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Journal articles on the topic 'Vacuum deposition method'

Author: Grafiati

Published: 5 June 2025

Last updated: 2 August 2025

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1

Rezinkin, O. L. "Synthesis of ferroceramics for electromagnetic shock waves generators by vacuum aerosol deposition method." Functional materials 23, no. 3 (2016): 484–89. http://dx.doi.org/10.15407/fm23.03.484.

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2

Szczepański, Tomasz, Urszula Więckiewicz, Barbara Konior, and Patryk Pucułek. "Vacuum metal deposition (VMD) – characteristics of the method." Issues of Forensic Science 308 (2020): 40–46. http://dx.doi.org/10.34836/pk.2020.308.1.

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Vacuum metal deposition was introduced in the process of visualization of latent fingermarks already in the 20th century. However, due to the requirement of using specialist equipment to ensure appropriate conditions for the development process, which would have generated significant costs, the method was not available in Poland. Technological developments, however, made it possible to create compact devices with smaller dimensions and lower parameters, which, nowadays, can be used in virtually every forensic fingerprint identification laboratory. The article describes the theoretical basis of

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3

SOONMIN, HO. "A review of nanostructured thin films for gas sensing and corrosion protection." Mediterranean Journal of Chemistry 7, no. 6 (2018): 433–51. http://dx.doi.org/10.13171/mjc7618111916hs.

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Thin film technology is getting huge attention across the world due to its wide applications. Deposition of thin films involves creation, transportation and condensation of target materials with thickness varying from few nanometers to several microns onto the substrate. This review will highlight thin film depositing techniques which consist of non-vacuum and vacuum based deposition method. Besides this, thin films and their applications in gas sensing and corrosion protection have also been discussed.

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4

Blanchet, R. C., and C. A. Santinelli. "Improved method for vacuum deposition of insulating films." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 4, no. 4 (1986): 1948–49. http://dx.doi.org/10.1116/1.573754.

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5

Mustata, Ion, Cristian Lungu, Ionut Jepu, and Corneliu Porosnicu. "Thermionic Vacuum Discharges for Thin Film Depositions." Coatings 13, no. 9 (2023): 1500. http://dx.doi.org/10.3390/coatings13091500.

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The thermionic vacuum discharge method is very effective in that the films obtained using this technology are characterised by a very high degree of adhesion, density and purity because the deposition technique is carried out in high, very high or, if possible, in ultra-very high vacuum conditions with no gas present. When the substrate is placed in vacuum, no heat transfer particles are present, the substrate being heated only by the ion incident on the surface. This advantage recommends the TVD method for deposits on plastics or other thermally sensitive materials. Additionally, this slow he

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6

INOUE, Takayoshi. "Thin Film Deposition using a Velocity-Selected Vacuum Deposition Method. Development of Velocity Selector and Its Application to Vacuum Deposition." Transactions of the Japan Society of Mechanical Engineers Series B 62, no. 599 (1996): 2711–16. http://dx.doi.org/10.1299/kikaib.62.2711.

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7

Wu, Hou Ya, Tie Niu Yang, and Xiao Jun Wang. "Researches of Pressure Measurement Method in Vacuum Environment." Applied Mechanics and Materials 347-350 (August 2013): 19–23. http://dx.doi.org/10.4028/www.scientific.net/amm.347-350.19.

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wafer processing is one process of the IC industry which is a booming area nowadays, the quality of the production of this course depends on the performance of the film which is formed by deposition. And one of the most important factors influencing the performance is working pressure. Variable structure chamber for flowing experiment and testing which is a multifunction testing platform with changeable structure and sufficient measurement points all-covered the chamber, a device has been designed and manufactured to measure and research vacuum flow filed. By using this equipment, the pressure

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8

Hinaut, Antoine, Sebastian Scherb, Sara Freund, Zhao Liu, Thilo Glatzel, and Ernst Meyer. "Influence of electrospray deposition on C60 molecular assemblies." Beilstein Journal of Nanotechnology 12 (June 15, 2021): 552–58. http://dx.doi.org/10.3762/bjnano.12.45.

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Maintaining clean conditions for samples during all steps of preparation and investigation is important for scanning probe studies at the atomic or molecular level. For large or fragile organic molecules, where sublimation cannot be used, high-vacuum electrospray deposition is a good alternative. However, because this method requires the introduction into vacuum of the molecules from solution, clean conditions are more difficult to be maintained. Additionally, because the presence of solvent on the surface cannot be fully eliminated, one has to take care of its possible influence. Here, we com

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9

Prikryl, Radek, Pavel Otrisal, Vladimir Obsel, Lubomír Svorc, Radovan Karkalic, and Jan Buk. "Protective Properties of a Microstructure Composed of Barrier Nanostructured Organics and SiOx Layers Deposited on a Polymer Matrix." Nanomaterials 8, no. 9 (2018): 679. http://dx.doi.org/10.3390/nano8090679.

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The SiOx barrier nanocoatings have been prepared on selected polymer matrices to increase their resistance against permeation of toxic substances. The aim has been to find out whether the method of vacuum plasma deposition of SiOx barrier nanocoatings on a polyethylene terephthalate (PET) foil used by Aluminium Company of Canada (ALCAN) company (ALCAN Packaging Kreuzlingen AG (SA/Ltd., Kreuzlingen, Switzerland) within the production of CERAMIS® packaging materials with barrier properties can also be used to increase the resistance of foils from other polymers against the permeation of organic

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10

Agawa, Yoshiaki, Satoshi Endo, Masamichi Matsuura, and Yoshikazu Ishii. "Behaviors of Metal Nano-Particles Prepared by Coaxial Vacuum Arc Deposition." Advanced Materials Research 123-125 (August 2010): 1067–70. http://dx.doi.org/10.4028/www.scientific.net/amr.123-125.1067.

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By the use of a coaxial pulsed vacuum arc discharge deposition method (APD), we have developed the catalyst deposition system onto support powders or sheet under vacuum. In this letter, we introduce Pt catalysis processing for fuel cell and evaluation for the electrode property.

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11

Specht, R. C., and G. J. Lutz. "Chromium deposition by sputtering." Proceedings, annual meeting, Electron Microscopy Society of America 44 (August 1986): 662–63. http://dx.doi.org/10.1017/s0424820100144723.

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Previous works have shown the benefits of depositing ultrathin films (0.5-3.0 nm) of chromium onto SEM specimens to permit improved resolution at higher magnification. The finer grain structure of the chromium permits closer replication of the specimen surface topography than is possible with the conventional 10 nm of gold. This paper presents the results of an ongoing program at Denton Vacuum to develop guidelines for successful, repeatable deposition of ultrathin chromium films by sputtering.Chromium can be deposited using a high vacuum evaporator by either evaporation of chips from baskets

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12

Abaghyan, G. V., and S. L. Petrosyan. "Investigation of polyaniline films produced by vacuum deposition method." Journal of Contemporary Physics (Armenian Academy of Sciences) 44, no. 4 (2009): 200–204. http://dx.doi.org/10.3103/s1068337209040100.

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13

Affinito, John. "A new method for vacuum deposition of polymer films." Thin Solid Films 420-421 (December 2002): 1–7. http://dx.doi.org/10.1016/s0040-6090(02)00739-3.

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14

Marchenko, Ekaterina, Venera Luchsheva, Gulsharat Baigonakova, Abdigali Bakibaev, and Alexander Vorozhtsov. "Functionalization of the Surface of Porous Nickel–Titanium Alloy with Macrocyclic Compounds." Materials 16, no. 1 (2022): 66. http://dx.doi.org/10.3390/ma16010066.

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For the first time, we performed functionalization of the surface of porous titanium nickelide alloys with bambusuril[6]-based macrocyclic compounds by different methods in order to provide the basis for saturation with therapeutic agents to impart antibacterial activity and accelerate its osteogenesis. It has been shown for the first time that the vacuum modification method is preferable for bambusuril deposition, since it provides a uniform deposition of organic matter on both the outer and inner surfaces of the pores. The effect of bambusuril deposition methods on the continuity, structure,

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15

Allwright, Emily, Dominik M. Berg, Rabie Djemour, Marc Steichen, Phillip J. Dale, and Neil Robertson. "Electrochemical deposition as a unique solution processing method for insoluble organic optoelectronic materials." J. Mater. Chem. C 2, no. 35 (2014): 7232–38. http://dx.doi.org/10.1039/c4tc01134a.

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16

Mohammed, Mohaned, and Doo-Man Chun. "Electrochemical Performance of Few-Layer Graphene Nano-Flake Supercapacitors Prepared by the Vacuum Kinetic Spray Method." Coatings 8, no. 9 (2018): 302. http://dx.doi.org/10.3390/coatings8090302.

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A few-layer graphene nano-flake thin film was prepared by an affordable vacuum kinetic spray method at room temperature and modest low vacuum conditions. In this economical approach, graphite microparticles, a few layers thick, are deposited on a stainless-steel substrate to form few-layer graphene nano-flakes using a nanoparticle deposition system (NPDS). The NPDS allows for a large area deposition at a low cost and can deposit various metal oxides at room temperature and low vacuum conditions. The morphology and structure of the deposited thin films are alterable by changing the scan speed o

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17

TAOMOTO, Akira, Yasuhiko MACHIDA, Katsuhiro NICHOGI, and Shiroh ASAKAWA. "Formation of ligand-coordinated phthalocyanine films by vacuum deposition method." NIPPON KAGAKU KAISHI, no. 11 (1987): 2025–30. http://dx.doi.org/10.1246/nikkashi.1987.2025.

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18

Lam, W. W., and I. Shih. "InSb thin films prepared by a multilayer vacuum deposition method." Materials Letters 16, no. 1 (1993): 8–13. http://dx.doi.org/10.1016/0167-577x(93)90174-v.

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19

Khamdokhov, A. Z., R. Sh Teshev, Z. M. Khamdokhov, V. S. Kulikauskas, and P. N. Chernykh. "Features of TiN film deposition by the vacuum-arc method." Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques 7, no. 4 (2013): 737–39. http://dx.doi.org/10.1134/s1027451013040320.

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20

Li, Ming, Shuanhu Wang, Yang Zhao, and Kexin Jin. "Review on fabrication methods of SrTiO3-based two dimensional conductive interfaces." European Physical Journal Applied Physics 93, no. 2 (2021): 21302. http://dx.doi.org/10.1051/epjap/2021200326.

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The SrTiO3-based two dimensional conductive interfaces have attracted considerable attention in the last decade owing to the emergence of novel physical phenomena. These heterointerfaces are generally formed by depositing the films on SrTiO3 substrates. Particularly, the controllable and precise characteristics of pulsed laser deposition (PLD) allow the deposition of an atomically flat oxide films and control the growth layer-by-layer. Recently, the deposition methods of atomic layer deposition (ALD) and spin coating have exhibited an excellent practicability and many interesting results are o

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21

Fu, Zhi Qiang, Cheng Biao Wang, Wen Yue, Zhi Jian Peng, Song Sheng Lin, and Ming Jiang Dai. "Influence of Vacuum Cathodic Arc Etching on Structure and Properties of W-Doped DLC Films." Advanced Materials Research 787 (September 2013): 296–300. http://dx.doi.org/10.4028/www.scientific.net/amr.787.296.

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In order to further improve the deposition process of the W-doped DLC films synthesized by a hybrid deposition method of vacuum cathodic arc, ion beam deposition, and magnetron sputtering, the paper studied the effect of vacuum cathodic arc etching prior to the deposition on the surface morphology, chemical bond status, hardness, elastic modulus, adhesion, friction, and wear of the films. It was found that the surface defects in the W-doped DLC films, which increase the average value and fluctuation of the friction coefficient of the W-doped DLC films, are mainly produced by vacuum cathodic ar

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22

Polityko, K. N., I. V. Kolesnikov, and D. S. Manturov. "Analysis of Technologies for Applying High-Entropy Coatings by Physical Deposition Method." Advanced Engineering Research (Rostov-on-Don) 24, no. 4 (2024): 369–91. https://doi.org/10.23947/2687-1653-2024-24-4-369-391.

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Introduction. Modern tribology solves the problems of increasing the reliability of friction units through applying vacuum wear-resistant coatings by the physical vapor deposition (PVD) method. More than five thousand scientific papers are devoted to high-entropy alloys (HEA). However, an urgent question about the possibility of obtaining wear-resistant and antifriction high-entropy coatings (HEC) using the PVD method remains unsolved. Its solution opens up the possibility of using HEC in mechanical engineering. The presented article is intended to fill this gap. Research objectives are as fol

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23

Dinca, Virginia, Aurelia Mandes, Rodica Vladoiu, Gabriel Prodan, Victor Ciupina, and Silviu Polosan. "Microstructural and Morphological Characterization of the Cobalt-Nickel Thin Films Deposited by the Laser-Induced Thermionic Vacuum Arc Method." Coatings 13, no. 6 (2023): 984. http://dx.doi.org/10.3390/coatings13060984.

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Laser Induced-Thermionic Vacuum Arc (LTVA) technology was used for depositing uniform intermetallic CoNi thin films of 100 nm thickness. LTVA is an original deposition method using a combination of the typical Thermionic Vacuum Arc (TVA) system and a laser beam provided by a QUANTEL Q-Smart 850 Nd:YAG compact Q-switched laser with a second harmonic module. The novelty is related to the simultaneous deposition of a bi-component metallic thin film using photonic processes of the laser over the plasma deposition, which improves the roughness but also triggers the composition of the deposited thin

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24

Vereschaka, Alexey A., Anatoly S. Vereschaka, Andre DL Batako, Boris J. Mokritskii, Anatoliy Y. Aksenenko, and Nikolay N. Sitnikov. "Improvement of structure and quality of nanoscale multilayered composite coatings, deposited by filtered cathodic vacuum arc deposition method." Nanomaterials and Nanotechnology 7 (January 17, 2016): 184798041668080. http://dx.doi.org/10.1177/1847980416680805.

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This article studies the specific features of cathode vacuum arc deposition of coatings used in the production of cutting tools. The detailed analysis of the major drawbacks of arc-Physical Vapour Deposition (PVD) methods has contributed to the development of the processes of filtered cathodic vacuum arc deposition to form nanoscale multilayered composite coatings of increased efficiency. This is achieved through the formation of nanostructure, increase in strength of adhesion of coating to substrate up to 20%, and reduction of such dangerous coating surface defects as macro- and microdroplets

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25

Zhang, Hong, Yong Zhao, Yong Zhang, Min Pan та Ming Lei. "SmBa2Cu3O7−δ superconducting layer prepared on NiO buffer layer through fluorine-free chemical method". International Journal of Modern Physics B 29, № 25n26 (2015): 1542040. http://dx.doi.org/10.1142/s0217979215420400.

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With energy shortage becoming increasingly severe, the application of high-temperature superconducting material is a considerable prospects, where economic, efficient and energy-saving preparation technology becoming the key factors for the large-scale applications of [Formula: see text] (REBCO) superconducting coated conductors. Currently, non-vacuum chemical solution deposition technique is an important way to reduce the cost of preparation of coated conductors. However, a randomly oriented NiO growth is an important problem for the non-vacuum chemical preparation of superconducting coated c

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26

Kim, Dongyeon, Hyeonggeun Kim, Hyeongmin Yu, Seeun Oh, and Kang Taek Lee. "Ultrathin Triple Conducting Oxide Interlayer for Protonic Ceramic Electrochemical Cells Fabricated by Chemical Solution Deposition." ECS Meeting Abstracts MA2024-02, no. 48 (2024): 3334. https://doi.org/10.1149/ma2024-02483334mtgabs.

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Protonic ceramic electrochemical cells (PCECs) offer the capability to enhance electrochemical properties across various energy conversion systems, efficiently transforming chemical fuels into electricity and vice versa, operating at temperatures below 600 °C. However, poor contact between the oxygen electrode, which possesses triple conductivity (H+/O2-/e-), and the electrolyte results in elevated ohmic resistance, impeding the electrochemical reactions of PCECs. To improve the adhesion between the oxygen electrode and the electrolyte layer, various vacuum deposition techniques such as pulsed

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27

Jang, Soo Ouk, Changhyun Cho, Ji Hun Kim та ін. "Microwave Plasma Assisted Aerosol Deposition (μ-PAD) for Ceramic Coating Applications". Ceramics 5, № 4 (2022): 1174–84. http://dx.doi.org/10.3390/ceramics5040083.

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To improve plasma and chemical resistance on various vacuum components used for semiconductor manufacturing equipment, various ceramic coating techniques have been applied. Among these methods for ceramic coating, the well-known atmospheric plasma spray (APS) is advantageous for providing thick film (100 µm or more) deposition. However, there are problems associated with the phase transition of the coating film and poor film quality due to formation of voids. To solve these problems, the aerosol deposition (AD) method has been developed. This method provides nice ceramic film quality. However,

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28

Seo, Min, Min Kyung Cho, Un Hyeon Kang, Sin Young Jeon, Sang-Ho Lim, and Seung Hee Han. "Low-Resistivity Cobalt and Ruthenium Ultra-Thin Film Deposition Using Bipolar HiPIMS Technique." ECS Journal of Solid State Science and Technology 11, no. 3 (2022): 033006. http://dx.doi.org/10.1149/2162-8777/ac5805.

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Owing to the rapid growth of very large-scale integration technology at nanometer scales, cobalt and ruthenium interconnects are being used to solve the high-resistivity copper problem. However, with such interconnects, carbon contamination can occur during chemical vapor deposition and atomic layer deposition. Bipolar (BP) high-power impulse magnetron sputtering (HiPIMS) with a high ionization rate is an excellent vacuum process for depositing low-resistivity thin films. In this study, low-resistivity cobalt, ruthenium, and copper thin films were deposited using BP-HiPIMS, HiPIMS, and direct-

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29

Schultrich, Bernd. "Structure and Characterization of Vacuum Arc Deposited Carbon Films—A Critical Overview." Coatings 12, no. 2 (2022): 109. http://dx.doi.org/10.3390/coatings12020109.

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This critical overview analyzes the relations between deposition conditions and structure for hydrogen-free carbon films, prepared by vacuum arc deposition. The manifold of film structures can be roughly divided into graphitic, nanostructured and amorphous films. Their detailed characterization uses advantageously sp3 fraction, density, Raman peak ratio and the mechanical properties (Young’s modulus and hardness). Vacuum arc deposition is based on energetic beams of carbon ions, where the film growth is mainly determined by ion energy and surface temperature. Both parameters can be clearly def

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30

Le, Ngoc Van, Hien Ngoc Pham, Trang Le Thanh Hoang, Tuan Tran, and Dat Thanh Huynh. "SUBSTRATE TEMPERATURE EFFECTS ON STRUCTURE AND ELECTRICAL CHARACTERISTICS OF TCO THIN FILM SnO2: Sb PREPARED BY REACTIVE MAGNETRON SPUTTERING." Science and Technology Development Journal 12, no. 17 (2009): 16–21. http://dx.doi.org/10.32508/stdj.v12i17.2362.

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The transparent electrode films SnO2: Sb were prepared by reactive magnetron sputtering method on glass substrate with various substrate temperatures. The material of target is alloy of Sn (99,5% purity) doped Sb (5% Sb by weight). The deposition processes were carried out in mixture of Ar (99,99% purity) and 02 (99,999% purity) gas. The vacuum inside the deposition chamber can get to about 10-5 torr. The substrate temperatures during the depositing processes were kept at fixed values between the room temperature and 450ºC. The dependence of crystal size and conductivity of films on substrate

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31

Kim, Ksenia B., Alexander S. Lenshin, Sergei S. Chernenko, Sabukhi Ilich ogly Niftaliev, and Andrey I. Chukavin. "Examining the morphology and surface composition of a nanostructured tin film on porous silicon." Journal of Optical Technology 91, no. 10 (2024): 675. https://doi.org/10.1364/jot.91.000675.

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Subject of study. Porous silicon is a material with significant potential for the development of optoelectronic and sensor devices, enhancing various technologies and improving their efficiency. It is used in light-emitting diodes, photodetectors, solar cells, sensors, and other devices that require high light absorption, emission efficiency, and sensitivity to environmental optical values. The deposition of tin particles on porous silicon enables the development of new nanocomposite materials with customized properties for various applications. Vacuum-thermal evaporation is a widely used meth

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32

Kim, Il-Jin, and Kee-Bae Park. "Hydrogen sensor of SWNT-PdOxsystem using the vacuum filtering deposition method." Journal of Sensor Science and Technology 19, no. 2 (2010): 87–91. http://dx.doi.org/10.5369/jsst.2010.19.2.087.

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33

Potelov, V. V., and B. N. Senik. "Aspherization of high-accuracy optical elements by the vacuum-deposition method." Journal of Optical Technology 71, no. 12 (2004): 814. http://dx.doi.org/10.1364/jot.71.000814.

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34

MIYAKE, Chie, Yuhito YONEDA, Masaru MATSUMURA, et al. "Characterization of Uranium Oxide Thin Film Prepared by Vacuum Deposition Method." Journal of Nuclear Science and Technology 27, no. 4 (1990): 382–85. http://dx.doi.org/10.1080/18811248.1990.9731197.

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35

Takikawa, Hirofumi, Tsuyoshi Sasaoka, and Tateki Sakakibara. "Synthesis of anatase TiO2 film by reactive vacuum arc deposition method." Electrical Engineering in Japan 126, no. 4 (1999): 12–20. http://dx.doi.org/10.1002/(sici)1520-6416(199903)126:4<12::aid-eej2>3.0.co;2-7.

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36

Munzert, Peter, Ulrike Schulz, and Norbert Kaiser. "Method for the Vacuum Deposition of Optical Coatings on Polymethyl Methacrylate." Plasma Processes and Polymers 4, S1 (2007): S1036—S1040. http://dx.doi.org/10.1002/ppap.200732401.

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37

Lee, Ji Hoon, Jin Ho Choi, Sang Ryong Lee, et al. "Vacuum-Free Continuous Fabrication for Forming Narrow Bus Wires." Applied Mechanics and Materials 481 (December 2013): 158–61. http://dx.doi.org/10.4028/www.scientific.net/amm.481.158.

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Photolithography is undoubtedly the most widely used patterning method for the fabrication of micro-and nanofeatures, despite the recent development in some unconventional fabrication techniques that are poised to take over certain applications. But photolithography is still the main fabrication method in industry. To step forward in many applied areas, however, large-area, continuous fabrication system needs to be developed. However photolithography has not been extended to large area continuous patterning like other printing technologies. Photolithography is currently based on wafer scale fa

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Dangwal, Shailesh, Ruochen Liu, Lyndon D. Bastatas, et al. "ZnO Microfiltration Membranes for Desalination by a Vacuum Flow-Through Evaporation Method." Membranes 9, no. 12 (2019): 156. http://dx.doi.org/10.3390/membranes9120156.

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ZnO was deposited on macroporous α-alumina membranes via atomic layer deposition (ALD) to improve water flux by increasing their hydrophilicity and reducing mass transfer resistance through membrane pore channels. The deposition of ZnO was systemically performed for 4–128 cycles of ALD at 170 °C. Analysis of membrane surface by contact angles (CA) measurements revealed that the hydrophilicity of the ZnO ALD membrane was enhanced with increasing the number of ALD cycles. It was observed that a vacuum-assisted ‘flow-through’ evaporation method had significantly higher efficacy in comparison to c

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SONG, WOOJIN, KYUBONG JUNG, DOO-MAN CHUN, SUNG-HOON AHN, and CAROLINE SUNYONG LEE. "DEPOSITION OF Al2O3 POWDERS USING NANO-PARTICLE DEPOSITION SYSTEM." Surface Review and Letters 17, no. 02 (2010): 189–93. http://dx.doi.org/10.1142/s0218625x10013710.

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In this paper, alumina film was deposited using supersonic micronozzle in nano-particle deposition System (NPDS). Powder deposition at room temperature is important in the field of film deposition since high processing temperature can be a serious limitation for the deposition on flexible substrate. Previously, many studies have been reported on particle deposition, such as aerosol deposition method (ADM) or cold spray method. However, these deposition methods cannot be applied to various types of powders. Recently, NPDS using aluminum nozzle was designed to resolve these problems but it canno

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40

Longo, Giulia, Lidón Gil-Escrig, Maarten J. Degen, Michele Sessolo, and Henk J. Bolink. "Perovskite solar cells prepared by flash evaporation." Chemical Communications 51, no. 34 (2015): 7376–78. http://dx.doi.org/10.1039/c5cc01103e.

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41

Goncharov, Victor K., Michail V. Puzyrev, Dzmitry P. Prakapenia, Nikita I. Shulhan, and Valery Yu Stupakevich. "Regimes of substrates processing and deposition nanofilms using the laser-plasma method." Journal of the Belarusian State University. Physics, no. 1 (February 11, 2021): 73–81. http://dx.doi.org/10.33581/2520-2243-2021-1-73-81.

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The physical processes occurring in a laser-plasma source is used for deposition nanostructures. The laser-plasma source is an erosion laser plume of the target material and a substrate located in a vacuum chamber. It has been proposed to place a grid between the laser target and the substrate. A negative potential is applied to the grid relative to the laser target to smoothly adjust the parameters of the particles deposited on the substrate. As a result, a particles flow is formed after a grid. This particle flow is predominantly consisting of ions. The energy of the ions can be reliably and

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42

Myslivets, A. S., P. A. Rozel, and E. A. Khakhlov. "IN-LINE SPUTTERING COATER OF HYDROPHOBIC ANTIREFLECTION COATING FOR SENSOR DISPLAYS." Doklady BGUIR, no. 7 (125) (December 7, 2019): 74–80. http://dx.doi.org/10.35596/1729-7648-2019-125-7-74-80.

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The aim of the work is to develop vacuum technological equipment for deposition an interference antireflection coating with the evaporation of a hydrophobic protective layer in a single vacuum cycle. To deposition an interference antireflection coating, the method of magnetron reactive sputtering in the alternating current mode with a frequency of 20 kHz is used. This method allows using of a wide range of sputtered materials and obtains stable and high-quality coatings on various substrates. To determine the optical characteristics, a spectrophotometer was used, which evaluated the transmitta

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43

Zhang, Shi Wei, Li Yuan Hou, Yong Chao Han, and Yuan Hua Xie. "A New Method and Equipment to Manufacture the Composite Powder Materials by Vacuum Co-Deposition of Double Sources." Advanced Materials Research 129-131 (August 2010): 626–30. http://dx.doi.org/10.4028/www.scientific.net/amr.129-131.626.

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In the process of manufacturing the composite materials, some of the chemical components are difficult to combine with each other. Aiming at this problem, a new method and supporting equipment of manufacturing the composite powder materials is reported which can make any two (or more) kinds of components mixing in nano-scale. This method is derived from the vacuum co-depositing technology by two (or more) vaporization sources for vacuum film coating, and some of the structures in vacuum film coil coating machine are used for reference. The principle, structure, process and characteristics of t

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Tsukamoto, Shuhei, Ichiro Fujii, Kouichi Nakashima, et al. "Preparation of Barium Titanate Nanoperticles with Necking Structure/Polymer Complex and their Dielectric Properties." Key Engineering Materials 582 (September 2013): 23–26. http://dx.doi.org/10.4028/www.scientific.net/kem.582.23.

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Barium titanate (BaTiO3) nanoparticles were prepared by a 2-step thermal decomposition method using nanooxalate particles. BaTiO3 nanoparticles were characterized using various methods. Accumulations were prepared by electrophoresis deposition method using the obtained BaTiO3 nanoparticles. They were performed necking structure by a solvothermal method. Polymer was infiltrated into the accumulations in vacuum to prepare a polymer film capacitor.

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Heydari Gharahcheshmeh, Meysam. "Fabrication of Conjugated Conducting Polymers by Chemical Vapor Deposition (CVD) Method." Nanomaterials 15, no. 6 (2025): 452. https://doi.org/10.3390/nano15060452.

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Chemical vapor deposition (CVD) is a highly adaptable manufacturing technique used to fabricate high-quality thin films, making it essential across numerous industries. As materials fabrication processes progress, CVD has advanced to enable the precise deposition of both inorganic 2D materials, such as graphene and transition metal dichalcogenides, and high-quality polymeric thin films, offering excellent conformality and precise nanostructure control on a wide range of substrates. Conjugated conducting polymers have emerged as promising materials for next-generation electronic, optoelectronic

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Rozhkov, Konstantin A., Sergey S. Starikov, Stepan V. Varushkin, Dmitry N. Trushnikov, and Irina A. Zubko. "ON IMPROVING THE METHOD OF ELECTRON-BEAM DEPOSITION." Journal of Physics: Conference Series 2077, no. 1 (2021): 012017. http://dx.doi.org/10.1088/1742-6596/2077/1/012017.

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Abstract The paper deals with improvement of the electron-beam additive forming of metal products using a vertically fed filler wire in vacuum with two electron beams as a heating source. We compared the importance of the power of the heat source required for fusing the layers with each other and the calculated power of the heat source required to melt the filler wire and the surface of the product. Within the experimental conditions of the multilayer electron beam deposition using side wire feeding, the electron beam power of 2.4 kW was required to ensure fusion without the defect formation b

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Cabrera, Isaac A., Parker J. Hill, Win-Ying Zhao, et al. "Prosthetic Sockets: Tensile Behavior of Vacuum Infiltrated Fused Deposition Modeling Sandwich Structure Composites." Prosthesis 4, no. 3 (2022): 317–37. http://dx.doi.org/10.3390/prosthesis4030027.

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The development of novel materials will enable a new generation of prosthetic devices to be built with additive manufacturing (AM). Vacuum infiltrated sandwich structure composites are a promising approach for building prosthetic sockets via AM. In this paper, we test the tensile properties of 18 different composite material configurations using ASTM D638. These composites were manufactured using a custom vacuum infiltration method and had varying filament materials, infiltrated matrix materials, and print directions. Several material-matrix-print composites showed higher ultimate tensile stre

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Vorontsov, Andrey, Andrey Filippov, Nikolay Shamarin, et al. "Microstructure and residual stresses of ZrN/CrN multilayer coatings formed by the plasma-assisted vacuum-arc method." Metal Working and Material Science 24, no. 3 (2022): 76–89. http://dx.doi.org/10.17212/1994-6309-2022-24.3-76-89.

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Introduction. The current state of the art in the field of hard coatings application requires the formation of nanostructured compositions using different chemical elements. Modern hard coatings are able to combine different properties such as high hardness, wear resistance, corrosion resistance. At present, coatings formed by layer-by-layer deposition of zirconium and chromium nitrides are promising. When depositing combinations of chemical elements on various substrates, studies are required aimed at investigating its microstructure and, mainly, residual stresses formed during the deposition

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Lupescu, Octavian, Ana Bădănac, Mădălina Popa, and Cristian Ulianov. "Researches upon Thin Layers Deposition on Cutting Inserts." Applied Mechanics and Materials 809-810 (November 2015): 339–44. http://dx.doi.org/10.4028/www.scientific.net/amm.809-810.339.

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It is known that during the cutting process the tool wears out. This is due to the high temperatures, the relative velocities and shocks between the contact surfaces of the tool-part and the mechanical and thermal stresses which appear on the active surfaces of the tool. The result is loss of cutting and reduced processing quality. This involves taking measures to increase the values of the cutting tools and/or the durability of their cutting inserts. Tool durability can be increased by various coating methods by the depositing in a vacuum of some different materials which achieve the necessar

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Nazarov, A. Yu, A. M. Khusainova, A. A. Maslov, et al. "Investigation of the influence of the stoichiometric composition of the coating and heat treatment modes on the phase composition of coatings of the Y-Al-O system." Izvestiya vysshikh uchebnykh zavedenii. Fizika, no. 11 (2022): 107–15. http://dx.doi.org/10.17223/00213411/65/11/107.

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The paper presents the results of studies of coatings of the Y-Al-O system deposited by the vacuum-arc method with simultaneous deposition from two electric arc evaporators with single-component Y and Al cathodes. Three different deposition modes were selected. After coating deposition, the samples were annealed in a vacuum furnace at 800 and at 1200 °C to determine the effect of annealing temperature on phase formation. In all modes of heat treatment, the YAlO3 phase is formed. With an increase in temperature, more complex compounds Y3Al5O12(YAG) and Y4Al2O9(YAM) are formed. X-ray diffraction

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