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Artículos de revistas sobre el tema "Plasma immersion ion implantation"

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Publicado: 4 de junio de 2021
Última modificación: 25 de julio de 2025

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1

Mantese, Joseph V., Ian G. Brown, Nathan W. Cheung, and George A. Collins. "Plasma-Immersion Ion Implantation." MRS Bulletin 21, no. 8 (1996): 52–56. http://dx.doi.org/10.1557/s0883769400035727.

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Plasma-immersion ion implantation (PIII) is an emerging technology for the surface engineering of semiconductors, metals, and dielectrics. It is inherently a batch-processable technique that lends itself to the implantation of large numbers of parts simultaneously. It thus offers the possibility of introducing ion implantation into manufacturing processes that have not traditionally been feasible using conventional implantation.In PIII the part to be treated is placed in a vacuum chamber in which is generated a plasma containing the ions of the species to be implanted. The plasma based implant
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2

Thomae, Rainer W. "Plasma-immersion ion implantation." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 139, no. 1-4 (1998): 37–42. http://dx.doi.org/10.1016/s0168-583x(97)00952-x.

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3

MIREAULT, N., and G. G. ROSS. "MODIFICATION OF WETTING PROPERTIES OF PMMA BY IMMERSION PLASMA ION IMPLANTATION." Surface Review and Letters 15, no. 04 (2008): 345–54. http://dx.doi.org/10.1142/s0218625x08011470.

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Advancing and receding contact angles below 5° have been obtained on PMMA surfaces with the implantation of argon and oxygen ions. The ion implantations were performed by means of the Immersion Plasma Ion Implantation (IPII) technique, a hybrid between ion beams and immersion plasmas. Characterization of treated PMMA surfaces by means of XPS and its combination with chemical derivatization (CD-XPS) have revealed the depletion of oxygen and the creation of dangling bonds, together with the formation of new chemical functions such as –OOH , –COOH and C = C . These observations provide a good exp
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4

Lieberman, M. A. "Model of plasma immersion ion implantation." Journal of Applied Physics 66, no. 7 (1989): 2926–29. http://dx.doi.org/10.1063/1.344172.

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5

Kondyurin, A., V. Karmanov, and R. Guenzel. "Plasma immersion ion implantation of polyethylene." Vacuum 64, no. 2 (2001): 105–11. http://dx.doi.org/10.1016/s0042-207x(01)00381-5.

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6

López-Callejas, R., R. Valencia-Alvarado, A. E. Muñoz-Castro, O. G. Godoy-Cabrera, and J. L. Tapia-Fabela. "Instrumentation for plasma immersion ion implantation." Review of Scientific Instruments 73, no. 12 (2002): 4277–82. http://dx.doi.org/10.1063/1.1517144.

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7

Collins, G. A., R. Hutchings, and J. Tendys. "Plasma immersion ion implantation of steels." Materials Science and Engineering: A 139 (July 1991): 171–78. http://dx.doi.org/10.1016/0921-5093(91)90613-r.

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8

Mändl, S., J. Brutscher, R. Günzel, and W. Möller. "Ion energy distribution in plasma immersion ion implantation." Surface and Coatings Technology 93, no. 2-3 (1997): 234–37. http://dx.doi.org/10.1016/s0257-8972(97)00051-0.

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9

Kenny, M. J., L. S. Wielunski, J. Tendys, and G. A. Collins. "A comparison of plasma immersion ion implantation with conventional ion implantation." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 80-81 (June 1993): 262–66. http://dx.doi.org/10.1016/0168-583x(93)96120-2.

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10

Yankov, Rossen A., and Stephan Mändl. "Plasma immersion ion implantation for silicon processing." Annalen der Physik 513, no. 4 (2001): 279–98. http://dx.doi.org/10.1002/andp.20015130401.

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11

Linder, B. P., and N. W. Cheung. "Plasma immersion ion implantation with dielectric substrates." IEEE Transactions on Plasma Science 24, no. 6 (1996): 1383–88. http://dx.doi.org/10.1109/27.553205.

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12

Brutscher, Jörg, Reinhard Günzel, and Wolfhard Möller. "Sheath dynamics in plasma immersion ion implantation." Plasma Sources Science and Technology 5, no. 1 (1996): 54–60. http://dx.doi.org/10.1088/0963-0252/5/1/007.

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13

Chen, S. M., R. M. Gwilliam, and B. J. Sealy. "Computer simulation of Plasma Immersion Ion Implantation." Radiation Effects and Defects in Solids 141, no. 1-4 (1997): 149–59. http://dx.doi.org/10.1080/10420159708211566.

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14

Zeng, Xuchu, Ricky K. Y. Fu, Dixon T. K. Kwok, and Paul K. Chu. "Quasi-direct current plasma immersion ion implantation." Applied Physics Letters 79, no. 19 (2001): 3044–46. http://dx.doi.org/10.1063/1.1415404.

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15

Oliveira, R. M., M. Ueda, J. O. Rossi, B. Diaz, and K. Baba. "Plasma Immersion Ion Implantation With Lithium Atoms." IEEE Transactions on Plasma Science 36, no. 5 (2008): 2572–76. http://dx.doi.org/10.1109/tps.2008.2004229.

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16

Huber, P., G. Keller, J. W. Gerlach, S. Mändl, W. Assmann, and B. Rauschenbach. "Trench homogeneity in plasma immersion ion implantation." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 161-163 (March 2000): 1085–89. http://dx.doi.org/10.1016/s0168-583x(99)00825-3.

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17

Schiller, T. L., D. Sheeja, D. R. McKenzie, et al. "Plasma immersion ion implantation of poly(tetrafluoroethylene)." Surface and Coatings Technology 177-178 (January 2004): 483–88. http://dx.doi.org/10.1016/s0257-8972(03)00916-2.

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18

Blawert, C., and B. L. Mordike. "Industrial applications of plasma immersion ion implantation." Surface and Coatings Technology 93, no. 2-3 (1997): 274–79. http://dx.doi.org/10.1016/s0257-8972(97)00060-1.

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19

Möller, Wolfhard, Stefano Parascandola, Olaf Kruse, Reinhard Günzel, and Edgar Richter. "Plasma-immersion ion implantation for diffusive treatment." Surface and Coatings Technology 116-119 (September 1999): 1–10. http://dx.doi.org/10.1016/s0257-8972(99)00144-9.

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20

Cheung, Nathan W. "Processing considerations with plasma immersion ion implantation." Surface and Coatings Technology 156, no. 1-3 (2002): 24–30. http://dx.doi.org/10.1016/s0257-8972(02)00068-3.

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21

Kondyurin, A., P. Volodin, and J. Weber. "Plasma immersion ion implantation of Pebax polymer." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 251, no. 2 (2006): 407–12. http://dx.doi.org/10.1016/j.nimb.2006.06.026.

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22

Zeng, Zhaoming, Ricky K. Y. Fu, Xiubo Tian, and Paul K. Chu. "Plasma immersion ion implantation of industrial gears." Surface and Coatings Technology 186, no. 1-2 (2004): 260–64. http://dx.doi.org/10.1016/j.surfcoat.2004.02.048.

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23

Tian, X. B., K. Y. Fu, P. K. Chu, and S. Q. Yang. "Plasma immersion ion implantation of insulating materials." Surface and Coatings Technology 196, no. 1-3 (2005): 162–66. http://dx.doi.org/10.1016/j.surfcoat.2004.08.166.

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24

Ueda, M., I. H. Tan, R. S. Dallaqua, J. O. Rossi, J. J. Barroso, and M. H. Tabacniks. "Aluminum plasma immersion ion implantation in polymers." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 206 (May 2003): 760–66. http://dx.doi.org/10.1016/s0168-583x(03)00844-9.

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25

Günzel, R., and J. Brutscher. "Sheath dynamics in plasma immersion ion implantation." Surface and Coatings Technology 85, no. 1-2 (1996): 98–104. http://dx.doi.org/10.1016/0257-8972(96)02883-6.

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26

Chu, Paul K. "Semiconductor applications of plasma immersion ion implantation." Plasma Physics and Controlled Fusion 45, no. 5 (2003): 555–70. http://dx.doi.org/10.1088/0741-3335/45/5/304.

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27

Cheung, N. W. "Plasma immersion ion implantation for semiconductor processing." Materials Chemistry and Physics 46, no. 2-3 (1996): 132–39. http://dx.doi.org/10.1016/s0254-0584(97)80006-5.

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28

Chu, Paul K., and Nathan W. Cheung. "Microcavity engineering by plasma immersion ion implantation." Materials Chemistry and Physics 57, no. 1 (1998): 1–16. http://dx.doi.org/10.1016/s0254-0584(98)00211-9.

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29

Ensinger, W. "Semiconductor processing by plasma immersion ion implantation." Materials Science and Engineering: A 253, no. 1-2 (1998): 258–68. http://dx.doi.org/10.1016/s0921-5093(98)00734-5.

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30

Jones, Erin C., Barry P. Linder, and Nathan W. Cheung. "Plasma Immersion Ion Implantation for Electronic Materials." Japanese Journal of Applied Physics 35, Part 1, No. 2B (1996): 1027–36. http://dx.doi.org/10.1143/jjap.35.1027.

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31

Cheung, Nathan W. "Plasma immersion ion implantation for ULSI processing." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 55, no. 1-4 (1991): 811–20. http://dx.doi.org/10.1016/0168-583x(91)96285-s.

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32

Yankov, Rossen A., and Stephan Mändl. "Plasma immersion ion implantation for silicon processing." Annalen der Physik 10, no. 4 (2001): 279–98. http://dx.doi.org/10.1002/1521-3889(200104)10:4<279::aid-andp279>3.0.co;2-r.

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33

Chu, Paul K. "Progress in direct-current plasma immersion ion implantation and recent applications of plasma immersion ion implantation and deposition." Surface and Coatings Technology 229 (August 2013): 2–11. http://dx.doi.org/10.1016/j.surfcoat.2012.03.073.

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34

Collins, G. A., R. Hutchings, K. T. Short, and J. Tendys. "Ion-assisted surface modification by plasma immersion ion implantation." Surface and Coatings Technology 103-104 (May 1998): 212–17. http://dx.doi.org/10.1016/s0257-8972(98)00395-8.

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35

Tian, X. B., and Paul K. Chu. "Multiple ion-focusing effects in plasma immersion ion implantation." Applied Physics Letters 81, no. 20 (2002): 3744–46. http://dx.doi.org/10.1063/1.1520716.

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36

Cheng-Sen, Liu, Wang De-Zhen, Fan Yu-Jia, Zhang Nan, Guan Li, and Yao Yuan. "Non-Uniformity of Ion Implantation in Direct-Current Plasma Immersion Ion Implantation." Chinese Physics Letters 27, no. 7 (2010): 075201. http://dx.doi.org/10.1088/0256-307x/27/7/075201.

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37

Qian, X. Y., N. W. Cheung, M. A. Lieberman, R. Brennan, M. I. Current, and N. Jha. "Conformal implantation for trench doping with plasma immersion ion implantation." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 55, no. 1-4 (1991): 898–901. http://dx.doi.org/10.1016/0168-583x(91)96303-3.

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38

Zhi-Neng Fan, Qing-Chuan Chen, P. K. Chu, and Chung Chan. "Low pressure plasma immersion ion implantation of silicon." IEEE Transactions on Plasma Science 26, no. 6 (1998): 1661–68. http://dx.doi.org/10.1109/27.747884.

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39

Chen, S. M., R. M. Gwilliam, and B. J. Sealy. "MOS device fabrication via plasma immersion ion implantation." Solid-State Electronics 41, no. 4 (1997): 535–37. http://dx.doi.org/10.1016/s0038-1101(96)00218-3.

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40

Tan, I. H., M. Ueda, R. S. Dallaqua, J. O. Rossi, A. F. Beloto, and E. Abramof. "Magnesium plasma immersion ion implantation on silicon wafers." Surface and Coatings Technology 169-170 (June 2003): 379–83. http://dx.doi.org/10.1016/s0257-8972(03)00053-7.

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41

Shao, Jiqun, Erin C. Jones, and Nathan W. Cheung. "Shallow junction formation by plasma immersion ion implantation." Surface and Coatings Technology 93, no. 2-3 (1997): 254–57. http://dx.doi.org/10.1016/s0257-8972(97)00055-8.

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42

Davis, J., K. Short, R. Wuhrer, M. Phillips, and K. Whittle. "Plasma Immersion Ion Implantation of Stainless Steel 316." Microscopy and Microanalysis 17, S2 (2011): 1886–87. http://dx.doi.org/10.1017/s1431927611010300.

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43

Thorwarth, G., S. Mändl, and B. Rauschenbach. "Plasma immersion ion implantation of cold-work steel." Surface and Coatings Technology 125, no. 1-3 (2000): 94–99. http://dx.doi.org/10.1016/s0257-8972(99)00605-2.

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44

Mändl, S., D. Krause, G. Thorwarth, et al. "Plasma immersion ion implantation treatment of medical implants." Surface and Coatings Technology 142-144 (July 2001): 1046–50. http://dx.doi.org/10.1016/s0257-8972(01)01066-0.

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45

Mändl, Stephan, and Darina Manova. "Modification of metals by plasma immersion ion implantation." Surface and Coatings Technology 365 (May 2019): 83–93. http://dx.doi.org/10.1016/j.surfcoat.2018.04.039.

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46

Kondyurin, A., B. K. Gan, M. M. M. Bilek, D. R. McKenzie, K. Mizuno, and R. Wuhrer. "Argon plasma immersion ion implantation of polystyrene films." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 266, no. 7 (2008): 1074–84. http://dx.doi.org/10.1016/j.nimb.2008.02.063.

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47

Ueda, M., M. M. Silva, C. M. Lepienski, P. C. Soares, J. A. N. Gonçalves, and H. Reuther. "High temperature plasma immersion ion implantation of Ti6Al4V." Surface and Coatings Technology 201, no. 9-11 (2007): 4953–56. http://dx.doi.org/10.1016/j.surfcoat.2006.07.074.

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48

Yankov, R. A., N. Shevchenko, A. Rogozin, et al. "Reactive plasma immersion ion implantation for surface passivation." Surface and Coatings Technology 201, no. 15 (2007): 6752–58. http://dx.doi.org/10.1016/j.surfcoat.2006.09.010.

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49

Valcheva, E., S. Dimitrov, D. Manova, S. Mändl, and S. Alexandrova. "AlN nanoclusters formation by plasma ion immersion implantation." Surface and Coatings Technology 202, no. 11 (2008): 2319–22. http://dx.doi.org/10.1016/j.surfcoat.2007.08.051.

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50

Collins, G. A., R. Hutchings, and J. Tendys. "Plasma immersion ion implantation—the role of diffusion." Surface and Coatings Technology 59, no. 1-3 (1993): 267–73. http://dx.doi.org/10.1016/0257-8972(93)90095-6.

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