Literatura académica sobre el tema "Polissage CMP"
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Artículos de revistas sobre el tema "Polissage CMP":
Walther, Sten M., Karen B. Domino, Robb W. Glenny, Nayak L. Polissar y Michael P. Hlastala. "Pulmonary blood flow distribution has a hilar-to-peripheral gradient in awake, prone sheep". Journal of Applied Physiology 82, n.º 2 (1 de febrero de 1997): 678–85. http://dx.doi.org/10.1152/jappl.1997.82.2.678.
Tesis sobre el tema "Polissage CMP":
Toth, Réka. "Mécanismes physico-chimiques du polissage". Thesis, Paris 6, 2016. http://www.theses.fr/2016PA066763.
Chemical Mechanical Polishing (CMP) consists in applying a slurry of colloidal particles onto a solid surface called substrate, through a pressure applied with a rotating polymeric pad. A silica substrate and CeO2 particles were chosen as reference system to study the mechanism of CMP. Macroscopic studies have shown the effect of the concentration and the size of abrasive particles, as well as the importance of pH and ionic strength. The mechanism was more thoroughly studied by recirculating the slurry in fixed conditions. Surface interactions between the substrate and the particles were studied thanks to a multi-instrumental approach (zeta potential, ATR-FTIR, TEM, SAXS, chemical analysis, AFM).A good understanding of the surfaces at stake is necessary to study the mechanism of polishing. Acid-basic and redox properties of the CeO2 surface were therefore investigated. Finally, the surface chemistry of the abrasive particles were modified (synthesis of core-shell particles and solid solutions), and different ceria morphologies were tested
Ostermann, Elodie. "Etude la croissance dendritique du cuivre dans l'acide oxalique : application au procédé de nettoyage post-CMP en microélectronique". Paris 6, 2005. https://tel.archives-ouvertes.fr/tel-01591863.
Morissette, Jean-François. "Fabrication par lithographie hybride et procédé damascène de transistors monoélectroniques à grille auto-alignée". Mémoire, Université de Sherbrooke, 2010. http://savoirs.usherbrooke.ca/handle/11143/1573.
Dubois, Christelle. "Evaluation des performances isolantes de couches de SIOCH poreuses et de polymères destinés aux technologies d'intégration innovantes". Phd thesis, Université de Grenoble, 2011. http://tel.archives-ouvertes.fr/tel-00625490.
Henault, Bastien. "Identification des processus physico-chimiques à l’origine des défauts locaux des surfaces polies optique et superpolies". Thesis, Université Clermont Auvergne (2017-2020), 2018. http://www.theses.fr/2018CLFAC090.
This PhD work focuses on the study of the physicochemical mechanisms involved in the chemical-mechanical polishing of Zerodur® (glass-ceramics) with an abrasive based on cerium oxides. The defects observed after polishing were characterized by optical microscopy and atomic force microscopy (AFM). Two main populations were observed, namely "fine" (longitudinal and continuous stripes) caused by debris of polished material. The second is called "scratch" (perpendicular fractures) caused by abrasive agglomerates. RX spectroscopic analyzes of the abrasive showed an increase in the Ce3+/ Ce4+ ratio after the polishing phase. This point confirms the chemical part of Zerodur® polishing. Zeta potential analyzes were carried out on these same abrasives and show an evolution of the abrasive surface charge. AFM observations show that the higher the Ce4+ concentration, the better the final polished surface quality. The polished surface was also probed with ToF-SIMS analyzes. This shows the presence of a cerium-enriched layer of several tens of nanometers, which may be a site for the chemical-mechanical polishing reaction. More precisely, this reaction seems to take place in the glassy phase of Zerodur®