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Littérature scientifique sur le sujet « Ald »

Auteur : Grafiati
Publié le 4 juin 2021
Mis à jour le 28 juin 2025

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Articles de revues sur le sujet "Ald"

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Zhou, Yi, Guandou Yuan, Fudi Zhong, and Songqing He. "Roles of the complement system in alcohol-induced liver disease." Clinical and Molecular Hepatology 26, no. 4 (2020): 677–85. http://dx.doi.org/10.3350/cmh.2020.0094.

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Alcohol-induced liver disease (ALD) is a complex disorder, with a disease spectrum ranging from steatosis to steatohepatitis, cirrhosis, and hepatocellular carcinoma. Although the pathogenesis of ALD is incompletely understood and currently no effective drugs are available for ALD, several lines of evidence suggest that complement activation and oxidative stress play crucial roles in the pathogenesis of ALD. Complement activation can regulate the production of ROS and influence oxidative stress in ALD. Precise regulation of the complement system in ALD may be a rational and novel avenue to postpone and even reverse the progression of disease and simultaneously promote the repair of liver injury. In this mini-review, we briefly summarize the recent research progress, especially focusing on the role of complement and oxidative stress-induced transfer RNA-derived fragments, which might help us to better understand the pathogenesis of ALD and provide aid in the development of novel therapeutic strategies for ALD.
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Vokoun, David, Ladislav Klimša, Aliaksei Vetushka, et al. "Al2O3 and Pt Atomic Layer Deposition for Surface Modification of NiTi Shape Memory Films." Coatings 10, no. 8 (2020): 746. http://dx.doi.org/10.3390/coatings10080746.

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Pt coatings on NiTi film micro-actuators and/or sensors can add some useful properties, e.g., they may improve the NiTi anticorrosion and thermomechanical characteristics or activate surface properties beneficial for a specific application (e.g., functionalized surfaces for biomedical applications). Pt coatings prepared via atomic layer deposition (ALD) may help reduce cost due to the nanometric thickness. However, no authors have reported preparation of Pt ALD coatings on NiTi films, perhaps due to the challenge of the concurrent NiTi film oxidation during the Pt ALD process. In the present study, Al2O3 and Pt ALD coatings were applied to NiTi thin films. The ALD coating properties were studied using electron and atomic force microscopies and X-ray photoelectron spectroscopy (XPS). Potential structural changes of NiTi due to the ALD process were evaluated using electron microscopy and X-ray diffraction. The presented ALD process resulted in well-controllable preparation of Pt nanoparticles on ultrathin Al2O3 seed layer and a change of the transformation temperatures of the NiTi films.
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Schwan, Katharina, Janey Youngblom, Kara Weisiger, Jessica Kianmahd, Rebecca Waggoner, and Joanna Fanos. "Family Perspectives on Newborn Screening for X-Linked Adrenoleukodystrophy in California." International Journal of Neonatal Screening 5, no. 4 (2019): 42. http://dx.doi.org/10.3390/ijns5040042.

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X-linked adrenoleukodystrophy (ALD) is caused by gene variants in the ABCD1 gene, resulting in a varied clinical spectrum. Males with ALD present with symptoms ranging from isolated adrenal insufficiency and slowly progressive myelopathy to severe cerebral demyelination. Females who are heterozygous for ALD typically develop milder symptoms by late adulthood. Treatment for adrenal insufficiency associated with ALD exists in the form of cortisol, and cerebral ALD may be treated with stem cell transplantation. Currently, there is no treatment for myelopathy. Since 2013, at least 14 states have added ALD to their newborn screening (NBS) panel, including California in 2016. We examined the impact of a positive NBS result for ALD on families in California. Qualitative interviews were conducted with mothers of 10 children who were identified via NBS for ALD. Interviews were transcribed verbatim and analyzed using thematic analysis by two coders. Mothers felt strongly that ALD should be included on California’s NBS panel; however, many expressed concerns over their experience. Themes included stress at initial phone call, difficulty living with uncertainty, concerns regarding mental health support, and desire for more information on disease progression, treatments and clinical trials. Mothers exhibited diverse coping strategies, including relying on faith, information seeking, and maintaining hope. Mothers’ recommendations for healthcare providers included: educating providers making the initial phone call, providing patient-friendly resources, offering information about ongoing research, and streamlining care coordination. Advice for parents of children with ALD focused on staying hopeful and appreciating the time they have with their children. As more states add ALD to their NBS panel, it is important to improve the current model to promote family resiliency and autonomy.
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Hartley, David, Elena Rochtchina, Philip Newall, Maryanne Golding, and Paul Mitchell. "Use of Hearing Aids and Assistive Listening Devices in an Older Australian Population." Journal of the American Academy of Audiology 21, no. 10 (2010): 642–53. http://dx.doi.org/10.3766/jaaa.21.10.4.

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Background: Hearing loss is a common sensory impairment experienced by older persons. Evidence shows that the use of hearing aids and/or assistive listening devices (ALDs) can benefit those with a hearing loss but that historically the uptake and use of these technologies has remained relatively low compared with the number of people who report a hearing loss. Purpose: The aim of this study was to determine the prevalence, usage, and factors associated with the use of hearing aids and ALDs in an older representative Australian population. Research Design: A population-based survey. Study Sample: A total of 2956 persons out of 3914 eligible people between the ages of 49 and 99 yr (mean age 67.4 yr), living in the Blue Mountains, west of Sydney, completed a hearing study conducted from 1997 to 2003. Data Collection and Analysis: Hearing levels were assessed using pure tone audiometry, and subjects were administered a comprehensive hearing survey by audiologists, which included questions about hearing aid and ALD usage. Logistic regression analysis was used to identify factors associated with hearing aid and ALD usage. Results: Of the surveyed population, 33% had a hearing loss as measured in the better ear. 4.4% had used an ALD in the past 12 mo, and 11% owned a hearing aid. Of current hearing aid owners, 24% never used their aids. ALD and hearing aid usage were found to be associated with increasing age, hearing loss, and self-perceived hearing disability. Conclusions: These results indicate that hearing aid ownership and ALD usage remains low in the older population. Given the significant proportion of older people who self-report and have a measured hearing loss, it is possible that more could be helped through the increased use of hearing aid and/or ALD technology. Greater efforts are needed to promote the benefits of these technologies and to support their use among older people with hearing loss.
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Young, Matthias J., Nikhila C. Paranamana, Ryan C. Gettler, Henry D. Koenig, and Xiaoqing He. "Characterization of the Local Atomic Structure of ALD Coated Interfaces." ECS Meeting Abstracts MA2022-02, no. 31 (2022): 1122. http://dx.doi.org/10.1149/ma2022-02311122mtgabs.

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To accelerate technological innovations using atomic layer deposition (ALD) coatings, we need to establish better understanding of structure-property relationships for ALD films. Historically, the ALD community has had difficulty connecting the atomic structure of ALD films with their performance, largely because of the significant challenge in determining the atomic-scale structure of ultrathin ALD films that are often amorphous, polycrystalline, or defective. In this work, we describe a series of recent efforts that collectively aim to improve understanding of the atomic structure of ALD coatings and inform structure-property understanding. These efforts employ experimental measurements including (a) inert-transfer XPS, (b) in-situ synchrotron high energy X-ray diffraction, and (c) cryogenic electron diffraction. Of particular focus in this talk is the use of X-ray and electron diffraction measurements in combination with pair distribution function (PDF) analysis and reverse Monte Carlo (RMC) structural modeling. We describe a newly developed approach employing alternating RMC and molecular statics steps (RMC-MS) that improves the physical accuracy of model structures derived from experimental diffraction data with minimal additional computational cost over conventional RMC modeling. We also describe efforts using localized cryogenic electron diffraction and PDF analysis (cryo-ePDF) with a ≤ 5 nm spot size to measure atomic structure at ALD interfaces. Together, these advances allow us to quantify differences in the atomic structure as a function of position through the depth of ALD films. A simple two-phase model comprised of bulk and interfacial layers with distinct atomic structure features is consistent with our measurements for both aluminum oxide and zinc oxide ALD coatings. The approaches we report yield atomic structure models that can be used to inform computational studies of the properties if ALD films and will aid in the selection and modification of ALD coating chemistries to address technological needs.
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Yan, Jinghe. "Dairy Product as a Preventative and Therapeutic Method in Alcohol Liver Disease." Theoretical and Natural Science 3, no. 1 (2023): 772–79. http://dx.doi.org/10.54254/2753-8818/3/20220480.

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Alcohol is one of the most prevalent global causes of chronic liver damage. Alcohol-related liver disease (ALD) is a prominent cause of liver disease related mortality, yet few treatments are now available. Important variables in the development of ALD or alcoholic liver cirrhosis include inflammation, oxidative stress, innate immunity, angiogenesis, and fibrosis. Due to biological constituents of diary product, including as lactoferrin, bioactive peptide, immunoglobulins, lactose, and vitamins, it has become a popular candidate for the treatment of ALD, since it has a number of immune-enhancing properties. This paper summarized the attributing factor, parthenogenesis, and current preventative and treatment methods for ALD to provide a comprehensive understanding of the disease. The preventive and therapeutic effects of milk, fermented milk, whey, and camel milk against ALD were then analyzed. These methods are anticipated to add the protective and therapeutic choices for alcohol-related liver damage in clinical use, either alone or in combination with other medications.
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Tsukamoto, Hide. "CYP2E1 and ALD." Hepatology 32, no. 1 (2003): 154–56. http://dx.doi.org/10.1002/hep.510320125.

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Granneman, Ernst, Pamela Fischer, Dieter Pierreux, Herbert Terhorst, and Peter Zagwijn. "Batch ALD: Characteristics, comparison with single wafer ALD, and examples." Surface and Coatings Technology 201, no. 22-23 (2007): 8899–907. http://dx.doi.org/10.1016/j.surfcoat.2007.05.009.

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Koike, Ryoko, Osamu Onodera, Hiroyuki Tabe, et al. "Partial deletions of putative adrenoleukodystrophy (ALD) gene in Japanese ALD patients." Human Mutation 6, no. 3 (1995): 263–67. http://dx.doi.org/10.1002/humu.1380060314.

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Al-Essa, Mazen, and Gursev S. Dhaunsi. "Selective receptor-mediated impairment of growth factor activity in neonatal- and X-linked adrenoleukodystrophy patients." Journal of Pediatric Endocrinology and Metabolism 32, no. 7 (2019): 733–38. http://dx.doi.org/10.1515/jpem-2018-0540.

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Abstract Background Neonatal adrenoleukodystrophy (n-ALD) and X-linked ALD (X-ALD) patients present with demyelination, poor growth and progressive mental retardation. Growth factors are known to play a vital role in the development of children. Objective To examine the mitogenic activity of various growth factors in skin fibroblasts from n-ALD and X-ALD patients. Methods Skin fibroblast cultures from n-ALD and X-ALD patients, and controls were treated with 50 ng/mL of platelet-derived growth factor (PDGF), basic fibroblast growth factor (bFGF) or insulin-like growth factor-1 (IGF-1) to examine DNA synthesis by 5-bromo-2′-deoxyuridine (BrdU) incorporation. Expression of receptors for PDGF, bFGF and IGF-1 was measured by western blotting. Serum levels of IGF-1 were assayed by enzyme-linked immunosorbent assay (ELISA). Results Fibroblasts from n-ALD and X-ALD patients had significantly (p < 0.01) less BrdU incorporation in response to fetal bovine serum (FBS). The mitogenic effect of PDGF, bFGF and IGF-1 was significantly lower in n-ALD as compared to control and X-ALD cells. X-ALD cells showed significant impairment in IGF-1-induced DNA synthesis. Expression of the FGF receptor (FGF-R) was significantly reduced in n-ALD cells. PDGF receptor remained unaffected, and IGF-1 receptor (IGF-1R) expression and serum IGF-1 levels were significantly (p < 0.01) reduced in n-ALD and X-ALD patients as compared to controls. Conclusions Growth factor activity differs in n-ALD and X-ALD patients, with marked impairment of IGF-1 function through receptor down-regulation.
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Thèses sur le sujet "Ald"

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Čech, Daniel. "Uplatnění herce ALD v praxi." Master's thesis, Akademie múzických umění v Praze. Divadelní fakulta AMU. Knihovna, 2007. http://www.nusl.cz/ntk/nusl-78601.

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Fedorenko, Viktoriia. "Atomic layer deposition on three dimensional silicon substrates for optical biosensors applications." Thesis, Montpellier, 2017. http://www.theses.fr/2017MONTT183/document.

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Ce manuscrit de thèse présente les recherches et les applications potentielles en tant que plate-forme (bio) capteur des couches minces conformes de ZnO et / ou Al2O3 / ZnO nanolaminates, déposées par dépôt de couche atomique (ALD) sur les différents substrats. Tout d'abord, une étude des propriétés optiques des films minces ZnO (20 et 50 nm) déposés par la technique ALD sur les grandes zones de nanofils de silicium ordonné (SiNW), réalisée en combinant la lithographie à la nanosphère et la gravure chimique à base de métal, a été réalisée. Ces méthodes ont permis la morphologie et le contrôle organisationnel des SiNW sur une grande surface. L'étude détaillée des propriétés structurales et optiques de l'hétérostructure SiNWs / ZnO à noyau-coquille a été réalisée en utilisant respectivement la spectroscopie XRD, SEM, de réflectance et de photoluminescence. L'intégration des tableaux SiNWs en tant que noyau et ZnO comme coque peut avoir un impact important sur le développement d'éléments de détection avec des propriétés améliorées. Dans les recherches ultérieures, des films ZnO formés par ALD en tant que plate-forme de biocapteur optique pour la détection des protéines de type A du virus Grapevine (antigènes GVA) ont été représentés. La détection de l'antigène GVA a été effectuée en utilisant les changements dans le comportement de la bande PL liée à la GVA. La sélectivité du biocapteur a été prouvée. La possibilité de détecter les antigènes GVA sans étiquettes supplémentaires a été démontrée. Ainsi, on a développé un biosensor à base de photoluminescence à base de photoluminescence libre pour les antigènes GVA. Une autre partie de notre étude est un contrôle spécifique de l'ancrage des protéines par le développement d'une surface multifonctionnelle avec une grande gamme de sphères de polystyrène (PSS), produite par la lithographie de nanosphère et bloquant davantage l'adsorption non spécifique des protéines à la surface du PSS par SAM de PEG. La microscopie d'épifluorescence a été utilisée pour confirmer qu'après l'immersion de l'échantillon sur la protéine cible (avidine et anti-avidine), ces dernières sont spécifiquement situées sur une sphère de polystyrène. Ces résultats sont significatifs pour l'exploration de dispositifs basés sur un nanoarray à grande échelle de sphères de PS et peuvent être utilisés pour la détection de protéines cibles ou simplement pour structurer une surface avec des protéines spécifiques. Notre recherche comprend également l'ajustement des propriétés structurelles et l'amélioration des propriétés électroniques et optiques des nanolaminés 1D PAN ZnO / Al2O3 conçus par dépôt de couche atomique (ALD) et électrospinning. Les propriétés structurelles et optiques de Al2O3 / ZnO déterminées à partir des analyses XPS, TEM, FTIR, XRD et PL. L'amélioration des propriétés électroniques et optiques permettrait l'application dans différents domaines de tels capteurs et biosensors<br>This thesis manuscript presents the investigations and potential applications as a (bio)sensor platform of the conform thin layers of ZnO and/or Al2O3/ZnO nanolaminates, deposited by atomic layer deposition (ALD) on the various substrates. First, a study of the optical properties of ZnO thin films (20 and 50 nm) deposited by ALD technique on the large areas of ordered silicon nanowires (SiNWs), produced by combining nanosphere lithography and metal-assisted chemical etching, was performed. These methods allowed the morphology and the organization control of SiNWs on a large area. The detailed study of structural and optical properties of core-shell SiNWs/ZnO heterostructure was done by utilizing XRD, SEM, reflectance and photoluminescence spectroscopy, respectively. Integration of SiNWs arrays as core and ZnO as shell can have a strong impact on the development of sensing elements with improved properties. In the further investigations, ZnO films formed by ALD as an optical biosensor platform for the detection of Grapevine virus A-type proteins (GVA-antigens) were represented. The GVA-antigen detection was performed using the changes in the GVA related PL band behavior. The biosensor selectivity has been proved. The possibility to detect GVA-antigens without additional labels has been demonstrated. Thus, label free and sensitive photoluminescence based biosensor for GVA-antigens has been developed. Another part of our study is a specific control of protein anchoring by the development of multifunctional surface with large-scale array of polystyrene spheres (PSS), which produced by nanosphere lithography and further blocking the unspecific adsorption of protein on the surface of the PSS by PEG SAMs. The epifluorescence microscopy was used to confirm that after immersion of sample on target protein (avidin and anti-avidin) solution, the latter are specifically located on polystyrene sphere. These results are meaningful for exploration of devices based on large-scale nanoarray of PS spheres and can be used for detection of target proteins or simply to pattern a surface with specific proteins. Our research also includes the tuning of structural properties and the enhancement of electronic and optical properties of 1D PAN ZnO/Al2O3 nanolaminates designed by atomic layer deposition (ALD) and electrospinning. The structural and optical properties of Al2O3/ ZnO determined from the XPS, TEM, FTIR, XRD and PL analysis. The enhancement of electronic and optical properties would allow application in different fields such sensors and biosensors
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Jäckel, Linda. "Transiente Simulation zur Optimierung von ALD-Prozessen." Bachelor's thesis, Technische Universitaet Bergakademie Freiberg Universitaetsbibliothek "Georgius Agricola", 2014. http://nbn-resolving.de/urn:nbn:de:bsz:105-qucosa-129523.

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Für die Beschichtung von Bauelementen im Bereich der Elektronik erlangt das Beschichtungsverfahren der Atomlagenabscheidung zunehmend an Bedeutung. Dieses Verfahren überzeugt hier durch seine Fähigkeit sehr homogene Schichten mit einer Dicke von wenigen nm auch auf Strukturen mit hohen Aspektverhältnissen zu erzeugen. Diese Arbeit beschäftigt sich mit der Atomlagenabscheidung von Aluminiumoxid unter Verwendung der Präkursoren Trimethylaluminium und Wasser. Hauptaufgabe dieser Arbeit ist die Modellierung eines experimentellen Prozessaufbaus mit kommerzieller Simulationssoftware. Anhand der Simulationsergebnisse können Aussagen zur Optimierung des ALD-Prozesses getroffen werden. Die durchgeführten Untersuchungen zeigen, dass für die Simulation eines ALD-Prozesses sehr lange Rechenzeiten erforderlich sind. Insbesondere konnte ein tieferes Verständnis der automatischen Zeitschrittweitenregulierung der Software bei transienten Simulationen gewonnen werden. Die Dauer der Spülschritte wurde durch die Simulationsergebnisse als ausreichend bestätigt. Des Weiteren kann die Verwendung der zur Anlage gehörigen Gasdusche anhand der Simulationsergebnisse nicht empfohlen werden.
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Jaffal, Moustapha. "Développement de Dépôt Sélectif Topographique 3D par combinaison de procédés PE(ALD) et ALE en microélectronique." Electronic Thesis or Diss., Université Grenoble Alpes, 2024. http://www.theses.fr/2024GRALT046.

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Au cours des dernières décennies, l’industrie des semi-conducteurs a connu une augmentation spectaculaire de la performance des circuits intégrés. La photolithographie, un procédé indispensable à la fabrication des circuits intégrés, requiert désormais une séquence d'étapes de plus en plus complexes, comprenant de nombreux traitements successifs tels que le Self-Aligned Double Patterning (SADP) et le Self-Aligned Quadruple Patterning (SAQP). Au-delà de leur complexité et de l’augmentation des coûts associés, les étapes de patterning engendrent des erreurs d’alignement (Edge Placement Error (EPE)) qui affectent le bon fonctionnement des dispositifs. L’objectif de la thèse est de développer un nouveau procédé de dépôt sélectif topographique (TSD) par une approche en super-cycle « Dépôt/Gravure ». Les avantages d’un dépôt TSD est de réaliser latéralement et directement des espaceurs sur les flancs latéraux des architectures 3D telles que les grilles des transistors CMOS à l’échelle du nanomètre. Cette nouvelle stratégie de fabrication permet tout d’abord d’envisager une réduction du nombre des étapes et d’équipements nécessaires à la structuration, limitant ainsi les EPE potentiellement induites par la photolithographie. Ainsi, elle offre la possibilité de réduire la consommation des surfaces horizontales des transistors 3D, qui est un des éléments critiques à prendre en compte lors de réalisation des espaceurs dans l’intégration des nœuds technologiques avancés. Une preuve de concept du dépôt TSD a fait l’objet de ma thèse grâce à une approche en super-cycle reposée sur l’alternance d’un procédé de dépôt conforme par PE(ALD) suivi par différents procédés de gravure plasma anisotrope dans un seul et même équipement, en utilisant les propriétés physiques et chimiques d’interactions des plasmas avec les matériaux<br>Over the past decades, the semiconductor industry has witnessed a remarkable increase in the performance of integrated circuits. Photolithography, a crucial process in the manufacturing of integrated circuits, requires an increasingly complex sequence of steps, including various successive treatments such as Self-Aligned Double Patterning (SADP) and Self-Aligned Quadruple Patterning (SAQP). Beyond their complexity and the associated cost escalation, patterning steps can result in alignment errors, known as Edge Placement Error (EPE), which can impact the proper functioning of devices such as transistors. The objective of this thesis is to develop a novel topographical selective deposition (TSD) process using a "Deposition/Etching" super-cycle approach. The advantages of this TSD process include the lateral and direct formation of spacers on the sidewalls of 3D architectures, such as CMOS transistor gates at the nanoscale. This innovative manufacturing approach paves the way for reducing the number of steps and equipment required in the fabrication process, minimizing the potential EPE introduced by photolithography. Consequently, it offers the opportunity to reduce the consumption of horizontal surfaces in 3D transistors, a critical factor in the integration of advanced technological nodes during spacer creation. This work offers a proof of concept of the TSD deposition, using a super-cycle approach that alternates between a conformal deposition process by PE(ALD) and various anisotropic plasma etching processes in the same tool. This approach leverages the physical and chemical properties of plasma interactions with materials
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Masse, de la Huerta César Arturo. "Développement de la technique dépôt par couche atomique spatiale (SALD) pour la fabrication de couches minces type P d'oxyde de cuivre (I) conductrices." Thesis, Université Grenoble Alpes (ComUE), 2019. http://www.theses.fr/2019GREAI067.

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Pour concevoir avec succès l'instrumentation nécessaire aux nouvelles technologies de fabrication avec une précision nanométrique, la méthodologie de conception doit prendre en compte de nombreux sujets différents liés à la chimie, à la physique, à la mécanique, à l'électronique et à l'automatisation, travaillant ensemble pour atteindre l'objectif souhaité. Dans cette thèse, cette méthodologie de conception a été mise en œuvre avec un grand nombre d’outils et d’approches permettant d’optimiser avec succès une méthode de nanofabrication appelée dépôt par couche atomique spatiale (SALD) afin de déposer des couches minces d’un matériau potentiellement utile en tant que composant du dispositifs à énergie solaire non-silicium, séparateurs d’eau photoélectrochimiques et composants électroniques transparents à couche mince, entre autres: oxyde cuivreux (Cu2O).En ce qui concerne la technologie de fabrication et la conception mécatronique, SALD est une technique de fabrication prometteuse qui permet la fabrication de films minces avec une précision nanométrique et avec la capacité de contrôler leurs propriétés mécaniques, électriques et cristallographiques. De plus, l'approche SALD utilisée dans cette thèse et dans le Laboratoire des matériaux et du génie physique (LMGP) fonctionne à l'air libre (sans chambre de dépôt) et constitue donc potentiellement une approche compatible avec l'industrie pour les films minces homogènes de grande surface fabrication avec un débit élevé. De plus, SALD peut être utilisé dans des conditions qui le rendent compatible avec les substrats flexibles et avec les approches de rouleau à rouleau (R2R). Enfin, SALD offre une flexibilité sur le processus de dépôt afin qu’il puisse être ajusté pour obtenir différentes propriétés sur les films fabriqués avec un minimum de modification de l’instrumentation.À l'aide de simulations CFD (Computational Fluid Dynamics), les phénomènes de la mécanique des fluides qui se produisent pendant le processus de dépôt dans le système SALD ont été analysés pour différentes configurations du réacteur. L'influence sur les propriétés du film a été étudiée et une validation avec des dépôts expérimentaux a été effectuée. Ensuite, en utilisant les connaissances et les directives obtenues avec les simulations CFD, et afin de réduire le coût et la complexité de la modification de certains composants mécaniques du système, un flux de travail comprenant la conception assistée par ordinateur (CAO) et la fabrication additive (également appelé impression 3D) impression) a été mis en place au LMGP pour la fabrication de l’un des composants principaux du système SALD à LMGP: la tête de dépôt. Ici, c'est la première fois qu'une telle technique de fabrication innovante est appliquée aux processus de nanofabrication en couches minces, offrant de nombreuses applications potentielles dans le domaine. Dans cette thèse, un tel flux de travail est présenté et expliqué, ainsi que les directives apprises et les limitations découvertes également présentées.Enfin, couches minces de Cu2O ont été déposé avec succès avec la méthode SALD. Le Cu2O est l’un des rares matériaux aux propriétés électroniques prometteuses en tant que semi-conducteur transparent de type p. Ici, les films de Cu2O fabriqués utilisant le système SALD à LMGP sont rapportés et leur conductivité de type p et leur cristallographie sont analysées.Les résultats de ces travaux fournissent des directives initiales pour la conception industrielle d’un système de fabrication à haut débit basé sur la technologie SALD, dans lequel la conception de ses composants est optimisée pour chaque matériau souhaité. Cette approche de conception rend également ce travail utile pour augmenter la quantité de matériaux compatibles avec le SALD, ainsi que pour développer davantage la méthodologie SALD dans des processus de fabrication innovants de matériaux et de dispositifs<br>To successfully design the instrumentation needed for new manufacturing technologies with nanoscale precision, the design methodology must take into account many different topics related to chemistry, physics, mechanics, electronics and automation, working together to achieve the desired goal. In this thesis, this design methodology has been implemented with a large number of tools and approaches to successfully optimize a nanofabrication method called spatial atomic layer deposition (SALD) in order to deposit thin films. a potentially useful material as a component of non-silicon solar energy devices, photoelectrochemical water separators and transparent thin-film electronic components, among others: cuprous oxide (Cu2O).With respect to manufacturing technology and mechatronics design, SALD is a promising manufacturing technique that enables the fabrication of thin films with nanoscale precision and the ability to control their mechanical, electrical and crystallographic properties. In addition, the SALD approach used in this thesis and in the Laboratoire des Matèriaux et du Génie Physique(LMGP) works in the open air (without a repository) and is therefore potentially an industry-compatible approach to film Thin homogeneous high-area manufacturing with high throughput. In addition, SALD can be used under conditions that make it compatible with flexible substrates and roll-to-roll approaches (R2R). Finally, SALD offers flexibility on the deposit process so that it can be adjusted to obtain different properties on films manufactured with a minimum of instrumentation modification.Using CFD (Computational Fluid Dynamics) simulations, the fluid mechanics phenomena that occur during the deposition process in the SALD system were analyzed for different reactor configurations. The influence on the properties of the film was studied and a validation with experimental deposits was carried out. Then, using the knowledge and guidance obtained with CFD simulations, and to reduce the cost and complexity of modifying certain mechanical components of the system, a workflow that includes computer-aided design (CAD) and manufacturing additive (also called 3D printing) printing) was set up at the LMGP for the manufacture of one of the main components of the LMGP SALD system: the deposit head. Here, it is the first time that such an innovative manufacturing technique has been applied to thin-film nanofabrication processes, offering many potential applications in the field. In this thesis, such a workflow is presented and explained, along with learned guidelines and discovered limitations also presented.Finally, thin layers of Cu2O have been successfully deposited with the SALD method. Cu2O is one of the few materials with promising electronic properties as a p-type transparent semiconductor. Here, Cu2O films made using the LMGP SALD system are reported and their p-type conductivity and crystallography are analyzed.The results of this work provide initial guidance for the industrial design of a high throughput manufacturing system based on SALD technology optimized for each desired material. This design approach also makes this work useful for increasing the amount of SALD compatible materials, as well as for further developing the SALD methodology in innovative materials and device manufacturing processes
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Schuisky, Mikael. "CVD and ALD in the Bi-Ti-O system." Doctoral thesis, Uppsala University, Department of Chemistry, 2000. http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-552.

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<p>Bismuth titanate Bi<sub>4</sub>Ti<sub>3</sub>O<sub>12</sub>, is one of the bismuth based layered ferroelectric materials that is a candidate for replacing the lead based ferroelectric materials in for instance non-volatile ferroelectric random access memories (FRAM). This is due to the fact that the bismuth based ferroelectrics consists of pseudo perovskite units sandwiched in between bismuth oxide layers, which gives them a better fatigue nature.</p><p>In this thesis thin films of Bi<sub>4</sub>Ti<sub>3</sub>O<sub>12 </sub>have been deposited by chemical vapour deposition (CVD) using the metal iodides, BiI<sub>3</sub> and TiI<sub>4</sub> as precursors. Films grown on MgO(001) substrates were found to grow epitaxially. The electrical properties were determined for films grown on Pt-coated silicon and good properties such as a high dielectric constant (ε) of 200, low <i>tan</i> δ of 0.018, a remnant polarisation (<i>P</i><sub>r</sub>) of 5.3 μC/cm<sup>2</sup> and coercive field (E<sub>c</sub>) as high as 150 kV/cm were obtained. Thin films in the Bi-Ti-O system were also deposited by atomic layer deposition (ALD) using metalorganic precursors.</p><p>In addition to the ternary bismuth titanates, films in the binary oxide systems <i>i.e.</i> bismuth oxides and titanium oxides were deposited. Epitaxial TiO<sub>2</sub> films were deposited both by CVD and ALD using TiI<sub>4</sub> as precursor. The rutile films deposited by ALD were found to grow epitaxially down to a temperature of at least 375 ¢ªC on α-A1<sub>2</sub>O<sub>3</sub>(0 1 2) substrates. The TiO<sub>2</sub> ALD process was also studied <i>in-situ</i> by QCM. Different bismuth oxides were deposited by halide-CVD using BiI<sub>3</sub> as precursor on MgO(0 0 1) and SrTiO<sub>3</sub>(0 0 1) substrates and the results were summarised in an experimental CVD stability diagram. The Bi<sub>2</sub>O<sub>2.33</sub> phase was found to grow epitaxially on both substrates.</p>
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Rooth, Mårten. "Metal Oxide Thin Films and Nanostructures Made by ALD." Doctoral thesis, Uppsala University, Department of Materials Chemistry, 2008. http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-8898.

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<p>Thin films of cobalt oxide, iron oxide and niobium oxide, and nanostructured thin films of iron oxide, titanium oxide and multilayered iron oxide/titanium oxide have been deposited by Atomic Layer Deposition (ALD). The metal oxides were grown using the precursor combinations CoI2/O2, Fe(Cp)2/O2, NbI5/O2 and TiI4/H2O. The samples were analysed primarily with respect to phase content, morphology and growth characteristics.</p><p>Thin films deposited on Si (100) were found to be amorphous or polycrystalline, depending on deposition temperature and the oxide deposited; cobalt oxide was also deposited on MgO (100), where it was found to grow epitaxially with orientation (001)[100]Co3O4||(001)[100]MgO. As expected, the polycrystalline films were rougher than the amorphous or the epitaxial films. The deposition processes showed properties characteristic of self-limiting ALD growth; all processes were found to have a deposition temperature independent growth region. The deposited films contained zero or only small amounts of precursor residues.</p><p>The nanostructured films were grown using anodic aluminium oxide (AAO) or carbon nanosheets as templates. Nanotubes could be manufactured by depositing a thin film which covers the pore walls of the AAO template uniformly; free-standing nanotubes retaining the structure of the template could be fabricated by removing the template. Multilayered nanotubes could be obtained by depositing multiple layers of titanium dioxide and iron oxide in the pores of the AAO template. Carbon nanosheets were used to make titanium dioxide nanosheets with a conducting graphite backbone. The nucleation of the deposited titanium dioxide could be controlled by acid treatment of the carbon nanosheets.</p>
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Perkins, Charles Michael. "Materials and electrical properties of ALD ZrO₂ gate dielectrics /." May be available electronically:, 2007. http://proquest.umi.com/login?COPT=REJTPTU1MTUmSU5UPTAmVkVSPTI=&clientId=12498.

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GIOVINAZZO, CECILIA. "Resistive switching in ALD metal-oxides with engineered interfaces." Doctoral thesis, Politecnico di Torino, 2019. http://hdl.handle.net/11583/2727227.

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Asheuer, Muriel. "Physiopathogénie et thérapie génique de l'adrénoleucodystrophie liée à l'X (ALD)." Paris 5, 2005. http://www.theses.fr/2005PA05D036.

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L'ALD est une maladie génétique caractérisée par une démyélinisation du SNC et une insuffisance surrénale. Elle présente une importante variabilité phénotypique. Aucune corrélation génotype/phénotype n'a pu être établie suggérant l'intervention de gènes modificateurs. La première partie de cette thèse a permis l'identification des gènes ABCD4 et BG1 jouant un rôle dans la sévérité de la maladie. La deuxième partie de ce travail a permis de montrer que l'expression restreinte du gène ABCD1 dans les oligodendrocytes permettait une correction des concentrations d'AGTLC dans le cerveau et la moelle de la souris ALD. Le manque de donneurs et les complications liées à la greffe de moelle osseuse allogénique ont conduit à développer une stratégie thérapeutique alternative, la greffe autologue de CSH génétiquement modifiées. Ce travail a permis de montrer la capacité des CD34+ transduites par un vecteur lentiviral avec l'ADNc ABCD1 à exprimer une protéine ALD fonctionnelle dans le SNC<br>X-ALD is a neurodegenerative disorder caracterized by CNS demyelinization and adrenal deficiency. X-ALD presents a marked phenotypic variability. No genotype-phenotype coorelation has been established which suggets the intervention of modifier genes. The first part of this thesis allowed to identify ABCD4 and BG1 genes playing a role in the severity of the disease. The second part of this work allowed to show that restricted expression of ABCD1 gene in oligodendrocytes corrects VLCFA levels in the brain and spinal cord of the ALD mouse. The lack of donors and complications linked to allogeneic bone marrow transplantation prompted to develop an alternative therapeutic strategy, the autologous transplantation of genetically modified hematopoïetic stem cells. This work allowed to demonstrate the capacity of human CD34+ cells transduced with a lentiviral vector expressing the ABCD1 gene to migrate in the SNC, differantiate into microglia and express a functional recombinant ALD protein
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Livres sur le sujet "Ald"

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Borel, Janet. ALD/AMN diet cookbook. Kennedy Institute, 1990.

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Holm, Sven. K ald mig Liva: En fernsyns-roman. Aschehoug, 1993.

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Fischer, Roland A. Precursor chemistry of advanced materials: CVD, ALD and nanoparticles. Springer, 2010.

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Métis, ed. Jos. Ald. Ouimet, ecr., M.P. et Louis Davis Riel. s.n., 1986.

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A, Fischer Roland, ed. Precursor chemistry of advanced materials: CVD, ALD and nanoparticles. Springer, 2005.

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Dodds, Nigel. Statement from DUP Secretary Ald. Nigel Dodds: [proposing the resolution on Europe at the DUP conference]. UDUP, 1993.

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Association, British Paramedic, and Royal National Lifeboat Association, eds. First aid, CPR, and AED. Jones and Bartlett, 2009.

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American Academy of Orthopaedic Surgeons., ed. First aid, CPR, and AED. 4th ed. Jones and Bartlett, 2005.

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L, Thygerson Alton, Thygerson Alton L, and American College of Emergency Physicians., eds. First aid, CPR, and AED. 5th ed. Jones and Bartlett Publishers, 2006.

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Benjamin, Gulli, Krohmer Jon R, American Academy of Orthopaedic Surgeons., and American College of Emergency Physicians., eds. First aid, CPR, and AED. 5th ed. Jones and Bartlett Publishers, 2007.

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Chapitres de livres sur le sujet "Ald"

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Aliano, Antonio, Giancarlo Cicero, Hossein Nili, et al. "ALD." In Encyclopedia of Nanotechnology. Springer Netherlands, 2012. http://dx.doi.org/10.1007/978-90-481-9751-4_100021.

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Scharnagl, Hubert, Winfried März, Markus Böhm, et al. "ALD." In Encyclopedia of Molecular Mechanisms of Disease. Springer Berlin Heidelberg, 2009. http://dx.doi.org/10.1007/978-3-540-29676-8_8438.

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Elliott, Simon D. "ALD Simulations." In Atomic Layer Deposition for Semiconductors. Springer US, 2013. http://dx.doi.org/10.1007/978-1-4614-8054-9_3.

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Chu, Schbuert. "ALD Machines." In Atomic Layer Deposition for Semiconductors. Springer US, 2013. http://dx.doi.org/10.1007/978-1-4614-8054-9_9.

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Kaga, Makiko. "Adrenoleukodystrophy (ALD)." In Modern Otology and Neurotology. Springer Singapore, 2021. http://dx.doi.org/10.1007/978-981-10-1479-6_8.

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Lackner, Carolin. "Alkoholische Lebererkrankungen (ALD)." In Pathologie. Springer Berlin Heidelberg, 2020. http://dx.doi.org/10.1007/978-3-642-04557-8_6.

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Panda, Sovan Kumar, and Hyunjung Shin. "Step Coverage in ALD." In Atomic Layer Deposition of Nanostructured Materials. Wiley-VCH Verlag GmbH & Co. KGaA, 2012. http://dx.doi.org/10.1002/9783527639915.ch2.

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Putkonen, Matti. "Precursors for ALD Processes." In Atomic Layer Deposition of Nanostructured Materials. Wiley-VCH Verlag GmbH & Co. KGaA, 2012. http://dx.doi.org/10.1002/9783527639915.ch3.

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Rodriguez, Cesar Augusto Duarte, and Germano Tremiliosi-Filho. "Atomic Layer Deposition (ALD)." In Encyclopedia of Tribology. Springer US, 2013. http://dx.doi.org/10.1007/978-0-387-92897-5_1166.

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Martinson, Alex. "ALD for Light Absorption." In Atomic Layer Deposition in Energy Conversion Applications. Wiley-VCH Verlag GmbH & Co. KGaA, 2017. http://dx.doi.org/10.1002/9783527694822.ch3.

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Actes de conférences sur le sujet "Ald"

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Kim, Sung-Hun, Kaito Hikake, Zhuo Li, Takuya Saraya, Toshiro Hiramoto, and Masaharu Kobayashi. "A Nanosheet Oxide Semiconductor FET Using ALD InZnOx Channel." In 2024 IEEE Silicon Nanoelectronics Workshop (SNW). IEEE, 2024. http://dx.doi.org/10.1109/snw63608.2024.10639206.

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Quinlan, Jason J., Ahmed H. Zahran, and Cormac J. Sreenan. "ALD." In the 4th ACM Multimedia Systems Conference. ACM Press, 2013. http://dx.doi.org/10.1145/2483977.2484003.

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Hore, Kate. "ALD and ALE for Quantum Sensors." In 66th Society of Vacuum Coaters Annual Technical Conference. Society of Vacuum Coaters, 2023. http://dx.doi.org/10.14332/svc23.proc.0057.

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Yoneoka, S., M. Liger, G. Yama, et al. "ALD-metal uncooled bolometer." In 2011 IEEE 24th International Conference on Micro Electro Mechanical Systems (MEMS). IEEE, 2011. http://dx.doi.org/10.1109/memsys.2011.5734515.

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Brown, J. J., N. C. Moore, O. D. Supekar, and V. M. Bright. "ULTRATHIN LOUDSPEAKERS FROM ALD." In 2016 Solid-State, Actuators, and Microsystems Workshop. Transducer Research Foundation, 2016. http://dx.doi.org/10.31438/trf.hh2016.9.

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Häyrinen, Markus, Arijit Bera, Matthieu Roussey, Markku Kuittinen, and Seppo Honkanen. "ALD-tuned titanium dioxide nanophotonics." In SPIE Microtechnologies, edited by Ion M. Tiginyanu. SPIE, 2015. http://dx.doi.org/10.1117/12.2178132.

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Li, Z., Z. Wu, P. Liao, et al. "ALD of in-doped ZnO." In 2016 IEEE 43rd Photovoltaic Specialists Conference (PVSC). IEEE, 2016. http://dx.doi.org/10.1109/pvsc.2016.7749863.

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Hamel, Cole, Stefan Cwik, Melvin Aviles, et al. "ALD-GCA-MCPs: Lifetime Performance." In UV, X-Ray, and Gamma-Ray Space Instrumentation for Astronomy XXIII, edited by Oswald H. Siegmund and Keri Hoadley. SPIE, 2023. http://dx.doi.org/10.1117/12.2676980.

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Purniawan, A., P. J. French, G. Pandraud, Y. Huang, and P. M. Sarro. "All ALD TiO2-Al2O3-TiO2 horizontal slot waveguides for optical sensing." In 2011 IEEE Sensors. IEEE, 2011. http://dx.doi.org/10.1109/icsens.2011.6127051.

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Knoops, Harm. "ALD, ALE and 2D Materials: Atomic Scale Processing for Optoelectronics Applications." In Asia Communications and Photonics Conference. OSA, 2017. http://dx.doi.org/10.1364/acpc.2017.s3j.6.

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Rapports d'organisations sur le sujet "Ald"

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Checchin, Mattia. Versatile CVD/ALD system. Office of Scientific and Technical Information (OSTI), 2020. http://dx.doi.org/10.2172/1615354.

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Veilleux, Richard E., Jossi Hillel, A. Raymond Miller, and David Levy. Molecular Analysis by SSR of Genes Associated with Alkaloid Synthesis in a Segregating Monoploid Potato Family. United States Department of Agriculture, 1994. http://dx.doi.org/10.32747/1994.7570550.bard.

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More than 15,000 anthers of an interspecific hybrid (CP2) between two diploid (2n=2x=24) potato species, Solanum chacoense (weedy) and S. phureja (cultivated), were cultured to generate a family of monoploid (haploid, 2n-1x=12) plants. Of 260 regenerated plants, 34 were monoploid, 210 diploid and 16 tetraploid. SSR analysis revealed that six monoploids were genetically identical and 14 diploids were homozygous, thus limiting the population to 42 (28 monoploids and 14 homozygous diploids). New microsatellite loci were developed for potato from database sequences (15), a conventional genomic library (6), an enriched library (18) and tomato (11). Of these, 13 were polymorphic in the CP2 family and 11 were used to study genetic segregatin. Four of 11 exhibited skewed segregation in the monoploid family. Seven of 18 microsatellite markers were polymorphic and informative on a set of 12 tetraploid potato cultivars. Acetylleptinidine (ALD) is the aglycone of leptines, a natural defense against insects, especially the highly destructuve Colorado potato beetle. ALD is absend in S. phureja but highly expressed in the S. chacoense parent of CP2. A backcross population between CP2 and tis S. phureja parent was used to examine segregation for ALD. Bulks of 10 backcross individuals that expressed ALD and 10 that did not were used to identify putative RAPD markers associatd with the trait. Of 80 primers tested, one putative marker amplified by OPQ02 was present in eight of ten individuals comprising the high bulk and absent in all 10 individuals comprising the low bulk. This is a putative marker for ALD expression in potato.
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Holland, M. K. Applicability of International and DOE Target Values to ALD Destructive Measurement Applications. Office of Scientific and Technical Information (OSTI), 2002. http://dx.doi.org/10.2172/806914.

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Gorte, Raymond. Cost-effective Stabilization of Nanostructured Cathodes by Atomic Layer Deposition (ALD). Office of Scientific and Technical Information (OSTI), 2020. http://dx.doi.org/10.2172/1600013.

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Oaks, A., Z. Mei, and A. Yacout. FY21 Progress Report on BISON Simulation Development for ALD Coated Particles. Office of Scientific and Technical Information (OSTI), 2021. http://dx.doi.org/10.2172/1823244.

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Groner, Markus. Final Report: Novel ALD-Coated Nanoparticle Anodes for Enhanced Performance Lithium-Ion Batteries. Office of Scientific and Technical Information (OSTI), 2009. http://dx.doi.org/10.2172/1105907.

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Nicholas, Jason, and Kevin Huang. Degradation & Performance Studies of ALD-Stabilized Nano-Composite SOFC Cathodes: Final Technical Report. Office of Scientific and Technical Information (OSTI), 2020. http://dx.doi.org/10.2172/1755027.

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Vohs, John, Raymond Gorte, and Steve McIntosh. Enhancing Coking Tolerance and Stability of SOFC Anodes Using Atomic Layer Deposition (ALD) of Oxide Thin Films. Office of Scientific and Technical Information (OSTI), 2021. http://dx.doi.org/10.2172/1837232.

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Bhattacharya, Sumit, Rachel Seibert, Andrew Nelson, Heather Connaway, and Abdellatif Yacout. Preliminary results from Low Pressure Steam Oxidation Testing of ALD ZrN and ZrO2 Coating Deposited over UCN Fuel Kernels. Office of Scientific and Technical Information (OSTI), 2021. http://dx.doi.org/10.2172/1807683.

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Alhasan, Ahmad, Brian Moon, Doug Steele, Hyung Lee, and Abu Sufian. Chip Seal Quality Assurance Using Percent Embedment. Illinois Center for Transportation, 2023. http://dx.doi.org/10.36501/0197-9191/23-029.

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This study investigates the use of macrotexture as an indicator of the percent embedment (PE) of aggregate in a chip seal and ultimately, as a quality assurance tool for chip seals. The study included an extensive field- and controlled-testing program from 24 chip seal sections constructed in Illinois. Surface texture measurements were acquired using a high-speed texture profiler and a stationary laser texture device. The analysis showed that stationary texture measurements were more consistent and reliable for estimating PE and characterizing chip seals in the field. Moreover, the ground truth PE values were estimated using an image analysis algorithm implemented on side-view images of cores extracted in the field. The ground truth PE values were estimated using four approaches: the average elevation method, percent embedment of each aggregate method, the peak method, and the aggregate circumference method. The analysis showed that the correlations between the different PE estimation methods are relatively weak, indicating the various methods provide different information and may relate to different characteristics. The general regression models for PE values estimated using the average elevation method and the mean profile depth (MPD) acquired using laser texture scans and the average least dimension (ALD) yielded the highest R2 value of 0.50. The model showed a consistent decreasing trend between PE and MPD estimated using laser texture scans and side-view images. Moreover, the model matched the expected behavior that PE should reach 100% as MPD reaches 0. Finally, four models were recommended correlating PE estimated using the average elevation and each aggregate methods to the MPD (mm) estimated from laser texture scans and ALD (mm) estimated from side-view images.
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