Littérature scientifique sur le sujet « CMP polishing »
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Articles de revues sur le sujet "CMP polishing":
Lou, Chun Lan, Hai Yan Di, Qiang Fang, Tao Kong, Wei Feng Yao et Zhao Zhong Zhou. « Study on Groove Shape of CMP Polishing Pad : A Review ». Advanced Materials Research 497 (avril 2012) : 278–83. http://dx.doi.org/10.4028/www.scientific.net/amr.497.278.
Liu, Zhi Xiang, Jian Guo Yao, Song Zhan Fan et Jian Xiu Su. « Study on the Preparation Technology of Fixed Abrasive Polishing Pad in Chemical Mechanical Polishing ». Applied Mechanics and Materials 602-605 (août 2014) : 485–88. http://dx.doi.org/10.4028/www.scientific.net/amm.602-605.485.
Tso, Pei Lum, Shi Guo Liu et J. C. Wang. « The Development of an Ultrasonic Head for CMP Pad Conditioning ». Advanced Materials Research 500 (avril 2012) : 275–80. http://dx.doi.org/10.4028/www.scientific.net/amr.500.275.
Son, Jungyu, et Hyunseop Lee. « Preliminary Study on Polishing SLA 3D-Printed ABS-Like Resins for Surface Roughness and Glossiness Reduction ». Micromachines 11, no 9 (8 septembre 2020) : 843. http://dx.doi.org/10.3390/mi11090843.
Zhang, Hui, Zi Feng Ni et Qing Zhong Li. « A Fine Atomization CMP Slurry for Copper ». Advanced Materials Research 279 (juillet 2011) : 271–74. http://dx.doi.org/10.4028/www.scientific.net/amr.279.271.
Zhang, Sheng Fang, Jian Xiu Su, Jia Xi Du et Ren Ke Kang. « Analysis on Contact Forms of Interface in Wafer CMP Based on Lubricating Behavior ». Materials Science Forum 704-705 (décembre 2011) : 313–17. http://dx.doi.org/10.4028/www.scientific.net/msf.704-705.313.
Sugimoto, Taku, Seiichi Suda et Koichi Kawahara. « Change in Slurry/Glass Interfacial Resistance by Chemical Mechanical Polishing ». MRS Advances 2, no 41 (2017) : 2205–10. http://dx.doi.org/10.1557/adv.2017.335.
Fang, Treliant, Ping Chung Chen et Ming Hsun Lee. « A New Permanganate-Free Slurry for GaN-SiC CMP Applications ». Materials Science Forum 1004 (juillet 2020) : 199–205. http://dx.doi.org/10.4028/www.scientific.net/msf.1004.199.
Guo, Zhi Xue, Jing Zhai, Hui Zhang et Qing Zhong Li. « The Effect of Speed Matching on the CMP Uniformity ». Advanced Materials Research 189-193 (février 2011) : 4154–57. http://dx.doi.org/10.4028/www.scientific.net/amr.189-193.4154.
Zhang, Zhu Qing, et Kang Lin Xing. « Study on 6H-SiC Crystal Substrate (0001) C Surface in FA-CMP Based on Diamond Particle ». Applied Mechanics and Materials 727-728 (janvier 2015) : 244–47. http://dx.doi.org/10.4028/www.scientific.net/amm.727-728.244.
Thèses sur le sujet "CMP polishing":
Ng, Dedy. « Nanoparticles removal in post-CMP (Chemical-Mechanical Polishing) cleaning ». Thesis, Texas A&M University, 2005. http://hdl.handle.net/1969.1/4159.
Born, Melanie P. (Melanie Providencia) 1975. « Ice and abrasive particles : an alternative CMP polishing technique ». Thesis, Massachusetts Institute of Technology, 1998. http://hdl.handle.net/1721.1/9570.
Kumar, Akhauri Prakash. « Agent based diagnostic system for the defect analysis during chemical mechanical polishing (CMP) ». Heimsheim Jost-Jetter, 2005. http://deposit.d-nb.de/cgi-bin/dokserv?idn=976561247.
Osorno, Andres. « Dynamic, In-Situ Pressure Measurements during CMP ». Thesis, Georgia Institute of Technology, 2005. http://hdl.handle.net/1853/7497.
Sampurno, Yasa. « Fundamental Consumables Characterization of Advanced Dielectric and Metal Chemical Mechanical Planarization Processes ». Diss., The University of Arizona, 2008. http://hdl.handle.net/10150/194544.
Choi, Changhoon. « Kinetic study of copper chemistry in chemical mechanical polishing (CMP) by an in-situ real time measurement technique ». [Ames, Iowa : Iowa State University], 2008.
Palla, Byron Joseph. « Mixed surfactant systems to control dispersion stability in severe environments for enhancing chemical mechanical polishing (CMP) of metal surfaces ». [Florida] : State University System of Florida, 2000. http://etd.fcla.edu/etd/uf/2000/ana6408/byronpalla.PDF.
Title from first page of PDF file. Document formatted into pages; contains xvii, 174 p.; also contains graphics. Vita. Includes bibliographical references (p. 165-173).
Zantye, Parshuram B. « Processing, Reliability And Integration Issues In Chemical Mechanical Planarization ». [Tampa, Fla.] : University of South Florida, 2005. http://purl.fcla.edu/fcla/etd/SFE0001263.
Toth, Réka. « Mécanismes physico-chimiques du polissage ». Thesis, Paris 6, 2016. http://www.theses.fr/2016PA066763.
Chemical Mechanical Polishing (CMP) consists in applying a slurry of colloidal particles onto a solid surface called substrate, through a pressure applied with a rotating polymeric pad. A silica substrate and CeO2 particles were chosen as reference system to study the mechanism of CMP. Macroscopic studies have shown the effect of the concentration and the size of abrasive particles, as well as the importance of pH and ionic strength. The mechanism was more thoroughly studied by recirculating the slurry in fixed conditions. Surface interactions between the substrate and the particles were studied thanks to a multi-instrumental approach (zeta potential, ATR-FTIR, TEM, SAXS, chemical analysis, AFM).A good understanding of the surfaces at stake is necessary to study the mechanism of polishing. Acid-basic and redox properties of the CeO2 surface were therefore investigated. Finally, the surface chemistry of the abrasive particles were modified (synthesis of core-shell particles and solid solutions), and different ceria morphologies were tested
Kumar, Akhauri Prakash [Verfasser]. « Agent based diagnostic system for the defect analysis during chemical mechanical polishing (CMP) / Universität Stuttgart, IFF, Institut für Industrielle Fertigung und Fabrikbetrieb ... Akhauri Prakash Kumar ». Heimsheim : Jost-Jetter, 2005. http://d-nb.info/976561247/34.
Livres sur le sujet "CMP polishing":
Marinescu, Ioan D., Toshiro K. Doi et Syuhei Kurokawa. Advances in CMP/polishing technologies for the manufacture of electronic devices. Oxford : Elsevier, 2012.
E, Materials Research Society Meeting Symposium. Science and technology of chemical mechanical planarization (CMP) : Symposium held April 14-16, 2009, San Francisco, California, U.S.A. Warrendale, Penn : Materials Research Society, 2010.
Texas Engineering Extension Service (TEEX) Staff. CMP (Chemical Mechanical Polishing). TEEX/Technology and Economic Development, 1998.
Advances in CMP Polishing Technologies. William Andrew, 2018.
Advances in CMP Polishing Technologies. Elsevier, 2012. http://dx.doi.org/10.1016/c2009-0-20355-2.
Babu, Suryadevara. Advances in Chemical Mechanical Planarization (CMP). Elsevier Science & Technology, 2016.
Seimitsu Kōgakkai. Puranarizēshon CMP to Sono Ōyō Gijutsu Senmon Iinkai., dir. Handōtai CMP yōgo jiten. 8e éd. Tōkyō : Ōmusha, 2008.
Seimitsu Kōgakkai. Puranarizēshon CMP to Sono Ōyō Gijutsu Senmon Iinkai., dir. Handōtai CMP yōgo jiten. 8e éd. Tōkyō : Ōmusha, 2008.
Lee, Seung-Mahn. Characterization of chemical interactions during chemical mechanical polishing (CMP) of copper. 2003.
Choi, Wonseop. Study of interfacial interaction during chemical mechanical polishing (CMP) of dielectric silicon dioxide. 2003.
Chapitres de livres sur le sujet "CMP polishing":
James, David B. « CMP Polishing Pads ». Dans Chemical-Mechanical Planarization of Semiconductor Materials, 167–213. Berlin, Heidelberg : Springer Berlin Heidelberg, 2004. http://dx.doi.org/10.1007/978-3-662-06234-0_6.
Danyluk, Steven, et Sum Huan Ng. « Chemical Mechanical Polishing (CMP) ». Dans Encyclopedia of Tribology, 366–70. Boston, MA : Springer US, 2013. http://dx.doi.org/10.1007/978-0-387-92897-5_610.
Borst, Christopher L., William N. Gill et Ronald J. Gutmann. « Chemical-Mechanical Planarization (CMP) ». Dans Chemical-Mechanical Polishing of Low Dielectric Constant Polymers and Organosilicate Glasses, 45–69. Boston, MA : Springer US, 2002. http://dx.doi.org/10.1007/978-1-4615-1165-6_3.
Borst, Christopher L., William N. Gill et Ronald J. Gutmann. « CMP of Organosilicate Glasses ». Dans Chemical-Mechanical Polishing of Low Dielectric Constant Polymers and Organosilicate Glasses, 97–118. Boston, MA : Springer US, 2002. http://dx.doi.org/10.1007/978-1-4615-1165-6_5.
Starosvetsky, D., et Y. Ein-Eli. « Electrochemical View of Copper Chemical-Mechanical Polishing (CMP) ». Dans Advanced Nanoscale ULSI Interconnects : Fundamentals and Applications, 359–78. New York, NY : Springer New York, 2009. http://dx.doi.org/10.1007/978-0-387-95868-2_24.
Borst, Christopher L., William N. Gill et Ronald J. Gutmann. « CMP of BCB and Silk Polymers ». Dans Chemical-Mechanical Polishing of Low Dielectric Constant Polymers and Organosilicate Glasses, 71–95. Boston, MA : Springer US, 2002. http://dx.doi.org/10.1007/978-1-4615-1165-6_4.
Borst, Christopher L., William N. Gill et Ronald J. Gutmann. « Low-κ CMP Model Based on Surface Kinetics ». Dans Chemical-Mechanical Polishing of Low Dielectric Constant Polymers and Organosilicate Glasses, 119–59. Boston, MA : Springer US, 2002. http://dx.doi.org/10.1007/978-1-4615-1165-6_6.
Ilie, Filip, Tiberiu Laurian et Constantin Tita. « Relating Friction and Processes Development during Chemical — Mechanical Polishing (CMP) ». Dans Advanced Tribology, 571–75. Berlin, Heidelberg : Springer Berlin Heidelberg, 2009. http://dx.doi.org/10.1007/978-3-642-03653-8_184.
Borst, Christopher L., William N. Gill et Ronald J. Gutmann. « Copper CMP Model Based Upon Fluid Mechanics and Surface Kinetics ». Dans Chemical-Mechanical Polishing of Low Dielectric Constant Polymers and Organosilicate Glasses, 161–80. Boston, MA : Springer US, 2002. http://dx.doi.org/10.1007/978-1-4615-1165-6_7.
Cheng, Jie. « Tribocorrosion Investigations of Cu/Ru Interconnect Structure During CMP ». Dans Research on Chemical Mechanical Polishing Mechanism of Novel Diffusion Barrier Ru for Cu Interconnect, 75–89. Singapore : Springer Singapore, 2017. http://dx.doi.org/10.1007/978-981-10-6165-3_4.
Actes de conférences sur le sujet "CMP polishing":
Shiu, Pei-Jiun R., et Chao-Chang A. Chen. « Effect of mechanical polishing on copper in electrochemical-mechanical polishing ». Dans 2014 International Conference on Planarization/CMP Technology (ICPT). IEEE, 2014. http://dx.doi.org/10.1109/icpt.2014.7017310.
Levert, Joseph A., et Chad S. Korach. « The Relative Friction Force Contributions of Polishing Pads and Slurries During Chemical Mechanical Polishing ». Dans World Tribology Congress III. ASMEDC, 2005. http://dx.doi.org/10.1115/wtc2005-63817.
Wan, Liew Siew, et Chong Yew Siew. « ILD CMP Polishing Pad and Disk Characterization ». Dans 2022 33rd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC). IEEE, 2022. http://dx.doi.org/10.1109/asmc54647.2022.9792492.
Hosokawa, Koichiro, Shoichiro Yoshida et Yoshiharu Ota. « The oxidant impact for Tungsten polishing ». Dans 2014 International Conference on Planarization/CMP Technology (ICPT). IEEE, 2014. http://dx.doi.org/10.1109/icpt.2014.7017301.
Takami, Shinichiro, Shogaku Ide et Makoto Tabata. « Wafer edge roll-off improvement by protective agent in polishing slurry at double side polishing process ». Dans 2014 International Conference on Planarization/CMP Technology (ICPT). IEEE, 2014. http://dx.doi.org/10.1109/icpt.2014.7017303.
Tsai, Jhy-Cherng, Yaw-Yi Shieh, Ming-Shih Tsai et Bau-Tong Dai. « Experimental Investigation on the Roles of Chemical Corrosion and Mechanical Polishing on Copper CMP ». Dans ASME 2004 International Mechanical Engineering Congress and Exposition. ASMEDC, 2004. http://dx.doi.org/10.1115/imece2004-61072.
WATANABE, J., T. INAMURA, T. BEPPU et Y. MINAMIKAWA. « CMP CHARACTERISTICS AND POLISHING MACHINE IN ILD PLANARIZATION ». Dans Proceedings of the International Symposium. WORLD SCIENTIFIC, 1997. http://dx.doi.org/10.1142/9789814317405_0011.
Yoon, Inho, Sum Huan Ng, Andres Osorno et Steven Danyluk. « Dishing and Erosion in Cu-CMP ». Dans World Tribology Congress III. ASMEDC, 2005. http://dx.doi.org/10.1115/wtc2005-63978.
Ng, Dedy, Milind Kulkarni, Hong Liang, Yeau-Ren Jeng et Pai-Yau Huang. « Nano-Particle Interaction During Chemical-Mechanical Polishing ». Dans World Tribology Congress III. ASMEDC, 2005. http://dx.doi.org/10.1115/wtc2005-63591.
Wang, Luling, Abhudaya Mishra, Benjamin Cruz et Richard Wen. « Cobalt polishing slurries for 10 nm and beyond ». Dans 2014 International Conference on Planarization/CMP Technology (ICPT). IEEE, 2014. http://dx.doi.org/10.1109/icpt.2014.7017287.