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Littérature scientifique sur le sujet « Ion bombardment »

Auteur : Grafiati

Publié le 4 juin 2021

Mis à jour le 25 juillet 2025

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Articles de revues sur le sujet "Ion bombardment"

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Lu, Rui, Guangliang Hu, Wanli Zhao, et al. "Effects of He-ion bombardment on the ferroelectric and dielectric properties of BaHf_0.17Ti_0.83O₃ films." Applied Physics Letters 121, no. 7 (2022): 072901. http://dx.doi.org/10.1063/5.0107438.

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Focused helium ion bombardment provides an effective means to modify the properties of ferroelectric materials. This work systematically investigates the effect of helium ion bombardment on the structural, ferroelectric, and dielectric properties of relaxor BaHf0.17Ti0.83O3 thin films at different bombardment doses in the range of 1 × 1012 to 7 × 1015 ions/cm2. The films show more defects and slightly expanded out-of-plane lattice parameters with an increase in dose. Despite helium ion bombardment introducing more defects and structural disorder in the system, the bombardment-induced dipole po

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Choi, Seung Kyu, Jae Min Jang, and Woo Gwang Jung. "Influence of Ion Bombardment of Sapphire on Electrical Property of GaN Layer." Solid State Phenomena 124-126 (June 2007): 615–18. http://dx.doi.org/10.4028/www.scientific.net/ssp.124-126.615.

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Ion beam bombardment of proton, He+, Ar+, Xe+ ions were made on single crystal substrate by cyclotron. The GaN epi-layer material was grown by MOCVD on ion beam bombarded substrate. After deposition of GaN epi-layer heat treatment was made in flow of N2. The RMS roughness of the substrate was increased by ion bombardment. The GaN crystal quality for substrates of ion bombardment was better than that for bare substrates. Raman spectrum analysis indicated the induced stress in the GaN epi-layer during the heat treatment. The electrical property of GaN was improved after heat treatment. It is est

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Wang, Airu, Osamu Ohashi, and N. Yamaguchi. "Effect of Argon Ion Bombardment on Diffusion Bonded Joint of Various Metals." Materials Science Forum 449-452 (March 2004): 901–4. http://dx.doi.org/10.4028/www.scientific.net/msf.449-452.901.

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Specimens of aluminum (Al), austenitic stainless steel (SUS304L), pure iron (Fe) and Oxygen-free high conductivity copper (Cu) were treated by argon ion bombardment, and then were bonded by diffusion bonding method. The effects of argon ion bombardment on diffusion-bonded joints of four kinds of metallic materials were compared from the tensile strength at real bonded area and the fractographs. The results showed that bonding temperature was lowered by argon ion bombardment treatment for four kinds of materials. The effect of argon ion bombardment on diffusion-bonded joint depended strongly on

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Gholami, Nasim, Babak Jaleh, Reza Golbedaghi, et al. "Modification of Chitosan Membranes via Methane Ion Beam." Molecules 25, no. 10 (2020): 2292. http://dx.doi.org/10.3390/molecules25102292.

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Chitosan has been used for biomedical applications in recent years, primarily because of its biocompatibility. A chitosan membrane with a 30 μm thickness was prepared and investigated for its surface modification using methane ions. Methane ions were implanted into the chitosan membrane using a Kaufman ion source; bombardment was accomplished using three accelerating voltages of ion beams—30, 55, and 80 kV. The influence of the ion bombardment on morphology, crystallinity, and hydrophilicity was investigated. Attenuated total reflectance Fourier-transform infrared (ATR-FTIR) spectroscopy analy

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Yamashita, Mutsuo. "Metal ion production by ion bombardment." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 14, no. 5 (1996): 2795–801. http://dx.doi.org/10.1116/1.580202.

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Window, B., and F. Sharples. "Effect of ion bombardment during the low-mobility growth of metallic superlattices." Journal of Materials Research 3, no. 5 (1988): 856–61. http://dx.doi.org/10.1557/jmr.1988.0856.

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The structure of sputtered Mo/Fe superlattices of periodicities 9 to 30 Å grown at a substrate temperature of 300 K at various pressures and levels of low-energy ion bombardment have been studied using x-ray diffraction. The samples show the growth of an amorphous phase below 17 Å periodicity and a crystalline phase above 21 Å, with mixed phases in between. Limited ion bombardment reduces the coherency in the growth direction in the crystalline phase, while heavy bombardment sufficient to promote significant mixing acts to improve the coherency, but not to the level observed in films with no b

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Kim, Sang-Pil, Huck Beng Chew, Eric Chason, Vivek B. Shenoy, and Kyung-Suk Kim. "Nanoscale mechanisms of surface stress and morphology evolution in FCC metals under noble-gas ion bombardments." Proceedings of the Royal Society A: Mathematical, Physical and Engineering Sciences 468, no. 2145 (2012): 2550–73. http://dx.doi.org/10.1098/rspa.2012.0042.

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Here, we uncover three new nanoplasticity mechanisms, operating in highly stressed interstitial-rich regions in face-centred-cubic (FCC) metals, which are particularly important in understanding evolution of surface stress and morphology of a FCC metal under low-energy noble-gas ion bombardments. The first mechanism is the configurational motion of self-interstitials in subsonic scattering during ion bombardments. We have derived a stability criterion of self-interstitial scattering during ion embedding, which consistently predicts the possibility of vacancy- and interstitial-rich double-layer

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Fujiwara, Yukio, and Naoaki Saito. "Negative ion beam bombardment of a protic ionic liquid: Alleviating surface charging and damage and analyzing the surface of organic insulating materials." Journal of Vacuum Science & Technology A 40, no. 5 (2022): 053203. http://dx.doi.org/10.1116/6.0001999.

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Positive ion beams are widely used in surface processing and analysis; however, serious surface charging can occur in the case of insulating materials. To address this issue, we investigate bombardment effects of ionic liquid negative ions emitted from the tip of a sharp needle wetted with the protic ionic liquid, diethylmethylammonium trifluoromethanesulfonate. Experimental results show that the potential of an electrically floating metal target bombarded with the ionic liquid negative ions is slightly higher (about 1 V) than that of a front electrode, indicating that the target potential can

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Ai, Yong Ping, Ying Ying Zeng, Li Jun Liu, Xiao Ming Huang, and Tai Ping Zhou. "Influence of Ar+ Energy of Bombardment Cu Target and Low Energy Assisted Bombardment on Cu-W Thin Film Structure by Ion Beam Sputtering." Key Engineering Materials 474-476 (April 2011): 448–53. http://dx.doi.org/10.4028/www.scientific.net/kem.474-476.448.

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This paper is to study the influence of Ar+ energy of bombardment Cu target and low energy assisted bombardment on Cu-W film structure in the preparation of Cu-W thin film by dual ion beam sputtering technique with iron as the substrate and argon as ion source. The results shown : when Ar+ energy of bombardment tungsten target is about 3keV, the beam of copper target is 20mA, Ar+ energy of bombardment Cu target is 1kev, 1.5kev and 2keV respectively, Cu-W thin film prepared by ion beam sputtering exists with the skeleton of tungsten in amorphous phase mixing with copper grains; with the increas

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Hirano, Motohisa, and Shojiro Miyake. "Tribological Improvement of Ag Films by Ion Beam Enhanced Deposition." Journal of Tribology 110, no. 1 (1988): 64–68. http://dx.doi.org/10.1115/1.3261576.

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This paper investigates the tribological properties of Ag film fabricated by ion enhanced deposition at atmospheric room temperature, whereby 150 keV Ar ion bombardment and Ag ion plating are performed simultaneously. In the absence of a lubricant, friction test apparatus employing ball-plate geometry is used. Also, properties such as film crystallinity, morphology and concentration profile are examined to study the high energy ion bombardment effect related to the film’s tribological properties. The activation of the mutual diffusion process which results from simultaneous ion bombardment dur

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Thèses sur le sujet "Ion bombardment"

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McLaren, M. G. "Ion bombardment induced deposition of tungsten." Thesis, University of Salford, 1996. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.308526.

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Samartsev, Andrey V. "Sputtering of Indium under polyatomic ion bombardment." [S.l. : s.n.], 2004. http://deposit.ddb.de/cgi-bin/dokserv?idn=976510278.

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Whitlow, Harry James. "Ion-materials interactions and their application." Thesis, University of Bath, 1998. https://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.285272.

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Kucheyev, Sergei Olegovich. "Ion-beam processes in group-III nitrides." View thesis entry in Australian Digital Theses Program, 2002. http://thesis.anu.edu.au/public/adt-ANU20030211.170915/index.html.

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Locklear, Jay Edward. "Secondary ion emission under keV carbon cluster bombardment." Diss., Texas A&M University, 2006. http://hdl.handle.net/1969.1/4273.

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Secondary ion mass spectrometry (SIMS) is a surface analysis technique capable of providing isotopic and molecular information. SIMS uses keV projectiles to impinge upon a sample resulting in secondary ion emission from nanometric dimensions. It is well documented that secondary ion emission is enhanced using cluster projectiles compared to atomic projectiles. Previous studies of enhanced secondary ion yields with cluster projectiles have led to the present study dealing with the scope of C60 as a projectile for SIMS. The secondary ion yields (i.e., the number of secondary ions detected per pr

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Zeroual, Boudjemaa. "Ion bombardment induced damage and annealing in Si." Thesis, University of Salford, 1990. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.258251.

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Yin, Jian. "Mechanism studies of fast atom bombardment mass spectrometry." Thesis, Georgia Institute of Technology, 1993. http://hdl.handle.net/1853/25987.

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Alzaim, Safa. "Studies of nanostructure fabrication and morphology development during ion bombardment as a function of bombardment angle." Thesis, Boston University, 2008. https://hdl.handle.net/2144/27575.

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Thesis (B.A.)--Boston University. University Professors Program Senior theses.<br>PLEASE NOTE: Boston University Libraries did not receive an Authorization To Manage form for this thesis. It is therefore not openly accessible, though it may be available by request. If you are the author or principal advisor of this work and would like to request open access for it, please contact us at open-help@bu.edu. Thank you.<br>In order to investigate the behavior of nanostructures during the widely-used process of ion bombardment, the mechanisms of ion bombardment on nanostructures were studied. Nanostr

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Zabeida, Oleg Vasilyevich. "Study of ion bombardment characteristics in high frequency plasmas." Thesis, National Library of Canada = Bibliothèque nationale du Canada, 2000. http://www.collectionscanada.ca/obj/s4/f2/dsk2/ftp03/NQ53549.pdf.

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SAXE, STEVEN GARY. "ION-INDUCED PROCESSES IN OPTICAL COATINGS (BOMBARDMENT, THIN FILMS)." Diss., The University of Arizona, 1985. http://hdl.handle.net/10150/188076.

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Nearly all the deficiencies of conventional vacuum evaporated coatings trace to a single physical property of condensed films: low packing density. One way to increase packing density is to bombard the growing film with ions during deposition, called ion-assisted deposition (IAD). The beginning chapters of this dissertation analyze IAD as a perturbation of the conventional vacuum evaporation process. The experimental chapters begin with an examination of the effect on moisture penetration behavior of oxygen-ion bombarding completed optical filters. Moisture adsorption and desorption is retarde

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Livres sur le sujet "Ion bombardment"

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Manenschijn, Albert. Ion bombardment and ion-assisted etching in rf discharges. Technische Universiteit Delft, 1991.

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F, Ziegler J., ed. Handbook of ion implantation technology. North-Holland, 1992.

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Anuntalabhochai, S. Ion beam bioengineering research. Nova Science Publisher's, 2011.

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Forrester, A. Theodore. Large ion beams: Fundamentals of generation and propagation. Wiley, 1988.

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Zeroual, Boudjemaa. Ion bombardment induced damage and annealing in Si. University of Salford, 1990.

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United States. National Aeronautics and Space Administration., ed. One dimensional heavy ion beam transport: Energy independent model. National Aeronautics and Space Administration], 1990.

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7

Prewett, P. D. Focused ion beams from liquid metal ion sources. Research Studies Press, 1991.

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Orloff, Jon. High resolution focused ion beams: FIB and its applications ; the physics of liquid metal ion sources and ion optics and their application to focused ion beam technology. Kluwer Academic/Plenum Publishers, 2003.

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Orloff, Jon. High Resolution Focused Ion Beams: FIB and its Applications: The Physics of Liquid Metal Ion Sources and Ion Optics and Their Application to Focused Ion Beam Technology. Springer US, 2003.

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1934-, Swanson Lynwood, and Utlaut Mark William 1949-, eds. High resolution focused ion beams: FIB and its applications : the physics of liquid metal ion sources and ion optics and their application to focused ion beam technology. Kluwer Academic/Plenum Publishers, 2003.

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Chapitres de livres sur le sujet "Ion bombardment"

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Yates, John T. "Alternate Ion Bombardment Sources." In Experimental Innovations in Surface Science. Springer New York, 1998. http://dx.doi.org/10.1007/978-1-4612-2304-7_95.

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Strazzulla, G. "Ion Bombardment: Techniques, Materials and Applications." In Experiments on Cosmic Dust Analogues. Springer Netherlands, 1988. http://dx.doi.org/10.1007/978-94-009-3033-9_8.

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Roth, J. "Physical Sputtering of Solids at Ion Bombardment." In Physics of Plasma-Wall Interactions in Controlled Fusion. Springer US, 1986. http://dx.doi.org/10.1007/978-1-4757-0067-1_8.

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Smirnov, A. B., and R. K. Savkina. "Nanostructuring Surfaces of HgCdTe by Ion Bombardment." In Springer Proceedings in Physics. Springer International Publishing, 2017. http://dx.doi.org/10.1007/978-3-319-56422-7_30.

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Cooks, R. G., B. H. Hsu, W. B. Emary, and W. K. Fife. "Surface Organic Reactions Induced by Ion Bombardment." In Springer Proceedings in Physics. Springer Berlin Heidelberg, 1986. http://dx.doi.org/10.1007/978-3-642-82718-1_6.

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Rauschenbach, Bernd. "Low-Energy Ion Beam Bombardment-Induced Nanostructures." In Low-Energy Ion Irradiation of Materials. Springer International Publishing, 2022. http://dx.doi.org/10.1007/978-3-030-97277-6_8.

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Rauschenbach, Bernd. "Evolution of Topography Under Low-Energy Ion Bombardment." In Low-Energy Ion Irradiation of Materials. Springer International Publishing, 2022. http://dx.doi.org/10.1007/978-3-030-97277-6_6.

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Miglierini, Marcel, Adriana Lančok, and Márius Pavlovič. "Ion bombardment of Fe-based amorphous metallic alloys." In ISIAME 2008. Springer Berlin Heidelberg, 2009. http://dx.doi.org/10.1007/978-3-642-01370-6_6.

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Klaumünzer, S. L. "Plastic Flow of Amorphous Materials During Ion Bombardment." In Multiscale Phenomena in Plasticity: From Experiments to Phenomenology, Modelling and Materials Engineering. Springer Netherlands, 2000. http://dx.doi.org/10.1007/978-94-011-4048-5_34.

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Kuznetsov, G. D. "Crystallization from the Gas Phase under Ion Bombardment." In Growth of Crystals. Springer US, 1988. http://dx.doi.org/10.1007/978-1-4615-7125-4_3.

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Actes de conférences sur le sujet "Ion bombardment"

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Eizner, B. A., V. I. Ivashneva, and V. I. Nikitin. "Ion Coatings Designed for Protection of Gas Turbine Engine Blades against Gas Corrosion." In CORROSION 1991. NACE International, 1991. https://doi.org/10.5006/c1991-91453.

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Abstract The results of investigation of heat-resistance under stationary and cyclic heat conditions and long-term strength of samples with vacuum electric-arc coatings (ion-plasma coating method with material generation by vacuum arc) are given. The influence of main technological parameters on heat-resistance has been studied. These coatings are shown to exceed in heat-resistance the electron-beam and plasma technology, ion bombardment, long-term strength, turbine-engine blade.

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Otabaeva, Kamola, Uchkun O. Kutliev, Obid I. Sabirov, and Aljon I. Rakhmanov. "Sputtering of Ionic Water Clusters at the Ar⁺ Ion Bombardment." In 2024 IEEE 25th International Conference of Young Professionals in Electron Devices and Materials (EDM). IEEE, 2024. http://dx.doi.org/10.1109/edm61683.2024.10615157.

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Walkup, R. E., Ph Avouris, and A. P. Ghosh. "Excited-Atom Production by Electron Bombardment of Alkali-Halides." In Microphysics of Surfaces, Beams, and Adsorbates. Optica Publishing Group, 1987. http://dx.doi.org/10.1364/msba.1987.mc4.

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Bombardment of solids by energetic beams of electrons, photons, or ions is generally accompanied by the ejection of particles from the surface. The ejected particles include ground-state neutral atoms and molecules, electronically excited atoms, and ionic species. We have performed a variety of experiments on the bombardment of alkali-halides by electron and ion beams. These experiments suggest a new mechanism for the formation of excited atoms and positive ions due to electron bombardment of alkali-halides. Additional measurements provide an interesting contrast between excited atom productio

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Pozdeyev, E., D. Kayran, V. N. Litvinenko, et al. "Ion bombardment in RF guns." In SPIN PHYSICS: 18th International Spin Physics Symposium. AIP, 2009. http://dx.doi.org/10.1063/1.3215603.

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Lehan, J. P., J. D. Targove, B. G. Bovard, M. J. Messerly, and C. C. Weng. "Intermittent ion bombardment of optical thin films." In OSA Annual Meeting. Optica Publishing Group, 1986. http://dx.doi.org/10.1364/oam.1986.mq4.

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The practical problems of using ion-assisted deposition with substrate rotation are discussed, including the role of ion energy vs total ion flux. We compare MgF2, ZrO2, and SiO2 films made conventionally and with intermittent ion bombardment in terms of optical performance and stoichiometry. Vacuum-to-air shifts of the peak wavelength are significantly reduced in narrowband filters of ZrO2/SiO2. Also discussed is the relation between which layers are bombarded and peak wavelength shift; i.e., does the entire filter need to be bombarded or just a few critical layers? We also investigated stres

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Wakamatsu, Yoshinobu, Hideaki Yamada, Satoshi Ninomiya, et al. "Biomolecular Emission by Swift Heavy Ion Bombardment." In ION IMPLANTATION TECHNOLOGY 2101: 18th International Conference on Ion Implantation Technology IIT 2010. AIP, 2011. http://dx.doi.org/10.1063/1.3548357.

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Sanabia, Jason E. "Highly Charged Ion Bombardment of Silicon Surfaces." In APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY: 17TH International Conference on the Application of Accelerators in Research and Industry. AIP, 2003. http://dx.doi.org/10.1063/1.1619781.

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MATOSSIAN, J., and J. BEATTIE. "Plasma properties in electron-bombardment ion thrusters." In 19th International Electric Propulsion Conference. American Institute of Aeronautics and Astronautics, 1987. http://dx.doi.org/10.2514/6.1987-1076.

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McNally, J. J., G. A. Al-Jumaily, and J. R. McNeil. "Ion-beam-assisted deposition of metal oxide optical thin films." In OSA Annual Meeting. Optica Publishing Group, 1985. http://dx.doi.org/10.1364/oam.1985.fl5.

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The properties of dielectric (Al2O3, Ta2O5, HfO2, and TiO2) films deposited using ion beam assisted deposition (IAD) have been examined. Previously1 we have described the importance of oxygen-ion energy and flux in applying IAD to dielectric materials and examined some of the properties of TiO2 and SiO2 films. In this work we present results illustrating ion bombardment effects on the thin film properties of Al2O3, Ta2O5, and HfO2; in particular, film stoichiometry is strongly dependent on the ion beam flux and energy, a reduction in optical scatter is observed, and higher values of refractive

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Menezes, P. V., J. Martin, M. Schafer, and K. M. Weitzel. "Bombardment induced ion transport through an ion-conducting Ca30 glass." In 2011 IEEE 14th International Symposium on Electrets ISE 14. IEEE, 2011. http://dx.doi.org/10.1109/ise.2011.6084970.

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Rapports d'organisations sur le sujet "Ion bombardment"

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Pozdeyev, E., D. Kayran, and V. Litvinenko. Cathode Ion Bombardment in RF Photoguns. Office of Scientific and Technical Information (OSTI), 2008. http://dx.doi.org/10.2172/939989.

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Pozdeyev E., D. Kayran, and V. Litvinenko. Cathode Ion Bombardment in RF Photoguns. Office of Scientific and Technical Information (OSTI), 2008. http://dx.doi.org/10.2172/1061912.

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Eklund, Elliott A., R. Bruinsma, J. Rudnick, and R. S. Williams. Submicron-Scale Surface Roughening Induced by Ion Bombardment. Defense Technical Information Center, 1991. http://dx.doi.org/10.21236/ada232151.

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Kiv, A. E., T. I. Maximova, and V. N. Soloviov. MD Simulation of the Ion-Stimulated Relaxation in Silicon Surface Layers. [б. в.], 2000. http://dx.doi.org/10.31812/0564/1278.

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Thus it was established that ion bombardment of silicon surface in the energy region of the threshold of elastic displacement of atoms might allow to improve structural characteristics of surface lavers and to decrease the relaxation time. Energy dependencies of radiation induced processes show a possibility to improve the real staicture of Silicon surface and to accelerate the long-term surface relaxation in microelectronic technology.

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Ila, Daryush, E. K. Williams, R. L. Zimmerman, P. R. Ashley, and D. B. Poker. Fabrication of Optical Channel Waveguides in the GaAs/AlGaAs System by MeV Ion Beam Bombardment. Defense Technical Information Center, 2000. http://dx.doi.org/10.21236/ada379168.

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Topper, James L., Binyamin Rubin, Cody C. Farnell, and Azer P. Yalin. Preliminary Results of Low Energy Sputter Yields of Boron Nitride due to Xenon Ion Bombardment (Preprint). Defense Technical Information Center, 2008. http://dx.doi.org/10.21236/ada484455.

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Nikzad, S., W. F. Calaway, M. J. Pellin, C. E. Young, D. M. Gruen, and T. A. Tombrello. Formation mechanism and yield of molecules ejected from ZnS, CdS, and FeS{sub 2} during ion bombardment. Office of Scientific and Technical Information (OSTI), 1994. http://dx.doi.org/10.2172/10134182.

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Manley, Michael. Creation of graphite surface defects via ion bombardment: The origin of active portals and their role in encapsulation of metal nanoparticles. Office of Scientific and Technical Information (OSTI), 2020. http://dx.doi.org/10.2172/1711426.

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Burnett, J. W., M. J. Pellin, J. E. Whitten, D. M. Gruen, and J. T. Jr Yates. Ion dose dependence of the sputtering yield: Ar{sup +}, Ne{sup +}, and Xe{sup +} bombardment of Ru(0001) and Al(111). Office of Scientific and Technical Information (OSTI), 1994. http://dx.doi.org/10.2172/10141730.

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Le Pimpec, F., R. E. Kirby, F. K. King, and M. Pivi. The Effect of Gas Ion Bombardment on the Secondary Electron Yield of TiN, TiCN and TiZrV Coatings For Suppressing Collective Electron Effects in Storage Rings. Office of Scientific and Technical Information (OSTI), 2006. http://dx.doi.org/10.2172/875817.

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