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Littérature scientifique sur le sujet « Thin film depositions »

Auteur : Grafiati

Publié le 9 mars 2023

Mis à jour le 31 juillet 2025

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Articles de revues sur le sujet "Thin film depositions"

Gadkar, Dr Gajendra Prasad. "Chemical Vapour Deposited CdO thin film for ethanol sensing." International Journal of Advanced Engineering, Management and Science 9, no. 4 (2023): 20–23. http://dx.doi.org/10.22161/ijaems.94.3.

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Herein we report the formation of cubic-phased Cadmium Oxide thin films using the aerosol-assisted chemical vapor deposition (AACVD) technique which gives high-quality, uniform thin film. The structural, morphological, and optical characterization of the deposited films was done using X-ray diffraction, SEM, TEM, UV-Vis spectroscopy, etc.The XRD analysis reports that crystallite size increases with film thickness. TEM shows particle size ~ 30 nm. SEM studies reveal an increase in surface roughness and porosity with the increase in thickness. Optical data shows band gap decreases with an increa

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Mustata, Ion, Cristian Lungu, Ionut Jepu, and Corneliu Porosnicu. "Thermionic Vacuum Discharges for Thin Film Depositions." Coatings 13, no. 9 (2023): 1500. http://dx.doi.org/10.3390/coatings13091500.

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The thermionic vacuum discharge method is very effective in that the films obtained using this technology are characterised by a very high degree of adhesion, density and purity because the deposition technique is carried out in high, very high or, if possible, in ultra-very high vacuum conditions with no gas present. When the substrate is placed in vacuum, no heat transfer particles are present, the substrate being heated only by the ion incident on the surface. This advantage recommends the TVD method for deposits on plastics or other thermally sensitive materials. Additionally, this slow he

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ILIESCU, Ciprian. "A COMPREHENSIVE REVIEW ON THIN FILM DEPOSITIONS ON PECVD REACTORS." Annals of the Academy of Romanian Scientists Series on Science and Technology of Information 14, no. 1-2 (2021): 12–24. http://dx.doi.org/10.56082/annalsarsciinfo.2021.1-2.12.

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The deposition of thin films by Plasma Enhanced Chemical Vapor Deposition (PECVD) method is a critical process in the fabrication of MEMS or semiconductor devices. The current paper presents an comprehensive overview of PECVD process. After a short description of the PECVD reactors main layers and their application such as silicon oxide, TEOS, silicon nitride, silicon oxynitride, silicon carbide, amorphous silicon, diamond like carbon are presented. The influence of the process parameters such as: chamber pressure, substrate temperature, mass flow rate, RF Power and RF Power mode on deposition

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Kuchakova, Iryna, Maria Daniela Ionita, Eusebiu-Rosini Ionita, et al. "Atmospheric Pressure Plasma Deposition of Organosilicon Thin Films by Direct Current and Radio-frequency Plasma Jets." Materials 13, no. 6 (2020): 1296. http://dx.doi.org/10.3390/ma13061296.

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Thin film deposition with atmospheric pressure plasmas is highly interesting for industrial demands and scientific interests in the field of biomaterials. However, the engineering of high-quality films by high-pressure plasmas with precise control over morphology and surface chemistry still poses a challenge. The two types of atmospheric-pressure plasma depositions of organosilicon films by the direct and indirect injection of hexamethyldisiloxane (HMDSO) precursor into a plasma region were chosen and compared in terms of the films chemical composition and morphology to address this. Although

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Gutwirth, Jan, Magdaléna Kotrla, Tomáš Halenkovič, Virginie Nazabal, and Petr Němec. "Tailoring of Multisource Deposition Conditions towards Required Chemical Composition of Thin Films." Nanomaterials 12, no. 11 (2022): 1830. http://dx.doi.org/10.3390/nano12111830.

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The model to tailor the required chemical composition of thin films fabricated via multisource deposition, exploiting basic physicochemical constants of source materials, is developed. The model is experimentally verified for the two-source depositions of chalcogenide thin films from Ga–Sb–Te system (tie-lines GaSb–GaTe and GaSb–Te). The thin films are deposited by radiofrequency magnetron sputtering using GaSb, GaTe, and Te targets. Prepared thin films are characterized by means of energy dispersive X-ray analysis coupled with a scanning electron microscope to determine the chemical compositi

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Hsieh, Chi Hua, Li Te Tsou, Sheng Hao Chen, et al. "Comparison of Characteristics of Rapid Thermal and Microwave Annealed Amorphous Silicon Thin Films Prepared by Electron Beam Evaporation and Low Pressure Chemical Vapor Deposition." Advanced Materials Research 663 (February 2013): 372–76. http://dx.doi.org/10.4028/www.scientific.net/amr.663.372.

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In this study we use chemical and physical vapor depositions to fabricate amorphous silicon (a-Si) films. We also use traditional rapid thermal annealing (RTA) and advanced microwave annealing (MWA) to activate or crystallize a-Si films and then observe their sheet resistances and crystallization. We discovered, although the cost of films fabricated by electron beam (e-beam) evaporation is relatively lower than by chemical vapor deposition (CVD), the effects of the former method are poorer whether in sheet resistance or film crystallization. In addition, only at the doping layer prepared by CV

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Singh, R., S. Kimothi, M. V. Singh, U. Rani, and A. S. Verma. "Structural and device fabrication of 2D-MoS2 thin film." Chalcogenide Letters 20, no. 8 (2023): 573–78. http://dx.doi.org/10.15251/cl.2023.208.573.

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In this research paper, we have prepared thin film of MoS2 by thermal evaporation technique and characterized it. This thin film depositions lead to amorphous thin film. To make it crystalline, thermal annealing of the film have deposited on the substrates at 800 o C for two hour under vacuum environment. X-ray diffraction data of thin film shows the poly-crystalline nature. The Atomic Force Microscopy (AFM) image of the thin film shows the crystallinity with regularly arranged grains. Furthermore, an unconventional MoS2 based FET device has been fabricated by depositing thin film of MoS2 on p

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Tuttle, B. A., and R. W. Schwartz. "Solution Deposition of Ferroelectric Thin Films." MRS Bulletin 21, no. 6 (1996): 49–54. http://dx.doi.org/10.1557/s088376940004608x.

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Solution deposition has been used by almost every electroceramic research-and-development organization throughout the world to evaluate thin films. Ferrite, high-temperature-superconductor, dielectric, and antireflection coatings are among the electroceramics for which solution deposition has had a significant impact. Lithium niobate, lithium tantalate, potassium niobate, lead scandium tantalate, lead magnesium niobate, and bismuth strontium tantalate are among the ferroelectric thin films processed by solution deposition. However, lead zir-conate titanate (PZT) thin films have received the mo

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Usha Rajalakshmi, P., and Rachel Oommen. "Structural and Optical Characterization of Chemically Deposited Cuprous Oxide (Cu₂O) Thin Film." Advanced Materials Research 678 (March 2013): 118–22. http://dx.doi.org/10.4028/www.scientific.net/amr.678.118.

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Thin films of cuprous oxide are grown on microscope glass slides by chemical bath deposition technique. Molar solutions of copper nitrate, hydrazine and TEA constituted the chemical bath. The depositions are made by optimizing the concentration of precursor solution. X-ray diffraction measurements revealed the phase formation in the oxide films. The optical characteristics of Cu2O films are analyzed by means of UV-Vis-NIR spectrophotometer. The effect of annealing on the structural and optical properties of the film is investigated. The calculated direct optical band gap of the films is in the

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Nadzari, Khairul Aizat, Muhammad Firdaus Omar, Nor Shahira Md Rudin, and Abd Khamim Ismail. "Structural Analysis of DLC Thin Film Using X-Ray Reflectivity and Raman Spectroscopy Techniques." Key Engineering Materials 908 (January 28, 2022): 543–48. http://dx.doi.org/10.4028/p-x8wahl.

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The characteristics of sputtered amorphous diamond-like carbon-containing copper (DLC: Cu films) films deposited on Si (100) substrates and Si (111) in argon gas-filled chamber using carbon target under different substrates deposition time, and RF power. The samples were deposited by RF magnetron sputtering and analyzed using Raman spectroscopy and X-ray reflectivity (XRR) methods. Different parameters of depositions were used to study the structure, thickness, roughness, and density of the samples. The Cu preliminary layer act as a catalyst to growth the DLC thin-film analyzed using XRR analy

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Thèses sur le sujet "Thin film depositions"

Imam, Mewlude. "CVD Chemistry of Organoborons for Boron-Carbon Thin Film Depositions." Doctoral thesis, Linköpings universitet, Tunnfilmsfysik, 2017. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-141548.

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Boron-carbon thin films enriched with 10B are potential neutron converting layers for 10B-based solid state neutron detectors given the good neutron absorption cross section of 10B atoms in thin films. The common neutron-transparent base material, Al (melting point 660 °C), limits the deposition temperature and the use of chlorinated precursors forming corrosive by-products such as HCl. Therefore, the organoborons triethylboron B(C2H5)3 (TEB) and trimethylboron B(CH3)3 (TMB) are evaluated as precursors for CVD of BxC films. In order to get a complete understanding of the CVD behaviour of these

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Choi, Y. J. "Very high frequency plasma enhanced chemical vapour depositions for thin film transistors." Thesis, University of Cambridge, 2005. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.597635.

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Hydrogenated amorphous silicon (a-Si:H) is increasingly being used in applications that require large-area, thin-film semiconductor. It can be deposited easily, at low temperature and low cost, on inexpensive substrates of almost any size by chemical vapour deposition methods. One of these applications of a-Si:H is the fabrication of thin-film transistors (TFTs) that are most often used in liquid crystal displays (LCDs). Plasma enhanced chemical vapour deposition (PECVD) is also called glow discharge deposition because of its visible luminosity of the plasma glow region, which is mainly the re

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CALDIROLA, STEFANO. "Characterization of a supersonic plasma source for nanostructured thin films deposition." Doctoral thesis, Università degli Studi di Milano-Bicocca, 2015. http://hdl.handle.net/10281/94564.

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The controlled growth of nanostructured thin films represents a challenging field of research which is related to many different applications of great scientific relevance. The properties of many materials can be greatly enhanced by optimizing the nanoscale assembly processes: by modelling the nanoparticles which create and assemble a film it is possible to achieve very promising results, although it requires a bottom-up approach capable of tailoring the properties with a high level of control or a complex set-up. Plasma-based synthesis processes have been widely developed and applied for an i

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Kroely, Laurent. "Process and material challenges in the high rate deposition of microcrystalline silicon thin films and solar cells by Matrix Distributed Electron Cyclotron Resonance plasma." Phd thesis, Ecole Polytechnique X, 2010. http://pastel.archives-ouvertes.fr/pastel-00550241.

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High deposition rates on large areas are industrial needs for mass production of microcrystalline silicon (μc-Si:H) solar cells. This doctoral work aims at exploring the usefulness of Matrix Distributed Electron Cyclotron Resonance (MDECR) plasmas to process the intrinsic layer of μc-Si:H p-i-n solar cells at high rates. With the high dissociation of silane achieved in MDECR plasmas, deposition rates as high as 6nm/s and 2.8nm/s have been demonstrated in our lab for amorphous and microcrystalline silicon respectively, without hydrogen dilution. This technique is also promising because it can b

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Xiao, Zhigang. "Synthesis of Functional Multilayer Coatings by Plasma Enhanced Chemical Vapor Deposition." Cincinnati, Ohio : University of Cincinnati, 2004. http://rave.ohiolink.edu/etdc/view?acc%5Fnum=ucin1081456822.

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Lau, Kenneth Ka Shun 1972. "Chemical vapor deposition of fluorocarbon films for low dielectric constant thin film applications." Thesis, Massachusetts Institute of Technology, 2000. http://hdl.handle.net/1721.1/16748.

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Thesis (Ph.D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 2000. Includes bibliographical references. This electronic version was submitted by the student author. The certified thesis is available in the Institute Archives and Special Collections. Pulsed plasma enhanced and hot filament chemical vapor deposition have produced fluorocarbon films with the potential use as low dielectric constant interconnect materials in microelectronic circuits. Solid-state nuclear magnetic resonance spectroscopy was demonstrated as a valuable film characterization tool to u

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Kim, Gwang-Soo 1975. "Multiscale modeling of thin film deposition processes." Thesis, Massachusetts Institute of Technology, 2002. http://hdl.handle.net/1721.1/29277.

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Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 2002. Includes bibliographical references. Ionized physical vapor deposition (IPVD) and electrochemical deposition (ECD) are two major thin film deposition processes in the microelectronics industry. The ion fluxes with high kinetic energies in IPVD process involve complex surface interactions that affect overall topology of the microscale features. Copper ECD process involves complex surface reactions and transport phenomena that ranges over different length scales. In this work, predictive simulation

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Garza, Ezra. "Pulsed Laser Deposition of Thin Film Heterostructures." ScholarWorks@UNO, 2011. http://scholarworks.uno.edu/td/459.

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Thin films of Strontium Ruthenate have been grown on Strontium Titanate and Lanthanum Aluminate (100) substrates by pulsed laser deposition. X-ray diffraction results show that the films grown on the Strontium Titanate are amorphous and polycrystalline on the Lanthanum Aluminate. Resistances versus temperature measurements show that the films exhibit semiconducting characteristics. In addition to the growth of Strontium Ruthenate thin films, multilayer heterostructures of Terfenol-D thin films on polycrystalline Lead Titanate thin films were grown by pulsed laser deposition. By using a novel e

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Rycroft, Ian M. "Electric, magnetic and optical properties of thin films, ultra thin films and multilayers." Thesis, University of Reading, 1996. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.318142.

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Chen, Yi. "Organic thin film transistors with mono-crystalline rubrene films by horizontal hot wall deposition." Thesis, McGill University, 2009. http://digitool.Library.McGill.CA:80/R/?func=dbin-jump-full&object_id=66699.

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As promising candidates for future low-cost and flexible display applications, organic thin film transistors (OTFTs) have attracted considerable research interests for the past two decades. Recent advances in organic semiconductor theory and organic film growth/deposition techniques have resulted in OTFTs based on single crystalline organic films with performance approaching or even exceeding the present day's dominant amorphous silicon TFT technology. In this work, efforts have been made to explore suitable methods for the fabrication of thin film transistors based on high m

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Livres sur le sujet "Thin film depositions"

A, Hopwood Jeffrey, ed. Ionized physical vapor deposition. Academic Press, 2000.

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Jaworek, Anatol. Electrospray technology for thin-film devices deposition. Nova Science, 2010.

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Konuma, Mitsuharu. Film Deposition by Plasma Techniques. Springer Berlin Heidelberg, 1992.

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Awan, Tahir Iqbal, Sumera Afsheen, and Sabah Kausar. Thin Film Deposition Techniques. Springer Nature Singapore, 2025. https://doi.org/10.1007/978-981-96-1364-9.

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Konuma, Mitsuharu. Plasma techniques for film deposition. Alpha Science International, 2005.

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Moroșanu, C. E. Thin films by chemical vapour deposition. Elsevier, 1990.

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Krishna, Seshan, ed. Handbook of thin-film deposition processes and techniques: Principles, methods, equipment, and applications. Noyes Publications, 2000.

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B, Chrisey Douglas, and Hubler G. K, eds. Pulsed laser deposition of thin films. J. Wiley, 1994.

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Sankapal, Babasaheb R., Ahmed Ennaoui, Ram B. Gupta, and Chandrakant D. Lokhande, eds. Simple Chemical Methods for Thin Film Deposition. Springer Nature Singapore, 2023. http://dx.doi.org/10.1007/978-981-99-0961-2.

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Moran, Robert. Thin layer deposition: Highlighting PVD. Business Communications Co., 2000.

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Chapitres de livres sur le sujet "Thin film depositions"

Sivaram, Srinivasan. "Thin Film Phenomena." In Chemical Vapor Deposition. Springer US, 1995. http://dx.doi.org/10.1007/978-1-4757-4751-5_2.

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Nedelcu, Nicoleta. "Vacuum Deposition." In Thin Films. Springer International Publishing, 2023. http://dx.doi.org/10.1007/978-3-031-06616-0_3.

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Awan, Tahir Iqbal, Sumera Afsheen, and Sabah Kausar. "Thin-Film Attributions." In Thin Film Deposition Techniques. Springer Nature Singapore, 2025. https://doi.org/10.1007/978-981-96-1364-9_7.

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El-Kareh, Badih. "Thin Film Deposition." In Fundamentals of Semiconductor Processing Technology. Springer US, 1995. http://dx.doi.org/10.1007/978-1-4615-2209-6_3.

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Yates, John T. "Thin Film Deposition." In Experimental Innovations in Surface Science. Springer International Publishing, 2015. http://dx.doi.org/10.1007/978-3-319-17668-0_29.

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Campedelli, Roberto, Luca Lamagna, Silvia Nicoli, and Andrea Nomellini. "Thin Film Deposition." In Silicon Sensors and Actuators. Springer International Publishing, 2022. http://dx.doi.org/10.1007/978-3-030-80135-9_3.

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Nedelcu, Nicoleta. "Deposition Methods, Classifications." In Thin Films. Springer International Publishing, 2023. http://dx.doi.org/10.1007/978-3-031-06616-0_2.

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Awan, Tahir Iqbal, Sumera Afsheen, and Sabah Kausar. "Fundamentals of Thin Film." In Thin Film Deposition Techniques. Springer Nature Singapore, 2025. https://doi.org/10.1007/978-981-96-1364-9_1.

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Angus, John C., Alberto Argoitia, Roy Gat, et al. "Chemical vapour deposition of diamond." In Thin Film Diamond. Springer Netherlands, 1994. http://dx.doi.org/10.1007/978-94-011-0725-9_1.

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Robertson, J. "Deposition of diamond-like carbon." In Thin Film Diamond. Springer Netherlands, 1994. http://dx.doi.org/10.1007/978-94-011-0725-9_9.

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Actes de conférences sur le sujet "Thin film depositions"

Yang, Yu, De Z. Shen, Jiying Zhang, et al. "Photoluminescence properties of ultrathin CdSe layer depositions in ZnSe matrix." In 4th International Conference on Thin Film Physics and Applications, edited by Junhao Chu, Pulin Liu, and Yong Chang. SPIE, 2000. http://dx.doi.org/10.1117/12.408453.

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CARP, Mihaela, Violeta DEDIU, Florian PISTRITU, Edwin A. LASZLO, and Ciprian ILIESCU. "Effective control of TEOS–PECVD thin film depositions." In 2020 International Semiconductor Conference (CAS). IEEE, 2020. http://dx.doi.org/10.1109/cas50358.2020.9268003.

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Xu, Zhigang, Corydon Hilton, Bobby Watkins, Sergey Yarmolenko, and Jag Sankar. "Thin YSZ Electrolyte Film Depositions on Dense and Porous Substrates." In ASME 2003 International Mechanical Engineering Congress and Exposition. ASMEDC, 2003. http://dx.doi.org/10.1115/imece2003-43330.

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Yttria stabilized zirconia (YSZ) thin films have been processed on polished silicon and porous strontium-doped lanthanum manganite (LSM) substrates by liquid fuel combustion chemical vapor deposition from combustion of an aerosol jet. The aerosol jet consists of Y- and Zr- containing metalorganics dissolved in toluene and high-purity oxygen. The morphology and thickness of the deposited films have been analyzed with scanning electron microscope. On the polished silicon substrates, thin and uniform films have been obtained. The grain growth rate is of the first order of the deposition time. The

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Giambra, Dominic J., and Wyatt E. Tenhaeff. "Kinetic Study of Polystyrene Thin Film Depositions by Cationic Chemical Vapor Deposition." In Optical Interference Coatings. OSA, 2019. http://dx.doi.org/10.1364/oic.2019.md.8.

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Jones, J. G., R. R. Biggers, J. D. Busbee, D. V. Dempsey, and G. Kozlowski. "Image processing plume fluence for superconducting thin-film depositions." In Proceedings of the Second International Conference on Intelligent Processing and Manufacturing of Materials. IPMM'99 (Cat. No.99EX296). IEEE, 1999. http://dx.doi.org/10.1109/ipmm.1999.791562.

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Jones, J. G., and P. D. Jero. "Modeling gas by-products from MO-CVD thin-film depositions." In Proceedings of the Second International Conference on Intelligent Processing and Manufacturing of Materials. IPMM'99 (Cat. No.99EX296). IEEE, 1999. http://dx.doi.org/10.1109/ipmm.1999.791552.

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Uchiyama, K., D. Fukunaga, T. Fujii, and T. Shiosaki. "High quality oxide thin film depositions using a sol-gel method." In 2008 17th IEEE International Symposium on the Applications of Ferroelectrics (ISAF). IEEE, 2008. http://dx.doi.org/10.1109/isaf.2008.4693864.

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Heuer, J. P., J. P. Eblen, R. L. Hall, and W. J. Gunning. "Scale-up Considerations for Codeposited Gradient Index Optical Thin Film Filters." In Optical Interference Coatings. Optica Publishing Group, 1992. http://dx.doi.org/10.1364/oic.1992.otub4.

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Refractive index tailoring by codeposition requires addressing issues that are not present, or at least subtle, in the case of sequential layer depositions. The two issues addressed in this work are the elimination of rate sensor crosstalk and reduction of the effects of refractive index modulation due to planetary rotation.

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Takeda, Yasuhiko, Tadashi Ichikawa, Tomoyoshi Motohiro, and Hiroshi Ito. "Thin film retardation plates fabricated by oblique depositions and their applications to LiNbO3-based sensors." In Optical Engineering for Sensing and Nanotechnology (ICOSN '99), edited by Ichirou Yamaguchi. SPIE, 1999. http://dx.doi.org/10.1117/12.347709.

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Vittoe, Robert L., Tung Ho, Sudhir Shrestha, Mangilal Agarwal, and Kody Varahramyan. "All Solution-Based Fabrication of CIGS Solar Cell." In ASME 2013 International Manufacturing Science and Engineering Conference collocated with the 41st North American Manufacturing Research Conference. American Society of Mechanical Engineers, 2013. http://dx.doi.org/10.1115/msec2013-1239.

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This paper presents fabrication of copper indium gallium di-selenide (CIGS) solar cells using all solution-based deposition processes. CIGS nanoparticles were synthesized through multi-step chemical process using copper chloride, indium chloride, gallium chloride, and selenium in oleyamine. CIGS thin films were constructed through layer-by-layer (LbL) self-assembly and spray-coating techniques. Chemical-bath-deposition and spray-coating methods were used for cadmium sulfide and zinc oxide film depositions, respectively. Initial thin film solar cell devices exhibited promising 0.3 mA short circ

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Rapports d'organisations sur le sujet "Thin film depositions"

Shanks, H. R. DoD-URIP Thin Film Deposition Equipment. Defense Technical Information Center, 1986. http://dx.doi.org/10.21236/ada223421.

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Wu, Genfa. Energetic Deposition of Niobium Thin Film in Vacuum. Office of Scientific and Technical Information (OSTI), 2001. http://dx.doi.org/10.2172/915443.

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Collins, W. E., and B. Rambabu. Experimental thin film deposition and surface analysis techniques. Office of Scientific and Technical Information (OSTI), 1986. http://dx.doi.org/10.2172/5705694.

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BREILAND, WILLIAM G. Reflectance-Correcting Pyrometry in Thin Film Deposition Applications. Office of Scientific and Technical Information (OSTI), 2003. http://dx.doi.org/10.2172/820889.

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Benziger, Jay B. Surface Intermediates in Thin Film Deposition on Silicon. Defense Technical Information Center, 1989. http://dx.doi.org/10.21236/ada216662.

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Lush, Gregory D. Equipment for a Thin-Film Deposition and Characterization Laboratory. Defense Technical Information Center, 2000. http://dx.doi.org/10.21236/ada377263.

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Genin, F., B. Stuart, W. McLean, and L. Chase. Sub-picosecond laser deposition of thin films. Office of Scientific and Technical Information (OSTI), 2000. http://dx.doi.org/10.2172/15005121.

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Headrick, Randall. Fundamental Mechanisms of Roughening and Smoothing During Thin Film Deposition. Office of Scientific and Technical Information (OSTI), 2016. http://dx.doi.org/10.2172/1242492.

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Trolier-McKinstry, Susan, and Thomas R. Shrout. Crystal Growth and Thin Film Deposition of High Performance Piezoelectrics. Defense Technical Information Center, 2001. http://dx.doi.org/10.21236/ada428818.

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Fernandez, Felix E. Pulsed Laser Deposition of Thin Film Material for Nonlinear Waveguides. Defense Technical Information Center, 1994. http://dx.doi.org/10.21236/ada290789.

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