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Articoli di riviste sul tema "Metallic films"

Autore: Grafiati

Pubblicato: 4 giugno 2021

Ultima modifica: 25 luglio 2025

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1

Česnek, J., J. Dobiáš, J. Houšová, and J. Sedláček. "Properties of thin metallic films for microwave susceptors." Czech Journal of Food Sciences 21, No. 1 (2011): 34–40. http://dx.doi.org/10.17221/3475-cjfs.

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Thin Al films of varying thickness, i.e. 3 to 30 nm, were deposited onto polyethylene-terephthalate film by evaporation in the vacuum of 3 &times; 10<sup>&ndash;3</sup> Pa. The dependence of DC (direct current) surface resistance on thickness was measured using a four-point method. The surface resistance exhibits the size effect in accordance with the Fuchs-Sondheimer theory. The microwave absorption properties of the prepared films of various metallization thickness were measured in a microwave field at the microwave power of 1.8 mW. The maximum microwave absorption at 2.4

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2

Sysoiev, Yu A. "Metallic films for triggering vacuum-arc plasma sources." Functional materials 21, no. 1 (2014): 47–51. http://dx.doi.org/10.15407/fm21.01.047.

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3

Cheng, Jin, Xiao Ping Zou, Xiang Min Meng, et al. "Electrochemical Deposition of Metallic Lead Particle Film." Advanced Materials Research 123-125 (August 2010): 423–26. http://dx.doi.org/10.4028/www.scientific.net/amr.123-125.423.

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The preparation of metallic lead films by electrochemical deposition was reported. Although primary deposits at fresh state (also referred to as fresh deposits) were indeed metallic lead films, the fresh lead films could be rapidly oxidized to lead oxide in air. To obtain long stable metallic lead films, the key process is how to prevent the oxidization of fresh lead films. Our studies indicate that the washing of fresh metallic lead films in absolute alcohol is a simple but effective method to protect the lead films from the oxidization for an extended period of more than 20 days.

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4

Pardoen, Thomas, Michael Coulombier, Alexandre Boe, et al. "Ductility of Thin Metallic Films." Materials Science Forum 633-634 (November 2009): 615–35. http://dx.doi.org/10.4028/www.scientific.net/msf.633-634.615.

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Depending on the loading conditions, geometry and material characteristics, the ductility of thin metallic films is controlled either by the resistance to plastic localization or by the resistance to internal damage. New on-chip tensile tests performed on submicron aluminium films show significant strain hardening capacity leading to relatively good resistance to necking, while damage occurs through void nucleation at grain boundaries followed by their growth and coalescence. These results are discussed in the light of several other studies presented in the recent literature in order to unrave

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5

Mochizuki, Chihiro, Takashi Senga, and Masami Shibata. "Pd-Based Metallic Glass Films Formed by Electrodeposition Process." Solid State Phenomena 194 (November 2012): 183–86. http://dx.doi.org/10.4028/www.scientific.net/ssp.194.183.

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The formation of Pd-Ni-P and Pd-Ni-Cu-P metallic glass films using the electrodeposition method was examined. In this study, the structure and composition of these metallic alloys were investigated at various condition of electrodeposition. The X-ray diffraction pattern on the electrodeposited Pd-Ni-P films in the range of 18-69 at% Pd, 12-62 at% Ni and 9-21 at% P showed a broad diffraction peak, which indicates metallic amorphous structure. A result of DSC showed that the electrodeposited Pd-Ni-P films in the range of 36-57 at% Pd, 24-47 at% Ni and 16-21 at% P were metallic glasses. In additi

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6

Kalkan, N. "Influence of Metallic Indium Concentration on the Properties of Indium Oxide Thin Films." High Temperature Materials and Processes 35, no. 9 (2016): 949–54. http://dx.doi.org/10.1515/htmp-2015-0055.

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AbstractCurrent–voltage characteristics of indium-embedded indium oxide thin films (600–850 Å), with Ag electrodes approximately 1000 Å thick, prepared by reactive evaporation of pure metallic indium in partial air pressure have been studied for substrate temperatures between 50 and 125°C. The optical properties of these films have also been investigated as a function of metallic indium concentration and substrate temperature. I–V characteristics of all the samples are non-ohmic, independent of metallic indium concentration. The conductivity of the films increases but the optical transmission

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7

Tang, Wu, Xue Hui Wang, Yi Peng Chao, and Ke Wei Xu. "The Relationship between Residual Stress and Resistivity of Au/NiCr/Ta Multi-Layered Metallic Films by Magnetron Sputtering." Advanced Materials Research 150-151 (October 2010): 14–17. http://dx.doi.org/10.4028/www.scientific.net/amr.150-151.14.

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Au/NiCr/Ta multi-layered metallic films were deposited on Al2O3 substrate by magnetron sputtering at different substrate temperature. The effect of substrate temperature on magnetron sputtering Au/NiCr/Ta films in crystal orientation, residual stress and resistivity was investigated. The all magnetron sputtering films were highly textured with dominant Au-(111) orientation or a mixture of Au-(111) and Au-(200) orientation. The residual stress in magnetron sputtering films at different substrate temperature was tensile stress with 155MPa-400MPa. A smallest resistivity of 3.6µΩ.cm was obtained f

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8

Zhang, Kaiqi, Congmian Zhen, Wengang Wei, et al. "Insight into metallic behavior in epitaxial half-metallic NiCo2O4 films." RSC Advances 7, no. 57 (2017): 36026–33. http://dx.doi.org/10.1039/c7ra03136j.

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Understanding the cation distribution and electronic transport properties of half-metallic NiCo<sub>2</sub>O<sub>4</sub> (NCO) films is crucial to advancing their practical applications in optoelectronic materials.

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9

Ossi, P. M., and R. Pastorelli. "Structural stability of irradiated metallic and non-metallic films." Surface and Coatings Technology 125, no. 1-3 (2000): 61–65. http://dx.doi.org/10.1016/s0257-8972(99)00548-4.

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10

Varchenya, S. A., A. Simanovskis, and S. V. Stolyarova. "Adhesion of thin metallic films to non-metallic substrates." Thin Solid Films 164 (October 1988): 147–52. http://dx.doi.org/10.1016/0040-6090(88)90125-3.

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11

Zhang, Chun Min, Xiao Yong Liu, Lin Qing Zhang, Hong Liang Lu, Peng Fei Wang, and David Wei Zhang. "Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing." Materials Science Forum 815 (March 2015): 8–13. http://dx.doi.org/10.4028/www.scientific.net/msf.815.8.

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A novel Ru thin film formation method was proposed to deposit metallic Ru thin films on TiN substrate for future backend of line process in semiconductor technologies. RuO2 thin films were first grown on TiN substrate by oxygen plasma-enhanced atomic layer deposition technique. The deposited RuO2 thin films were then reduced into metallic Ru thin films by H2/N2-assisted annealing.

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12

Nittono, Osamu. "Thin Films and Metallic Multilayers." Materia Japan 36, no. 9 (1997): 847–50. http://dx.doi.org/10.2320/materia.36.847.

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13

Gupta, D. "Diffusion in Metallic Thin Films." Defect and Diffusion Forum 59 (January 1991): 137–50. http://dx.doi.org/10.4028/www.scientific.net/ddf.59.137.

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14

Obi, Yoshihisa, Manabu Ikebe, Hideo Nakajima, and Hiroyasu Fujimori. "Superconductivity in Metallic Multilayered Films." Materia Japan 33, no. 10 (1994): 1290–98. http://dx.doi.org/10.2320/materia.33.1290.

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15

Sajfert, Vjekoslav, Dušan Popov, Bednar Nikola, and Bratislav Tošić. "Superconductivity of Thin Metallic Films." Journal of Computational and Theoretical Nanoscience 7, no. 8 (2010): 1351–63. http://dx.doi.org/10.1166/jctn.2010.1489.

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16

Fan, Ping, Kui Yi, Jian-Da Shao, and Zheng-Xiu Fan. "Electrical transport in metallic films." Journal of Applied Physics 95, no. 5 (2004): 2527–31. http://dx.doi.org/10.1063/1.1644906.

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17

Avrekh, M., B. M. Thibadeau, O. R. Monteiro, and I. G. Brown. "Transparent, conducting, metallic thin films." Review of Scientific Instruments 70, no. 11 (1999): 4328–30. http://dx.doi.org/10.1063/1.1150075.

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18

Brotzen, F. R., C. T. Rosenmayer, C. G. Cofer, and R. J. Gale. "Creep of thin metallic films." Vacuum 41, no. 4-6 (1990): 1287–90. http://dx.doi.org/10.1016/0042-207x(90)93935-c.

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19

Ovchinnikov, Yu N. "Conductivity of granular metallic films." Journal of Experimental and Theoretical Physics 104, no. 2 (2007): 254–57. http://dx.doi.org/10.1134/s1063776107020100.

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20

Goodman, D. Wayne. "Chemistry on monolayer metallic films." Ultramicroscopy 34, no. 1-2 (1990): 1–9. http://dx.doi.org/10.1016/0304-3991(90)90050-v.

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21

Kierul, J., and J. Ledzion. "Conductivity of Thin Metallic Films." physica status solidi (a) 119, no. 2 (1990): K117—K120. http://dx.doi.org/10.1002/pssa.2211190241.

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22

Kamiko, Masao, and Ryoichi Yamamoto. "Surfactant-Mediated Epitaxial Growth of Metallic Thin Films." Advanced Materials Research 117 (June 2010): 55–61. http://dx.doi.org/10.4028/www.scientific.net/amr.117.55.

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The effects of several surfactants on the homoepitaxial and heteroepitaxial growth of metallic films and multilayers have been studied and compared. Our measurements clearly revealed that pre-deposition of a small amount of surfactant prior to the adatom deposition changed thin film growth mode and structure. The pre-deposited surfactant enhanced layer-by-layer (LBL) growth of the homoepitaxial and heteroepitaxial growth of metallic films. The surfactant also enhanced the epitaxial growth of metallic multilayer.

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23

Liang, S. H., T. L. Wang, X. Bai, and J. H. Li. "Cu-Zr-Nb Crystalline-Amorphous Composites Investigated by Thermodynamic Calculation and Ion Beam Mixing Experiments." Materials Science Forum 745-746 (February 2013): 793–98. http://dx.doi.org/10.4028/www.scientific.net/msf.745-746.793.

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The formation of Cu-Zr-Nb metallic glass was predicted by thermodynamic calculation and then five Cu-Zr-Nb ternary metallic multilayered films were designed and prepared by electron depositing. The metastable supersaturated solid solutions, amorphous phase as well as their composites were able to be obtained in these Cu-Zr-Nb metallic multilayered films upon ion beam mixing. The observations provided a clew to improve the ductibility of the metallic glasses. Some possible interpretations were presented concerning the formation of the crystalline-amorphous composite.

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24

Harada, Takayuki, and Yoshinori Okada. "Metallic delafossite thin films for unique device applications." APL Materials 10, no. 7 (2022): 070902. http://dx.doi.org/10.1063/5.0097269.

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Metallic delafossites ( ABO2) are layered oxides with quasi-two-dimensional conduction layers. Metallic delafossites are among the most conducting materials with the in-plane conductivity comparable with that of elemental metals. In this Perspective, we will discuss basic properties and future research prospects of metallic delafossites, mainly focusing on thin films and heterostructures. We exemplify the fascinating properties of these compounds, such as high conductivity and surface polarity, and discuss how it can be utilized in thin films and heterostructures.

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25

Сотский, А. Б., Е. А. Чудаков та Л. И. Сотская. "Эллипсометрия металлических пленок в условиях аномального скин-эффекта". Оптика и спектроскопия 129, № 7 (2021): 889. http://dx.doi.org/10.21883/os.2021.07.51080.1847-21.

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Inhomogeneous Fredholm’s integral equations of the second kind are formulated, which describe the fields of TE and TM polarized waves in metallic films with allowance for the anomalous skin effect. The equations are solved numerically by the quadrature method. The electric fields in gold and aluminum films located on a silicon substrate and the angular dependences of the polarization angles of light reflected from the films are investigated. It is found that the solution of the inverse problem of multi-angle ellipsometry for metallic films using the standard model of the normal skin effect is

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26

Yang, Wen Yao, Jian Hua Xu, Si Yu Wang, and Yan Chen. "The Research of Gas-Sensing and Optical Characterization of Chlorinated Metallic Porphyrin Spin-Coated Films." Key Engineering Materials 531-532 (December 2012): 58–62. http://dx.doi.org/10.4028/www.scientific.net/kem.531-532.58.

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In this text, the Chlorinated metallic porphyrin (TPPMncl and TPPFecl) thin films were fabricated by Spin-coated technique onto quartz substrates. In order to search for the gas-sensing characterization of Chlorinated metallic porphyrin Spin-coated films, the changes of UV-Visible absorption spectrums of TPPMncl and TPPFecl Spin-coated films respectively exposed in vapor of Chloroform, pyridine, Ammonia, triethylamine and dimethylamine were analyzed. The experimental results show that, the spectral response of TPPMncl and TPPFecl on organic gas molecular is obviously found. And we know that ch

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27

XUE, Z. Q., H. J. GAO, W. M. LIU, Y. W. LIU, Q. D. WU, and S. J. PANG. "STUDY OF METALLIC CLUSTERS IN ORGANIC THIN FILMS." Surface Review and Letters 03, no. 01 (1996): 1029–32. http://dx.doi.org/10.1142/s0218625x96001844.

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The polyethylene (PE) and the metallic materials are deposited alternatively on substrates in the chamber of the ICB-TOFMS deposition system. The metallic-cluster-polyethylene thin films are formed. The film thickness is about 30 nm. The structures of these samples including Au-PE, Ag-PE, In-PE, and Sn-PE thin films are studied. These special thin films with suspension metal clusters display many special properties.

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28

Chiou, W. A., and R. Mitra. "In Situ TEM Study of Straining of Free Standing Nickel Thin Films." Microscopy and Microanalysis 6, S2 (2000): 464–65. http://dx.doi.org/10.1017/s1431927600034814.

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In situ dynamic experiments in the TEM provide a powerful and unique method of investigating materials, when they are subjected to different environments or treatments. Study of plastic deformation mechanisms of free standing thin metallic films have evoked strong research interest in recent years. In the past, free standing thin metallic films have been tested in tension, where the tensile properties were measured and compared with those of bulk samples. Certain other studies dealt with metallic films attached to the substrate, where the deformation was introduced by thermal cycling or mechan

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29

KIM, Su Jae, Miyeon CHEON, and Se-Young JEONG. "Making Metallic Thin Films Atomically Flat." Physics and High Technology 29, no. 7/8 (2020): 3–12. http://dx.doi.org/10.3938/phit.29.024.

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Can we control the flatness of the surface of a thin film down to the level of individual atoms? Can we further make such an ultraflat surface on a wafer scale? For such purposes, the current deposition methods, including molecular beam epitaxy (MBE), atomic layer deposition (ALD) and conventional sputtering methods, are still not adequate. In this article, we introduce a novel thin film deposition technique developed by modifying a simple sputtering method to make atomically flat metallic surfaces and a new way to investigate the structural details of thin films grown at the atomic level. For

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30

Haerudin, Yayan Heru, M. Amirul Ghiffari, and Wisnu Bayu Pratama. "Peningkatan Yield Produksi Tipe Metalis BOPP di Perusahaan PT XQZ dengan Metode Pendekatan QCDSMPE dan 4M+1E." Wikara National Economic and Social Research Development 5, no. 1 (2024): 37–50. http://dx.doi.org/10.54010/wnesrd.v5i1.30.

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Metallic films are produced through a metalization process known as vapor deposition. This process involves coating aluminum onto a base polymer substrate, such as PET or PP, with the aim of enhancing the barrier properties of the underlying film material. Metallic films are used in various forms of packaging, including bags, caps, candy wrappers, labels, and also find applications in the electrical industry. The quality of the barrier provided by metallic films plays a crucial role in ensuring the desired shelf life of products. The high rejection rate of BOPP metallic film products is largel

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31

Ma, Xiaoqian, Huan Song, and Junfeng Yan. "Electrochemically mediated gradient metallic film generation." New Journal of Chemistry 45, no. 4 (2021): 1809–13. http://dx.doi.org/10.1039/d1nj00030f.

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32

Nguyen, Tra Anh Khoa, Nhat Minh Dang, Chi-Hang Lin, et al. "Effects of RF Magnetron Sputtering Power on the Mechanical Behavior of Zr-Cu-Based Metallic Glass Thin Films." Nanomaterials 13, no. 19 (2023): 2677. http://dx.doi.org/10.3390/nano13192677.

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Zirconium-based metallic glass films are promising materials for nanoelectronic and biomedical applications, but their mechanical behavior under different conditions is not well understood. This study investigates the effects of radio frequency (RF) power and test temperature on the nanostructure, morphology, and creep behavior of Zr55Cu30Al10Ni5 metallic glass films prepared by RF magnetron sputtering. The films were characterized by X-ray diffraction and microscopy, and their mechanical properties were measured by a bulge test system. The results show that the films were amorphous and exhibi

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33

Jovanovski, Stefan, Maja Popovic, Mirjana Novakovic, et al. "Formation of WO3 thin films from RF sputtered tungsten films by air annealing: A cost-effective approach." Science of Sintering, no. 00 (2025): 13. https://doi.org/10.2298/sos250210013j.

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WO3 thin films were prepared by RF sputtering metallic tungsten onto glass substrates, followed by thermal oxidation through annealing in air. This technique is straightforward, cost-efficient, and time-effective, achieving high deposition rates of 16 nm/min on average at 200 W magnetron power for the highly homogeneous W-metallic films. SEM/EDX analysis showed that after annealing at 450?C in air, the RF sputtered 269 nm thick metallic W films with a round grain morphology (~30 nm) turned into 420 nm thick nearly stoichiometric transparent WO3 (tungsten (VI) oxide) film, with a dramatically c

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34

Sauvan, Muriel, and Christophe Pijolat. "Selectivity improvement of SnO2 films by superficial metallic films." Sensors and Actuators B: Chemical 58, no. 1-3 (1999): 295–301. http://dx.doi.org/10.1016/s0925-4005(99)00147-1.

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35

Moskal, I. E., A. M. Petrzhik, Yu V. Kislinskii, A. V. Shadrin, G. A. Ovsyannikov, and N. V. Dubitskiy. "Production and electronic transport in thin films of strontium iridate." Izvestiâ Akademii nauk SSSR. Seriâ fizičeskaâ 88, no. 4 (2024): 673–76. http://dx.doi.org/10.31857/s0367676524040211.

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The results of the study of epitaxial thin films of SrIrO3 are presented, data on growth technology, crystal structure and electronic transport are presented. In SrIrO3 films received in a mixture of Ar and O2 gases, the dependence of resistance on temperature has a metallic character. For the films deposited in pure argon, the resistance versus temperature curves shows both a metallic and a dielectric behavior. It depends on the deposition pressure and the deposition temperature. The activation energy was calculated for dielectric samples and compared with the activation energy for Sr2IrO4 fi

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36

Yao, Xinyue, Mikko Vepsäläinen, Fabio Isa, Phil Martin, Paul Munroe, and Avi Bendavid. "Advanced RuO2 Thin Films for pH Sensing Application." Sensors 20, no. 22 (2020): 6432. http://dx.doi.org/10.3390/s20226432.

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RuO2 thin films were prepared using magnetron sputtering under different deposition conditions, including direct current (DC) and radio frequency (RF) discharges, metallic/oxide cathodes, different substrate temperatures, pressures, and deposition times. The surface morphology, residual stress, composition, crystal structure, mechanical properties, and pH performances of these RuO2 thin films were investigated. The RuO2 thin films RF sputtered from a metallic cathode at 250 °C exhibited good pH sensitivity of 56.35 mV/pH. However, these films were rougher, less dense, and relatively softer. Ho

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37

Kawakami, Reina, Ryusei Saeki, Shinji Munetoh, and Takeshi Ohgai. "Micro-Vickers Hardness of Cu and Cu2O Dual Phase Composite Films Electrodeposited from Acidic Aqueous Solutions Containing Polyethylene Glycol." Crystals 13, no. 12 (2023): 1654. http://dx.doi.org/10.3390/cryst13121654.

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Metallic copper (Cu) and copper oxide (Cu2O) dual phase composite films were fabricated via a cathodic reduction process in an acidic aqueous solution dissolving polyethylene glycol (PEG) to investigate the structure and micro-Vickers hardness. By dissolving PEG in an aqueous electrolyte, the cathode potential was depolarized to the noble region during the electrodeposition, and the average crystallite size of electrodeposited Cu/Cu2O composite films was decreased down to around 40 nm. The metallic copper films electrodeposited from the solution without PEG was preferentially orientated in (22

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38

Botchway, E. A., Francis Kofi Ampong, Isaac Nkrumah, D. B. Puzer, Robert Kwame Nkum, and Francis Boakye. "The CZTS Thin Films Grown by Sulfurization of Electrodeposited Metallic Precursors: The Effect of Increasing Tin Content of the Metallic Precursors on the Structure, Morphology and Optical Properties of the Thin Films." East European Journal of Physics, no. 2 (June 2, 2023): 249–56. http://dx.doi.org/10.26565/2312-4334-2023-2-28.

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A study has been carried out to investigate the influence of the amount of Sn in the precursor solution, on some physical properties of CZTS films grown by sulfurization of electrodeposited metallic precursors. The growth of the CZTS samples was achieved by sequential electrodepositon of constituent metallic layers on ITO glass substrates using a 3-electrode electrochemical cell with graphite as a counter electrode and Ag/AgCl as the reference electrode. The Sn-content in the metallic precursor was varied by varying the deposition time of Sn. The stacked elemental layer was then soft annealed

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Ohgai, Takeshi, Masayuki Mizumoto, Shigeki Nomura, and Akio Kagawa. "Electrodeposition of Metallic Nanowires in Nanoporous Polycarbonate Films." Materials Science Forum 539-543 (March 2007): 1253–57. http://dx.doi.org/10.4028/www.scientific.net/msf.539-543.1253.

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A polycarbonate membrane filter with numerous cylindrical nanopores was used as a template for growing metallic nanowires such as Ni, Co and Fe. The nanoporous template with pore-diameter of 150 nm, pore-length of 6000 nm, and pore-density of 108 pore•cm-2 was modified as a cathode with sputter-deposited gold layer. Inside the nano-pores, the metallic nanowires were electrochemically deposited from an acidic sulfate solution containing metal ions. The growth rate of metallic nanowires depended on the cathode potential during electrodeposition. The diameter of electrodeposited nanowires corresp

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40

Sunke, Venkataiah, and Uthanna Suda. "Structural and Optical Properties of Thermally Oxidized Zirconium Dioxide Films." International Letters of Chemistry, Physics and Astronomy 77 (January 2018): 15–25. http://dx.doi.org/10.18052/www.scipress.com/ilcpa.77.15.

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Zirconium oxide (ZrO2) thin films were grown by thermal oxidation of metallic zirconium films deposited by sputtering of zirconium target by DC magnetron sputtering technique. The metallic zirconium films were thermally oxidized in oxygen atmosphere at different temperatures in the range from 300°C to 500°C. The as-deposited and oxidized films were characterized for their chemical composition by energy dispersive X-ray analysis, structure by X-ray diffraction, chemical binding configuration with Fourier transform infrared spectroscopy and optical absorption using UV-Vis NIR spectrophotometer.

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Sunke, Venkataiah, and Uthanna Suda. "Structural and Optical Properties of Thermally Oxidized Zirconium Dioxide Films." International Letters of Chemistry, Physics and Astronomy 77 (January 25, 2018): 15–25. http://dx.doi.org/10.56431/p-3575p1.

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Zirconium oxide (ZrO2) thin films were grown by thermal oxidation of metallic zirconium films deposited by sputtering of zirconium target by DC magnetron sputtering technique. The metallic zirconium films were thermally oxidized in oxygen atmosphere at different temperatures in the range from 300°C to 500°C. The as-deposited and oxidized films were characterized for their chemical composition by energy dispersive X-ray analysis, structure by X-ray diffraction, chemical binding configuration with Fourier transform infrared spectroscopy and optical absorption using UV-Vis NIR spectrophotometer.

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Skiba, N. V. "Plastic Deformation Micromechanism in Nanotwinned Films." REVIEWS ON ADVANCED MATERIALS SCIENCE 57, no. 1 (2018): 133–36. http://dx.doi.org/10.1515/rams-2018-0056.

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Abstract (sommario):

Abstract A theoretical model is suggested which describes micromechanism of the plastic deformation in nanotwinned metallic film formed by electrical deposition onto metallic substrate. In the framework of the model, the micromechanism of the plastic deformation is widening of nanoscale twins due to migration of twin boundaries. The energy and stress characteristics of the twin widening are calculated.

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43

Lee, Natalia L., Galen B. Fisher, and Robert Schulz. "Sputter deposition of a corrosion-resistant amorphous metallic coating." Journal of Materials Research 3, no. 5 (1988): 862–71. http://dx.doi.org/10.1557/jmr.1988.0862.

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Abstract (sommario):

Starting with corrosion-resistant amorphous Fe32Ni36Cr14P12B6 alloy material, rf sputter deposition has been successfully used to deposit amorphous thin films very similar in composition onto low-carbon (i.e., 1008) steel. The effects that varying sputter deposition parameters has on a film's corrosion resistance, microstructure, and chemical composition have been examined. Optical, scanning, and transmission electron microscopy, Auger depth profiling, and x-ray diffraction were used to characterize the microstructure and composition of the films, while the corrosion resistance was determined

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44

Martin, Nicolas, Jean-Marc Cote, Joseph Gavoille, and Valérie Potin. "Tantalum Oxide Thin Films Sputter-Deposited by Oxygen Gas Pulsing." Coatings 13, no. 11 (2023): 1932. http://dx.doi.org/10.3390/coatings13111932.

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Abstract (sommario):

Tantalum oxide thin films are deposited by DC reactive magnetron sputtering from a tantalum metallic target and argon + oxygen. The oxygen gas is pulsed during the deposition with a constant pulsing period T = 10 s, whereas the introduction time of the reactive gas, namely the tON injection time, is systematically changed from 0 to 100% of T. Therefore, composition of as-deposited TaOx films is continuously changed from pure metallic tantalum to the over-stoichiometric Ta2O5 material. Films adopt the body-centered cubic structure (metallic Ta) for the lowest tON injection time values (oxygen s

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45

DONG ZHENG-CHAO, SHENG LI, XING DING-YU, and DONG JIN-MING. "QUANTUM TRANSPORT THEORY IN METALLIC FILMS." Acta Physica Sinica 46, no. 3 (1997): 568. http://dx.doi.org/10.7498/aps.46.568.

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46

Wang, Yanfeng, Fei Yang, Zhengjun Zhang, and Yiping Zhao. "Performance of Transparent Metallic Thin Films." Journal of Physical Chemistry C 125, no. 29 (2021): 16334–42. http://dx.doi.org/10.1021/acs.jpcc.1c04832.

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47

Wu, Reng-Lai, Ye-Jun Long, Hong-Jie Xue, Yabin Yu, and Hui-Fang Hu. "Plasmon dispersions in ultrathin metallic films." International Journal of Modern Physics B 28, no. 27 (2014): 1450189. http://dx.doi.org/10.1142/s0217979214501896.

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Abstract (sommario):

We present an eigen-equation for plasmon of ultrathin films based on the self-consistent linear response approximation (SCLRA). The calculations for plasmon dispersion in both single and multilayer systems are reported. There are two types of plasmon in the plasmon spectrum, two-dimensional (2D) and bulk-like (BL) modes. The plasmon energy of the 2D mode is zero in the long wave limit, while the one of BL mode is nonzero in the long-wave limit. Given a surface electron density, with the decrease of the wave vector the dispersions of the 2D plasmon of different layer systems become equal to eac

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48

Dimmich, R. "Optical properties of metallic multilayer films." Physical Review B 45, no. 7 (1992): 3784–91. http://dx.doi.org/10.1103/physrevb.45.3784.

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49

Continentino, M. A., and E. V. Lins de Mello. "Two-dimensional ferromagnetism in metallic films." Journal of Physics: Condensed Matter 2, no. 13 (1990): 3131–34. http://dx.doi.org/10.1088/0953-8984/2/13/023.

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50

BELOTSKII, E. D., and P. M. TOMCHUK. "Hot electrons in island metallic films." International Journal of Electronics 69, no. 1 (1990): 173–78. http://dx.doi.org/10.1080/00207219008920304.

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