Dissertationen zum Thema „Metal oxide semiconductors, Complimentary“
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Trivedi, Vishal P. „Physics and design of nonclassical nanoscale CMOS devices with ultra-thin bodies“. [Gainesville, Fla.] : University of Florida, 2005. http://purl.fcla.edu/fcla/etd/UFE0009860.
Der volle Inhalt der QuelleChinchani, Rameshwari. „Strained silicon/silicon-germanium heterostructure complimentary metal oxide semiconductor devices a simulation study of linearity /“. Ohio : Ohio University, 2004. http://www.ohiolink.edu/etd/view.cgi?ohiou1176143999.
Der volle Inhalt der QuelleSong, Ping. „A 1.0-V CMOS class-E power amplifier for bluetooth applications /“. View abstract or full-text, 2005. http://library.ust.hk/cgi/db/thesis.pl?ELEC%202005%20SONG.
Der volle Inhalt der QuelleRae, Bruce R. „Micro-systems for time-resolved fluorescence analysis using CMOS single-photon avalanche diodes and micro-LEDs“. Thesis, University of Edinburgh, 2009. http://hdl.handle.net/1842/4219.
Der volle Inhalt der QuelleAl-Ahmadi, Ahmad Aziz. „Complementary orthogonal stacked metal oxide semiconductor a novel nanoscale complementary metal oxide semiconductor architecture /“. Ohio : Ohio University, 2006. http://www.ohiolink.edu/etd/view.cgi?ohiou1147134449.
Der volle Inhalt der QuellePesci, Federico M. „Metal oxide semiconductors employed as photocatalysts during water splitting“. Thesis, Imperial College London, 2014. http://hdl.handle.net/10044/1/24964.
Der volle Inhalt der QuelleGurcan, Zeki B. „0.18 [mu]m high performance CMOS process optimization for manufacturability /“. Online version of thesis, 2005. http://hdl.handle.net/1850/5197.
Der volle Inhalt der QuelleWu, Ting. „Design of terabits/s CMOS crossbar switch chip /“. View Abstract or Full-Text, 2003. http://library.ust.hk/cgi/db/thesis.pl?ELEC%202003%20WU.
Der volle Inhalt der QuelleIncludes bibliographical references (leaves 100-105). Also available in electronic version. Access restricted to campus users.
Huang, Amy. „On the plasma induced degradation of organosilicate glass (OSG) as an interlevel dielectric for sub 90 nm CMOS /“. Online version of thesis, 2008. http://hdl.handle.net/1850/5899.
Der volle Inhalt der QuelleÖzdağ, Pınar Güneş Mehmet. „Capacitance-voltage spectroscopy in metal-tantalum pentoxide (Ta-O)-silicon mos capacitors/“. [s.l.]: [s.n.], 2005. http://library.iyte.edu.tr/tezler/master/fizik/T000397.pdf.
Der volle Inhalt der QuelleKeywords: Capacitance-voltage spectroscopy, high dielectric constant insulators, tantalum pentoxide. Includes bibliographical references (leaves 92-97)
Waghe, Anil Bhalchandra. „Synthesis of Porous Monoclinic Tungsten Oxides and Their Application in Sensors“. Fogler Library, University of Maine, 2003. http://www.library.umaine.edu/theses/pdf/WagheAB2003.pdf.
Der volle Inhalt der QuelleDu, Xiaohua. „Understanding and optimization of gas sensors based on metal oxide semiconductors“. Connect to online resource, 2007. http://gateway.proquest.com/openurl?url_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:dissertation&res_dat=xri:pqdiss&rft_dat=xri:pqdiss:3284441.
Der volle Inhalt der QuelleBeglitis, N. „First-principles studies of surface defects of model metal-oxide semiconductors“. Thesis, University College London (University of London), 2011. http://discovery.ucl.ac.uk/1324515/.
Der volle Inhalt der QuelleBowen, Andrew. „Anodisation and study of oxide films formed on zirconium“. Thesis, University of Nottingham, 1989. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.328407.
Der volle Inhalt der QuelleWu, Kehuey. „Strain effects on the valence band of silicon piezoresistance in p-type silicon and mobility enhancement in strained silicon pMOSFET /“. [Gainesville, Fla.] : University of Florida, 2005. http://purl.fcla.edu/fcla/etd/UFE0008390.
Der volle Inhalt der QuelleYellai, Kashyap Williams John R. „Post ion-implantation surface planarization process for 4H-SiC wafers using carbon encapsulation technique“. Auburn, Ala., 2006. http://repo.lib.auburn.edu/2006%20Fall/Theses/YELLAI_KASHYAP_13.pdf.
Der volle Inhalt der QuelleShum, Roger Chi Fai Carleton University Dissertation Engineering Electrical. „A timing macro model for performance optimization of CMOS logic circuits“. Ottawa, 1992.
Den vollen Inhalt der Quelle findenPeleckis, Germanas. „Studies on diluted oxide magnetic semiconductors for spin electronic applications“. Access electronically, 2006. http://www.library.uow.edu.au/adt-NWU/public/adt-NWU20070821.145447/index.html.
Der volle Inhalt der QuelleLiu, Kou-chen. „Si1-xGex/Si vertical MOSFETs and sidewall strained Si devices : design and fabrication /“. Digital version accessible at:, 1999. http://wwwlib.umi.com/cr/utexas/main.
Der volle Inhalt der QuelleGhamgosar, Pedram. „Advanced Metal Oxide Semiconductors for Solar Energy Harvesting and Solar Fuel Production“. Licentiate thesis, Luleå tekniska universitet, Institutionen för teknikvetenskap och matematik, 2017. http://urn.kb.se/resolve?urn=urn:nbn:se:ltu:diva-64922.
Der volle Inhalt der QuelleCsutak, Sebastian Marius. „Optical receivers and photodetectors in 130nm CMOS technology“. Access restricted to users with UT Austin EID Full text (PDF) from UMI/Dissertation Abstracts International, 2001. http://wwwlib.umi.com/cr/utexas/fullcit?p3036588.
Der volle Inhalt der QuelleHildreth, Scott A. „Statistical SPICE parameter extraction for an N-Well CMOS process /“. Online version of thesis, 1995. http://hdl.handle.net/1850/12177.
Der volle Inhalt der QuelleCarruthers, Colin. „Low noise operation in deep depletion mode MOS transistors“. Thesis, University of Edinburgh, 1989. http://hdl.handle.net/1842/10866.
Der volle Inhalt der QuelleAli, Danish. „Coulomb blockade in silicon-on-insulator“. Thesis, University of Cambridge, 1994. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.321368.
Der volle Inhalt der QuelleUpadhyaya, Parag. „High IIP2 CMOS doubly balanced quadrature sub-harmonic mixer for 5 GHz direct conversion receiver“. Online access for everyone, 2005. http://www.dissertations.wsu.edu/Thesis/Spring2005/p%5Fupadhyaya%5F050505.pdf.
Der volle Inhalt der QuellePrice, David T. „N-Well CMOS process integration /“. Online version of thesis, 1992. http://hdl.handle.net/1850/11261.
Der volle Inhalt der QuelleJohn, Soji. „UHVCVD growth of Si₁-x-yGexCy epitaxial materials and application in heterostructure MOS devices /“. Digital version accessible at:, 1998. http://wwwlib.umi.com/cr/utexas/main.
Der volle Inhalt der QuelleWu, Zhenghui. „Impact of metal oxide/bulk-heterojunction interface on performance of organic solar cells“. HKBU Institutional Repository, 2015. https://repository.hkbu.edu.hk/etd_oa/159.
Der volle Inhalt der QuelleZeng, Xu, und 曾旭. „Electrical reliability of N-Mos devices with N2O-based oxides as gate dielectrics“. Thesis, The University of Hong Kong (Pokfulam, Hong Kong), 1996. http://hub.hku.hk/bib/B31235475.
Der volle Inhalt der QuelleZeng, Xu. „Electrical reliability of N-Mos devices with N2O-based oxides as gate dielectrics /“. Hong Kong : University of Hong Kong, 1996. http://sunzi.lib.hku.hk/hkuto/record.jsp?B1966980X.
Der volle Inhalt der QuelleGajera, Dipesh. „Process costing of microchip“. Morgantown, W. Va. : [West Virginia University Libraries], 2006. https://eidr.wvu.edu/etd/documentdata.eTD?documentid=4726.
Der volle Inhalt der QuelleTitle from document title page. Document formatted into pages; contains vii, 92 p. : ill. (some col.). Includes abstract. Includes bibliographical references (p. 85-91).
Gilzad, Kohan Mojtaba. „Plasmonic Effect of Metal Nanoparticles Deposited on Wide-Band Gap Metal Oxide Nanowire Substrate“. Thesis, Luleå tekniska universitet, Institutionen för teknikvetenskap och matematik, 2017. http://urn.kb.se/resolve?urn=urn:nbn:se:ltu:diva-64762.
Der volle Inhalt der QuelleRichards, Winifred Mary. „An investigation of UV activated metal oxide semiconductors for the detection of volatiles“. Thesis, University of the West of England, Bristol, 2010. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.524714.
Der volle Inhalt der QuelleRace, Nicholas. „Iron Polypyridyl Catalysts Assembled on Metal Oxide Semiconductors for Heterogeneous Photocatalytic Hydrogen Generation“. W&M ScholarWorks, 2018. https://scholarworks.wm.edu/etd/1530192812.
Der volle Inhalt der QuelleHaynes, Keith M. „Molecules and Materials for Excitonic Solar Cells Using P-type Metal Oxide Semiconductors“. Thesis, University of North Texas, 2015. https://digital.library.unt.edu/ark:/67531/metadc804970/.
Der volle Inhalt der QuelleHöhr, Timm. „Quantum-mechanical modeling of transport parameters for MOS devices /“. Konstanz : Hartnung-Gorre, 2006. http://www.loc.gov/catdir/toc/fy0707/2007358987.html.
Der volle Inhalt der QuelleSummary in German and English, text in English. Includes bibliographical references (p. 123-132).
Chun, Young Tea. „Charge transfer characteristic of zinc oxide nanowire devices and their applications“. Thesis, University of Cambridge, 2015. https://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.708978.
Der volle Inhalt der Quelle李加碧 und Stella Li. „Interface state generation induced by Fowler-Nordheim tunneling in mosdevices“. Thesis, The University of Hong Kong (Pokfulam, Hong Kong), 1999. http://hub.hku.hk/bib/B31221403.
Der volle Inhalt der QuelleLi, Stella. „Interface state generation induced by Fowler-Nordheim tunneling in mos devices /“. Hong Kong : University of Hong Kong, 1999. http://sunzi.lib.hku.hk/hkuto/record.jsp?B20566487.
Der volle Inhalt der QuelleCorrell, Jeffrey. „The design and implementation of an 8 bit CMOS microprocessor /“. Online version of thesis, 1992. http://hdl.handle.net/1850/11649.
Der volle Inhalt der QuelleBachelu, Carol R. Carleton University Dissertation Engineering Electrical. „A Topological single-layer routing algorithm and its application to leaf cell synthesis“. Ottawa, 1992.
Den vollen Inhalt der Quelle findenWemple, Ivan L. „Parasitic substrate modeling for monolithic mixed analog/digital circuit design and verification /“. Thesis, Connect to this title online; UW restricted, 1996. http://hdl.handle.net/1773/5944.
Der volle Inhalt der QuelleChen, Zengjun Williams John R. „Electrical properties of MOS devices fabricated on 4H carbon-face SiC“. Auburn, Ala, 2009. http://hdl.handle.net/10415/1858.
Der volle Inhalt der QuelleWu, Xu Sheng. „Three dimensional multi-gates devices and circuits fabrication, characterization, and modeling /“. View abstract or full-text, 2005. http://library.ust.hk/cgi/db/thesis.pl?ELEC%202005%20WUX.
Der volle Inhalt der QuelleModzelewski, Kenneth Paul. „DC parameter extraction technique for independent double gate MOSFETs a thesis presented to the faculty of the Graduate School, Tennessee Technological University /“. Click to access online, 2009. http://proquest.umi.com/pqdweb?index=11&did=1759989211&SrchMode=1&sid=1&Fmt=6&VInst=PROD&VType=PQD&RQT=309&VName=PQD&TS=1250600320&clientId=28564.
Der volle Inhalt der QuelleKhan, Shamsul Arefin. „Deep sub-micron MOS transistor design and manufacturing sensitivity analysis /“. Digital version accessible at:, 1999. http://wwwlib.umi.com/cr/utexas/main.
Der volle Inhalt der QuelleStrasik, Michael. „Photoelectrochemical and photocatalytic investigation of semiconducting iron oxide for solar energy conversion /“. Full text open access at:, 1988. http://content.ohsu.edu/u?/etd,167.
Der volle Inhalt der QuelleBialuschewski, Danny [Verfasser]. „Laser-assisted Modification of Metals and Metal Oxide Semiconductors as Photoactive Materials / Danny Bialuschewski“. München : Verlag Dr. Hut, 2020. http://d-nb.info/1219477699/34.
Der volle Inhalt der QuelleWilson, Jeffrey. „Analysis of power requirements inside of NMOS integrated circuits“. Full text open access at:, 1986. http://content.ohsu.edu/u?/etd,134.
Der volle Inhalt der QuelleMulfinger, G. Robert. „Investigation of induced charge damage on self-aligned metal-gate MOS devices /“. Online version of thesis, 2006. http://hdl.handle.net/1850/2036.
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