Artykuły w czasopismach na temat „Electron Cyclotron Resonance Plasmas”
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Girard, A., D. Hitz, G. Melin, and K. Serebrennikov. "Electron cyclotron resonance plasmas and electron cyclotron resonance ion sources: Physics and technology (invited)." Review of Scientific Instruments 75, no. 5 (2004): 1381–88. http://dx.doi.org/10.1063/1.1675926.
Pełny tekst źródłaShufflebotham, P. K., and D. J. Thomson. "Stability and spatial characterization of electron cyclotron resonance processing plasmas." Canadian Journal of Physics 69, no. 3-4 (1991): 195–201. http://dx.doi.org/10.1139/p91-032.
Pełny tekst źródłaGirard, A., C. Pernot, G. Melin, and C. Lécot. "Modeling of electron-cyclotron-resonance-heated plasmas." Physical Review E 62, no. 1 (2000): 1182–89. http://dx.doi.org/10.1103/physreve.62.1182.
Pełny tekst źródłaOutten, C. A., J. C. Barbour, and W. R. Wampler. "Characterization of electron cyclotron resonance hydrogen plasmas." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 9, no. 3 (1991): 717–21. http://dx.doi.org/10.1116/1.577350.
Pełny tekst źródłaSan Andrés, E., A. Del Prado, A. J. Blázquez, I. Mártil, and G. González-Díaz. "Procesos de oxidación de Si mediante plasma de resonancia ciclotrónica de electrones." Boletín de la Sociedad Española de Cerámica y Vidrio 43, no. 2 (2004): 379–82. http://dx.doi.org/10.3989/cyv.2004.v43.i2.546.
Pełny tekst źródłaHansen, S. K., S. K. Nielsen, J. Stober, et al. "Parametric Decay Instabilities during Electron Cyclotron Resonance Heating of Fusion Plasmas, Problems and Possibilities." EPJ Web of Conferences 277 (2023): 01002. http://dx.doi.org/10.1051/epjconf/202327701002.
Pełny tekst źródłaPu, Yi-Kang, Zhi-Gang Guo, Zheng-De Kang, et al. "Comparative characterization of high-density plasma reactors using emission spectroscopy from VUV to NIR." Pure and Applied Chemistry 74, no. 3 (2002): 459–64. http://dx.doi.org/10.1351/pac200274030459.
Pełny tekst źródłaCastagna, T. J., J. L. Shohet, D. D. Denton, and N. Hershkowitz. "X rays in electron‐cyclotron‐resonance processing plasmas." Applied Physics Letters 60, no. 23 (1992): 2856–58. http://dx.doi.org/10.1063/1.106846.
Pełny tekst źródłaGoeckner, M. J., J. A. Meyer, G. ‐H Kim, et al. "Role of contaminants in electron cyclotron resonance plasmas." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 11, no. 5 (1993): 2543–52. http://dx.doi.org/10.1116/1.578605.
Pełny tekst źródłaRacz, Richárd, Sándor Biri, and József Palinkas. "Visible Light Emission of Electron Cyclotron Resonance Plasmas." IEEE Transactions on Plasma Science 39, no. 11 (2011): 2462–63. http://dx.doi.org/10.1109/tps.2011.2150244.
Pełny tekst źródłaMarchetti, M. T., M. Cavenago, and F. Pegoraro. "Models of many-element electron cyclotron resonance plasmas." Review of Scientific Instruments 69, no. 2 (1998): 1123–25. http://dx.doi.org/10.1063/1.1148644.
Pełny tekst źródłaRawwagah, F., M. Al-Ali, A. Al-Khateeb, and M. Bawa'aneh. "Collisional and resonance absorption of electromagnetic waves in a weakly collisional, inhomogeneous magnetoplasma slab." Advanced Electromagnetics 9, no. 2 (2020): 25–30. http://dx.doi.org/10.7716/aem.v9i2.1466.
Pełny tekst źródłaHansen, S. K., S. K. Nielsen, and J. Stober. "Relativistic analysis of upper hybrid wave propagation and trapping." Physics of Plasmas 30, no. 4 (2023): 042103. http://dx.doi.org/10.1063/5.0138249.
Pełny tekst źródłaVirko, V. F., V. M. Slobodyan, and Yu V. Virko. "Coupling of Helicon Antennas to Plasma near the Electron Cyclotron Resonance." Ukrainian Journal of Physics 61, no. 11 (2016): 956–59. http://dx.doi.org/10.15407/ujpe61.11.0956.
Pełny tekst źródłaJiang, Wence, Daniel Verscharen, Seong-Yeop Jeong, et al. "Velocity-space Signatures of Resonant Energy Transfer between Whistler Waves and Electrons in the Earth’s Magnetosheath." Astrophysical Journal 960, no. 1 (2023): 30. http://dx.doi.org/10.3847/1538-4357/ad0df8.
Pełny tekst źródłaMISRA, A. P., G. BRODIN, M. MARKLUND, and P. K. SHUKLA. "Circularly polarized modes in magnetized spin plasmas." Journal of Plasma Physics 76, no. 6 (2010): 857–64. http://dx.doi.org/10.1017/s0022377810000450.
Pełny tekst źródłaRobinson, P. A. "Electron cyclotron waves: dispersion and accessibility conditions in isotropic and anisotropic plasmas." Journal of Plasma Physics 35, no. 2 (1986): 187–207. http://dx.doi.org/10.1017/s0022377800011272.
Pełny tekst źródłaCastagna, T. J., J. L. Shohet, K. A. Ashtiani, and N. Hershkowitz. "X‐ray diagnostics for electron cyclotron resonance processing plasmas." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 10, no. 4 (1992): 1325–30. http://dx.doi.org/10.1116/1.578247.
Pełny tekst źródłaSharma, R. P., Yogesh Kumar Tripathi, and A. Kumar. "Parametric instabilities during electron cyclotron resonance heating in plasmas." Physical Review A 35, no. 8 (1987): 3567–70. http://dx.doi.org/10.1103/physreva.35.3567.
Pełny tekst źródłaArunasalam, V., P. C. Efthimion, J. C. Hosea, H. Hsuan, and G. Taylor. "Doppler splitting of electron cyclotron absorption resonance in plasmas." Physical Review A 36, no. 8 (1987): 3909–11. http://dx.doi.org/10.1103/physreva.36.3909.
Pełny tekst źródłaJacob, W., P. Reinke, and W. Möller. "Ion energy distributions from electron cyclotron resonance methane plasmas." Diamond and Related Materials 2, no. 2-4 (1993): 378–82. http://dx.doi.org/10.1016/0925-9635(93)90086-h.
Pełny tekst źródłaKumar, P., G. Rodrigues, P. S. Lakshmy, D. Kanjilal, and R. Kumar. "Charge-state distributions of metallic electron cyclotron resonance plasmas." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 26, no. 1 (2008): 97–102. http://dx.doi.org/10.1116/1.2823486.
Pełny tekst źródłaKitamura, N., M. Kitahara, M. Shoji, et al. "Direct measurements of two-way wave-particle energy transfer in a collisionless space plasma." Science 361, no. 6406 (2018): 1000–1003. http://dx.doi.org/10.1126/science.aap8730.
Pełny tekst źródłaRácz, R., S. Biri, and J. Pálinkás. "Electron cyclotron resonance plasma photos." Review of Scientific Instruments 81, no. 2 (2010): 02B708. http://dx.doi.org/10.1063/1.3267289.
Pełny tekst źródłaNarita, Y., E. Marsch, C. Perschke, K. H. Glassmeier, U. Motschmann, and H. Comişel. "Wave–particle resonance condition test for ion-kinetic waves in the solar wind." Annales Geophysicae 34, no. 4 (2016): 393–98. http://dx.doi.org/10.5194/angeo-34-393-2016.
Pełny tekst źródłaChen, Geng Shun, Rui Hong Tong, and An Hua Zhang. "Magnetic Confinement of Plasmas Generated by Coaxial Twinned Electron Cyclotron Resonance (ECR) Discharge." Advanced Materials Research 413 (December 2011): 18–23. http://dx.doi.org/10.4028/www.scientific.net/amr.413.18.
Pełny tekst źródłaMishra, Bharat, Angelo Pidatella, Alessio Galatà, et al. "Probing Electron Properties in ECR Plasmas Using X-ray Bremsstrahlung and Fluorescence Emission." Condensed Matter 6, no. 4 (2021): 41. http://dx.doi.org/10.3390/condmat6040041.
Pełny tekst źródłaZerbini, M., P. Buratti, O. Tudisco, et al. "Electron cyclotron emission diagnostic of high temperature electron cyclotron resonance heated plasmas on Frascati tokamak upgrade." Review of Scientific Instruments 70, no. 1 (1999): 1007–10. http://dx.doi.org/10.1063/1.1149519.
Pełny tekst źródłaKENNETT, M. P., D. B. MELROSE, and Q. LUO. "Cyclotron effects on wave dispersion in pulsar plasmas." Journal of Plasma Physics 64, no. 4 (2000): 333–52. http://dx.doi.org/10.1017/s0022377800008862.
Pełny tekst źródłaFukumasa, Osamu, and Masanori Matsumori. "Negative Ion Volume Production in Electron Cyclotron Resonance Hydrogen Plasmas." Japanese Journal of Applied Physics 38, Part 1, No. 7B (1999): 4581–85. http://dx.doi.org/10.1143/jjap.38.4581.
Pełny tekst źródłaMehlman, G., C. R. Eddy, and S. R. Douglass. "Characterization of electron cyclotron resonance plasmas by vacuum ultraviolet spectroscopy." Journal of Applied Physics 78, no. 11 (1995): 6421–26. http://dx.doi.org/10.1063/1.360525.
Pełny tekst źródłaUeda, Yoko, and Yoshinobu Kawai. "Role of extraordinary waves in uniform electron cyclotron resonance plasmas." Applied Physics Letters 71, no. 15 (1997): 2100–2102. http://dx.doi.org/10.1063/1.120416.
Pełny tekst źródłaZhao, H. Y., H. W. Zhao, L. T. Sun, et al. "Extreme ultraviolet narrow band emission from electron cyclotron resonance plasmas." Review of Scientific Instruments 79, no. 2 (2008): 02C719. http://dx.doi.org/10.1063/1.2814258.
Pełny tekst źródłaRossnagel, S. M., K. Schatz, S. J. Whitehair, R. C. Guarnieri, D. N. Ruzic, and J. J. Cuomo. "The effects of substrate potentials on electron cyclotron resonance plasmas." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 9, no. 3 (1991): 702–6. http://dx.doi.org/10.1116/1.577347.
Pełny tekst źródłaGanguli, A., M. K. Akhtar, R. D. Tarey, and R. K. Jarwal. "Absorption of left-polarized microwaves in electron cyclotron resonance plasmas." Physics Letters A 250, no. 1-3 (1998): 137–43. http://dx.doi.org/10.1016/s0375-9601(98)00833-0.
Pełny tekst źródłaPool, F. S., and Y. H. Shing. "Deposition of diamondlike films by electron cyclotron resonance microwave plasmas." Journal of Applied Physics 68, no. 1 (1990): 62–65. http://dx.doi.org/10.1063/1.347094.
Pełny tekst źródłaLee, J. W., S. J. Pearton, C. R. Abernathy, W. S. Hobson, and F. Ren. "Damage introduction in InGaP by electron cyclotron resonance Ar plasmas." Applied Physics Letters 67, no. 21 (1995): 3129–31. http://dx.doi.org/10.1063/1.114856.
Pełny tekst źródłaZhang, Mei, Lujun Pan, Tsutomu Miyazaki, and Yoshikazu Nakayama. "Carbon Nitride Films Produced Using Electron Cyclotron Resonance Nitrogen Plasmas." Japanese Journal of Applied Physics 36, Part 1, No. 7B (1997): 4897–900. http://dx.doi.org/10.1143/jjap.36.4897.
Pełny tekst źródłaKovalchuk, A. V., and S. Y. Shapoval. "Electron Cyclotron Resonance Plasma Studies Using the Second Cyclotron Harmonic Resonance." Russian Microelectronics 53, no. 5 (2024): 433–38. http://dx.doi.org/10.1134/s1063739724600353.
Pełny tekst źródłaSamukawa, Seiji, Yukito Nakagawa, and Kei Ikeda. "Ion Energy Distributions at the Electron Cyclotron Resonance Position in Electron Cyclotron Resonance Plasma." Japanese Journal of Applied Physics 29, Part 2, No. 12 (1990): L2319—L2321. http://dx.doi.org/10.1143/jjap.29.l2319.
Pełny tekst źródłaViktorov, M., I. Izotov, E. Kiseleva, A. Polyakov, S. Vybin, and V. Skalyga. "Kinetic whistler instability in a mirror-confined plasma of a continuous ECR ion source." Physics of Plasmas 30, no. 2 (2023): 022101. http://dx.doi.org/10.1063/5.0133930.
Pełny tekst źródłaCao, L. H., Wei Yu, M. Y. Yu, and C. Y. Yu. "Terahertz Radiation from a Plasma Cylinder with External Radial Electric and Axial Magnetic Fields." Laser and Particle Beams 2021 (January 29, 2021): 1–6. http://dx.doi.org/10.1155/2021/6666760.
Pełny tekst źródłaSun, B. J., M. A. Ochando, and D. López-Bruna. "Acoustic mode driven by fast electrons in TJ-II Electron Cyclotron Resonance plasmas." EPL (Europhysics Letters) 115, no. 3 (2016): 35001. http://dx.doi.org/10.1209/0295-5075/115/35001.
Pełny tekst źródłaMejia, S. R., T. Chau, R. D. McLeod, K. C. Kao, and H. C. Card. "Electron cyclotron resonance microwave-plasma etching." Canadian Journal of Physics 65, no. 8 (1987): 856–58. http://dx.doi.org/10.1139/p87-131.
Pełny tekst źródłaMIATSUO, Seitero. "Electron cyclotron resonance plasma process technology." Journal of the Japan Society for Precision Engineering 54, no. 10 (1988): 1877–80. http://dx.doi.org/10.2493/jjspe.54.1877.
Pełny tekst źródłaWhang, Ki Woong, Seok Hyun Lee, and Ho Jun Lee. "Cryogenic electron cyclotron resonance plasma etching." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 10, no. 4 (1992): 1307–12. http://dx.doi.org/10.1116/1.578244.
Pełny tekst źródłaGaudin, C., L. Hay, J. M. Buzzi, M. Bacal, and M. Lamoureux. "Compact electron cyclotron resonance plasma source." Review of Scientific Instruments 69, no. 2 (1998): 890–92. http://dx.doi.org/10.1063/1.1148584.
Pełny tekst źródłaNagase, M. "Silicidation using electron cyclotron resonance plasma." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 10, no. 3 (1992): 1087. http://dx.doi.org/10.1116/1.586083.
Pełny tekst źródłaLorenz, G., P. Baumann, G. Castrischer, I. Kessler, K. H. Kretschmer, and B. Dumbacher. "An electron cyclotron resonance plasma source." Materials Science and Engineering: A 139 (July 1991): 302–6. http://dx.doi.org/10.1016/0921-5093(91)90633-x.
Pełny tekst źródłaNishikawa, Kazuyasu, Yoshihiro Kusumi, Tatsuo Oomori, Minoru Hanazaki, and Keisuke Namba. "Platinum Etching and Plasma Characteristics in RF Magnetron and Electron Cyclotron Resonance Plasmas." Japanese Journal of Applied Physics 32, Part 1, No. 12B (1993): 6102–8. http://dx.doi.org/10.1143/jjap.32.6102.
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