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Artykuły w czasopismach na temat „Film roughness”

Autor: Grafiati

Data publikacji: 4 czerwca 2021

Data aktualizacji: 12 lutego 2022

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1

He, Li Jun, Chuan Li, and Xing Zhao Liu. "Surface Roughness in Alumina Thin Film Deposited on Silica Using Oblique Incidence." Materials Science Forum 787 (April 2014): 373–77. http://dx.doi.org/10.4028/www.scientific.net/msf.787.373.

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The main characteristics of a surface are physical and chemical structure, surface tension and surface roughness. Surface roughness is one of the critical factors, which could cause instability in quality performance. In this paper, surface roughness of alumina thin films deposited on a silicon substrate by using electron beam evaporation with oblique angle deposition were studied. It has been found that the surface roughness of the alumina thin films was dependent on the substrate temperature, the deposition rate, the film thickness and the inclined angle. The experimental results showed that

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2

ZHAO, PEI, RENG WANG, DINGQUAN LIU, FENGSHAN ZHANG, WEITAO SU, and XIAOFENG XU. "UNDERLAYER ROUGHNESS INFLUENCE ON THE PROPERTIES OF Ag THIN FILM." Surface Review and Letters 15, no. 06 (December 2008): 787–91. http://dx.doi.org/10.1142/s0218625x08012062.

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The effects of the roughness of ZnS underlayer on the microstructure, optical, and electrical properties of nanometer Ag thin film have been investigated in this paper. Nanometer Ag thin films in glass/ ZnS /7.5 nm Ag /30 nm ZnS stacks have been deposited and analyzed. In the stacks, the underlayers of ZnS have been sputtered with various thicknesses to generate various surface roughnesses. The X-ray diffraction (XRD) has been used to study the crystal structure of Ag films. The surface topography and the roughness of ZnS underlayer have been analyzed by atomic force microscopy. The sheet resi

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3

Chengwei, Wu. "On Mixed Squeeze Films of Infinite Width Plates." Journal of Tribology 113, no. 2 (April 1, 1991): 378–83. http://dx.doi.org/10.1115/1.2920632.

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A mixed squeeze film model between two rough squeezing plates is established in the present paper. The squeeze behavior in the presence of full and partial fluid film between two rough surfaces is analyzed by using Patir and Cheng’s average flow model and Greenwood and Tripp’s roughness contact model. For one-dimensional squeeze films, transverse and isotropic surface roughness (γ ≤ 1) leads to an increasing squeeze film damping coefficient and a longer sinkage time in comparison with smooth surfaces. But, longitudinal roughness (γ > 1) leads to a decreasing squeeze film damping coefficient

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4

Mitsuya, Y., T. Ohkubo, and H. Ota. "Averaged Reynolds Equation Extended to Gas Lubrication Possessing Surface Roughness in the Slip Flow Regime: Approximate Method and Confirmation Experiments." Journal of Tribology 111, no. 3 (July 1, 1989): 495–503. http://dx.doi.org/10.1115/1.3261957.

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The average film thickness theory is extended to gas lubrication possessing surface roughness in the slip flow regime. A simplified averaged Reynolds equation is derived and its applicability is confirmed through comparing with experiments. This averaging equation makes use of the mixed average film thickness defined as Havem = αHm + (1 − α)Hmˆ, where m = 1, 2 and 3; α indicates the mixing ratio; and H¯ and Hˆ denote the arithmetically and harmonically averaged film thicknesses. The experiments were performed using computer flying heads having precisely photolithography-fabricated longitudinal

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5

Wongkaew, Akkarat, Chanida Soontornkallapaki, Naritsara Amhae, and Wichet Lamai. "Effect of ZnO on a Superhydrophilic Self-Cleaning Properties of TiO₂/SiO₂ Thin Film on Glass Slide Substrate." Advanced Materials Research 1131 (December 2015): 237–41. http://dx.doi.org/10.4028/www.scientific.net/amr.1131.237.

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This work aims to study the effect of ZnO containing in TiO2/SiO2 film on the superhydrophilic property after exposed to different types of light. The metal solutions were prepared by sol-gel technique and the film was deposited on glass slides by dip coating method. The parameter studied was the amount of ZnO in the TiO2/SiO2 film. The contents of ZnO were 5-20% weight (increased by 5%). The amount of TiO2 was constant at 30% weight. The obtained films were analyzed for their roughness. The results indicated that film roughness changed according to the ZnO contents. With 5%ZnO in the thin fil

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6

Niesen, T. P., M. R. De Guire, J. Bill, F. Aldinger, M. Rühle, A. Fischer, F. C. Jentoft, and R. Schlögl. "Atomic force microscopic studies of oxide thin films on organic self-assembled monolayers." Journal of Materials Research 14, no. 6 (June 1999): 2464–75. http://dx.doi.org/10.1557/jmr.1999.0331.

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The surface morphology of TiO2- and ZrO2-based thin films, deposited from aqueous solution at 70–80 °C onto functionalized organic self-assembled monolayers (SAMs) on silicon has been examined using atomic force microscopy (AFM). The films have been previously shown to consist, respectively, of nanocrystalline TiO2 (anatase) and of nanocrystalline tetragonal ZrO2 with amorphous basic zirconium sulfate. The films exhibit characteristic surface roughnesses on two length scales. Roughness on the nanometer scale appears to be dictated by the size of the crystallites in the film. Roughness on the m

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7

Mitsuya, Y., and H. Ota. "Stiffness and Damping of Compressible Lubricating Films Between Computer Flying Heads and Textured Media: Perturbation Analysis Using the Finite Element Method." Journal of Tribology 113, no. 4 (October 1, 1991): 819–27. http://dx.doi.org/10.1115/1.2920698.

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Averaged static and dynamic lubrication equations are derived in the general form containing anisotropic film thicknesses dependent on roughness orientation. Solving these equations lead to a presentation of the dynamic characteristics of lubricating films existing between computer flying heads and textured media. Squeeze effects owing to moving roughness accompanying high-frequency spacing variation are found to be given as a function of arithmetically averaged film thickness minus harmonically averaged film thickness. The calculation procedure using the finite element method is then presente

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8

Cui, Rui Hai, Zhao Hua Jiang, and Zhong Ping Yao. "Influence of Cu²⁺ Doping on the Photocatalytic Activity of TiO₂ Film." Key Engineering Materials 368-372 (February 2008): 1483–85. http://dx.doi.org/10.4028/www.scientific.net/kem.368-372.1483.

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With the approach of anodic oxidation, TiO2/Ti film doped with Cu2+ was produced in H2SO4 electrolyte mixed with CuSO4. The surface morphology and the roughness of the films were studied with atomic force microscopy. The phase composition of the films was studied by X-ray diffraction. The photocatalytic activity of the films was compared through the photocatalytic degradation rate of phenol. The relations of the photocatalytic activity to the concentration of Cu2+, the microstructure and the surface roughness of the film were investigated. The results showed that Cu2+ increased the surface rou

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9

Peng, Yonghong, Shuai Zhang, Fanghua Zhu, Wa Li, Yong Yi, Kai Du, and Qiang Yin. "Fabrication and Characterization of Fluorinated Polyimides (PI) Films with Improved Hydrophobic Property." Nano 13, no. 07 (July 2018): 1850080. http://dx.doi.org/10.1142/s1793292018500807.

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There is a demand for composite films with excellent hydrophobic properties in inertial confinement fusion (ICF) physics experiments. In this paper, we prepared fluorinated polyimide hydrophobic films using spinning and plasma etching methods. The experimental results indicate that the water contact angle for the perfluorodecyltrichlorosilane (PFTS) treatment polyimide (PI) film is 112.0[Formula: see text], which is larger than the pure PI film [Formula: see text]. The rap oil contact angle is 84.2[Formula: see text], which is also much larger than the contact angle of PI film [Formula: see te

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10

SURESH, K. A., YUSHAN SHI, A. BHATTACHARYYA, and SATYENDRA KUMAR. "WETTING–DEWETTING TRANSITION AND CONFORMAL TO NON-CONFORMAL INTERFACIAL ROUGHNESS TRANSITION IN ULTRA-THIN LIQUID CRYSTAL FILMS ON SOLID SUBSTRATES." Modern Physics Letters B 15, no. 08 (April 10, 2001): 225–33. http://dx.doi.org/10.1142/s0217984901001628.

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High-resolution X-ray reflectivity has been employed to study the structure, wetting properties, and interfacial roughness of ultra-thin liquid crystal films. The films were prepared at the air–water interface and transferred on to glass substrates by a modified horizontal deposition technique. A 3-layer film was found to partially-wet the substrate in the nematic and isotropic phases and dewet upon cooling to the crystalline phase. The surface roughnesses at the air-film and the film-glass interfaces exhibited a gradual reversible but hysteretic conformal (strongly correlated) to non-conforma

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11

Santjojo, D. J. Djoko H., Masruroh, Sri Widyarti, and Fadli Robiandi. "Functionality of ZnPc Thin Film Deposited on Polystyrene Interlayer for Immobilization of Biomolecules in QCM Based Biosensor." Materials Science Forum 827 (August 2015): 266–70. http://dx.doi.org/10.4028/www.scientific.net/msf.827.266.

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Functionality of zinc pthalocyanine (ZnPc) thin film for immobilization of biomolecules was studied using bovine serum albumin (BSA). The functionality is affected by microstructures and surface roughness of the film. This studies is conducted by producing ZnPc films by means of thermal evaporation in vacuum. The ZnPc films were deposited on quartz crystal substrates with a polystyrene interlayer. Observations were carried out using a scanning electron microscope and an optical micro-profilometry. Enhancement of the functionality is observed with the increase of the film thickness. Surface rou

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12

Guangteng, G., P. M. Cann, A. V. Olver, and H. A. Spikes. "Lubricant Film Thickness in Rough Surface, Mixed Elastohydrodynamic Contact." Journal of Tribology 122, no. 1 (July 14, 1999): 65–76. http://dx.doi.org/10.1115/1.555330.

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A spacer layer imaging method has been employed to map lubricant film thickness in very thin film, rough surface, rolling elastohydrodynamic (EHD) contacts. A series of model roughnesses have been produced by depositing tiny ridges and bumps on a steel ball surface and the influence of these features on film thickness has been investigated at a range of rolling speeds. It has been shown that all the model surface features studied form speed-dependent, micro-EHD lubricating films, but the detailed shape and thickness of these films depends upon the geometry of the feature and the rolling speed.

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13

Ji, H., and G. S. Was. "Mechanism of in-plane texture development by ion-beam-assisted deposition." Journal of Materials Research 14, no. 6 (June 1999): 2524–32. http://dx.doi.org/10.1557/jmr.1999.0338.

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The objective of this work was to determine the mechanism of in-plane texture development in films made by ion-beam-assisted deposition (IBAD). Both in-plane texture and surface roughness were studied as functions of film thickness. A phenomenological growth model based on the preferential growth of aligned grains due to channeling was proposed, linking the surface roughness evolution and texture development. Good correlation was found between the measured roughness and the model prediction, as well as between the roughness evolution and the in-plane texture development. A critical thickness w

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14

Mohd Dahan, Rozana, Muhamad Naiman Sarip, Yap Seong Ling, Mohamad Hafiz Mohd Wahid, Adillah Nurashikin Arshad, Norlida Kamarulzaman, and Dzaraini Kamarun. "Surface Modification of Polyvinylidenefluoride-Trifluoroethylene Film Using Argon Gas Plasma." Advanced Materials Research 626 (December 2012): 317–23. http://dx.doi.org/10.4028/www.scientific.net/amr.626.317.

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This study investigates the surface properties of plasma surface modified spin coated PVDF-TrFE (70/30) film using Atomic Force Microscopy (AFM), Water Contact Angle (WCA) and X-ray Photoelectron Spectroscopy (XPS). The surfaces of the spin coated PVDF-TrFE film were modified using 13.56 MHz rf Argon plasma. The exposure time of the charged particle PVDF-TrFE films were varied for 1, 3 and 5mins. Prior to modification, the average surface roughness obtained was 8.615nm, but upon modification, the surface roughness was found to increase to 12.466nm. The value of the contact angle of the modifie

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15

Park, Min Woo, Wang Woo Lee, Jae Gab Lee, and Chong Mu Lee. "A Comparison of the Mechanical Properties of RF- and DC- Sputter-Deposited Cr Thin Films." Materials Science Forum 546-549 (May 2007): 1695–98. http://dx.doi.org/10.4028/www.scientific.net/msf.546-549.1695.

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Chromium (Cr) films were deposited on plain carbon steel sheets by DC and RF magnetron sputtering as well as by electroplating. Effects of DC or RF sputtering power on the deposition rate and properties such as hardness and surface roughness of the Cr films were investigated. X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microcopy (SEM) analyses were performed to investigate the crystal structure, surface roughness, thickness of the Cr films. The deposition rate, hardness and surface roughness of the Cr film deposited by either DC or RF sputtering increase with the

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16

Topolovec-Miklozic, Ksenija, T. Reg Forbus, and Hugh A. Spikes. "Film thickness and roughness of ZDDP antiwear films." Tribology Letters 26, no. 2 (January 9, 2007): 161–71. http://dx.doi.org/10.1007/s11249-006-9189-2.

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17

Du, Yuanying, and Ming Li. "Effects on lubrication characteristics of water-lubricated rubber bearings with journal tilting and surface roughness." Proceedings of the Institution of Mechanical Engineers, Part J: Journal of Engineering Tribology 234, no. 2 (June 20, 2019): 161–71. http://dx.doi.org/10.1177/1350650119858573.

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To study the effect of surface roughness on the lubrication characteristics of water-lubricated rubber bearings (WLRBs) when the stern shaft is tilted, the surface roughness of the bearings was measured by a surface roughness measuring instrument. Considering the tilting stern shaft and surface roughness, a mathematical model was constructed and water film thickness equation was deduced. By adopting the finite difference method, the film thickness and pressure distribution of WLRBs with tilt angle and roughness were analysed. The effects of tilt angle on film thickness and pressure under diffe

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18

Lin, Jian Liang, Brajendra Mishra, Malki Pinkas, and John J. Moore. "Pulsed Closed Field Unbalanced Magnetron Sputtering (P-CFUBMS) Deposited TiC/a:C Thin Films." Materials Science Forum 561-565 (October 2007): 1177–80. http://dx.doi.org/10.4028/www.scientific.net/msf.561-565.1177.

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TiC/a:C nanocomposite thin film has proven to be a worthy material selection as a thin film for tribological applications due to its low coefficient of friction, good wear resistance and high hardness. In the current study TiC/a:C thin films with carbon concentration near 55-62 at % were deposited via pulsed closed field unbalanced magnetron sputtering (P-CFUBMS) in pure argon atmosphere with different substrate bias voltages and onto 440C stainless steel substrate with different substrate roughness. It was found that the TiC/a:C film hardness and elastic modulus were increased from 18.5 GPa t

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19

Mitsuya, Y., and T. Hayashi. "Numerical Study of Film Thickness Averaging in Compressible Lubricating Films Incurring Stationary Surface Roughness." Journal of Tribology 112, no. 2 (April 1, 1990): 230–37. http://dx.doi.org/10.1115/1.2920246.

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The compressibility effects of lubricating films incurring a roughness on film thickness averaging were studied numerically with a focus on the physical interpretation of the roughness effects. A numerical comparison between load-carrying capacities resulting from rough film thickness and from averaged film thickness are presented for a wide range of bearing numbers up to 107. It is found that currently indicated particular features such as the appearance of the maximum or minimum load-carrying capacity can be induced from the superimposition of local compressibility effects (LCEs) caused by i

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20

Faezahana, Mokhter, Nayan Nafarizal, Jia Wei Low, Che Ani Norhidayah, Mohd Zainizan Sahdan, Mohd Khairul Ahmad, Ali Yeon Md Shakaff, Zakaria Ammar, and Mohd Zain Ahmad Faizal. "2D and 3D Analyses of Metal Oxide Thin Films Examined by Atomic Force Microscope." Applied Mechanics and Materials 773-774 (July 2015): 716–19. http://dx.doi.org/10.4028/www.scientific.net/amm.773-774.716.

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Atomic force microscope (AFM) is a useful tool to capture the two- and three-dimensional image of height and size of nanostructured thin film. It operate by measuring the forces between a sharp tip and surface of the measured sample. In addition, AFM is equipped with powerful software for image processing to interpret experimental results in detail. For example, by using the height and scanning length parameters of measured sample, average roughness and root mean square roughness can be evaluated. In the present works, the effect of image flattening process toward the surface roughness and sur

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21

Kago, Keitaro, Hitoshi Endo, Hideki Matsuoka, Hitoshi Yamaoka, Nozomu Hamaya, Masahiko Tanaka, and Takeharu Mori. "Characterization of Thin Polymer Films by X-ray Reflectometry with Synchrotron Radiation." Journal of Synchrotron Radiation 5, no. 5 (September 1, 1998): 1304–8. http://dx.doi.org/10.1107/s0909049598006797.

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X-ray reflectivity (XR) measurements with a synchrotron radiation source were carried out for thin polymer films on a glass plate. From the XR data, the film thickness and surface and interface roughnesses could be determined. In addition, the appropriate conditions and precision for measurements were also discussed. Kiessig fringes were observed clearly for specular XR measurements of poly(methylmethacrylate) thin film. Analysis of the XR data allowed the determination of the film thickness very precisely. By a curve-fitting procedure of the XR profile, the film-surface roughness and film–sub

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22

Huang, Jen Ching, Yi Chia Liao, Huail Siang Liu, and Fu Jen Cheng. "The Study on Deposition Process and Mechanical Properties of Deposited Cu Thin Films Using Molecular Dynamics." Advanced Materials Research 684 (April 2013): 37–41. http://dx.doi.org/10.4028/www.scientific.net/amr.684.37.

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This paper studies the deposition process and mechanical properties of Cu thin films deposited on single crystal copper substrates with various surface roughnesses by molecular dynamics (MD). In the effect of vacancy concentration (Cv) of substrate, the Young's modulus of sample decreased as the Cv of substrate increased but the adhesion force will increase as the Cv of substrate increases. The effect of substrate roughness on the peak intensity of crystal orientation has little. And the greater Cv of substrate, the surface roughness of the deposited thin film also increased. In the effect of

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23

Li, Wang-Long. "Ultra-Thin Gas Squeeze Film Characteristics for Infinitely Large Squeeze Number." Journal of Tribology 120, no. 4 (October 1, 1998): 750–57. http://dx.doi.org/10.1115/1.2833775.

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In this study, the characteristics of ultra-thin gas films are analyzed asymptotically for infinite squeeze number using the molecular gas film lubrication equation with coupled roughness and rarefaction effects taken into consideration. The governing equation of the internal region was obtained by a time averaged technique, and the boundary conditions were obtained numerically from the matching conditions near the boundaries. Two new functions, H and H−1 were proposed for deriving the matching equation near the boundary. Finally, the characteristics of squeeze film bearings with infinite widt

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24

Amorsolo, Alberto V., Paul D. Funkenbusch, and Alan M. Kadin. "Atomic force microscope investigation of the thermal stability of thin TiSi2 films." Journal of Materials Research 13, no. 7 (July 1998): 1938–49. http://dx.doi.org/10.1557/jmr.1998.0273.

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The thermal stability of TiSi2 films on Si has been studied using the atomic force microscope (AFM). Changes in the surface roughness, film morphology, and sheet resistance were monitored during a series of rapid thermal annealing treatments. A linear increase of the root-mean-square (rms) roughness with time was observed during the early stages of degradation, in agreement with a surface diffusion model of thermal grooving, followed by an apparent saturation roughness that was attributed to the effective rupture of the film.

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25

Müller, Robert, Lilit Ghazaryan, Paul Schenk, Sabrina Wolleb, Vivek Beladiya, Felix Otto, Norbert Kaiser, Andreas Tünnermann, Torsten Fritz, and Adriana Szeghalmi. "Growth of Atomic Layer Deposited Ruthenium and Its Optical Properties at Short Wavelengths Using Ru(EtCp)2 and Oxygen." Coatings 8, no. 11 (November 20, 2018): 413. http://dx.doi.org/10.3390/coatings8110413.

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High-density ruthenium (Ru) thin films were deposited using Ru(EtCp)2 (bis(ethylcyclopentadienyl)ruthenium) and oxygen by thermal atomic layer deposition (ALD) and compared to magnetron sputtered (MS) Ru coatings. The ALD Ru film growth and surface roughness show a significant temperature dependence. At temperatures below 200 °C, no deposition was observed on silicon and fused silica substrates. With increasing deposition temperature, the nucleation of Ru starts and leads eventually to fully closed, polycrystalline coatings. The formation of blisters starts at temperatures above 275 °C because

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26

Yu, Ping, Guo-Bing Hu, Yun-Fei Tian, Ding-Quan Xiao, Yang Liu, and Qing-Wu Guo. "Synthesis and Photoluminescent Properties of Nanocrystalline CaMoO4 Thin Film via Chemical Solution Processing." Journal of Nanoscience and Nanotechnology 8, no. 5 (May 1, 2008): 2651–54. http://dx.doi.org/10.1166/jnn.2008.422.

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Stoichiometric CaMoO4 thin film was successfully fabricated based on chemical solution processing. The thin films were deposited on Si(100) substrates by means of the spin-coating technique. X-ray diffraction reveals that the CaMoO4 thin film prepared are pure and well crystalline thin films. Atom Force Microscope photographs indicate that the film prepared possesses a homogeneous and dense surface morphology. The average grain size of the films was 40–50 nm, and the root-mean-square (RMS) of the surface roughness and the average surface roughness of the film measured were 2.161 nm and 1.726 n

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Kosykh, T. B., A. S. Prosyakov, A. P. Pyatakov, Alexander N. Shaposhnikov, Anatoly R. Prokopov, and Irene V. Sharay. "Surface Properties of Nanoscale Iron Garnet Films." Solid State Phenomena 233-234 (July 2015): 678–81. http://dx.doi.org/10.4028/www.scientific.net/ssp.233-234.678.

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Surface properties of nanoscale iron garnet films of different compositions prepared by reactive ion beam sputtering were examined by means of scanning probe microscopy. Atomic force microscope images of the film surfaces are represented for the films of different compositions and deposition times. The article presents the dependences of the roughness parameters on the film composition and thickness and on the energy of Ar+ ions by which the substrates were pre-treated. It was shown that the roughness parameters of the films' surface increase with the increase of Ar+ ions energy and the films'

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Zhan, Chao, Wen Jian Ke, Xin Ming Li, Wan Li Du, Li Juan Wang, and Cong Ye. "The Influence of Substrate Temperature on the Morphological and Optical Properties of ZnTiO₃ Thin Films Prepared by Magnetron Sputtering." Advanced Materials Research 804 (September 2013): 3–7. http://dx.doi.org/10.4028/www.scientific.net/amr.804.3.

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Cubic ZnTiO3thin films have been prepared by radio frequency magnetron sputtering on n-type (100) Si substrate at different temperatures. The morphological and optical properties of ZnTiO3films in relation to substrate temperatures are investigated by spectroscopic ellipsometry (SE) and AFM as well as SEM in detail. X-ray diffraction (XRD) measurement shows that all the films have a cubic phase structure and the optimum substrate temperature to form crystalline ZnTiO3thin film is 250 °C. Through SEM and AFM, the particle size in thin films and film surface roughness increase with increasing th

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Choi, Won Seok, Young Park, Jin Hyo Boo, Junsin Yi, and Byung You Hong. "Synthesis and Characterization of Ce-Doped BZT Thin Films Deposited by a RF Magnetron Sputtering Method." Key Engineering Materials 321-323 (October 2006): 1336–39. http://dx.doi.org/10.4028/www.scientific.net/kem.321-323.1336.

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We investigated the structural and electrical properties of the 0.5% Ce-doped Ba(ZrxTi1-x)O3 (BZT) thin films with a mole fraction of x=0.2 and a thickness of 150 nm for the MLCC (Multilayer Ceramic Capacitor) application. Ce-doped BZT films were prepared on Pt/Ti/SiO2/Si substrates by a RF magnetron sputtering system as a function of Ar/O2 ratio and substrate temperature. X-ray diffraction patterns were recorded for the samples deposited with three different substrate temperatures. The thickness and the surface roughness of the films deposited with different Ar/O2 ratios were measured. The ox

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Kairaitis, Gediminas, and Arvaidas Galdikas. "Modelling of Phase Structure and Surface Morphology Evolution during Compound Thin Film Deposition." Coatings 10, no. 11 (November 9, 2020): 1077. http://dx.doi.org/10.3390/coatings10111077.

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The dependences of the surface roughness and the phase structure of compound thin films on substrate temperature and flux of incoming particles are investigated by a proposed mathematical model. The model, which describes physically deposited thin compound film growth process is based on the Cahn–Hilliard equation and includes processes of phase separation, adsorption, and diffusion. In order to analyze large temperature range and assuming deposition of energetic particles, the diffusion is discriminated into thermal diffusion, radiation-enhanced diffusion, and ion beam mixing. The model is ad

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Miksis, Michael J., and Stephen H. Davis. "Slip over rough and coated surfaces." Journal of Fluid Mechanics 273 (August 25, 1994): 125–39. http://dx.doi.org/10.1017/s0022112094001874.

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We study the effect of surface roughness and coatings on fluid flow over a solid surface. In the limit of small-amplitude roughness and thin lubricating films we are able to derive asymptotically an effective slip boundary condition to replace the no-slip condition over the surface. When the film is absent, the result is a Navier slip condition in which the slip coefficient equals the average amplitude of the roughness. When a layer of a second fluid covers the surface and acts as a lubricating film, the slip coefficient contains a term which is proportional to the viscosity ratio of the two f

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Fan, Rong, Lin Jun Wang, Jian Huang, Ke Tang, Ji Jun Zhang, Wei Min Shi, and Yi Ben Xia. "ZnO Films Deposited on Various Diamond Film Substrates with Different Surface Roughness." Advanced Materials Research 287-290 (July 2011): 2347–50. http://dx.doi.org/10.4028/www.scientific.net/amr.287-290.2347.

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ZnO thin films were deposited by radio frequency (R. F.) magnetron sputtering on various diamond film substrates with different surface roughness. The influence of surface roughness on structural properties and surface morphology of ZnO thin films was investigated by X-ray diffraction (XRD) and atom force microscopy (AFM), respectively. Only on the nanocrystalline and free-standing diamond substrates, ZnO films with preferential c-axis orientation and smooth surface were obtained.

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33

Zhang, Zhong Shan, Liang Tang, and Lei Ji. "Preparation of AlN Thin Film Deposited on SiO₂ for Improving Temperature Frequency Coefficient of FBAR Used in CSACs." Advanced Materials Research 1004-1005 (August 2014): 791–94. http://dx.doi.org/10.4028/www.scientific.net/amr.1004-1005.791.

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AlN films were deposited by RF magnetron sputtering on the SiO2films with different thickness. Preferred orientation, grain size, surface roughness and grain growth of the AlN films were characterized by X-ray diffraction (XRD), atomic force microscopy (AFM) and field-emission scanning electron microscopy (FESEM). It's found that when the thickness of SiO2films are 100 nm and 200 nm, the AlN films have characteristics of good C-axis preferred orientation, good surface roughness and vertical grain growth, which are suitable for application in thin film bulk acoustic wave resonators (FBARs). Whe

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34

Boutaous, M’hamed, and Patrick Bourgin. "Macroscopic Effects of Surface Roughness in Confined Air Flow." Journal of Fluids Engineering 126, no. 2 (March 1, 2004): 216–22. http://dx.doi.org/10.1115/1.1669034.

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The general framework deals with the winding of thin plastic films, in order to obtain good-quality rolls. This issue is tightly connected to the thickness of the residual air layer entrapped between the film layers. It is then of importance to optimize the surface topography of the films so that to improve the quality of the wound rolls. In a previous work, we proposed a simple model for the flow of an air layer squeezed between a solid smooth substrate and a plastic film sample: it was shown experimentally that the macroscopic characteristics of the flow are connected to the film roughness,

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35

Jiang, Aihua, Jianrong Xiao, Xinyu Li, and Zhiyong Wang. "Effect of Structure, Composition, and Micromorphology on the Hydrophobic Property of F-DLC Film." Journal of Nanomaterials 2013 (2013): 1–7. http://dx.doi.org/10.1155/2013/690180.

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Fluorinated diamond-like carbon (F-DLC) films were prepared by radio frequency plasma-enhanced chemical vapor deposition technique with CF4and CH4as source gases under different deposition conditions. The chemical bonding structure and composition of the films were detected by Raman, Fourier transform infrared absorption spectrometry (FTIR), and X-ray photoelectron spectroscopy (XPS) characterization. The micromorphology and surface roughness of the film were observed and analyzed by atomic force microscopy (AFM). The results indicated that all the prepared films presented a diamond-like carbo

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36

Kamat, Sandip V., Vijaya Puri, and R. K. Puri. "The Effect of Film Thickness on the Structural Properties of Vacuum Evaporated Poly(3-methylthiophene) Thin Films." ISRN Polymer Science 2012 (March 21, 2012): 1–8. http://dx.doi.org/10.5402/2012/570363.

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This paper reports on the structural properties of poly(3-methylthiophene) P3MeT thin films prepared by vacuum evaporation on the glass substrates. The structural and surface morphology, wettability, adhesion, and intrinsic stress of these thin films were studied for three different thicknesses. The variation of the film thickness affects the structure, surface, and mechanical properties of P3MeT thin films. Vapor chopping also strongly influences the surface morphology, surface roughness, and wettability of the thin films. It was found that there is a decrease in the intrinsic stress and (RMS

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37

CATTANI, M., A. R. VAZ, R. S. WIEDERKEHR, F. S. TEIXEIRA, M. C. SALVADORI, and I. G. BROWN. "INFLUENCE OF ELECTRON SCATTERING FROM MORPHOLOGICAL GRANULARITY AND SURFACE ROUGHNESS ON THIN FILM ELECTRICAL RESISTIVITY." Surface Review and Letters 14, no. 01 (February 2007): 87–91. http://dx.doi.org/10.1142/s0218625x07009116.

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We report electrical resistivity measurements of platinum and gold thin films over a range of film thickness d(1.3 ≤ d ≤ 11.7 nm ), together with associated measurements of the film morphological and crystallographic grain size. The resistivity results are compared to predictions of the Fuchs–Sondheimer and the Mayadas–Shatzkes models, based on the electron mean free path and crystallographic grain size, and the agreement is not satisfactory. We describe an alternative model based on elastic electron scattering with morphological granularity (grain structure as measured on the film surface) an

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38

Domingues, Gláucia, Michele de Almeida Oliveira, Nayne Barros Gonzaga Ferreira, Bhetina Cunha Gomes, Elivelton Alves Ferreira, and Ladário da Silva. "Effect of fluoride on the thickness, surface roughness and corrosion resistance of titanium anodic oxide films formed in a phosphate buffer solution at different applied potentials." Research, Society and Development 9, no. 11 (December 9, 2020): e95791110689. http://dx.doi.org/10.33448/rsd-v9i11.10689.

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The anodizing process and anions type present in the electrolyte during anodic oxidation are important parameters to improve oxide biocompatibility. From these parameters, it is possible to control the thickness and surface roughness of the oxide film. This control is of major importance, once blood clots can be avoided when the oxide film on the metal substrate has a small surface roughness (Ra ≤ 50 nm). In this paper, the thickness, surface roughness, and corrosion resistance of the anodized titanium film were studied in a phosphate buffer solution containing fluoride anions (0.6 w.t % NaF),

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Sarip, Muhamad Naiman, Rozana Mohd Dahan, Yap Seong Ling, Mohamad Hafiz Mohd Wahid, Adillah Nurashikin Arshad, and Dzaraini Kamarun. "Effect of Exposure Time on Plasma Modified Polyvinylidenefluoride-Trifluoroethylene (PVDF-TrFE) Film Surfaces." Advanced Materials Research 895 (February 2014): 138–41. http://dx.doi.org/10.4028/www.scientific.net/amr.895.138.

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This study investigates the plasma surface modified spin coated PVDF-TrFE (70/30) film of 200nm thick using Atomic Force Microscopy (AFM), Water Contact Angle (WCA) and Fourier Transform Infrared Spectroscopy (FTIR). The surface of the spin coated PVDF-TrFE film were modified using 13.56 MHz rf Argon plasma. The exposure time of the charged particle on PVDF-TrFE films were varied for 1, 3, 5, 7 and 9mins. Prior to modification, the average surface roughness observed was 3.5nm. However upon modification, the surface roughness was increased to 9.5nm. The contact angle of the surface modified fil

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40

Beaulieu, L. Y., A. D. Rutenberg, and J. R. Dahn. "Measuring Thickness Changes in Thin Films Due to Chemical Reaction by Monitoring the Surface Roughness with In Situ Atomic Force Microscopy." Microscopy and Microanalysis 8, no. 5 (October 2002): 422–28. http://dx.doi.org/10.1017/s1431927602010309.

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Measuring the changing thickness of a thin film, without a reference, using an atomic force microscope (AFM) is problematic. Here, we report a method for measuring film thickness based on in situ monitoring of surface roughness of films as their thickness changes. For example, in situ AFM roughness measurements have been performed on alloy film electrodes on rigid substrates as they react with lithium electrochemically. The addition (or removal) of lithium to (or from) the alloy causes the latter to expand (or contract) reversibly in the direction perpendicular to the substrate and, in princip

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41

Cheng, Hong Ho, and C. C. Chen. "Chemical-Assisted Mechanical Polishing of Diamond Film on Wafer." Materials Science Forum 505-507 (January 2006): 1225–30. http://dx.doi.org/10.4028/www.scientific.net/msf.505-507.1225.

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Diamond has been well recognized a strategic engineering material. It possesses excellent physical and chemical properties including the highest hardness and thermal conductivity, and good resistance to chemical erosion. Although CVD diamond film has good potential outstanding properties, its industrial applications have been limited by the non-uniform thickness and rough surface. In the current study, the CVD diamond film is polished by the chemical-assisted mechanical method with different slurries. These slurries contain strong oxidation chemical and diamond powder. During the process, the

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42

Kumar, Ranganathan, Matthias Gottmann, and K. R. Sridhar. "Film Thickness and Wave Velocity Measurements in a Vertical Duct." Journal of Fluids Engineering 124, no. 3 (August 19, 2002): 634–42. http://dx.doi.org/10.1115/1.1493808.

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This paper describes the experimental investigation of an upward annular air-water flow in a duct with a 6.35 mm by 63.5 mm rectangular cross section. The test section was instrumented to measure the film thickness and the interfacial wave velocity. Flush-wire electrical conductivity probes were used to obtain local film thickness measurement with a spatial resolution of 200 μm or better and a temporal resolution greater than 2 kHz. Measurements of the base films range from 50 μm to ∼325 μm (2% to 10% of half-channel thickness). Statistical analysis shows that the standard deviation of the fil

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43

Olver, A. V., and D. Dini. "Roughness in lubricated rolling contact: The dry contact limit." Proceedings of the Institution of Mechanical Engineers, Part J: Journal of Engineering Tribology 221, no. 7 (July 1, 2007): 787–91. http://dx.doi.org/10.1243/13506501jet318.

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A difficulty with the standard fast Fourier transform (FFT) perturbation model of roughness in lubricated rolling contacts is that it does not necessarily converge towards the elastic case as the film thickness is reduced; rather it leads to a situation in which all the roughness is completely flattened. This is rarely the case for real engineering surfaces. Here, it is shown that this difficulty can be avoided by carrying out a Fourier transform of the elastostatically flattened roughness and using the resulting (complex) amplitude as the low-film thickness limit of each Fourier component in

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44

Tian, Zhong, Han Yan, Qing Peng, Lin Jay Guo, Shengjun Zhou, Can Ding, Peng Li, and Qi Luo. "Atomistic Insights into Aluminum Doping Effect on Surface Roughness of Deposited Ultra-Thin Silver Films." Nanomaterials 11, no. 1 (January 10, 2021): 158. http://dx.doi.org/10.3390/nano11010158.

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Ultra-thin and continuous metallic silver films are attracting growing interest due to the applications in flexible transparent conducting electrodes. The surface morphology and structure of silver film are very important for its electrical resistivity and optical loss. Therefore, roughness control is essential for the production of ultra-thin metallic electrode film. We have investigated the effect of aluminum doping on the improvement of surface morphology of ultra-thin silver films using molecular dynamics simulations. Al-doped silver films showed smaller surface roughness than pure silver

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45

Tian, Zhong, Han Yan, Qing Peng, Lin Jay Guo, Shengjun Zhou, Can Ding, Peng Li, and Qi Luo. "Atomistic Insights into Aluminum Doping Effect on Surface Roughness of Deposited Ultra-Thin Silver Films." Nanomaterials 11, no. 1 (January 10, 2021): 158. http://dx.doi.org/10.3390/nano11010158.

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Ultra-thin and continuous metallic silver films are attracting growing interest due to the applications in flexible transparent conducting electrodes. The surface morphology and structure of silver film are very important for its electrical resistivity and optical loss. Therefore, roughness control is essential for the production of ultra-thin metallic electrode film. We have investigated the effect of aluminum doping on the improvement of surface morphology of ultra-thin silver films using molecular dynamics simulations. Al-doped silver films showed smaller surface roughness than pure silver

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46

Liu, Er Bao, Xiu Fang Cui, Guo Jin, Qing Fen Li, and Tian Min Shao. "Effect of Niobium Film on Corrosion Resistance of AZ91D Magnesium Alloy." Key Engineering Materials 525-526 (November 2012): 9–12. http://dx.doi.org/10.4028/www.scientific.net/kem.525-526.9.

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The niobium film is prepared by magnetron sputtering on the surface of the AZ91D magnesium alloy. The morphology, phase structure, roughness, nanohardness and elastic modulus of the niobium films were studied by filed emission scanning electron microscope, X-ray diffraction, atomic force microscope and nanoindentation respectively. The influences of film deposition parameters, such as substrate temperature, negative bias and power on the properties of films were investigated. The corrosion resistance of niobium films on magnesium alloy was investigated by electrochemical system. Results show t

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47

Renner, Robert F., and KNona C. Liddell. "Roughness development in electrodeposited ultrathin cobalt and nickel layers." Journal of Materials Research 15, no. 2 (February 2000): 458–62. http://dx.doi.org/10.1557/jmr.2000.0069.

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For both Co and Ni, a series of electrodeposited films of varying thickness (2–10 nm) was grown under otherwise identical conditions using potentiostatic control. The substrates were pieces of Si wafer onto which a Cu basal layer had been thermally evaporated. Contact mode atomic force microscopy was used to measure both the root-mean-square peak height (nm) and the areal peak density (μm−2) of each film. Root-mean-square (rms) peak heights for Co initially increase with film thickness and then plateau at a layer thickness of 3 nm. For Ni, the rms peak heights increase almost linearly for laye

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48

Miyagawa, Shingo, Tomoyuki Suzuki, Takahiro Kudo, and Masataka Satoh. "Encapsulating Annealing of N⁺ Implanted 4H-SiC by Diamond-Like-Carbon Film." Materials Science Forum 556-557 (September 2007): 583–86. http://dx.doi.org/10.4028/www.scientific.net/msf.556-557.583.

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The encapsulating annealing of N+ implanted 4H-SiC(0001) is performed using diamondlike- carbon (DLC) films for the suppression of surface roughening. 4H-SiC(0001) sample with an off-orientation of 8o is multiply implanted by N+ with energy ranging from 15 to 120 keV at a total dose of 2.4×1015 cm-2 at room temperature. DLC films with thickness ranging from 0.3 to 1.8 μm are deposited on the surface of implanted sample using plasma-based ion implantation equipment with C2H4 gas. The DLC capped sample is annealed at 1500 oC for 5 min using IR image annealer. After annealing, DLC film is removed

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Zeng, Ling Jun, Shuang Juan Shen, Qian Feng, Jian Min Zhang, Zhi Gao Chen, and Zhi Gao Huang. "The Growth, Surface Topography and Curie Temperature in Ni Thin Films: Kinetic Lattice Monte Carlo Simulation." Advanced Materials Research 150-151 (October 2010): 493–98. http://dx.doi.org/10.4028/www.scientific.net/amr.150-151.493.

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Based on the Monte Carlo (MC) simulation, the film growth and magnetic properties of Ni (100) films are investigated. The simulated results indicate that the surface roughness of the Ni films drops with the increase of the substrate temperature and the decrease of the deposition rate. The Curie temperature Tc is greatly influenced by the surface roughness and size of Ni films. Moreover, it is found that the Curie temperatures of the films are related to the mean coordination number Z and the surface roughness r. The simulated results explain the experimental facts well.

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Rogozhin, Alexander, Andrey Miakonkikh, Elizaveta Smirnova, Andrey Lomov, Sergey Simakin, and Konstantin Rudenko. "Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor." Coatings 11, no. 2 (January 21, 2021): 117. http://dx.doi.org/10.3390/coatings11020117.

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Ruthenium thin films were deposited by plasma-enhanced atomic layer deposition (PEALD) technology using Ru(EtCp)2 and oxygen plasma on the modified surface of silicon and SiO2/Si substrates. The crystal structure, chemical composition, and morphology of films were characterized by grazing incidence XRD (GXRD), secondary ion mass spectrometry (SIMS), and atomic force microscopy (AFM) techniques, respectively. It was found that the mechanism of film growth depends crucially on the substrate temperature. The GXRD and SIMS analysis show that at substrate temperature T = 375 °C, an abrupt change in

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