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Gotowa bibliografia na temat „Multilayers”

Autor: Grafiati

Data publikacji: 4 czerwca 2021

Data aktualizacji: 9 czerwca 2025

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Artykuły w czasopismach na temat "Multilayers"

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Park, Geun Woo, and Hyuck Sang Kwon. "Structural and Mechanical Properties of Multilayered CVD TiC/TiCN Coatings with Variations of Multilayer Period." Materials Science Forum 534-536 (January 2007): 1233–36. http://dx.doi.org/10.4028/www.scientific.net/msf.534-536.1233.

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Multilayered coatings on tungsten carbide cutting tools are widely used for enhancing cutting performance. In this paper, we review the CVD TiC/TiCN multilayer as a function of the multilayer period. The TiC/TiCN multilayers in initial stage show preferred (220) orientation but shifts to (200) orientation with decreasing multilayer period. The nanohardness of TiC/TiCN multilayers were found to increase with decreasing multilayer period and shows a maximum of 23.8 GPa at a period = 33.5 nm.

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Kaneko, Yoshihisa, H. Sakakibara, and Satoshi Hashimoto. "Dependence of Vickers Hardness on Annealing Temperature at Co/Cu Multilayered Films." Materials Science Forum 561-565 (October 2007): 2399–402. http://dx.doi.org/10.4028/www.scientific.net/msf.561-565.2399.

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Co/Cu and Ni/Cu multilayers fabricated by electroplating technique were annealed at various temperatures in order to investigate thermal stability of multilayered structures. Vickers hardness tests on the annealed Co/Cu and Ni/Cu multilayers were conducted at room temperature. It was recognized that after the annealing at 1023K the Co/Cu multilayer still maintained the hardness of as-deposited state. On the other hand, the hardness of Ni/Cu multilayer was almost identical to copper substrate after the annealing at 903K.

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Kaneko, Yoshihisa, T. Sanda, and Satoshi Hashimoto. "Microstructures of Ni/Cu and Ni-Co/Cu Multilayers Produced by Electrodeposition Method." Advanced Materials Research 26-28 (October 2007): 1321–24. http://dx.doi.org/10.4028/www.scientific.net/amr.26-28.1321.

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Microstructures of Ni/Cu and Ni-Co/Cu multilayers were investigated by X-ray diffraction analysis. These multilayered structures were fabricated on copper substrates using electrodeposition technique. At an as-deposited Ni/Cu multilayer with the layer thickness of h=5nm, a single diffraction peak appeared, although the multilayer of h=100nm exhibited the diffractions splitting into two peaks which resulted from both the Ni and Cu layers. In the Ni-Co/Cu multilayers, it was found that composition of the Ni-Co layer depended on an electric potential applied during deposition. The fcc and hcp structures were detected at the Ni-rich and the Co-rich deposits, respectively. The Vickers hardness of the Co-Ni/Cu multilayer was higher than that of the Ni/Cu multilayer.

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Sattler, Margaret L., and Michael A. O'Keefe. "HRTEM simulation of interfacial structure in amorphous multilayers." Proceedings, annual meeting, Electron Microscopy Society of America 47 (August 6, 1989): 466–67. http://dx.doi.org/10.1017/s0424820100154305.

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Multilayered materials have been fabricated with such high perfection that individual layers having two atoms deep are possible. Characterization of the interfaces between these multilayers is achieved by high resolution electron microscopy and Figure 1a shows the cross-section of one type of multilayer. The production of such an image with atomically smooth interfaces depends upon certain factors which are not always reliable. For example, diffusion at the interface may produce complex interlayers which are important to the properties of the multilayers but which are difficult to observe. Similarly, anomalous conditions of imaging or of fabrication may occur which produce images having similar traits as the diffusion case above, e.g., imaging on a tilted/bent multilayer sample (Figure 1b) or deposition upon an unaligned substrate (Figure 1c). It is the purpose of this study to simulate the image of the perfect multilayer interface and to compare with simulated images having these anomalies.

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TAN, M., D. J. LI, G. Q. LIU, L. DONG, X. Y. DENG, H. LIU, and X. SUN. "STRUCTURES AND MECHANICAL PROPERTIES OF MODULATED ZrB2/W AND ZrB2/WNx NANOMULTILAYERS." International Journal of Modern Physics B 24, no. 01n02 (January 20, 2010): 34–42. http://dx.doi.org/10.1142/s0217979210063958.

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ZrB 2, W , WN x coatings and ZrB 2/ W , ZrB 2/ WN x multilayered coatings have been synthesized by ion beam assisted deposition at room temperature. X-ray diffraction (XRD), XP-2 surface profiler, scanning electron microscopy (SEM) and nano indenter were employed to investigate the influence of modulation periods and N + beam bombardment on microstructure and mechanical properties of the coatings. The low-angle XRD patterns and cross-sectional SEM indicate a well-defined composition modulation and layer structure of the multilayers. The multilayers with modulation periods ranging from 9 to 16 nm without N + bombardment possessed higher hardness and elastic modulus than the rule-of-mixtures value of monolithic ZrB 2 and W coatings. The highest hardness was 24 GPa. N + bombardment to growing multilayers gave a significant contribution to mechanical property enhancement. When modulation period is 9.6 nm, ZrB 2/ WN x multilayer with 200 eV N + bombardment reveals the highest hardness (30.2 GPa) and elastic modulus. This hardest multilayer also showed the improved residual stress and fracture resistance.

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Li, Y. P., G. P. Zhang, and Z. G. Wang. "Strength and Plastic Deformation Behavior of Nano-Scale Au/Cu and Cr/Cu Multilayers." Advanced Materials Research 41-42 (April 2008): 3–8. http://dx.doi.org/10.4028/www.scientific.net/amr.41-42.3.

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Nano-scale Au/Cu multilayers were investigated by nano/microindentation. It was found that the hardness of the multilayers increases with decreasing individual layer thickness (λ), and shear band deformation can occur more easily in the multilayer with small λ. For comparison, the same experiments were also performed on Cr/Cu multilayers with the same layer structure. The results show that the Cr/Cu multilayer can be more effective in resisting shear band deformation than the Au/Cu multilayer. Finally, the λ dependence of shear band deformation and the difference between plastic deformation behaviors of the two multilayers were analyzed based on dislocation plasticity.

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Yue, Jian Ling, Wei Shi, and Ge Yang Li. "Modulation Structure and Superhardness Effect of VC/TiN Nano-Multilayer Films." Applied Mechanics and Materials 184-185 (June 2012): 1080–83. http://dx.doi.org/10.4028/www.scientific.net/amm.184-185.1080.

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A series of VC/TiN nano-multilayer films with various TiN layer thicknesses were synthesized by magnetron sputtering method. The relationship between the modulation structure and superhardness effect of the multilayer films were investigated. The results reveal that TiN below a critical layer thickness grows coherently with VC layers in multilayers. Correspondingly, the hardness and elastic modulus of the multilayers increase significantly. The maximum hardness and modulus achieved in these multilayers is 40.7GPa and 328GPa.With further increase in the TiN layer thickness, coherent structure of multilayers are destroyed, resulting in a remarkable decrease of hardness and modulus. The superhardness effect of multilayers is related to the three directional strains generated from the coherent structure.

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Buznikov, Nikita A., and Galina V. Kurlyandskaya. "Magnetoimpedance in Symmetric and Non-Symmetric Nanostructured Multilayers: A Theoretical Study." Sensors 19, no. 8 (April 12, 2019): 1761. http://dx.doi.org/10.3390/s19081761.

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Intensive studies of the magnetoimpedance (MI) effect in nanostructured multilayers provide a good phenomenological basis and theoretical description for the symmetric case when top and bottom layers of ferromagnet/conductor/ferromagnet structure have the same thickness and consist of one magnetic layer each. At the same time, there is no model to describe the MI response in multilayered films. Here, we propose the corresponding model and analyze the influence of the multilayer parameters on the field and frequency dependences of the MI. The approach is based on the calculation of the field distribution within the multilayer by means of a solution of lineralizied Maxwell equations together with the Landau–Lifshitz equation for the magnetization motion. The theoretical model developed allows one to explain qualitatively the main features of the MI effect in multilayers and could be useful for optimization of the film parameters. It might also be useful as a model case for the development of MI magnetic biosensors for magnetic biomarker detection.

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Kusi-Appiah, Aubrey E., Troy W. Lowry, Nicholas Vafai, David H. Van Winkle, and Steven Lenhert. "Fluid Lipid Multilayer Stabilization by Tetraethyl Orthosilicate for Underwater AFM Characterization and Cell Culture Applications." MRS Advances 2, no. 57 (2017): 3553–58. http://dx.doi.org/10.1557/adv.2017.502.

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ABSTRACTStabilization of surface supported fluid lipid multilayers for underwater characterization is an essential step in making them useful for scalable cell culture applications such as high throughput screening. To this end, we used tetraethyl orthosilicate (TEOS), recently shown to stabilize fluid lipid films while maintaining their fluidity and functionality under water, to stabilize lipid multilayer micropatterns of 1,2-dioleoyl-sn-glycero-3-phosphocholine (DOPC). The treated multilayers were immersed under water and successfully imaged by atomic force microscopy (AFM), a difficult feat to perform on fluid lipid multilayers without TEOS treatment. The treated lipid multilayer showed an average swelling of approximately 18% in water but remained stable during the imaging process. The TEOS-treated lipid multilayers also proved compatible with cell culture as HeLa, MDCK, and HEK cell types all adhered and grew in high numbers over the multilayers. The results obtained here open the door to the use of fluid lipid multilayers in biotechnology applications such as microarray based high throughput cell assays.

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Poulopoulos, Panagiotis, S. D. Pappas, Vassilios Kapaklis, P. E. Jönsson, E. T. Papaioannou, A. Delimitis, D. Trachylis, M. J. Velgakis, Efstathios I. Meletis, and C. Politis. "Growth and Magnetism of Natural Multilayers." Journal of Nano Research 15 (September 2011): 95–103. http://dx.doi.org/10.4028/www.scientific.net/jnanor.15.95.

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. In this work, we present a simple method to fabricate high quality Ni/NiO multilayers with the use of a single magnetron sputtering head. Namely, at the end of the deposition of each single Ni layer, air is let to flow into the vacuum chamber through a leak valve. Then, a very thin NiO layer (~ 1nm) is formed by natural oxidation. The process is reproducible and the result is the formation of a multilayer with excellent layering. Magnetization hysteresis loops recorded at 5 K and room temperature reveal a tendency for perpendicular magnetic anisotropy as the thickness of the individual Ni layers decreases. It is shown that the Ni/NiO interface has sizeable positive surface/interface anisotropy, i.e. it favors the development of perpendicular magnetic anisotropy. This is rather unusual for a Ni-based multilayered system and may render Ni/NiO multilayers useful for magneto-optical recording applications.

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Rozprawy doktorskie na temat "Multilayers"

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Yang, Fu-Liang. "Interdiffusion in metallic multilayers." Thesis, University of Cambridge, 1994. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.360566.

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Moffat, Jonathan. "Assembly of biopolymer multilayers." Thesis, University of East Anglia, 2007. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.435024.

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Conyers, James Scott. "Diffusion in metallic multilayers." Thesis, University of Cambridge, 2000. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.621609.

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Skubic, Björn. "Spin Dynamics and Magnetic Multilayers." Doctoral thesis, Uppsala University, Department of Physics, 2007. http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-8168.

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<p>Theoretical studies based on first-principles theory are presented for a number of different magnetic systems. The first part of the thesis concerns spin dynamics and the second part concerns properties of magnetic multilayers. The theoretical treatment is based on electronic structure calculations performed by means of density functional theory.</p><p>A method is developed for simulating atomistic spin dynamics at finite temperatures, which is based on solving the equations of motion for the atomic spins by means of Langevin dynamics. The method relies on a mapping of the interatomic exchange interactions from density functional theory to a Heisenberg Hamiltonian. Simulations are performed for various magnetic systems and processes beyond the reach of conventional micromagnetism. As an example, magnetization dynamics in the limit of large magnetic and anisotropy fields is explored. Moreover, the method is applied to studying the dynamics of systems with complex atomic order such as the diluted magnetic semiconductor MnGaAs and the spin glass alloy CuMn. The method is also applied to a Fe thin film and a Fe/Cr/Fe trilayer system, where the limits of ultrafast switching are explored. Current induced magnetization dynamics is investigated by calculating the current induced spin-transfer torque by means of density functional theory combined with the relaxation time approximation and semi-classical Boltzmann theory. The current induced torque is calculated for the helical spin-density waves in Er and fcc Fe, where the current is found to promote a rigid rotation of the magnetic order.</p><p>Properties of magnetic multilayers composed of magnetic and nonmagnetic layers are investigated by means of the Korringa-Kohn-Rostocker interface Green's function method. Multilayer properties such as magnetic moments, interlayer exchange coupling and ordering temperatures are calculated and compared with experiments, with focus on understanding the influence of interface quality. Moreover, the influence on the interlayer exchange coupling of alloying the nonmagnetic spacer layers with small amounts of a magnetic impurity is investigated.</p>

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Skubic, Björn. "Spin dynamics and magnetic multilayers /." Uppsala : Acta Universitatis Upsaliensis Acta Universitatis Upsaliensis, 2007. http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-8168.

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Baxter, C. S. "The structure of metal multilayers." Thesis, University of Cambridge, 1986. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.377256.

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Genc, Arda. "Phase Stability in Metallic Multilayers." The Ohio State University, 2008. http://rave.ohiolink.edu/etdc/view?acc_num=osu1204506282.

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Turner-Valle, Jennifer 1970. "Nonlinear multilayers as optical limiters." Diss., The University of Arizona, 1998. http://hdl.handle.net/10150/288788.

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In this work we present a non-iterative technique for computing the steady-state optical properties of nonlinear multilayers and we examine nonlinear multilayer designs for optical limiters. Optical limiters are filters with intensity-dependent transmission designed to curtail the transmission of incident light above a threshold irradiance value in order to protect optical sensors from damage due to intense light. Thin film multilayers composed of nonlinear materials exhibiting an intensity-dependent refractive index are used as the basis for optical limiter designs in order to enhance the nonlinear filter response by magnifying the electric field in the nonlinear materials through interference effects. The nonlinear multilayer designs considered in this work are based on linear optical interference filter designs which are selected for their spectral properties and electric field distributions. Quarter wave stacks and cavity filters are examined for their suitability as sensor protectors and their manufacturability. The underlying non-iterative technique used to calculate the optical response of these filters derives from recognizing that the multi-valued calculation of output irradiance as a function of incident irradiance may be turned into a single-valued calculation of incident irradiance as a function of output irradiance. Finally, the benefits and drawbacks of using nonlinear multilayer for optical limiting are examined and future research directions are proposed.

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Holmström, Erik. "Magnetism and Structure in Metallic Multilayers." Doctoral thesis, Uppsala University, Department of Physics, 2003. http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-3556.

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<p>The interplay between magnetism and structure has been studied in magnetic multilayers by electronic structure calculations based on density functional theory and analyzed in terms of models. The main ideas behind the Korringa-Kohn-Rostocker Green’s function method are described and the implementation of the coherent potential approximation is outlined.</p><p>A simple model for the bilinear magnetic interlayer coupling in metallic multilayers is derived that elucidates the main characteristics of the effect such as coupling period and origin of damping. An analysis of two exotic effects on the magnetic interlayer coupling, Fermi surface nesting and magnetic enhancement is also performed. The Fermi surface nesting in CuPd for the (110) direction is shown to induce a sharp peak in the magnetic interlayer coupling amplitude for a Fe/CuPd/Fe system when the Cu concentration is 60% in the CuPd alloy. The high magnetic susceptibility in Pd is shown to have strong influence on the magnetic interlayer coupling in a Fe/Pd/Fe (100) system where it changes the amplitude, phase and induces an offset.</p><p>The relation between surface structure and magnetic properties in metallic multilayers is investigated in terms of a theory that is based on a symbiosis between experiment and theory. By calculating the total magnetic moment of a sample for a large range of possible interface structures and comparing to experimental results for equivalent samples a parameter that describes the interface structure is determined. This parameter is then shown to be universal for the particular combination of elements in the structure both as regards the calculated total magnetic moment as well as the magnetic interlayer coupling and the critical temperatures. </p>

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Ajib, Rabih. "Propagation of light in Plasmonic multilayers." Thesis, Université Clermont Auvergne‎ (2017-2020), 2017. http://www.theses.fr/2017CLFAC040/document.

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La plasmonique vise à utiliser des nanostructures métalliques très petites devant la longueur d’onde pour manipuler la lumière. Les structures métalliques sont particulières parce qu’elles contiennent un plasma d’électrons libres qui conditionne complètement leur réponse optique. Notamment, lorsque la lumière se propage à proximité des métaux, sous forme de mode guidés comme les plasmons et les gap-palsmons, elle est souvent lente, présentant une vitesse de groupe faible. Dans ce travail, nous présentons une analyse physique qui permet de comprendre cette faible vitesse en considérant le fait que l’énergie se déplace à l’opposé de la lumière dans les métaux. Nous montrons que la vitesse de groupe est égale à la vitesse de l’énergie pour ces modes guidés, et proposons la notion de ralentissement plasmonique. Finalement, nous étudions comment cette « trainée plasmonique » rend une structure aussi simple qu’un coupleur à prisme sensible à la répulsion entre les électrons du plasma<br>The field of plasmonics aims at manipulating light using deeply subwavelength nanostructures. Such structures present a peculiar optical response because of the free electron plasma they contain. Actually, when light propagates in the vicinity of metals, usually under the form of a guided mode, it presents a low group velocity. Such modes, like plasmons and gap-plasmons, are said to be slow. In this work we present a general physical analysis of this phenomenon by studying how the energy propagates in metals in a direction that is opposite to the propagation direction of the mode. We show that the group velocity and the energy velocity are the same, and finally introduce the concept of plasmonic drag. Finally, we study how slow guided modes make structures as simple as prism couplers sensitive to the repulsion between electrons inside the plasma

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Książki na temat "Multilayers"

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1930-, Bennett L. H., and Watson R. E, eds. Magnetic multilayers. Singapore: World Scientific, 1994.

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Hartmann, Uwe, ed. Magnetic Multilayers and Giant Magnetoresistance. Berlin, Heidelberg: Springer Berlin Heidelberg, 2000. http://dx.doi.org/10.1007/978-3-662-04121-5.

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Lenczowski, Stanisław Karel Józef. Giant magnetoresistance of magnetic multilayers. Eindhoven: Technische Universiteit Eindhoven, 1995.

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Mele, Paolo, Tamio Endo, Shunichi Arisawa, Chaoyang Li, and Tetsuo Tsuchiya, eds. Oxide Thin Films, Multilayers, and Nanocomposites. Cham: Springer International Publishing, 2015. http://dx.doi.org/10.1007/978-3-319-14478-8.

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L, Mills D., and Bland, J. A. C. 1958-, eds. Nanomagnetism: Ultrathin films, multilayers and nanostructures. Amsterdam: Elsevier, 2006.

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Chamberlain, J. M. Electronic Properties of Multilayers and Low-Dimensional Semiconductor Structures. Boston, MA: Springer US, 1991.

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NATO, Advanced Study Institute on Electronic Properties of Multilayers and Low-Dimensional Semiconductor Structures (1989 Castéra-Verduzan France). Electronic properties of multilayers and low-dimensional semiconductor structures. New York: Plenum Press, 1990.

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Chamberlain, J. M., Laurence Eaves, and Jean-Claude Portal, eds. Electronic Properties of Multilayers and Low-Dimensional Semiconductor Structures. Boston, MA: Springer US, 1990. http://dx.doi.org/10.1007/978-1-4684-7412-1.

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Hartmann, Uwe. Magnetic Multilayers and Giant Magnetoresistance: Fundamentals and Industrial Applications. Berlin, Heidelberg: Springer Berlin Heidelberg, 2000.

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1952-, Pietsch Ullrich, and Baumbach Tilo 1961-, eds. High-resolution X-ray scattering from thin films and multilayers. Berlin: Springer, 1999.

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Części książek na temat "Multilayers"

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Schaaf, P., and J. C. Voegel. "Polyelectrolyte Multilayers." In Nanoscience, 1017–42. Berlin, Heidelberg: Springer Berlin Heidelberg, 2009. http://dx.doi.org/10.1007/978-3-540-88633-4_21.

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Clint, John H. "Langmuir-Blodgett multilayers." In Surfactant Aggregation, 59–81. Dordrecht: Springer Netherlands, 1992. http://dx.doi.org/10.1007/978-94-011-2272-6_4.

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France, Michel Mendès, and Ahmed Sebbar. "Refraction on Multilayers." In Recent Developments in Fractals and Related Fields, 203–6. Boston: Birkhäuser Boston, 2010. http://dx.doi.org/10.1007/978-0-8176-4888-6_13.

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Ferrer, S., and J. L. Martinez. "Layers — Multilayers — Superlattices." In Neutron and Synchrotron Radiation for Condensed Matter Studies, 261–87. Berlin, Heidelberg: Springer Berlin Heidelberg, 1994. http://dx.doi.org/10.1007/978-3-662-22223-2_12.

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Schubert, Christian. "Co/Pt Multilayers." In Springer Theses, 19–23. Cham: Springer International Publishing, 2014. http://dx.doi.org/10.1007/978-3-319-07106-0_3.

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Park, Yong Tae, and Jaime C. Grunlan. "Carbon Nanotube-Based Multilayers." In Multilayer Thin Films, 595–612. Weinheim, Germany: Wiley-VCH Verlag GmbH & Co. KGaA, 2012. http://dx.doi.org/10.1002/9783527646746.ch24.

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von Klitzing, Regine, Ralf Köhler, and Chloe Chenigny. "Neutron Reflectometry at Polyelectrolyte Multilayers." In Multilayer Thin Films, 219–68. Weinheim, Germany: Wiley-VCH Verlag GmbH & Co. KGaA, 2012. http://dx.doi.org/10.1002/9783527646746.ch11.

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Fishman, F., F. Schwabl, and D. Schwenk. "Theory of Ferromagnetic Multilayers." In Physics, Fabrication, and Applications of Multilayered Structures, 408. Boston, MA: Springer US, 1988. http://dx.doi.org/10.1007/978-1-4757-0091-6_63.

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Spaepen, Frans. "Stability of Artificial Multilayers." In Physics, Fabrication, and Applications of Multilayered Structures, 199–214. Boston, MA: Springer US, 1988. http://dx.doi.org/10.1007/978-1-4757-0091-6_9.

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Cai, Peng, Guangle Li, Jiao Li, Yi Jia, Zhongfeng Zhang, and Junbai Li. "Photosystem II Based Multilayers." In Supramolecular Chemistry of Biomimetic Systems, 109–33. Singapore: Springer Singapore, 2017. http://dx.doi.org/10.1007/978-981-10-6059-5_6.

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Streszczenia konferencji na temat "Multilayers"

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Ackermann, Marcelo D., Dennis IJpes, Andrey E. Yakshin, Marko J. Sturm, and Adele Valpreda. "Improving multilayers for maximum reflectivity." In Optical and EUV Nanolithography XXXVIII, edited by Martin Burkhardt and Claire van Lare, 44. SPIE, 2025. https://doi.org/10.1117/12.3051539.

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Kortright, J. B. "Evolution of Roughness with Polishing at Fused Silica Surfaces." In Physics of X-Ray Multilayer Structures. Washington, D.C.: Optica Publishing Group, 1994. http://dx.doi.org/10.1364/pxrayms.1994.wc.8.

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Roughness limits x-ray multilayer specular reflectance and contributes to scattering. Roughness is generally more important for multilayer mirrors than for total reflection mirrors, because multilayers operate at higher momentum transfer than total reflection mirrors, where the effects of roughness are more severe. As the multilayer period decreases, the effects of roughness increase, so that roughness is generally expected to play a significant role in limiting reflectance in the small d-spacing limit. Roughness in multilayers can originate from microstructural defects within the multilayer, or from propagation of roughness from the substrate into the multilayer. In any case, complete understanding of the roughness in multilayers cannot be obtained without first understanding the roughness spectrum ofthe substrates on which the multilayers are grown.

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Nguyen, Tai D., Chantal Khan-Malek, and James H. Underwood. "Achievement of Low Stress in Mo/Si Multilayer Mirrors." In Extreme Ultraviolet Lithography. Washington, D.C.: Optica Publishing Group, 1994. http://dx.doi.org/10.1364/eul.1994.ec.56.

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The feasibility of low stress Mo/Si multilayers was studied in an attempt to fabricate flat semi-transparent multilayer mirrors as beam splitters near 13 nm wavelength. Stress in periodic multilayer structures is independent of the number of bilayer pairs, and depends strongly on the multilayer period, and the ratio of the layer thicknesses. Transition of stress from compressive to tensile state is observed in Mo/Si multilayers as Γ, the ratio of the Mo layer thickness to the multilayer period, increases. Low stress Mo/Si multilayers have been achieved, and achievement of Mo/Si beam splitters is demonstrated.

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Kortright, J. B., T. D. Nguyen, and E. M. Gullikson. "Short wavelength (4.5–12.4 nm) multilayer reflectors." In OSA Annual Meeting. Washington, D.C.: Optica Publishing Group, 1991. http://dx.doi.org/10.1364/oam.1991.tuee5.

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X-ray multilayer structures offer high normal incidence reflectance in the extreme ultraviolet and soft x-ray range. The choice of materials for use in these structures depends largely on their optical properties, which change rapidly with wavelength. The bi-layer thickness or period of multilayers is directly proportional to λ, and is measured in nanometers. Molybdenum/silicon multilayers are efficient reflectors for λ > 12.4 nm, with reflectance > 50%. At shorter λ, absorption from the Si LII,III levels makes Si less ideal for use in multilayers. C and B have low absorption in this range, and are hence incorporated into multilayer structures. As wavelengths decrease below 12.4 nm, the ratio of the reflectance measured from actual multilayers compared to that calculated for ideal multilayers decreases. Presumably this decrease results from the presence of structural imperfections, which have a larger effect on reflectance as the wavelength, and multilayer period, become smaller. The measured soft x-ray reflectance of sputtered multilayers composed of Ru and C, B and B4C are presented and compared to theoretical calculations. Microstructural characterizations including transmission electron microscopy and non-specular x-ray scattering are also presented, and used to discuss the nature of structural imperfections which may be important in degrading multilayer reflectance.

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Nguyen, Tai D., Xiang Lu, and James H. Underwood. "Stress Characteristics in Periodic Multilayer Structures for X-Ray Optics." In Physics of X-Ray Multilayer Structures. Washington, D.C.: Optica Publishing Group, 1994. http://dx.doi.org/10.1364/pxrayms.1994.wa.3.

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Sputtered x-ray multilayers usually exhibit the presence of intrinsic stress in the structures. Stress in multilayer mirrors are undesirable in many x-ray optical applications where flat mirrors, or precise control of curved mirrors, are designed. Controlling of the stress in these multilayers requires understanding of stress characteristics in multilayers and thin films.

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Page, Catherine, Michael Ansell, Betsy Cogan, Grace Neff, and Lisa Hommel. "Self-Assembled Inorganic-Organic Multilayer Thin Films." In Chemistry and Physics of Small-Scale Structures. Washington, D.C.: Optica Publishing Group, 1997. http://dx.doi.org/10.1364/cps.1997.csud.5.

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Self-assembly of inorganic-organic multilayer thin films allows the construction of materials with control of thickness, chemical composition, properties and proximity of different layers for use in a variety of applications. By developing different types of organic-inorganic bonding which can be exploited to self-assemble multilayer films we are able to prepare superstructure multilayers consisting of, for example, alternating hafnium-bisphosphonate layers and cobalt diisocyanide layers. The ability to make superstructures with different types of metal-ligand interactions allows more flexibility in the choice of organic linkers, the selection of interesting metal ions, and the properties associated with various combinations of components. Different approaches to incorporating nonlinear optical properties into these multilayers will be presented. Examples of these types of multilayers grown on silicon wafers and their characterization by grazing-angle x-ray diffraction, ellipsometry and second harmonic generation will be discussed. Preliminary results of lithographic approaches to patterning these multilayers in the lateral dimension will also be presented.

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Wang, F., P. Huang, M. Xu, and T. J. Lu. "Deformation Kinetics in Cu/Ta Nanoscale Multilayers." In ASME 2010 International Mechanical Engineering Congress and Exposition. ASMEDC, 2010. http://dx.doi.org/10.1115/imece2010-37483.

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Intensive research has been carried out on two key parameters important for interpreting the deformation kinetics of nanocrystalline metals, i.e., strain rate sensitivity and activation volume. Other than nanocrystalline metals, however, only a few recent studies focus on evaluating the two parameters for nanoscale multilayers that also possess nanoscale grain size. Using transmission electron microscope and nanoindentation test, we study the deformation behavior of nanoscale Cu/Ta multilayers having modulation period of 140 nm and 18 nm, respectively. The microstructure, grain size and strain rate sensitivity of the nanoscale multilayer subjected to nanoindentation are examined to explore its deformation mechanisms. It is established that the strain rate sensitivity of nanoscale Cu/Ta multilayers differ from those of nanocrystalline metals. The implications of these findings for the mechanical properties of nanoscale multilayers are discussed.

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Voorma, H. J., E. Louis, N. B. Koster, F. Bijkerk, and M. J. v. d. Wiel. "Characterisation of Mo/Si multilayers with small angle reflectivity measurements." In Physics of X-Ray Multilayer Structures. Washington, D.C.: Optica Publishing Group, 1994. http://dx.doi.org/10.1364/pxrayms.1994.wc.6.

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We developed an optical system for soft x-ray projection lithography [1] with a laser plasma x-ray source. In the optical system Mo/Si multilayer mirrors are used for near normal incidence reflectivity. High reflectivity of each multilayer is mandatory because in the optical system four reflecting surfaces are used. A reliable tool for characterisation of multilayers is needed in the process of determining the optimum parameters for the production of high reflectivity multilayer mirrors. Therefore we developed software to analyse the hard x-ray reflectivity measurements. With this software, that is based on a fast Fourier transform (FFT) of the Bragg peaks, a distinction between interface-roughness and layer-thickness errors can be made. These two parameters have considerable influence on the near normal incidence reflectivity. Furthermore, reflectivity measurements are done at various wavelengths to find the material densities. These are also important parameters for the near normal incidence reflectivity. This article will restrict itself to the analysis Mo/Si multilayers deposited at 36°C and 215°C with or without ion etching. These multilayers are made for a wavelength of 13.5 nm at normal incidence.

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Akhsaklialyan, A. D., Yu A. Blyakhman, S. A. Gusev, N. I. Polushkin, and N. N. Salashchenko. "Observation of Phase Separation in Fe/C Multilayers." In Physics of X-Ray Multilayer Structures. Washington, D.C.: Optica Publishing Group, 1994. http://dx.doi.org/10.1364/pxrayms.1994.mc.3.

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The phenomenon of phase separation in alloys and multilayers is of great fundamental and technological interest [1-4]. There are at least two important aspects in its study. First, uphill interdiffusion currents originate the metastable heterostructures in alloys [3], and they are expected to assist in the formation of atomically abrupt interfaces in artificial multilayer structures. Secondly, this process in nm-scale multilayers may be accompanied by drastic changes in their physical (e.g., mechanical, optical, magnetic, etc.) properties because their layer thicknesses are comparable with spatial interdiffusion scales.

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Kortright, J. B., K. Nguyen, P. Denham, and D. L. Windt. "Controlling short wavelength x-ray multilayer period variation on focussing optics." In Soft X-Ray Projection Lithography. Washington, D.C.: Optica Publishing Group, 1992. http://dx.doi.org/10.1364/sxray.1992.tub2.

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The variation of multilayer period, or d-spacing, across the reflecting surfaces of soft x-ray normal-incidence focussing optics is of primary importance in the optical performance of these systems. Focussing necessarily implies a specific optimal variation of period across the surfaces, and the multilayer bandpass sets the tolerance scale for acceptable deviations from this ideal variation.1,2 Mo/Si multilayers for use at wavelengths above 12.4 nm have relatively broad bandpasses, easing these tolerances. Multilayers for use at shorter wavelengths have significantly narrower bandpasses, thus placing significantly greater demands on the control of the period variation. Other design considerations, such as higher magnification systems and larger optics, also place more stringent demands on the control of multilayer period.

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Raporty organizacyjne na temat "Multilayers"

1

Hood, Randolph Quentin. Magnetic metallic multilayers. Office of Scientific and Technical Information (OSTI), April 1994. http://dx.doi.org/10.2172/10150963.

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Barbee, T. W. Interfacial effects in multilayers. Office of Scientific and Technical Information (OSTI), June 1999. http://dx.doi.org/10.2172/14282.

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Verdier, M., M. Hawley, M. Nastasi, H. Kung, M. Niewczas, and J. D. Embury. Plastic behavior of Cu/Ni multilayers. Office of Scientific and Technical Information (OSTI), December 1998. http://dx.doi.org/10.2172/319824.

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Robert Sinclair and Richard Chin. Structure and Properties of Iron-Carbide Multilayers. Office of Scientific and Technical Information (OSTI), February 2004. http://dx.doi.org/10.2172/821078.

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Barbee, T. W. ,. Jr LLNL. Interface reaction characterization and interfacial effects in multilayers. Office of Scientific and Technical Information (OSTI), April 1998. http://dx.doi.org/10.2172/305942.

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Camley, R. E. Magnetic, Electronic, and Thermal Properties of Magnetic Multilayers. Fort Belvoir, VA: Defense Technical Information Center, January 1996. http://dx.doi.org/10.21236/ada370040.

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Oren, A. L., and B. L. Henke. A refined model for characterizing x-ray multilayers. Office of Scientific and Technical Information (OSTI), December 1987. http://dx.doi.org/10.2172/6917733.

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Burcklen, C. X-ray Multilayers for Next-Generation Astrophysics Missions. Office of Scientific and Technical Information (OSTI), October 2023. http://dx.doi.org/10.2172/2204087.

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Misra, A., H. Kung, T. E. Mitchell, T. R. Jervis, and M. Nastasi. Microstructures and mechanical properties of sputtered Cu/Cr multilayers. Office of Scientific and Technical Information (OSTI), March 1998. http://dx.doi.org/10.2172/672097.

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Jankowski, A. F., J. G. Tobin, and G. D. Waddill. Magnetic x-ray circular dichroism in nickel-gold multilayers. Office of Scientific and Technical Information (OSTI), November 1994. http://dx.doi.org/10.2172/81068.

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