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Artykuły w czasopismach na temat „Nano Crystalline Thin Film”

Autor: Grafiati

Data publikacji: 3 czerwca 2025

Data aktualizacji: 31 lipca 2025

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1

Modh, Paresh V. "UV- VIS- NIR Spectrophotometer for Nano Particles and Nano- Crystalline Thin Films." International Journal of Scientific Research 3, no. 4 (2012): 435. http://dx.doi.org/10.15373/22778179/apr2014/154.

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Luu Thi, Lan Anh, Duc Hieu Nguyen, Mateus Manuel Neto, Ngoc Trung Nguyen, and Thach Son Vo. "Characterization of Nanocrystalline Titania Thin Film Deposited by Spray Pyrolysis Technique." Advanced Materials Research 875-877 (February 2014): 49–53. http://dx.doi.org/10.4028/www.scientific.net/amr.875-877.49.

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Nanocrystalline titania (TiO2) thin ﬁlms prepared by spray pyrolysis deposition on to the heated glass in a temperature range of TS = 350 ÷ 450oC. Analysis of optical transmission spectral of films reveals an optical band gap of about 3.2÷3.4 eV and the transmittance above 80% for TiO2 films with thickness of 0.8÷1.6 µm. X-ray diffraction (XRD) analysis demonstrates that the ﬁlms are found of anatase phase in crystal structure. The AFM photographs show the nano-size of the constituents. The crystallize size and crystalline of the samples is discussed with respect to the film thickness and depo

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3

Chung, Chung Jen, Ching Liang Wei, Po Tsung Hsieh, et al. "Synthetic Properties of the c-Axis Tilted AlN Thin Films." Materials Science Forum 654-656 (June 2010): 1780–83. http://dx.doi.org/10.4028/www.scientific.net/msf.654-656.1780.

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Aluminum nitride (AlN) is one of the most popular piezoelectric materials for high frequency resonators, filters and sensors. The piezoelectric property, i.e. electromechanical coupling coefficient, of AlN thin film is highly related to its crystalline orientation. AlN thin films with various c-axis-tilted angles can be fabricated by the RF sputtering technique. The crystallization and grain growth orientations of AlN thin film are examined by XRD, SEM, and TEM, while the bonding condition and nano-mechanical properties are investigated by a raman system and a nano-indentation technique.

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4

Won, Sung Bin, Min Jung Kim, Chun Yu Xu, Yeon Sang Hwang, and Dong Bok Lee. "High Temperature Oxidation of CrAlSiN Thin Films." Advanced Materials Research 699 (May 2013): 612–15. http://dx.doi.org/10.4028/www.scientific.net/amr.699.612.

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Nano-multilayered, crystalline CrAlSiN thin films were deposited on either steel or WC-10%Co substrates by the cathodic arc plasma deposition. Their oxidation characteristics were studied at 800-1000°C for 50 h in air. The film deposited on steel displayed good oxidation resistance, due mainly to formation of Cr2O3 and α-Al2O3. The film deposited on WC-10%Co displayed poor oxidation resistance, due mainly to the oxidation of the substrate.

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5

Patil, M. M., K. P. Joshi, and S. B. Patil. "Studies on nanocomposites nanoplates and pervoskite nanorod thin films." YMER Digital 20, no. 12 (2021): 303–13. http://dx.doi.org/10.37896/ymer20.12/27.

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Nano crystalline nickel oxide thin films of different film thickness were deposited onto glass substrate at 350 oC by varying volume of precursor solution using spray pyrolysis technique. This structural, morphological and microstructure properties were investigated using XRD, FE-SEM and TEM. The element composition was studied using EDAX. It is found that increase in the volume of sprayed solution leads to the increment in film thickness and amelioration of crystallinity of the film. The results are discussed and interpreted.

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6

Lourduraj, Stephen, and Rayar Victor Williams. "Effect of molarity on sol–gel routed nano TiO2 thin films." Journal of Advanced Dielectrics 07, no. 06 (2017): 1750042. http://dx.doi.org/10.1142/s2010135x17500424.

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The nanostructured titanium dioxide (TiO[Formula: see text] thin films have been prepared for the molar concentrations of titanium tetra isopropoxide (TTIP) 0.05[Formula: see text]M, 0.1[Formula: see text]M, 0.15[Formula: see text]M and 0.2[Formula: see text]M by sol–gel routed spin coating technique with calcination at 450[Formula: see text]C. The processing parameters such as, pH value (8), catalyst HCl (0.1[Formula: see text]ml), spin speed (3000[Formula: see text]rpm) and calcination temperature (450[Formula: see text]C) are optimized. The crystalline nature and surface morphology were ana

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7

Gou, Jun, Jun Wang, Ze Hua Huang, and Ya Dong Jiang. "Preparation of LiTaO₃ Nano-Crystalline Films by Sol-Gel Process." Key Engineering Materials 531-532 (December 2012): 446–49. http://dx.doi.org/10.4028/www.scientific.net/kem.531-532.446.

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Lithium tantalite (LiTaO3) thin film material shows good feasibility and potential for the application of high-performance detection system. In this paper, sol-gel process of LiTaO3 thin films on p-type (111) silicon substrates was described. Stable precursor solution with a desired viscosity was obtained using lithium acetate (LiAc) and tantalum ethoxide (Ta(OC2H5)5) as starting materials. Heat treatment process was optimized to fabricate LiTaO3 films of high crystallinity. Higher crystalline quality films were obtained when each spin-coating process was followed by an annealing operation. Mi

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8

Soud, A. J., and Bushra K. H. Al-Maiyaly. "Influence of annealing temperature on nano crystalline description for CuZnS thin films." Chalcogenide Letters 21, no. 5 (2024): 385–94. http://dx.doi.org/10.15251/cl.2024.215.385.

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Copper Zinc Sulphide (Cu0.5Zn0.5S) alloy and thin films were fabricated in a vacuum. Nano crystallized (CZS) film with thick 450±20 nm was deposit at substrates glasses using thermal evaporation technique below ~ 2 × 10− 5 mbar vacuum to investigated the films structural, morphological and optical properties depended on annealing temperatures ( as-deposited, 423, 523 and 623) K for one hour. The influences annealed temperature on structurally besides morphologically characteristics on these films were investigated using XRD and AFM respectively. XRD confirms the formation a mixed hexagonal pha

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9

Khan, Taj Muhammad, and Tayyaba BiBi. "Compatibility and optoelectronic of ZnSe nano crystalline thin film." Chinese Physics B 21, no. 9 (2012): 097303. http://dx.doi.org/10.1088/1674-1056/21/9/097303.

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10

Ayyanar, B., J. Suresh, V. Thangaraj, S. Karthikeyan, A. Arun, and M. Kayalvizhi. "Dielectric, AC Conductance of Chalcone Moiety, Metal Oxide Nanocomposite Doped Thin Polymer Film: Synthesis and Characterization." Asian Journal of Chemistry 34, no. 12 (2022): 3132–44. http://dx.doi.org/10.14233/ajchem.2022.24012.

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For conducting use, an organic molecule chalcone (1-(2,4-dichlorophenyl)-3-(4-hydroxy-phenyl)-prop- 2-en-1-one (DCHP) and metal oxide nanocomposite (MONC) doped polymer thin films were prepared. In addition, polyvinyl alcohol (PVA) and chitosan (CS) was utilized as a host polymer. The features of successfully prepared thin polymer films were characterized. The XRD analysis revealed the nano-sized (40-150 nm), crystalline phases and semi-crystalline behaviour of polymer films. The XPS and EDX confirmed the elements of PVA, CS, DCHP, MONC4 and MONC5, as well as the oxidation states of MONC4 and

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11

Singh, Satya Pal, Archana Kumari Singh, and Aman Alexander. "SYNTHESIS OF Mg-DOPED n(ZnO) THIN FILMS USING SOL-GEL 6 DIP-COATING METHOD AND CHARACTERIZATION OF ITS STRUCTURAL AND OPTICAL PROPERTIES." Journal of Advanced Scientific Research 13, no. 04 (2022): 69–75. http://dx.doi.org/10.55218/jasr.202213412.

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Mg-doped ZnO alloy thin films having hexagonal Wurtzite structures were prepared using the Sol-Gel method. The doping results into, increased surface roughness and reduced grain size. Photonic applications are made easier by altering the optical bandgap of ZnO nano-structured thin films doped with various components. Mg metal atom doped ZnO films are an excellent example for study. In this work, the thin film of Mg-doped ZnO is formed on glass substrate via dip coating method with varied concentration of dopant. Dip-coating method is one of the cheapest methods. SEM, Raman spectroscopy and UV-

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12

Xie, Jian Sheng, Ping Luan, and Jin Hua Li. "Optical Properties of Nano-CuInSi Thin Films Prepared by Multilayer Synthesized Method." Advanced Materials Research 403-408 (November 2011): 1094–98. http://dx.doi.org/10.4028/www.scientific.net/amr.403-408.1094.

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Thin Nano-CuInSi films have been prepared by multilayer synthesized method using magnetron sputtering technology, and followed by annealing in N2 atmosphere at different temperatures. The structures of CuInSi films were detected by X-ray diffraction(XRD); X-ray diffraction studies of the annealed films indicate the presence of CuInSi, the peak of main crystal phase is at 2θ=42.450°; the morphology of the film surface was studied by SEM. The SEM images show that the crystalline of the film prepared by multilayer synthesized method was granulated. The transmittance (T) spectra of the films were

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13

Li, Shun, Jia Chen Liu, Chao Liang Cui, and Li Bin Liu. "Effect of Deposition Conditions on TiO₂ Thin Film on Silica Glass Fibers by Liquid Phase Deposition." Key Engineering Materials 336-338 (April 2007): 1921–23. http://dx.doi.org/10.4028/www.scientific.net/kem.336-338.1921.

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Crystalline TiO2 thin films coated on silica glass fibers and nano-powders were prepared by adding H3BO3 into an (NH4)2TiF6 solution supersaturated with anatase nano-crystalline TiO2 at 40°C. The effect of the deposition conditions on the surface morphology, section morphology, growth patterns, thicknesses of the deposited TiO2 thin films were investigated. Growth rate and particle size of the thin films were controlled by the deposition conditions. As a result, a well-combined and durable TiO2 thin films on silica glass fibers surface obtained under definite optimizing experimental conditions

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14

Arendse, Christopher J., Theophillus F. G. Muller, Franscious R. Cummings, and Clive J. Oliphant. "Oxidation Reduction in Nanocrystalline Silicon Grown by Hydrogen-Profiling Technique." Journal of Nano Research 41 (May 2016): 9–17. http://dx.doi.org/10.4028/www.scientific.net/jnanor.41.9.

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The deposition of a compact amorphous silicon/nano-crystalline silicon material is demonstrated by hot-wire chemical vapour deposition using a sequential hydrogen profiling technique at low hydrogen dilutions. Nano-crystallite nucleation occurs at the substrate interface that develops into a uniform, porous crystalline structure as the growth progresses. A further reduction in the H-dilution results in the onset of a dense amorphous silicon layer. The average crystalline volume fraction and nano-crystallite size in the sample bulk amounts to 30% and 6 nm, respectively, as probed by Raman spect

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15

ZHOU, JICHENG, ZHENG LIU, XUQIANG ZHENG, YOUZHEN LI, and DITIAN LUO. "EFFECT OF N CONTENT ON THE THERMAL STABILITY OF Ta–Si–N THIN FILM BARRIER LAYER." International Journal of Modern Physics B 24, no. 30 (2010): 5867–75. http://dx.doi.org/10.1142/s0217979210057420.

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Ta–Si–N thin films and Cu/Ta–Si–N thin films were deposited on p-type Si (111) substrates by magnetron reactive sputtering. Then the films were characterized by four-point probe sheet resistance measurement, atomic force microscopy, X-ray diffraction method and scanning electron microscope, respectively. The experimental results show that the sheet resistance of Ta–Si–N thin film increases with N content. And the surface roughness of the thin film first decreases and then increases with N content. By increasing the N content, the diffusion barrier property of Ta–Si–N thin film can be improved;

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16

Wang, Chih Ming, Kuo Sheng Kao, Da Long Cheng, et al. "Electrochromic Properties of Nano-Columnar Nickel Oxide." Materials Science Forum 654-656 (June 2010): 1904–7. http://dx.doi.org/10.4028/www.scientific.net/msf.654-656.1904.

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Electrochromic properties of transition metal oxides had much attention in recent years. The electrochromic thin films can be assembly as electrochromic devices (ECDs) and then used for applications in devices such as mirrors, panels and smart windows. A kind of complementary ECD is popular in resent years. Therefore, a specific investigation on nickel oxide (NiO) electrochromic properties is completed in this study. The crystalline structure of the NiO films was analyzed using XRD (PANalytical X’Pert PRO) with Cu-Kα radiation. The atmosphere of oxygen concentration increasing has changed the

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17

Sun, Feng Yun, Ming Hu, and Peng Sun. "Effects of Preparing Conditions on NO₂-Sensing Properties of Sputtered WO₃ Nano-Films." Advanced Materials Research 690-693 (May 2013): 1680–84. http://dx.doi.org/10.4028/www.scientific.net/amr.690-693.1680.

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WO3 nano-films were deposited on Al2O3 substrate by dc reactive magnetron sputtering method. The effects of preparing conditions, such as the discharge gas ratio (Ar:O2), working pressure, sputtering time and annealing temperature on microstructure, crystalline state and NO2-sensing properties of WO3 nano-films were investigated by orthogonal trial experiment method. The optimum technological conditions were determined by orthogonal test and extreme difference analysis. The crystallization, morphology and composition of WO3 thin film obtained at the optimal parameters were studied by XRD, SEM

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18

Hamza Alhasan, Sarmad Fawzi, Seth R. Calhoun, Hussain Abouelkhair, et al. "Smooth TiO2 Thin Films Grown by Aqueous Spray Deposition for Long-Wave Infrared Applications." MRS Advances 3, no. 5 (2018): 255–60. http://dx.doi.org/10.1557/adv.2018.20.

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ABSTRACTSelf-assembled TiO2 films deposited by aqueous-spray deposition were investigated to evaluate morphology, crystalline phase, and infrared optical constants. The Anatase nano-crystalline film had ∼10 nm characteristic surface roughness sparsely punctuated by defects of not more than 200 nm amplitude. The film is highly transparent throughout the visible to wavelengths of 12 μm. The indirect band gap was determined to be 3.2 eV. Important for long-wave infrared applications is that dispersion in this region is weak compared with the more commonly used dielectric SiO2 for planar structure

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19

Shehu, Muhammad Shafiu, Rasheed Segun Lawal, Nura Ibrahim, Nuhu Yunusa, Olaoye A.O, and Siyaku Adinoyi. "STRUCTURAL ANALYSIS FOR A NANO-CRYSTALLINE FILM (ZnS) BY AEROSOL SPRAY PYROLYSIS TECHNIQUE." FUDMA JOURNAL OF SCIENCES 7, no. 1 (2023): 60–66. http://dx.doi.org/10.33003/fjs-2023-0701-1177.

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Nano thin film materials play an indispensable role in modern electronics and other field of material sciences especially in a photovoltaic technology. The scope of this research is to grow Zinc Sulphide (ZnS) thin film and characterize structurally to understand the benefits of the study choosing chemical deposition method (The aerosol spray pyrolysis), the chemical combination analysis and the annealing temperature. Specifically on the film strength and its applications. In the light of this work, Nano crystalline ZnS thin films was grown by carefully dissolving 1.48g of Zinc Acetate (Zn(CH3

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20

Najafov, BA, FP Abasov, and RS Ibragimov. "Obtaining Thin Films of Silicon-Carbon Method of Reactive Magnetron Sputtering are used as Solar Cells." Journal of Nanosciences Research & Reports 3, no. 2 (2021): 1–7. http://dx.doi.org/10.47363/jnsrr/2021(3)121.

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In the work of the various parameters studied film amorphous and nano-crystalline alloy silicon-carbon (а-nc-Si1-xCx :H (x=0÷1)) doped with phosphorus (PH3 ) and boron (B2 H6 ). Studied the properties of these films on different substrates derived from quartz, glass and Silicon-coated Fe, Al, Pd, Ni, Ti, Ag. Using transmission electron microscopy (TEM) studied the morphology obtained nano tubes. Also examine the structural properties of films by using infrared spectroscopy and x-ray diffraction of x-rays. Created by cascade solar cells area S = 1.2 cm2 and have a coefficient of 11.2%.

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21

Tarale, A. N., D. J. Salunkhe, P. B. Joshi, S. B. Kulkarni, and V. R. Reddy. "Magnetodielectric properties of nano-crystalline BaZr0.15Ti0.85O3/La0.67Sr0.33MnO3 thin film heterostructures." Journal of Materials Science: Materials in Electronics 24, no. 11 (2013): 4457–63. http://dx.doi.org/10.1007/s10854-013-1425-6.

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22

KAUR, JASMEET, and R. SINGH. "EFFECT OF POWER AND HYDROTHERMAL HEAT TREATMENT ON RF SPUTTERED COPPER OXIDE THIN FILMS." Surface Review and Letters 25, no. 08 (2018): 1950029. http://dx.doi.org/10.1142/s0218625x1950029x.

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Nano-crystalline copper oxide films were deposited on quartz substrates by RF-magnetron sputtering in argon gas environment. The XRD patterns show Cu4O3 phase for films deposited at 50 and 60[Formula: see text]W of RF power. The film deposited at 70[Formula: see text]W shows existence of Cu4O3 and CuO phases, whereas film deposited at 100[Formula: see text]W of RF power consists of only CuO phase. Raman spectra and transmission electron microscopy (TEM) also confirm these results. Field emission scanning electron microscopy (FESEM) shows morphological changes in the film as a function of RF po

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23

Lin, Jia-Hao, Hung-Wei Wu, Wei-Chen Tien, Cheng-Yuan Hung, and Shih-Kun Liu. "Effects of Chamber Pressures on the Passivation Layer of Hydrogenated Nano-Crystalline Silicon Mixed-Phase Thin Film by Using Microwave Annealing." Electronics 10, no. 18 (2021): 2199. http://dx.doi.org/10.3390/electronics10182199.

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This paper proposes the effects of chamber pressures on the passivation layer of hydrogenated nano-crystalline silicon (nc-Si:H) mixed-phase thin film using microwave annealing (MWA) to achieve a high-quality thin film. The use of 40.68 MHz very-high-frequency plasma-enhanced chemical vapor deposition (VHFPECVD) deposited the nc-Si:H mixed-phase thin film on the top and bottom of the n-type crystalline silicon substrate. The chamber pressures (0.2, 0.4, 0.6, and 0.8 Torr) of the VHFPECVD were critical factors in controlling the carrier lifetime of the symmetric structure. By using the VHFPECVD

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24

Liu, Liqin, Zeyu Zhao, Changtao Wang, et al. "Realizing multimodal lithography effects by adjusting laser exposure power ranges for TeO_x inorganic photoresist." Materials Research Express 11, no. 12 (2024): 126401. https://doi.org/10.1088/2053-1591/ad97a6.

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Abstract Suboxide chalcogenide thin films like TeO x are promising inorganic lithography materials. Different from previous reports of single-mode lithography based on TeO x films at low laser power, this study proposes multimodal lithography effects at low, medium, and high laser power ranges. The TeO x films were fabricated by reactive magnetron sputtering, exhibiting super smooth surface with an RMS 0.33 nm. The lithographic performance was researched using a laser direct writing system with a wavelength of 780 nm. The experiment results showed that different kind of lithographic patterns w

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25

Kala, P. V., P. Mohanbabu, and K. Srinivasarao. "Structural, Optical and Electrochromic Investigations on Nano Crystalline MoO3 Thin Films." Material Science Research India 15, no. 1 (2018): 41–47. http://dx.doi.org/10.13005/msri/150105.

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Thin films of MoO3 were deposited on quartz glass, Silicon (100) and Indium Tin Oxide (ITO) substrates by dc magnetron sputtering at two substrate temperatures of 300 K and 600 K and at sputtering pressures of 5 Pa and 10 Pa and at a fixed sputtering power of 50 W. The deposited films were characterized by Grazing Incidence X-ray Diffraction (GIXRD), Raman and Optical Transmittance Spectra and Cyclic Voltametry (CV) studies. The GIXRD reveales that the crystallanity of films starts at low temperature (300 K) and crystallizes in orthorhombic phase. The crystallanity increases with increase of s

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Liu, Yi, Ai Xiang Wei, and Xiao Dong Lin. "Morphological and Optical Properties of CdS Nano-Crystalline Thin Films by Chemical Bath Deposition." Key Engineering Materials 537 (January 2013): 144–49. http://dx.doi.org/10.4028/www.scientific.net/kem.537.144.

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CdS thin films were prepared by chemical bath deposition (CBD) at different ammonia concentration and different temperature using cadmium chloride hydrate, thiourea, ammonium chloride, ammonia and deionized water as precursors. The morphology structure and the optical properties of CdS thin films were characterized by scanning electron microscope (SEM), ultraviolet-visible spectra and spectroscopic ellipsometry. The results indicated that CdS thin film could be grown when ammonia concentration at the range of 0.4-1.0 mol /L and in the temperature range of 50 °C -80 °C. Within 600-980 nm wavele

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27

Abed, Ali l., and Mohammed T. Hussein. "Synthesis and Characterization of Ternary BexZn1-xO Nano Thin Films prepared by Pulsed Laser Deposition Technique." Iraqi Journal of Physics (IJP) 20, no. 2 (2022): 53–63. http://dx.doi.org/10.30723/ijp.v20i2.983.

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Beryllium Zinc Oxide (BexZn1-xO) ternary nano thin films were deposited using the pulsed laser deposition (PLD) technique under a vacuum condition of 10-3 torr at room temperature on glass substrates with different films thicknesses, (300, 600 and 900 nm). UV-Vis spectra study found the optical band gap for Be0.2Zn0.8O to be (3.42, 3.51 and 3.65 eV) for the (300, 600 and 900nm) film thicknesses, respectively which is larger than the value of zinc oxide ZnO (3.36eV) and smaller than that of beryllium oxide BeO (10.6eV). While the X-ray diffraction (XRD) pattern analysis of ZnO, BeO and Be 0.2 Z

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SHIM, J. H., K. H. HAN, M. B. PARK, and N. H. CHO. "EFFECT OF REACTION GAS ON THE STRUCTURAL AND OPTICAL FEATURES OF NC-SI:H THIN FILMS PREPARED BY PECVD." International Journal of Modern Physics B 16, no. 28n29 (2002): 4335–38. http://dx.doi.org/10.1142/s0217979202015388.

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Hydrogenated nano-crystalline silicon (nc-Si:H) thin films were prepared by plasma enhanced chemical vapor deposition (PECVD). The variation in the crystallinity, nano-structure and optical characteristics of the nc-Si:H films with deposition variables such as reaction gas, post-deposition heat-treatment and deposition time were investigated; the relationship between the optical nano-structural features of the nc-Si:H films was discussed. The intensity of the PL peak, observed at about ~ 480 nm region, increased with the amount of reaction gas as well as deposition time. On the other hand, PL

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29

Liwei, Xiong, Liu Fan, Wang Jianhua, Man Weidong, Weng Jun, and Liu Changlin. "Plasma Processing of Boron-Doped Nano-Crystalline Diamond Thin Film Fabricated on Poly-Crystalline Diamond Thick Film." Plasma Science and Technology 12, no. 4 (2010): 433–36. http://dx.doi.org/10.1088/1009-0630/12/4/10.

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Han, Xiao Dong, Li Hua Wang, Pan Liu, et al. "Dynamic Atomic Mechanisms of Plasticity of Ni Nanowires and Nano Crystalline Ultra-Thin Films." Materials Science Forum 654-656 (June 2010): 2293–96. http://dx.doi.org/10.4028/www.scientific.net/msf.654-656.2293.

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Using our recently developed in situ transmission electron microscopy techniques, we revealed that the FCC structured Ni nanowires with diameter of about 30 nm possess ultra-large strain plasticity. Dynamic complex dislocation activities mediated the large strain bent-plasticity and they were monitored at atomic scale in real time. The bent-induced strain gradient allows studying the strain effects on dislocation mediated plasticity. We also explored the deformation techniques to more general cases, the nano thin films. An example of tensile Pt ultra-thin film is presented.

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Lee, S., H. Seo, G. Lucovsky, L. B. Fleming, M. D. Ulrich, and J. Lüning. "Bulk defects in nano-crystalline and in non-crystalline HfO2-based thin film dielectrics." Thin Solid Films 517, no. 1 (2008): 437–40. http://dx.doi.org/10.1016/j.tsf.2008.08.098.

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Nasir, Syafiqa, Fuei Pien Chee, Bablu Kumar Ghosh та ін. "Composition Dependence Structural and Optical Properties of Silicon Germanium (SiχGe1−χ) Thin Films". Crystals 13, № 5 (2023): 791. http://dx.doi.org/10.3390/cryst13050791.

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This study investigates the structural and optical characteristics of Silicon Germanium (SiGe) thin films with varying compositions and annealing temperatures for potential use in electronic and optoelectronic devices. Si0.8Ge0.2 and Si0.9Ge0.1 films were deposited onto a high-temperature quartz substrate and annealed at 600 °C, 700 °C, and 800 °C before being evaluated using an X-Ray Diffractometer (XRD), Atomic Force Microscopy (AFM), and a UV-Vis Spectrometer for structural and optical properties. The results show that increasing the annealing temperature results in an increase in crystalli

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Baskar, T., George Shaji, Aremu Bashiru, and Pandey Digvijay. "Effect of Current Density on Properties of Electrodeposited Nickel-Phosphorus Alloy Thin Films." AlQalam Journal of Medical and Applied Sciences 4, no. 2 (2021): 18–24. https://doi.org/10.5281/zenodo.4677594.

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Electrode position in different current density was used to prepare nanostructure thin films of NiP. Films deposited with NiP have a texture that shows FCC structure. The structural properties of thin films observed experimentally for different current density were compared. The addition of phosphorus (Co) to nickel thin films will improve their structural and mechanical properties. Electrodeposited NiP films were prepared at various current density of 2,3,4 and 5 mA/cm2. Morphological, structural, and mechanical characterization were performed on them. At 5 mA/cm2, the nickel concentration re

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Wang, Y. L., M. C. Li, X. K. Chen, et al. "Nano-Polycrystalline Vanadium Oxide Thin Films Prepared by Pulsed Laser Deposition." Journal of Nanoscience and Nanotechnology 8, no. 5 (2008): 2604–8. http://dx.doi.org/10.1166/jnn.2008.18290.

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Nano-polycrystalline vanadium oxide thin films have been successfully produced by pulsed laser deposition on Si(100) substrates using a pure vanadium target in an oxygen atmosphere. The vanadium oxide thin film is amorphous when deposited at relatively low substrate temperature (500 °C) and enhancing substrate temperature (600–800 °C) appears to be efficient in crystallizing VOx thin films. Nano-polycrystalline V3O7 thin film has been achieved when deposited at oxygen pressure of 8 Pa and substrate temperature of 600 °C. Nano-polycrystalline VO2 thin films with a preferred (011) orientation ha

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Tan, Chong Wei, Ye Zhu, Shen Lin Chua, Maziar Shakerzadeh, Chuan Seng Tan, and Beng Kang Tay. "Electrical properties of FCVA deposited nano-crystalline graphitic carbon thin films with in situ treatment techniques." European Physical Journal Applied Physics 85, no. 2 (2019): 20301. http://dx.doi.org/10.1051/epjap/2019180097.

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In this report, detailed studies of the nano-crystalline graphitic (NCG) carbon thin films deposited by filtered cathodic vacuum arc (FCVA) following its first discovery and first electrical characterization have been performed. The microstructure of carbon thin film can be modified by applying in situ treatment techniques (such as altering the thermal and carbon ion deposition energy). It was found that highly electrical conductive carbon thin films with graphitic planes can also be deposited at a low deposition temperature instead of the previously reported high deposition temperature with a

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Fujimoto, Masayuki, Hiroshi Koyama, Yasunari Hosoi, Kazuya Ishihara, and Shinji Kobayashi. "High-Speed Resistive Switching of TiO2/TiN Nano-Crystalline Thin Film." Japanese Journal of Applied Physics 45, No. 11 (2006): L310—L312. http://dx.doi.org/10.1143/jjap.45.l310.

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Gong, H., J. Q. Hu, J. H. Wang, C. H. Ong, and F. R. Zhu. "Nano-crystalline Cu-doped ZnO thin film gas sensor for CO." Sensors and Actuators B: Chemical 115, no. 1 (2006): 247–51. http://dx.doi.org/10.1016/j.snb.2005.09.008.

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Cuong, Tran Kim. "Photoelectric Characteristics of Nano TiO2 Film Prepared By Spraying Pyrolysis Method." International Journal of Nano Studies & Technology 4, no. 1 (2015): 78–83. https://doi.org/10.19070/2167-8685-1500015.

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The nanocrystalline TiO2 (nc TiO2) film was prepared by spraying pyrolysis method. Starting material for the synthesis was TiCl4. Phase compositions and crystalline sizes were examined by pattern of XRD, and surface morphology of the thin film was analyzed by SEM and AFM. Optical characteristics were examined by UV – Vis and luminescent spectra (PL). Electric characteristics were examined by measuring resistance changing of films versus temperature. The experimental data showed that the forming films had nanostructure and typical photoelectric characteristics of nano

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AL-Rashedi, Khadher, Mazahar Farooqui, and Gulam Rabbani. "Characterizing Crystalline Chromium oxide Thin Film Growth by Sol-gel method on Glass Substrates." Oriental Journal of Chemistry 34, no. 4 (2018): 2203–7. http://dx.doi.org/10.13005/ojc/3404064.

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In this work, nano-crystalline chromium oxide (Cr2O3) thin film was synthesized using the Sol-gel method. The thin film was deposited on a glass substrate at 50°C by using chromium nitrate, methanol, ethanol, polyvinyl alcohol with a magnetic stirrer device and a hot plate. Each deposited thin film annealed in the microwave oven at 200°C. The structure of the prepared thin film was examined by means of X-ray diffraction (XRD). The Shearer formula was used to calculate the size of the film granules. The scanning electron microscopy (SEM) was used to study the surface morphology. UV-VIS measurem

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Rahmati, A., H. Bidadi, K. Ahmadi, and F. Hadian. "Ti substituted nano-crystalline Cu3N thin films." Journal of Coatings Technology and Research 8, no. 2 (2010): 289–97. http://dx.doi.org/10.1007/s11998-010-9279-9.

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Revathi, Chinnasamy, Krishnamoorthy Rajavel, Kugalur Shanmugam Ranjith, and Ramasamy Thangavelu Rajendrakumar. "Synthesis and Antibacterial Studies of Nano Structured Ag Thin Films." Advanced Materials Research 678 (March 2013): 291–96. http://dx.doi.org/10.4028/www.scientific.net/amr.678.291.

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Silver thin film of 5 nm thicknesses was evaporated on glass and stainless steel substrates and annealed at 300°C for one hour. Then these samples were characterized by using X-ray diffraction method (XRD), Scanning Electron Microscopy (SEM), UV-VIS spectroscopy, and subjected to anti-microbial resistance test. XRD analysis showed as deposited silver thin film coated on glass substrate and stainless steel substrates have amorphous nature. The annealed Ag thin film coated on glass and stainless steel substrates showed crystallinity with silver phase and their crystalline size were in the range

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F.T.Z. Toma, K.M.A. Hussain, M.S. Rahman, and Syed Ahmed. "Preparation and characterization of CdS thin film using chemical bath deposition (CBD) technique for solar cell application." World Journal of Advanced Research and Reviews 12, no. 3 (2021): 629–33. http://dx.doi.org/10.30574/wjarr.2021.12.3.0746.

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The structural properties of CBD deposited CdS thin films have been studied by varying the processing parameters and Cd/S ratio of the starting Precursors in order to better understand the growth conditions. A CdS thin film was prepared on glass substrate by CBD method from a bath containing Thiourea and Ammonium hydroxide. The structural analysis was performed by X-ray Diffraction (XRD). The deposited CdS thin film was a cubic phase with small nano crystalline grains. The film was deposited at 60°C for 2 hours. After sintering the film at 300°C for 1 hour the color of the film was changed lik

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F.T.Z., Toma, Hussain K.M.A., Rahman M.S., and Ahmed Syed. "Preparation and characterization of CdS thin film using chemical bath deposition (CBD) technique for solar cell application." World Journal of Advanced Research and Reviews 12, no. 3 (2021): 629–33. https://doi.org/10.5281/zenodo.5820472.

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The structural properties of CBD deposited CdS thin films have been studied by varying the processing parameters and Cd/S ratio of the starting Precursors in order to better understand the growth conditions. A CdS thin film was prepared on glass substrate by CBD method from a bath containing Thiourea and Ammonium hydroxide. The structural analysis was performed by X-ray Diffraction (XRD). The deposited CdS thin film was a cubic phase with small nano crystalline grains. The film was deposited at 60°C for 2 hours. After sintering the film at 300°C for 1 hour the color of the film was cha

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Reddy, T. Ramesh, M. Ravindar Reddy, A. R. Subrahmanyam, J. Siva Kumar, and M. Maheshwar Reddy. "INVESTIGATION ON STRUCTURAL, MORPHOLOGICAL, THERMAL AND OPTICAL PROPERTIES OF BLEND PPY- PVA THIN FILMS DOPED WITH NANO TiO2 PARTICLES." RASAYAN Journal of Chemistry 15, no. 04 (2022): 2387–93. http://dx.doi.org/10.31788/rjc.2022.1548004.

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Poly Vinyl Alcohol (PVA), Poly Pyrrole (PPY), and PPY-PVA blend thin films loaded with varying concentrations of nano TiO2 particles were prepared by using the in-situ chemical oxidative polymerization technique. Prepared films have undergone several characterization techniques i.e., XRD, UV- Spectroscopy, SEM, and DSC to study their structural, morphological, optical, and thermal properties. SEM images revealed that the surface morphology of PPY has been significantly modified upon the addition of PVA and nano TiO2 particles and observed the presence of pores on the surface. XRD spectra discl

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Chandrasekar, J., and Durgachalam Manikandan. "Structural and Optical Properties of Chemically Deposited Metal Chalcogenide Thin Film CrS and its Photovoltaic Application." Asian Journal of Chemistry 34, no. 2 (2022): 279–83. http://dx.doi.org/10.14233/ajchem.2022.23470.

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In this work, chromium sulfide (CrS) thin films were grown on the acetic acid substrates by chemical bath deposition to prepare non-toxic photovoltaic devices. The combined single-source precursor approach has been developed for the deposition method using tris(diethyldithiocarbamato)chromium(III) for the deposition of CrS thin films grown at bath temperatures of 30, 60 and 90 ºC and at a constant deposition time of 30-120 min. The sufrace mophology of the prepared films have been analyzed by SEM and HR-TEM techniques. The study of the films indicate the distributed roughness and nano bundled

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Ahmed, Honar S., Raghad Y. Mohammed, and Mohammed Hussein Khalil. "Effects of Deposition Time And PH on The Characterization of Chemically Synthesized Composite Nano-Wires of Cu2S Thin Films." Science Journal of University of Zakho 9, no. 4 (2021): 184–92. http://dx.doi.org/10.25271/sjuoz.2021.9.4.863.

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 The chemical bath deposition technique (CBD) had used for depositing Cu2S thin films on the glass substrates. It found that thickness and deposition rate were significantly dependent on deposition parameters (deposition time and pH value). XRD data indicates that at different deposition times and pH values are given amorphous structure except for the deposited thin film of (8hours) and, pH of (10.4) the structure was crystalline. The morphology of the deposited thin films remarkably changed as the deposition time increased. Optical transmittance measurements illustrate that transmission

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Kobayashi, Satoshi, Shuichi Nonomura, Kenichi Ushikoshi, et al. "Optical and electrical properties of nano-crystalline GaN thin films and their application for thin-film transistor." Journal of Crystal Growth 189-190 (June 1998): 749–52. http://dx.doi.org/10.1016/s0022-0248(98)00281-4.

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TSUKIOKA, MASAYUKI, TASUKU MASHIO, MASAJI SHIMAZU, and TAKESHI NAKAMURA. "PREFERABLE ORIENTATION OF CRYSTALLINE THIN-FILM OF MODIFIED BNN SYSTEM." Modern Physics Letters B 03, no. 06 (1989): 465–70. http://dx.doi.org/10.1142/s021798498900073x.

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Using rf-sputtering method, modified BNN ( Ba 2 NaNb 5 O 15) thin-films, which are highly aligned, were prepared on a polished surface of a stainless steel plate and on a polished silicon wafer. It was found that preferably aligned thin-films were successfully obtained only when modified Nb-rich BNN target was used. Preferable orientation of these thin-films was confirmed by X-ray diffraction measurement. In order to find the correlation between preferable orientation and separation from plasma center, X-ray measurement was carried out at several points on the thin-film sputtered on a long sta

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Yang, Guoyong, Yunxiang Lu, Bo Wang, et al. "Chemical Vapor Deposition of <110> Textured Diamond Film through Pre-Seeding by Diamond Nano-Sheets." Materials 15, no. 21 (2022): 7776. http://dx.doi.org/10.3390/ma15217776.

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Diamond films prepared by chemical vapor deposition will exhibit different surface morphologies, which are determined by the texture and the structural perfection of the deposited diamond. In general, its surface morphology can be controlled by adjusting the deposition conditions. In the present work, <110> textured diamond film was deposited on single crystalline silicon through pre-seeding by diamond nanosheets, rather than controlling the deposition conditions. The employed diamond nano-sheets were prepared by cleavage along a plane, exhibiting good crystallinity. Before chemical vapo

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KAYANI, ZOHRA NAZIR, SAIRA RIAZ, and SHAHZAD NASEEM. "STRUCTURAL AND MAGNETIC PROPERTIES OF THIN FILM OF IRON NITRIDE." Surface Review and Letters 21, no. 01 (2014): 1450013. http://dx.doi.org/10.1142/s0218625x14500139.

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The nano-crystalline iron nitride films with a mixture of γ- Fe 4 N , ε Fe 3 N and α Fe 2 N phases were synthesized on copper substrate by sol–gel technology. The structure, morphology and magnetic properties of the samples were characterized using X-ray diffraction, scanning electron microscopy, and vibrating sample magnetometer. The films are ferromagnetic at room temperature. Magnetic properties such as coercive forces and saturation magnetization were found to be 398 Oestered and 32.92 emu/cm3, respectively.

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