Bibliografías temáticas / Plasma immersion ion implantation

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Literatura académica sobre el tema "Plasma immersion ion implantation"

Autor: Grafiati
Publicado: 4 de junio de 2021
Última modificación: 25 de julio de 2025

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Artículos de revistas sobre el tema "Plasma immersion ion implantation"

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Mantese, Joseph V., Ian G. Brown, Nathan W. Cheung, and George A. Collins. "Plasma-Immersion Ion Implantation." MRS Bulletin 21, no. 8 (1996): 52–56. http://dx.doi.org/10.1557/s0883769400035727.

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Plasma-immersion ion implantation (PIII) is an emerging technology for the surface engineering of semiconductors, metals, and dielectrics. It is inherently a batch-processable technique that lends itself to the implantation of large numbers of parts simultaneously. It thus offers the possibility of introducing ion implantation into manufacturing processes that have not traditionally been feasible using conventional implantation.In PIII the part to be treated is placed in a vacuum chamber in which is generated a plasma containing the ions of the species to be implanted. The plasma based implant
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Thomae, Rainer W. "Plasma-immersion ion implantation." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 139, no. 1-4 (1998): 37–42. http://dx.doi.org/10.1016/s0168-583x(97)00952-x.

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MIREAULT, N., and G. G. ROSS. "MODIFICATION OF WETTING PROPERTIES OF PMMA BY IMMERSION PLASMA ION IMPLANTATION." Surface Review and Letters 15, no. 04 (2008): 345–54. http://dx.doi.org/10.1142/s0218625x08011470.

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Advancing and receding contact angles below 5° have been obtained on PMMA surfaces with the implantation of argon and oxygen ions. The ion implantations were performed by means of the Immersion Plasma Ion Implantation (IPII) technique, a hybrid between ion beams and immersion plasmas. Characterization of treated PMMA surfaces by means of XPS and its combination with chemical derivatization (CD-XPS) have revealed the depletion of oxygen and the creation of dangling bonds, together with the formation of new chemical functions such as –OOH , –COOH and C = C . These observations provide a good exp
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Lieberman, M. A. "Model of plasma immersion ion implantation." Journal of Applied Physics 66, no. 7 (1989): 2926–29. http://dx.doi.org/10.1063/1.344172.

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Kondyurin, A., V. Karmanov, and R. Guenzel. "Plasma immersion ion implantation of polyethylene." Vacuum 64, no. 2 (2001): 105–11. http://dx.doi.org/10.1016/s0042-207x(01)00381-5.

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López-Callejas, R., R. Valencia-Alvarado, A. E. Muñoz-Castro, O. G. Godoy-Cabrera, and J. L. Tapia-Fabela. "Instrumentation for plasma immersion ion implantation." Review of Scientific Instruments 73, no. 12 (2002): 4277–82. http://dx.doi.org/10.1063/1.1517144.

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Collins, G. A., R. Hutchings, and J. Tendys. "Plasma immersion ion implantation of steels." Materials Science and Engineering: A 139 (July 1991): 171–78. http://dx.doi.org/10.1016/0921-5093(91)90613-r.

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Mändl, S., J. Brutscher, R. Günzel, and W. Möller. "Ion energy distribution in plasma immersion ion implantation." Surface and Coatings Technology 93, no. 2-3 (1997): 234–37. http://dx.doi.org/10.1016/s0257-8972(97)00051-0.

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Kenny, M. J., L. S. Wielunski, J. Tendys, and G. A. Collins. "A comparison of plasma immersion ion implantation with conventional ion implantation." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 80-81 (June 1993): 262–66. http://dx.doi.org/10.1016/0168-583x(93)96120-2.

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Yankov, Rossen A., and Stephan Mändl. "Plasma immersion ion implantation for silicon processing." Annalen der Physik 513, no. 4 (2001): 279–98. http://dx.doi.org/10.1002/andp.20015130401.

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Tesis sobre el tema "Plasma immersion ion implantation"

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Chen, Shou-Mian. "Plasma immersion ion implantation of silicon." Thesis, University of Surrey, 1997. http://epubs.surrey.ac.uk/842893/.

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Plasma Immersion Ion Implantation has several unique advantages over conventional implantation, such as low cost, large area capability, non-line-of-sight features and high dose rate implantation. However, it is still far from use in routine production because of problems such as the ability to control the ion depth profile in targets, the ion dose and contamination. In this thesis, a PIII system has been systematically calibrated, and a computer simulation code for PIII has been developed in order to understand more clearly the physics of the PIII process and to optimise the experimental cond
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Allan, Scott Young. "Ion Energy Measurements in Plasma Immersion Ion Implantation." Thesis, The University of Sydney, 2009. http://hdl.handle.net/2123/5338.

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This thesis investigates ion energy distributions (IEDs) during plasma immersion ion implantation (PIII). PIII is a surface modification technique where an object is placed in a plasma and pulse biased with large negative voltages. The energy distribution of implanted ions is important in determining the extent of surface modifications. IED measurements were made during PIII using a pulse biased retarding field energy analyser (RFEA) in a capacitive RF plasma. Experimental results were compared with those obtained from a two dimensional numerical simulation to help explain the origins of featu
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Allan, Scott Young. "Ion Energy Measurements in Plasma Immersion Ion Implantation." The School of Physics. The Faculty of Science, 2009. http://hdl.handle.net/2123/5338.

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Doctor of Philosophy (PhD)<br>This thesis investigates ion energy distributions (IEDs) during plasma immersion ion implantation (PIII). PIII is a surface modification technique where an object is placed in a plasma and pulse biased with large negative voltages. The energy distribution of implanted ions is important in determining the extent of surface modifications. IED measurements were made during PIII using a pulse biased retarding field energy analyser (RFEA) in a capacitive RF plasma. Experimental results were compared with those obtained from a two dimensional numerical simulation to hel
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Oates, Thomas William Henry. "Metal plasma immersion ion implantation and deposition using polymer substrates." Connect to full text, 2003. http://hdl.handle.net/2123/571.

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Thesis (Ph. D.)--University of Sydney, 2004.<br>Title from title screen (viewed 5 May 2008). Submitted in fulfilment of the requirements for the degree of Doctor of Philosophy to the School of Physics, Faculty of Science. Degree awarded 2004; thesis submitted 2003. Includes bibliographical references. Also available in print form.
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Oates, T. W. H. "Metal plasma immersion ion implantation and deposition using polymer substrates." Thesis, The University of Sydney, 2003. http://hdl.handle.net/2123/571.

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This thesis investigates the application of plasma immersion ion implantation (PIII) to polymers. PIII requires that a high negative potential be applied to the surface of the material while it is immersed in a plasma. This presents a problem for insulating materials such as polymers, since the implanting ions carry charge to the surface, resulting in a charge accumulation that effectively neutralises the applied potential. This causes the plasma sheath at the surface to collapse a short time after the potential is applied. Measurements of the sheath dynamics, including the collapsing shea
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Oates, T. W. H. "Metal plasma immersion ion implantation and deposition using polymer substrates." University of Sydney. Physics, 2003. http://hdl.handle.net/2123/571.

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This thesis investigates the application of plasma immersion ion implantation (PIII) to polymers. PIII requires that a high negative potential be applied to the surface of the material while it is immersed in a plasma. This presents a problem for insulating materials such as polymers, since the implanting ions carry charge to the surface, resulting in a charge accumulation that effectively neutralises the applied potential. This causes the plasma sheath at the surface to collapse a short time after the potential is applied. Measurements of the sheath dynamics, including the collapsing shea
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Kosobrodova, Elena. "Plasma Immersion Ion Implanted Polymers for Antibody Microarray Applications." Thesis, The University of Sydney, 2014. http://hdl.handle.net/2123/13676.

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A novel platform for protein microarrays with improved sensitivity and reproducibility was developed. Plasma immersion ion implantation (PIII) treated polycarbonate (PC) was used as a substrate for anti-cluster of differentiation (CD) antibody microarrays. Compared to the current industrial standard, nitrocellulose-coated glass slides, the novel platform requires a three times lower concentration of anti-CD antibodies to achieve an equivalent signal strength and has about two times better reproducibility and three times higher sensitivity. For the first time, an anti-CD antibody microarray w
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Bozkurt, Bilge. "Dynamic Ion Behavior In Plasma Source Ion Implantation." Master's thesis, METU, 2006. http://etd.lib.metu.edu.tr/upload/12607025/index.pdf.

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The aim of this work is to analytically treat the dynamic ion behavior during the evolution of the ion matrix sheath, considering the industrial application plasma source ion implantation for both planar and cylindrical targets, and then to de-velop a code that simulates this dynamic ion behavior numerically. If the sepa-ration between the electrodes in a discharge tube is small, upon the application of a large potential between the electrodes, an ion matrix sheath is formed, which fills the whole inter-electrode space. After a short time, the ion matrix sheath starts moving towards the cathod
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Tsoutas, Kostadinos Wallach. "Towards Advanced Bionics: Plasma Immersion Ion Implantation of Conductive Polypyrrole Films." Thesis, The University of Sydney, 2019. https://hdl.handle.net/2123/22624.

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This thesis investigates the use of Plasma Immersion Ion Implantation (PIII) to modify electroploymerised polypyrrole (PPy) to allow for surface covalent binding of a range of biomolecules for biofunctionalized bionic applications. Synthesis regimes were investigated, aiming to produce PPy samples with the highest degree of batch consistency, chemical homogeneity and electroactivity. Galvanostatic samples at 0.2mA proved to produce superior PPy samples. PIII of nitrogen ions into PPy was modelled using TRIM/SRIM software. The depth of the treated volume of PPy was determined, along with the u
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Watkins, John H. "The application of plasma immersion ion implantation to sheep shearing combs /." Title page, contents and abstract only, 1995. http://web4.library.adelaide.edu.au/theses/09PH/09phw335.pdf.

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Libros sobre el tema "Plasma immersion ion implantation"

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André, Anders, ed. Handbook of plasma immersion ion implantation and deposition. Wiley, 2000.

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Dearborn, Mich ). International Workshop on Plasma-Based Ion Implantation (4th 1998. Papers from the Fourth International Plasma-Based Ion Implantation Workshop: 2-4 June 1998, Dearborn, Michigan. American Vacuum Society through the American Institute of Physics, 1999.

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United States. National Aeronautics and Space Administration., ed. Plasma assisted surface coating/modification processes: An emerging technology. National Aeronautics and Space Administration, 1987.

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Robert, Moran. Thin layer deposition: Highlighting implantation and epitaxy, plasma, thermal, and ion. Business Communications Co., 1996.

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1928-, Hochman Robert F., Solnick-Legg Hillary, Legg Keith O, ASM International. Ion Implantation Committee., and ASM International. Plasma Processes Committee., eds. Ion implantation and plasma assisted processes: Proceedings of the Conference on Ion Implantation and Plasma Assisted Processes for Industrial Applications, Atlanta, Georgia, 22-25 May 1988. ASM International, 1988.

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R, Conrad John, Sridharan Kumar, and Applied Science and Technology (ASTeX), Inc., eds. Papers from the First International Workshop on Plasma-Based Ion Implantation: 4-6 August 1993, University of Wisconsin--Madison, Madison, Wisconsin. Published for the American Vacuum Society by the American Institute of Physics, 1994.

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Anders, André. Handbook of Plasma Immersion Ion Implantation and Deposition. Wiley-Interscience, 2000.

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Hochman, Robert F., Hillary Solnick-Legg, and Keith O. Legg. Ion Implantation and Plasma Assisted Processes: Proceedings of the Conference on Ion Implantation and Plasma Assisted Processes for Industrial Appli. Asm Intl, 1989.

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Papers from the First International Workshop on Plasma-Based Ion Implantation: 4-6 August 1993, University of Wisconsin--Madison, Madison, Wisconsin. Published for the American Vacuum Society by the American Institute of Physics, 1994.

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Gnedenkov, S. V. Plazmennoe ėlektroliticheskoe oksidirovanie metallov i splavov v tartratsoderzhashchikh rastvorakh =: Plazma electrolitic oxidation of metal and alloys in tartrate containing electrolytes. 2008.

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Capítulos de libros sobre el tema "Plasma immersion ion implantation"

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Yu, Crid, and Nathan W. Cheung. "Plasma Immersion Ion Implantation: A Perspective." In Crucial Issues in Semiconductor Materials and Processing Technologies. Springer Netherlands, 1992. http://dx.doi.org/10.1007/978-94-011-2714-1_25.

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Jirásková, Y., O. Schneeweiss, V. Peřina, C. Blawert, and B. L. Mordike. "Phase Composition of Steel Surfaces after Plasma Immersion Ion Implantation." In Mössbauer Spectroscopy in Materials Science. Springer Netherlands, 1999. http://dx.doi.org/10.1007/978-94-011-4548-0_17.

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Hirschmann, A. C. O., M. M. Silva, C. Moura Neto, et al. "Surface Modification of Inconel 718 Superalloy by Plasma Immersion Ion Implantation." In Superalloy 718 and Derivatives. John Wiley & Sons, Inc., 2012. http://dx.doi.org/10.1002/9781118495223.ch75.

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Coeur, F., Y. Arnal, J. Pelletier, O. Lesaint, O. Maulat, and M. Roche. "Monoatomic Ion Rich DECR Plasmas for Ion Implantation by Plasma Immersion Using a New High Voltage — High Current Pulse Generator." In Advanced Technologies Based on Wave and Beam Generated Plasmas. Springer Netherlands, 1999. http://dx.doi.org/10.1007/978-94-017-0633-9_32.

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Uzumaki, E. T., and C. S. Lambert. "Characterization of Titanium Oxide Thin Films Produced by Plasma Immersion Ion Implantation for Biomedical Implants." In Bioceramics 20. Trans Tech Publications Ltd., 2007. http://dx.doi.org/10.4028/0-87849-457-x.673.

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Pakpum, C., N. Pasaja, P. Suanpoot, et al. "Diamond-Like Carbon Formed by Plasma Immersion Ion Implantation and Deposition Technique on 304 Stainless Steel." In Solid State Phenomena. Trans Tech Publications Ltd., 2005. http://dx.doi.org/10.4028/3-908451-12-4.129.

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You, Y. Z., D. I. Kim, and H. G. Chun. "A study on the Surface Properties of Nitrogen Implanted H13 Steel by Plasma Immersion Ion Implantation." In Solid State Phenomena. Trans Tech Publications Ltd., 2006. http://dx.doi.org/10.4028/3-908451-25-6.275.

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Uzumaki, E. T., C. S. Lambert, W. D. Belangero, and Cecília A. C. Zavaglia. "Biocompatibility of Titanium Based Implants with Diamond-Like Carbon Coatings Produced by Plasma Immersion Ion Implantation and Deposition." In Bioceramics 20. Trans Tech Publications Ltd., 2007. http://dx.doi.org/10.4028/0-87849-457-x.677.

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Liu, Hongxi, Rong Zhou, Yehua Jiang, and Baoyin Tang. "Friction and Wear Behaviors and Rolling Contact Fatigue Life of TiN Film on Bearing Steel by Plasma Immersion Ion Implantation and Deposition Technique." In Advanced Tribology. Springer Berlin Heidelberg, 2009. http://dx.doi.org/10.1007/978-3-642-03653-8_241.

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Möller, Wolfhard. "Plasma Based Ion Implantation." In Advanced Technologies Based on Wave and Beam Generated Plasmas. Springer Netherlands, 1999. http://dx.doi.org/10.1007/978-94-017-0633-9_10.

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Actas de conferencias sobre el tema "Plasma immersion ion implantation"

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Wei, Ronghua, Marta A. Jakab, Kent Coulter, and A. M. Abd El-Rahman. "Plasma Surface Engineering of Materials for Corrosion Protection." In CORROSION 2010. NACE International, 2010. https://doi.org/10.5006/c2010-10261.

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Abstract The surface of a component is very critical to maintain the proper functions when it is directly exposed to a very harsh environment. Various commercial treatments are available to enhance the surface properties including heat treatment and painting. For over a half of a century, plasmas have been studied for enhancing the surface properties of materials, and in some areas plasma surface engineering is applied to industrial components. In this paper, we will discuss the latest research in this area and various technologies with the emphasis on materials corrosion protection. SwRI has
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Oliveira, Rogerio M., Mario Ueda, Jose O. Rossi, and Beatriz L. D. Moreno. "Plasma Immersion Ion Implantation with Lithium Ions." In 2007 IEEE Pulsed Power Plasma Science Conference. IEEE, 2007. http://dx.doi.org/10.1109/ppps.2007.4345866.

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Burenkov, A., P. Pichler, J. Lorenz, Y. Spiegel, J. Duchaine, and F. Torregrosa. "Simulation of plasma immersion ion implantation." In 2011 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD). IEEE, 2011. http://dx.doi.org/10.1109/sispad.2011.6034962.

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Sakudo, N., N. Ikenaga, K. Matsui, and N. Sakumoto. "Exact ion energy in plasma immersion ion implantation." In 2015 IEEE International Conference on Plasma Sciences (ICOPS). IEEE, 2015. http://dx.doi.org/10.1109/plasma.2015.7179884.

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Díaz, C., J. A. García, S. Mändl, R. Pereiro, B. Fernández, and R. J. Rodríguez. "Plasma immersion ion implantation for reducing metal ion release." In ION IMPLANTATION TECHNOLOGY 2012: Proceedings of the 19th International Conference on Ion Implantation Technology. AIP, 2012. http://dx.doi.org/10.1063/1.4766544.

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Oliveira, R. M., M. Ueda, J. O. Rossi, and B. Diaz. "Plasma immersion ion implantation with lithium atoms." In 2007 IEEE International Pulsed Power Plasma Science Conference (PPPS 2007). IEEE, 2007. http://dx.doi.org/10.1109/ppps.2007.4651972.

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Nizou, S., V. Vervisch, H. Etienne, et al. "Deep Trench Doping by Plasma Immersion Ion Implantation in Silicon." In ION IMPLANTATION TECHNOLOGY: 16th International Conference on Ion Implantation Technology - IIT 2006. AIP, 2006. http://dx.doi.org/10.1063/1.2401501.

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Vahedi, V., M. A. Lieberman, M. V. Alves, J. P. Verboncoeur, and C. K. Birdsall. "A collisional model for plasma immersion ion implantation." In 1990 Plasma Science IEEE Conference Record - Abstracts. IEEE, 1990. http://dx.doi.org/10.1109/plasma.1990.110778.

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Burenkov, Alex, Juergen Lorenz, Yohann Spiegel, and Frank Torregrosa. "Simulation of plasma immersion ion implantation into silicon." In 2015 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD). IEEE, 2015. http://dx.doi.org/10.1109/sispad.2015.7292298.

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Cheung, N. W., W. En, J. Gao, et al. "Plasma Immersion Ion Implantation for Electronic Materials Applications." In 1995 International Conference on Solid State Devices and Materials. The Japan Society of Applied Physics, 1995. http://dx.doi.org/10.7567/ssdm.1995.c-2-1.

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Informes sobre el tema "Plasma immersion ion implantation"

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Scheuer, J. T., K. C. Walter, D. J. Rej, M. Nastasi, and J. P. Blanchard. Plasma source ion implantation of ammonia into electroplated chromium. Office of Scientific and Technical Information (OSTI), 1995. http://dx.doi.org/10.2172/28338.

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Bibeault, M. L., and G. R. Thayer. Operations manual for the plasma source ion implantation economics program. Office of Scientific and Technical Information (OSTI), 1995. http://dx.doi.org/10.2172/366451.

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Lillard, R. S., D. P. Butt, T. N. Taylor, K. C. Walter, and M. Nastasi. Diamond-like carbon produced by plasma source ion implantation as a corrosion barrier. Office of Scientific and Technical Information (OSTI), 1998. http://dx.doi.org/10.2172/645555.

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Wood, B. P., W. A. Reass, and I. Henins. Plasma source ion implantation of metal ions: Synchronization of cathodic-arc plasma production and target bias pulses. Office of Scientific and Technical Information (OSTI), 1995. http://dx.doi.org/10.2172/52820.

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