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Artykuły w czasopismach na temat "Electron microscopy Methodology"

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Iha, Luiz Cesar Nakao, Andre Aguillera, Flavio Faria, Cristiane Akemi Kasse, Oswaldo Laercio Mendonça Cruz, and Edna Frey Muller. "R147: Scanning Electron Microscopy: Alternatives in Methodology." Otolaryngology–Head and Neck Surgery 135, no. 2_suppl (August 2006): P156. http://dx.doi.org/10.1016/j.otohns.2006.06.901.

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Downing, Kenneth H. "Instrumentation and methodology for electron crystallography." Proceedings, annual meeting, Electron Microscopy Society of America 49 (August 1991): 420–21. http://dx.doi.org/10.1017/s0424820100086404.

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The determination of three-dimensional structures of macromolecules at atomic resolution remains one oμf the great promises of electron microscopy. Instrumental problems which had to be overcome in order to achieve single-atom resolution have long been recognized and to a large extent overcome. It is interesting to note that most of the instrumental developments were already incorporated in a microscope under construction over 20 years ago. However, the application of techniques to circumvent limitations imposed by the sensitivity of organic specimen to radiation damage are still developing. E
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Liang, Alice F., Chris Petzold, Kristen Dancel-Manning, Yan Deng, and Michael Cammer. "Methodology Development at NYULMC Microscopy Core - Correlative Light and Electron Microscopy Applications." Microscopy and Microanalysis 21, S3 (August 2015): 879–80. http://dx.doi.org/10.1017/s143192761500519x.

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Leppard, GG, A. Heissenberger, and GJ Herndl. "Ultrastructure of marine snow. I. Transmission electron microscopy methodology." Marine Ecology Progress Series 135 (1996): 289–98. http://dx.doi.org/10.3354/meps135289.

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Danev, Radostin, Haruaki Yanagisawa, and Masahide Kikkawa. "Cryo-Electron Microscopy Methodology: Current Aspects and Future Directions." Trends in Biochemical Sciences 44, no. 10 (October 2019): 837–48. http://dx.doi.org/10.1016/j.tibs.2019.04.008.

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Sicignano, A., and M. Vaez Iravani. "Methodology and practice of in situ differential scanning electron microscopy." Scanning 12, no. 2 (1990): 61–68. http://dx.doi.org/10.1002/sca.4950120203.

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Asher, Lucas, and Jessica Hata. "Platelet Electron Microscopy: Utilizing LEAN Methodology to Optimize Laboratory Workflow." Pediatric and Developmental Pathology 23, no. 5 (May 19, 2020): 356–61. http://dx.doi.org/10.1177/1093526620915361.

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Background Platelet electron microscopy (PEM) is the gold standard methodology for diagnosing storage pool disorder, defined as a paucity of delta granules, alpha granules, or both. PEM literature is limited with few published resources and without well-developed interlaboratory standardization for the preparation and examination of platelet samples. Methods Whole mount (WM) dense body (DB) counts for 300 pediatric cases were reviewed to determine whether counting fewer platelets could yield the same results. For 6 cases, DB average was determined on the day of WM preparation and on 2 consecut
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Kammers, A. D., and S. Daly. "Digital Image Correlation under Scanning Electron Microscopy: Methodology and Validation." Experimental Mechanics 53, no. 9 (July 11, 2013): 1743–61. http://dx.doi.org/10.1007/s11340-013-9782-x.

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Menteş, T. O., G. Zamborlini, A. Sala, and A. Locatelli. "Cathode lens spectromicroscopy: methodology and applications." Beilstein Journal of Nanotechnology 5 (October 27, 2014): 1873–86. http://dx.doi.org/10.3762/bjnano.5.198.

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The implementation of imaging techniques with low-energy electrons at synchrotron laboratories allowed for significant advancement in the field of spectromicroscopy. The spectroscopic photoemission and low energy electron microscope, SPELEEM, is a notable example. We summarize the multitechnique capabilities of the SPELEEM instrument, reporting on the instrumental aspects and the latest developments on the technical side. We briefly review applications, which are grouped into two main scientific fields. The first one covers different aspects of graphene physics. In particular, we highlight the
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Yang, Jinfeng, and Yoichi Yoshida. "Relativistic Ultrafast Electron Microscopy: Single-Shot Diffraction Imaging with Femtosecond Electron Pulses." Advances in Condensed Matter Physics 2019 (May 2, 2019): 1–6. http://dx.doi.org/10.1155/2019/9739241.

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We report on a single-shot diffraction imaging methodology using relativistic femtosecond electron pulses generated by a radio-frequency acceleration-based photoemission gun. The electron pulses exhibit excellent characteristics, including a root-mean-square (rms) illumination convergence of 31 ± 2 μrad, a spatial coherence length of 5.6 ± 0.4 nm, and a pulse duration of approximately 100 fs with (6.3 ± 0.6) × 106 electrons per pulse at 3.1 MeV energy. These pulses facilitate high-quality diffraction images of gold single crystals with a single shot. The rms spot width of the diffracted beams
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Rozprawy doktorskie na temat "Electron microscopy Methodology"

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Distasi, Matthew R. "The 3D characterization of the annulate lamellae : the development of a new methodology incorporating 3D-anaglyph techniques and serial transmission electron microscopy." Virtual Press, 2003. http://liblink.bsu.edu/uhtbin/catkey/1266020.

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Zhou, Dan [Verfasser], Peter A. van [Akademischer Betreuer] Aken, and Christoph T. [Akademischer Betreuer] Koch. "Aberration-Corrected Analytical Transmission Electron Microscopy of Light Elements in Complex Oxides: Application and Methodology / Dan Zhou. Betreuer: Peter A. van Aken ; Christoph T. Koch." Darmstadt : Universitäts- und Landesbibliothek Darmstadt, 2016. http://d-nb.info/1112044884/34.

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Jespersson, Niklas, and Torbjörn Sandberg. "Evaluation of different non-metallic inclusions in steel chips by using electrolytic extraction : Evaluation of a methodology for electrolytic extraction and scanning electron microscopy - energy dispersive spectroscopy (SEM-EDS) analysis." Thesis, KTH, Materialvetenskap, 2021. http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-298419.

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Analysing non-metallic inclusions (NMI) by conventional microscopy is prone to errors.  Better imaging can be achieved by using electrolytic extraction (EE) to effectively dissolve the metal matrix, freeing the inclusions so that they can be collected on a filter.  This method of studying NMI was tested on a 157C steel chip, with EE taking place three times on the same surface with increasing levels of  charge  applied.  The  relationship  between  charge  and  extracted  layer depth was examined, so as to facilitate the targeting of NMI from specific depths.  A selection of the extracted incl
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Ihiawakrim, Dris. "Etude par les techniques avancées de microscopie électronique en transmission de matériaux fragiles." Thesis, Strasbourg, 2019. http://www.theses.fr/2019STRAE005/document.

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Le travail présenté dans ce manuscrit a montré l’importance du développement méthodologique et technique pour identifier et débloquer les verrous empêchant l’analyse de matériaux hybrides et complexes qui se dégradent sous irradiation par un faisceau d’électrons. Nous avons mis en évidence que des dégâts sur l’échantillon produits par les électrons n’apparaissent qu’au-dessus d'un certain seuil de densité de courant électronique qui dépend de la nature du matériau et de ses caractéristiques morphologiques et structurales. Ces développements couplés à la Cryo-EM, nous ont permis de mettre en év
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Andrikopoulos, Pavlos. "Direct electric field visualization in semiconductor planar structures." Thesis, Monterey, Calif. : Naval Postgraduate School, 2006. http://bosun.nps.edu/uhtbin/hyperion.exe/06Dec%5FAndrikopoulos.pdf.

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Thesis (M.S. in Applied Physics and M.S. in Systems Engineering)--Naval Postgraduate School, December 2006.<br>Thesis Advisor(s): Nancy M. Haegel, David Jenn. "December 2006." Includes bibliographical references (p. 125). Also available in print.
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Avery, Meredith Ryan. "Multivariate Analysis of Volcanic Particle Morphology: Methodology and Application of a Quantitative System of Fragmentation Mechanism Classification." Bowling Green State University / OhioLINK, 2015. http://rave.ohiolink.edu/etdc/view?acc_num=bgsu1428939377.

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Zhou, Dan. "Aberration-Corrected Analytical Transmission Electron Microscopy of Light Elements in Complex Oxides: Application and Methodology." Phd thesis, 2016. https://tuprints.ulb.tu-darmstadt.de/5236/1/Dan%20PhD%20thesis%202016%20January%2013.pdf.

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The advent of aberration correctors for electron optical lenses at the end of 20th century has brought atomic resolution analysis of the materials into a new era. In this thesis, the new possibilities of application and methodology on aberration-corrected analytical transmission electron microscopy (TEM) of light elements in complex oxides are explored by experiments and image simulations, with the emphasis on annular bright-field (ABF) imaging. The arrangement and bonding of light elements, like lithium (Li) and oxygen (O), in complex oxides plays a crucial rule in the material’s propertie
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"Study of Chinese antique objects by surface science techniques =: 中國古物之表面科學技術硏究". 1999. http://library.cuhk.edu.hk/record=b5890150.

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by Yeung Sau Lai Catherine.<br>Thesis (M.Phil.)--Chinese University of Hong Kong, 1999.<br>Includes bibliographical references.<br>Text in English; abstracts in English and Chinese.<br>by Yeung Sau Lai Catherine.<br>Acknowledgments --- p.i<br>Abstract --- p.ii<br>Table of Contents --- p.iv<br>List of Figures --- p.vii<br>List of Tables --- p.ix<br>Chapter Chapter1 --- Introduction to the Study of Chinese antique objects using surface science techniques<br>Chapter 1.1 --- Surface Science --- p.1<br>Chapter 1.2 --- Surface Science Techniques --- p.1<br>Chapter 1.3 --- Study of Antiques Ob
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Książki na temat "Electron microscopy Methodology"

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Schatten, Heide. Scanning electron microscopy for the life sciences. Cambridge: Cambridge University Press, 2012.

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Ayache, Jeanne. Sample preparation handbook for transmission electron microscopy: Methodology. New York: Springer, 2010.

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Hayat, M. A. Negative staining. New York: McGraw-Hill Pub. Co., 1990.

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Ayache, Jeanne, Luc Beaunier, Jacqueline Boumendil, Gabrielle Ehret, and Danièle Laub. Sample Preparation Handbook for Transmission Electron Microscopy: Methodology. Springer, 2014.

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Ayache, Jeanne, Luc Beaunier, and Jacqueline Boumendil. Sample Preparation Handbook for Transmission Electron Microscopy: Methodology. Springer, 2011.

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(Editor), Prajna Das Gupta, and Hiroshi Yamamoto (Editor), eds. Electron Microscopy in Medicine and Biology. Science Publishers, 2000.

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J, Sommerville, and Scheer U, eds. Electron microscopy in molecular biology: A practical approach. Oxford, England: IRL Press, 1987.

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(Editor), J. Sommerville, and U. Scheer (Editor), eds. Electron Microscopy in Molecular Biology: A Practical Approach. Oxford University Press, USA, 1986.

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Handbook of cryo-preparation methods for electron microscopy. Boca Raton: CRC Press, 2008.

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(Editor), Annie Cavalier, Daniele Spehner (Editor), and Bruno M. Humbel (Editor), eds. Handbook of Cryopreparation Methods for Electron Microscopy (Methods in Visualization). CRC, 2008.

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Części książek na temat "Electron microscopy Methodology"

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Ayache, Jeanne, Luc Beaunier, Jacqueline Boumendil, Gabrielle Ehret, and Danièle Laub. "Methodology: General Introduction." In Sample Preparation Handbook for Transmission Electron Microscopy, 1–2. New York, NY: Springer New York, 2010. http://dx.doi.org/10.1007/978-0-387-98182-6_1.

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Zemlin, F. "Cryoelectron Microscopy of Protein Crystals. Some Remarks on the Methodology." In Electron Crystallography of Organic Molecules, 305–8. Dordrecht: Springer Netherlands, 1991. http://dx.doi.org/10.1007/978-94-011-3278-7_25.

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Afsari, Bijan, and Gregory S. Chirikjian. "A Methodology for Deblurring and Recovering Conformational States of Biomolecular Complexes from Single Particle Electron Microscopy." In Lecture Notes in Computer Science, 643–53. Cham: Springer International Publishing, 2015. http://dx.doi.org/10.1007/978-3-319-25040-3_69.

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Morel, Gérard, Annie Cavalier, and Lynda Williams. "Principles of Methodology." In in situ Hybridization in Electron Microscopy, 47–64. CRC Press, 2001. http://dx.doi.org/10.1201/9781420042504-2.

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YONG, S. C. "PREPARATION, PROCESSING, SECTIONING AND STAINING FOR ELECTRON MICROSCOPY." In Research Methodology in Orthopaedics and Reconstructive Surgery, 161–70. WORLD SCIENTIFIC, 2002. http://dx.doi.org/10.1142/9789812778338_0009.

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Mortimer, Catherine, and Martin Stoney. "A Methodology for Punchmark Analysis Using Electron Microscopy." In Archaeological Sciences 1995, 119–22. Oxbow Books, 2017. http://dx.doi.org/10.2307/j.ctvh1dtz1.23.

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N. Hattori, Azusa, and Ken Hattori. "Creation and Evaluation of Atomically Ordered Side- and Facet-Surface Structures of Three-Dimensional Silicon Nano-Architectures." In 21st Century Surface Science - a Handbook. IntechOpen, 2020. http://dx.doi.org/10.5772/intechopen.92860.

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The realization of three-dimensional (3D)-architected nanostructures, that is, the transformation from novel two-dimensional (2D) film-based devices to 3D complex nanodevices, is of crucial importance with the progress of scaling down devices to nanometer order. However, little attention has been devoted to controlling the atomic ordering and structures of side-surfaces on 3D structures, while techniques for controlling and investigating 2D surfaces, namely, surface science, have been established only for planar 2D surfaces. We have established an original methodology that enables atomic orderings and arrangements of surfaces with arbitrary directions to be observed on 3D figured structures by developing diffraction and microscopy techniques. An original technique, namely, directly and quantitatively viewing the side- and facet-surfaces at the atomic scale by reflection high-energy electron diffraction (RHEED) and low-energy electron diffraction (LEED), can be used to determine process parameters in etching. This chapter introduces methods of evaluation by RHEED and LEED based on a reciprocal space map and methods of creating various atomically flat 111 and {100} side-surfaces of 3D Si nano-architectures and tilted 111 facet-surfaces fabricated by lithography dry and wet etching processes, followed by annealing treatment in vacuum.
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Allen, Jessica L., Cari L. Johnson, Matthew J. Heumann, Jared Gooley, and William Gallin. "New technology and methodology for assessing sandstone composition: A preliminary case study using a quantitative electron microscope scanner (QEMScan)." In Mineralogical and Geochemical Approaches to Provenance. Geological Society of America, 2012. http://dx.doi.org/10.1130/2012.2487(11).

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Streszczenia konferencji na temat "Electron microscopy Methodology"

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Toh, Suey Li, and Rong Ji. "Maximizing the Electron Microscopy Contrasts for Analysis." In ISTFA 2017. ASM International, 2017. http://dx.doi.org/10.31399/asm.cp.istfa2017p0345.

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Abstract To characterize materials or devices in the next generation cutting-edge technologies, it is becoming more essential to carry out comprehensive characterization of the samples with a system that can provide a wealth of various contrast information. By analyzing the different signals detected at different angular scattering distribution, it can reveal tremendous information from the samples. Coupled with the superior detection capability, we have demonstrated the capability to enhance the fault isolation methodology of memory devices or media grain size analysis by optimizing various p
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Kang, H. C., J. T. Lim, J. S. Choi, T. Y. Lee, B. H. Lee, S. B. Chin, and D. H. Cho. "Methodology and mechanism study on high aspect ratio (HAR) contact bottom image in scanning electron microscopy." In Microlithography 2005, edited by Richard M. Silver. SPIE, 2005. http://dx.doi.org/10.1117/12.596832.

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Courbon, Franck, Sergei Skorobogatov, and Christopher Woods. "Direct Charge Measurement in Floating Gate Transistors of Flash EEPROM Using Scanning Electron Microscopy." In ISTFA 2016. ASM International, 2016. http://dx.doi.org/10.31399/asm.cp.istfa2016p0327.

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Abstract We present a characterization methodology for fast direct measurement of the charge accumulated on Floating Gate (FG) transistors of Flash EEPROM cells. Using a Scanning Electron Microscope (SEM) in Passive Voltage Contrast (PVC) mode we were able to distinguish between '0' and '1' bit values stored in each memory cell. Moreover, it was possible to characterize the remaining charge on the FG; thus making this technique valuable for Failure Analysis applications for data retention measurements in Flash EEPROM. The technique is at least two orders of magnitude faster than state-of-the-a
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Lai, Li-Lung, HungLing Chen, and Huimin Gao. "Methodology and Application of Backside Physical Failure Analysis." In ISTFA 2011. ASM International, 2011. http://dx.doi.org/10.31399/asm.cp.istfa2011p0428.

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Abstract There are some advantages to performing physical failure analysis from the backside as opposed to normal frontside analysis. However, there are challenges to be overcome with regard to sample preparation and scanning electron microscopy. Thus, we introduce this unusual technique to overcome the barrier of difficulty. This technique can eventually lead to the development of a versatile methodology that can be used in actual applications for failure analysis.
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Yu, Huisheng, Shuqing Duan, Ming Li, Qihua Zhang, and Wei-Ting Kary Chien. "Productive Polishing TEM Sample Preparation Methodology Development." In ISTFA 2014. ASM International, 2014. http://dx.doi.org/10.31399/asm.cp.istfa2014p0420.

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Abstract In this paper, three productive polishing transmission electron microscopy (TEM) sample preparation methods are reported. The methods are studied to improve the efficiency and expand the application fields. Method 1 and 2 address expanding conventional polishing method application on same or similar pattern samples. Method 1 used a laser mark to identify one of the sample; and method 2 used a Pt coated glass inserted between samples or a direct deposition of Pt on one of the samples. Method 3 was developed facilitate stacking three or more samples into a single, batch process block an
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Lee, Tan-Chen, Jui-Yen Huang, Li-Chien Chen, Ruey-Lian Hwang, and David Su. "Methodology for TEM Analysis of Barrier Profiles." In ISTFA 2002. ASM International, 2002. http://dx.doi.org/10.31399/asm.cp.istfa2002p0689.

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Abstract Device shrinkage has resulted in thinner barriers and smaller vias. Transmission Electron Microscopy (TEM) has become a common technique for barrier profile analysis because of its high image resolution. TEM sample preparation and image interpretation becomes difficult when the size of the small cylindrical via is close to the TEM sample thickness. Effects of different sample thickness and specimen preparation methods, therefore, have been investigated. An automatic FIB program has been shown to be useful in via sample preparation. Techniques for imaging a TEM specimen will be discuss
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Younan, Hua, Shen Yue, Chen Yixin, Fu Chao, and Li Xiaomin. "Studies on a Qualification Method (OSSD) for Microchip Al Bondpads." In ISTFA 2015. ASM International, 2015. http://dx.doi.org/10.31399/asm.cp.istfa2015p0295.

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Abstract In authors’ previous paper, an OSAT [Optical, SEM (Scanning Electron Microscopy), Auger (Auger Electron Spectroscopy) and TEM (Transmission Electron Microscopy)] methodology was developed for qualification of microchip aluminum (Al) bondpads. Using the OSAT methodology, one can qualify microchip Al bondpads. In this paper, we will further study the NSOP (Non-Stick On Pad) problem on microchip Al bondpads. A new qualification methodology, OSSD [(Optical, SEM, and Surface and Depth profiling X-ray Photoelectron Spectroscopy (XPS)] will be proposed, in which XPS surface analysis is used
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Shen, Cha-Ming, Tsan-Chen Chuang, Shi-Chen Lin, Lian-Fon Wen, and Chen-May Huang. "Combining the Nano-Probing Technique with Mathematics to Model and Identify Non-Visual Failures." In ISTFA 2007. ASM International, 2007. http://dx.doi.org/10.31399/asm.cp.istfa2007p0214.

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Abstract In this paper, we focus on how to identify non-visual failures by way of electrical analysis because some special failures cannot be observed by SEM (scanning electron microscopy) or TEM (transmission electron microscopy) even when they are precisely located by other analytical instrumentation or are symptomatic of an authentic or single suspect. The methodology described here was developed to expand the capabilities of nano-probing via C-AFM (conductive atomic forced microscopy), which can acquire detailed electrical data, and combining the technique with reasoned simulation using va
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Liu, Chin Kai, Chi Jen. Chen, Jeh Yan.Chiou, and David Su. "A Methodology to Reduce Ion Beam Induced Damage in TEM Specimens Prepared by FIB." In ISTFA 2002. ASM International, 2002. http://dx.doi.org/10.31399/asm.cp.istfa2002p0313.

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Abstract Focused ion beam (FIB) has become a useful tool in the Integrated Circuit (IC) industry, It is playing an important role in Failure Analysis (FA), circuit repair and Transmission Electron Microscopy (TEM) specimen preparation. In particular, preparation of TEM samples using FIB has become popular within the last ten years [1]; the progress in this field is well documented. Given the usefulness of FIB, “Artifact” however is a very sensitive issue in TEM inspections. The ability to identify those artifacts in TEM analysis is an important as to understanding the significance of pictures
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Cowan, J., and T. Taylor. "SEM Equipment Capabilities Evaluated for Sub-Half Micron Semiconductor Applications." In ISTFA 1997. ASM International, 1997. http://dx.doi.org/10.31399/asm.cp.istfa1997p0329.

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Abstract Evaluation of Scanning Electron Microscopes (SEMs) was initiated for the purpose of purchasing a SEM that would improve the productivity of scanning electron microscopy during the cycle of analysis and deprocessing of semiconductor devices in a failure analysis lab. In addition to the need for high image resolution at low electron acceleration voltages, an accurate motorized stage is a major evaluation factor. It is necessary for the analyst to drive directly to a known location such as a memory cell with a high assurance that the site of interest was found. There are two main areas o
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