Готові списки джерел за темами / Filtered vacuum arc

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Добірка наукової літератури з теми "Filtered vacuum arc"

Автор: Grafiati
Опубліковано: 28 травня 2022
Оновлено: 31 липня 2025

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Статті в журналах з теми "Filtered vacuum arc"

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Benti, Hailu Gemechu, Abraham Debebe Woldeyohannes, and Belete Sirahbizu Yigezu. "Improving the Efficiency of Cutting Tools through Application of Filtered Cathodic Vacuum Arc Deposition Coating Techniques: A Review." Advances in Materials Science and Engineering 2022 (May 28, 2022): 1–17. http://dx.doi.org/10.1155/2022/1450805.

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Анотація:
The challenge of enhancing cutting tool life has been dealt with by many research studies. However, this challenge seems endless with growing technological advancement which brings about incremental improvement in tool life. The objective of this review paper is focused at assessing filtered cathodic vacuum arc deposition techniques applied on cutting tools and their effect on tool efficiency. The paper particularly picks filtered cathodic vacuum arc deposition (FCVAD) among other well-identified methods of coating like the Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD). F
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2

Верещака, Алексей, and Aleksey Vereshchaka. "Development process of assisted filtered cathodic-vacuum-arc deposition (AFCVAD)." Bulletin of Bryansk state technical university 2014, no. 3 (2014): 10–13. http://dx.doi.org/10.12737/23189.

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Developed a process of assisted filtered cathodic-vacuum-arc deposition (AFCVAD). We used a special emitter (implantor) to generate Cr, Mo ions with high energy. Such key parameters of coatings as composition, structure, a thickness, hardness, adhesion in relation to a substrate obtained at various energy of chrome ions have been studied. A phenomenological (physical) model of assisted filtered cathodic-vacuum-arc deposition (AFCVAD), allows to predict the properties of the coatings formed on the basis of binary compounds as a function of the relationship Ra, characterizing parameters of ion i
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3

Brzezinka, Tomasz L., Jeff Rao, Jose M. Paiva, et al. "Facilitating TiB2 for Filtered Vacuum Cathodic Arc Evaporation." Coatings 10, no. 3 (2020): 244. http://dx.doi.org/10.3390/coatings10030244.

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Анотація:
TiB2 is well established as a superhard coating with a high melting point and a low coefficient of friction. The brittle nature of borides means they cannot be utilised with arc evaporation, which is commonly used for the synthesis of hard coatings as it provides a high deposition rate, fully ionised plasma and good adhesion. In this work, TiB2 conical cathodes with non-standard sintering additives (carbon and TiSi2) were produced, and the properties of the base material, such as grain structure, hardness, electrical resistivity and composition, were compared to those of monolithic TiB2. The d
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4

Maksimov, Y. V., A. S. Vereschaka, A. A. Vereschaka, et al. "Development and research of multilayer composite coatings with nano-dispersed structure which are deposited on cutting tools using assistance cathode-vacuum-arc processes." Izvestiya MGTU MAMI 7, no. 1-2 (2013): 73–82. http://dx.doi.org/10.17816/2074-0530-68031.

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Анотація:
The authors considered the problem of synthesis of multilayer coatings with nano-dispersed structure using the process of assistance filtered cathode-vacuum-arc deposition. The effect of high-energy assisting ions, generated by a special device (implanter), which the ВИТ-3 vacuum-arc setting was equipped with, is analyzed in the paper. The mechanisms of modifying the properties of the deposited coatings and cutting properties of carbide inserts with coatings obtained in assisting cathode-vacuum-arc deposition with filtration of ion-vapor flow are analyzed as well.
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TAKIKAWA, Hirofumi, and Takahiro BANDO. "Vacuum Arc Deposition: Steered and Filtered Methods." Journal of The Surface Finishing Society of Japan 75, no. 7 (2024): 310–13. https://doi.org/10.4139/sfj.75.310.

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Aksenov, I. I., D. S. Aksyonov, V. V. Vasilyev, A. A. Luchaninov, E. N. Reshetnyak, and V. E. Strel'nitskij. "Two-Cathode Filtered Vacuum-Arc Plasma Source." IEEE Transactions on Plasma Science 37, no. 8 (2009): 1511–16. http://dx.doi.org/10.1109/tps.2009.2018820.

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Boxman, R. L., V. Zhitomirsky, B. Alterkop, et al. "Recent progress in filtered vacuum arc deposition." Surface and Coatings Technology 86-87 (December 1996): 243–53. http://dx.doi.org/10.1016/s0257-8972(96)03023-x.

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Shi, X., B. K. Tay, D. I. Flynn, Q. Ye, and Z. Sun. "Characterization of filtered cathodic vacuum arc system." Surface and Coatings Technology 94-95 (October 1997): 195–200. http://dx.doi.org/10.1016/s0257-8972(97)00347-2.

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Stepanov, Igor, Alexander Ryabchikov, and Denis Sivin. "Very Broad Metal Ion Beam Source for Ion Implantation and Coating Deposition Technologies." Advanced Materials Research 880 (January 2014): 288–91. http://dx.doi.org/10.4028/www.scientific.net/amr.880.288.

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Анотація:
The paper describes high broad metal ion source based on dc macroparticle filtered vacuum arc plasma generation with the dc ion-beam extraction. The possibility of formation of pseudo ribbon beam of metal ions with the parameters: ion beam length 0.6 m, ion current up to 0.2 A, accelerating voltage 40 kV, and ion energy up to 160 kV has been demonstrated. The pseudo ribbon ion beam is formed from dc driven vacuum arc plasma. The results of investigation of the vacuum arc evaporator ion-emission properties are presented. The influence of magnetic field strength near the cathode surface on the a
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Wang, Z. H., D. R. McKenzie, P. J. Martin, and R. P. Netterfield. "Spectroscopic studies of a solenoid filtered vacuum arc." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 13, no. 4 (1995): 2261–65. http://dx.doi.org/10.1116/1.579505.

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Дисертації з теми "Filtered vacuum arc"

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Mustapha, Nazir Mohamad. "Reactive filtered arc evaporation." Thesis, Loughborough University, 1993. https://dspace.lboro.ac.uk/2134/26797.

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Анотація:
Conventional physical vapour deposition (PVD) techniques usually result in films of lower quality than the corresponding bulk material. A major problem with PVD films is the presence of columns and voids throughout the thickness of the film. The films may have a low packing density, low micro-hardness and in many cases poor adhesion to the substrate. Many of these problems are a direct consequence of the low energy of the depositing atoms arriving at the substrate during film growth. The resulting film porosity gives rise to a reduction in mechanical strength, and in the case of dielectric opt
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Belous, V. A., S. A. Firstov, V. F. Gorban, et al. "Properties of Coatings Deposited from Filtered Vacuum Arc Plasma with HEA Cathode." Thesis, Sumy State University, 2013. http://essuir.sumdu.edu.ua/handle/123456789/35323.

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Ti-V-Zr-Nb-Hf metallic and nitride films were deposited by filtered vacuum arc plasma from a single equiatomic HEA cathode. The composition, microstructure, mechanical properties, thermal stability and corrosion properties were investigated. The deposited metallic film has a two-phase structure with bcc and hcp-lattice. The nitride films were found to have only an fcc structure. All coatings have nano-grained structures, with grain sizes 5 nm for metallic and 36 nm for nitride. The nitride coatings have a compressive stress of around – 12,5 GPa, high hardness ~ 40 GPa and elastic modulus
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3

Minault, Christophe S. "Filtered vacuum arc deposition of diamond like carbon films on sharp edged samples." Thesis, University of Reading, 1999. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.298488.

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Veerasamy, Vijayen S. "Tetrahedral amorphous carbon : deposition, characterisation and electronic properties." Thesis, University of Cambridge, 1994. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.337824.

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Elzwawi, Salim Ahmed Ali. "Cathodic Arc Zinc Oxide for Active Electronic Devices." Thesis, University of Canterbury. Electrical and Computer Engineering, 2015. http://hdl.handle.net/10092/10852.

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Анотація:
The filtered cathodic vacuum arc (FCVA) technique is a well established deposition method for wear resistant mechanical coatings. More recently, this method has attracted attention for growing ZnO based transparent conducting films. However, the potential of FCVA deposition to prepare ZnO layers for electronic devices is largely unexplored. This thesis addresses the use of FCVA deposition for the fabrication of active ZnO based electronic devices. The structural, electrical and optical characteristics of unintentionally doped ZnO films grown on different sapphire substrates were systematically
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6

Oblitas, Raissa Lima de. "Avaliação da composição elementar de filmes finos de ligas metálicas depositados por Arco Catódico Filtrado em Vácuo utilizando RBS e EDS quantitativo." Universidade de São Paulo, 2016. http://www.teses.usp.br/teses/disponiveis/43/43134/tde-24102016-115435/.

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Анотація:
Devido à relevância de filmes finos, as técnicas que são utilizadas para produzi-los e também para caracteriza-los tem se tornado importante. Neste contexto, foram analisados filmes finos de até 100 nm, de duas ligas metálicas (cromel e alumel), obtidos a partir da deposição por plasma de Arco Catódico Filtrado em Vácuo (Filtered Cathodic Vacuum Arc - FCVA). O objetivo deste projeto foi avaliar a similaridade em composição elementar entre os materiais utilizados para deposição, que operam como cátodos, e os filmes finos depositados, a partir de medições obtidas pela técnica de microanálise qua
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7

Vasyliev, V. V., A. A. Luchaninov, E. N. Reshetnyak, and V. E. Strelnitskij. "Comparative Characteristics of Stress and Structure of TiN and Ti0.5-xAl0.5YxN Coatings Prepared by Filtered Vacuum-Arc PIIID Method." Thesis, Sumy State University, 2012. http://essuir.sumdu.edu.ua/handle/123456789/34913.

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Анотація:
A comparative study of the structure and stress state of Ti0.5-xAl0.5YxN and TiN coatings deposited under identical conditions from the filtered vacuum-arc plasma under high voltage pulsed bias potential on the substrate was carried out. It was found that for Ti0.5Al0.5N coatings the dependence of the residual stress on the amplitude of the pulsed voltage potential is non-monotonic with a minimum when the amplitude is of 1 kV. As for TiN films, a monotonic decrease in the level of residual stresses takes place when the amplitude of the potential is increased in the range 0-2.5 kV. Non-mon
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8

Kuhakan, J., M. Medhisuwakul, and L. D. Yu. "Filtered Cathodic Vacuum Arc Deposition of Porous and Nanostructured Carbon and Hybrid C-Mo Thin Films for Fuel Cell Membranes." Thesis, Sumy State University, 2012. http://essuir.sumdu.edu.ua/handle/123456789/34867.

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Анотація:
In our proton exchange membrane (PEM) fuel cells, the electrolyte is a catalyst platinum (Pt) coated nafion membrane. In order to increase the electrochemically active catalyst area to enhance the cell performance but without sacrificing the electrical conductivity of the membrane, carbon thin films were deposited onto the membrane by using the filtered cathodic vacuum arc deposition (FCVAD) technique. With varying the deposition conditions, it was possible to form porous carbon films and nanoisland and nanorod structure surface which increased the catalyst area when a higher He working g
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Akkaya, S. S., V. V. Vasyliev, K. Kazmanl, et al. "Mechanical and Tribological Properties of TiN Coatings Produced by PIII&D Technique." Thesis, Sumy State University, 2013. http://essuir.sumdu.edu.ua/handle/123456789/35187.

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The structure, mechanical and tribological properties TiN coatings рroduced with PIII&D by using rectilinear filtered vacuum arc plasma system are present. The results of scratch testing and wear reciprocating testing clearly revealed the positive effect of pulse bias (0.5÷2.5 kV) application on tribological behavior of the TiN coatings in comparison the coatings deposited with DC bias (150 V). Application of pulsed bias potential leads to a significant reduction in the friction coefficient and increasing of coatings wear resistance due to a change in their structure. The orientation of c
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杜禹寬. "Deposition of Al0.5CoCrCu1.5FeNi Films with Filtered Cathodic Vacuum Arc Deposition Apparatus." Thesis, 2010. http://ndltd.ncl.edu.tw/handle/12714418462452046671.

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Книги з теми "Filtered vacuum arc"

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Shilyaev, Mihail, Elena Hromova, Aleksandr Bogomolov, A. Pavlenko, and V. Butov. Modeling of hydrodynamics and heat and mass transfer in dispersed media. INFRA-M Academic Publishing LLC., 2022. http://dx.doi.org/10.12737/1865376.

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The monograph presents methods for calculating the dehydration of wet granular materials in industrial centrifuges, filter presses and vacuum filters under the influence of gravitational forces, as well as by purging the granular layer with dry air with elevated temperature; physical and mathematical models of gas absorption and the theory of capturing submicron dust by condensation in foam, centrifugal bubbling apparatus and hollow nozzle scrubbers, packing columns and tubular absorbers; physical and mathematical models of dry adsorption of gases in packing columns and flues by injecting a di
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Частини книг з теми "Filtered vacuum arc"

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Panwar, O. S., Ajay Kesarwani, Atul Bisht, et al. "Synthesis of Multilayer Graphene by Filtered Cathodic Vacuum Arc Technique." In Physics of Semiconductor Devices. Springer International Publishing, 2014. http://dx.doi.org/10.1007/978-3-319-03002-9_166.

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2

Bilek, M. M. M., D. R. McKenzie, T. W. H. Oates, J. Pigott, P. Denniss, and J. Vlcek. "Deposition of Nanoscale Multilayered Structures Using Filtered Cathodic Vacuum Arc Plasma Beams." In Emerging Applications of Vacuum-Arc-Produced Plasma, Ion and Electron Beams. Springer Netherlands, 2002. http://dx.doi.org/10.1007/978-94-010-0277-6_16.

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3

Zhang, Xu, Hui Xing Zhang, Xiang Ying Wu, and Tong He Zhang. "Low Stress Tetrahedral Amorphous Carbon Films Prepared by Filtered Vacuum Arc Deposition." In Materials Science Forum. Trans Tech Publications Ltd., 2005. http://dx.doi.org/10.4028/0-87849-960-1.3623.

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Tripathi, R. K., O. S. Panwar, Ajay Kumar Kesarwani, and Sreekumar Chockalingam. "Phosphorous Doped Hydrogenated Amorphous Silicon Carbide Films Deposited by Filtered Cathodic Vacuum Arc Technique." In Physics of Semiconductor Devices. Springer International Publishing, 2014. http://dx.doi.org/10.1007/978-3-319-03002-9_96.

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Kesarwani, Ajay, O. S. Panwar, R. K. Tripathi, and Sreekumar Chockalingam. "Synthesis and Characterization of Phosphorus Doped Hydrogenated Silicon Films by Filtered Cathodic Vacuum Arc Technique." In Physics of Semiconductor Devices. Springer International Publishing, 2014. http://dx.doi.org/10.1007/978-3-319-03002-9_137.

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Lee, Woo-Young, Young-Jun Jang, Takayuki Tokoroyama, Motoyuki Murashima, and Noritsugu Umehara. "Effect of defects on tribological behavior in ta-C coating deposited by Filtered Cathodic Vacuum Arc technique." In Advances in Mechanism and Machine Science. Springer International Publishing, 2019. http://dx.doi.org/10.1007/978-3-030-20131-9_391.

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Kim, Jong-kuk, Young-Jun Jang, Yong-Jin Kang, and Dohyun Kim. "Large-area 400-mm class coating through the mass production scale of a filtered cathode vacuum arc system." In Advances in Mechanism and Machine Science. Springer International Publishing, 2019. http://dx.doi.org/10.1007/978-3-030-20131-9_388.

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Lee, Seunghun, Do-Geun Kim, Igor Svadkovski, and Jong-Kuk Kim. "Nanocomposite Films Deposition by means of Various Filtered Vacuum Arc Systems." In Advances in Diverse Industrial Applications of Nanocomposites. InTech, 2011. http://dx.doi.org/10.5772/14421.

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Lee, Seunghun, P. Vijai, T. Elangovan, Do-Geun Kim, and Jong-Kuk Kim. "Synthesis and Characterization of Ti-Si-C-N Nanocomposite Coatings Prepared by a Filtered Vacuum Arc with Organosilane Precursors." In Nanocomposites - New Trends and Developments. InTech, 2012. http://dx.doi.org/10.5772/51059.

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Miyake, Shojiro, and Masatoshi Miyake. "Regression Analysis of Nano and Macrotribological Properties of Diamond-Like Carbon Films Deposited Through a Filtered Cathodic Vacuum Arc Ion-Plating Method." In Advances and Challenges in Science and Technology Vol. 6. B P International (a part of SCIENCEDOMAIN International), 2023. http://dx.doi.org/10.9734/bpi/acst/v6/19891d.

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Тези доповідей конференцій з теми "Filtered vacuum arc"

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Zhang, Yirui, Hao Cheng, Yueheng Yang, et al. "Experimental Study of Vacuum Arc Characteristics of Cu-Cr Alloy Electrode Recorded by Various Wavelength Bandpass Filters." In 2024 7th International Conference on Electric Power Equipment - Switching Technology (ICEPE-ST). IEEE, 2024. https://doi.org/10.1109/icepe-st61894.2024.10792599.

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2

Aksenov, I. I., V. V. Vasilyev, A. A. Luchaninov, et al. "High efficiency filtered vacuum-arc plasma source." In 2004 XXIst International Symposium on Discharges and Electrical Insulation in Vacuum. IEEE, 2004. http://dx.doi.org/10.1109/deiv.2004.1422654.

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Boxman, Raymond, Samuel Goldsmith, Amir Ben-Shalom, et al. "Filtered vacuum arc deposition of semiconductor thin films." In XVI International Symposium on Discharges and Electrical Insulation in Vacuum, edited by Gennady A. Mesyats. SPIE, 1994. http://dx.doi.org/10.1117/12.174615.

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Aksenov, I. I., D. S. Aksyonov, V. V. Vasilyev, A. A. Luchaninov, E. N. Reshetnyak, and V. E. Strel'nitskij. "Filtered vacuum-arc plasma source for composite coatings deposition." In 2008 XXIII International Symposium on Discharges and Electrical Insulation in Vacuum (ISDEIV 2008). IEEE, 2008. http://dx.doi.org/10.1109/deiv.2008.4676857.

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Kelly, H., A. Marquez, and M. Pirrera. "Three-dimensional Ion Distribution in a Filtered Vacuum Arc Discharge." In PLASMA AND FUSION SCIENCE: 16th IAEA Technical Meeting on Research using Small Fusion Devices; XI Latin American Workshop on Plasma Physics. AIP, 2006. http://dx.doi.org/10.1063/1.2405943.

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Biluš Abaffy, Nemo, Jim G. Partridge, and Dougal G. McCulloch. "Antireflective trilayer films fabricated using a filtered cathodic vacuum arc." In Solar Energy + Applications, edited by Bolko von Roedern and Alan E. Delahoy. SPIE, 2008. http://dx.doi.org/10.1117/12.795634.

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Zhong, W. H., S. P. Lau, B. K. Tay, S. Li, and C. Q. Sun. "Fe-nitride Thin Films Deposited Using Filtered Cathodic Vacuum Arc Technique." In Proceedings of the Symposium F. WORLD SCIENTIFIC, 2003. http://dx.doi.org/10.1142/9789812704344_0051.

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Xu, Nai Yun, Hang Tong Teo, Xin Cai Wang, An Yan Du, Chee Mang Ng, and Beng Kang Tay. "Carbon metal composite film deposited using novel Filtered Cathodic Vacuum Arc technique." In 2011 IEEE 61st Electronic Components and Technology Conference (ECTC). IEEE, 2011. http://dx.doi.org/10.1109/ectc.2011.5898668.

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Xu, Naiyun, Siu Hon Tsang, Edwin Hang Tong Teo, and Beng Kang Tay. "Formation of thick textured carbon film using filtered cathodic vacuum arc technique." In 2013 IEEE International Nanoelectronics Conference (INEC). IEEE, 2013. http://dx.doi.org/10.1109/inec.2013.6465959.

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"Field emission from nitrogen doped tetrahedral amorphous carbon prepared by filtered cathodic vacuum arc technique." In 10th International Conference on Vacuum Microelectronics. IEEE, 1997. http://dx.doi.org/10.1109/ivmc.1997.627399.

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Звіти організацій з теми "Filtered vacuum arc"

1

Thanyasrisung, Panida, Aemvika Vittayaprasit, Voravee Hoven, Sugai, Motoyuki, and Oranart Matangkasombut. Rapid detection of mutans streptococci by substrate specific binding of automutanolysin : Final report. Faculty of Dentistry, Chulalongkorn University, 2016. https://doi.org/10.58837/chula.res.2016.19.

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Анотація:
Chair-side rapid detection of mutans streptococci is an important aid to clinical dental caries risk assessment. Rapid Streptococcus mutans detection tools are available on the market but there are a small number. Automutanolysin (Aml) is a peptidoglycan hydrolase whose cell wall-binding domain (CWBD) has substrate-specificity towards mutans streptococci. This study aims to develop a rapid detection assay using CWBD conjugated with horseradish peroxidase (HRP). However, the recombinant protein was as insoluble form. Therefore, magnetic nanoparticles were used as an alternative reporter to conj
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