Статті в журналах з теми "Filtered vacuum arc"
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Benti, Hailu Gemechu, Abraham Debebe Woldeyohannes, and Belete Sirahbizu Yigezu. "Improving the Efficiency of Cutting Tools through Application of Filtered Cathodic Vacuum Arc Deposition Coating Techniques: A Review." Advances in Materials Science and Engineering 2022 (May 28, 2022): 1–17. http://dx.doi.org/10.1155/2022/1450805.
Повний текст джерелаВерещака, Алексей, and Aleksey Vereshchaka. "Development process of assisted filtered cathodic-vacuum-arc deposition (AFCVAD)." Bulletin of Bryansk state technical university 2014, no. 3 (2014): 10–13. http://dx.doi.org/10.12737/23189.
Повний текст джерелаBrzezinka, Tomasz L., Jeff Rao, Jose M. Paiva, et al. "Facilitating TiB2 for Filtered Vacuum Cathodic Arc Evaporation." Coatings 10, no. 3 (2020): 244. http://dx.doi.org/10.3390/coatings10030244.
Повний текст джерелаMaksimov, Y. V., A. S. Vereschaka, A. A. Vereschaka, et al. "Development and research of multilayer composite coatings with nano-dispersed structure which are deposited on cutting tools using assistance cathode-vacuum-arc processes." Izvestiya MGTU MAMI 7, no. 1-2 (2013): 73–82. http://dx.doi.org/10.17816/2074-0530-68031.
Повний текст джерелаTAKIKAWA, Hirofumi, and Takahiro BANDO. "Vacuum Arc Deposition: Steered and Filtered Methods." Journal of The Surface Finishing Society of Japan 75, no. 7 (2024): 310–13. https://doi.org/10.4139/sfj.75.310.
Повний текст джерелаAksenov, I. I., D. S. Aksyonov, V. V. Vasilyev, A. A. Luchaninov, E. N. Reshetnyak, and V. E. Strel'nitskij. "Two-Cathode Filtered Vacuum-Arc Plasma Source." IEEE Transactions on Plasma Science 37, no. 8 (2009): 1511–16. http://dx.doi.org/10.1109/tps.2009.2018820.
Повний текст джерелаBoxman, R. L., V. Zhitomirsky, B. Alterkop, et al. "Recent progress in filtered vacuum arc deposition." Surface and Coatings Technology 86-87 (December 1996): 243–53. http://dx.doi.org/10.1016/s0257-8972(96)03023-x.
Повний текст джерелаShi, X., B. K. Tay, D. I. Flynn, Q. Ye, and Z. Sun. "Characterization of filtered cathodic vacuum arc system." Surface and Coatings Technology 94-95 (October 1997): 195–200. http://dx.doi.org/10.1016/s0257-8972(97)00347-2.
Повний текст джерелаStepanov, Igor, Alexander Ryabchikov, and Denis Sivin. "Very Broad Metal Ion Beam Source for Ion Implantation and Coating Deposition Technologies." Advanced Materials Research 880 (January 2014): 288–91. http://dx.doi.org/10.4028/www.scientific.net/amr.880.288.
Повний текст джерелаWang, Z. H., D. R. McKenzie, P. J. Martin, and R. P. Netterfield. "Spectroscopic studies of a solenoid filtered vacuum arc." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 13, no. 4 (1995): 2261–65. http://dx.doi.org/10.1116/1.579505.
Повний текст джерелаVeerasamy, V. S., G. A. J. Amaratunga, and W. I. Milne. "Plasma motion in a filtered cathodic vacuum arc." IEEE Transactions on Plasma Science 21, no. 3 (1993): 322–28. http://dx.doi.org/10.1109/27.277558.
Повний текст джерелаBoxman, R. L., S. Goldsmith, A. Ben-Shalom, et al. "Filtered vacuum arc deposition of semiconductor thin films." IEEE Transactions on Plasma Science 23, no. 6 (1995): 939–44. http://dx.doi.org/10.1109/27.476479.
Повний текст джерелаChekh, Yu, I. S. Zhirkov, and M. P. Delplancke-Ogletree. "Simple filtered repetitively pulsed vacuum arc plasma source." Review of Scientific Instruments 81, no. 2 (2010): 023506. http://dx.doi.org/10.1063/1.3310096.
Повний текст джерелаChen, Y. M., H. Q. Zhang, Z. W. Li, W. Cao, B. Liao, and X. Zhang. "Deposition of ZrNxOyfilms by filtered cathodic vacuum arc." Surface Engineering 29, no. 8 (2013): 567–71. http://dx.doi.org/10.1179/1743294413y.0000000163.
Повний текст джерелаVereschaka, Alexey A., Anatoly S. Vereschaka, Andre DL Batako, Boris J. Mokritskii, Anatoliy Y. Aksenenko, and Nikolay N. Sitnikov. "Improvement of structure and quality of nanoscale multilayered composite coatings, deposited by filtered cathodic vacuum arc deposition method." Nanomaterials and Nanotechnology 7 (January 17, 2016): 184798041668080. http://dx.doi.org/10.1177/1847980416680805.
Повний текст джерелаBi, W. Y., L. H. Li, H. T. Liu, and G. Zhao. "The effect of biased plates on transport of vacuum arc plasma through rectangular curved magnetic filter." Modern Physics Letters B 31, no. 19-21 (2017): 1740006. http://dx.doi.org/10.1142/s0217984917400061.
Повний текст джерелаShashurin, A., I. I. Beilis, Y. Sivan, S. Goldsmith, and R. L. Boxman. "Copper film deposition rates by a hot refractory anode vacuum arc and magnetically filtered vacuum arc." Surface and Coatings Technology 201, no. 7 (2006): 4145–51. http://dx.doi.org/10.1016/j.surfcoat.2006.08.022.
Повний текст джерелаKaplan, L., V. N. Zhitomirsky, S. Goldsmith, R. L. Boxman, and I. Rusman. "Arc behaviour during filtered vacuum arc deposition of Sn-O thin films." Surface and Coatings Technology 76-77 (November 1995): 181–89. http://dx.doi.org/10.1016/0257-8972(95)02592-8.
Повний текст джерелаTripathi, R. K., O. S. Panwar, A. K. Kesarwani, et al. "Investigations on phosphorous doped hydrogenated amorphous silicon carbide thin films deposited by a filtered cathodic vacuum arc technique for photo detecting applications." RSC Adv. 4, no. 97 (2014): 54388–97. http://dx.doi.org/10.1039/c4ra08343a.
Повний текст джерелаMo, Ji Liang, Min Hao Zhu, J. An, H. Sun, Yong Xiang Leng, and Nan Huang. "Deposition of CrN Coatings by Filtered Cathodic Vacuum Arc." Key Engineering Materials 373-374 (March 2008): 130–33. http://dx.doi.org/10.4028/www.scientific.net/kem.373-374.130.
Повний текст джерелаZukerman, I., E. Goldenberg, V. N. Zhitomirsky, A. Raveh, and R. L. Boxman. "Thermal Stability of Filtered Vacuum Arc Deposited Er2O3 Coatings." Journal of Coating Science and Technology 2, no. 1 (2015): 13–19. http://dx.doi.org/10.6000/2369-3355.2015.02.01.3.
Повний текст джерелаBilek, M. M. M., P. Evans, D. R. Mckenzie, D. G. McCulloch, H. Zreiqat, and C. R. Howlett. "Metal ion implantation using a filtered cathodic vacuum arc." Journal of Applied Physics 87, no. 9 (2000): 4198–204. http://dx.doi.org/10.1063/1.373052.
Повний текст джерелаLau, S. P., Y. H. Cheng, J. R. Shi, P. Cao, B. K. Tay, and X. Shi. "Filtered cathodic vacuum arc deposition of thin film copper." Thin Solid Films 398-399 (November 2001): 539–43. http://dx.doi.org/10.1016/s0040-6090(01)01315-3.
Повний текст джерелаChen, J. S., S. P. Lau, Y. B. Zhang, Z. Sun, B. K. Tay, and C. Q. Sun. "Deposition of permalloy films by filtered cathodic vacuum arc." Thin Solid Films 443, no. 1-2 (2003): 115–19. http://dx.doi.org/10.1016/s0040-6090(03)01031-9.
Повний текст джерелаShi, J. R., S. P. Lau, Z. Sun, X. Shi, B. K. Tay, and H. S. Tan. "Filtered cathodic vacuum arc deposition of copper thin film." Electronics Letters 36, no. 14 (2000): 1205. http://dx.doi.org/10.1049/el:20000861.
Повний текст джерелаWU, X. L., X. J. LI, X. ZHANG, W. B. XUE, G. A. CHENG, and A. D. LIU. "TRIBOLOGICAL BEHAVIORS OF DUPLEX DLC/Al2O3 COATINGS FABRICATED USING MICRO-ARC OXIDATION AND FILTERED CATHODIC VACUUM ARC SYSTEM." Surface Review and Letters 14, no. 02 (2007): 193–97. http://dx.doi.org/10.1142/s0218625x07009256.
Повний текст джерелаDorraki, Naghme, Ralf Methling, and Sergey Gortschakow. "Optical Diagnostics of Anode Surface Temperature in Vacuum Interrupters with Different CuCr Compositions." PLASMA PHYSICS AND TECHNOLOGY 10, no. 1 (2023): 28–31. http://dx.doi.org/10.14311/ppt.2023.1.28.
Повний текст джерелаBUJAK, Jan, and Zbigniew SŁOMKA. "CHARACTERIZATION OF MULTICOMPONENT, TRIBOLOGICAL AlCrTiN COATINGS, PRODUCED BY THE FILTERED CATHODIC VACUUM ARC METHOD." Tribologia 276, no. 6 (2017): 5–11. http://dx.doi.org/10.5604/01.3001.0010.8052.
Повний текст джерелаShi, X., B. K. Tay, and S. P. Lau. "THE DOUBLE BEND FILTERED CATHODIC ARC TECHNOLOGY AND ITS APPLICATIONS." International Journal of Modern Physics B 14, no. 02n03 (2000): 136–53. http://dx.doi.org/10.1142/s0217979200000145.
Повний текст джерелаTay, B. K., X. Shi, H. S. Yang, E. J, L. K. Cheah, and H. S. Tan. "Study of tin films by filtered cathodic vacuum arc techniques." Surface Engineering 15, no. 1 (1999): 33–37. http://dx.doi.org/10.1179/026708499322911610.
Повний текст джерелаPanwar, Omvir Singh, Ajay Kumar Kesarwani, Sanjay Rangnath Dhakate, et al. "Few layer graphene synthesized by filtered cathodic vacuum arc technique." Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 31, no. 4 (2013): 040602. http://dx.doi.org/10.1116/1.4813762.
Повний текст джерелаMartin, P. "Review of the filtered vacuum arc process and materials deposition." Thin Solid Films 394, no. 1-2 (2001): 1–14. http://dx.doi.org/10.1016/s0040-6090(01)01169-5.
Повний текст джерелаElzwawi, Salim, Hyung Suk Kim, Robert Heinhold, et al. "Device quality ZnO grown using a Filtered Cathodic Vacuum Arc." Physica B: Condensed Matter 407, no. 15 (2012): 2903–6. http://dx.doi.org/10.1016/j.physb.2011.08.074.
Повний текст джерелаZhang, Xu, Xiangying Wu, Zhongzhen Yi, Tonghe Zhang, and Huixing Zhang. "The TiN/AlN multilayers deposited by filtered vacuum arc deposition." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 206 (May 2003): 382–85. http://dx.doi.org/10.1016/s0168-583x(03)00767-5.
Повний текст джерелаZhitomirsky, V. N., L. Kaplan, R. L. Boxman, and S. Goldsmith. "Ion current distribution in a filtered vacuum arc deposition system." Surface and Coatings Technology 76-77 (November 1995): 190–96. http://dx.doi.org/10.1016/0257-8972(95)02593-6.
Повний текст джерелаBilek, M. M. M., and W. I. Milne. "Filtered cathodic vacuum arc (FCVA) deposition of thin film silicon." Thin Solid Films 290-291 (December 1996): 299–304. http://dx.doi.org/10.1016/s0040-6090(96)09180-8.
Повний текст джерелаWarr, George B., Richard N. Tarrant, Marcela M. M. Bilek, et al. "Tomographic interferometry of a filtered high-current vacuum arc plasma." Journal of Applied Physics 101, no. 7 (2007): 073302. http://dx.doi.org/10.1063/1.2714677.
Повний текст джерелаBen-Shalom, A., L. Kaplan, R. L. Boxman, S. Goldsmith, and M. Nathan. "SnO2 transparent conductor films produced by filtered vacuum arc deposition." Thin Solid Films 236, no. 1-2 (1993): 20–26. http://dx.doi.org/10.1016/0040-6090(93)90635-3.
Повний текст джерелаTse, K. Y., H. H. Hng, S. P. Lau, Y. G. Wang, and S. F. Yu. "ZnO thin films produced by filtered cathodic vacuum arc technique." Ceramics International 30, no. 7 (2004): 1669–74. http://dx.doi.org/10.1016/j.ceramint.2003.12.156.
Повний текст джерелаMucsi, C. S., Rubens Nunes de Faria Jr., E. Galego, and J. L. Rossi. "Consolidation of Compacted Zircaloy Chips via Vacuum Arc Melting - Analysis of the Electric Arc." Materials Science Forum 498-499 (November 2005): 258–63. http://dx.doi.org/10.4028/www.scientific.net/msf.498-499.258.
Повний текст джерелаVereschaka, A. A., A. S. Vereschaka, S. N. Grigoriev, and D. V. Sladkov. "Nano-Scale Multi-Layered Coatings for Cutting Tools Generated Using Assisted Filtered Cathodic-Vacuum-Arc Deposition (AFCVAD)." Applied Mechanics and Materials 325-326 (June 2013): 1454–59. http://dx.doi.org/10.4028/www.scientific.net/amm.325-326.1454.
Повний текст джерелаZhao, Z. W., B. K. Tay, G. Q. Yu, and S. P. Lau. "Nanocrystalline Zirconium Oxide Thin Films Prepared by Filtered Cathodic Vacuum Arc." Journal of Metastable and Nanocrystalline Materials 23 (January 2005): 63–66. http://dx.doi.org/10.4028/www.scientific.net/jmnm.23.63.
Повний текст джерелаVasylyev, V. V., Strel'nitskij V.E., and V. B. Makarov. "DLC Coatings on Spherical Elements of HIP Endoprostheses." European Journal of Engineering and Formal Sciences 2, no. 3 (2018): 42. http://dx.doi.org/10.26417/ejef.v2i3.p42-47.
Повний текст джерелаVasylyev, V. V., V. E. Strel’nitskij, V. B. Makarov, M. A. Skoryk, and G. O. Lazarenko. "DLC Coatings on Spherical Elements of HIP Endoprostheses." European Journal of Engineering and Formal Sciences 2, no. 3 (2018): 41–47. http://dx.doi.org/10.2478/ejef-2018-0015.
Повний текст джерелаZhang, Xu, Xiang Ying Wu, Hui Xing Zhang, and Tong He Zhang. "Tetrahedral Amorphous Carbon Films Prepared by Filtered Catholic Vacuum Arc Deposition." Materials Science Forum 423-425 (May 2003): 585–90. http://dx.doi.org/10.4028/www.scientific.net/msf.423-425.585.
Повний текст джерелаAnders, Simone, André Anders, Ian G. Brown, Robert A. MacGill, and Michael R. Dickinson. "Vacuum arc ion source with filtered plasma for macroparticle‐free implantation." Review of Scientific Instruments 65, no. 4 (1994): 1319–21. http://dx.doi.org/10.1063/1.1144997.
Повний текст джерелаÇetinörgü, E., S. Goldsmith, V. N. Zhitomirsky, R. L. Boxman, and C. L. Bungay. "Optical characterization of filtered vacuum arc deposited zinc oxide thin films." Semiconductor Science and Technology 21, no. 9 (2006): 1303–10. http://dx.doi.org/10.1088/0268-1242/21/9/015.
Повний текст джерелаZhang, H. S., and K. Komvopoulos. "Surface modification of magnetic recording media by filtered cathodic vacuum arc." Journal of Applied Physics 106, no. 9 (2009): 093504. http://dx.doi.org/10.1063/1.3245399.
Повний текст джерела赵, 雅娟. "Biocompatibility of Nanocrystal Iron Film Prepared by Filtered Cathodic Vacuum Arc." Material Sciences 08, no. 05 (2018): 490–96. http://dx.doi.org/10.12677/ms.2018.85055.
Повний текст джерелаCheng, Y. H., B. K. Tay, S. P. Lau, X. Shi, and H. C. Chua. "Deposition of (Ti, Al)N films by filtered cathodic vacuum arc." Thin Solid Films 379, no. 1-2 (2000): 76–82. http://dx.doi.org/10.1016/s0040-6090(00)01397-3.
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