Relevant bibliographies by topics / Atomic layer deposition

Contents

  1. Journal articles
  2. Dissertations / Theses
  3. Books
  4. Book chapters
  5. Conference papers
  6. Reports

Academic literature on the topic 'Atomic layer deposition'

Author: Grafiati
Published: 4 June 2021
Last updated: 26 July 2025

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Journal articles on the topic "Atomic layer deposition"

1

Godlewski, Marek. "Atomic layer deposition." Semiconductor Science and Technology 27, no. 7 (2012): 070301. http://dx.doi.org/10.1088/0268-1242/27/7/070301.

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Szyszka, Bernd, and Hugo Tholense. "Atomic Layer Deposition." JOT Journal für Oberflächentechnik 51, no. 9 (2011): 48–51. http://dx.doi.org/10.1365/s35144-011-0169-4.

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Pimenoff, Joe. "Atomic Layer Deposition." Vakuum in Forschung und Praxis 24, no. 6 (2012): 10–13. http://dx.doi.org/10.1002/vipr.201200502.

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Leskela, Markku, Emma Salmi, and Mikko Ritala. "Atomic Layer Deposited Protective Layers." Materials Science Forum 879 (November 2016): 1086–92. http://dx.doi.org/10.4028/www.scientific.net/msf.879.1086.

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This paper reviews the use of Atomic Layer Deposition (ALD) in protective coatings. Because of the growth principle ALD allows the deposition of dense conformal films on substrates of different size and shape. Recently, ALD has received increasingly interest in deposition of protective coatings. In protective coatings oxides are the most common materials and especially Al, Ti, and Ta oxides have been applied. The use of nanolaminates enables improving the protection properties. Since ALD films are pinhole-free and often thin they are used to protect against moisture, radiation, out-gassing but
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Pécz, B., Zs Baji, Z. Lábadi, and A. Kovács. "ZnO layers deposited by Atomic Layer Deposition." Journal of Physics: Conference Series 471 (November 29, 2013): 012015. http://dx.doi.org/10.1088/1742-6596/471/1/012015.

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Solanki, Raj. "Atomic Layer Deposition of Copper Seed Layers." Electrochemical and Solid-State Letters 3, no. 10 (1999): 479. http://dx.doi.org/10.1149/1.1391185.

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Poodt, Paul, David C. Cameron, Eric Dickey, et al. "Spatial atomic layer deposition: A route towards further industrialization of atomic layer deposition." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 30, no. 1 (2012): 010802. http://dx.doi.org/10.1116/1.3670745.

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Leskelä, Markku, Mikko Ritala, and Ola Nilsen. "Novel materials by atomic layer deposition and molecular layer deposition." MRS Bulletin 36, no. 11 (2011): 877–84. http://dx.doi.org/10.1557/mrs.2011.240.

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Scarel, G., E. Bonera, C. Wiemer, et al. "Atomic-layer deposition of Lu2O3." Applied Physics Letters 85, no. 4 (2004): 630–32. http://dx.doi.org/10.1063/1.1773360.

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Reijnen, L., B. Meester, A. Goossens, and J. Schoonman. "Atomic layer deposition of CuxS." Le Journal de Physique IV 11, PR3 (2001): Pr3–1103—Pr3–1107. http://dx.doi.org/10.1051/jp4:20013138.

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Dissertations / Theses on the topic "Atomic layer deposition"

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Roy, Amit Kumar. "Atomic Layer Deposition onto Fibers." Doctoral thesis, Universitätsbibliothek Chemnitz, 2012. http://nbn-resolving.de/urn:nbn:de:bsz:ch1-qucosa-85451.

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The main goal of this dissertation was to show that the principle of atomic layer deposition (ALD) can be applied to “endless” fibers. A reactor of atomic layer deposition has been designed, especially for coating depositions onto meter long bundles of fibers. Aluminum oxide (alumina), titanium oxide (titania), double layers of alumina and titania, as well as aluminium phosphate have been deposited onto bundles of carbon fibers using the home-built reactor. Scanning electron microscopic (SEM) and transmission electron microscopic (TEM) images indicate that the coatings were uniform and conform
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Melzer, Marcel. "Atomic Layer Deposition and Microanalysis of Ultrathin Layers." Bachelor's thesis, Universitätsbibliothek Chemnitz, 2012. http://nbn-resolving.de/urn:nbn:de:bsz:ch1-qucosa-97235.

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Carbon nanotubes (CNTs) are a highly promising material for future interconnects. It is expected that the decoration of CNTs with Cu particles or also the filling of the interspaces between the CNTs with Cu instead of the currently used SiO2 can enhance the performance of CNT-based interconnects. Due to the high aspect ratio of CNTs an appropriate deposition technique has to be applied which is able to coat such structures uniformly. The current work is therefore considered with thermal atomic layer deposition (ALD) of CuxO from the liquid Cu (I) β-diketonate precursor [(nBu3P)2Cu(acac)] and
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Hao, Wenjun. "Atomic layer deposition of boron nitride." Thesis, Lyon, 2017. http://www.theses.fr/2017LYSE1311/document.

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Cette thèse conclut 3 années d'études doctorales sur le "dépôt de couches atomiques (ALD) de nitrure de bore (BN)". Le but de ce travail a été d'adapter la voie des céramiques dérivées de polymères (PDC) à la technique ALD pour la croissance de films minces de h-BN et l'élaboration de nanostructures fonctionnelles. Tout d'abord, un nouveau procédé d'ALD sans ammoniac en deux étapes, comprenant une croissance par ALD à basse température (80 °C) de polyborazine (PBN) à partir de 2,4,6-trichloroborazine et d'hexaméthyldisilazane suivi un traitement thermique à haute température sous atmosphère c
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Graniel, tamayo Octavio. "Atomic layer deposition for biosensing applications." Thesis, Montpellier, 2019. http://www.theses.fr/2019MONTS071.

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Le dépôt de couche atomique (ALD) est devenu une technique essentielle de dépôt en phase vapeur de couches minces pour de nombreuses applications. La demande croissante de composants électroniques et de matériaux nanostructurés a fait de gls{ald} l'un des processus de fabrication clés du marché des nanotechnologies.Dans ce travail, nous présentons de nouveaux matériaux nanostructurés pouvant être utilisés comme transducteurs dans des dispositifs à biocapteurs. Ces matériaux ont été préparés en combinant gls{ald} avec des techniques "top-down" et "bottom-up" telles que la lithographie par nanos
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Salgård, Cunha Pedro. "Functional nano-structures using atomic layer deposition." Thesis, University of Cambridge, 2014. https://www.repository.cam.ac.uk/handle/1810/245295.

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This thesis is a study of the crossover between the fields of atomic layer deposition, block copolymer self-assembly and photovoltaics. The central research question is how the technique of atomic layer deposition (ALD) can be incorporated into the creation of nano-structured functional materials and devices, specifically in the areas of photovoltaics and biomimetics. The work aims to explore the capabilities of ALD as a strategy for overcoming two main challenges: the creation of extremely thin conformal metal oxide layers and the replication of complex high surface area templates. In these a
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Kim, Oh Hyun. "Atomic layer deposition of GaN and TaN." [Gainesville, Fla.] : University of Florida, 2009. http://purl.fcla.edu/fcla/etd/UFE0025153.

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King, Peter. "Hafnium oxide-based dielectrics by atomic layer deposition." Thesis, University of Liverpool, 2013. http://livrepository.liverpool.ac.uk/9253/.

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In 2007 there was an important change in the architecture of nanotransistors - the building blocks of modern logic and memory devices. This change was from utilising thermally grown silicon dioxide as a dielectric to so-called high-κ hafnium oxide dielectrics grown by atomic layer deposition. The first production logic devices of this era used a hafnium oxide dielectric layer deposited by thermal atomic layer deposition; using HfCl₄ and H₂O as the precursors. Present day fabrication makes use of hafnium oxide-based atomic-layer-deposited dielectric films. The latest nanotransistor devices util
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Nallan, Himamshu, Thong Ngo, Agham Posadas, Alexander Demkov, and John Ekerdt. "Area Selective Deposition of Ultrathin Magnetic Cobalt Films via Atomic Layer Deposition." Universitätsbibliothek Chemnitz, 2016. http://nbn-resolving.de/urn:nbn:de:bsz:ch1-qucosa-207142.

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The work investigates the selective deposition of cobalt oxide via atomic layer deposition. Methoxysilanes chlorosilane and poly(trimethylsilylstyrene) self-assembled monolayers are utilized to prevent wetting of water and cobalt bis(N-tert butyl, N'-ethylpropionamidinate) from the substrate, thereby controlling nucleation on the substrate and providing a pathway to enable selective deposition of cobalt oxide. Sr and Al are deposited atop the oxide films to scavenge oxygen and yield carbon-free cobalt metal films. Thermal reduction of the oxide layer in the presence of CO and H 2 was also inve
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McCormick, Jarod Alan. "Atomic layer deposition on nanoparticles in a rotary reactor." Connect to online resource, 2007. http://gateway.proquest.com/openurl?url_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:dissertation&res_dat=xri:pqdiss&rft_dat=xri:pqdiss:3284402.

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Fang, Ziwen. "Atomic layer deposition of tantalum, hafnium and gadolinium nitrides." Thesis, University of Liverpool, 2011. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.570232.

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This research describes the development of ALD processes for the deposition of nitride materials including tantalum, hafnium and gadolinium nitrides. Ta and Hf nitrides are of significant interests for sub-l00nm silicon based electronic devices, while Gd nitride may be exploitable in future spintronic devices. ALD has been established a key manufacturing tool in microelectronics, the development of ALD processes for these nitrides are essential for future manufacturing of electronic devices and can benefit future manufacturing of spintronic devices. In the current research, these nitrides were
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Books on the topic "Atomic layer deposition"

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Kääriäinen, Tommi, David Cameron, Marja-Leena Kääriäinen, and Arthur Sherman. Atomic Layer Deposition. John Wiley & Sons, Inc., 2013. http://dx.doi.org/10.1002/9781118747407.

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Symposium, on Atomic Layer Deposition Applications (3rd 2007 Washington D. C. ). Atomic layer deposition applications 3. Electrochemical Society, 2007.

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Symposium, on Atomic Layer Deposition Applications (2nd 2006 Cancun Mexico). Atomic layer deposition applications 2. Electrochemical Society, 2007.

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Hwang, Choel Seong, ed. Atomic Layer Deposition for Semiconductors. Springer US, 2014. http://dx.doi.org/10.1007/978-1-4614-8054-9.

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Symposium on Atomic Layer Deposition Applications (2nd 2006 Cancun, Mexico). Atomic layer deposition applications 2. Edited by Londergan A, Electrochemical Society Meeting, and Electrochemical Society. Dielectric Science and Technology Division. Electrochemical Society, 2007.

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Symposium on Atomic Layer Deposition Applications (3rd 2007 Washington, D.C.). Atomic layer deposition applications 3. Edited by Londergan A, Electrochemical Society Meeting, and Electrochemical Society. Dielectric Science and Technology Division. Electrochemical Society, 2007.

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Symposium on Atomic Layer Deposition Applications (2nd 2006 Cancun, Mexico). Atomic layer deposition applications 2. Edited by Electrochemical Society Meeting and Electrochemical Society. Dielectric Science and Technology Division. Electrochemical Society, 2007.

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Symposium on Atomic Layer Deposition Applications (3rd 2007 Washington, D.C.). Atomic layer deposition applications 3. Edited by Londergan A, Electrochemical Society Meeting, and Electrochemical Society. Dielectric Science and Technology Division. Electrochemical Society, 2007.

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Symposium on Atomic Layer Deposition Applications (2nd 2006 Cancun, Mexico). Atomic layer deposition applications 2. Edited by Londergan A, Electrochemical Society Meeting, and Electrochemical Society. Dielectric Science and Technology Division. Electrochemical Society, 2007.

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Symposium on Atomic Layer Deposition Applications (3rd 2007 Washington, D.C.). Atomic layer deposition applications 3. Edited by Londergan A, Electrochemical Society Meeting, and Electrochemical Society. Dielectric Science and Technology Division. Electrochemical Society, 2007.

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Book chapters on the topic "Atomic layer deposition"

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Awan, Tahir Iqbal, Sumera Afsheen, and Sabah Kausar. "Atomic Layer Deposition." In Thin Film Deposition Techniques. Springer Nature Singapore, 2025. https://doi.org/10.1007/978-981-96-1364-9_4.

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Dezelah, Charles L. "Atomic Layer Deposition." In Encyclopedia of Nanotechnology. Springer Netherlands, 2015. http://dx.doi.org/10.1007/978-94-007-6178-0_372-2.

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Aliano, Antonio, Giancarlo Cicero, Hossein Nili, et al. "Atomic Layer Deposition." In Encyclopedia of Nanotechnology. Springer Netherlands, 2012. http://dx.doi.org/10.1007/978-90-481-9751-4_372.

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Kessels, Erwin, Harald Profijt, Stephen Potts, and Richard van de Sanden. "Plasma Atomic Layer Deposition." In Atomic Layer Deposition of Nanostructured Materials. Wiley-VCH Verlag GmbH & Co. KGaA, 2012. http://dx.doi.org/10.1002/9783527639915.ch7.

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Rodriguez, Cesar Augusto Duarte, and Germano Tremiliosi-Filho. "Atomic Layer Deposition (ALD)." In Encyclopedia of Tribology. Springer US, 2013. http://dx.doi.org/10.1007/978-0-387-92897-5_1166.

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Hwang, Cheol Seong, Woongkyu Lee, Jeong Hwan Han, et al. "Nanosession: Atomic Layer Deposition." In Frontiers in Electronic Materials. Wiley-VCH Verlag GmbH & Co. KGaA, 2013. http://dx.doi.org/10.1002/9783527667703.ch61.

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Aliano, Antonio, Giancarlo Cicero, Hossein Nili, et al. "Atomic Layer Deposition (ALD)." In Encyclopedia of Nanotechnology. Springer Netherlands, 2012. http://dx.doi.org/10.1007/978-90-481-9751-4_100043.

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Leskelä, Markku. "Challenges in Atomic Layer Deposition." In Atomic Layer Deposition of Nanostructured Materials. Wiley-VCH Verlag GmbH & Co. KGaA, 2012. http://dx.doi.org/10.1002/9783527639915.ch17.

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Meyer, Jens, and Thomas Riedl. "Low-Temperature Atomic Layer Deposition." In Atomic Layer Deposition of Nanostructured Materials. Wiley-VCH Verlag GmbH & Co. KGaA, 2012. http://dx.doi.org/10.1002/9783527639915.ch6.

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Ramachandran, Ranjith K., Christophe Detavernier, and Jolien Dendooven. "Atomic Layer Deposition for Catalysis." In Nanotechnology in Catalysis. Wiley-VCH Verlag GmbH & Co. KGaA, 2017. http://dx.doi.org/10.1002/9783527699827.ch14.

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Conference papers on the topic "Atomic layer deposition"

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"Atomic layer deposition." In 2016 14th International Baltic Conference on Atomic Layer Deposition (BALD). IEEE, 2016. http://dx.doi.org/10.1109/bald.2016.7886520.

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Ghazaryan, Lilit, Ernst-Bernhard Kley, Andreas Tünnermann, and Adriana Szeghalmi. "Nanoporous SiO2made by atomic layer deposition and atomic layer etching." In SPIE Optical Systems Design, edited by Michel Lequime, H. Angus Macleod, and Detlev Ristau. SPIE, 2015. http://dx.doi.org/10.1117/12.2192972.

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Aoyagi, Yoshinobu, Atsutoshi Doi, Sohachi Iwai, and Susumu Namba. "Atomic Layer Growth of GaAs by Pulsed Laser MOVPE." In Microphysics of Surfaces, Beams, and Adsorbates. Optica Publishing Group, 1987. http://dx.doi.org/10.1364/msba.1987.tuc2.

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Atomic layer epitaxy has recently been interested in by many workers since the epitaxy seems to be a promising candidate for producing thin epitaxial layers and abrupt interfaces controlled in atomic scale. In this epitaxy As and Ga atoms are alternatively deposited on the GaAs substrate, layer by layer, and it is essential to realize the precise atomic layer epitaxy (SME, Stepwise Monoatomic layer Epitaxy(1)) that the deposition of Ga or As atom should be stopped automatically at the 100 % surface coverage of each atoms.
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Fujimoto, T., Y. Shiomi, H. Kumagai, and A. Kobayashi. "Atomic layer deposition of atomic mirror for silicon." In Lasers and Applications in Science and Engineering, edited by Craig B. Arnold, Tatsuo Okada, Michel Meunier, et al. SPIE, 2007. http://dx.doi.org/10.1117/12.699991.

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Nazarov, Denis V., Maxim Yu Maximov, Pavel A. Novikov, Anatoly A. Popovich, and Vladimir M. Smirnov. "Atomic layer deposition of tin oxide nanofilms using tetraethyltin." In 2016 14th International Baltic Conference on Atomic Layer Deposition (BALD). IEEE, 2016. http://dx.doi.org/10.1109/bald.2016.7886523.

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Szeghalmi, Adriana V. "Atomic Layer Deposition for Optical Applications." In Optical Interference Coatings. OSA, 2016. http://dx.doi.org/10.1364/oic.2016.wb.1.

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Ahles, Christopher, Jong Choi, Keith Wong, Srinivas Nemani, and Andrew Kummel. "Selective Atomic Layer Deposition of TiO2." In 2019 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA). IEEE, 2019. http://dx.doi.org/10.1109/vlsi-tsa.2019.8804682.

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Frederick, Esther, Quinn Campbell, Kevin Dwyer, et al. "Area-Selective Atomic Layer Deposition Templated by Atomic Precision Fabrication." In Proposed for presentation at the ACS Spring 2022 held March 20-24, 2022 in San Diega, CA United States. US DOE, 2022. http://dx.doi.org/10.2172/2002069.

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Kim, Hyungjun, Jaehong Yoon, and Han-Bo-Ram Lee. "Atomic layer deposition for nanoscale contact applications." In 2011 Materials for Advanced Metallization (MAM). IEEE, 2011. http://dx.doi.org/10.1109/iitc.2011.5940260.

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Karvonen, Lasse, Antti Säynätjoki, Matthieu Roussey, Markku Kuittinen, and Seppo Honkanen. "Application of atomic layer deposition in nanophotonics." In SPIE OPTO, edited by Jean Emmanuel Broquin and Gualtiero Nunzi Conti. SPIE, 2014. http://dx.doi.org/10.1117/12.2042263.

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Reports on the topic "Atomic layer deposition"

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Ives, Robert Lawrence, Gregory Parsons, Philip Williams, Christopher Oldham, Zach Mundy, and Valery Dolgashev. High Gradient Accelerator Cavities Using Atomic Layer Deposition. Office of Scientific and Technical Information (OSTI), 2014. http://dx.doi.org/10.2172/1165161.

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Zotter, Beth. CRADA Final Report: Synthetic Metal Atomic Layer Deposition Tool. Office of Scientific and Technical Information (OSTI), 2023. http://dx.doi.org/10.2172/1962103.

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George, Steven M. Nanolaminates with Novel Properties Fabricated Using Atomic Layer Deposition Techniques. Defense Technical Information Center, 2006. http://dx.doi.org/10.21236/ada451599.

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Elam, Jeffrey. Development of Highly Selective Oxidation Catalysts by Atomic Layer Deposition. Office of Scientific and Technical Information (OSTI), 2014. http://dx.doi.org/10.2172/1162272.

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Talghader, Joseph J. High Power Optical Coatings by Atomic Layer Deposition and Signatures of Laser-Induced Damage. Defense Technical Information Center, 2012. http://dx.doi.org/10.21236/ada564804.

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Pike, Christopher. Building a Better Capacitor with Thin-Film Atomic Layer Deposition Processing. Office of Scientific and Technical Information (OSTI), 2015. http://dx.doi.org/10.2172/1213126.

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George, Steven M. Atomic Layer Deposition of Metal Oxides on sp2-Graphitic Carbon Substrates. Defense Technical Information Center, 2014. http://dx.doi.org/10.21236/ada608981.

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Gorte, Raymond. Cost-effective Stabilization of Nanostructured Cathodes by Atomic Layer Deposition (ALD). Office of Scientific and Technical Information (OSTI), 2020. http://dx.doi.org/10.2172/1600013.

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Gorey, Timothy. Tailoring Corrosion Resistance of Additively Manufactured Metals with Atomic Layer Deposition. Office of Scientific and Technical Information (OSTI), 2022. http://dx.doi.org/10.2172/1863724.

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Van Duyne, Richard. Instrumentation for Atomic Layer Deposition and Single Molecule SERS/TERS Excitation Spectroscopy. Defense Technical Information Center, 2009. http://dx.doi.org/10.21236/ada589757.

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