Dissertations / Theses on the topic 'Carbide and nitride precipitation'
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Sabounchei, S. J. S. Z. "Carbide and nitride clusters." Thesis, University of Liverpool, 1990. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.291737.
Full textFujita, Nobuhiro. "Modelling carbide precipitation in alloy steels." Thesis, University of Cambridge, 2000. https://www.repository.cam.ac.uk/handle/1810/219197.
Full textRazzell, Anthony Gordon. "Silicon carbide fibre silicon nitride matrix composites." Thesis, University of Warwick, 1992. http://wrap.warwick.ac.uk/110559/.
Full textGao, Wei. "Oxidation of nitride-bonded silicon carbide (NBSC) and hot rod silicon carbide with coatings." Thesis, University of Strathclyde, 2001. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.366751.
Full textTatli, Zafer. "Silicon nitride and silicon carbide fabrication using coated powders." Thesis, University of Newcastle Upon Tyne, 2002. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.394640.
Full textTuran, Servet. "Microstructural characterisation of silicon nitride-silicon carbide particulate composites." Thesis, University of Cambridge, 1995. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.627653.
Full textMartinelli, Antonio Eduardo. "Diffusion bonding of silicon carbide and silicone nitride to molybdenum." Thesis, McGill University, 1995. http://digitool.Library.McGill.CA:80/R/?func=dbin-jump-full&object_id=40191.
Full textSiC was solid-state bonded to Mo at temperatures ranging from 1000$ sp circ$C to 1700$ sp circ$C. Diffusion of Si and C into Mo resulted in a reaction layer containing two main phases: $ rm Mo sb5Si sb3$ and Mo$ sb2$C. At temperatures higher than 1400$ sp circ$C diffusion of C into $ rm Mo sb5Si sb3$ stabilized a ternary phase of composition $ rm Mo sb5Si sb3$C. At 1700$ sp circ$C, the formation of MoC$ rm sb{1-x}$ was observed as a consequence of bulk diffusion of C into Mo$ sb2$C. A maximum average shear strength of 50 MPa was obtained for samples hot-pressed at 1400$ sp circ$C for 1 hour. Higher temperatures and longer times contributed to a reduction in the shear strength of the joints, due to the excessive growth of the interfacial reaction layer. $ rm Si sb3N sb4$ was joined to Mo in vacuum and nitrogen, at temperatures between 1000$ sp circ$C and 1800$ sp circ$C, for times varying from 15 minutes to 4 hours. Dissociation of $ rm Si sb3N sb4$ and diffusion of Si into Mo resulted in the formation of a reaction layer consisting, initially, of $ rm Mo sb3$Si. At 1600$ sp circ$C (in vacuum) Mo$ sb3$Si was partially transformed into $ rm Mo sb5Si sb3$ by diffusion of Si into the original silicide, and at higher temperatures, this transformation progressed extensively within the reaction zone. Residual N$ sb2$ gas, which originated from the decomposition of $ rm Si sb3N sb4,$ dissolved in the Mo, however, most of the gas escaped during bonding or remained trapped at the original $ rm Si sb3N sb4$-Mo interface, resulting in the formation of a porous layer. Joining in N$ sb2$ increased the stability of $ rm Si sb3N sb4,$ affecting the kinetics of the diffusion bonding process. The bonding environment did not affect the composition and morphology of the interfaces for the partial pressures of N$ sb2$ used. A maximum average shear strength of 57 MPa was obtained for samples hot-pressed in vacuum at 1400$ sp circ$C for 1 hour.
Kim, Hyoun-Ee. "Gaseous corrosion of silicon carbide and silicon nitride in hydrogen /." The Ohio State University, 1987. http://rave.ohiolink.edu/etdc/view?acc_num=osu1487327695622538.
Full textRohatgi, Aashish. "Detection of vanadium nitride precipitation using a creep technique." Thesis, McGill University, 1993. http://digitool.Library.McGill.CA:80/R/?func=dbin-jump-full&object_id=69578.
Full textThe Ti-V-Mo steel was tested at various stresses between 30 and 50 MPa in the temperature range 850-900$ sp circ$C. A mathematical equation was fitted to the creep strain vs. time curves and the creep strain was expressed as a function of time. The strain rate was determined by differentiating the equation with respect to time and log(strain rate) vs. log(creep strain) or creep strain curves were then plotted for each testing condition. At 850$ sp circ$C and 900 seconds, the strain rate was observed to decrease at a faster rate. This time decreased to 700 seconds at 875$ sp circ$C at the same stress of 36MPa. This effect is attributed to the occurrence of VN precipitation in austenite, which reduces the creep rate. However, precipitation could not be detected by the creep technique at 900$ sp circ$C in this steel.
The 0.07% Nb steel was tested at 950$ sp circ$C under stresses of 42 and 32 MPa. At 32MPa, the strain rate was found to decrease at a faster rate at 250 seconds. The 0.04% Nb steel was tested under stresses of 50 and 40 MPa at 875$ sp circ$C, and under 50 MPa at 850$ sp circ$C. In this steel too, a behaviour similar to that shown by the Ti-V and high Nb steels was observed at 375 seconds, 40MPa (875$ sp circ$C) and at 460 seconds, 50MPa (850$ sp circ$C). This is believed to be due the precipitation of NbCN.
Sundaresan, Siddarth G. "Ultra-fast high temperature microwave processing of silicon carbide and gallium nitride." Fairfax, VA : George Mason University, 2007. http://hdl.handle.net/1920/2851.
Full textTitle from PDF t.p. (viewed Oct. 29, 2007). Thesis director: Mulpuri V. Rao. Submitted in partial fulfillment of the requirements for the degree of Doctor of Philosophy in Electrical and Computer Engineering. Vita: p. 170. Includes bibliographical references (p. 160-169). Also available in print.
Okayama, Taizo. "Performance of devices made of large band-gap semiconductors, SiC and GaN." Fairfax, VA : George Mason University, 2007. http://hdl.handle.net/1920/2935.
Full textTitle from PDF t.p. (viewed Jan. 21, 2008). Thesis director: Mulpuri V. Rao. Submitted in partial fulfillment of the requirements for the degree of Doctor of Philosophy in Electrical and Computer Engineering. Vita: p. 128. Includes bibliographical references (p. 122-127). Also available in print.
Lee, Jaeseob. "Direct bonding of gallium nitride to silicon carbide physical, and electrical characterization /." NCSU, 2003. http://www.lib.ncsu.edu/theses/available/etd-08072003-125025/.
Full textStodilka, Danielle O. "Silicon carbide MIS and MOS development using alternative nitride and oxide dielectrics." [Gainesville, Fla.] : University of Florida, 2005. http://purl.fcla.edu/fcla/etd/UFE0013116.
Full text慎護, 中根. "Synthesis and densification of nitride, boride, and carbide by high-pressure technology." Thesis, https://doors.doshisha.ac.jp/opac/opac_link/bibid/BB10353361/?lang=0, 2010. https://doors.doshisha.ac.jp/opac/opac_link/bibid/BB10353361/?lang=0.
Full textRomero, Amy Marie. "Static and Dynamic Characterization of Silicon Carbide and Gallium Nitride Power Semiconductors." Thesis, Virginia Tech, 2018. http://hdl.handle.net/10919/93744.
Full textMS
Demir, Adem. "Silicon carbide fibre reinforced #beta#-sialon ceramics." Thesis, University of Newcastle Upon Tyne, 1998. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.391291.
Full textClauß, Arno Rainer. "Nitriding of Fe-Cr-Al alloys nitride precipitation and phase transformations /." Stuttgart : Max-Planck-Inst. für Metallforschung, 2008. http://d-nb.info/995395918/34.
Full textHolleck, H. [Verfasser]. "Binaere und ternaere Carbide und Nitride der Uebergangsmetalle und ihre Phasenbeziehungen / H. Holleck." Karlsruhe : KIT-Bibliothek, 2012. http://d-nb.info/1190100371/34.
Full textGarg, Aaron R. "Transition metal carbide and nitride nanoparticles with Noble metal shells as enhanced catalysts." Thesis, Massachusetts Institute of Technology, 2018. https://hdl.handle.net/1721.1/121890.
Full textCataloged from PDF version of thesis. Page 157 blank. Vita.
Includes bibliographical references (pages 137-153).
Core-shell nanostructures represent a promising and versatile design platform for enhancing the performance of noble metal catalysts while reducing the cost. Early transition metal carbides (TMCs) and nitrides (TMNs) have been identified as ideal core materials for supporting noble metal shells owing to their earth-abundance, thermal and chemical stability, electrical conductivity, and their ability to bind strongly to noble metals while still being immiscible with them. Unfortunately, the formation of surface oxides or carbon on TMCs and TMNs presents a difficult synthetic challenge for the deposition of atomically thin, uniform noble metal layers. Recent advances have enabled the synthesis of TMC core nanoparticles with noble metal shells (denoted as NM/TMC), although applicability toward TMN cores has not been previously demonstrated. Furthermore, the complete properties of these unique materials are still unknown.
This thesis conducts a detailed investigation of the synthesis, characterization, and catalytic performance of NM/TMC and NM/TMN core-shell nanoparticles to provide a comprehensive understanding of their material properties and the underlying phenomena. First, in-situ studies yielded insight into the mechanism behind the high temperature self-assembly of NM/TMC particles, indicating the presence of a metallic alloy phase preceding the formation of the core-shell structure upon insertion of carbon into the lattice. Next, the synthesis of NM/TMN nanoparticles was demonstrated via nitridation of a parent NM/TMC, and the structural and electronic properties of both core-shell materials were examined through in-situ X-ray absorption spectroscopy (XAS). The analysis revealed significant alterations to the electronic structure of the noble metal shell due to bonding interactions with the TMC and TMN cores, which led to weakened adsorbate binding energies.
Finally, the materials displayed improved performance for the oxygen reduction reaction (ORR), a critical challenge for fuel cell technologies. Notably, particles with complete, uniform shells exhibited unprecedented stability during electrochemical ageing at highly oxidizing conditions, highlighting the great potential of core-shell architectures with earth-abundant TMC and TMN cores for future ORR applications. Overall, this work will provide new opportunities toward the design of enhanced noble metal catalysts and enable further optimization of their performance.
by Aaron R. Garg.
Ph. D.
Ph.D. Massachusetts Institute of Technology, Department of Chemical Engineering
Robson, Joseph Douglas. "Modelling of carbide and Laves phase precipitation in 9-12 wt% chromium steels." Thesis, University of Cambridge, 1997. https://www.repository.cam.ac.uk/handle/1810/224753.
Full textIm, Hsung Jai. "Metal contacts to silcon carbide and galliumnitride studied with ballistic electron emission microscopy." Connect to this title online, 2001. http://rave.ohiolink.edu/etdc/view?acc%5Fnum=osu1000844302.
Full textTitle from first page of PDF file. Document formatted into pages; contains xiii, 165 p.; also contains graphics (some col.). Includes abstract and vita. Advisor: Jonathan P. Pelz, Dept. of Physics. Includes bibliographical references (p. 160-165).
Rey, Tomas. "Investigation of Microstructure and Mechanical Properties in Hot-work Tool Steels." Thesis, KTH, Materialvetenskap, 2017. http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-210699.
Full textCook, Grant O. III. "Joining Polycrystalline Cubic Boron Nitride and Tungsten Carbide by Partial Transient Liquid Phase Bonding." BYU ScholarsArchive, 2010. https://scholarsarchive.byu.edu/etd/2366.
Full textUnal, Ozer. "Interface studies in silicon nitride/silicon carbide and gallium indium arsenide/gallium arsenide systems." Case Western Reserve University School of Graduate Studies / OhioLINK, 1991. http://rave.ohiolink.edu/etdc/view?acc_num=case1059501714.
Full textIm, Hsung J. "Metal Contacts to Silicon Carbide and Gallium Nitride Studied with Ballistic Electron Emission Microscopy." The Ohio State University, 2001. http://rave.ohiolink.edu/etdc/view?acc_num=osu1000844302.
Full textIm, Hsung Jai. "Metal contacts to silicon carbide and gallium nitride studied with ballistic electron emission microscopy /." The Ohio State University, 2002. http://rave.ohiolink.edu/etdc/view?acc_num=osu1486402957194756.
Full textBadinier, Guillaume. "The effect of carbon segregation and carbide precipitation on the mechanical response of martensite." Thesis, University of British Columbia, 2013. http://hdl.handle.net/2429/44022.
Full textZirkelbach, Frank [Verfasser], and Bernd [Akademischer Betreuer] Stritzker. "Atomistic simulation study on silicon carbide precipitation in silicon / Frank Zirkelbach. Betreuer: Bernd Stritzker." Augsburg : Universität Augsburg, 2012. http://d-nb.info/1077700946/34.
Full textSchwartz, Viviane. "Preparation and Reactivity of Niobium-Containing Hydrotreating Catalysts." Diss., Virginia Tech, 2000. http://hdl.handle.net/10919/26368.
Full textPh. D.
Camurlu, Hasan Erdem. "Carbothermic Production Of Hexagonal Boron Nitride." Phd thesis, METU, 2006. http://etd.lib.metu.edu.tr/upload/3/12607808/index.pdf.
Full textB2O3 mixtures was slower than activated C&ndash
B2O3 mixtures. It was concluded that B4C is not a necessary intermediate product in the carbothermic production of h-BN. Some additives are known to catalytically affect the h-BN formation. The second aim of this study was to examine the catalytic effect of some alkaline earth metal oxides and carbonates, some transition metal oxides and cupric nitrate. It was found that addition of 10wt% CaCO3 into the B2O3+C mixture was optimum for increasing the rate and yield of h-BN formation and decreasing the B4C amount in the products and that the reaction was complete in 2 hours. CaCO3 was observed to be effective in increasing the rate and grain size of the formed h-BN. Addition of cupric nitrate together with CaCO3 provided a further increase in the size of the h-BN grains.
Techaboonanek, Chanachon. "Precipitation during Tempering of Martensite in Fe-Cr-C alloys." Thesis, KTH, Materialvetenskap, 2012. http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-103192.
Full textGasch, Matthew J. "Processing and mechanical properties of silicon nitride/silicon carbide ceramic nanocomposites derived from polymer precursors /." For electronic version search Digital dissertations database. Restricted to UC campuses. Access is free to UC campus dissertations, 2003. http://uclibs.org/PID/11984.
Full textIschenko, Vladislav. "Verwendung molekularer Vorstufen für die Synthese neuartiger Carbide und Nitride der Elemente der IV. Hauptgruppe." [S.l. : s.n.], 2003. http://www.bsz-bw.de/cgi-bin/xvms.cgi?SWB11244196.
Full text張秀霞 and Sau-ha Cheung. "Growing of GaN on vicinal SiC surface by molecular beam epitaxy." Thesis, The University of Hong Kong (Pokfulam, Hong Kong), 2002. http://hub.hku.hk/bib/B31243009.
Full textCheung, Sau-ha. "Growing of GaN on vicinal SiC surface by molecular beam epitaxy /." Hong Kong : University of Hong Kong, 2002. http://sunzi.lib.hku.hk/hkuto/record.jsp?B25212163.
Full textJordan, Jennifer Lynn. "Shock-activated reaction synthesis and high pressure response of Ti-based ternary carbide and nitride ceramics." Diss., Georgia Institute of Technology, 2003. http://hdl.handle.net/1853/19674.
Full textKerkar, Awdhoot Vasant. "Investigation of steric stabilization as a route for colloidal processing of silicon carbide/silicon nitride composites." Case Western Reserve University School of Graduate Studies / OhioLINK, 1990. http://rave.ohiolink.edu/etdc/view?acc_num=case1059055054.
Full textZhou, Yijian. "Effects of grain boundary and triple line structures on carbide precipitation in type 304L stainless steel." Thesis, National Library of Canada = Bibliothèque nationale du Canada, 2000. http://www.collectionscanada.ca/obj/s4/f2/dsk1/tape4/PQDD_0019/MQ54131.pdf.
Full textZaman, Farhana. "Characterization of selective epitaxial graphene growth on silicon carbide: limitations and opportunities." Diss., Georgia Institute of Technology, 2012. http://hdl.handle.net/1853/43624.
Full textZetterling, Carl-Mikael. "Silicon dioxide and aluminium nitride as gate dielectric for high temperature and high power silicon carbide MOSFETs." Doctoral thesis, KTH, Electronic Systems Design, 1997. http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-2514.
Full textSilicon carbide (SIC) is a wide bandgap semiconductor thathas been suggested as a replacement for silicon in applicationsusing high voltages, high frequencies, high temperatures orcombinations thereof. Several basic process steps need to bedeveloped for reliable manufacturing of long-term stableelectronic devices. One important process step is the formationof an insulator on the silicon carbide surface that may be usedas a) a gate dielectric, b) for device isolation or c) forpassivation of the surface. Silicon dioxide and aluminumnitride have been suggested for these purposes. This thesiscovers the investigation of some formation methods for boththese materials on 4H and 6H silicon carbide, and theelectrical characterisation of the resulting films.
Commercially available n-type and p-type 4H and 6H SICwafers have been used, and both the silicon face and the carbonface have been investigated. Silicon dioxide has been formed byseveral methods: a) dry thermal oxidation with or without theaddition of TCA (trichloroethane), b) wet oxidation inpyrogenic steam or with awater bubbler, c) oxide deposition byPECVD (plasma enhanced chemical vapor deposition) or LPCVD (lowpressure chemical vapor deposition) and d) oxidation of aevaporated or LPCVD deposited sacrificial layer of silicon. Theinfluence of various cleaning methods prior to oxidation hasbeen studied, as well as post-oxidation and post-metallisationannealing. The aluminum nitride films were grown by MOCVD(metal organic chemical vapor deposition) under various processconditions.
Oxidation kinetics have been studied for dry thermaloxidation at 1200 0C. The redistribution of aluminum (p-typedopant in SiC) during dry thermal oxidation has beeninvestigated using SIMS (secondary ion mass spectrometry). Themorphology of the aluminum nitride was determined using x-raydiffraction rocking curves, RHEED (reflection high energyelectron diffraction) and AFM (atomic force microscopy). Thequality of the silicon dioxide used as gate dielectric has beendetermined using breakdown field measurements. High frequencycapacitance-voltage measurements have been used on bothinsulators to a) verify thickness measurements made with othermethods, b) to determine fixed oxide charges by measuring theflatband voltage shifts and c) to quantitatively compare theamount of interface states.
For electrical characterisation either aluminum, titanium ordoped polysilicon circular gate contacts of various sizes wereformed on the insulator surface. Flat MOS capacitors weremainly used for the electrical characterisation. U-grooved MOScapacitors, manufactured by RIE (reactive ion etching), wereused to test the quality of oxides grown on vertical surfaces.Two types of MOSFETs (metal oxide semiconductor field effecttransistors) have been fabricated: vertical U-grooved andlateral devices.
Keywords:silicon carbide, thermal oxidation, silicondioxide, metal organic chemical vapor deposition (MOCVD),aluminum nitride, capacitance-voltage measurements, MOSFET.
Graham, David W. "Corrosion resistant chemical vapor deposited coatings for SiC and Si₃N₄ /." This resource online, 1993. http://scholar.lib.vt.edu/theses/available/etd-09292009-020327/.
Full textClauß, Arno Rainer [Verfasser]. "Nitriding of Fe-Cr-Al alloys : nitride precipitation and phase transformations / vorgelegt von Arno Rainer Clauß." Stuttgart : Max-Planck-Inst. für Metallforschung, 2008. http://d-nb.info/995395918/34.
Full textCheng, Leon Man Lung. "Study of the kinetics of precipitation, dissolution and coarsening of aluminum nitride in low-carbon steels." Thesis, National Library of Canada = Bibliothèque nationale du Canada, 1999. http://www.collectionscanada.ca/obj/s4/f2/dsk1/tape8/PQDD_0029/NQ38867.pdf.
Full textChan, King-lung, and 陳勁龍. "A study of geometrical properties of SiC and GaN surfaces by auger electron spectroscopy." Thesis, The University of Hong Kong (Pokfulam, Hong Kong), 2002. http://hub.hku.hk/bib/B2664387X.
Full textDevarapally, Rahul Reddy. "Survey of applications of WBG devices in power electronics." Kansas State University, 2016. http://hdl.handle.net/2097/32665.
Full textDepartment of Electrical and Computer Engineering
Behrooz Mirafzal
Wide bandgap devices have gained increasing attention in the market of power electronics for their ability to perform even in harsh environments. The high voltage blocking and high temperature withstanding capabilities make them outperform existing Silicon devices. They are expected to find places in future traction systems, electric vehicles, LED lightning and renewable energy engineering systems. In spite of several other advantages later mentioned in this paper, WBG devices also face a few challenges which need to be addressed before they can be applied in large scale in industries. Electromagnetic interference and new requirements in packaging methods are some of the challenges being faced by WBG devices. After the commercialization of these devices, many experiments are being carried out to understand and validate their abilities and drawbacks. This paper summarizes the experimental results of various applications of mainly Silicon Carbide (SiC) and Gallium Nitride (GaN) power devices and also includes a section explaining the current challenges for their employment and improvements being made to overcome them.
Parikh, Rinku Pankaj. "Simulation-based design, optimization, and control of silicon carbide and gallium nitride thin film chemical vapor deposition reactor systems." College Park, Md. : University of Maryland, 2006. http://hdl.handle.net/1903/3976.
Full textThesis research directed by: Chemical Engineering. Title from t.p. of PDF. Includes bibliographical references. Published by UMI Dissertation Services, Ann Arbor, Mich. Also available in paper.
Wang, Li [Verfasser], Florian [Akademischer Betreuer] Pyczak, and Helmut [Akademischer Betreuer] Clemens. "Mechanisms of carbide precipitation and carbon solubility in high Nb containing TiAl Alloys / Li Wang ; Florian Pyczak, Helmut Clemens." Cottbus : BTU Cottbus - Senftenberg, 2014. http://d-nb.info/1114282898/34.
Full textWang, Li Verfasser], Florian [Akademischer Betreuer] [Pyczak, and Helmut [Akademischer Betreuer] Clemens. "Mechanisms of carbide precipitation and carbon solubility in high Nb containing TiAl Alloys / Li Wang ; Florian Pyczak, Helmut Clemens." Cottbus : BTU Cottbus - Senftenberg, 2014. http://nbn-resolving.de/urn:nbn:de:kobv:co1-opus4-30392.
Full textGiordano, Cristina [Verfasser], and Peter [Akademischer Betreuer] Strauch. "A neglected world: transition metal nitride and metal carbide based nanostructures : novel synthesis and future perspectives / Cristina Giordano ; Betreuer: Peter Strauch." Potsdam : Universität Potsdam, 2015. http://d-nb.info/1218792590/34.
Full textYao, Mengji Verfasser], Dierk [Akademischer Betreuer] Raabe, and Jochen M. [Akademischer Betreuer] [Schneider. "κ-carbide in a high-Mn light-weight steel : precipitation, off-stoichiometry and deformation / Mengji Yao ; Dierk Raabe, Jochen Michael Schneider." Aachen : Universitätsbibliothek der RWTH Aachen, 2017. http://d-nb.info/1162498366/34.
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