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Relevant bibliographies by topics / Cat-CVD

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Journal articles
Dissertations / Theses
Books
Book chapters
Conference papers

Academic literature on the topic 'Cat-CVD'

Author: Grafiati

Published: 4 June 2021

Last updated: 1 February 2022

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Journal articles on the topic "Cat-CVD"

1

Matsumura, Hideki, and Keisuke Ohdaira. "Cat-CVD (Catalytic-CVD); Its Fundamentals and Application." ECS Transactions 25, no. 8 (2019): 53–63. http://dx.doi.org/10.1149/1.3207575.

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Bourée, Jean-Eric, and A. Harv Mahan. "Fifth international conference on hot-wire CVD (Cat-CVD) process." Thin Solid Films 517, no. 12 (2009): 3413–14. http://dx.doi.org/10.1016/j.tsf.2009.01.016.

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Bourée, Jean-Eric, and A. Harv Mahan. "Fourth international conference on hot-wire CVD (Cat-CVD) process." Thin Solid Films 516, no. 5 (2008): 487–89. http://dx.doi.org/10.1016/j.tsf.2007.06.062.

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Schropp, R. E. I. "Status of Cat-CVD (Hot-Wire CVD) research in Europe." Thin Solid Films 395, no. 1-2 (2001): 17–24. http://dx.doi.org/10.1016/s0040-6090(01)01200-7.

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Bourée, Jean Eric. "Seventh international conference on hot-wire CVD (Cat-CVD) process." Thin Solid Films 575 (January 2015): 1–2. http://dx.doi.org/10.1016/j.tsf.2014.10.008.

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Bourée, Jean-Eric, and A. Harv Mahan. "Third International Conference on Hot-Wire CVD (Cat-CVD) Process." Thin Solid Films 501, no. 1-2 (2006): 1–2. http://dx.doi.org/10.1016/j.tsf.2005.07.083.

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Bourée, Jean-Eric, and A. Harv Mahan. "Sixth international conference on hot-wire CVD (Cat-CVD) process." Thin Solid Films 519, no. 14 (2011): 4409–11. http://dx.doi.org/10.1016/j.tsf.2011.01.002.

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8

Nakamura, S., K. Matsumoto, A. Susa, and M. Koshi. "Reaction mechanism of silicon Cat-CVD." Journal of Non-Crystalline Solids 352, no. 9-20 (2006): 919–24. http://dx.doi.org/10.1016/j.jnoncrysol.2005.11.136.

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Matsumura, Hideki, Hironobu Umemoto, Akira Izumi, and Atsushi Masuda. "Recent progress of Cat-CVD research in Japan—bridging between the first and second Cat-CVD conferences." Thin Solid Films 430, no. 1-2 (2003): 7–14. http://dx.doi.org/10.1016/s0040-6090(03)00072-5.

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Akasaka, Yoichi. "Application of Cat-CVD for ULSI technology." Thin Solid Films 516, no. 5 (2008): 773–78. http://dx.doi.org/10.1016/j.tsf.2007.06.186.

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Dissertations / Theses on the topic "Cat-CVD"

1

Brühne, Kai. "Hot-Wire-Gasphasenabscheidung von nanokristallinem Silicium und Silicium-Germanium." [S.l. : s.n.], 2003. http://www.bsz-bw.de/cgi-bin/xvms.cgi?SWB10447205.

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Nos, Aguilà Oriol. "HWCVD Technology Development Addressed to the High Rate Deposition of mi-c-Si:H." Doctoral thesis, Universitat de Barcelona, 2013. http://hdl.handle.net/10803/98346.

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The first block of this thesis deals with the study of the degradation process of tungsten catalytic filaments in the field of silicon deposition with the Hot Wire Chemical Vapour Deposition (HWCVD) technique. The development of technological solutions addressed to the filaments protection will also be dealt as well as the design, fabrication and performance of a novel system for the automatic replacement of used filaments in a HWCVD reactor. The second block deals with the scaling up of HWCVD towards large area deposition and the existence of a scaling law that may allow the deposition of mic

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Hsu, Yi-Peng, and 許翼鵬. "Study of Microcrystalline Silicon Thin Films Deposited by Cat-CVD for Thin Film Solar Cell Applications." Thesis, 2012. http://ndltd.ncl.edu.tw/handle/01705353553010955041.

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碩士<br>國立交通大學<br>光電工程學系<br>100<br>In this study, Catalytic Chemical Vapor Deposition (Cat-CVD, also known as Hot-Wire Chemical Vapor Deposition, HWCVD) was used as the process equipment. The gases of silane (SiH4) and hydrogen (H2) were used to deposit hydrogenated microcrystalline film. In this thesis, the filament temperature and substrate temperature were calibrated at first. Then, by varying hydrogen-to-silane dilution ratio, process pressure, filament-to-substrate distance and different substrates, we have obtained the characteristics of the undoped microcrystalline silicon thin film. Al

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Motaragheb, Jafarpour Saeed. "Investigation of multicomponent catalyst systems for type-selective growth of SWCNTs by CVD." 2019. https://monarch.qucosa.de/id/qucosa%3A38384.

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Excellent electronic properties of semiconducting single-walled carbon nanotubes (sc-SWCNTs) motivated the investigation for using them in different application areas such as microelectronics, sensorics, MEMS and MOEMS. However, challenges arise from the lack of selectivity with respect to electronic type and chirality as well as ensuring high quality, high purity and well-aligned SWCNTs during fabrication process. Catalytic chemical vapour deposition (CCVD) has shown great potential in direct synthesis of high quality SWCNTs with chiral or type selectivity. This thesis addresses three importa

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Books on the topic "Cat-CVD"

1

Matsumura, Hideki, Karen K. Gleason, Ruud E. I. Schropp, and Hironobu Umemoto. Catalytic Chemical Vapor Deposition: Technology and Applications of Cat-CVD. Wiley & Sons, Incorporated, John, 2019.

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2

Matsumura, Hideki, Karen K. Gleason, Ruud E. I. Schropp, and Hironobu Umemoto. Catalytic Chemical Vapor Deposition: Technology and Applications of Cat-CVD. Wiley-VCH Verlag GmbH, 2019.

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3

Matsumura, Hideki, Karen K. Gleason, Ruud E. I. Schropp, and Hironobu Umemoto. Catalytic Chemical Vapor Deposition: Technology and Applications of Cat-CVD. Wiley & Sons, Incorporated, John, 2019.

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Book chapters on the topic "Cat-CVD"

1

"Application of Cat-CVD Technologies." In Catalytic Chemical Vapor Deposition. Wiley-VCH Verlag GmbH & Co. KGaA, 2019. http://dx.doi.org/10.1002/9783527818655.ch8.

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2

"Physics and Chemistry of Cat-CVD." In Catalytic Chemical Vapor Deposition. Wiley-VCH Verlag GmbH & Co. KGaA, 2019. http://dx.doi.org/10.1002/9783527818655.ch4.

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3

"Organic Polymer Synthesis by Cat-CVD-Related Technology - Initiated CVD (iCVD)." In Catalytic Chemical Vapor Deposition. Wiley-VCH Verlag GmbH & Co. KGaA, 2019. http://dx.doi.org/10.1002/9783527818655.ch6.

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4

"Properties of Inorganic Films Prepared by Cat-CVD." In Catalytic Chemical Vapor Deposition. Wiley-VCH Verlag GmbH & Co. KGaA, 2019. http://dx.doi.org/10.1002/9783527818655.ch5.

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5

"Physics and Technologies for Operating Cat-CVD Apparatus." In Catalytic Chemical Vapor Deposition. Wiley-VCH Verlag GmbH & Co. KGaA, 2019. http://dx.doi.org/10.1002/9783527818655.ch7.

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6

"Radicals Generated in Cat-CVD Apparatus and Their Application." In Catalytic Chemical Vapor Deposition. Wiley-VCH Verlag GmbH & Co. KGaA, 2019. http://dx.doi.org/10.1002/9783527818655.ch9.

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7

"Fundamentals for Analytical Methods for Revealing Chemical Reactions in Cat-CVD." In Catalytic Chemical Vapor Deposition. Wiley-VCH Verlag GmbH & Co. KGaA, 2019. http://dx.doi.org/10.1002/9783527818655.ch3.

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"Fundamentals for Studying the Physics of Cat-CVD and Difference from PECVD." In Catalytic Chemical Vapor Deposition. Wiley-VCH Verlag GmbH & Co. KGaA, 2019. http://dx.doi.org/10.1002/9783527818655.ch2.

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Conference papers on the topic "Cat-CVD"

1

Godavarthi, S., Y. Matsumoto, V. Subramaniam, and P. S. Mallick. "Deposition of nanocrystalline-silicon by Cat-CVD method and its characterization." In 2009 6th International Conference on Electrical Engineering, Computing Science and Automatic Control (CCE 2009). IEEE, 2009. http://dx.doi.org/10.1109/iceee.2009.5393569.

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Acharya, Sanchar, and Anil Kottantharayil. "VLS growth of silicon nanowires in cold wall Cat-CVD chamber." In 2014 IEEE 2nd International Conference on Emerging Electronics (ICEE). IEEE, 2014. http://dx.doi.org/10.1109/icemelec.2014.7151169.

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3

Matsumoto, Y., M. Ortega, F. Wunsch та Z. Yu. "Cat-CVD deposited inverted μc-Si:H/c-Si heterojunction solar cell approach". У 2008 5th International Conference on Electrical Engineering, Computing Science and Automatic Control (CCE). IEEE, 2008. http://dx.doi.org/10.1109/iceee.2008.4723442.

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4

Okada, Shinya, and Hideki Matsumura. "Properties of a New Passivation SiNx Films Prepared by cat-CVD Method." In 1996 International Conference on Solid State Devices and Materials. The Japan Society of Applied Physics, 1996. http://dx.doi.org/10.7567/ssdm.1996.pc-8-3.

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LI, J. C., Q. ZHAO, M. WANG та ін. "NANOCRYSTALLINE β-SiC FILMS GROWN BY CAT-CVD WITH PRE-CARBONIZATION PROCESS". У Proceedings of the International Symposium on Solid State Chemistry in China. WORLD SCIENTIFIC, 2002. http://dx.doi.org/10.1142/9789812776846_0056.

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6

Matsumoto, Yasuhiro, and Zhenrui Yu. "Boron-doped microcrystalline-phase involved amorphous silicon oxide windows prepared by Cat-CVD." In 2006 3rd International Conference on Electrical and Electronics Engineering. IEEE, 2006. http://dx.doi.org/10.1109/iceee.2006.251848.

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7

MATSUMURA, Hideki. "Low Temperature Formation of Polysilicon Films by Catalytic Chemical Vapor Deposition (Cat-CVD) Method." In 1991 International Conference on Solid State Devices and Materials. The Japan Society of Applied Physics, 1991. http://dx.doi.org/10.7567/ssdm.1991.pc5-4.

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8

Jain, Manmohan, J. R. Ramos-Serrano, Ateet Dutt, and Yasuhiro Matsumoto. "Photoluminescence properties of thin-film SiOxCy deposited by O-Cat CVD technique using MMS and TEOS." In 2020 17th International Conference on Electrical Engineering, Computing Science and Automatic Control (CCE). IEEE, 2020. http://dx.doi.org/10.1109/cce50788.2020.9299113.

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9

Nguyen, Cong Thanh, Koichi Koyama, Shigeki Terashima, et al. "Cat-CVD passivation realizing extremely low surface recombination velocity < 0.2 cm/s in solar cell structure." In 2016 IEEE 43rd Photovoltaic Specialists Conference (PVSC). IEEE, 2016. http://dx.doi.org/10.1109/pvsc.2016.7749798.

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10

Chen, Renfang, Liping Zhang, Zhuopeng Wu, et al. "Widening Bandgap of i/n-a-Si:H Window Layers via Hydrogen Injection in Cat-CVD for SHJ Solar Cells." In 2018 IEEE 7th World Conference on Photovoltaic Energy Conversion (WCPEC) (A Joint Conference of 45th IEEE PVSC, 28th PVSEC & 34th EU PVSEC). IEEE, 2018. http://dx.doi.org/10.1109/pvsc.2018.8548232.

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