Books on the topic 'Catalytic chemical vapor deposition'

Sivaram, Srinivasan. Chemical Vapor Deposition. Boston, MA: Springer US, 1995. http://dx.doi.org/10.1007/978-1-4757-4751-5.

Fortin, Jeffrey B., and Toh-Ming Lu. Chemical Vapor Deposition Polymerization. Boston, MA: Springer US, 2004. http://dx.doi.org/10.1007/978-1-4757-3901-5.

O, Pierson Hugh, ed. Handbook of chemical vapor deposition. 2nd ed. Norwich, NY: Noyes Publications, 1999.

Dobkin, Daniel M. Principles of Chemical Vapor Deposition. Dordrecht: Springer Netherlands, 2003.

Dobkin, Daniel M., and Michael K. Zuraw. Principles of Chemical Vapor Deposition. Dordrecht: Springer Netherlands, 2003. http://dx.doi.org/10.1007/978-94-017-0369-7.

Gesheva, K. A. Chemical vapor deposition (CVD) technology. Hauppauge, N.Y: Nova Science Publishers, 2008.

Magneto luminous chemical vapor deposition. Boca Raton, FL: Taylor & Francis, 2011.

K, Zuraw Michael, ed. Principles of chemical vapor deposition. Dordrecht: Kluwer Academic Publishers, 2003.

Luminous chemical vapor deposition and interface engineering. New York: Marcel Dekker, 2005.

Miyoshi, Kazuhisa. Chemical-vapor-deposited diamond film. [Cleveland, Ohio]: National Aeronautics and Space Administration, Lewis Research Center, 1999.

Miyoshi, Kazuhisa. Chemical-vapor-deposited diamond film. [Cleveland, Ohio]: National Aeronautics and Space Administration, Lewis Research Center, 1999.

Miyoshi, Kazuhisa. Chemical-vapor-deposited diamond film. [Cleveland, Ohio]: National Aeronautics and Space Administration, Lewis Research Center, 1999.

Miyoshi, Kazuhisa. Chemical-vapor-deposited diamond film. [Cleveland, Ohio]: National Aeronautics and Space Administration, Lewis Research Center, 1999.

Chemical vapor deposition: Thermal and plasma deposition of electronic materials. New York: Van Nostrand Reinhold, 1995.

Moroșanu, C. E. Thin films by chemical vapour deposition. Amsterdam: Elsevier, 1990.

1949-, Werner Christoph, ed. Modeling of chemical vapor deposition of tungsten films. Basel: Birkhäuser Verlag, 1993.

Mazumder, J. Theory and application of laser chemical vapor deposition. New York: Plenum Press, 1995.

Mazumder, Jyoti, and Aravinda Kar. Theory and Application of Laser Chemical Vapor Deposition. Boston, MA: Springer US, 1995. http://dx.doi.org/10.1007/978-1-4899-1430-9.

Kleijn, Chris R., and Christoph Werner. Modeling of Chemical Vapor Deposition of Tungsten Films. Basel: Birkhäuser Basel, 1993. http://dx.doi.org/10.1007/978-3-0348-7741-1.

Sohn, Hong Yong. Chemical vapor synthesis of inorganic nanopowders. Hauppauge, N.Y: Nova Science Publishers, 2011.

Kwatera, Andrzej. Modelowanie chemicznego procesu osadzania cienkich warstw z fazy gazowej w warunkach kontrolowanych dyfuzją reagentów do podłoża. Kraków: Akademia Górniczo-Hutnicza im. S. Staszica, 1991.

Bliznakovska, Blagica. CVD: Main concepts, applications and restrictions. Jülich: Forschungszentrum Jülich GmbH, Zentralbibliothek, 1993.

Moene, Robert. Application of chemical vapour deposition in catalyst design: Development of high surface area silicon carbide as catalyst support. The Netherlands: Delft University Press, 1995.

Symposium on Atomic Layer Deposition Applications (3rd 2007 Washington, D.C.). Atomic layer deposition applications 3. Edited by Londergan A, Electrochemical Society Meeting, and Electrochemical Society. Dielectric Science and Technology Division. Pennington, NJ: Electrochemical Society, 2007.

Symposium on Atomic Layer Deposition Applications (2nd 2006 Cancun, Mexico). Atomic layer deposition applications 2. Edited by Londergan A, Electrochemical Society Meeting, and Electrochemical Society. Dielectric Science and Technology Division. Pennington, N.J: Electrochemical Society, 2007.

Symposium, on Atomic Layer Deposition Applications (3rd 2007 Washington D. C. ). Atomic layer deposition applications 3. Pennington, NJ: Electrochemical Society, 2007.

Symposium on Atomic Layer Deposition Applications (2nd 2006 Cancun, Mexico). Atomic layer deposition applications 2. Edited by Electrochemical Society Meeting and Electrochemical Society. Dielectric Science and Technology Division. Pennington, N.J: Electrochemical Society, 2007.

Symposium, on Atomic Layer Deposition Applications (2nd 2006 Cancun Mexico). Atomic layer deposition applications 2. Pennington, N.J: Electrochemical Society, 2007.

Symposium on Atomic Layer Deposition Applications (3rd 2007 Washington, D.C.). Atomic layer deposition applications 3. Edited by Londergan A, Electrochemical Society Meeting, and Electrochemical Society. Dielectric Science and Technology Division. Pennington, NJ: Electrochemical Society, 2007.

Symposium on Atomic Layer Deposition Applications (3rd 2007 Washington, D.C.). Atomic layer deposition applications 3. Edited by Londergan A, Electrochemical Society Meeting, and Electrochemical Society. Dielectric Science and Technology Division. Pennington, NJ: Electrochemical Society, 2007.

Symposium on Atomic Layer Deposition Applications (2nd 2006 Cancun, Mexico). Atomic layer deposition applications 2. Edited by Londergan A, Electrochemical Society Meeting, and Electrochemical Society. Dielectric Science and Technology Division. Pennington, N.J: Electrochemical Society, 2007.

Rosner, Daniel E. Research on chemical vapor deposition processes for advanced ceramic coatings. New Haven, CT: Yale University, Dept. of Chemical Engineering, High Temperature Chemical Reaction Engineering Laboratory, 1993.

Rosner, Daniel E. Research on chemical vapor deposition processes for advanced ceramic coatings. New Haven, CT: Yale University, Dept. of Chemical Engineering, High Temperature Chemical Reaction Engineering Laboratory, 1993.

Etemadi, Peyman. Plasma enhanced chemical vapor deposition of crystalline diamond films. Ottawa: National Library of Canada, 2002.

Sherman, Arthur. Chemical vapor deposition for microelectronics: Principles, technology, and applications. Park Ridge, N.J., U.S.A: Noyes Publications, 1987.

Liu, Huimin. Diamond chemical vapor deposition: Nucleation and early growth stages. Park Ridge, N.J: Noyes Publications, 1995.

Yongdong, Xu. Chemical vapour deposition: An integrated engineering design for advanced materials. London: Springer, 2009.

Handbook of chemical vapor deposition (CVD): Principles, technology, and applications. Park Ridge, N.J., U.S.A: Noyes Publications, 1992.

European Conference on Chemical Vapour Deposition (8th 1991 Glasgow, Scotland). Proceedings of the Eighth European Conference on Chemical Vapour Deposition =: Actes de la 8ème Conférence européenne sur les dépôts chimiques en phase gazeuse, Glasgow, Scotland, 9-13 September 1991. Les Ulis, France: Éditions de physique, 1991.

Spain) European Conference on Chemical Vapour Deposition (12th 1999 Barcelona. Proceedings of the Twelfth European Conference on Chemical Vapour Deposition, Sitges, Barcelona, Spain, September 5-10, 1999. Les Ulis, France: EDP Sciences, 1999.

European Conference on Chemical Vapour Deposition (8th 1991 Glasgow). Proceedings of the Eighth European Conference on Chemical Vapour Deposition, Glasgow, Scotland, 9-13 September 1991. Courtaboeuf: Journal de Physique, 1991.

European, Conference on Chemical Vapour Deposition (7th 1989 Perpignan France). Actes de la 7ème Conférence européenne sur les dépôts chimiques en phase gazeuse: Perpignan, France, 19-23 juin 1989 = Proceedings of the Seventh European Conference on Chemical Vapour Deposition. Les Ulis, France: Editions de physique, 1989.

European Conference on Chemical Vapour Deposition (13th 2001 Glyphada, Attikē, Greece). Thirteenth European Conference on Chemical Vapor Deposition, Glyfada, Athens, Greece, August 26-31, 2001. Les Ulis, France: EDP Sciences, 2001.

Moran, Robert. Thin layer deposition: Highlighting CVD. Norwalk, CT: Business Communications Co., 2000.

Robert, Moran. Thin layer deposition: Highlighting CVD. Norwalk, CT: Business Communications Co., 1996.

Robert, Moran. Thin layer deposition: Highlighting PVD. Norwalk, CT: Business Communications Co., 1996.

Konuma, Mitsuharu. Plasma techniques for film deposition. Harrow, U.K: Alpha Science International, 2005.

Emanuel, Mark A. Metalorganic chemical vapor deposition for the heterostructure hot electron diode. Park Ridge, N.J., U.S.A: Noyes Data Corp., 1989.

International, Conference on Chemical Vapor Deposition (15th 2000 Toronto Ont ). CVD XV: Proceedings of the Fifteenth International Symposium on Chemical Vapor Deposition. Pennington, NJ: Electrochemical Society, 2000.

Matsumura, Hideki, Karen K. Gleason, Ruud E. I. Schropp, and Hironobu Umemoto. Catalytic Chemical Vapor Deposition: Technology and Applications of Cat-CVD. Wiley & Sons, Incorporated, John, 2019.