Books on the topic 'Cathode processes'
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Han, Hwang-Jin. Physical processes in hollow cathode discharge sources. Naval Postgraduate School, 1989.
Find full textUnited States. National Aeronautics and Space Administration., ed. Plasma assisted surface coating/modification processes: An emerging technology. National Aeronautics and Space Administration, 1987.
Find full textVan Zee, John William, 1952-, Electrochemical Society. Industrial Electrolysis and Electrochemical Engineering Division., Electrochemical Society. Energy Technology Division., Electrochemical Society Meeting, Symposium on Advances in Mathematical Modeling and Simulation of Electrochemical Processes (1998 : San Diego, Calif.), and Symposium on Oxygen Depolarized Cathodes and Activated Cathodes for Chlor-Alkali and Chlorate Processes (1998 : San Diego, Calif.), eds. Proceedings of the Symposium on Advances in Mathematical Modeling and Simulation of Electrochemical Processes and [the Symposium on] Oxygen Depolarized Cathodes and Activated Cathodes for Chlor-Alkali and Chlorate Processes. Electrochemical Society, 1998.
Find full textvon, Baeckmann W., Schwenk W, Prinz W, and Baeckmann W. von, eds. Handbook of cathodic corrosion protection: Theory and practice of electrochemical protection processes. 3rd ed. Gulf Pub. Co., 1997.
Find full textWeale, Christopher John. Cathodic protection of reinforced concrete: Anodic processes in cements and related electrolytes. Aston University. Department of Civil Engineering, 1992.
Find full textInternational Colloquium on Plasmas and Sputtering (6th 1987 Antibes, France). Comptes rendus des travaux du CIP G87. Société française du vide, 1987.
Find full textRittner, Mindy N. Sputtered targets and sputtered films: Technology and markets. Business Communications Company, 1999.
Find full textRittner, Mindy N. Sputtering targets and sputtered films: Technology and markets. Business Communications Co., 2002.
Find full textWasa, Kiyotaka. Thin film materials technology: Sputtering of compound materials. William Andrew Pub., 2004.
Find full textWasa, Kiyotaka. Handbook of sputter deposition technology: Principles, technology, and applications. Noyes Publications, 1992.
Find full text(Stijn), Mahieu S., and SpringerLink (Online service), eds. Reactive Sputter Deposition. Springer-Verlag Berlin Heidelberg, 2008.
Find full textFuller, T. F., P. C. Foller, and F. Hine. Advances in Mathematical Modelling & Simulation of Electrochemical Processes & Oxygen Depolarized Cathodes & Activated Cathodes for Chlor-Alkali (Proceedings). Electrochemical Society, 1998.
Find full textKitabatake, Makoto, Hideaki Adachi, and Kiyotaka Wasa. Thin Film Materials Technology: Sputtering of Compound Materials. Noyes Publications, 2003.
Find full textStuart, R. V. Vacuum Technology, Thin Films, and Sputtering: An Introduction. Elsevier Science & Technology Books, 2012.
Find full textA Mathematical model of cathodic delamination and blistering processes in paint films on steel. U.S. Dept. of Commerce, Technology Administration, National Institute of Standards and Technology, 1992.
Find full textWasa, Kiyotaka, and Shigeru Hayakawa. Handbook of Sputter Deposition Technology: Principles, Technology and Applications. Elsevier Science & Technology Books, 1992.
Find full textKitabatake, Makoto, Hideaki Adachi, and Kiyotaka Wasa. Thin Film Materials Technology: Sputtering of Compound Materials. Elsevier Science & Technology Books, 2004.
Find full textWasa, Kiyotaka. Handbook of Sputter Deposition Technology: Fundamentals and Applications for Functional Thin Films, Nano-Materials and MEMS. Elsevier Science & Technology Books, 2012.
Find full textI Never Thought I'd GROW up to BE a Super Cool CATHODE RAY TUBE SALVAGE PROCESSOR: But HERE I AM Living the Dream ! Independently Published, 2021.
Find full textLu, Toh-Ming, and Edward V. Barnat. Pulsed and Pulsed Bias Sputtering: Principles and Applications. Springer, 2011.
Find full textLu, Toh-Ming, and Edward V. Barnat. Pulsed and Pulsed Bias Sputtering: Principles and Applications. Springer, 2014.
Find full textLu, Toh-Ming, and Edward V. Barnat. Pulsed and Pulsed Bias Sputtering: Principles and Applications. Springer London, Limited, 2013.
Find full textLu, Toh-Ming, and Edward V. Barnat. Pulsed and Pulsed Bias Sputtering: Principles and Applications. Springer, 2003.
Find full textSputtering Materials For Vlsi And Thin Film Devices. William Andrew Publishing, 2012.
Find full textFunctional Materials: Fundamental Research and Industrial Application. Trans Tech Publications, Limited, 2021.
Find full textPipeline External Corrosion Direct Assessment Methodology. AMPP, 2025. https://doi.org/10.5006/nace_sp0502-2025.
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