Log in

Relevant bibliographies by topics / Cathodic Arc / Dissertations / Theses

To see the other types of publications on this topic, follow the link: Cathodic Arc.

Dissertations / Theses on the topic 'Cathodic Arc'

Author: Grafiati

Published: 4 June 2021

Last updated: 20 February 2023

Create a spot-on reference in APA, MLA, Chicago, Harvard, and other styles

Select a source type:

Consult the top 50 dissertations / theses for your research on the topic 'Cathodic Arc.'

Next to every source in the list of references, there is an 'Add to bibliography' button. Press on it, and we will generate automatically the bibliographic reference to the chosen work in the citation style you need: APA, MLA, Harvard, Chicago, Vancouver, etc.

You can also download the full text of the academic publication as pdf and read online its abstract whenever available in the metadata.

Browse dissertations / theses on a wide variety of disciplines and organise your bibliography correctly.

1

Elzwawi, Salim Ahmed Ali. "Cathodic Arc Zinc Oxide for Active Electronic Devices." Thesis, University of Canterbury. Electrical and Computer Engineering, 2015. http://hdl.handle.net/10092/10852.

Full text

Abstract:

The filtered cathodic vacuum arc (FCVA) technique is a well established deposition method for wear resistant mechanical coatings. More recently, this method has attracted attention for growing ZnO based transparent conducting films. However, the potential of FCVA deposition to prepare ZnO layers for electronic devices is largely unexplored. This thesis addresses the use of FCVA deposition for the fabrication of active ZnO based electronic devices. The structural, electrical and optical characteristics of unintentionally doped ZnO films grown on different sapphire substrates were systematically

APA, Harvard, Vancouver, ISO, and other styles

2

Neumann, Patrick Reinhard Christian. "Centre-Triggered Pulsed Cathodic Arc Spacecraft Propulsion Systems." Thesis, The University of Sydney, 2015. http://hdl.handle.net/2123/13810.

Full text

Abstract:

Satellites must carry some manner of propulsion system so that course correction or orbit stationkeeping manoeuvres can be carried out. Chemical thrusters have lower specific impulse than electric propulsion systems, and so focus has turned to using plasma and ion propulsion systems such as Hall Effect thrusters and gridded ion thrusters. Both of these systems use gaseous propellants and require a charge neutralisation system, both of which impose certain design compromises. This thesis explores the potential use of pulsed cathodic arcs as a spacecraft propulsion system, determining fuel sp

APA, Harvard, Vancouver, ISO, and other styles

3

Eriksson, Anders. "Cathodic Arc Synthesis of Ti-Si-C-N Thin Films from Ternary Cathodes." Licentiate thesis, Linköpings universitet, Tunnfilmsfysik, 2010. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-61994.

Full text

Abstract:

Cathodic arc deposition is a powerful technique for thin film synthesis, associated with explosive phase transformations resulting in an energetic and highly ionized plasma. This Thesis presents film growth through arc deposition from compound cathodes of Ti3SiC2, providing source material for plasma and films rich in Si and C. The interest for the resulting Ti-Si-C-N films is inspired by the two ternaries Ti-Si-N and Ti-C-N, both successfully applied as corrosion and wear resistant films, with a potential for synergistic effects in the quarternary system. When using a rotating substrate fixt

APA, Harvard, Vancouver, ISO, and other styles

4

MacKenzie, Maureen. "Analytical electron microscopy of interfaces in cathodic arc coatings." Thesis, University of Glasgow, 1997. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.337506.

Full text

APA, Harvard, Vancouver, ISO, and other styles

5

Mustapha, Nazir Mohamad. "Reactive filtered arc evaporation." Thesis, Loughborough University, 1993. https://dspace.lboro.ac.uk/2134/26797.

Full text

Abstract:

Conventional physical vapour deposition (PVD) techniques usually result in films of lower quality than the corresponding bulk material. A major problem with PVD films is the presence of columns and voids throughout the thickness of the film. The films may have a low packing density, low micro-hardness and in many cases poor adhesion to the substrate. Many of these problems are a direct consequence of the low energy of the depositing atoms arriving at the substrate during film growth. The resulting film porosity gives rise to a reduction in mechanical strength, and in the case of dielectric opt

APA, Harvard, Vancouver, ISO, and other styles

6

Chhowalla, Manish. "Carbon thin films with enhanced properties from cathodic arc plasmas." Thesis, University of Cambridge, 1998. https://www.repository.cam.ac.uk/handle/1810/265423.

Full text

Abstract:

In this thesis, the physical, optical and electronic properties of amorphous carbon ( a-C) thin films deposited using a filtered and unfiltered cathodic arcs are investigated. Firstly, the plasma properties of the filtered cathodic vacuum arc (FCVA) have been examined using planar and wire Langmuir probes in order to optimize the plasma throughput around the 90� bend. The knowledge of plasma characteristics is then utilized to understand the properties of highly tetrahedral amorphous carbon ( ta-C) films as a function of the ion energy, deposition temperature and the deposition rate. A model b

APA, Harvard, Vancouver, ISO, and other styles

7

Schonjahn, Cornelia. "Surface treatment in a cathodic arc plasma : key step for interface engineering." Thesis, Sheffield Hallam University, 2001. http://shura.shu.ac.uk/20336/.

Full text

Abstract:

The effect of substrate surface treatment (substrate sputter cleaning) in a cathodic arc plasma prior to unbalanced magnetron deposition of transition metal nitride coatings on the performance of the coated components has been investigated. In particular the influence of parameters such as ion species, ion energy and exposure time on the changes in substrate surface topography, microstructure and micro-chemistry were studied employing transmission electron microscopy, energy dispersive X-ray analysis, electron energy loss spectroscopy, X-ray diffraction, atomic force microscopy and optical mic

APA, Harvard, Vancouver, ISO, and other styles

8

Liu, Zhijie. "Application of a pulsed cathodic arc for deposition of high entropy alloy thin films." Thesis, The University of Sydney, 2021. https://hdl.handle.net/2123/27518.

Full text

Abstract:

High entropy alloys (HEAs) were highly valued because of their unique and desirable properties. A HEA is defined as having at least five elements in equimolar or near equimolar ratios, and the concentration of each element is between 5% and 35%. HEAs have many desired properties, such as excellent hardness, thermal stability, high electrical and oxidation resistance, and excellent mechanical properties. These advantages grant HEAs to overcome the conventional alloys and be applied in various fields like tools with excellent hardness, high temperature and durable characteristics, magnetic films

APA, Harvard, Vancouver, ISO, and other styles

9

Syed, Muhammad Bilal. "Thermal Stability of Arc Evaporated ZrCrAlN." Thesis, Linköpings universitet, Nanostrukturerade material, 2012. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-84769.

Full text

Abstract:

This research explores the thermal stability of ZrCrAlN material system. For this purpose fourteen different compositions of ZrCrAlN coatings were deposited onto tungsten carbide substrates by using reactive cathodic arc evaporation. These compositions were further annealed at 800oC, 900oC, 1000oC and 1100oC temperatures. EDS was employed to specify the compositions. The crystal structure of the coatings were analysed by XRD, and the hardness of these coatings was determined by Nanoindentation. The experimental findings reported a significant age hardening of Zr0.16Cr0.12Al0.72N and a delayed

APA, Harvard, Vancouver, ISO, and other styles

10

Veerasamy, Vijayen S. "Tetrahedral amorphous carbon : deposition, characterisation and electronic properties." Thesis, University of Cambridge, 1994. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.337824.

Full text

APA, Harvard, Vancouver, ISO, and other styles

11

Kok, Yin Nan. "Nanoscale multilayer Me-graphite coatings grown by combined steered cathodic arc/unbalanced magnetron sputtering." Thesis, Sheffield Hallam University, 2005. http://shura.shu.ac.uk/19926/.

Full text

Abstract:

Low friction, nanoscale multilayer carbon/chromium (C/Cr) coatings were successfully deposited by the combined steered cathodic arc/unbalanced magnetron sputtering technique (also known as Arc Bond Sputtering or ABS) using a Hauzer HTC 1000-4 PVD coater. The work described in this thesis has been directed towards understanding the effect of ion irradiation on the composition, microstructure, and functional properties of C/Cr coatings. This has been achieved by varying the bias voltage, U[B], over a wide range between -65 V and -550 V. C/Cr coatings were deposited in three major steps: (i) Cr+

APA, Harvard, Vancouver, ISO, and other styles

12

Eriksson, Anders. "Cathodic Arc Synthesis of Ti-Si-C-N Thin Films : Plasma Analysis and Microstructure Formation." Doctoral thesis, Linköpings universitet, Tunnfilmsfysik, 2013. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-86259.

Full text

Abstract:

This Thesis explores the arc deposition process and films of Ti-Si-C-N, inspired by the two ternary systems Ti-Si-N and Ti-C-N, both successfully applied as corrosion and wear resistant films. The correlation between cathode, plasma, and film properties are studied for a comprehensive view on film formation. Novel approaches to adapt arc deposition to form multi-element films are investigated, concluding that the source of C is not a determining factor for film growth. Thus, cubic-phase films of similar properties can be synthesized from processes with either 1) ternary Ti-Si-C cathodes, inclu

APA, Harvard, Vancouver, ISO, and other styles

13

Oliveira, Junior Myriano Henriques de. "Propriedades ópticas, mecânicas e estruturais de filmes de carbono amorfo." [s.n.], 2009. http://repositorio.unicamp.br/jspui/handle/REPOSIP/277831.

Full text

Abstract:

Orientador: Francisco das Chagas Marques<br>Tese (doutorado) - Universidade Estadual de Campinas, Instituto de Fisica Gleb Wataghin<br>Made available in DSpace on 2018-08-14T14:37:10Z (GMT). No. of bitstreams: 1 OliveiraJunior_MyrianoHenriquesde_D.pdf: 13534676 bytes, checksum: 4da81eaf9a2b22721528c9804801a446 (MD5) Previous issue date: 2009<br>Resumo: Neste trabalho desenvolvemos um sistema de deposição de filmes finos pela técnica de arco catódico filtrado (FCVA- Filtered Cathodic Vacuum Arc), que possibilita o desenvolvimento de ligas metálicas e, sobretudo, a deposição de filmes de carb

APA, Harvard, Vancouver, ISO, and other styles

14

Oblitas, Raissa Lima de. "Avaliação da composição elementar de filmes finos de ligas metálicas depositados por Arco Catódico Filtrado em Vácuo utilizando RBS e EDS quantitativo." Universidade de São Paulo, 2016. http://www.teses.usp.br/teses/disponiveis/43/43134/tde-24102016-115435/.

Full text

Abstract:

Devido à relevância de filmes finos, as técnicas que são utilizadas para produzi-los e também para caracteriza-los tem se tornado importante. Neste contexto, foram analisados filmes finos de até 100 nm, de duas ligas metálicas (cromel e alumel), obtidos a partir da deposição por plasma de Arco Catódico Filtrado em Vácuo (Filtered Cathodic Vacuum Arc - FCVA). O objetivo deste projeto foi avaliar a similaridade em composição elementar entre os materiais utilizados para deposição, que operam como cátodos, e os filmes finos depositados, a partir de medições obtidas pela técnica de microanálise qua

APA, Harvard, Vancouver, ISO, and other styles

15

Oates, T. W. H. "Metal plasma immersion ion implantation and deposition using polymer substrates." Thesis, The University of Sydney, 2003. http://hdl.handle.net/2123/571.

Full text

Abstract:

This thesis investigates the application of plasma immersion ion implantation (PIII) to polymers. PIII requires that a high negative potential be applied to the surface of the material while it is immersed in a plasma. This presents a problem for insulating materials such as polymers, since the implanting ions carry charge to the surface, resulting in a charge accumulation that effectively neutralises the applied potential. This causes the plasma sheath at the surface to collapse a short time after the potential is applied. Measurements of the sheath dynamics, including the collapsing shea

APA, Harvard, Vancouver, ISO, and other styles

16

Oates, T. W. H. "Metal plasma immersion ion implantation and deposition using polymer substrates." University of Sydney. Physics, 2003. http://hdl.handle.net/2123/571.

Full text

Abstract:

This thesis investigates the application of plasma immersion ion implantation (PIII) to polymers. PIII requires that a high negative potential be applied to the surface of the material while it is immersed in a plasma. This presents a problem for insulating materials such as polymers, since the implanting ions carry charge to the surface, resulting in a charge accumulation that effectively neutralises the applied potential. This causes the plasma sheath at the surface to collapse a short time after the potential is applied. Measurements of the sheath dynamics, including the collapsing shea

APA, Harvard, Vancouver, ISO, and other styles

17

Kuhakan, J., M. Medhisuwakul, and L. D. Yu. "Filtered Cathodic Vacuum Arc Deposition of Porous and Nanostructured Carbon and Hybrid C-Mo Thin Films for Fuel Cell Membranes." Thesis, Sumy State University, 2012. http://essuir.sumdu.edu.ua/handle/123456789/34867.

Full text

Abstract:

In our proton exchange membrane (PEM) fuel cells, the electrolyte is a catalyst platinum (Pt) coated nafion membrane. In order to increase the electrochemically active catalyst area to enhance the cell performance but without sacrificing the electrical conductivity of the membrane, carbon thin films were deposited onto the membrane by using the filtered cathodic vacuum arc deposition (FCVAD) technique. With varying the deposition conditions, it was possible to form porous carbon films and nanoisland and nanorod structure surface which increased the catalyst area when a higher He working g

APA, Harvard, Vancouver, ISO, and other styles

18

Taylor, Matthew Bruce, and matthew taylor@rmit edu au. "A Study of Aluminium Nitride and Titanium Vanadium Nitride Thin Films." RMIT University. Applied Science, 2007. http://adt.lib.rmit.edu.au/adt/public/adt-VIT20080529.151820.

Full text

Abstract:

Thin film coatings are used to improve the properties of components and products in such diverse areas as tool coatings, wear resistant biological coatings, miniature integrated electronics, micro-mechanical systems and coatings for optical devices. This thesis focuses on understanding the development of intrinsic stress and microstructure in coatings of the technologically important materials of aluminium nitride (AlN) and titanium vanadium nitride (TiVN) deposited by filtered cathodic arc deposition. Thin films of AlN are fabricated under a variety of substrate bias regimes and at diffe

APA, Harvard, Vancouver, ISO, and other styles

19

Araujo, Juliano Avelar. "Obtenção e caracterização microestrutural e química de recobrimentos multicamadas de NbN/CrN para aplicações tribológicas pelo processo de deposição física de vapor." Universidade de São Paulo, 2016. http://www.teses.usp.br/teses/disponiveis/3/3133/tde-08122016-080902/.

Full text

Abstract:

O presente trabalho tem como objetivo contribuir para o conhecimento da morfologia, microestrutura e modulação composicional (perfil da composição química) de recobrimentos NbN/CrN multicamadas nanoestruturados com diferentes periodicidades (entre 4 e 20 nm) depositado por PVD pela técnica de arco catódico. Foi alcançada espessura total do recobrimento de 30 ?m mantendo-se a homogeneidade da periodicidade ao longo de toda a espessura. Análises de difração de Raios-X, aliadas a modelamento computacional (difração dinâmica), e análise de microscopia eletrônica de transmissão (MET), permitiram a

APA, Harvard, Vancouver, ISO, and other styles

20

Atiser, Adil [Verfasser]. "Influence of the plasma chemistry and energetics of an Al cathodic arc discharge on the composition and structure of Alumina thin films / Adil Atiser." Aachen : Shaker, 2011. http://d-nb.info/1080765220/34.

Full text

APA, Harvard, Vancouver, ISO, and other styles

21

Weng, Ko-Wei, and 翁克偉. "System and Process Correlation in Cathodic Arc Evaporation." Thesis, 2002. http://ndltd.ncl.edu.tw/handle/79222023800694336652.

Full text

Abstract:

博士<br>國立中興大學<br>材料工程學研究所<br>90<br>The research purpose was to develop the new process and the novel system configuration that attributed to reduction and promoted the formation of microdroplets, improvement the interface connection strength leaded to the enhancement of adhesion properties and anti-wear performance, and increased the flexibility of coating system, to extend the application of cathodic arc deposition. The combination of the process and the system design in our study can be categorized into four groups, reformation cathodic arc source, cathodic arc activated deposition (CAAD), cu

APA, Harvard, Vancouver, ISO, and other styles

22

Lin, Yi-Hung, and 林毅弘. "Wear Behavior of Cathodic Arc Plasma Deposited Titanium Nitride." Thesis, 1996. http://ndltd.ncl.edu.tw/handle/00681412826478635949.

Full text

Abstract:

碩士<br>逢甲大學<br>材料科學研究所<br>84<br>Recent investigation on the current status of hard coatings shows that cathodic arc plasma (CAP) deposition is the most widely used process for tool application while titanium nitride (TiN) is the most common material.Great advantages can be obtained from CAP coating that plenty of reports about wear behavior were appeared. However, these reports emphasized the performance of tool materials with and without CAP coating. A systematical study on the coating para

APA, Harvard, Vancouver, ISO, and other styles

23

Kuo, Jui-Kang, and 郭瑞剛. "Investigation of DLC-film wear by cathodic arc deposition." Thesis, 1999. http://ndltd.ncl.edu.tw/handle/55110576322533352403.

Full text

Abstract:

碩士<br>華梵大學<br>機電工程研究所<br>87<br>ABSTRACT This paper describes the characteristics of the DLC film evaporated by graphite cathodic arc method and it’s tribological behavior in reciprocating dry sliding with 4032 Al-alloy, 52100 steel and Al2O3. In addition, the wear mechanisms of the film and counterbody are discussed. The influence of process parameter and loading on wear is also studied. The result shows that the DLC film obtained under low Ar evaporation condition has a better performance on hardness. Besides, the thickness of the DLC film increases with the increase

APA, Harvard, Vancouver, ISO, and other styles

24

Chang, Yen-Shuo, and 張晏碩. "Cathodic arc evaporated CrAlSiN coatings with multi-cycle depositions." Thesis, 2014. http://ndltd.ncl.edu.tw/handle/01302734791497431759.

Full text

Abstract:

碩士<br>明道大學<br>材料科學與工程學系碩士班<br>102<br>The study used by cathode arc deposition to process nano-multi cycle of deposition CrAlSiN thin film which substrate used SUS304 and Tungsten steel. The system selected by PLATIT 80+ that is used on the industry widely. The experiment processed four different muti-cycle deposition CrAlSiN coating.The experiment was divided into two steps. First, it showed that Characteristic will change on microstructures and mechanical of muti-cycle deposition of CrAlSiN coating. The result show that the microstructures that used by Field Emission Scanning Electronic Micro

APA, Harvard, Vancouver, ISO, and other styles

25

ZHANG, YONG-JIE, and 張詠傑. "Electric Magnetron Arc Source Design of Cathodic Arc Evaporation and Deposition of AlTiN Hard Coatings." Thesis, 2018. http://ndltd.ncl.edu.tw/handle/6tmswb.

Full text

Abstract:

碩士<br>國立虎尾科技大學<br>機械與電腦輔助工程系碩士班<br>106<br>The cathodic arc system of physical vapor deposition, because of its fast deposition rate and low cost of machine equipment, is widely used by the tool and mold industry coatings, but it has one of the biggest defects are particles and droplets deposited on the surface of the film. This defect causes the surface of the film. Decrease in luminosity and mechanical properties. Therefore, many researches have proposed improvement methods for this drawback, such as reducing cathode target current, placing a magnetic filter tube in front of the target, and a

APA, Harvard, Vancouver, ISO, and other styles

26

謝涵嵋. "Deposition of CoCrCuFeNi Films with Cathodic Vacuum Arc Deposition Apparatus." Thesis, 2008. http://ndltd.ncl.edu.tw/handle/42247626937510788686.

Full text

APA, Harvard, Vancouver, ISO, and other styles

27

杜禹寬. "Deposition of Al0.5CoCrCu1.5FeNi Films with Filtered Cathodic Vacuum Arc Deposition Apparatus." Thesis, 2010. http://ndltd.ncl.edu.tw/handle/12714418462452046671.

Full text

APA, Harvard, Vancouver, ISO, and other styles

28

Chan, Mu-hsuan, and 詹慕萱. "Process and Characterization of Titanium Dioxide Coatings by Cathodic Arc Deposition." Thesis, 2006. http://ndltd.ncl.edu.tw/handle/19815625463245705135.

Full text

Abstract:

碩士<br>明道管理學院<br>材料暨系統工程研究所<br>94<br>Due to the energy shortage and environmental protection issues, titanium dioxide used as photocatalyst by absorbing solar energy to decompose various kinds of pollutant has been an interesting research recently. Moreover, for pure TiO2, only the ultraviolet fraction of the solar irradiation (about 5%) is active in the photoexcitation processes. Recently, many researches are working on the utilization of visible light to activate catalyst behaviors of titanium dioxide in order to expand applications in many fields. Titanium oxide (TiO2) and Copper-doped t

APA, Harvard, Vancouver, ISO, and other styles

29

Hsieh, Chi-Chung, and 謝啟中. "Simulation Study of Plasma Characteristics for Magnetic Filter Cathodic Arc System." Thesis, 2006. http://ndltd.ncl.edu.tw/handle/94999126832983257920.

Full text

Abstract:

碩士<br>國立成功大學<br>光電科學與工程研究所<br>94<br>Abstract In this simulation study,we use the PIC-model plasma simulation program OOPIC Pro as a tool for related research. the research is about the effects on system under the variation of the generating rate of the working gas、the type of axial magnetic field、input voltage on substrate、input voltage on solenoid、the type of baffles in the solenoid...etc. The research is helpful in following three aspects― a) Improve the comprehension of plasma characteristics. b) It is helpful to the further design of manufacture process. c) Constructing a platform of sim

APA, Harvard, Vancouver, ISO, and other styles

30

Jiang, Luh-Feng, and 江祿峰. "The Study of Hard Films by Cathodic Arc Plasma Deposition Method." Thesis, 1995. http://ndltd.ncl.edu.tw/handle/67007795681131096079.

Full text

Abstract:

碩士<br>國立臺灣科技大學<br>化學工程研究所<br>83<br>In tihis thesis, we explored the application of cathodic arc plasma technique in the deposition of (i)diamond-like film, (ii) hard films such as TiN, TiC and TiCN. Diamond-like film was deposited using high density graphite (1.92 g/cm3) as target and nitrogen as arc-sustaining gas. Film structure was influenced by parameters like arc current, background gas pressure and substrate bias voltage. Optimum condition was achieved as 35-40 ampere arc

APA, Harvard, Vancouver, ISO, and other styles

31

Wu, Tzu-Ming, and 吳澤民. "Synthesis and characterization of Titanium carbide by Filter Cathodic Arc Plasma." Thesis, 2007. http://ndltd.ncl.edu.tw/handle/46960769912778923515.

Full text

Abstract:

碩士<br>中國文化大學<br>材料科學與奈米科技研究所<br>95<br>In this study, we use the Filter Cathodic Vacuum Arc Deposition System. Due to have Filter System, it can be improved to filter macro-particle. At surface roughness, plates the film adhering and has great improvement with the hole rate on the surface, and plate the film structure do not change, because hole rate reduce to dwindle with particle, it make to speed reduce of plate film. The Cathodic Arc will have film to be density high, adhesive force strong, fast to deposit speed, advantage such as being good of the homogeneity, and by controlling different

APA, Harvard, Vancouver, ISO, and other styles

32

HSU, PIN-HUA, and 徐品華. "Process of CrAl(O,N) Oxide Coatings by Cathodic Arc Deposition." Thesis, 2016. http://ndltd.ncl.edu.tw/handle/77641476087901471408.

Full text

Abstract:

碩士<br>明道大學<br>材料與能源工程學系碩士班<br>104<br>In this study, cathodic arc deposition and Cr, Cr30Al70 dual targets were used to synthesize the CrN, CrAlN, CrAlON and CrAl coatings at low temperature. Except the CrAl coating, the other coatings possess similar surface roughness, however, many submicro droplets were sprayed on the coating surface due to the Al element with low melting temperature mixed in the target material. CrAlON coating decomposed of the Cr2O3, Al2O3 and CrN phases which present corundum structure. Vicker’s hardness test showed the highest hardness of Hv10g – 3180 for the CrAlN coati

APA, Harvard, Vancouver, ISO, and other styles

33

翁克偉. "Microstructure of TiNi thin films prepared by cathodic arc plasma ion plating." Thesis, 1998. http://ndltd.ncl.edu.tw/handle/85831609429632063451.

Full text

Abstract:

碩士<br>逢甲大學<br>材料科學研究所<br>86<br>TiNi intermetallic compound with pseudoelasticity and erosion and corrosion resistance could be potentially applied to sliding wear, rolling fatigue, corrosion, or erosion environment. The TiNi is however expensive. Thin film coating of TiNi will enable the usage of low cost materials such as polain steel to the above application. Thus a study on the TiNI coating is required. 　　A cathodic arc plasma ion plating process was used to deopsit TiNi films on plain steel. In the exoperimental, plain steel were use as substrates. Substrates bias voltage, working pressure

APA, Harvard, Vancouver, ISO, and other styles

34

Yeh, Chien-hsuan, and 葉建弦. "Deposition of Yttria-Stabilized Zirconia Film Using Cathodic Arc Plasma Ion Plating." Thesis, 2004. http://ndltd.ncl.edu.tw/handle/23832370439881588772.

Full text

Abstract:

碩士<br>逢甲大學<br>材料科學所<br>92<br>Zirconia ceramic exhibits excellent fracture toughness, high ion conductivity, low electron conductivity, and low thermal conductivity properties. Therefore, YSZ films have been widely applied to be the solid electrolyte of fuel cell, oxygen sensor, wear protective coatings and the thermal barrier coatings of high temperature power-generator components. Cathodic arc plasma ion plating (CAP) process is a promising coating technology which has high deposition rate, high atomic ionization and excellent film adhesion. In this study, the CAP process with Zr84Y16 cat

APA, Harvard, Vancouver, ISO, and other styles

35

Hsueh, Hsu-Hung, and 薛旭宏. "High Hardness Al-Ti-O-N Coating Deposited by cathodic Arc Evaporation." Thesis, 2008. http://ndltd.ncl.edu.tw/handle/46761235970646268310.

Full text

Abstract:

碩士<br>明道大學<br>材料暨系統工程研究所<br>96<br>The development of wear resistant coatings for cutting applications is rapidly progressing. The structure, mechanical properties, and wear performance of arc evaporated Al-Ti-O-N coatings have been investigated in this study. The various Al-Ti-O-N coatings were synthesized by using an AlTi target and varied O2/(O2+N2) gas flow between 0 to 16%. The coating structure was designed with tripled layers in which were composed of CrN as interlayer,CrN/AlTiN multi-layer and AlTiON top layer. The structural of the various coatings were analyzed using SEM, AFM, XRD, an

APA, Harvard, Vancouver, ISO, and other styles

36

黃思嘉. "Growth of single-crystal aluminum nanorods by filtered cathodic arc discharge system." Thesis, 2003. http://ndltd.ncl.edu.tw/handle/53514879343535583335.

Full text

Abstract:

碩士<br>國立清華大學<br>材料科學工程學系<br>91<br>Abstract Single phase aluminum nanorods was fabricated by filtered cathodic arc deposition system. SEM showed that typical nanorods are around 100 — 200 nm in diameter and several hundred nm in length. High resolution transmission electron microscopy with electron diffraction study revealed that the structures are of single crystalline. The EDS confirmed that the nanorods contain only the element of aluminum. In this method we are able to synthesize aluminum nanorods directly, quickly (few minutes), and in large-scale (8” wafer). No templates and ca

APA, Harvard, Vancouver, ISO, and other styles

37

古永延. "Tribological performance study of TiCxNy coatings deposited by cathodic arc ion plating technology." Thesis, 1997. http://ndltd.ncl.edu.tw/handle/52670915645296376310.

Full text

APA, Harvard, Vancouver, ISO, and other styles

38

Wu, Chung Wei, and 吳仲崴. "Sysnthesis and characterizations of TiSi(N,O) films by cathodic arc plasma evaporation." Thesis, 2009. http://ndltd.ncl.edu.tw/handle/t5w58v.

Full text

Abstract:

碩士<br>明道大學<br>材料科學與工程學系碩士班<br>97<br>In this study, the TiSi(N,O) coating on tungsten carbide and S304 steel substrates were deposited using cathodic arc plasma deposition process. This coating designed and implemented a compound interface, comprising a series of Ti, TiN, and TiSiN interlayers deposited in a continuous structure, between the TiSi(N,O) top coating and tungsten carbide substrate. The TiSi(N,O) composition was varied by changing the oxygen flow rate during the coating process. The phase structure, chemical composition, and morphology of coatings were observed by utilizing X-ray

APA, Harvard, Vancouver, ISO, and other styles

39

Chen, Wu-Wen, and 陳裕文. "Synthesis and characterizations of Ti-Si-C film by cathodic arc plasma evaporation." Thesis, 2009. http://ndltd.ncl.edu.tw/handle/66d4ub.

Full text

Abstract:

碩士<br>明道大學<br>材料科學與工程學系碩士班<br>97<br>In this work, Ti-Si-C coatings were produced by reactive cathodic arc deposition from TiSi alloy target at different C2H2 flow ratios onto cemented carbide substrates. The composition of the films was investigated by Electron Probe Micro-Analysis (EPMA), while structure was characterized using a X-ray diffractometer. The hardness and residual stress were studied using depth-sensing indentation and substrate deflection measurements (using Stoney's equation), respectively. Plots of carbon contents as a function of the C2H2 flow ratios showed the structure and

APA, Harvard, Vancouver, ISO, and other styles

40

Chiu, Li-Yen, and 邱立言. "Structure and mechanical properties of AlSiN/TiN multilayer deposited by cathodic arc evaporation." Thesis, 2011. http://ndltd.ncl.edu.tw/handle/47608317571405371385.

Full text

Abstract:

碩士<br>明道大學<br>材料科學與工程學系碩士班<br>99<br>In this thesis, the bigger particle defect of AlSiN/TiN multilayer which was coated by using Cathode Arc Deposition (CAE) systems was studied. The rotation speed of the sample holder on process was changed when AlSiN/TiN multilayer was coated and the mechanical property and structure of multilayer ware measured. The advantage of CAE system is that it can use alloy target and it owns better uniformity, stronger adhesion and higher deposition rate. The advantage of multilayer films is not only that it combines the characteristics of each single film, also it

APA, Harvard, Vancouver, ISO, and other styles

41

Chen, Wei-Chih, and 陳威池. "Synthesis and characterizations of TiSiN/TiAlN multilayer coating by cathodic arc plasma evaporation." Thesis, 2007. http://ndltd.ncl.edu.tw/handle/67638116303993904379.

Full text

Abstract:

碩士<br>明道大學<br>材料暨系統工程研究所<br>95<br>In this work, nano-multilayer TiSiN/TiAlN films have been deposited on WC-Co substrates by using TiSi (80:20 at.%) and TiAl (50:50 at.%) alloy target on a dual cathodic arc plasma evaporation system. The influences of bias voltages, holder speed rotation and reaction gas pressure varied on the microstructure, adhesion strength and tribological properties of the films were investigated. Scanning electron microscopy (SEM), X-ray diffraction (XRD) techniques were employed to analysis the microstructure, grain size, residual stress and bi-layer thickness. Corros

APA, Harvard, Vancouver, ISO, and other styles

42

Tsou, Po-Yi, and 鄒柏毅. "Source current effect on properties of CrSiN hard coatings by cathodic arc deposition." Thesis, 2014. http://ndltd.ncl.edu.tw/handle/16721670734108340408.

Full text

Abstract:

碩士<br>明道大學<br>材料科學與工程學系碩士班<br>102<br>Cathodic arc deposition system has a feature of high ionization rate, fast deposition rate and good adhesion properties. CrSiN thin films has good mechanical and chemical properties, few researches used the pulse current to enhance the films properties with excellent features. In this study, CrSiN thin films were deposited by cathodic arc deposition system. The influences of source cathodic arc current on the microstructure, mechanical properties and chemical properties of CrSiN thin films were investigated. The characteristics of CrSiN coatings were carrie

APA, Harvard, Vancouver, ISO, and other styles

43

Chang, JingTang, and 張景棠. "Cavitation Erosion Behavior of TiNi Thin Films Deposited by Cathodic Arc Plasma Ion Plating." Thesis, 2000. http://ndltd.ncl.edu.tw/handle/55860173335944425053.

Full text

Abstract:

碩士<br>逢甲大學<br>材料科學學系<br>88<br>TiNi intermetallic compound is considered for its pseudoelasticity to the application of cavitation resistance. It is however expensive and motivated the introduction of thin film process. Cathodic arc plasma deposition was used to deposit TiNi films on S48C medium carbon steel substrate. The substrates bias voltage was changed to optimize the properties of the deposited film when using Ti50Ni50 target. And Ti55Ni45 and Ti60Ni40 targets were used as well to deposit different film compositions. Surface and cross-sectional morphology of the deposited film

APA, Harvard, Vancouver, ISO, and other styles

44

Kao, Frank, and 高穗安. "A study of microstructure and properties of TiN prepared by cathodic arc ion plating." Thesis, 1999. http://ndltd.ncl.edu.tw/handle/39115559694237910565.

Full text

Abstract:

碩士<br>國立中興大學<br>材料工程學研究所<br>87<br>Abstract TiN thin films prepared by cathodic arc ion plating are wildly used as a hard coating for cutting tools in industry due to its good wear- and corrosion-resistance. Experiments were carried out to deposit TiN on a type 304 stainless steel for different substrate bias ranging from -100 to -300 V, and nitrogen pressure ranging from 10 to 30 mTorr. With the different coating conditions, the mechanical and corrosion properties and microstructure of the TiN thin films were studied. Characterization of the microstructure of the TiN th

APA, Harvard, Vancouver, ISO, and other styles

45

Wang, Wan-Chun, and 王婉純. "A Study of the Microstructure and Coating Properties of Cathodic Arc Evaporated Chromium Nitrides." Thesis, 2000. http://ndltd.ncl.edu.tw/handle/91783602092676001064.

Full text

Abstract:

碩士<br>國立中興大學<br>材料工程學研究所<br>88<br>This research is to investigate the microstructure, residual stress, oxidation resistance and corrosion resistance of cathodic arc deposited CrN film. The microstructure and chemical composition of the coatings were analyzed by X-ray diffractometry (XRD), analytical electron microscopy (AEM), high resolution transmission electron microscope (TEM) and scanning electron microscopy (SEM). The corrosion behavior of the coatings were studied by an EG&E 263A potentiostat. The residual stress in the cathodic arc deposited CrN film was measured to be 5.05 G

APA, Harvard, Vancouver, ISO, and other styles

46

Chen, Qi Ke, and 陳祈克. "On tribological properties of CrN coatings deposited on D2 steels by cathodic arc evaporation." Thesis, 1995. http://ndltd.ncl.edu.tw/handle/69904049877615120708.

Full text

APA, Harvard, Vancouver, ISO, and other styles

47

Shih, Yuan-Ting, and 施元丁. "The influence of oxygen on Diamondlike film deposited by cathodic arc plasma deposition technology." Thesis, 1995. http://ndltd.ncl.edu.tw/handle/86418768558415822509.

Full text

APA, Harvard, Vancouver, ISO, and other styles

48

Huang, Sung-Hsiu, and 黃頌修. "A Study of Nano-multilayered Thin Films Prepared by Filtered Cathodic Arc Evaporation Method." Thesis, 2015. http://ndltd.ncl.edu.tw/handle/57tpme.

Full text

Abstract:

博士<br>國立交通大學<br>材料科學與工程學系所<br>103<br>Due to the miniaturization and high-frequency applications of microelectronics, the substrates for electronic package have evolved from conventional FR4 printed circuit board to advanced substrates such as BT resin, Al2O3 and AlN substrates. Presently, the dry machining is the mainstream of substrate manufacture due to the requirements of product functionality and environmental issues. Development of new materials and surface hardening methods for drilling tools is hence critical since traditional cement metal tools such as WC-Co and surface coatings can no

APA, Harvard, Vancouver, ISO, and other styles

49

Hsieh, Tsung-Ju, and 謝宗儒. "Synthesis and characterizations of nanocomposite (Ti,Si)CN films by cathodic arc plasma evaporation." Thesis, 2007. http://ndltd.ncl.edu.tw/handle/72298780840660377622.

Full text

Abstract:

碩士<br>明道大學<br>材料暨系統工程研究所<br>95<br>Nanocomposite (Ti,Si)CN double-layered films were deposited on tungsten carbide (WC–Co) substrates using TiSi alloy as target for a dual cathodic arc plasma deposition system. The double-layered coatings were designed with Ti/(Ti,Si)N as an interlayer and (Ti,Si)CN as a surface layer. The (Ti,Si)CN coatings were deposited under the mixture of constant flow of N2 and various flows of C2H2. The influences of bias voltages and C2H2/N2 rate on the microstructure, mechanical, tribological and corrosion properties of the films were investigated. Scanning electro

APA, Harvard, Vancouver, ISO, and other styles

50

Guillen, E., I. Heras, Llorente G. Rincon, F. Lungwitz, M. Alcon-Camas, and R. Escobar-Galindo. "Room temperature deposition of highly dense TiO2 thin films by Filtered Cathodic Vacuum Arc." 2019. https://hzdr.qucosa.de/id/qucosa%3A33929.

Full text

Abstract:

A systematic study of TiO2 films deposited by dc filtered cathodic vacuum arc (FCVA) was carried out by varying the deposition parameters in a reactive oxygen atmosphere. The influence of the oxygen partial pressure on film properties is analyzed. Composition was obtained by Rutherford backscattering spectroscopy (RBS) measurements, which also allow us to obtain the density of the films. Morphology of the samples was studied by scanning electron microscopy (SEM) and their optical properties by ellipsometry. Transparent, very dense and stoichiometric TiO2 films were obtained by FCVA at room tem

APA, Harvard, Vancouver, ISO, and other styles

We offer discounts on all premium plans for authors whose works are included in thematic literature selections. Contact us to get a unique promo code!