Relevant bibliographies by topics / Cathodic reactive sputtering

Contents

  1. Journal articles
  2. Dissertations / Theses
  3. Book chapters
  4. Conference papers

Academic literature on the topic 'Cathodic reactive sputtering'

Author: Grafiati
Published: 4 June 2021
Last updated: 1 February 2022

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Journal articles on the topic "Cathodic reactive sputtering"

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Vacandio, F., Y. Massiani, P. Gravier, L. Fedrizzi, and D. Brida. "Electrochemical Behaviour of AIN Films Prepared by Reactive Cathodic Sputtering." Materials Science Forum 289-292 (August 1998): 689–98. http://dx.doi.org/10.4028/www.scientific.net/msf.289-292.689.

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ASHOK, K. "CHARACTERIZATION OF NICKEL OXIDE THIN FILM — DC REACTIVE MAGNETRON SPUTTERING." Surface Review and Letters 18, no. 01n02 (2011): 11–15. http://dx.doi.org/10.1142/s0218625x11014424.

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Nickel oxide ( NiO ) thin films were deposited on glass substrates by reactive direct current (DC) magnetron sputtering of a Ni target in an Ar / O 2 mixture. The effect of thickness (0.2 μm, 0.4 μm and 1 μm) on the structural and surface morphological properties of NiO thin films was investigated. These films were characterized by X-ray diffraction (XRD), Fourier transform infrared spectroscopy (FTIR) and atomic force microscopy (AFM). The films were cubic NiO , with preferred orientation in the (111) direction at lower deposition time (10 mins). At higher deposition time (60 mins) the prefer
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Münz, W. D. "Large-Scale Manufacturing of Nanoscale Multilayered Hard Coatings Deposited by Cathodic Arc/Unbalanced Magnetron Sputtering." MRS Bulletin 28, no. 3 (2003): 173–79. http://dx.doi.org/10.1557/mrs2003.58.

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AbstractNanoscale multilayered (superlattice) hard coatings can be manufactured in a plastic hardness range (HP) between 25GPa and 55 GPa by a combination of cathodic arc evaporation and unbalanced magnetron sputtering (arc bond sputter technology). Using large-scale industrial physical vapor deposition (PVD) equipment and a sufficiently high pumping speed, multilayered coatings can be deposited by simultaneously operating cathodes without special shutter and shielding facilities in a common reactive-gas atmosphere. The efficiency of the process is in many cases identical to that of TiN and Cr
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Meunier, G., J. P. Manaud, and P. Grall. "Synthesis and characterization of titanium hydride thin films obtained by reactive cathodic sputtering." Materials Science and Engineering: B 18, no. 3 (1993): 303–7. http://dx.doi.org/10.1016/0921-5107(93)90147-f.

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Hubička, Zdenek, Martin Zlámal, Jiri Olejníček, Drahoslav Tvarog, Martin Čada, and Josef Krýsa. "Semiconducting p-Type Copper Iron Oxide Thin Films Deposited by Hybrid Reactive-HiPIMS + ECWR and Reactive-HiPIMS Magnetron Plasma System." Coatings 10, no. 3 (2020): 232. http://dx.doi.org/10.3390/coatings10030232.

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A reactive high-power impulse magnetron sputtering (r-HiPIMS) and a reactive high-power impulse magnetron sputtering combined with electron cyclotron wave resonance plasma source (r-HiPIMS + ECWR) were used for the deposition of p-type CuFexOy thin films on glass with SnO2F conductive layer (FTO). The aim of this work was to deposit CuFexOy films with different atomic ratio of Cu and Fe atoms contained in the films by these two reactive sputtering methods and find deposition conditions that lead to growth of films with maximum amount of delafossite phase CuFeO2. Deposited copper iron oxide fil
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Arab Pour Yazdi, Lizarraga, Vernoux, Billard, and BRIOIS. "Catalytic Properties of Double Substituted Lanthanum Cobaltite Nanostructured Coatings Prepared by Reactive Magnetron Sputtering." Catalysts 9, no. 4 (2019): 381. http://dx.doi.org/10.3390/catal9040381.

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Lanthanum perovskites are promising candidates to replace platinum group metal (PGM), especially regarding catalytic oxidation reactions. We have prepared thin catalytic coatings of Sr and Ag doped lanthanum perovskite by using the cathodic co-sputtering magnetron method in reactive condition. Such development of catalytic films may optimize the surface/bulk ratio to save raw materials, since a porous coating can combine a large exchange surface with the gas phase with an extremely low loading. The sputtering deposition process was optimized to generate crystallized and thin perovskites films
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Combadiere, L., and J. Machet. "Study and control of both target-poisoning mechanisms and reactive phenomenon in reactive planar magnetron cathodic sputtering of TiN." Surface and Coatings Technology 82, no. 1-2 (1996): 145–57. http://dx.doi.org/10.1016/0257-8972(95)02671-1.

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Tarnowski, Michał, Justyna Witkowska, Jerzy Morgiel, et al. "Formation of Nitrogen Doped Titanium Dioxide Surface Layer on NiTi Shape Memory Alloy." Materials 14, no. 6 (2021): 1575. http://dx.doi.org/10.3390/ma14061575.

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NiTi shape memory alloys are increasingly being used as bone and cardiac implants. The oxide layer of nanometric thickness spontaneously formed on their surface does not sufficiently protect from nickel transition into surrounding tissues, and its presence, even in a small amount, can be harmful to the human organism. In order to limit this disadvantageous phenomenon, there are several surface engineering techniques used, including oxidation methods. Due to the usually complex shapes of implants, one of the most prospective methods is low-temperature plasma oxidation. This article presents the
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Vidal, M. A., and R. Asomoza. "Monte Carlo simulation of the transport process in the growth ofa‐Si:H prepared by cathodic reactive sputtering." Journal of Applied Physics 67, no. 1 (1990): 477–82. http://dx.doi.org/10.1063/1.345228.

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Li, Ke-Ding, Po-Wen Chen, and Kao-Shuo Chang. "Low-Temperature Deposition of Transparent Conducting Films Applied to Flexible Electrochromic Devices." Materials 14, no. 17 (2021): 4959. http://dx.doi.org/10.3390/ma14174959.

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Here, we compare two different transparent conducting oxides (TCOs), namely indium tin oxide (ITO) and indium zinc tin oxide (IZTO), fabricated as transparent conducting films using processes that require different temperatures. ITO and IZTO films were prepared at 230 °C and at room temperature, respectively, on glass and polyethylene terephthalate (PET) substrates using reactive magnetron sputtering. Electrochromic WO3 films deposited on ITO-based and IZTO-based ECDs using vacuum cathodic arc plasma (CAP) were investigated. IZTO-based ECDs have higher optical transmittance modulation, ΔT = 63
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Dissertations / Theses on the topic "Cathodic reactive sputtering"

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Sanchette, Fredéric. "Synthèse et caractérisation de dépôts Al-Cr-(N) et Al-Ti-(N) obtenus par pulvérisation cathodique magnétron en condition réactive." Vandoeuvre-les-Nancy, INPL, 1996. http://www.theses.fr/1996INPL057N.

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Ce travail porte sur l'élaboration et la caractérisation chimique, structurale, mécanique et électrochimique de revêtements Al-Cr-(N) et Al-Ti-(N) obtenus par pulvérisation cathodique magnétron de cibles composites Al-Cr et Al-Ti dans des plasmas d'argon et d'argon/azote. Les mécanismes de transfert de matière sont d'abord étudiés avec l'aide de l'analyse métallurgique des revêtements, le diagnostic du plasma par spectrométrie d'émission optique et un modèle de pulvérisation adapté à la géométrie des cibles composites. Les revêtements bruts de pulvérisation sont composés de solutions solides m
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Tirano, Sauveur. "Intégration et caractérisation électrique d'éléments de mémorisation à commutation de résistance de type back-end à base d'oxydes métalliques." Thesis, Aix-Marseille, 2013. http://www.theses.fr/2013AIXM4713/document.

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Cette thèse porte principalement sur la caractérisation électrique et la modélisation physique d'éléments mémoires émergents de type OxRRAM (Oxide Resistive Random Access Memory) intégrant soit un oxyde de nickel, soit un oxyde de hafnium. Une fois la maturité technologique atteinte, ce concept de mémoire est susceptible de remplacer la technologie Flash qui fait encore figure de référence. Les principaux avantages de la technologie OxRRAM reposent sur une très bonne compatibilité avec les filières CMOS, un faible nombre d'étapes de fabrication, une grande densité d'intégration et des performa
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Book chapters on the topic "Cathodic reactive sputtering"

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"Oxynitrides and Oxides Deposited by Cathodic Vacuum Arc." In Metallic Oxynitride Thin Films by Reactive Sputtering and Related Deposition Methods: Process, Properties and Applications, edited by Jörg Vetter. BENTHAM SCIENCE PUBLISHERS, 2013. http://dx.doi.org/10.2174/9781608051564113010015.

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SPROUL, WILLIAM D., PAUL J. RUDNIK, MICHAEL E. GRAHAM, and SUZANNE L. ROHDE. "HIGH RATE REACTIVE SPUTTERING IN AN OPPOSED CATHODE CLOSED-FIELD UNBALANCED MAGNETRON SPUTTERING SYSTEM." In Metallurgical Coatings and Thin Films 1990. Elsevier, 1990. http://dx.doi.org/10.1016/b978-1-85166-813-7.50034-6.

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Belkind, A., W. Gerristead, Z. Orban, D. Dow, J. Felts, and R. Laird. "Reactive co-sputtering of oxides and nitrides using a C-Mag™rotatable cylindrical cathode." In Metallurgical Coatings and Thin Films 1991. Elsevier, 1991. http://dx.doi.org/10.1016/b978-0-444-89455-7.50034-4.

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Conference papers on the topic "Cathodic reactive sputtering"

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Kraatz, Paul, F. R. Nakatsukasa, and John W. Stephenson. "Optical and electrical properties of transition metal nitride films produced by reactive cathodic arc deposition and reactive rf sputtering." In San Dieg - DL Tentative, edited by Richard I. Seddon. SPIE, 1990. http://dx.doi.org/10.1117/12.22372.

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Vergöhl, M., and D. Rademacher. "Particle generation during reactive magnetron sputtering of SiO2 with cylindrical and planar cathodes." In Optical Interference Coatings. OSA, 2010. http://dx.doi.org/10.1364/oic.2010.tud3.

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Patel, A. M., S. Y. Guo, A. P. Stavrides, et al. "Deposition of large area, directly textured, ZnO:Al films by reactive-environment, hollow cathode sputtering." In 2008 33rd IEEE Photovolatic Specialists Conference (PVSC). IEEE, 2008. http://dx.doi.org/10.1109/pvsc.2008.4922812.

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Delahoy, Alan, Sheyu Guo, John Cambridge, et al. "Reactive-Environment Hollow Cathode Sputtering: Compound Film Production, and Application to Thin Film Photovoltaics." In 2006 IEEE 4th World Conference on Photovoltaic Energy Conference. IEEE, 2006. http://dx.doi.org/10.1109/wcpec.2006.279457.

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Szczyrbowski, Joachim, and C. Braatz. "Reactive sputtering of highly insulating layers with twin-cathode and mid-frequency power supply." In Optical Materials Technology for Energy Efficiency and Solar Energy, edited by Anne Hugot-Le Goff, Claes-Goeran Granqvist, and Carl M. Lampert. SPIE, 1992. http://dx.doi.org/10.1117/12.130509.

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"Cathode Heating Hysteresis in Reactive Magnetron Sputtering: A Path to Accurate Values of the Ion-induced Secondary Electron Yield." In SVC TechCon 2016. Society of Vacuum Coaters, 2016. http://dx.doi.org/10.14332/svc16.proc.0024.

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Teng, C. W., C. C. Lee, K. C. Liu, et al. "Experimental Study of Chemical Reaction between LiF and Polyflourene Interface During Sputtering ITO Cathode for Top Emission PLED Devices." In 2005 International Conference on Solid State Devices and Materials. The Japan Society of Applied Physics, 2005. http://dx.doi.org/10.7567/ssdm.2005.f-8-1.

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You might also be interested in the extended bibliographies on the topic 'Cathodic reactive sputtering' for particular source types:
Journal articles
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