Books on the topic 'Chemical vapour deposition (CVD)'

Gesheva, K. A. Chemical vapor deposition (CVD) technology. Hauppauge, N.Y: Nova Science Publishers, 2008.

Bliznakovska, Blagica. CVD: Main concepts, applications and restrictions. Jülich: Forschungszentrum Jülich GmbH, Zentralbibliothek, 1993.

Moran, Robert. Thin layer deposition: Highlighting CVD. Norwalk, CT: Business Communications Co., 2000.

Robert, Moran. Thin layer deposition: Highlighting CVD. Norwalk, CT: Business Communications Co., 1996.

United States. National Aeronautics and Space Administration., ed. An overview of CVD processes. Washington DC: National Aeronautics and Space Administration, 1986.

Syrkin, V. G. CVD-metod: Khimicheskoe parofaznoe osazhdenie. Moskva: "Nauka", 2000.

Mazumder, J. Theory and application of laser chemical vapor deposition. New York: Plenum Press, 1995.

Handbook of chemical vapor deposition (CVD): Principles, technology, and applications. Park Ridge, N.J., U.S.A: Noyes Publications, 1992.

Russell, C. James. CVD diamond and related superhard materials. Waltham, MA (1100 Winter St., Waltham 02154): Decision Resources, 1993.

E, Spear Karl, Dismukes John P, and Electrochemical Society, eds. Synthetic diamond: Emerging CVD science and technology. New York: Wiley, 1994.

International, Conference on Chemical Vapor Deposition (15th 2000 Toronto Ont ). CVD XV: Proceedings of the Fifteenth International Symposium on Chemical Vapor Deposition. Pennington, NJ: Electrochemical Society, 2000.

Geiser, Juergen. Models and simulation of deposition processes with CVD apparatus: Theory and applications. Hauppauge, N.Y. , USA: Nova Science Publishers, 2009.

Powell, J. Anthony. Advances in silicon carbide chemical vapor deposition (CVD) for semiconductor device fabrication. [Washington, DC]: National Aeronautics and Space Administration, 1991.

International Conference on Chemical Vapor Deposition (11th 1990 Seattle, Wash.). CVD-XI: Proceedings of the Eleventh International Conference on Chemical Vapor Deposition, 1990. Pennington, N.J: Electrochemical Society, 1990.

Uppsala, Sweden) European Conference on Chemical Vapour Deposition (5th 1985. Euro CVD five: Proceedings of the Fifth European Conference on Chemical Vapour Deposition, June 17-20, 1985, Uppsala, Sweden. Uppsala, Sweden: Uppsala University, Dept. of Chemistry, 1985.

Jones, Anthony C. CVD of compound semiconductors: Precursor synthesis, development and applications. Weinheim, Germany: VCH, 1997.

Jönsson, Martin. Investigations of plasma-enhanced CVD growth of carbon nanotubes and potential applications. Göteborg: Göteborg University, 2007.

European Conference on Chemical Vapour Deposition (12th 1999 Sitges, Barcelona, Spain). Late news: Proceedings of the Twelfth European Conference on Chemical Vapour Deposition : Euro CVD Twelve : Sitges, Barcelona, Spain, September 5-10, 1999. Les Ulis: EDP Sciences, 2000.

S, Sussmann Ricardo, ed. CVD diamond for electronic devices and sensors. Chichester, West Sussex, UK: J. Wiley, 2009.

Kroll, Darwin E. Metallization of CVD diamond using metal oxide intermediate layers for electronics packaging. Monterey, Calif: Naval Postgraduate School, 1997.

Fischer, Roland A. Precursor chemistry of advanced materials: CVD, ALD and nanoparticles. Berlin: Springer, 2010.

European Conference on Chemical Vapour Deposition (13th 2001 Athens, Greece). Thirteenth European Conference on Chemical Vapor Deposition: Proceedings : EURO CVD Thirteen : Glyfada, Athens, Greece, August 26-31, 2001. Les Ulis, France: EDP Sciences, 2001.

J, Hampden-Smith Mark, ed. Aerosol processing of materials. New York: Wiley-VCH, 1999.

G, Lucovsky, Ibbotson Dale E, and Hess Dennis W, eds. Characterization of plasma-enhanced CVD processes: Symposium held Novermber 27-28, 1989, Boston, Massachusetts, U.S.A. Pittsburgh, Pa: Materials Research Society, 1990.

Jones, Anthony C., and Michael L. Hitchman, eds. Chemical Vapour Deposition. Cambridge: Royal Society of Chemistry, 2008. http://dx.doi.org/10.1039/9781847558794.

Xu, Yongdong, and Xiu-Tian Yan. Chemical Vapour Deposition. London: Springer London, 2010. http://dx.doi.org/10.1007/978-1-84882-894-0.

Carlsson, Jan-Otto. Progress in chemical vapour deposition. Oxford: Pergamon, 1994.

Wilson, M. I. Chemical vapour deposition onto porous materials. Manchester: UMIST, 1993.

Moroșanu, C. E. Thin films by chemical vapour deposition. Amsterdam: Elsevier, 1990.

C, Jones Anthony, and Hitchman Michael L, eds. Chemical vapour deposition: Precursors, processes and applications. Cambridge, UK: Royal Society of Chemistry, 2009.

Ahmed, Waqar, Htet Sein, Mark J. Jackson, Christopher Rego, David A. Phoenix, Abdelbary Elhissi, and St John Crean. Chemical Vapour Deposition of Diamond for Dental Tools and Burs. Cham: Springer International Publishing, 2014. http://dx.doi.org/10.1007/978-3-319-00648-2.

Yongdong, Xu. Chemical vapour deposition: An integrated engineering design for advanced materials. London: Springer, 2009.

Ahmed, Waqar. Studies in low pressure chemical vapour deposition of polycrystalline silicon. Salford: University of Salford, 1986.

Moene, Robert. Application of chemical vapour deposition in catalyst design: Development of high surface area silicon carbide as catalyst support. The Netherlands: Delft University Press, 1995.

European Conference on Chemical Vapour Deposition (8th 1991 Glasgow). Proceedings of the Eighth European Conference on Chemical Vapour Deposition, Glasgow, Scotland, 9-13 September 1991. Courtaboeuf: Journal de Physique, 1991.

Pritchard, Hywyn. The production of thin tungsten films by low pressure chemical vapour deposition. Salford: University of Salford, 1988.

Sutcliffe, P. J. SIMS surface studies of silicon substrates for low temperature chemical vapour deposition. Manchester: UMIST, 1992.

McLean, Steven. Chemical vapour deposition of titanium carbide on low alloy high speed steel. Birmingham: University of Birmingham, 1987.

Spain) European Conference on Chemical Vapour Deposition (12th 1999 Barcelona. Proceedings of the Twelfth European Conference on Chemical Vapour Deposition, Sitges, Barcelona, Spain, September 5-10, 1999. Les Ulis, France: EDP Sciences, 1999.

Jones, Philip Antony. The application of chemical vapour deposition to the growth of CuInSe2 thin films. Salford: University ofSalford, 1993.

European, Conference on Chemical Vapour Deposition (7th 1989 Perpignan France). Actes de la 7ème Conférence européenne sur les dépôts chimiques en phase gazeuse: Perpignan, France, 19-23 juin 1989 = Proceedings of the Seventh European Conference on Chemical Vapour Deposition. Les Ulis, France: Editions de physique, 1989.

European Conference on Chemical Vapour Deposition (8th 1991 Glasgow, Scotland). Proceedings of the Eighth European Conference on Chemical Vapour Deposition =: Actes de la 8ème Conférence européenne sur les dépôts chimiques en phase gazeuse, Glasgow, Scotland, 9-13 September 1991. Les Ulis, France: Éditions de physique, 1991.

R, Brozel M., and Chemistry, eds. Characterization of algainp light emitting diodes (leds) grown by metal organic chemical vapour deposition (mocvd). Manchester: UMIST, 1998.

Tilsley, Matthew Edward Glyn. An investigation of magnetic thin films grown by organic chemical vapour deposition for possible magnetoresistive applications. Birmingham: University of Birmingham, 1997.

European Conference on Chemical Vapour Deposition (9th 1993 Tampere, Finland). Proceedings of the ninth European Conference on Chemical Vapour Deposition, Tampere, Finland, 22-27 August 1993. Courtaboeuf: Journal de Physique, 1993.

European Conference on Chemical Vapour Deposition (6th 1987 Jerusalem). Proceedings of the Sixth European Conference on Chemical Vapour Deposition, Jerusalem, Israel, 29 March-3 April 1987. Nahariya, Israel: Iscar Ltd., Hardmetal Industrial Products., 1987.

European, Conference on Chemical Vapour Deposition (13th 2001 Glyfada Athens Greece). Late news: Thirteenth European Conference on Chemical Vapour Deposition : proceedings : EUROCVD Thirteen : Glyfada, Athens, Greece, August 26-31, 2001. Les Ulis, France: EDP Sciences, 2002.

Priestner, Deborah Mary. An investigation of the chemical vapour deposition of titanium carbide onto pre-carburised low carbon, low alloy steel substrates. Birmingham: University of Birmingham, 1989.

Thin-film deposition: Principles and practice. New York: McGraw-Hill, 1995.

Choy, Kwang Leong, ed. Chemical Vapour Deposition (CVD). CRC Press, 2019. http://dx.doi.org/10.1201/9780429342363.