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Journal articles on the topic 'Chemical vapour deposition'

Author: Grafiati

Published: 4 June 2021

Last updated: 6 September 2023

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1

BACHMANN, P. K., D. LEERS, and D. U. WIECHERT. "DIAMOND CHEMICAL VAPOUR DEPOSITION." Le Journal de Physique IV 02, no. C2 (September 1991): C2–907—C2–913. http://dx.doi.org/10.1051/jp4:19912109.

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2

Roy, S. K. "Laser chemical vapour deposition." Bulletin of Materials Science 11, no. 2-3 (November 1988): 129–35. http://dx.doi.org/10.1007/bf02744550.

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3

Marinkovic, S. N. "Chemical Vapour Deposition of Diamond." Materials Science Forum 214 (May 1996): 171–78. http://dx.doi.org/10.4028/www.scientific.net/msf.214.171.

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4

Swinbanks, David. "Chemical vapour deposition advances superconducters." Nature 332, no. 6162 (March 1988): 295. http://dx.doi.org/10.1038/332295a0.

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5

Choy, K. "Chemical vapour deposition of coatings." Progress in Materials Science 48, no. 2 (2003): 57–170. http://dx.doi.org/10.1016/s0079-6425(01)00009-3.

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6

Jönsson, Ulf, Göran Olofsson, Magnus Malmqvist, and Inger Rönnberg. "Chemical vapour deposition of silanes." Thin Solid Films 124, no. 2 (February 1985): 117–23. http://dx.doi.org/10.1016/0040-6090(85)90253-6.

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7

Wahl, G., and F. Schmaderer. "Chemical vapour deposition of superconductors." Journal of Materials Science 24, no. 4 (April 1989): 1141–58. http://dx.doi.org/10.1007/bf02397041.

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8

Chaudhari, Mandakini N. "Thin film Deposition Methods: A Critical Review." International Journal for Research in Applied Science and Engineering Technology 9, no. VI (June 30, 2021): 5215–32. http://dx.doi.org/10.22214/ijraset.2021.36154.

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The aim of this review paper is to present a critical analysis of existing methods of thin film deposition. Paper discusses some thin film techniques which are advanced and popular. The advantages and disadvantages of each method are mentioned. The two major areas of interest discussed are physical and chemical vapor deposition techniques. In general, thin film is a small thickness that produces by physical vapour deposition (PVD) and chemical vapour deposition (CVD). Despite the PVD technique has a few drawbacks, it remains an important method and more beneficial than CVD technique for depositing thin films materials. It is examined that some remarkable similarities and difference between the specific methods. The sub methods which are having common principle are classified. The number of researchers attempted to explain the how the specific method is important and applicable for the deposition of thin films. In conclusion the most important method of depositing thin films is CVD. For our research work the Spray Pyrolysis technique, which is versatile and found suitable to use.

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9

Mundra, S. S., S. S. Pardeshi, S. S. Bhavikatti, and Atul Nagras. "Development of an integrated physical vapour deposition and chemical vapour deposition system." Materials Today: Proceedings 46 (2021): 1229–34. http://dx.doi.org/10.1016/j.matpr.2021.02.069.

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10

Carlsson, Jan-Otto, Bertil Holmberg, Jorma Korvola, Erkki Kolehmainen, Knut Maartmann-Moe, and Nils Tælnes. "Precursor Design for Chemical Vapour Deposition." Acta Chemica Scandinavica 45 (1991): 864–69. http://dx.doi.org/10.3891/acta.chem.scand.45-0864.

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11

Gracio, J. J., Q. H. Fan, and J. C. Madaleno. "Diamond growth by chemical vapour deposition." Journal of Physics D: Applied Physics 43, no. 37 (September 2, 2010): 374017. http://dx.doi.org/10.1088/0022-3727/43/37/374017.

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12

Lindahl, Erik, Mikael Ottosson, and Jan-Otto Carlsson. "Chemical Vapour Deposition of Metastable Ni3N." ECS Transactions 25, no. 8 (December 17, 2019): 365–72. http://dx.doi.org/10.1149/1.3207614.

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13

Ruppi, S., and A. Larsson. "Chemical vapour deposition of κ-Al2O3." Thin Solid Films 388, no. 1-2 (June 2001): 50–61. http://dx.doi.org/10.1016/s0040-6090(01)00814-8.

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14

Forsgren, Katarina, and Anders H«rsta. "Halide chemical vapour deposition of Ta2O5." Thin Solid Films 343-344 (April 1999): 111–14. http://dx.doi.org/10.1016/s0040-6090(98)01624-1.

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15

Wieczorek, C. "Chemical vapour deposition of tantalum disilicide." Thin Solid Films 126, no. 3-4 (April 1985): 227–32. http://dx.doi.org/10.1016/0040-6090(85)90315-3.

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16

Auvert, Geoffroy. "Laser chemical vapour deposition for microelectronics." Applied Surface Science 86, no. 1-4 (February 1995): 466–74. http://dx.doi.org/10.1016/0169-4332(94)00451-x.

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17

Bain, M. F., B. M. Armstrong, and H. S. Gamble. "Deposition of tungsten by plasma enhanced chemical vapour deposition." Le Journal de Physique IV 09, PR8 (September 1999): Pr8–827—Pr8–833. http://dx.doi.org/10.1051/jp4:19998105.

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18

Oliveri, C., F. Baroetto, and C. Magro. "Study of the chemical composition of silicon nitride films obtained by chemical vapour deposition and plasma-enhanced chemical vapour deposition." Surface and Coatings Technology 45, no. 1-3 (May 1991): 137–46. http://dx.doi.org/10.1016/0257-8972(91)90216-j.

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19

Norman, John A. T., David A. Roberts, Arthur K. Hochberg, Paul Smith, Gary A. Petersen, John E. Parmeter, Chris A. Apblett, and Thomas R. Omstead. "Chemical additives for improved copper chemical vapour deposition processing." Thin Solid Films 262, no. 1-2 (June 1995): 46–51. http://dx.doi.org/10.1016/0040-6090(94)05808-3.

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20

Schmidt, Volker, Stephan Senz, and Ulrich Gösele. "UHV chemical vapour deposition of silicon nanowires." Zeitschrift für Metallkunde 96, no. 5 (May 2005): 427–28. http://dx.doi.org/10.3139/146.018129.

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21

Sun, Fang Hong, X. G. Wang, Zhi Ming Zhang, H. S. Shen, and Ming Chen. "Chemical Vapour Deposition Diamond Coated Drawing Dies." Key Engineering Materials 259-260 (March 2004): 68–72. http://dx.doi.org/10.4028/www.scientific.net/kem.259-260.68.

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22

Mohammadi, A. "CHEMICAL VAPOUR DEPOSITION OF ELECTRICALLY CONDUCTING POLYMERS." Surface Engineering 10, no. 2 (January 1994): 152–54. http://dx.doi.org/10.1179/sur.1994.10.2.152.

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23

Vasilev, Vladislav Yu, and Sergei M. Repinsky. "Chemical vapour deposition of thin-film dielectrics." Russian Chemical Reviews 74, no. 5 (May 31, 2005): 413–41. http://dx.doi.org/10.1070/rc2005v074n05abeh000886.

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24

Mainwood, A., L. Allers, A. Collins, J. F. Hassard, A. S. Howard, A. R. Mahon, H. L. Parsons, et al. "Neutron damage of chemical vapour deposition diamond." Journal of Physics D: Applied Physics 28, no. 6 (June 14, 1995): 1279–83. http://dx.doi.org/10.1088/0022-3727/28/6/035.

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25

Kuijlaars, K. J., C. R. Kleijn, and H. E. A. van den Akker. "Simulation of selective tungsten chemical vapour deposition." Materials Science in Semiconductor Processing 1, no. 1 (April 1998): 43–54. http://dx.doi.org/10.1016/s1369-8001(98)00004-3.

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26

Tägtström, P., and U. Jansson. "Chemical vapour deposition of epitaxial WO3 films." Thin Solid Films 352, no. 1-2 (September 1999): 107–13. http://dx.doi.org/10.1016/s0040-6090(99)00379-x.

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27

Kuzminykh, Yury, Ali Dabirian, Michael Reinke, and Patrik Hoffmann. "High vacuum chemical vapour deposition of oxides:." Surface and Coatings Technology 230 (September 2013): 13–21. http://dx.doi.org/10.1016/j.surfcoat.2013.06.059.

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28

Mane, Anil U., and S. A. Shivashankar. "Atomic layer chemical vapour deposition of copper." Materials Science in Semiconductor Processing 7, no. 4-6 (January 2004): 343–47. http://dx.doi.org/10.1016/j.mssp.2004.09.094.

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29

Inspektor-Koren, Aharon. "Principles of plasma-activated chemical vapour deposition." Surface and Coatings Technology 33 (December 1987): 31–48. http://dx.doi.org/10.1016/0257-8972(87)90174-5.

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30

Machac, Petr, Stanislav Cichon, Ladislav Lapcak, and Ladislav Fekete. "Graphene prepared by chemical vapour deposition process." Graphene Technology 5, no. 1-2 (February 14, 2020): 9–17. http://dx.doi.org/10.1007/s41127-019-00029-6.

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31

Isobe, Y., M. Tanaka, S. Yamanaka, and M. Miyake. "Chemical vapour deposition of rhenium on graphite." Journal of the Less Common Metals 152, no. 1 (June 1989): 177–84. http://dx.doi.org/10.1016/0022-5088(89)90083-0.

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32

Hoffman, David M. "Chemical vapour deposition of nitride thin films." Polyhedron 13, no. 8 (April 1994): 1169–79. http://dx.doi.org/10.1016/s0277-5387(00)80253-3.

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33

Pola, Josef, Antonín Lyčka, Leonid E. Guselnikov, and Vera V. Volkova. "Laser-induced chemical vapour deposition of polymethanimine." J. Chem. Soc., Chem. Commun., no. 1 (1992): 20–22. http://dx.doi.org/10.1039/c39920000020.

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34

Cognolato, L. "Chemical Vapour Deposition for Optical Fibre Technology." Le Journal de Physique IV 05, no. C5 (June 1995): C5–975—C5–987. http://dx.doi.org/10.1051/jphyscol:19955115.

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35

Henry, F., B. Armas, C. Combescure, D. Thenegal, and R. Flamand. "Chemical Vapour Deposition of AIN-Si3N4 Codeposits." Le Journal de Physique IV 05, no. C5 (June 1995): C5–785—C5–792. http://dx.doi.org/10.1051/jphyscol:1995593.

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36

Kosky, P. G., H. C. Peters, C. L. Spiro, D. S. McAtee, L. Rumaner, and D. Marsh. "Superconducting Nb3Sn joints by chemical vapour deposition." Cryogenics 34, no. 9 (January 1994): 753–59. http://dx.doi.org/10.1016/0011-2275(94)90162-7.

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37

Goela, Jitendra S., and Raymond L. Taylor. "Monolithic material fabrication by chemical vapour deposition." Journal of Materials Science 23, no. 12 (December 1988): 4331–39. http://dx.doi.org/10.1007/bf00551927.

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38

Cheung, C. K. W., P. McNamara, G. W. Barton, and Z. Liu. "Germania nanocrystals in Modified Chemical Vapour Deposition." Journal of Non-Crystalline Solids 354, no. 33 (September 2008): 3958–64. http://dx.doi.org/10.1016/j.jnoncrysol.2008.05.033.

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39

Meyer, G., and J. Saura. "CdTe crystals grown by chemical vapour deposition." Journal of Materials Science Letters 11, no. 3 (1992): 143–44. http://dx.doi.org/10.1007/bf00724671.

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40

Fredriksson, Eva, and Jan-Otto Carlsson. "Chemical vapour deposition of Al2O3 on TiO." Thin Solid Films 263, no. 1 (July 1995): 28–36. http://dx.doi.org/10.1016/0040-6090(95)06546-6.

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41

Madar, R., N. Thomas, and C. Bernard. "Chemical vapour deposition precursors for metal silicides." Materials Science and Engineering: B 17, no. 1-3 (February 1993): 118–25. http://dx.doi.org/10.1016/0921-5107(93)90092-2.

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42

Sharma, Uttam, Sachin S. Chauhan, Jayshree Sharma, A. K. Sanyasi, J. Ghosh, K. K. Choudhary, and S. K. Ghosh. "Tungsten Deposition on Graphite using Plasma Enhanced Chemical Vapour Deposition." Journal of Physics: Conference Series 755 (October 2016): 012010. http://dx.doi.org/10.1088/1742-6596/755/1/012010.

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43

Abhinandan, Lala, and Andreas Holländer. "Localized deposition of hydrocarbon using plasma activated chemical vapour deposition." Thin Solid Films 457, no. 2 (June 2004): 241–45. http://dx.doi.org/10.1016/j.tsf.2003.10.014.

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44

Hwang, N. M., and D. Y. Yoon. "Driving force for deposition in the chemical vapour deposition process." Journal of Materials Science Letters 13, no. 19 (1994): 1437–39. http://dx.doi.org/10.1007/bf00405056.

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45

Spee, C. I. M. A., F. Verbeek, J. G. Kraaijkamp, J. L. Linden, T. Rutten, H. Delhaye, E. A. van der Zouwen, and H. A. Meinema. "Tungsten deposition by organometallic chemical vapour deposition with organotungsten precursors." Materials Science and Engineering: B 17, no. 1-3 (February 1993): 108–11. http://dx.doi.org/10.1016/0921-5107(93)90090-a.

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46

Oehr, C., and H. Suhr. "Deposition of silver films by plasma-enhanced chemical vapour deposition." Applied Physics A Solids and Surfaces 49, no. 6 (December 1989): 691–96. http://dx.doi.org/10.1007/bf00616995.

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47

Jašek, Ondřej, Petr Synek, Lenka Zajíčková, Marek Eliáš, and Vít Kudrle. "Synthesis of Carbon Nanostructures by Plasma Enhanced Chemical Vapour Deposition at Atmospheric Pressure." Journal of Electrical Engineering 61, no. 5 (September 1, 2010): 311–13. http://dx.doi.org/10.2478/v10187-011-0049-9.

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Synthesis of Carbon Nanostructures by Plasma Enhanced Chemical Vapour Deposition at Atmospheric PressureCarbon nanostructures present the leading field in nanotechnology research. A wide range of chemical and physical methods was used for carbon nanostructures synthesis including arc discharges, laser ablation and chemical vapour deposition. Plasma enhanced chemical vapour deposition (PECVD) with its application in modern microelectronics industry became soon target of research in carbon nanostructures synthesis. Selection of the ideal growth process depends on the application. Most of PECVD techniques work at low pressure requiring vacuum systems. However for industrial applications it would be desirable to work at atmospheric pressure. In this article carbon nanostructures synthesis by plasma discharges working at atmospheric pressure will be reviewed.

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48

Gómez-Aleixandre, C., J. M. Albella, F. Ojeda, and F. J. Martí. "Síntesis de materiales cerámicos mediante técnicas químicas en fase vapor (CVD)." Boletín de la Sociedad Española de Cerámica y Vidrio 42, no. 1 (February 28, 2003): 27–31. http://dx.doi.org/10.3989/cyv.2003.v42.i1.653.

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49

Fu, Xiuhua, Lin Li, Gibson Des, Waddell Ewan, and Wingo Lv. "Modelling and optimization of f ilm thickness variation for plasma enhanced chemical vapour deposition processes." Chinese Optics Letters 11, S1 (2013): S10209. http://dx.doi.org/10.3788/col201311.s10209.

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50

Pchelkin, Vyacheslav, and Tatyana Duyun. "Wear-resisting properties of multilayer coated carbide blades under different technological conditions of turning of heat-resistant steel." MATEC Web of Conferences 224 (2018): 01110. http://dx.doi.org/10.1051/matecconf/201822401110.

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Experimented results of wear-resisting properties of carbide blades with multilayer wear-resistance coatings, obtained by different processes: chemical vapor deposition and spraying by condensation from vapour (gas) phase while turning of corrosion –resistant heat-resistant steel 08Х18Н10Т are presented.

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