Relevant bibliographies by topics / Cml pfd

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Academic literature on the topic 'Cml pfd'

Author: Grafiati
Published: 4 June 2021
Last updated: 10 February 2022

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Journal articles on the topic "Cml pfd"

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Abbas, Waseem, Zubair Mehmood, and Munkyo Seo. "A V-Band Phase-Locked Loop with a Novel Phase-Frequency Detector in 65 nm CMOS." Electronics 9, no. 9 (September 13, 2020): 1502. http://dx.doi.org/10.3390/electronics9091502.

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A 65–67 GHz phase-locked loop (PLL) with a novel low power phase-frequency detector (PFD) in 65 nm LP CMOS is presented. The PLL consists of a V-band voltage-controlled oscillator (VCO), a divide-by-two injection-locked frequency divider (ILFD), and a current-mode logic (CML) divider chain. A charge pump (CP) and a 2nd-order loop filter are used with PFD for VCO tuning. The PFD is implemented with 16 transistors with dead-zone-free capability. The measured locking range of the PLL is from 65.15 to 67.4 GHz, with −11.5 dBm measured output power at 66.05 GHz while consuming 88 mW. The measured phase noise at 1 MHz offset is −84.43 dBc/Hz. The chip area of the PLL is 0.84 mm2 including probing pads. The proposed PLL can be utilized as a frequency synthesizer for carrier signal generation in IEEE 802.11ad standard high data rate transceiver circuits.
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Gunes, Adalet Meral, Frédéric Millot, Krzysztof Kalwak, Birgitte Lausen, Petr Sedlacek, Birgitte Versluijs, Michael Dworzak, Barbara De Moerloose, and Meinolf Suttorp. "Features and Outcome of Chronic Myeloid Leukemia (CML) at Very Young Age: Data from the International Pediatric CML Registry (I-CML-Ped Study)." Blood 132, Supplement 1 (November 29, 2018): 1748. http://dx.doi.org/10.1182/blood-2018-99-112905.

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Abstract Introduction: CML is rare in the first two decades of life comprising only 3% of pediatric and adolescent leukemias. The overall annual incidence is approximately 1 per million children and adolescents and it increases with age (median: 12 yrs, range: 1-18) resulting in an extreme rarity of children affected in the first years of life. Data regarding the clinicopathologic characteristics and response to therapy of childhood CML diagnosed at age <3 years has not been reported yet. Aims and objectives: We studied the epidemiologic and clinical features of patients(pts) with CML <3 years of age and evaluated treatment and long term outcome. Material and Methods: Data from pediatric CML pts (age at diagnosis 0-18 yrs) registered from 2010 until 2017 into the International Pediatric CML Registry (Poitiers, France) under the umbrella of the I-BFM Study Group were retrospectively analyzed. Characteristics and treatment outcome of pts <3 yrs at diagnosis were evaluated from standardized forms. Results: 22/479 pts (4.6%, ratio male/female: 14/8) were enrolled with a median age of 22 months (10-34) and a median weight and height were 9.3 kg (8.1-15.5) and 78 cm (73-98), respectively. The median time period from the first symptoms until final diagnosis was 21 days (2-182). Median spleen size was 12 cm (2-20) and median liver size was 3 cm (2-6) below the costal margins. Major complains and symptoms comprised asthenia (30%), fever (30%), abdominal pain (20%), extramedullary signs (14%), hemorrhage (5%), and weight loss (5%). Median WBC, Hb and platelet counts were 154 600/µl (23 000-892 000), 8.7 g/dl (5,6-11,5) and 311 000/µl (51 000-1 820 000), respectively. All pts underwent BM aspiration but, BM biopsy was performed only in 8/22 children. Philadelphia chromosome and BCR-ABL1 gene rearrangement were detected by cytogenetic and/or molecular techniques (FISH and RQ-PCR). In only 2 (9%) children, additional chromosomal abnormalities were detected by cytogenetics classifying one patient in accelerated phase. Overall 19/22 (86%) children were diagnosed in chronic phase and the remaining 3 pts were in advanced phase (CML-AP: n= 2, CML-BP: n= 1). Median follow-up of the cohort was 78 months (7-196). Treatment: 21/22 pts initially received imatinib at the recommended dose of 260-300 mg/sqm/day while one child received IFN + ARA-C. Imatinib was changed to either dasatinib (n= 5) or nilotinib (n= 1) in 6 children (29%). Thus, 15 pts continued on imatinib. During follow-up, 9/22 (41%) pts underwent HSCT including 2 pts after switching to dasatinib. Molecular response: Major molecular response (MR) was achieved in 10/21 (48%) children on TKI. One child (1/21) on TKI was not followed for MR, but he developed complete cytogenetic remission 4 mo after imatinib treatment. The remaining cohort (6/22; 27%) is alive on TKI without major MR with a median follow-up of 77 m (7-186) and 5/22 (23%) achieved complete MR following HSCT. Adverse effects (AE): 194 AE episodes were reported in 18/22 (82%) pts. Most frequently observed AEs were hematologic (20%), gastrointestinal (16%), infectious (14%), musculoskeletal (14%), skin (12%), metabolic (6%), and HSCT-related (GvHD, 5%). Less frequently AEs comprised psychological (3%), edema (3%), tooth development delay (2%), allergic (2%), neurologic (PRESS syndrome,1%), and renal colic (1%). At last follow up, assessment of puberty status revealed that the majority of children were in Tanner stage 1 or 2 (17/22, 77%). Among these, 7 were >10 years old and showed puberty delay, while pubertal development was normal in the remaining 5/22 pts. Data on growth and development was available in 15/22 (68%) children. The majority had experienced decline of height (93%) and weight (73%). In 4 (27%) and 2 (13%) pts, respectively, measurements were found below the 3rd-10th percentiles. Delta z-score analysis for height and weight revealed that the z-scores in total 3 pts were below -2. Survival: 21/22 (95%) children are alive while one patient died of GvHD. Two pts' last molecular status is unknown. 7/19 pts (37%) are in molecular CR following HSCT and the other 12/19 (63%) are still on TKI. Out of these, 3/12 pts achieved durable CMR with TKI (PCR negative) while the remaining 9/12 pts show either fluctuating (n= 3 ) or no major MR (n= 6). Conclusion: This report demonstrates for the first time the efficacy and long term side effects of upfront imatinib in the so far largest cohort of children with CML diagnosed at very young age. Disclosures Kalwak: Sanofi: Other: travel grants; medac: Other: travel grants.
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Millot, Frédéric, Meinolf Suttorp, Joelle Guilhot, Pietr Sedlacek, Evelina S. De Bont, Chi Kong Li, Krzysztof Kalwak, et al. "The International Registry for Chronic Myeloid Leukemia (CML) in Children and Adolescents (I-CML-Ped-Study): Objectives and Preliminary Results." Blood 120, no. 21 (November 16, 2012): 3741. http://dx.doi.org/10.1182/blood.v120.21.3741.3741.

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Abstract Abstract 3741 Background: CML is a very rare disease in children and adolescents accounting for less than 5% of all CML cases. Only scant data is available regarding epidemiology, presenting features and outcome of CML in this age range. Aims: An international registry (I-CML-Ped Study) was established to assess epidemiology, management and outcome of CML in the pediatric population. The main objectives of the study are the following: i) to describe the clinical and biological characteristics of CML in a large cohort of patients less than 18 years of age, ii) to identify prognostic factors in this age-group in order to optimize individual treatment choices iii) to determine side effects and long term effects of treatments, mainly the tyrosine kinase inhibitor effect, on growth and development of a pediatric cohort. Methods: All national pediatric study groups were invited to participate. All newly diagnosed children and adolescents less than 18 years diagnosed later than January 2000 has to be notified and collection of the follow- up data is planned. The study is strictly observational and informed consent from the patient and/or the legal guardians is required for enrollment. The study was started in January 2011. Results: As of July 2012, 200 patients (pts) from 9 countries have been registered. There was a male preponderance (59%). The median age at diagnosis was 11.6 years (range, 8 months −18 years); 8% of the patients were younger than 4 years. Clinical and biological data at initial diagnosis so far is available in 150 pts. At time of diagnosis 92% were in chronic phase, 6% in accelerated phase and 2% in blastic phase according to the European Leukemia Net criteria. The Sokal risk group distribution was: 13% low, 33% intermediate and 55% high risk. The majority of the patients showed a Lansky score of 100 (67%) or 90 (16%). Splenomegaly was present in 76% of patients. The median of the spleen size below the costal margin was 8 cm (range: 0 to 25 cm). The median of the leukocyte count was 250×109/L (range: 5 to 1037). Additional chromosomal abnormalities in Ph-positive cells were observed in 2.3 % of the patients. The BCR-ABL transcript type was available in 100 patients: b3a2 51%, b2a2 40%, b3a2 plus b2a2 7% and b2a3 2%. The median follow-up time is 28 months (range, 2–138). Five deaths were recorded. The estimated overall survival rate at 42 months is 97% (CI 95%, 91–99). Forty seven (63%) of 75 assessable patients for cytogenetic response achieved complete cytogenetic response 12 months after the start of the treatment (imatinib: 43 pts, switch to dasatinib after imatinib failure: 3 pts, interferon + cytosine arabinoside: 1pt). Data collection regarding molecular assessment is ongoing and will be presented. Conclusion: This is the largest study reporting on children and adolescents with CML. The data indicates that children and adolescents with CML presented with clinical and biological differences compared to adult patients with CML. Whether these differences translate into a different outcome still remains to be determined. Acknowledgment: The I-CML Ped study is supported by an unrestricted grant from Novartis Pharmaceutical Company Disclosures: No relevant conflicts of interest to declare.
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Park, Boumyoung, Hyunseop Lee, Kihyun Park, Heondeok Seo, Haedo Jeong, Hoyoun Kim, and Hyoungjae Kim. "Fixed Abrasive Pad with Self-conditioning in CMP Process." Journal of the Korean Institute of Electrical and Electronic Material Engineers 18, no. 4 (April 1, 2005): 321–26. http://dx.doi.org/10.4313/jkem.2005.18.4.321.

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Millot, Frédéric, Joelle Guilhot, Meinolf Suttorp, Petr Sedlacek, Eveline S. J. M. de Bont, Chi Kong Li, Krzysztof Kalwak, et al. "The Experience of the International Registry for Chronic Myeloid Leukemia (CML) in Children and Adolescents (I-CML-Ped Study): Pronostic Consideration." Blood 124, no. 21 (December 6, 2014): 521. http://dx.doi.org/10.1182/blood.v124.21.521.521.

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Abstract Aims: An international registry (I-CML-Ped Study)was established to assess epidemiology, management and outcome of CML in the pediatric population. Methods: All national pediatric study groups were invited to include newly diagnosed children and adolescents less than 18 years with CML diagnosed later than January 2000. Results: Since January 2011, 351 patients from 12 countries have been registered. Clinical and biological data at initial diagnosis are available in 278 patients.There was a male preponderance (57%). The median age at diagnosis was 12.4 years (range, 9 months -17.5 years); 6% of the patients were younger than 4 years. At time of diagnosis 92% of the children were in chronic phase, 8% in accelerated phase and 1% in blastic phase according to the European Leukemia Net criteria. The Sokal risk group distribution was: 18% low, 31% intermediate and 51% high risk. The majority of the patients showed a Lansky score of 100 (59%) or 90 (21%). Splenomegaly was present in 76% of patients. The median of the spleen size below the costal margin was 11 cm (range: 1 to 25 cm). The median of the leukocyte count was 235x109/L (range: 5 to 1038). Additional chromosomal abnormalities in Ph-positive cells were observed in 6 % of the patients. The BCR-ABL transcript type was available in 227 patients: b3a2 54%, b2a2 38%, b3a2-b2a2 6% and b2a3 2%. The median follow-up time is 39 months (range, 0.5-161). Eight deaths were recorded. The estimated overall survival rate at 60 months is 95% (95%CI 89-97). Irrespective of treatment and follow-up, 124 (73%) of 169 assessable patients for cytogenetic response achieved complete cytogenetic response (CCyR). Exploratory analyses were performed in newly diagnosed patients regarding clinical and biological factors influencing the achievement of CCyR 12 months after starting imatinib. In univariate analyses, the Eutos score, the spleen size, the hematocrit level, the lymphocyte count and immature cells in peripheral blood, the percentage of granulocytes and monocytes in the marrow were identified as potential prognostic factors. However, only the percentage of the granulocytes in the marrow was identified as independent factor of achievement of CCyR at 12 months in multivariate analysis. Data collection and quality control regarding molecular assessment are ongoing. Conclusion: The data indicates that children and adolescents with CML presented with clinical and biological differences compared to adult patients with CML. Identification of prognostic factors is needed to optimize the strategy in the pediatric population. Acknowledgment: The I-CML Ped study is supported by an unrestricted grant from Novartis Pharmaceutical Company Disclosures No relevant conflicts of interest to declare.
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Pak, Byeongjun, Dasol Lee, Seonho Jeong, Hyunjin Kim, and Haedo Jeong. "Finite Element Analysis on Dynamic Viscoelasticity of CMP Polishing Pad." Journal of the Korean Society for Precision Engineering 36, no. 2 (February 1, 2019): 177–81. http://dx.doi.org/10.7736/kspe.2019.36.2.177.

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Park, Ki-Hyun, Hyoung-Jae Kim, Jae-young Choi, Heon-deok Seo, and Hae-do Jeong. "The Effects of Groove Dimensions of Pad on CMP Characteristics." Transactions of the Korean Society of Mechanical Engineers A 29, no. 3 (March 1, 2005): 432–38. http://dx.doi.org/10.3795/ksme-a.2005.29.3.432.

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Choi, Gwon-Woo, Nam-Hoon Kim, Yong-Jin Seo, and Woo-Sun Lee. "CMP Properties of Oxide Film with Various Pad Conditioning Temperatures." Journal of the Korean Institute of Electrical and Electronic Material Engineers 18, no. 4 (April 1, 2005): 297–302. http://dx.doi.org/10.4313/jkem.2005.18.4.297.

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EGAMI, Kazutaka, Syuhei KUROKAWA, Toshiro DOI, Osamu OHMSHI, Midhio UNEDA, and Kazunori KADOMURA. "907 Condition of Grain on CMP Conditioner and Pad Surface Analysis." Proceedings of Conference of Kyushu Branch 2012.65 (2012): 319–20. http://dx.doi.org/10.1299/jsmekyushu.2012.65.319.

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de Cortazar, Victor Garcia, and Gabino Reginato. "Yield, PFD Interception, and Crop Load Relationships in `Royal Gala' Apples." HortScience 41, no. 4 (July 2006): 1010A—1010. http://dx.doi.org/10.21273/hortsci.41.4.1010a.

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Three different parameters were tested to estimate yield in `Royal Gala' apples. These are: a) parameters related to crop load—fruits per tree, fruits per cm2 of branch cross-sectional area, and fruits per hectare; b) parameters related with PFD interception: average fraction of PFD intercepted, total PFD intercepted during the season; and c) combination of the parameters a) and b). The data set was composed of measurements of PFD interception once a month and of yield components on various commercial apple orchards of the variety `Royal Gala' in the central zone of Chile between 2003 and 2006. The orchards were managed for high production, but there were differences of plantation distance, age, and size between them. Also, inside the orchard there were differences between trees. For the trees studied, there were variations of a factor of 10 for crop load, branch cross-sectional area, and tree size estimated as fractional interception of PFD at the beginning of the season. In spite of the big differences between trees, simple equations were fitted between yield and load parameters with coefficients of determination >0.95. Research funded by FONDECYT-Chile grant 1930695.
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Dissertations / Theses on the topic "Cml pfd"

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SUN, TING. "Pad-Wafer and Brush-Wafer Contact Characterization in Planarization and Post-Planarization Processes." Diss., The University of Arizona, 2009. http://hdl.handle.net/10150/194898.

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This dissertation presents a series of studies relating to pad-wafer and brush-wafer contact characterization in planarization and post-planarization processes. These are also evaluated with the purposes of minimizing environmental impact and reducting cost of ownership.Firstly, a new method using spectral analysis based on real-time raw friction data is developed to quantify the total amount of mechanical interaction in the brush-fluid-wafer interface in terms of stick-slip phenomena in post-planarization scrubbing. This new method is remarkable from the standpoint of its potential to eliminate having to perform a multitude of experiments needed for constructing and interpreting Stribeck curves, and its application to processes where Stribeck curves fail to yield any useful data. Moreover, this method is applied to investigate the effect of brush roller design on scrubbing process and to analyze behaviors of eccentric brushes.In order to study pad-wafer contact in planarization processes, a mechanical characterization method (incremental loading test) is developed and applied to analyze different types of pads and pad surfaces subjected to various treatments. Along with optical interferometry and theoretical analysis, flow resistance due to pad land area topography can be estimated.The greatest contribution of this dissertation involves development of real pad-wafer contact area measurement technique using confocal microscopy. The real pad-wafer contact area is a difficult property to measure in planarization, yet it is a key feature to further understand the process. A custom-made sample holder with a sapphire window and a miniature load cell is used to collect confocal images at controlled values of down force.At last, the two newly developed techniques (incremental loading test and real pad-wafer contact area measurement using confocal microscopy) together with dual emission UV enhanced fluorescence imaging are utilized to investigate conditioning effects in planarization process.
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Mu, Yan, and Yan Mu. "Slurry Mean Residence Time Analysis and Pad-Wafer Contact Characterization in Chemical Mechanical Planarization." Diss., The University of Arizona, 2016. http://hdl.handle.net/10150/621459.

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This dissertation presents a series of studies related to the slurry mean residence time analysis and the pad-wafer contact characterization in Chemical Mechanical Planarization (CMP). The purpose of these studies is to further understand the fundamentals of CMP and to explore solutions to some of CMP's challenges. Mean residence time (MRT) is a widely used term that is mostly seen in classical chemical engineering reactor analysis. In a CMP process, the wafer-pad interface can be treated as a closed system reactor, and classical reactor theory can be applied to the slurry flow through the region. Slurry MRT represents the average time it takes for fresh incoming slurry to replace the existing slurry in the region bound between the pad and the wafer. Understanding the parameters that have an impact on MRT, and therefore removal rate, is critical to maintain tight specifications in the CMP process. In this dissertation, we proposed a novel slurry injection system (SIS) which efficiently introduced fresh slurry into the pad-wafer interface to reduce MRT. Results indicated that SIS exhibited lower slurry MRT and dispersion numbers but higher removal rates than the standard pad center slurry application by blocking the spent slurry and residual rinse water from re-entering the pad-wafer interface during polishing. Another study in this dissertation dealt with the effect of pad groove width on slurry MRT in the pad-wafer interface as well as slurry utilization efficiency (η). Three concentrically grooved pads with different groove widths were tested at different polishing pressures to experimentally determine the corresponding MRT using the residence time distribution (RTD) technique. Results showed that MRT and η increased significantly when the groove width increased from 300 to 600μm. On the other hand, when the groove width increased further to 900μm, MRT continued to increase while n remained constant. Results also indicated that MRT was reduced at a higher polishing pressure while η did not change significantly with pressure for all three pads. In the last study of this dissertation, the effect of pad surface micro-texture on removal rate during tungsten CMP was investigated. Two different conditioner discs ("Disc A" and "Disc B") were employed to generate different pad surface micro-textures during polishing. Results showed that "Disc B" generated consistently lower removal rates and coefficients of friction than "Disc A". To fundamentally elucidate the cause(s) of such differences, pad surface contact area and topography were analyzed using laser confocal microscopy. The comparison of the pad surface micro-texture analysis on pad surfaces conditioned by both discs indicated that "Disc A" generated a surface having a smaller abruptness (λ) and more solid contact area which resulted in a higher removal rate. In contrast, "Disc B" generated many large near-contact areas as a result of fractured and collapsed pore walls.
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Mohamed, Mohamed Ali. "Les facteurs explicatifs du rendement scolaire dans l'enseignement primaire aux îles Comores, la contribution des enseignants des classes de CM1 et de CM2." Thesis, National Library of Canada = Bibliothèque nationale du Canada, 2000. http://www.collectionscanada.ca/obj/s4/f2/dsk1/tape3/PQDD_0021/NQ55822.pdf.

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Guay, Daniel. "Étude thermodynamique des systèmes monomoléculaires mixtes CHL a/a-TQ, CHL a/PQ 2, CHL a/PQ 3 et CHL a/PQ 9 à l'interface air-eau." Thèse, Université du Québec à Trois-Rivières, 1986. http://depot-e.uqtr.ca/6047/1/000556260.pdf.

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Kusznir, James. "CLM as a smart home middleware." Pullman, Wash. : Washington State University, 2010. http://www.dissertations.wsu.edu/Thesis/Spring2010/j_kusznir_042110.pdf.

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Thesis (M.S. in computer science)--Washington State University, May 2010.
Title from PDF title page (viewed on July 9, 2010). "School of Electrical Engineering and Computer Science." Includes bibliographical references (p. 46-48).
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Broutin, Clémentine. "Electron Measurements and Search for Higgs Bosons in Multi-Lepton Channels with the CMS Experiment at LHC." Palaiseau, Ecole polytechnique, 2011. http://pastel.archives-ouvertes.fr/docs/00/61/75/14/PDF/these_cbroutin2.pdf.

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Cette thèse présente le travail de trois ans effectué dans l'expérience CMS, dans le contexte des premières collisions du LHC. L'étude porte en particulier sur les électrons, objets essentiels pour les analyses de recherche en canaux multi-leptons, notamment l'analyse H → ZZ(∗) → 4ℓ. Durant les premiers mois de collisions, nous avons pris part à la validation des données enregistrées par le calorimètre électromagnétique. Nous avons mesuré l'efficacité du système de déclenchement de niveau 1 en électrons et photons tout au long de l'année 2010. L'efficacité sur le plateau est de 99. 6 % (resp. 98. 5 %) pour des électrons dans le tonneau (resp. Dans les bouchons) du calorimètre. En vue d'optimiser le potentiel de découverte, nous avons mis au point un nouvel algorithme de mesure de la charge des électrons. Dans CMS, celle-ci est affectée par la grande quantité de matière présente dans le trajectographe. Les performances de cet algorithme ont été mesurées sur les données enregistrées en 2010, sur des électrons issus de désintégrations de bosons Z, passant une sélection standard. La probabilité d'erreur est de 1. 06 % (0. 19 % après une sélection spécifique), en accord avec la simulation. L'analyse de physique effectuée dans cette thèse porte sur la recherche de bosons de Higgs doublement chargés, dans leurs désintégrations en paires de leptons. Avec les données enregistrées en 2010, un événement de bruit de fond est attendu à la fin de la sélection, pour un nombre d'événements de signal qui dépend de l'hypothèse de masse et du modèle considéré. Un événement est observé dans les données, en accord avec le bruit de fond attendu, ce qui permet d'exclure ce signal sur des domaines de masse plus larges que précédemment : la limite varie de 122 GeV à 176 GeV en fonction du modèle
This thesis presents three years of work with the CMS experiment, in the context of the first LHC collisions. Electron objects were studied in particular, as major tools for multi-lepton analyses, in particular the H → ZZ(∗) → 4ℓ analysis. During the first months of collisions, we took part in the validation of data registered by the electromagnetic calorimeter. We also measured the efficiency of the level-1 electron and photon trigger during the whole 2010 year. The plateau efficiency is of 99. 6 % (resp. 98. 5 %) on electrons in the barrel part (resp. In the endcap part) of the calorimeter. In order to optimize the discovery potential, we built a new electron charge measurement algorithm. In CMS, this measurement is affected by the large amount of material present in the inner tracker. The performance of this algorithm was measured on 2010 data, for electrons from Z boson decay passing a standard selection. The probability of charge mis-identification is of 1. 06 % (0. 19 % with a specific selection), in agreement with the simulation. The physics analysis that was built during this PhD searches doubly charged Higgs bosons decaying into lepton pairs. For the amount of data registered in 2010, one background event is expected to pass the selection, while the amount of signal events depends on the mass hypothesis and on the model. One event was found on data, in agreement with the background expectation, hence the signal was excluded on larger mass ranges than previous experiments: a mass limit was set between 122 GeV and 176 GeV, depending on the model
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Cook, Kathryn. "Learner control and user-interface interactions in CMC courses." Thesis, National Library of Canada = Bibliothèque nationale du Canada, 2001. http://www.collectionscanada.ca/obj/s4/f2/dsk3/ftp04/NQ63620.pdf.

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Sun, Yan. "Business-oriented Software Process Improvement based on CMM and CMMI using QFD." Diss., Rolla, Mo. : University of Missouri-Rolla [sic] [Missouri University of Science and Technology], 2008. http://scholarsmine.mst.edu/thesis/pdf/Sun_09007dcc8047a90b.pdf.

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Thesis (Ph. D.)--Missouri University of Science and Technology, 2008.
Degree granted by Missouri University of Science and Technology, formerly known as the University of Missouri-Rolla. Vita. The entire thesis text is included in file. Title from title screen of thesis/dissertation PDF file (viewed April 29, 2008) Includes bibliographical references (p. 108-111).
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Jean, David. "CDL+CWS, un langage de prototype et son environnement." Thesis, National Library of Canada = Bibliothèque nationale du Canada, 1997. http://www.collectionscanada.ca/obj/s4/f2/dsk1/tape11/PQDD_0002/MQ40593.pdf.

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Segui, Jacob A. "Propriétés photovoltaïques des cellules en sandwich ITO/CdS/Chl ® /Ag." Thèse, Université du Québec à Trois-Rivières, 1992. http://depot-e.uqtr.ca/5365/1/000597808.pdf.

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Books on the topic "Cml pfd"

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Athey. Cncl: Cmp&inf Sys Bs,2+pfs. Not Avail, 1998.

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Firth, Helen V., Jane A. Hurst, and Judith G. Hall. Pregnancy and fertility. Oxford University Press, 2011. http://dx.doi.org/10.1093/med/9780192628961.003.0203.

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Anterior abdominal wall defects 566Assisted reproductive technology: in vitro fertilization (IVF), intracytoplasmic sperm injection (ICSI), and pre-implantation genetic diagnosis (PGD) 568Bowed limbs 572Club-foot (talipes) 574Congenital cystic lung lesions, Currarino syndrome, and sacrococcygeal teratoma 576Congenital diaphragmatic hernia 578Cytomegalovirus (CMV) 580...
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Schwingungen von Windenergieanlagen 2019. VDI Verlag, 2019. http://dx.doi.org/10.51202/9783181023464.

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Dieser VDI-Bericht ist ausschließlich als PDF-Datei erschienen! Sie möchten gerne erfahren, welche Themen auf der 10. VDI-Fachtagung in Bremen präsentiert wurden? Inhalt Eröffnung Erkenntnisse aus digitalisierten Daten von über 3000 Windenergieanlagen im Betrieb 1 B. Hahn, S. Faulstich, Fraunhofer IEE, Kassel BIG DATA Auswertungen und Analysen von Betriebsdaten I Big Data – Smart Data, analytische Datenauswertung von Betriebsdaten 17 W. Holweger, Schaeffler Technologies AG & Co. KG, Herzogenaurach; F. Harzendorf, B. Azzam, CWD RWTH Aachen University, Aachen; J. Fliege, Universität Southampton, Southampton, UK Felderfahrung von Anlagen und Windparks I MSA (Messsystemanalyse) eines back-to-back Getriebeprüfstands 29 T. Jacob (M.Sc.) (VDI), Flender GmbH, Voerde; M. Blomeyer, Flender GmbH, Bocholt Felderfahrung und Ergebnisse aus großen Windparks: Von der Zuverlässigkeits- und CMS-Analyse zur Prognosefähigkeit 41 S. Mtauweg, V. Meimann, MML Solutions GmbH; H. Fritsch, U.
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Strayer, Robert W. Ways of the World : A Brief Global History with Sources, 2e CMB & Launch Pad HistoryClass for Ways of the World: A Brief Global History with Sources, 2e CMB. Bedford/St. Martin's, 2013.

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Book chapters on the topic "Cml pfd"

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Liao, Yunn Shiuan, M. Y. Tsai, James C. Sung, and Y. L. Pai. "Single Diamond Dressing Characteristics of CMP Polyurethane Pad." In Advances in Abrasive Technology IX, 151–56. Stafa: Trans Tech Publications Ltd., 2007. http://dx.doi.org/10.4028/0-87849-416-2.151.

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Tso, Pei Lum, and Y. L. Pai. "Amorphous Diamond Dresser for CMP Fixed Abrasives Pad." In Advances in Abrasive Technology IX, 157–62. Stafa: Trans Tech Publications Ltd., 2007. http://dx.doi.org/10.4028/0-87849-416-2.157.

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Zhou, Zhao Zhong, Ju Long Yuan, Bing Hai Lv, and Jia Jin Zheng. "Study on Pad Conditioning Parameters in Silicon Wafer CMP Process." In Advances in Grinding and Abrasive Technology XIV, 309–13. Stafa: Trans Tech Publications Ltd., 2007. http://dx.doi.org/10.4028/0-87849-459-6.309.

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Sung, James C., and Ming Chi Kan. "The In-Situ Dressing of CMP Pad Conditioners with Novel Coating Protection." In Progress in Powder Metallurgy, 1133–36. Stafa: Trans Tech Publications Ltd., 2007. http://dx.doi.org/10.4028/0-87849-419-7.1133.

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Luo, Jianfeng, and David A. Dornfeld. "Material Removal Mechanism in CMP: A Comprehensive Model of Abrasive Particle, Pad Asperity and Wafer Interactions." In Integrated Modeling of Chemical Mechanical Planarization for Sub-Micron IC Fabrication, 53–95. Berlin, Heidelberg: Springer Berlin Heidelberg, 2004. http://dx.doi.org/10.1007/978-3-662-07928-7_3.

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Luo, Jianfeng, and David A. Dornfeld. "Material Removal Regions in CMP: Coupling Effects of Slurry Chemicals, Abrasive Particle Size Distribution and Wafer-Pad Contact Area." In Integrated Modeling of Chemical Mechanical Planarization for Sub-Micron IC Fabrication, 115–45. Berlin, Heidelberg: Springer Berlin Heidelberg, 2004. http://dx.doi.org/10.1007/978-3-662-07928-7_5.

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Cook, Lee M. "Chapter 6 CMP Consumables II: Pad." In Semiconductors and Semimetals, 155–81. Elsevier, 1999. http://dx.doi.org/10.1016/s0080-8784(08)62570-3.

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Seo, Jihoon. "Chemical Mechanical Planarization-Related to Contaminants: Their Sources and Characteristics." In Emerging Contaminants [Working Title]. IntechOpen, 2020. http://dx.doi.org/10.5772/intechopen.94292.

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Chemical mechanical planarization (CMP) process has been widely used to planarize a variety of materials including dielectrics, metal, and semiconductors in Si-based semiconductor devices. It is one of the most critical steps to achieve the nanolevel wafer and die scale planarity. However, various contaminants are observed on the wafer surfaces after the CMP process, and they become the most critical yield detractor over many generations of rapidly diminishing feature sizes because they have the most direct impacts on device performance and reliability. This book chapter provides (1) CMP consumables-induced contaminants such as residual particles, surface residues, organic residues, pad debris and metallic impurities, pad contamination, watermark, etc., (2) brush-induced cross-contamination during post CMP cleaning, (3) post-CMP cleaning for removing these contaminants. Fundamental understanding of the formation of various types of CMP contaminants and their characteristics will significantly benefit the development of next-generation CMP slurries and post-CMP cleaning solutions.
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Li, Z. C., E. A. Baisie, X. H. Zhang, and Q. Zhang. "Diamond disc pad conditioning in chemical mechanical polishing." In Advances in Chemical Mechanical Planarization (CMP), 327–57. Elsevier, 2016. http://dx.doi.org/10.1016/b978-0-08-100165-3.00013-9.

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Li, Z. C., E. A. Baisie, X. H. Zhang, and Q. Zhang. "Diamond disc pad conditioning in chemical mechanical polishing." In Advances in Chemical Mechanical Planarization (CMP), 383–412. Elsevier, 2022. http://dx.doi.org/10.1016/b978-0-12-821791-7.00014-9.

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Conference papers on the topic "Cml pfd"

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Lim, Donghyun, Hojoong Kim, Bongyoung Jang, Honglae Cho, Junyong Kim, and Hasub Hwang. "A novel pad conditioner and pad roughness effects on tungsten CMP." In 2014 International Conference on Planarization/CMP Technology (ICPT). IEEE, 2014. http://dx.doi.org/10.1109/icpt.2014.7017318.

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Tano, Hiroyuki, Katsutaka Yokoi, Hideki Nishimura, Ayako Maekawa, Takami Hirao, and Satoshi Kamo. "Advanced Cu CMP pad for reducing scratches." In 2014 International Conference on Planarization/CMP Technology (ICPT). IEEE, 2014. http://dx.doi.org/10.1109/icpt.2014.7017274.

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Liu, Yi-Liang, Wu-Sian Sie, Chun-Lin Chen, P. C. Huang, Yu-Ting Li, Renn Guey Lin, Yu Min Lin, et al. "Defect reduction with CMP pad dressing optimization." In 2014 International Conference on Planarization/CMP Technology (ICPT). IEEE, 2014. http://dx.doi.org/10.1109/icpt.2014.7017312.

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Ng, Dedy, Milind Kulkarni, and Hong Liang. "Roles of Surfactant Molecules in Post-CMP Cleaning." In World Tribology Congress III. ASMEDC, 2005. http://dx.doi.org/10.1115/wtc2005-64358.

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One major concern in post-CMP cleaning is particles contamination on the substrate surface after the CMP process. These particles can be abrasive particles from the slurry, debris from pad material, and particles of film being polished. The cleaning method used in this study is direct contact of the substrate surface and brush sweeping. To enhance the cleaning process, an anionic surfactant is added in the cleaning solution. In order to understand effects of surfactant molecules on post-CMP cleaning, for the first time, we use a tribological approach over a range of surfactant concentration and temperature. In this regard, we observe how the surfactant behavior before and after it reaches the critical micelles concentration (cmc). Experimental results show that increase in surfactant concentration can promote bilayer interaction of micelles on the hydrophilic particles. Based on our study, we propose an interactive explanation of surface molecules with the wafer surface and nanoparticles through friction. This understanding will serve as a guide on how much surfactant should be added in order to achieve effective particle removal.
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Baisie, Emmanuel A., Z. C. Li, and X. H. Zhang. "Finite Element Modeling of Pad Deformation due to Diamond Disc Conditioning in Chemical Mechanical Polishing (CMP)." In ASME 2012 International Manufacturing Science and Engineering Conference collocated with the 40th North American Manufacturing Research Conference and in participation with the International Conference on Tribology Materials and Processing. American Society of Mechanical Engineers, 2012. http://dx.doi.org/10.1115/msec2012-7364.

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Chemical mechanical planarization (CMP) is widely used to planarize and smooth the surface of semiconductor wafers. In CMP, diamond disc conditioning is traditionally employed to restore pad planarity and surface asperity. Pad deformation which occurs during conditioning affects the material removal mechanism of CMP since pad shape, stress and strain are related to cut rate during conditioning, pad wear rate and wafer material removal rate (MRR) during polishing. Available reports concerning the effect of diamond disc conditioning on pad deformation are based on simplified models of the pad and do not consider its microstructure. In this study, a two-dimensional (2-D) finite element analysis (FEA) model is proposed to analyze the interaction between the diamond disc conditioner and the polishing pad. To enhance modeling fidelity, image processing is utilized to characterize the morphological and mechanical properties of the pad. An FEA model of the characterized pad is developed and utilized to study the effects of process parameters (conditioning pressure and pad stiffness) on pad deformation. The study reveals that understanding the morphological and mechanical properties of CMP pads is important to the design of high performance pads.
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Shin, Cheolmin, Sunjae Jang, Hongyi Qin, Jichul Yang, and Taesung Kim. "Characteristic of pad cut rate as conditioner structure." In 2014 International Conference on Planarization/CMP Technology (ICPT). IEEE, 2014. http://dx.doi.org/10.1109/icpt.2014.7017308.

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Teodosescu, Petre-Dorel, Mircea Bojan, Denes Fodor, and Richard Marschalko. "Research concerning appropriate PFC methods for classic CFL lighting devices." In 2012 EPE-ECCE Europe Congress. IEEE, 2012. http://dx.doi.org/10.1109/epepemc.2012.6397251.

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Baisie, Emmanuel A., Z. C. Li, and X. H. Zhang. "Diamond Disc Pad Conditioning in Chemical Mechanical Polishing: A Literature Review of Process Modeling." In ASME 2009 International Manufacturing Science and Engineering Conference. ASMEDC, 2009. http://dx.doi.org/10.1115/msec2009-84033.

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Chemical Mechanical Polishing (CMP) is a major manufacturing step extensively used to planarize semiconductor wafers. In CMP, the polishing pad surface is glazed by residues. A diamond disc conditioner is used to dress the pad to regenerate new pad profile and asperity in order to maintain favorable process conditions. This paper presents a review on process modeling of diamond disc pad conditioning in CMP. Following the introduction, the paper briefly introduces a technical background of the conditioning process and process control. It then summarizes research work on the various analytical process models proposed and ends with conclusions and topics for future research.
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Fukuda, Akira, and Masahito Mitarai. "Visualization of slurry flow in polishing pad asperity area." In 2014 International Conference on Planarization/CMP Technology (ICPT). IEEE, 2014. http://dx.doi.org/10.1109/icpt.2014.7017288.

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Li, Z. C., Emmanuel A. Baisie, and X. H. Zhang. "Diamond Disc Pad Conditioning in Chemical Mechanical Planarization (CMP): A Mathematical Model to Predict Pad Surface Shape." In ASME 2011 International Manufacturing Science and Engineering Conference. ASMEDC, 2011. http://dx.doi.org/10.1115/msec2011-50149.

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Chemical mechanical planarization (CMP) is widely used to planarize semiconductor wafers and smooth the wafer surface. In CMP, a diamond disc conditioner is used to condition (or dress) a polishing pad to restore the pad performance. In this paper, a surface element method is proposed to develop a mathematic model to predict the pad surface shape resulted from diamond disc conditioning. The developed model is then validated by published experimental data. Results show that the model is effective to simulate the diamond disc conditioning process and predict the pad surface shape.
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Reports on the topic "Cml pfd"

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Chapman, Ray, Phu Luong, Sung-Chan Kim, and Earl Hayter. Development of three-dimensional wetting and drying algorithm for the Geophysical Scale Transport Multi-Block Hydrodynamic Sediment and Water Quality Transport Modeling System (GSMB). Engineer Research and Development Center (U.S.), July 2021. http://dx.doi.org/10.21079/11681/41085.

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The Environmental Laboratory (EL) and the Coastal and Hydraulics Laboratory (CHL) have jointly completed a number of large-scale hydrodynamic, sediment and water quality transport studies. EL and CHL have successfully executed these studies utilizing the Geophysical Scale Transport Modeling System (GSMB). The model framework of GSMB is composed of multiple process models as shown in Figure 1. Figure 1 shows that the United States Army Corps of Engineers (USACE) accepted wave, hydrodynamic, sediment and water quality transport models are directly and indirectly linked within the GSMB framework. The components of GSMB are the two-dimensional (2D) deep-water wave action model (WAM) (Komen et al. 1994, Jensen et al. 2012), data from meteorological model (MET) (e.g., Saha et al. 2010 - http://journals.ametsoc.org/doi/pdf/10.1175/2010BAMS3001.1), shallow water wave models (STWAVE) (Smith et al. 1999), Coastal Modeling System wave (CMS-WAVE) (Lin et al. 2008), the large-scale, unstructured two-dimensional Advanced Circulation (2D ADCIRC) hydrodynamic model (http://www.adcirc.org), and the regional scale models, Curvilinear Hydrodynamics in three dimensions-Multi-Block (CH3D-MB) (Luong and Chapman 2009), which is the multi-block (MB) version of Curvilinear Hydrodynamics in three-dimensions-Waterways Experiments Station (CH3D-WES) (Chapman et al. 1996, Chapman et al. 2009), MB CH3D-SEDZLJ sediment transport model (Hayter et al. 2012), and CE-QUAL Management - ICM water quality model (Bunch et al. 2003, Cerco and Cole 1994). Task 1 of the DOER project, “Modeling Transport in Wetting/Drying and Vegetated Regions,” is to implement and test three-dimensional (3D) wetting and drying (W/D) within GSMB. This technical note describes the methods and results of Task 1. The original W/D routines were restricted to a single vertical layer or depth-averaged simulations. In order to retain the required 3D or multi-layer capability of MB-CH3D, a multi-block version with variable block layers was developed (Chapman and Luong 2009). This approach requires a combination of grid decomposition, MB, and Message Passing Interface (MPI) communication (Snir et al. 1998). The MB single layer W/D has demonstrated itself as an effective tool in hyper-tide environments, such as Cook Inlet, Alaska (Hayter et al. 2012). The code modifications, implementation, and testing of a fully 3D W/D are described in the following sections of this technical note.
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