Relevant bibliographies by topics / Copper Ruthenium Oxides

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Academic literature on the topic 'Copper Ruthenium Oxides'

Author: Grafiati
Published: 4 June 2021
Last updated: 7 February 2022

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Journal articles on the topic "Copper Ruthenium Oxides"

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Homsi, Doris, Samer Aouad, Cedric Gennequin, Antoine Aboukaïs, and Edmond Abi-Aad. "Hydrogen Production by Methane Steam Reforming Over Ru and Cu Supported on Hydrotalcite Precursors." Advanced Materials Research 324 (August 2011): 453–56. http://dx.doi.org/10.4028/www.scientific.net/amr.324.453.

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Co6Al2oxide was prepared using the hydrotalcite route. The obtained solid was thermally stabilized at 500°C and then impregnated with 5 wt.% copper or 1 wt.% ruthenium nitrate solution followed by calcination at 500°C under an air flow. X-ray diffraction results showed that the calcination of the impregnated solids led to the formation of various oxides (CuO, RuO2, Co3O4, CoAl2O4, CoAl2O4). The different impregnated and non impregnated solids were tested in the methane steam reforming reaction (MSR). Methane conversion did not exceed 5% at 800°C in the case of the non impregnated solid, wherea
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Mclaughlin, A. C., F. Sher, and J. P. Attfield. "Negative lattice expansion from the superconductivity–antiferromagnetism crossover in ruthenium copper oxides." Nature 436, no. 7052 (2005): 829–32. http://dx.doi.org/10.1038/nature03828.

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Mclaughlin, A. C., F. Sher, and J. P. Attfield. "Correction: Negative lattice expansion from the superconductivity–antiferromagnetism crossover in ruthenium copper oxides." Nature 437, no. 7061 (2005): 1057. http://dx.doi.org/10.1038/nature04182.

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Long, Wenjing, Qingge Zhai, Jieli He, Qinghong Zhang, Weiping Deng, and Ye Wang. "Significant Synergistic Effect between Supported Ruthenium and Copper Oxides for Propylene Epoxidation by Oxygen." ChemPlusChem 77, no. 1 (2012): 27–30. http://dx.doi.org/10.1002/cplu.201100050.

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Wu, Chunwei, Brian P. Mosher, and Taofang Zeng. "Chemically-Mechanically Assisted Synthesis of Metallic and Oxide Nanoparticles in Ambient Conditions." Journal of Nanoscience and Nanotechnology 8, no. 1 (2008): 386–89. http://dx.doi.org/10.1166/jnn.2008.18144.

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Based on the redox principle of galvanic displacement reaction, active metal foils, including magnesium (Mg), aluminum (Al) and cobalt (Co), were creatively introduced as new heterogeneous reducing media and were successfully employed in the presence of sonomechanical assistance to produce metallic nanoparticles such as silver, copper, tin and metal oxides such as those of iron, cobalt and ruthenium. Various combinations were investigated to determine the optimum ion/foil pairings for dense and monodisperse colloids. A wide range of nanoscale metallic species can be achieved by this method giv
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Attfield, M. P., P. D. Battle, S. K. Bollen, S. H. Kim, A. V. Powell, and M. Workman. "Structural and electrical studies of mixed copper/ruthenium oxides and related compounds of zinc and antimony." Journal of Solid State Chemistry 96, no. 2 (1992): 344–59. http://dx.doi.org/10.1016/s0022-4596(05)80268-3.

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Kuz’min, E. V., S. G. Ovchinnikov, and I. O. Baklanov. "Superconductivity of strongly correlated electrons in copper and ruthenium oxides within the t-J-I model." Journal of Experimental and Theoretical Physics 89, no. 2 (1999): 349–57. http://dx.doi.org/10.1134/1.558991.

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Gai, Pratibha L. "In-situ Electron Microscopy in catalysis research." Proceedings, annual meeting, Electron Microscopy Society of America 48, no. 4 (1990): 228–29. http://dx.doi.org/10.1017/s0424820100174278.

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The dynamic nature of surfaces and interfaces in catalytic oxides, and in metal particle catalysts on oxide supports, is of fundamental importance in heterogeneous catalysis. In-situ electron microscopy with a controlled environment has been used, together with other EM-based techniques, to obtain a better understanding of disorder under reaction conditions in these non-stoichiometric materials. It is important to recognize that the structure of the solid surface under reaction conditions may differ from that occurring under static conditions or in different atmospheres, including the usual EM
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Song, In Gu, Christopher Timmons, Galit Levitin, and Dennis W. Hess. "Photoresist Removal Using Alternative Chemistries and Pressures." Solid State Phenomena 145-146 (January 2009): 303–10. http://dx.doi.org/10.4028/www.scientific.net/ssp.145-146.303.

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Approximately 20% of the processing steps in integrated circuit (IC) fabrication involve surface cleaning and removal of photoresist and plasma etch residues. Continuous device minimization requires the use of thin films (<20 nm), closely spaced features, and ultra shallow junctions (<50nm); as a result, the challenges associated with effective surface cleaning are intensified. In addition, to insure high device performance, incorporation of alternate materials such as copper, ruthenium, and molybdenum, porous low dielectric constant SiO2-based insulators, and hafnium or zirconium oxides
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Ogawa, T., M. Fujii, T. Asai, A. Ikegami, and T. Kobayashi. "Application of copper conductor and ruthenium containing oxides-glass resistor to high-frequency hybrid ICs for a portable cellular radio." IEEE Transactions on Components, Hybrids, and Manufacturing Technology 11, no. 2 (1988): 211–17. http://dx.doi.org/10.1109/33.2989.

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Dissertations / Theses on the topic "Copper Ruthenium Oxides"

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Venkataraman, Shyam S. "Electrodeposition of Copper on Ruthenium Oxides and Bimetallic Corrosion of Copper/Ruthenium in Polyphenolic Antioxidants." Thesis, University of North Texas, 2007. https://digital.library.unt.edu/ark:/67531/metadc3908/.

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Copper (Cu) electrodeposition on ruthenium (Ru) oxides was studied due to important implications in semiconductor industry. Ruthenium, proposed as the copper diffusion barrier/liner material, has higher oxygen affinity to form different oxides. Three different oxides (the native oxide, reversible oxide, and irreversible oxide) were studied. Native oxide can be formed on exposing Ru in atmosphere. The reversible and irreversible oxides can be formed by applying electrochemical potential. Investigation of Cu under potential deposition on these oxides indicates the similarity between native and r
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Venkataraman, Shyam S. Chyan Oliver Ming-Ren. "Electrodeposition of copper on ruthenium oxides and bimetallic corrosion of copper/ruthenium in polyphenolic antioxidants." [Denton, Tex.] : University of North Texas, 2007. http://digital.library.unt.edu/permalink/meta-dc-3908.

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Yu, Kyle K. Chyan Oliver Ming-Ren. "Study of copper electrodeposition on ruthenium oxide surfaces and bimetallic corrosion of copper/ruthenium in gallic acid solution." [Denton, Tex.] : University of North Texas, 2007. http://digital.library.unt.edu/permalink/meta-dc-3897.

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Yu, Kyle K. "Study of Copper Electrodeposition on Ruthenium Oxide Surfaces and Bimetallic Corrosion of Copper/Ruthenium in Gallic Acid Solution." Thesis, University of North Texas, 2007. https://digital.library.unt.edu/ark:/67531/metadc3897/.

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Ruthenium, proposed as a new candidate of diffusion barrier, has three different kinds of oxides, which are native oxide, electrochemical reversible oxide and electrochemical irreversible oxide. Native oxide was formed by naturally exposed to air. Electrochemical reversible oxide was formed at lower anodic potential region, and irreversible oxides were formed at higher anodic potential region. In this study, we were focusing on the effect of copper electrodeposition on each type of oxides. From decreased charge of anodic stripping peaks and underpotential deposition (UPD) waves in cyclic volta
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Wang, Chang-Sheng. "Selective catalytic C(sp²)–H and C(sp³)–H bond functionalizations for the synthesis of phosphorus and nitrogen containing molecules." Thesis, Rennes 1, 2018. http://www.theses.fr/2018REN1S106/document.

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Dans la thèse de doctorat, nous avons développé une approche efficace pour la modification rapide d'oxydes d'arylphosphines via la fonctionnalisation de liaisons C-H en position ortho du groupement P=O catalysée par le ruthénium (II) en présence des alcènes. Intéressement, l'ajustement du pH du milieu réactionnel permet de contrôler la sélectivité de la réaction à savoir alkylation or oléfination. La réduction des oxydes de phosphines fonctionnalisées permet la formation d'arylphosphines portant un carboxylate flexible. Dans le second objectif, un couplage C(sp3)–H /N-H oxydatif catalysé par l
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Huang, Long. "Copper Electrodeposition on Iridium, Ruthenium and Its Conductive Oxide Substrate." Thesis, University of North Texas, 2003. https://digital.library.unt.edu/ark:/67531/metadc4416/.

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The aim of this thesis was to investigate the physical and electrochemical properties of sub monolayer and monolayer of copper deposition on the polycrystalline iridium, ruthenium and its conductive oxide. The electrochemical methods cyclic voltammetry (CV) and chronocoulometry were used to study the under potential deposition. The electrochemical methods to oxidize the ruthenium metal are presented, and the electrochemical properties of the oxide ruthenium are studied. The full range of CV is presented in this thesis, and the distances between the stripping bulk peak and stripping UPD p
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Zhang, Yibin. "Study of Ruthenium and Ruthenium Oxide's Electrochemical Properties and Application as a Copper Diffusion Barrier." Thesis, University of North Texas, 2005. https://digital.library.unt.edu/ark:/67531/metadc4825/.

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As a very promising material of copper diffusion barrier for next generation microelectronics, Ru has already obtained a considerable attention recently. In this dissertation, we investigated ruthenium and ruthenium oxide electrochemical properties and the application as a copper diffusion barrier. Cu under potential deposition (UPD) on the RuOx formed electrochemically was first observed. Strong binding interaction, manifesting by the observed Cu UPD process, exists between Cu and Ru as well as its conductive ruthenium oxide. Since UPD can be conformally formed on the electrode surface, whic
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Dhakal, Dileep. "Growth Monitoring of Ultrathin Copper and Copper Oxide Films Deposited by Atomic Layer Deposition." Doctoral thesis, Universitätsbibliothek Chemnitz, 2017. http://nbn-resolving.de/urn:nbn:de:bsz:ch1-qucosa-229808.

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Atomic layer deposition (ALD) of copper films is getting enormous interest. Ultrathin Cu films are applied as the seed layer for electrochemical deposition (ECD) of copper in interconnect circuits and as the non-magnetic material for the realization of giant magnetoresistance (GMR) sensors. Particularly, Co/Cu multi-layered structures require sub 4.0 nm copper film thickness for obtaining strong GMR effects. The physical vapor deposition process for the deposition of the copper seed layers are prone to non-conformal coating and poor step coverage on side-walls and bottoms of trenches and vias,
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Kurnaz, Emine. "Epoxidation Reactions Of Small Alkenes On Catalytic Surfaces." Master's thesis, METU, 2011. http://etd.lib.metu.edu.tr/upload/12613918/index.pdf.

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Propylene epoxidation reaction was investigated on catalytic surfaces of chlorinated copper(I) oxide and ruthenium(IV) oxide using periodic density functional theory (DFT). Cu2O(001) and (110) surface of RuO2 was selected to generate chlorinated surfaces to be used in the study. Besides epoxidation, other reactions that compete with epoxidation were also studied such as formations of allyl-radical, acrolein, acetone on chlorinated Cu2O(001) and formations of propionaldehyde, allyl-radical and acetone on chlorinated RuO2(110) surface. Path of each reaction was determined by CI-NEB method and tr
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Waechtler, Thomas, Steffen Oswald, Nina Roth, Heinrich Lang, Stefan E. Schulz, and Thomas Gessner. "ALD of Copper and Copper Oxide Thin Films For Applications in Metallization Systems of ULSI Devices." Universitätsbibliothek Chemnitz, 2008. http://nbn-resolving.de/urn:nbn:de:bsz:ch1-200800914.

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<p> As a possible alternative for growing seed layers required for electrochemical Cu deposition of metallization systems in ULSI circuits, the atomic layer deposition (ALD) of Cu is under consideration. To avoid drawbacks related to plasma-enhanced ALD (PEALD), thermal growth of Cu has been proposed by two-step processes forming copper oxide films by ALD which are subsequently reduced. </p> <p> This talk, given at the 8th International Conference on Atomic Layer Deposition (ALD 2008), held in Bruges, Belgium from 29 June to 2 July 2008, summarizes the results of thermal ALD experi
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Books on the topic "Copper Ruthenium Oxides"

1

Moi, Yeoh Lee. Phase formation and superconductivity in copper oxide based YBCO and RU-1212 and RU-1222 systems prepared by sol-gel and coprecipitation techniques. Nova Science Publishers, 2011.

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