Journal articles on the topic 'Critical Dimension Measurement'
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OTAKA, Tadashi, Hiroki KAWADA, Chie SHISHIDO, and Mayuka OSAKI. "Critical Dimension Measurement Technology Using CD-SEM." Hyomen Kagaku 27, no. 11 (2006): 636–41. http://dx.doi.org/10.1380/jsssj.27.636.
Full textMizuno, Fumio. "Evaluation of total uncertainty in the dimension measurements using critical-dimension measurement scanning electron microscopes." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 16, no. 6 (1998): 3661. http://dx.doi.org/10.1116/1.590387.
Full textSartore, R. "Linewidth measurements of metallization coated with insulator on microelectronic circuits using Energy-Dispersive Xray Analysis (EDXA)." Proceedings, annual meeting, Electron Microscopy Society of America 50, no. 2 (1992): 1690–91. http://dx.doi.org/10.1017/s0424820100133084.
Full textAbe, Hideaki, Motoki Kadowaki, Akira Hamaguchi, Takahiro Ikeda, and Yuichiro Yamazaki. "Systematic Measurement Uncertainty of Critical Dimension Scanning Electron Microscope." Japanese Journal of Applied Physics 49, no. 6 (2010): 06GD03. http://dx.doi.org/10.1143/jjap.49.06gd03.
Full textLee, Wonsuk. "Measurement of critical dimension in scanning electron microscope mask images." Journal of Micro/Nanolithography, MEMS, and MOEMS 10, no. 2 (2011): 023003. http://dx.doi.org/10.1117/1.3574771.
Full textKwon, Soonyang, Namyoon Kim, Taeyong Jo, and Heui Jae Pahk. "Critical dimension measurement of transparent film layers by multispectral imaging." Optics Express 22, no. 14 (2014): 17370. http://dx.doi.org/10.1364/oe.22.017370.
Full textLorusso, G. F., and D. C. Joy. "Experimental resolution measurement in critical dimension scanning electron microscope metrology." Scanning 25, no. 4 (2003): 175–80. http://dx.doi.org/10.1002/sca.4950250403.
Full textYamashita, Hiroshi. "Highly accurate critical dimension measurement for sub-0.5-μm devices". Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 12, № 6 (1994): 3591. http://dx.doi.org/10.1116/1.587477.
Full textHitomi, Keiichiro, Yoshinori Nakayama, Hiromasa Yamanashi, Yasunari Sohda, and Hiroki Kawada. "Study of Measurement Condition Optimization in Critical Dimension-Scanning Electron Microscope." Japanese Journal of Applied Physics 47, no. 8 (2008): 6554–57. http://dx.doi.org/10.1143/jjap.47.6554.
Full textNagase, Masao, Hideo Namatsu, Kenji Kurihara, and Takahiro Makino. "Critical Dimension Measurement in Nanometer Scale by Using Scanning Probe Microscopy." Japanese Journal of Applied Physics 35, Part 1, No. 7 (1996): 4166–74. http://dx.doi.org/10.1143/jjap.35.4166.
Full textMarák, Károly. "Characterization of the Inverse Problem in Critical Dimension Measurement of Diffraction Gratings." Periodica Polytechnica Electrical Engineering and Computer Science 61, no. 1 (2016): 1. http://dx.doi.org/10.3311/ppeecs.7.
Full textMurayama, Ken, Satoshi Gonda, Hajime Koyanagi, Tsuneo Terasawa, and Sumio Hosaka. "Critical-Dimension Measurement using Multi-Angle-Scanning Method in Atomic Force Microscope." Japanese Journal of Applied Physics 45, no. 7 (2006): 5928–32. http://dx.doi.org/10.1143/jjap.45.5928.
Full textHuang, Y., B. X. Cai, Y. S. Lin, et al. "Optical Critical Dimension Measurement for AEI Structures at Sub 65 Nm Node." ECS Transactions 60, no. 1 (2014): 869–74. http://dx.doi.org/10.1149/06001.0869ecst.
Full textZou, Y. B., M. S. S. Khan, H. M. Li, et al. "Use of model-based library in critical dimension measurement by CD-SEM." Measurement 123 (July 2018): 150–62. http://dx.doi.org/10.1016/j.measurement.2018.02.069.
Full textZhang, Zhen Sheng, Yi Huang, Yong-Gang Feng, et al. "Critical Dimension Measurement Using OCD Spectroscopy for Gate and STI AEI Structures." ECS Transactions 44, no. 1 (2019): 1169–74. http://dx.doi.org/10.1149/1.3694445.
Full textMarák, Károly. "Characterization of the Inverse Problem in Critical Dimension Measurement of Diffraction Gratings." Periodica Polytechnica Electrical Engineering and Computer Science 60, no. 3 (2016): 187–93. http://dx.doi.org/10.3311/ppee.9310.
Full textMalkusch, Wolf, and Thomas Pioch. "A method to test the accuracy of critical dimension measurement systems (CDMS)." Microelectronic Engineering 11, no. 1-4 (1990): 675–79. http://dx.doi.org/10.1016/0167-9317(90)90194-x.
Full textYu, Anqi, Xiaolin Zhao, Sheng Ni, Rui Dai, Jinshui Miao, and Xuguang Guo. "Plasmon-assisted optical critical dimension measurement for three-layer orthogonal metallic gratings." Photonics and Nanostructures - Fundamentals and Applications 46 (September 2021): 100949. http://dx.doi.org/10.1016/j.photonics.2021.100949.
Full textRyabko, M., S. Koptyaev, A. Shcherbakov, and A. Lantsov. "Interferometer -based Technology for Optical Nanoscale Inspection." Measurement Science Review 14, no. 1 (2014): 25–28. http://dx.doi.org/10.2478/msr-2014-0004.
Full textReilly, Terrence W., and Louis G. Dawang. "A study of robust critical dimension measurement algorithm for use in differing scanning electron microscope configurations in the measurement of submicron semiconductor geometries." Proceedings, annual meeting, Electron Microscopy Society of America 49 (August 1991): 882–83. http://dx.doi.org/10.1017/s0424820100088725.
Full textXiang, Wuweikai, Yanling Tian, and Xianping Liu. "Dynamic analysis of tapping mode atomic force microscope (AFM) for critical dimension measurement." Precision Engineering 64 (July 2020): 269–79. http://dx.doi.org/10.1016/j.precisioneng.2020.03.023.
Full textCiappa, Mauro, Alexander Koschik, Maurizio Dapor, and Wolfgang Fichtner. "Modeling secondary electron images for linewidth measurement by critical dimension scanning electron microscopy." Microelectronics Reliability 50, no. 9-11 (2010): 1407–12. http://dx.doi.org/10.1016/j.microrel.2010.07.120.
Full textShivaprasad, Deepak, Jiangtao Hu, Milad Tabet, Ray Hoobler, David Mui, and Wei Liu. "Measurement of semi-isolated polysilicon gate structure with the optical critical dimension technique." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 21, no. 6 (2003): 2517. http://dx.doi.org/10.1116/1.1622946.
Full textAzuma, Tsukasa, Kenji Chiba, Hideaki Abe, Hiroshi Motoki, and Noriaki Sasaki. "Mechanism of ArF resist-pattern shrinkage in critical-dimension scanning electron microscopy measurement." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 22, no. 1 (2004): 226. http://dx.doi.org/10.1116/1.1643055.
Full textUk Lee, Jae, Seongchul Hong, Jinho Ahn, Jonggul Doh, and SeeJun Jeong. "Actinic critical dimension measurement of contaminated extreme ultraviolet mask using coherent scattering microscopy." Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 32, no. 3 (2014): 031601. http://dx.doi.org/10.1116/1.4873697.
Full textAhn, Jae Hyung, Tai-Wook Kim, and Heui Jae Pahk. "Fast focus and astigmatism correction algorithm for critical dimension measurement using electron microscopy." International Journal of Precision Engineering and Manufacturing 16, no. 9 (2015): 1941–47. http://dx.doi.org/10.1007/s12541-015-0252-5.
Full textTengelin, Ellinor, Christina Cliffordson, Elisabeth Dahlborg, and Ina Berndtsson. "Constructing the Norm-critical awareness scale." Equality, Diversity and Inclusion: An International Journal 38, no. 6 (2019): 652–67. http://dx.doi.org/10.1108/edi-10-2017-0222.
Full textRosenfield, M. G. "Linewidth measurement using the low voltage SEM." Proceedings, annual meeting, Electron Microscopy Society of America 44 (August 1986): 652–53. http://dx.doi.org/10.1017/s0424820100144681.
Full textZao, Jin You, Bong Yin Yen, Lim Beng Kuan, John Thornell, Darcy Hart, and David Marx. "Automated Metrology Improves Productivity and Yields for Wafer Level Packaging in High Volume Manufacturing." International Symposium on Microelectronics 2014, no. 1 (2014): 000155–60. http://dx.doi.org/10.4071/isom-ta61.
Full textBattaglia, Alessandro, Elke Rustemeier, Ali Tokay, Ulrich Blahak, and Clemens Simmer. "PARSIVEL Snow Observations: A Critical Assessment." Journal of Atmospheric and Oceanic Technology 27, no. 2 (2010): 333–44. http://dx.doi.org/10.1175/2009jtecha1332.1.
Full textAndré, Kummerow, Nicolai Steffen, and Bretschneider Peter. "Outlier Detection Methods for Uncovering of Critical Events in Historical Phasor Measurement Records." E3S Web of Conferences 64 (2018): 08006. http://dx.doi.org/10.1051/e3sconf/20186408006.
Full textPatrick, Heather J. "Optical critical dimension measurement of silicon grating targets using back focal plane scatterfield microscopy." Journal of Micro/Nanolithography, MEMS, and MOEMS 7, no. 1 (2008): 013012. http://dx.doi.org/10.1117/1.2885275.
Full textChouaib, Houssam, and Qiang Zhao. "Nanoscale optical critical dimension measurement of a contact hole using deep ultraviolet spectroscopic ellipsometry." Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 31, no. 1 (2013): 011803. http://dx.doi.org/10.1116/1.4771969.
Full textKwak, Gyea Young, Hye Jung Chang, Min Young Na, et al. "Calibration of high magnification in the measurement of critical dimension by AFM and SEM." Applied Surface Science 565 (November 2021): 150481. http://dx.doi.org/10.1016/j.apsusc.2021.150481.
Full textSantamaria, Tricia, and Dan Nathan-Roberts. "Personality Measurement and Design in Human-Robot Interaction: A Systematic and Critical Review." Proceedings of the Human Factors and Ergonomics Society Annual Meeting 61, no. 1 (2017): 853–57. http://dx.doi.org/10.1177/1541931213601686.
Full textCantero-López, Nuria, Víctor M. González-Chordá, María Jesús Valero-Chillerón, et al. "Attitudes of Undergraduate Nursing Students towards Patient Safety: A Quasi-Experimental Study." International Journal of Environmental Research and Public Health 18, no. 4 (2021): 1429. http://dx.doi.org/10.3390/ijerph18041429.
Full textQerimi, Qerim. "The impact of EU conditionality policy on human rights and rule of law in the western Balkans: An attempt at a methodology." SEER 24, no. 1 (2021): 93–102. http://dx.doi.org/10.5771/1435-2869-2021-1-93.
Full textYasutake, Masatoshi, Kazutoshi Watanabe, Sigeru Wakiyama, and Takehiro Yamaoka. "Critical Dimension Measurement Using New Scanning Mode and Aligned Carbon Nanotube Scanning Probe Microscope Tip." Japanese Journal of Applied Physics 45, no. 3B (2006): 1970–73. http://dx.doi.org/10.1143/jjap.45.1970.
Full textRyu, Doo Hyeon, Jongwon Kim, and Byungki Kim. "Development of Simple Optical Triangulation Device and Its Signal Processing Software for Critical Dimension Measurement." JOURNAL OF THE KOREAN SOCIETY FOR NONDESTRUCTIVE TESTING 37, no. 5 (2017): 335–41. http://dx.doi.org/10.7779/jksnt.2017.37.5.335.
Full textLi, Dehua, Rui Guo, Soo-Young Lee, et al. "Noise filtering for accurate measurement of line edge roughness and critical dimension from SEM images." Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 34, no. 6 (2016): 06K604. http://dx.doi.org/10.1116/1.4968184.
Full textSulistiyani, Endang, and Rizqi Putri Nourma Budiarti. "Analysis of Online Learning Readiness Level at Universitas Nahdlatul Ulama Surabaya (UNUSA)." International Journal of Innovation in Enterprise System 5, no. 01 (2021): 23–34. http://dx.doi.org/10.25124/ijies.v5i01.102.
Full textZheng, Chuanjun, Jingfeng Yuan, Lingzhi Li, and Mirosław J. Skibniewski. "Process-Based Identification of Critical Factors for Residual Value Risk in China's Highway PPP Projects." Advances in Civil Engineering 2019 (May 9, 2019): 1–21. http://dx.doi.org/10.1155/2019/5958904.
Full textAbdullah, A. B., S. M. Sapuan, Z. Samad, H. M. T. Khaleed, and N. A. Aziz. "Geometrical Error Analysis of Cold Forged AUV Propeller Blade Using Optical Measurement Method." Advanced Materials Research 383-390 (November 2011): 7117–21. http://dx.doi.org/10.4028/www.scientific.net/amr.383-390.7117.
Full textFannon, David, Michelle Laboy, and Peter Wiederspahn. "Dimensions of Use." Enquiry A Journal for Architectural Research 15, no. 1 (2018): 25–45. http://dx.doi.org/10.17831/enq:arcc.v15i1.447.
Full textHarada, Tetsuo, Masato Nakasuji, Masaki Tada, Yutaka Nagata, Takeo Watanabe, and Hiroo Kinoshita. "Critical Dimension Measurement of an Extreme-Ultraviolet Mask Utilizing Coherent Extreme-Ultraviolet Scatterometry Microscope at NewSUBARU." Japanese Journal of Applied Physics 50, no. 6S (2011): 06GB03. http://dx.doi.org/10.7567/jjap.50.06gb03.
Full textOrji, Ndubuisi G. "Progress on implementation of a reference measurement system based on a critical-dimension atomic force microscope." Journal of Micro/Nanolithography, MEMS, and MOEMS 6, no. 2 (2007): 023002. http://dx.doi.org/10.1117/1.2728742.
Full textSettens, Charles, Aaron Cordes, Benjamin Bunday, et al. "Assessment of critical dimension small-angle x-ray scattering measurement approaches for FinFET fabrication process monitoring." Journal of Micro/Nanolithography, MEMS, and MOEMS 13, no. 4 (2014): 041408. http://dx.doi.org/10.1117/1.jmm.13.4.041408.
Full textFukuda, Hiroshi, Yoshinori Momonoi, and Kei Sakai. "Estimating extremely low probability of stochastic defect in extreme ultraviolet lithography from critical dimension distribution measurement." Journal of Micro/Nanolithography, MEMS, and MOEMS 18, no. 02 (2019): 1. http://dx.doi.org/10.1117/1.jmm.18.2.024002.
Full textHarada, Tetsuo, Masato Nakasuji, Masaki Tada, Yutaka Nagata, Takeo Watanabe, and Hiroo Kinoshita. "Critical Dimension Measurement of an Extreme-Ultraviolet Mask Utilizing Coherent Extreme-Ultraviolet Scatterometry Microscope at NewSUBARU." Japanese Journal of Applied Physics 50, no. 6 (2011): 06GB03. http://dx.doi.org/10.1143/jjap.50.06gb03.
Full textLu, Junfei, Chu-Ling Lo, Na Mi Bang, and Devon Romero. "A Critical Review of Spiritual Well-Being Scales: Implications for Research, Practice, and Education in Rehabilitation Counseling." Rehabilitation Counseling Bulletin 62, no. 3 (2018): 144–56. http://dx.doi.org/10.1177/0034355218776764.
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