Log in

Relevant bibliographies by topics / DC Sputter Deposition / Journal articles

To see the other types of publications on this topic, follow the link: DC Sputter Deposition.

Journal articles on the topic 'DC Sputter Deposition'

Author: Grafiati

Published: 6 September 2023

Create a spot-on reference in APA, MLA, Chicago, Harvard, and other styles

Select a source type:

Consult the top 50 journal articles for your research on the topic 'DC Sputter Deposition.'

Next to every source in the list of references, there is an 'Add to bibliography' button. Press on it, and we will generate automatically the bibliographic reference to the chosen work in the citation style you need: APA, MLA, Harvard, Chicago, Vancouver, etc.

You can also download the full text of the academic publication as pdf and read online its abstract whenever available in the metadata.

Browse journal articles on a wide variety of disciplines and organise your bibliography correctly.

1

Thormählen, Lars, Dennis Seidler, Viktor Schell, Frans Munnik, Jeffrey McCord, and Dirk Meyners. "Sputter Deposited Magnetostrictive Layers for SAW Magnetic Field Sensors." Sensors 21, no. 24 (2021): 8386. http://dx.doi.org/10.3390/s21248386.

Full text

Abstract:

For the best possible limit of detection of any thin film-based magnetic field sensor, the functional magnetic film properties are an essential parameter. For sensors based on magnetostrictive layers, the chemical composition, morphology and intrinsic stresses of the layer have to be controlled during film deposition to further control magnetic influences such as crystallographic effects, pinning effects and stress anisotropies. For the application in magnetic surface acoustic wave sensors, the magnetostrictive layers are deposited on rotated piezoelectric single crystal substrates. The thermo

APA, Harvard, Vancouver, ISO, and other styles

2

Somekh, R. E., and Z. H. Barber. "UHV sputter deposition with a research-scale DC magnetron." Journal of Physics E: Scientific Instruments 21, no. 11 (1988): 1029–33. http://dx.doi.org/10.1088/0022-3735/21/11/005.

Full text

APA, Harvard, Vancouver, ISO, and other styles

3

Kent, Karl, and Milutin Stoilovic. "Development of latent fingerprints using preferential DC sputter deposition." Forensic Science International 72, no. 1 (1995): 35–42. http://dx.doi.org/10.1016/0379-0738(94)01671-q.

Full text

APA, Harvard, Vancouver, ISO, and other styles

4

Sonoda, Tsutomu, and Kiyotaka Katou. "Coating of Granular Polymeric Spacers with Copper by Sputter-Deposition for Enhancing Cell Wall Structure of Sintered Highly Porous Aluminum Materials." Materials Science Forum 660-661 (October 2010): 432–36. http://dx.doi.org/10.4028/www.scientific.net/msf.660-661.432.

Full text

Abstract:

The deposition of copper onto acrylic resin powder in its self-convective motion by magnetron DC sputtering was examined in order to prepare granular polymeric spacers coated with the metal, aiming at enhancing the cell wall structure of sintered highly porous aluminum materials. The fabrication of sintered highly porous aluminum materials was carried out in an ordinary powder metallurgy processing combined with a space-holder method with the polymer-copper binary spacer granules prepared by powder-coating using the sputter-deposition technique. The effects of the sputter-deposition of copper

APA, Harvard, Vancouver, ISO, and other styles

5

Park, Min Woo, Wang Woo Lee, Jae Gab Lee, and Chong Mu Lee. "A Comparison of the Mechanical Properties of RF- and DC- Sputter-Deposited Cr Thin Films." Materials Science Forum 546-549 (May 2007): 1695–98. http://dx.doi.org/10.4028/www.scientific.net/msf.546-549.1695.

Full text

Abstract:

Chromium (Cr) films were deposited on plain carbon steel sheets by DC and RF magnetron sputtering as well as by electroplating. Effects of DC or RF sputtering power on the deposition rate and properties such as hardness and surface roughness of the Cr films were investigated. X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microcopy (SEM) analyses were performed to investigate the crystal structure, surface roughness, thickness of the Cr films. The deposition rate, hardness and surface roughness of the Cr film deposited by either DC or RF sputtering increase with the

APA, Harvard, Vancouver, ISO, and other styles

6

Kharrazi Olsson, M., K. Macák, U. Helmersson, and B. Hjörvarsson. "High rate reactive dc magnetron sputter deposition of Al2O3 films." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 16, no. 2 (1998): 639–43. http://dx.doi.org/10.1116/1.581081.

Full text

APA, Harvard, Vancouver, ISO, and other styles

7

Ting, Jyh-Ming, and B. S. Tsai. "DC reactive sputter deposition of ZnO:Al thin film on glass." Materials Chemistry and Physics 72, no. 2 (2001): 273–77. http://dx.doi.org/10.1016/s0254-0584(01)00451-5.

Full text

APA, Harvard, Vancouver, ISO, and other styles

8

Schneider, R., J. Geerk, G. Linker, O. Meyer, and R. Smithey. "Effects of DC bias voltage in sputter deposition of YBaCuO films." Physica C: Superconductivity 235-240 (December 1994): 671–72. http://dx.doi.org/10.1016/0921-4534(94)91559-8.

Full text

APA, Harvard, Vancouver, ISO, and other styles

9

Koren, G. "DC sputter deposition of YBa2Cu3O7 thin films for two sided coating." Physica C: Superconductivity 209, no. 4 (1993): 369–72. http://dx.doi.org/10.1016/0921-4534(93)90547-4.

Full text

APA, Harvard, Vancouver, ISO, and other styles

10

Kellett, B. J., та J. H. James. "Ion beam sputter deposition of YBa2Cu3O7−δ thin films". Journal of Materials Research 8, № 12 (1993): 3032–42. http://dx.doi.org/10.1557/jmr.1993.3032.

Full text

Abstract:

This article addresses issues associated with in situ growth of superconducting YBa2Cu3O7−δ thin films by ion beam sputtering. High oxygen partial pressure during ion beam deposition can cause significant beam broadening and oxidation of filaments and grids. Also, many of the targets used for processing YBCO are unstable when sputtered in a high oxygen partial pressure. It is shown that ion beam sputtering can produce YBCO films of comparable quality to those produced by laser ablation or dc magnetron sputtering. Typical film properties are Tco = 91 K and Jc (77 K) = 106 A cm−2. It appears tha

APA, Harvard, Vancouver, ISO, and other styles

11

Dinh, Cam Thi Mong, Thang Bach Phan, and Hoang Thanh Nguyen. "Synthesis of ZnO nanowires on Ti/glass substrates by DC magnetron sputter deposition." Science and Technology Development Journal 17, no. 2 (2014): 47–55. http://dx.doi.org/10.32508/stdj.v17i2.1314.

Full text

Abstract:

One-dimensional (1-D) zinc oxide (ZnO) nanostructures, such as ZnO nanowires and nanorods, have in recent years attracted a lot of attention due to their many unique properties and possibility that can be applied to various nanoscale functional devices. In this study, ZnO nanowires have been successfully synthesized on Ti/glass substrates by an DC magnetron sputter deposition technique. Deposition of ZnO using this technique generally leads to the formation of ZnO thin film but not of nanowire. So prior to the ZnO deposition, a Cu labyer was prepared on the Ti/glass substrate using an electrol

APA, Harvard, Vancouver, ISO, and other styles

12

Wu, Wan-Yu, and Jyh-Ming Ting. "Effects of Process Conditions on the Synthesis and Microstructure of Nano-Scale Metal-Containing Amorphous Carbon Thin Films." Journal of Nanoscience and Nanotechnology 8, no. 5 (2008): 2623–26. http://dx.doi.org/10.1166/jnn.2008.18294.

Full text

Abstract:

Thin films of metal-containing amorphous carbon (a-C:Me) were deposited on a number of substrates, including silicon, Pt coated silicon, carbon coated silicon, polymer, and glass. The deposition was performed in a dc reactive sputter deposition system equipped with one single magnetron gun. The gases used were various mixtures of CH4 + Ar. The gas mixture was admitted to the deposition chamber at constant flow rate and ratio. Self-assembled alternating layer structure was observed under certain deposition conditions. Correlation between the self-assembled alternating layer structure and deposi

APA, Harvard, Vancouver, ISO, and other styles

13

Sonoda, Tsutomu, Kiyotaka Katou, and Tadashi Asahina. "Porous Structure and Mechanical Properties of the Cellular Metallic Materials Fabricated by Sintering Al Powder Coated with Sn." Materials Science Forum 591-593 (August 2008): 277–81. http://dx.doi.org/10.4028/www.scientific.net/msf.591-593.277.

Full text

Abstract:

The deposition of pure tin onto pure aluminum powder in its self-convective motion by magnetron DC sputtering was examined in order to prepare Al-Sn composite powder and thereby to improve the sintering of the aluminum particles, aiming at the development of highly structure-controlled porous aluminum materials. The fabrication of porous aluminum materials was carried out by space-holder method using the prepared Al-Sn composite powder in ordinary powder metallurgy processing. The effects of the sputterdeposition of tin on porous structure and mechanical properties of the sintered compact were

APA, Harvard, Vancouver, ISO, and other styles

14

Sangwaranatee, N. W., N. Sangwaranatee, M. Horprathum, C. Chananonnawathorn, and M. Muntini. "DC reactive sputter deposition of CuO thin films at different operating pressures." Materials Today: Proceedings 5, no. 7 (2018): 15166–69. http://dx.doi.org/10.1016/j.matpr.2018.04.076.

Full text

APA, Harvard, Vancouver, ISO, and other styles

15

Klein, P., B. Gottwald, T. Frauenheim, C. Köhler, and A. Gemmler. "Residual stresses modelled by MD simulation applied to PVD DC sputter deposition." Surface and Coatings Technology 200, no. 5-6 (2005): 1600–1603. http://dx.doi.org/10.1016/j.surfcoat.2005.08.120.

Full text

APA, Harvard, Vancouver, ISO, and other styles

16

R. Agool, Ibrahim, Mohammed K. Khalaf, Shaimaa H. Abd Muslim, and Riyadh N. Talaq. "Reactive DC magnetron sputter deposition and structural properties of NiO thin films." Engineering and Technology Journal 33, no. 6B (2015): 1082–92. http://dx.doi.org/10.30684/etj.2015.116476.

Full text

APA, Harvard, Vancouver, ISO, and other styles

17

Shen, Yi, and Ruo He Yao. "Properties of Al Films Depend on Substrate Temperature by DC Magnetron Sputter Deposition." Advanced Materials Research 662 (February 2013): 413–16. http://dx.doi.org/10.4028/www.scientific.net/amr.662.413.

Full text

Abstract:

Al films were prepared by DC magnetron sputter deposition at different substrate temperatures. The sheet resistance of the films was measured by four point probe sheet resistance meter, and the film thickness, which was obtained by surface profiling system. The surface and cross-section morphology of the films was observed by AFM and FESEM. As a result, the resistivity of the films decreases obviously as the substrate temperature increases gradually. The higher substrate temperature is, the rougher the films surface is and the larger the grain size is.

APA, Harvard, Vancouver, ISO, and other styles

18

Akhtar, Pervez, T. J. Ali, and R. Mahmud. "An Investigation into the Effects of Substrate Temperature on Magnetic Properties of RF Sputtered NiFe Films." Key Engineering Materials 442 (June 2010): 109–15. http://dx.doi.org/10.4028/www.scientific.net/kem.442.109.

Full text

Abstract:

The paper describes results of investigation on sputtered NiFe Films to determine the sputter deposition condition that could produce magnetic field sensors with the desired magnetic properties. The magnetic materials used in such devices should have a low coercive force, a low anisotropy field and a low magnetization dispersion, α50. .The results of systematic investigation of radio-frequency (RF) sputtered, RF biased, 82-18 % NiFe films showed (i) Improved Kobelev methods were applied to magneto-optic measurement techniques, suppress the magnetization ripples when subjected under the applica

APA, Harvard, Vancouver, ISO, and other styles

19

Madsen, N. D., B. H. Christensen, S. Louring, et al. "Controlling the deposition rate during target erosion in reactive pulsed DC magnetron sputter deposition of alumina." Surface and Coatings Technology 206, no. 23 (2012): 4850–54. http://dx.doi.org/10.1016/j.surfcoat.2012.05.070.

Full text

APA, Harvard, Vancouver, ISO, and other styles

20

Prabaswara, Aditya, Jens Birch, Muhammad Junaid, Elena Alexandra Serban, Lars Hultman, and Ching-Lien Hsiao. "Review of GaN Thin Film and Nanorod Growth Using Magnetron Sputter Epitaxy." Applied Sciences 10, no. 9 (2020): 3050. http://dx.doi.org/10.3390/app10093050.

Full text

Abstract:

Magnetron sputter epitaxy (MSE) offers several advantages compared to alternative GaN epitaxy growth methods, including mature sputtering technology, the possibility for very large area deposition, and low-temperature growth of high-quality electronic-grade GaN. In this article, we review the basics of reactive sputtering for MSE growth of GaN using a liquid Ga target. Various target biasing schemes are discussed, including direct current (DC), radio frequency (RF), pulsed DC, and high-power impulse magnetron sputtering (HiPIMS). Examples are given for MSE-grown GaN thin films with material qu

APA, Harvard, Vancouver, ISO, and other styles

21

Deshmukh, Pratap, Sergey Yarmolenko, Sudheer Neralla, and Jagannathan Sankar. "Corrosion Analysis of Mg/Al₂O₃ Bio-Degradable Nanolaminate Thin-Films Fabricated Using DC/Pulsed DC Magnetron-Sputtering Technique." ECS Meeting Abstracts MA2022-02, no. 14 (2022): 2596. http://dx.doi.org/10.1149/ma2022-02142596mtgabs.

Full text

Abstract:

Multilayered Thin films are effective in controlling the rate of corrosion of magnesium alloys used for bio-implants applications. It’s been proven that corrosion of metallic implants can be delayed by depositing multilayered metal-oxide thin films. In this study, Mg/Al2O3 nanolaminates, along with different metal oxides, were deposited using DC and pulsed DC magnetron sputtering methods at room temperature on glass substrates. Applicability of these metal-oxide nanolaminates to corrosion control was studied by bulk volumetric degradation measurement technique using solutions such as Saline, H

APA, Harvard, Vancouver, ISO, and other styles

22

Hoon, Jian Wei, Kah Yoong Chan, and Cheng Yang Low. "XRD Investigations on Film Thickness and Substrate Temperature Effects of DC Magnetron Sputtered ZnO Films." Advanced Materials Research 845 (December 2013): 241–45. http://dx.doi.org/10.4028/www.scientific.net/amr.845.241.

Full text

Abstract:

In this paper, direct current plasma magnetron sputter deposition technique was employed to deposit zinc oxide (ZnO) films on glass substrates. The magnetron sputtering process parameters including film thickness and substrate temperature were investigated. The crystallite sizes of the ZnO films were extracted from the measured X-ray diffraction patterns. The correlation of the crystallite size of the ZnO films with the film thickness and the substrate temperature will be discussed in this paper.

APA, Harvard, Vancouver, ISO, and other styles

23

DENG, JINXIANG, GUANGHUA CHEN, and XUEMEI SONG. "CHARACTERIZATION OF CUBIC BORON NITRIDE THIN FILMS DEPOSITED BY RF SPUTTER." International Journal of Modern Physics B 16, no. 28n29 (2002): 4339–42. http://dx.doi.org/10.1142/s021797920201539x.

Full text

Abstract:

Cubic boron nitride (c-BN) thin films have been deposited on Si substrates by radio frequency sputter. Sputtering target was hot pressed hexagonal boron nitride of 4N purity. Sputtering gas was the mixture of nitrogen and argon. During depositing c-BN thin films, substrates were biased by dc voltage negatively with respect to ground. By optimizing the deposition conditions, the boron nitride (BN) films containing a large amount of cubic phase were obtained. The samples were characterized with Fourier transformation infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS), and atomi

APA, Harvard, Vancouver, ISO, and other styles

24

Chen, Le, Michael E. Graham, Gonghu Li, and Kimberly A. Gray. "Fabricating highly active mixed phase TiO2 photocatalysts by reactive DC magnetron sputter deposition." Thin Solid Films 515, no. 3 (2006): 1176–81. http://dx.doi.org/10.1016/j.tsf.2006.07.094.

Full text

APA, Harvard, Vancouver, ISO, and other styles

25

Fischer, Maria, Mathis Trant, Kerstin Thorwarth, Jörg Patscheider, and Hans Josef Hug. "A setup for arc-free reactive DC sputter deposition of Al-O-N." Surface and Coatings Technology 362 (March 2019): 220–24. http://dx.doi.org/10.1016/j.surfcoat.2019.01.082.

Full text

APA, Harvard, Vancouver, ISO, and other styles

26

de Jong, Michiel, Victor E. van Enter, and Erik van der Kolk. "DC/RF magnetron sputter deposition and characterisation of Ca3Si2N2O4:Eu2+ luminescent thin films." Journal of Luminescence 164 (August 2015): 52–56. http://dx.doi.org/10.1016/j.jlumin.2015.03.008.

Full text

APA, Harvard, Vancouver, ISO, and other styles

27

Hashimoto, Mituru, Hong Qiu, Tatsuya Ohbuchi, et al. "Characterization of cobalt films grown on MgO(001) by dc-biased-sputter deposition." Journal of Crystal Growth 166, no. 1-4 (1996): 792–97. http://dx.doi.org/10.1016/0022-0248(95)00495-5.

Full text

APA, Harvard, Vancouver, ISO, and other styles

28

Lee, Hanbin, Minjeong Park, Minhyon Jeon, and Byeongcheol Kim. "Multi-Layer Anti-Reflection Film Based on SiOx and NbOx by DC Pulse Sputter System with Inductively Coupled Plasma Source." Crystals 10, no. 6 (2020): 424. http://dx.doi.org/10.3390/cryst10060424.

Full text

Abstract:

The research on anti-reflection (AR) optical thin film has long sought to obtain high-performance reflection and transmission properties in photovoltaic and photonic devices. The study of multi-layer AR (M-AR) film with low- and high-refractive-index materials is essential to increase the selective transmittance and reflectance at visible light wavelengths. However, M-AR film exhibits low substrate adhesion and slow deposition rates. We developed a DC pulse sputter system incorporating an inductively coupled plasma (ICP) source of high density to obtain high-quality M-AR film. Six-layer AR opt

APA, Harvard, Vancouver, ISO, and other styles

29

Krumme, J.-P., V. Doormann, F. Welz, O. Dösssel та H. van Hal. "Ion-beam sputter deposition process for Y1Ba2Cu3O7-δ thin-film structures". Journal of Materials Research 9, № 11 (1994): 2747–60. http://dx.doi.org/10.1557/jmr.1994.2747.

Full text

Abstract:

Ion-beam sputter deposition (IBS) has been developed to a fully oxygen-compatible technology for growth of complex oxides, such as Y1Ba2Cu3O7−δ (YBCO) thin films. The IBS system consists of an rf-plasma ion source with molybdenum grids for sputtering, a dc-plasma electron source for space charge compensation, stoichiometric YBCO and NGO targets, a beam chopper with BaO2, Cu, and Nd blades for stoichiometry control, and an ECR-oxygen-plasma source for in situ film oxidation and photoresist removal. Due to its complexity the IBS process is fully computer-controlled. A salient feature of IBS is t

APA, Harvard, Vancouver, ISO, and other styles

30

Kaufholz, Marthe, Bärbel Krause, Sunil Kotapati, et al. "Monitoring the thin film formation during sputter deposition of vanadium carbide." Journal of Synchrotron Radiation 22, no. 1 (2015): 76–85. http://dx.doi.org/10.1107/s1600577514024412.

Full text

Abstract:

The thin film formation of magnetron sputtered polycrystalline coatings was monitored byin situX-ray reflectivity measurements. The measured intensity was analyzed using the Parratt algorithm for time-dependent thin film systems. Guidelines for the on-line interpretation of the data were developed. For thick coatings, the experimental resolution needs to be included in the data evaluation in order to avoid misinterpretations. Based on a simple layer model, the time-dependent mean electron density, roughness and growth velocity were extracted from the data. As an example, the method was applied

APA, Harvard, Vancouver, ISO, and other styles

31

Chang, Chi-Lung, Tz-Heng Chiou, Pin-Hung Chen, Wei-Chih Chen, Chun-Ta Ho, and Wan-Yu Wu. "Characteristics of TiN/W 2 N multilayers prepared using magnetron sputter deposition with dc and pulsed dc powers." Surface and Coatings Technology 303 (October 2016): 25–31. http://dx.doi.org/10.1016/j.surfcoat.2016.03.086.

Full text

APA, Harvard, Vancouver, ISO, and other styles

32

Wu, Wan Yu, Chia Wei Hsu, and Jyh Ming Ting. "Nanoscaled C, Ni, Pt Thin Films." Journal of Nano Research 6 (June 2009): 29–34. http://dx.doi.org/10.4028/www.scientific.net/jnanor.6.29.

Full text

Abstract:

We have investigated the growth and characteristics of nanoscaled thin films of carbon, nickel, and platinum. The nanoscaled thin films were deposited on Si and quartz substrates with or without a surface layer of carbon, nickel, or platinum using a DC magnetron sputter deposition technique. The thicknesses, which were determined using ellipsometry, are all less than 10 nm. The film structures were examined using glazing angle incident x-ray diffractometry and Raman spectroscopy. The electrical and optical properties were determined using a four point probe technique and UV-VIS-IR spectrometry

APA, Harvard, Vancouver, ISO, and other styles

33

Aleman, Angel, Chao Li, Hicham Zaid, et al. "Ultrahigh vacuum dc magnetron sputter-deposition of epitaxial Pd(111)/Al2O3(0001) thin films." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 36, no. 3 (2018): 030602. http://dx.doi.org/10.1116/1.5021609.

Full text

APA, Harvard, Vancouver, ISO, and other styles

34

Kharrazi, M., L. Kullman, and C. G. Granqvist. "High-rate dual-target DC magnetron sputter deposition of “blue” electrochromic Mo oxide films." Solar Energy Materials and Solar Cells 53, no. 3-4 (1998): 349–56. http://dx.doi.org/10.1016/s0927-0248(98)00033-6.

Full text

APA, Harvard, Vancouver, ISO, and other styles

35

Löbl, H. P., and M. Huppertz. "Thermal stability of nonstoichiometric silicon nitride films made by reactive dc magnetron sputter deposition." Thin Solid Films 317, no. 1-2 (1998): 153–56. http://dx.doi.org/10.1016/s0040-6090(97)00512-9.

Full text

APA, Harvard, Vancouver, ISO, and other styles

36

Militello, Maria C., Stephen W. Gaarenstroom, and Steven J. Simko. "Epitaxial Aluminum Nitride Film on Silicon(111) Grown by Reactive DC Magnetron Sputter Deposition." Surface Science Spectra 1, no. 1 (1992): 3–7. http://dx.doi.org/10.1116/1.1247668.

Full text

APA, Harvard, Vancouver, ISO, and other styles

37

Sivakumar, Kousik, and S. M. Rossnagel. "Deposition of aluminum-doped zinc oxide thin films for optical applications using rf and dc magnetron sputter deposition." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 28, no. 4 (2010): 515–22. http://dx.doi.org/10.1116/1.3425640.

Full text

APA, Harvard, Vancouver, ISO, and other styles

38

Bosworth, David, Nadia Stelmashenko, and Zoe H. Barber. "Structural Control of Carbon Nickel Thin Films Without Substrate Heating." MRS Proceedings 1451 (2012): 145–50. http://dx.doi.org/10.1557/opl.2012.1251.

Full text

Abstract:

ABSTRACTA variety of characterization techniques have been employed to study the growth and structure of nickel carbon thin films fabricated by ionized magnetron sputter deposition. A two target magnetron system is used along with an RF powered coil, to create a secondary plasma, with a DC bias applied at the substrate. By varying the bias it is possible to control the energy of the depositing species as well as a range of other plasma properties and therefore the resulting film microstructure. It has been observed that a change from the metastable hexagonal nickel carbide phase to the stable

APA, Harvard, Vancouver, ISO, and other styles

39

Sakkas, Charalampos, Jean-Marc Cote, Joseph Gavoille, et al. "Tunable Electrical Properties of Ti-B-N Thin Films Sputter-Deposited by the Reactive Gas Pulsing Process." Coatings 12, no. 11 (2022): 1711. http://dx.doi.org/10.3390/coatings12111711.

Full text

Abstract:

Titanium-boron-nitrogen (Ti-B-N) thin films were deposited by RF reactive magnetron sputtering using a titanium diboride (TiB2) target in an argon + nitrogen mixture. The argon mass flow rate was kept constant, whereas that of nitrogen was pulsed during the deposition. A constant pulsing period of P = 10 s was used, and the introduction time of the nitrogen gas (duty cycle (dc)) was systematically varied from dc = 0 to 100% of the pulsing period. This reactive gas pulsing process allowed the deposition of Ti-B-N thin films with various boron and nitrogen concentrations. Such adjustable concent

APA, Harvard, Vancouver, ISO, and other styles

40

Järrendahl, K., I. Ivanov, J.-E. Sundgren, G. Radnóczi, Zs Czigany, and J. E. Greene. "Microstructure evolution in amorphous Ge/Si multilayers grown by magnetron sputter deposition." Journal of Materials Research 12, no. 7 (1997): 1806–15. http://dx.doi.org/10.1557/jmr.1997.0249.

Full text

Abstract:

Microstructure evolution in amorphous Ge/Si multilayers grown by dual-target dc magnetron sputtering was investigated by cross-sectional transmission electron microscopy, x-ray diffraction, and growth simulations. In films grown under low intensity ion-irradiation conditions, the structure is columnar with low-density regions along column boundaries where layer intermixing was observed. By increasing the low-irradiation intensity (controlled by an applied negative substrate-bias), structures with smooth and well-defined layers could be grown. This was achieved at bias voltages between 80 and 1

APA, Harvard, Vancouver, ISO, and other styles

41

Murray, Jack, Wayne Huebner, Matthew J. O’Keefe, et al. "Sputter deposition of thin film MIM capacitors on LTCC substrates for RF bypass and filtering applications." International Symposium on Microelectronics 2011, no. 1 (2011): 000747–52. http://dx.doi.org/10.4071/isom-2011-wp3-paper3.

Full text

Abstract:

Thin film capacitors for RF bypass and filtering applications were sputter deposited onto low temperature co-fired ceramic (LTCC) substrates. The capacitors were configured in a metal-insulator-metal (MIM) design featuring 200 nm thick Al electrodes and a 300 nm thick Al2O3 dielectric layer, with dimensions varied between ∼150×150 μm and ∼750×750 μm. DC current-voltage measurements (E ≤ 5 MV/cm) coupled with impedance analysis (≤15 MHz) was used to characterize the resulting devices. More than 90% of the devices functioned as capacitors with high DC resistance (&gt;20 MΩ) and low loss (tan

APA, Harvard, Vancouver, ISO, and other styles

42

Auret, F. D. "Characterization of defects introduced during dc magnetron sputter deposition of Ti–W on n-Si." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 4, no. 5 (1986): 1168. http://dx.doi.org/10.1116/1.583477.

Full text

APA, Harvard, Vancouver, ISO, and other styles

43

Aoi, Takafumi, Nobuto Oka, Yasushi Sato, Ryo Hayashi, Hideya Kumomi, and Yuzo Shigesato. "DC sputter deposition of amorphous indium–gallium–zinc–oxide (a-IGZO) films with H2O introduction." Thin Solid Films 518, no. 11 (2010): 3004–7. http://dx.doi.org/10.1016/j.tsf.2009.09.176.

Full text

APA, Harvard, Vancouver, ISO, and other styles

44

Pachlhofer, Julia M., Aitana Tarazaga Martín-Luengo, Robert Franz, et al. "Non-reactive dc magnetron sputter deposition of Mo-O thin films from ceramic MoOx targets." Surface and Coatings Technology 332 (December 2017): 80–85. http://dx.doi.org/10.1016/j.surfcoat.2017.07.083.

Full text

APA, Harvard, Vancouver, ISO, and other styles

45

Selinder, T. I., G. Larsson, U. Helmersson, S. Rudner, and I. Petrov. "The dc magnetron sputter deposition process of YBa 2 Cu 3 O x thin films." Physica C: Superconductivity and its Applications 162-164 (December 1989): 599–600. http://dx.doi.org/10.1016/0921-4534(89)91166-0.

Full text

APA, Harvard, Vancouver, ISO, and other styles

46

Meng, Lingling, Qufu Wei, Yueli Li, and Wenzheng Xu. "Effects of plasma pre-treatment on surface properties of fabric sputtered with copper." International Journal of Clothing Science and Technology 26, no. 1 (2014): 96–104. http://dx.doi.org/10.1108/ijcst-06-2012-0028.

Full text

Abstract:

Purpose – In this study, the polyester fabrics were treated with low temperature plasma before Cu sputtering. The effect of oxygen gas plasma pre-treatment on the surface structures, electrical properties, and mechanical properties of samples was investigated. The paper aims to discuss these issues. Design/methodology/approach – A laboratory direct current (DC) magnetron sputter coating system was used to deposit the nanoscale copper (Cu) films onto the surface of polyester plain fabric at room temperature. Findings – The crystal structure of the sputtered copper films did not show any obvious

APA, Harvard, Vancouver, ISO, and other styles

47

Sonoda, Tsutomu, Akira Watazu, Kazumi Kato, and Tadashi Asahina. "Deposition of Sn-Al Onto Aluminum Powder in Its Self-Convective Motion by DC Sputtering." Materials Science Forum 498-499 (November 2005): 23–27. http://dx.doi.org/10.4028/www.scientific.net/msf.498-499.23.

Full text

Abstract:

The deposition of Sn-5wt.%Al alloy onto pure aluminum powder in its self-convective motion by magnetron DC sputtering was examined in order to prepare Al-Sn composite particles, aiming not only at the development of highly uniform sintered binary compact materials but also at the improvement of the bonding between the aluminum particles after sintering at low temperature such as 250°C. The self-convection phenomenon of the aluminum powder in the vacuum chamber occurred when a perpendicular vibration was applied to the powder. The sputter-deposition of the Sn-Al alloy was carried out during the

APA, Harvard, Vancouver, ISO, and other styles

48

Becerril-Gonzalez, J. J., A. M. Castro-Chong, G. Oskam, and O. Arés-Muzio. "Sputter deposition of Mo-alumina cermet solar selective coatings: Interrelation between residual oxygen incorporation, structure and optical properties." Materials Research Express 8, no. 10 (2021): 105506. http://dx.doi.org/10.1088/2053-1591/ac3042.

Full text

Abstract:

Abstract Mo/alumina cermet-based selective coatings are of great interest for concentrated solar-thermal power systems, in particular, parabolic trough collectors. We report on the sputter deposition of high-performance multilayer Mo/alumina cermet coatings on stainless steel with a solar absorptance of 94% and a thermal emittance of 8% (at 400 °C), and excellent thermal stability. The selective coatings were deposited in a 0.95 m3 sputtering chamber in order to correlate the deposition parameters, such as presence of residual gases, deposition power, and sputtering method (DC or RF), with the

APA, Harvard, Vancouver, ISO, and other styles

49

Sonoda, Tsutomu, Akira Watazu, Kiyotaka Katou, and Tadashi Asahina. "AES Studies on the Ti/N Compositionally Gradient Film Deposited onto Ti-6Al-4V Alloy by Reactive DC Sputtering." Microscopy and Microanalysis 12, no. 4 (2006): 356–61. http://dx.doi.org/10.1017/s1431927606060478.

Full text

Abstract:

Deposition of Ti/N compositionally gradient film onto Ti-6Al-4V alloy substrates was carried out by reactive DC sputtering, not only to improve the blood compatibility of the alloy but also to relax the stress concentrated at the interface between the film and the alloy substrate. The compositional gradient was realized by varying continuously the nitrogen content in Ar-N2 sputter gas during deposition. In Auger electron spectroscopy (AES) analysis, Auger spectra were acquired in the N(E) mode using the beam brightness modulation (BBM) method to overcome the problem of the peak overlap of the

APA, Harvard, Vancouver, ISO, and other styles

50

Belkind, A., W. Zhu, J. Lopez, and K. Becker. "Time-resolved optical emission spectroscopy during pulsed dc magnetron sputter deposition of Ti and TiO2thin films." Plasma Sources Science and Technology 15, no. 2 (2006): S17—S25. http://dx.doi.org/10.1088/0963-0252/15/2/s03.

Full text

APA, Harvard, Vancouver, ISO, and other styles

We offer discounts on all premium plans for authors whose works are included in thematic literature selections. Contact us to get a unique promo code!