Academic literature on the topic 'E-ALD'
Create a spot-on reference in APA, MLA, Chicago, Harvard, and other styles
Consult the lists of relevant articles, books, theses, conference reports, and other scholarly sources on the topic 'E-ALD.'
Next to every source in the list of references, there is an 'Add to bibliography' button. Press on it, and we will generate automatically the bibliographic reference to the chosen work in the citation style you need: APA, MLA, Harvard, Chicago, Vancouver, etc.
You can also download the full text of the academic publication as pdf and read online its abstract whenever available in the metadata.
Journal articles on the topic "E-ALD"
Blasco Ferrer, Eduardo. "ALI a confronto con ALD-I: Breve collaudo geolinguistico e ricostruttivo." Romance Philology 57, no. 2 (January 2004): 351–57. http://dx.doi.org/10.1484/j.rph.2.304528.
Full textFELÍCIO, JOÃO CARLOS, CARLOS EDUARDO DE OLIVEIRA CAMARGO, ROGÉRIO GERMANI, PAULO BOLLER GALLO, JAIRO LOPES DE CASTRO, and RICARDO AUGUSTO DIAS KANTHACK. "MELHORAMENTO GENÉTICO DO TRIGO: XXXII. AVALIAÇÃO DE NOVOS GENÓTIPOS DERIVADOS DO 'IAC 24' QUANTO ÀS CARACTERÍSTICAS AGRONÔMICAS E À QUALIDADE TECNOLÓGICA." Bragantia 57, no. 1 (1998): 61–80. http://dx.doi.org/10.1590/s0006-87051998000100009.
Full textBanga, Dhego, Youn-Geun Kim, and John Stickney. "PbSe∕PbTe Superlattice Formation via E-ALD." Journal of The Electrochemical Society 158, no. 2 (2011): D99. http://dx.doi.org/10.1149/1.3521463.
Full textRamasamy, Mukunthan, Chan‐Yong Jung, Yu‐Beom Yeon, and Chi‐Woo Lee. "Mo/CIGS/CdS Structures by E‐ALD." Bulletin of the Korean Chemical Society 40, no. 6 (April 29, 2019): 496–503. http://dx.doi.org/10.1002/bkcs.11711.
Full textGoebl, Hans. "Presentazione delle due parti (ALD-I e ALD-II) dell’Atlante Linguistico del Ladino Dolomitico e dei dialetti limitrofi." Romance Philology 74, no. 2 (September 2020): 245–66. http://dx.doi.org/10.1484/j.rph.5.122252.
Full textWasalathanthri, Dona Ruwani N., Yukun Gong, Monika M. Biener, Anna N. Ivanovskaya, Nikola A. Dudukovic, and Rohan Akolkar. "Adsorption-Mediated Electrochemical Atomic Layer Deposition of Gold." ECS Meeting Abstracts MA2022-01, no. 23 (July 7, 2022): 1181. http://dx.doi.org/10.1149/ma2022-01231181mtgabs.
Full textLu, Peng-Fei, Hai-Li Qiao, and You-Qing Luo. "Female Sex Pheromone Blends and Male Response of the Legume Pod Borer, Maruca vitrata (Lepidoptera: Crambidae), in Two Populations of Mainland China." Zeitschrift für Naturforschung C 68, no. 9-10 (October 1, 2013): 416–27. http://dx.doi.org/10.1515/znc-2013-9-1009.
Full textLiu, Y.-X., and X.-Z. Meng. "Identification of sex-pheromone components for Acleris fimbriana (Lepidoptera: Tortricidae)." Canadian Entomologist 134, no. 4 (August 2002): 511–18. http://dx.doi.org/10.4039/ent134511-4.
Full textToth, Julianna, Adnan A. Ismaiel, and Jiann-Shin Chen. "The ald Gene, Encoding a Coenzyme A-Acylating Aldehyde Dehydrogenase, Distinguishes Clostridium beijerinckii and Two Other Solvent-Producing Clostridia fromClostridium acetobutylicum." Applied and Environmental Microbiology 65, no. 11 (November 1, 1999): 4973–80. http://dx.doi.org/10.1128/aem.65.11.4973-4980.1999.
Full textGray, T. G., R. F. Shepherd, G. Gries, and R. Gries. "SEX PHEROMONE COMPONENT OF THE WESTERN BLACKHEADED BUDWORM, ACLERIS GLOVERANA WALSINGHAM (LEPIDOPTERA: TORTRICIDAE)." Canadian Entomologist 128, no. 6 (December 1996): 1135–42. http://dx.doi.org/10.4039/ent1281135-6.
Full textDissertations / Theses on the topic "E-ALD"
Xaba, Nqobile. "Development of Anode Materials Using Electrochemical Atomic Layer Deposition (E-ALD) for Energy Applications." University of the Western Cape, 2018. http://hdl.handle.net/11394/6390.
Full textNanomaterials have been found to undeniably possess superior properties than bulk structures across many fields of study including natural science, medicine, materials science, electronics etc. The study of nano-sized structures has the ability to address the current world crisis in energy demand and climate change. The development of materials that have various applications will allow for quick and cost effective solutions. Nanomaterials of Sn and Bi are the core of the electronic industry for their use in micro packaging components. These nanomaterials are also used as electrocatalysts in fuel cells and carbon dioxide conversion, and as electrodes for rechargeable sodium ion batteries. There are various methods used to make these nanostructures including solid state methods, hydrothermal methods, sputtering, and vacuum deposition techniques. These methods lack the ability to control the structure of material at an atomic level to fine tune the properties of the final product. This study aims to use E-ALD technique to synthesis thin films of Sn and Bi for various energy applications, and reports the use of E-ALD in battery applications for the first time. Thin films were synthesised by developing a deposition sequence and optimising this deposition sequence by varying deposition parameters. These parameters include deposition potential, and concentration of precursor solution. The thin films were characterised using cyclic voltammetry, linear sweep voltammetry, chronoamperometry for electrochemical activity. These were also characterised using scanning electron microscope for morphology, x-ray diffraction for crystal phases, energy dispersive spectroscopy for elemental mapping, and focused ion beam scanning electron microscope for thickness. The elemental content was analysed using electron probe micro analysis and inductively coupled plasma mass spectrometry. The electrochemical impedance charge and discharge profile were used for electrochemical battery tests.
Bazoni, Raniella Falchetto. "Caracterização de camadas de TiO2:Al2O3 por refletividade de raios-x." Universidade Federal de Viçosa, 2013. http://locus.ufv.br/handle/123456789/4261.
Full textCoordenação de Aperfeiçoamento de Pessoal de Nível Superior
In this work, ultra-thin layers of oxides grown using the technique of atomic layer deposition were characterized by measurements of x-ray reflectivity. TiO2:Al2O3 samples were grown using titanium isopropoxide (Ti(Hi-Pr)4), trimethylaluminum (Al(CH3)3) and water. The proportion of alumina was changed from 8 to 44% by varying the number of cycles of each precursor. TiO2:NiO samples were also grown using nickelocene (NiCp2) and water as precursors for NiO. The x-ray reflectivity measurements were performed at the Brazilian Synchrotron Light Laboratory and showed a reduction in deposition rate during growth of the TiO2:NiO series of samples, which prevented its use in the remainder of the study. The experimental data of TiO2:Al2O3 samples were analyzed using 03 simulation software: MOTOFIT, a free package designed to run on the IGOR Pro platform, and two MATHEMATICA codes; a first one based on kinematic approximation and another based in the Parrat recursion s method. The fitting procedure was based on two models: single layer, considering alumina as dopant, and multilayer, with sample composed of alternate layers of TiO2 and Al2O3. We conducted a detailed comparison of the results obtained from the softwares and models used and analyzed the influence of various parameters on the fits obtained. The fittings allowed the determination of various sample parameters, such as electron density and thickness of each layer and the roughness of the various interfaces. Comparing the software, we found that the best fits to the experimental data were obtained using the Parrat recursion s method. The multilayer model resulted in a better fit, reflecting the repetitive nature of the growth process, although the interface roughness values obtained were too large compared to layer thickness. Irrespective of software and the model used, the results show that atomic layer deposition can be used to obtain layers with controlled thickness and roughness less than 1 nm, independent of the number of cycles used in the deposition process.
Neste trabalho, camadas ultra-finas de óxidos, crescidas pela técnica de deposição por camada atômica, foram caracterizadas através de medidas de refletividade de raios-x. As amostras de TiO2:Al2O3 foram crescidas utilizando a técnica de deposição por camada atômica (ALD) usando como precursores isopropóxido de titânio (Ti(O-i-Pr)4), trimetilalumínio (Al(CH3)3) e água. A proporção de alumina foi modificada de 8 á 44%, variando a quantidade de ciclos de cada um dos precursores. Foram crescidas, também, amostras de TiO2:NiO, utilizando Niqueloceno (NiCp2) e água como precursores para NiO. As medidas de refletividade de raios-x foram realizadas nas instalações do Laboratório Nacional de Luz Síncrotron e mostraram uma redução na taxa de deposição durante o crescimento da série de amostras de TiO2:NiO, que impediu a sua utilização no restante do estudo. Os resultados experimentais das amostras de TiO2:Al2O3 foram analisados utilizando 03 softwares de simulação: MOTOFIT, um pacote livre desenvolvido para rodar na plataforma IGOR Pro, e dois códigos desenvolvidos para rodar na plataforma MATHEMATICA, o primeiro baseado na aproximação cinemática e o segundo no método de recursão de Parrat. Os ajustes das curvas experimentais foram feitos utilizando dois modelos: o de camada simples, considerando a alumina e o óxido de níquel como dopantes, e o de multicamada. Foi feita uma comparação detalhada entre os softwares e os modelos utilizados, analisando a influência dos vários parâmetros nos ajustes obtidos. Estes ajustes permitiram a determinação de diversos parâmetros característicos das amostras, tais como a espessura e a densidade eletrônica de cada camada e a rugosidade das várias interfaces. Na comparação entre os softwares, observou-se que o melhor ajuste aos dados experimentais foi obtido utilizando o método de recursão de Parrat. Em relação aos dois modelos utilizados, o de multicamada foi o que permitiu um melhor ajuste, refletindo a natureza repetitiva do processo de crescimento, apesar de fornecer valores de rugosidade das interfaces muito grande, comparados à espessura das camadas. Independente do software e do modelo utilizado, os ajustes permitem afirmar que a técnica de deposição por camada atômica permite a obtenção de camadas com espessura controlada e rugosidade menor que 1 nm, independente do número de ciclos utilizados na deposição.
Manfrim, Tarcio Pelissoni. "Um novo método para síntese de vidros fotônicos baseado na sinergia entre as técnicas VAD e ALD." [s.n.], 2011. http://repositorio.unicamp.br/jspui/handle/REPOSIP/264781.
Full textDissertação (mestrado) - Universidade Estadual de Campinas, Faculdade de Engenharia Mecânica
Made available in DSpace on 2018-08-17T18:43:06Z (GMT). No. of bitstreams: 1 Manfrim_TarcioPelissoni_M.pdf: 2213852 bytes, checksum: 20f8b76513e6d5acf1ec8af66bed9951 (MD5) Previous issue date: 2011
Resumo: Este trabalho visou estabelecer um novo método para síntese de vidros fotônicos através da sinergia das técnicas "Vapor-phase Axial Deposition" (VAD) e "Atomic Layer Deposition" (ALD), tendo como intuito obter um material completamente transparente, contendo uma distribuição uniforme do elemento dopante tanto na posição radial como axial. Na primeira etapa deste trabalho foi projetado, construído e testado um reator ALD de nível laboratorial adaptado à dopagem de preformas porosas VAD. A etapa subseqüente contou com a fabricação de preformas porosas de sílica pura através da técnica VAD, dopagem com titânia via técnica ALD e consolidação em forno elétrico para obtenção do material vítreo final. Foi estudado o efeito da variação dos parâmetros dos processos VAD e ALD sobre as propriedades estruturais e ópticas do material. As propriedades estruturais foram caracterizadas através das técnicas de espectrometria de fluorescência de raios-X, difração de raios-X e espectroscopia Raman. As propriedades ópticas foram determinadas pela técnica de espectrofotometria de absorção óptica. Maiores uniformidades do dopante (TiO2) foram alcançadas através das dopagens realizadas sob altas temperatura, uma vez que era possível evitar o efeito de condensação dos precursores. Além disso, preformas porosas de maior densidade média apresentaram uma maior tendência a formação de um perfil mais constante de dopagem. Para as amostras dopadas a 90°C, a taxa de dopagem estimada foi de aproximadamente 0,75 % em massa de TiO2/ciclo para os 4 primeiros ciclos. As amostras de SiO2-TiO2 apresentaram uma transmitância óptica máxima na região do infravermelho e visível muito semelhante a da sílica pura, sofrendo um absorção abrupta próximo a faixa do ultravioleta devido a formação de átomos de titânio com valência 4+
Abstract: This study aimed to establish a new method for synthesis of photonic glasses through the synergy of Vapor-phase Axial Deposition (VAD) and Atomic Layer Deposition (ALD) techniques. Having the intention to obtain a completely transparent material containing a uniform distribution of dopant element both radial and axial position. In the first stage of this study it was designed, built and tested an ALD reactor of laboratory scale appropriate for doping of VAD porous preforms. The subsequent stage included the manufacture of pure silica porous preform by VAD technique, doping with titania by ALD technique and consolidation in an electric furnace to obtain the final material in glassy state. The effect of variation of parameters of VAD and ALD processes on structural and optical properties of the material was studied. The structural properties were characterized by X-ray fluorescence spectrometry, X-ray diffraction and Raman spectroscopy. The optical properties were determined using optical absorption spectroscopy. Greater uniformity of the dopant (TiO2) have been achieved through doping carried out under high temperature, since it was possible to avoid the effect of condensation of the precursors. Furthermore, porous preforms with higher average density showed a greater tendency to form a more constant doping profile. For samples doped at 90 °C, the doping rate was approximately 0.75 wt% of TiO2/cycle for the first 4 ALD cycles. Samples of SiO2-TiO2 showed a maximum optical transmittance in the infrared and visible very similar to that of pure silica, suffering an abrupt absorption near the UV range due to formation of titanium atoms with valence 4+
Mestrado
Materiais e Processos de Fabricação
Mestre em Engenharia Mecânica
Schäfer, Christian Martin. "Towards organic-inirganic hybrid thin films deposited by ALD/MLD." Master's thesis, Universidade de Aveiro, 2017. http://hdl.handle.net/10773/22267.
Full textA técnica de deposição por camada atómica (ALD) permite a deposição de filmes finos em fase de vapor de alta qualidade com um controlo de espessura à nano-escala. No presente trabalho foi demonstrado a deposição de filmes finos de óxido de zinco (ZnO) por ALD de elevada uniformidade em diferentes substratos, incluído nano-estruturas como por exemplo, nanotubos de carbono. Demonstrou-se por difracção de raio-X que o processo de deposição do ZnO originou a formação da estrutura da hexagonal, na fase wurtzite, com uma taxa de crescimento por ciclo de 1.9 Å. A deposição de filmes finos de natureza inorgânica (e.g. óxidos metálicos) por ALD está bem estabelecida contrariamente à emergente deposição por camada molecular (MLD) de filmes finos puramente orgânicos. Actualmente, a combinação de ALD/MLD começa a ganhar importância na criação de estruturas híbridas do tipo orgânica-inorgânicas. Nomeadamente, através da selecção adequada dos precursores, é possível obter diferentes arquitecturas funcionais em forma de filme fino, incluindo nano-laminados, superestruturas e redes metalo-orgânicas (MOFs) nano-porosas. A deposição de MOFs por ALD/MLD surge como uma alternativa para superar as desvantagens dos métodos convencionais de deposição de filmes finos baseados em soluções. Este trabalho contempla também a revisão da literatura no que diz respeito à síntese de este tipo de filmes finos obtidos em fase de vapor. Procedeu-se à reprodução dos resultados da literatura tendo como objectivo a síntese de filmes finos híbridos orgânico-inorgânicos (e.g. MOFs). Numa primeira fase efectuou-se a transformação vapor-sólido de um filme de ZnO crescido por ALD por exposição ao vapor de 2-metilimidazol. Posteriormente usou-se um processo ALD/MLD com o propósito de depositar uma estrutura do tipo zeólito (ZIF-8) a partir da reacção do dietilzinco (DEZ) e o 2-metilimidazol. Finalmente realizou-se a síntese de dois sistemas de filmes finos híbridos com base no ácido tereftálico como precursor orgânico e os seguintes precursores organometálicos: DEZ e Eu(TMHD)3. Para o caso do sistema DEZ/TPA, a formação da ligação Zn-TP nos filmes híbridos, foi observada por espectroscopia de FTIR
Atomic layer deposition is a state-of-the-art vapor phase deposition method for the creation of high quality thin films with nanoscale thickness control. As demonstrated in this work by the deposition of ZnO with a home-built reactor, ALD enables uniform and conformal film deposition even on complex nanostructures like carbon nanotubes. Deposition of hexagonal wurtzite ZnO proven by GIXRD with a growth-per-cycle of 1.9 Å, determined from XRR thickness measurements, was demonstrated. While the ALD synthesis of inorganic thin films, such as metal oxides is widely established, the organic counterpart molecular layer deposition (MLD) is still emerging. Recently, combining ALD/MLD has attracted great interest for the creation of organic-inorganic hybrid structures. By choice and adaptation of suitable precursors a great versatility of functional thin film architectures is achievable, spanning from novel multilayer nanolaminates and superstructures for thermoelectrics, over luminescent lanthanide hybrid films for optical application to even crystalline, nanoporous metal-organic frameworks (MOFs) as low-κ dielectrics in microdevices. Especially in the field of MOFs, a clean and precise synthesis route by ALD/MLD is desirable for device implementation in order to overcome the drawbacks of conventional, solution-based thin film deposition techniques. In this work, recent advances towards these vapor-processed hybrids are reviewed. Then, the reproduction of literature results leading to the deposition of organic-inorganic hybrid thin films (e.g. MOFs) was studied. The feasibility of a vapor-solid transformation of a sacrificial ALD-grown ZnO film by exposure to 2-methylimidazole (HMIM) and a direct ALD/MLD method using HMIM and diethylzinc (DEZ) towards a zeolitic imidazole framework (ZIF-8) have been attempted. Finally, the synthesis of two different hybrid films was studied involving the organic precursor terephthalic acid (TPA) combined with the organometallic precursors DEZ or Eu(TMHD)3. In case of the DEZ/TPA system, the deposition of a hybrid thin film with Zn-terephthalate bondings was evidenced by FTIR spectroscopy.
Acauan, Luiz Henrique. "Síntese de estruturas 3D de nanotubos de carbono verticalmente alinhados, dopados e não-dopados, decorados com nanopartículas de óxido de titânio, sua caracterização microestrutural e de propriedades fotocatalíticas e elétricas." reponame:Biblioteca Digital de Teses e Dissertações da UFRGS, 2015. http://hdl.handle.net/10183/153303.
Full textIn this work, we propose an experimental procedure for fabrication of 3D carbon nanotubes structures anchored with titanium oxide particles, on a copper substrate. We correlate three different types of CNTs from this structure (pristine, doped with nitrogen and treated with plasma) with the deposition of TiO2 by ALD. It was yet suggested, three applications for this structure. The synthesis of vertically aligned CNTs, doped and undoped, was optimized among several synthesis parameters such as temperature, oxidizing agent and specially, the catalyst film. The introduction of defects in NTCP by oxidative plasma treatment was evaluated against variables such as pressure, power and exposure time. The association between the defects from these three types of CNTs and the deposition of TiO2 by ALD was assessed by transmission microscopy, Raman, XPS and TGA. The experimental procedure for assembling the 3D structure had been studied step by step by various techniques, from chemical and imaging, up to empirical testing. In the final structure, the photocatalytic properties were evaluated by the organic dye decomposition in an aqueous medium, capacitive properties by cyclic voltammetry and field emission properties through electric field versus emission current curves and F-N diagram. Was obtained high quality NTCs with a height up to 0.5mm with regular diameters and number of walls. On these, it was introduced, in a controllable way, a high amount of defects without jeopardizing the forest structure. The NTCNx forest reach a 0,3nm height with a 2% nitrogen concentration in its typical structure “bamboo-like”. The results show the relation between the type of defect and the deposition of TiO2 by ALD, forming crystalline particles over the NTCP and NTCNx, in this last evenly distributed with uniform size, while on the NTCOx is is formed a dense TiO2 layer shaped by large monocrystalline grains. By process such as heat treatments and CNT transferring was achieved a 3d structure composed by a graphitic carbon layer and VACNTs over a cupper substrate, without disturb the forest assembly. The samples showed electron field emission effect, but its assessment for quantitative analysis was limited to technical issues. The photocatalysis tests showed that immobilization of TiO2 on a dense support prevents the dye degradation in an aqueous medium. The NTCNx shown higher capacitance than NTCP, and the TiO2 was apparently ineffective for improvement of this property.
Schlenk, Sonya. "E-Learning als Bestandteil einer E-Business-Strategie." [S.l. : s.n.], 2003. http://www.bsz-bw.de/cgi-bin/xvms.cgi?SWB11675849.
Full textDye, Charles Eugene. "Now and all are important a post-structural critique of humanism, Aldo Leopold's "The Land Ethic," and Disney/Pixar's "Wall-E" /." Thesis, Montana State University, 2008. http://etd.lib.montana.edu/etd/2008/dye/DyeC1208.pdf.
Full textGubitosi, Viviana. "Alg??bres d??riv??es ??quivalentes ?? des alg??bres inclin??es m-amass??es aimables." Thèse, Universit?? de Sherbrooke, 2014. http://savoirs.usherbrooke.ca/handle/11143/71.
Full textMeyer, Sindy. "E-Collaboration als Erfolgspotenzial Grundlagen, Strategien und Prozesse." Saarbrücken VDM, Müller, 2004. http://deposit.d-nb.de/cgi-bin/dokserv?id=2880137&prov=M&dok_var=1&dok_ext=htm.
Full textValido, Vasco Neves da Silva Simões. "Gestão de activos e passivos (ALM) no BES." Master's thesis, Instituto Superior de Economia e Gestão, 2012. http://hdl.handle.net/10400.5/10308.
Full textAs instituições financeiras deparam-se com o problema de correctamente alocar e gerir os recursos que dispõem em aplicações que maximizem a sua rendibilidade. Fazê-lo tendo em conta os riscos inerentes a essa premissa é uma das missões primordiais da área de gestão de activos e passivos de uma instituição ou Asset-Liability Management (ALM). Os riscos evocados anteriormente são genericamente o risco de liquidez, de taxa de juro, de crédito e mercado, sendo os dois primeiros os mais relevantes para a área anteriormente definida tendo em conta o impacto que estes podem ter tanto na margem financeira como na própria solvabilidade da instituição. Em suma, visto que a minha formação se centrou na área financeira, mais propriamente nas instituições financeiras, e tendo em conta a conjuntura actual que o sistema financeiro está a ser alvo, decidi ingressar num estágio numa área de ALM por forma a apreender como se efectua esta gestão e monitorização de risco numa instituição bancária portuguesa.
Financial institutions face many issues when they need to allocate their assets and resources properly to maximize their profit. Doing this regarding the associated risks is one of the main purposes of the ALM Desk. The risks highlighted before are mainly Liquidity risk, Interest Rate risk, Market risk and Credit risk, the former being the most important to the ALM monitoring process. This happens since the first two are, considering the ALM point-of-view, the risks that can more easily cause changes on the financial margin and the institutions solvability. In short, since my academic background lies on Financial Institutions management I?ve decide to do an internship in this same area in order to learn and understand this process of risk management and monitoring in a Portuguese financial institution.
Books on the topic "E-ALD"
author, Storti Giovanni, Poretti Giacomo author, and Brambilla Michele 1958 editor, eds. Tre uomini e una vita: La nostra (vera) storia raccontata per la prima volta. Milano: Mondadori, 2016.
Find full textgraphou, Lile Zo. E gynaika sou e ale tissa: Mythistore ma. 4th ed. Athe na: Gramme, 1985.
Find full textJarchavi, S. R. R. Malood-e-haram maula Ali. Karachi: Idara tarvij soz khwani, 2001.
Find full textGiornata, di studi su Aldo Capasso (2003 Venice Italy). Aldo Capasso: Critica e poesia. Venezia: Granviale, 2008.
Find full texteditor, Tega Eleonora, Tega Francesca editor, and Galleria Tega, eds. Aldo Mondino: Tappeti e quadrettature. Milano: Tega arte moderna e contemporanea, 2015.
Find full textCrespi, Stefano. Aldo Ferrario: "artista e modella". Lugano-Viganello [Switzerland]: Edizioni Colomba, 2001.
Find full textCarlo, Dionisotti. Aldo Manuzio: Umanista e editore. Milano: Edizioni Il polifilo, 1995.
Find full textBook chapters on the topic "E-ALD"
Stickney, John. "Semiconductors, Electrochemical Atomic Layer Deposition (E-ALD)." In Encyclopedia of Applied Electrochemistry, 1947–53. New York, NY: Springer New York, 2014. http://dx.doi.org/10.1007/978-1-4419-6996-5_31.
Full textNowlan, Robert A. "All About ‘e’ (Well, Almost All)." In Masters of Mathematics, 19–34. Rotterdam: SensePublishers, 2017. http://dx.doi.org/10.1007/978-94-6300-893-8_2.
Full textBaker, Donna L. "All about E-Books." In Adobe Acrobat 5: The Professional User’s Guide, 363–92. Berkeley, CA: Apress, 2002. http://dx.doi.org/10.1007/978-1-4302-1100-6_13.
Full textWurm, Christiane. "E-Mails als Geschäftsbriefersatz." In Die erfolgreichsten Geschäftsbriefe, 435–40. Wiesbaden: Gabler Verlag, 2002. http://dx.doi.org/10.1007/978-3-322-92982-2_19.
Full textStrzyzewski, Frank, and Charlotte Karpa-Tovar. "E-Mail als Marketinginstrument." In Generierung von qualifizierten E-Mail-Adressen, 19–39. Wiesbaden: Springer Fachmedien Wiesbaden, 2019. http://dx.doi.org/10.1007/978-3-658-26755-1_1.
Full textReitz, Sandra. "Menschenrechtsbildung als e-Learning." In Menschenrechtsbildung, 265–78. Wiesbaden: VS Verlag für Sozialwissenschaften, 2004. http://dx.doi.org/10.1007/978-3-322-81001-4_22.
Full textHeckmann, Dirk. "E-Justice als Motor für E-Government." In E-Government, 93–111. Wiesbaden: Gabler, 2010. http://dx.doi.org/10.1007/978-3-8349-6343-7_5.
Full textLütters, Holger, Martin Eisend, and Pakize Schuchert-Güler. "Online-Marktforschung als E-Service." In Electronic Services, 613–38. Wiesbaden: Gabler Verlag, 2002. http://dx.doi.org/10.1007/978-3-8349-4418-4_25.
Full textBuschor, Ernst. "E-Learning als notwendige Kernkompetenz." In The Digital Economy — Anspruch und Wirklichkeit, 353–62. Berlin, Heidelberg: Springer Berlin Heidelberg, 2004. http://dx.doi.org/10.1007/978-3-642-17032-4_24.
Full textWarschburger, Volker, and Christian Jost. "Die Produktpolitik als E-Marketinginstrument." In Nachhaltig erfolgreiches E-Marketing, 60–116. Wiesbaden: Vieweg+Teubner Verlag, 2001. http://dx.doi.org/10.1007/978-3-322-90293-1_4.
Full textConference papers on the topic "E-ALD"
Tanneeru, Akhilesh, Bongmook Lee, and Veena Misra. "Building Blocks of a New ALD E-Nose - A First Step: N-Type and P-Type ALD Sensors." In 2018 IEEE Sensors. IEEE, 2018. http://dx.doi.org/10.1109/icsens.2018.8589752.
Full textChoe, Jeong-Dong, Se-Hoon Lee, Young Joon Ahn, Donghoon Jang, Young-Bae Yoon, Jong Jin Lee, Ilsub Chung, Kyucharn Park, and Donggun Park. "Hybrid ALD-SiN/Si-nanocrystals/ALD-SiN FinFET device with large P/E window for MLC NAND Flash memory application." In 2007 65th Annual Device Research Conference. IEEE, 2007. http://dx.doi.org/10.1109/drc.2007.4373724.
Full textXuan, Y., T. Shen, Y. Q. Wu, M. Xu, and P. D. Ye. "High-performance Inversion-type E-mode In0.65Ga0.35As MOSFETs with ALD HfO2 as Gate Dielectric." In 2008 66th Annual Device Research Conference (DRC). IEEE, 2008. http://dx.doi.org/10.1109/drc.2008.4800725.
Full textCARINA DOS SANTOS CARVALHO, JULIA, FRANCISCO DAS CHAGAS MARQUES, and Rafael Merlo. "Caracterização de TiO2 compacto depositado por ALD através de difração de raios-x e espectroscopia UV-VIS-NIR." In XXV Congresso de Iniciação Cientifica da Unicamp. Campinas - SP, Brazil: Galoa, 2017. http://dx.doi.org/10.19146/pibic-2017-78704.
Full textVizotto, Iara Desiree, Juliana da Cruz Nunes Silva, Maryellen Orbolato Patussi, Luiza Mahiara Calixto Zussa, and Paulo Giovani Padilha dos Santos. "DOENÇA HEPÁTICA ALCOÓLICA." In I Congresso Brasileiro de Saúde Pública On-line: Uma abordagem Multiprofissional. Revista Multidisciplinar em Saúde, 2021. http://dx.doi.org/10.51161/rems/2820.
Full textTanneeru, Akhilesh, Fatma P. Akbulut, Bongmook Lee, and Veena Misra. "A novel monolithic array of multiple metal oxide sensors for E-Nose applications via selective on-chip annealing of nanolayered ALD stacks." In 2019 IEEE SENSORS. IEEE, 2019. http://dx.doi.org/10.1109/sensors43011.2019.8956877.
Full textWu, Tian-Li, Denis Marcon, Brice De Jaeger, Marleen Van Hove, Benoit Bakeroot, Steve Stoffels, Guido Groeseneken, Stefaan Decoutere, and Robin Roelofs. "Time dependent dielectric breakdown (TDDB) evaluation of PE-ALD SiN gate dielectrics on AlGaN/GaN recessed gate D-mode MIS-HEMTs and E-mode MIS-FETs." In 2015 IEEE International Reliability Physics Symposium (IRPS). IEEE, 2015. http://dx.doi.org/10.1109/irps.2015.7112769.
Full textChowdhury, Aminur Rashid, Ting Shan Luk, and Tanya Hutter. "Plasmonic gold nanoisland on TiO2: effect of dewetting temperature." In Frontiers in Optics. Washington, D.C.: Optica Publishing Group, 2022. http://dx.doi.org/10.1364/fio.2022.jw5a.20.
Full textHayashida, T., K. Endo, Y. X. Liu, S. O'uchi, T. Matsukawa, W. Mizubayashi, S. Migita, et al. "Performance and Variability Comparisons between ALD- and PVD-TiN Gate FinFET." In 2011 International Conference on Solid State Devices and Materials. The Japan Society of Applied Physics, 2011. http://dx.doi.org/10.7567/ssdm.2011.e-9-3.
Full textMorita, Y., S. Migita, W. Mizubayashi, and H. Ota. "Extremely scaled (~0.2 nm) equivalent oxide thickness of higher-k ALD-HfO2 gate stacks." In 2011 International Conference on Solid State Devices and Materials. The Japan Society of Applied Physics, 2011. http://dx.doi.org/10.7567/ssdm.2011.e-9-4l.
Full textReports on the topic "E-ALD"
Rittmeier, Aaron. Die EU-Taxonomie als Webereiter für Nachhaltig(er)e Chemie? Sonderforschungsgruppe Institutionenanalyse, 2021. http://dx.doi.org/10.46850/sofia.9783941627963.
Full textSalisbury, M. L. The Specialist vs. Corporal: All E-4s Are Not the Same. Fort Belvoir, VA: Defense Technical Information Center, February 2005. http://dx.doi.org/10.21236/ada509354.
Full textAvery, M. P. Vitrinite reflectance data for Chevron et al Hopedale E-33. Natural Resources Canada/ESS/Scientific and Technical Publishing Services, 2008. http://dx.doi.org/10.4095/224748.
Full textSalazar, Lina, and Gonzalo Muñoz. Garantizando la seguridad alimentaria en ALC en el contexto del COVID-19: Retos e intervenciones. Inter-American Development Bank, June 2020. http://dx.doi.org/10.18235/0002396.
Full textMcCallum, Bennett. The Unique Minimum State Variable RE Solution is E-Stable in All Well Formulated Linear Models. Cambridge, MA: National Bureau of Economic Research, September 2003. http://dx.doi.org/10.3386/w9960.
Full textAvery, M. P. Vitrinite Reflectance (Ro) of Dispersed Organics From Husky-Bow Valley et al, Trave E-87. Natural Resources Canada/ESS/Scientific and Technical Publishing Services, 1988. http://dx.doi.org/10.4095/130503.
Full textAvery, M. P. Vitrinite reflectance (Ro) of dispersed organic matter from Mobil et al. Linnet E-63, offshore Newfoundland. Natural Resources Canada/ESS/Scientific and Technical Publishing Services, 2002. http://dx.doi.org/10.4095/213217.
Full textVerkerk, Pieter Johannes, Philippe Delacote, Elias Hurmekoski, Janni Kunttu, Robert Matthews, Raisa Mäkipää, Fredric Mosley, et al. In che modo le foreste e l'uso del legno possono contribuire al conseguimento degli obiettivi climatici? European Forest Institute, March 2023. http://dx.doi.org/10.36333/pb2it.
Full textBishop, Stephanie, and Juliana Corrêa. Principais considerações: Engajamento dos jovens na américa latina e no caribe na resposta à COVID-19. SSHAP, July 2022. http://dx.doi.org/10.19088/sshap.2022.033.
Full textIregui-Bohórquez, Ana María, Ligia Alba Melo-Becerra, María Teresa Ramírez-Giraldo, and Ana María Tribín-Uribe. Determinantes del acceso al crédito formal e informal : evidencia de los hogares de ingresos medios y bajos en Colombia. Bogotá, Colombia: Banco de la República, August 2016. http://dx.doi.org/10.32468/be.956.
Full text