Relevant bibliographies by topics / E-etching

Contents

  1. Journal articles
  2. Dissertations / Theses
  3. Books
  4. Book chapters
  5. Conference papers

Academic literature on the topic 'E-etching'

Author: Grafiati
Published: 4 June 2021
Last updated: 12 February 2022

Create a spot-on reference in APA, MLA, Chicago, Harvard, and other styles

Select a source type:

Consult the lists of relevant articles, books, theses, conference reports, and other scholarly sources on the topic 'E-etching.'

Next to every source in the list of references, there is an 'Add to bibliography' button. Press on it, and we will generate automatically the bibliographic reference to the chosen work in the citation style you need: APA, MLA, Harvard, Chicago, Vancouver, etc.

You can also download the full text of the academic publication as pdf and read online its abstract whenever available in the metadata.

Journal articles on the topic "E-etching"

1

Zunic, Zora, Predrag Ujic, Igor Celikovic, and Kenzo Fujimoto. "ECE laboratory in the Vinca institute: Its basic characteristics and fundamentals of electrochemic etching on polycarbonate." Nuclear Technology and Radiation Protection 18, no. 2 (2003): 57–60. http://dx.doi.org/10.2298/ntrp0302057z.

Full text
Abstract:
This paper deals with the introductory aspects of the Electrochemical Etching Laboratory installed at the VINCA Institute in the year 2003. The main purpose of the laboratory is its field application for radon and thoron large-scale survey using passive radon/thoron UFO type detectors. Since the etching techniques together with the laboratory equipment were transferred from the National Institute of Radiological Sciences, Chiba, Japan, it was necessary for both etching conditions to be confirmed and to be checked up^ i. e., bulk etching speeds of chemical etching and electrochemical etching in
APA, Harvard, Vancouver, ISO, and other styles
2

Yamada, Tomoya, Ryoichi Inanami, and Shinzo Morita. "Polyimide transmitted E-beam excited CF4 plasma etching." Thin Solid Films 316, no. 1-2 (1998): 13–17. http://dx.doi.org/10.1016/s0040-6090(98)00380-0.

Full text
APA, Harvard, Vancouver, ISO, and other styles
3

Rogozhin, A., M. Bruk, E. Zhikharev, D. Streltsov, A. Spirin, and J. Hramchihina. "Dry e-beam etching of resist for optics." Journal of Physics: Conference Series 741 (August 2016): 012115. http://dx.doi.org/10.1088/1742-6596/741/1/012115.

Full text
APA, Harvard, Vancouver, ISO, and other styles
4

Jeon, Bo-Kyung, Chang-Ha Lee, A. Reum Kim, et al. "Effect of Etching Procedures on the Adhesion of Biofilm-Coated Dentin." Materials 13, no. 12 (2020): 2762. http://dx.doi.org/10.3390/ma13122762.

Full text
Abstract:
Oral biofilms coat all surfaces in the oral cavity including the exposed dentin surface. This study aimed to investigate biofilm removal by acid etching procedures and the effects of the residual biofilm on dentin surfaces on composite–dentin adhesion. Dentin discs were assigned to five groups: no biofilm formation (C); biofilm formation and no surface treatment (BF); biofilm formation and acid etching (BF-E); biofilm formation and acid etching followed by chlorhexidine soaking (BF-EC); and biofilm formation and rubbing with pumice, followed by acid etching (BF-RE). Biofilms were formed on sal
APA, Harvard, Vancouver, ISO, and other styles
5

Wu, Hsing Chen, Sheng Hung Tu, Min Chieh Yang, and Emanuel Cooper. "Selective Etching of Silicon Oxide versus Nitride with Low Oxide Etching Rate." Solid State Phenomena 255 (September 2016): 75–80. http://dx.doi.org/10.4028/www.scientific.net/ssp.255.75.

Full text
Abstract:
This paper describes both aqueous and solvent-based formulations aimed at etching silicon oxide (SiOx) with etching rates (E/R) of the order of 10-20 A/min with selectivity greater than 5 with respect to silicon nitride (SiNx) . Diluted hydrofluoric acid (dHF) with very low pH was tried first but the selectivity was found to increase only with higher SiOx E/R. Solvent-based formulations derived from previous work also behaved in a similar way, however its SiOx E/R could be reduced by modifying the total fluoride concentration inside formulation. Finally, we found that low SiOx E/R could also b
APA, Harvard, Vancouver, ISO, and other styles
6

Ivantsov, Vladimir, and Anna Volkova. "A Comparative Study of Dislocations in HVPE GaN Layers by High-Resolution X-Ray Diffraction and Selective Wet Etching." ISRN Condensed Matter Physics 2012 (August 30, 2012): 1–6. http://dx.doi.org/10.5402/2012/184023.

Full text
Abstract:
It has been shown during the present study that the E-etching at elevated temperatures can be adopted for the dislocation etching in hydride vapor-phase epitaxy (HVPE) GaN layers. It has been found that the X-ray diffraction (XRD) evaluation of the dislocation density in the thicker than 6 μm epilayers using conventional Williamson-Hall plots and Dunn-Koch equation is in an excellent agreement with the results of the elevated-temperature E-etching. The dislocation distribution measured for 2-inch GaN-on-sapphire substrate suggests strongly the influence of the inelastic thermal stresses on the
APA, Harvard, Vancouver, ISO, and other styles
7

Zogheib, Lucas Villaça, Alvaro Della Bona, Estevão Tomomitsu Kimpara, and John F. Mccabe. "Effect of hydrofluoric acid etching duration on the roughness and flexural strength of a lithium disilicate-based glass ceramic." Brazilian Dental Journal 22, no. 1 (2011): 45–50. http://dx.doi.org/10.1590/s0103-64402011000100008.

Full text
Abstract:
The aim of this study was to examine the effect of different acid etching times on the surface roughness and flexural strength of a lithium disilicate-based glass ceramic. Ceramic bar-shaped specimens (16 mm x 2 mm x 2 mm) were produced from ceramic blocks. All specimens were polished and sonically cleaned in distilled water. Specimens were randomly divided into 5 groups (n=15). Group A (control) no treatment. Groups B-E were etched with 4.9% hydrofluoric acid (HF) for 4 different etching periods: 20 s, 60 s, 90 s and 180 s, respectively. Etched surfaces were observed under scanning electron m
APA, Harvard, Vancouver, ISO, and other styles
8

Sponchiado, Adriane Regina, Afonso E. Wunderlich Júnior, Paulo Sérgio Galletta, and Murilo Rosa. "Avaliação do uso do Self Etching Primer na colagem de braquetes ortodônticos metálicos." Revista Dental Press de Ortodontia e Ortopedia Facial 10, no. 3 (2005): 66–74. http://dx.doi.org/10.1590/s1415-54192005000300008.

Full text
Abstract:
Nesta pesquisa laboratorial foi avaliada a resistência de união ao cisalhamento de braquetes metálicos colados ao esmalte dentário bovino, utilizando um sistema adesivo convencional, composto de ácido fosfórico + primer + resina adesiva, e de um sistema SEP (self-etching primer) que combina ácido e primer em uma única solução, avaliado em ambiente seco e úmido (com água). Quarenta e oito incisivos inferiores bovinos foram divididos em três grupos de 16 unidades, que foram assim preparados: grupo 1 (controle) ácido fosfórico 37% + primer + resina Transbond XT; o grupo 2 Transbond Plus Self Etch
APA, Harvard, Vancouver, ISO, and other styles
9

Li, Zhong Yang, Zhao Yang Zhang, Yao Min Wang, and Wei Ping Mao. "Stress-Etching Using Laser Electrochemical Micromachining with Masks." Applied Mechanics and Materials 268-270 (December 2012): 468–72. http://dx.doi.org/10.4028/www.scientific.net/amm.268-270.468.

Full text
Abstract:
Metal workpiece was processed by nanosecond pulsed laser electrochemical micro-etching with masks patterns in the shape of letter "E". In the experimental system established, the effect of different laser energy on processing quality was studied in air. In the different concentrations of the electrolyte, through optimized composite machining parameters, machining results of different laser energy with the masks were analyzed and compared in Aluminum alloy and Stainless steel. There was a large of difference in machining morphology by laser electrochemical micromachining with masks in two diffe
APA, Harvard, Vancouver, ISO, and other styles
10

Schwimmer, Yair, Nurit Beyth, Diana Ram, Eitan Mijiritsky, and Esti Davidovich. "Laser Tooth Preparation for Pit and Fissure Sealing." International Journal of Environmental Research and Public Health 17, no. 21 (2020): 7813. http://dx.doi.org/10.3390/ijerph17217813.

Full text
Abstract:
Objectives: Various approaches are available for pit and fissure sealing, including: the use of sealants, with or without mechanical preparation; the use of etching, with or without bonding; and the use of lasers as an alternative to mechanical preparation. The objective of this study is to evaluate pit and fissure sealing by comparing the retention and microleakage of sealants, between mechanical and Er:Yag laser enamel preparation. Methods: Sixty extracted sound third molars are classified into six groups: A, bur mechanical preparation and sealant application; B, bur mechanical preparation,
APA, Harvard, Vancouver, ISO, and other styles
More sources

Dissertations / Theses on the topic "E-etching"

1

Orf, Bryan J. "Comparison of advanced resist etching In e-beam generated plasmas." College Park, Md. : University of Maryland, 2006. http://hdl.handle.net/1903/3660.

Full text
Abstract:
Thesis (M.S.) -- University of Maryland, College Park, 2006.<br>Thesis research directed by: Dept. of Materials Science and Engineering. Title from t.p. of PDF. Includes bibliographical references. Published by UMI Dissertation Services, Ann Arbor, Mich. Also available in paper.
APA, Harvard, Vancouver, ISO, and other styles
2

Macedo, Maria Gracinda Ferreira Pereira de. "Integridade da camada de adesivo em diferentes áreas topográficas da dentina, utilizando sistemas de adesão de total ecthing e self-etching." Dissertação, Faculdade de Medicina Dentária da Universidade do Porto, 2009. http://hdl.handle.net/10216/61052.

Full text
APA, Harvard, Vancouver, ISO, and other styles
3

Macedo, Maria Gracinda Ferreira Pereira de. "Integridade da camada de adesivo em diferentes áreas topográficas da dentina, utilizando sistemas de adesão de total ecthing e self-etching." Master's thesis, Faculdade de Medicina Dentária da Universidade do Porto, 2009. http://hdl.handle.net/10216/61052.

Full text
APA, Harvard, Vancouver, ISO, and other styles
4

Saavedra, Guilherme de Siqueira Ferreira Anzaloni. "Efeito da neutralização e limpeza sônica do precipitado do ácido fluorídrico sobre a resistência de união entre uma cerâmica feldspática e um cimento resinoso /." São José dos Campos : [s.n.], 2006. http://hdl.handle.net/11449/97416.

Full text
Abstract:
Orientador: Estevão Tomomitsu Kimpara<br>Banca: Rander Pereira Avelar<br>Banca: Tarcisio José de Arruda Paes<br>Resumo: O objetivo deste trabalho foi avaliar três hipóteses: a) o processo de neutralização influencia nos valores de resistência de união entre uma cerâmica feldspática e um cimento resinoso; b) limpeza sônica dos precipitados do ácido fluorídrico aumenta os valores de resistência de união; c) associação entre o do processo de neutralização e a limpeza sônica melhora a resistência de união. Confeccionou-se 32 blocos cerâmicos (VM7 VITA Zahnfabrik), os quais foram duplicados em resi
APA, Harvard, Vancouver, ISO, and other styles
5

Camargo, Janine Sanches Gonzaga de. "Modificação da molhabilidade da celulose por processos subsequentes de ablação e deposição a plasma." Universidade Federal de São Carlos, 2017. https://repositorio.ufscar.br/handle/ufscar/9001.

Full text
Abstract:
Submitted by Milena Rubi (milenarubi@ufscar.br) on 2017-08-16T16:54:47Z No. of bitstreams: 1 CAMARGO_Janine_2017.pdf: 19878018 bytes, checksum: 517c1918bf6801b10fe87b0d806d8a50 (MD5)<br>Approved for entry into archive by Milena Rubi (milenarubi@ufscar.br) on 2017-08-16T16:55:38Z (GMT) No. of bitstreams: 1 CAMARGO_Janine_2017.pdf: 19878018 bytes, checksum: 517c1918bf6801b10fe87b0d806d8a50 (MD5)<br>Approved for entry into archive by Milena Rubi (milenarubi@ufscar.br) on 2017-08-16T16:55:44Z (GMT) No. of bitstreams: 1 CAMARGO_Janine_2017.pdf: 19878018 bytes, checksum: 517c1918bf6801b10fe87b0d
APA, Harvard, Vancouver, ISO, and other styles
6

Azevedo, Paola Cristine Almeida. "Gravura em luz : uma possibilidade holistica da calcogravura e a holografia." [s.n.], 2007. http://repositorio.unicamp.br/jspui/handle/REPOSIP/284315.

Full text
Abstract:
Orientador: Jose Joaquim Lunazzi<br>Tese (doutorado) - Universidade Estadual de Campinas, Instituto de Artes<br>Made available in DSpace on 2018-08-10T03:37:00Z (GMT). No. of bitstreams: 1 Azevedo_PaolaCristineAlmeida_D.pdf: 3042587 bytes, checksum: 6e2407a885f75cbe4b90031a1cadd1f1 (MD5) Previous issue date: 2007<br>Resumo: Esta pesquisa objetivou criar e refletir sobre o alargamento de linguagens usadas na arte e a tecnologia como parâmetros de criação de um trabalho em poéticas visuais. Para estruturar esses conceitos, foram levantadas leituras referentes à mudança paradigmática da segunda
APA, Harvard, Vancouver, ISO, and other styles
7

Coppini, Erick Kamiya 1989. "Influence of enamel acid-etching on mechanical properties and nanoleakage of resin composite restorations after thermomechanical aging = Influência do condicionamento ácido do ângulo cavosuperficial nas propriedades mecânicas e nanoinfiltração de restaurações após envelhecimento termomecânico." [s.n.], 2013. http://repositorio.unicamp.br/jspui/handle/REPOSIP/289649.

Full text
Abstract:
Orientador: Luís Alexandre Maffei Sartini Paulillo<br>Dissertação (mestrado) - Universidade Estadual de Campinas, Faculdade de Odontologia de Piracicaba<br>Made available in DSpace on 2018-08-24T07:41:05Z (GMT). No. of bitstreams: 1 Coppini_ErickKamiya_M.pdf: 3349153 bytes, checksum: e0323d6512c30cee2e8ea17128a4c6e6 (MD5) Previous issue date: 2013<br>Resumo: The aim of this study was to evaluate the cavosuperficial enamel acid-etching influence in class I cavities, filled with composites on microtensile bond strength, Knoop microhardness and nanoleakage after thermomechanic ageing. It was se
APA, Harvard, Vancouver, ISO, and other styles
8

Freitas, Marcela Santiago 1987. "Effect of pre-etching to enamel and dentin on bond strength and interfacial morphology of different adhesives systems = Efeito do pré-condicionamento ácido do esmalte da dentina na resistência de união e morfologia de interface de diferentes sistemas adesivos." [s.n.], 2013. http://repositorio.unicamp.br/jspui/handle/REPOSIP/288307.

Full text
Abstract:
Orientadores: Mirela Sanae Shinohara, Mário Fernando de Góes<br>Dissertação (mestrado) - Universidade Estadual de Campinas, Faculdade de Odontologia de Piracicaba<br>Made available in DSpace on 2018-08-21T23:51:52Z (GMT). No. of bitstreams: 1 Freitas_MarcelaSantiago_M.pdf: 38797129 bytes, checksum: 16869befa66eba198d1cb13ad5c9ac1d (MD5) Previous issue date: 2013<br>Resumo: Estudos mostram que a resistência de união (RU) alcançada pelos sistemas adesivos autocondicionantes em superfície de esmalte pré-condicionado é significativamente maior se comparada aos valores obtidos em esmalte não cond
APA, Harvard, Vancouver, ISO, and other styles
9

Iost, Rodrigo Michelin. "Biocélula a combustível on-chip utilizando folhas individuais de grafeno." Universidade de São Paulo, 2016. http://www.teses.usp.br/teses/disponiveis/75/75134/tde-22092016-104129/.

Full text
Abstract:
A miniaturização de uma biocélula a combustível (BC) enzimática de glicose/O2 para aplicação em dispositivos bioeletrônicos implantáveis representa um grande desafio em eletroquímica moderna. Isso porque é preciso desenvolver bioeletrodos com alta atividade bioeletrocatalítica, com enzimas fortemente ligadas a superfície eletródica. Além disso, o próprio processo de micromanipulação é desafiador, uma vez que é desejável obter biocélulas miniaturizadas e com alta densidade de potência. Assim, propõe-se aqui o desenvolvimento de uma BC que atenda os requisitos supracitados. Para isso, desenvolve
APA, Harvard, Vancouver, ISO, and other styles
10

Hamaya, Pedro Yukio de Barros. "Paisagens flutuantes." Universidade de São Paulo, 2016. http://www.teses.usp.br/teses/disponiveis/27/27159/tde-22032017-104803/.

Full text
Abstract:
Este trabalho é o resultado de uma pesquisa envolvendo estudos, reflexões e experimentações poéticas que buscam problematizar a percepção visual sobre a representação bidimensional e sobre a realidade cotidiana - o conjunto aqui apresentado reúne textos reflexivos, imagens produzidas (desenhos, pinturas e gravuras) e anotações sobre o processo. Num primeiro momento, ele centra na exploração das possibilidades em torno da construção de um efeito flutuante na visualidade imagética, tentando tensionar os modos de apreender a representação bidimensional. Num segundo momento, ele acrescenta a seu q
APA, Harvard, Vancouver, ISO, and other styles
More sources

Books on the topic "E-etching"

1

Lasinio, Carlo. Carlo Lasinio: Incisioni. L.S. Olschki, 2004.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
2

Le stampe e i disegni. Silvana, 2012.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
3

Malignaggi, Diana. L'acquaforte: Vincenzo Riolo, Francesco La Farina, Bartolomeo e Luca Costanzo, incisori. Caracol, 2008.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
4

L'acquaforte: Vincenzo Riolo, Francesco La Farina, Bartolomeo e Luca Costanzo, incisori. Caracol, 2008.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
5

Tomasi, Lucia Tongiorgi. La Toscana descritta: Incisori e viaggiatori del '700. Pacini editore, 1990.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
6

Peter, Ackermann. Peter Ackermann: Immagini per un libro e altre acqueforti. Biblioteca statale di Cremona, 2005.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
7

Peter, Ackermann. Peter Ackermann: Immagini per un libro e altre acqueforti. Biblioteca statale di Cremona, 2005.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
8

Ackermann, Peter. Peter Ackermann: Immagini per un libro e altre acqueforti. Biblioteca statale di Cremona, 2005.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
9

Centre, Macdonald Stewart Art, W.K.P. Kennedy Gallery., Art Gallery of Ontario, and Laurentian University Museum and Arts Centre., eds. A real amateur: The Elizabeth E. Dales Collection of nineteenth-century French prints. Art Gallery of Ontario = Musée des beaux-arts de l'Ontario, 1991.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
10

Galleries, Cincinnati Art, ed. The etchings of E. T. Hurley. Cincinnati Art Galleries, 1996.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
More sources

Book chapters on the topic "E-etching"

1

"Etching." In Encyclopedia of Optical and Photonic Engineering, Second Edition. CRC Press, 2015. http://dx.doi.org/10.1081/e-eoe2-120038531.

Full text
APA, Harvard, Vancouver, ISO, and other styles
2

"Atomic Layer Etching." In Encyclopedia of Plasma Technology. CRC Press, 2016. http://dx.doi.org/10.1081/e-eplt-120049598.

Full text
APA, Harvard, Vancouver, ISO, and other styles
3

"Etching: Endpoint Detection." In Encyclopedia of Plasma Technology. CRC Press, 2016. http://dx.doi.org/10.1081/e-eplt-120049619.

Full text
APA, Harvard, Vancouver, ISO, and other styles
4

"Graphene: Plasma Etching." In Encyclopedia of Plasma Technology. CRC Press, 2016. http://dx.doi.org/10.1081/e-eplt-120053944.

Full text
APA, Harvard, Vancouver, ISO, and other styles
5

Karmakar, Anirban, and Anuradha Saha. "Fractal-Inspired Ultra-Wideband Diversity Slot Antenna for Wireless Communication Systems." In Contemporary Developments in High-Frequency Photonic Devices. IGI Global, 2019. http://dx.doi.org/10.4018/978-1-5225-8531-2.ch005.

Full text
Abstract:
A novel compact ultra-wideband (UWB) multiple-input multiple-output (MIMO) slot antenna with band notch characteristics is presented for portable wireless UWB applications. The antenna comprises of co-planar waveguide feed (CPW) and two radiating monopoles oriented in orthogonal orientation for providing orthogonal radiation patterns. A Minkowski fractal parasitic stub along with a Minkowski fractal grounded stub has been placed at 45° between the monopoles to reduce the coupling between them, which in turn establishes high isolation between the radiators. An excellent band notch characteristic is obtained at 5.5 GHz by etching a modified E-shaped compact slot on the radiators. Results show that the designed antenna meets -10 dB impedance bandwidth and -17 dB isolation throughout the entire operating band (3.1 -12 GHz). Novelty of this design lies in improving isolation using fractal which occupies less space in compared to other isolation mechanisms in MIMO structures. The simulated and measured results depict that the proposed antenna is convenient for MIMO diversity systems.
APA, Harvard, Vancouver, ISO, and other styles
6

Koshevoi, Veniamin, Anton Belorus, Ilya Pleshanov, et al. "Study of Composite Structures Based on a Porous Silicon Matrix and Nanoparticles Ag/Zno Used as Non-Invasive Highly Sensitive Biosensor Devices." In Composite Materials. IntechOpen, 2021. http://dx.doi.org/10.5772/intechopen.92850.

Full text
Abstract:
In this work composite structures based on a porous silicon were obtained and studied. Porous matrices were formed by electrochemical etching in aqueous solutions of hydrofluoric acid. Based on the obtained substrates, por-silicon (Si)/silver (Ag) and por-Si/zinc oxide (ZnO) composite structures were formed. These composites were functionalized by various methods (electro (E)-, thermo (T)-, electrothermal exposure) as a result of which the structures were modified. When studying the samples by scanning electron microscopy (SEM), it was concluded that silver nanoparticles actively diffused into the pores under these technological modes of functionalization. The por-Si/Ag and por-Si/ZnO composite structures were also studied using the following methods: infrared (IR) spectroscopy and Raman ultrasoft X-ray emission spectroscopy. Also, the photoluminescent characteristics of the samples were studied. Based on the obtained results, it was concluded that functionalization methods actively change the phase composition of structures and the optical properties of composites.
APA, Harvard, Vancouver, ISO, and other styles
7

"Atomic Layer Etching: Directional." In Encyclopedia of Plasma Technology. CRC Press, 2016. http://dx.doi.org/10.1081/e-eplt-120053939.

Full text
APA, Harvard, Vancouver, ISO, and other styles
8

"Boron Trichloride Dry Etching." In Encyclopedia of Plasma Technology. CRC Press, 2016. http://dx.doi.org/10.1081/e-eplt-120053961.

Full text
APA, Harvard, Vancouver, ISO, and other styles
9

"Wide Bandgap Materials: Plasma Etching." In Encyclopedia of Plasma Technology. CRC Press, 2016. http://dx.doi.org/10.1081/e-eplt-120053981.

Full text
APA, Harvard, Vancouver, ISO, and other styles
10

"Semiconductors: Etching with Sulfur Hexafluoride (SF6)." In Encyclopedia of Plasma Technology. CRC Press, 2016. http://dx.doi.org/10.1081/e-eplt-120053954.

Full text
APA, Harvard, Vancouver, ISO, and other styles

Conference papers on the topic "E-etching"

1

Rogozhin, Alexander E., Fedor A. Sidorov, Mark A. Bruk, and Eugene N. Zhikharev. "Simulation of dry e-beam etching of resist and experimental evidence." In The International Conference on Micro- and Nano-Electronics 2018, edited by Vladimir F. Lukichev and Konstantin V. Rudenko. SPIE, 2019. http://dx.doi.org/10.1117/12.2522458.

Full text
APA, Harvard, Vancouver, ISO, and other styles
2

Tajalli, A., E. Canato, A. Nardo, et al. "Impact of Sidewall Etching on the Dynamic Performance of GaN-on-Si E-Mode Transistors." In 2019 IEEE International Reliability Physics Symposium (IRPS). IEEE, 2019. http://dx.doi.org/10.1109/irps.2019.8720445.

Full text
APA, Harvard, Vancouver, ISO, and other styles
3

Chen, Xianfeng, Qiang Gao, Ming Li, Chorng Niou, and W. T. Kary Chien. "Deformation Study of Low K Dielectric after E-beam Exposure." In ISTFA 2006. ASM International, 2006. http://dx.doi.org/10.31399/asm.cp.istfa2006p0246.

Full text
Abstract:
Abstract In this paper, the deformation mechanism of low K dielectric film under electron beams (E-beams) is discussed, and the effect of film deformation on the development of a low K dielectric film etching recipe is investigated. To provide meaningful data for process development, numerical analysis was used in the failure analysis procedure. A correction factor is formulated to calculate the change in thickness of the low K dielectric film after E-beam exposure. In addition, scanning electron microscope (SEM) settings for imaging low K dielectric films are optimized to minimize deformation
APA, Harvard, Vancouver, ISO, and other styles
4

Quijada, Manuel A., David R. Boris, Vivek Dwivedi, et al. "E-beam generated plasma etching for developing high-reflectance mirrors for far-ultraviolet astronomical instrument applications." In Space Telescopes and Instrumentation 2018: Ultraviolet to Gamma Ray, edited by Jan-Willem A. den Herder, Kazuhiro Nakazawa, and Shouleh Nikzad. SPIE, 2018. http://dx.doi.org/10.1117/12.2314391.

Full text
APA, Harvard, Vancouver, ISO, and other styles
5

Kishihara, M., M. Murakami, A. Yamaguchi, Y. Utsumi, and I. Ohta. "Trial fabrication of PTFE-based E-plane waveguide coupler for short millimeter-wave by SR etching." In 2015 IEEE International Symposium on Radio-Frequency Integration Technology (RFIT). IEEE, 2015. http://dx.doi.org/10.1109/rfit.2015.7377909.

Full text
APA, Harvard, Vancouver, ISO, and other styles
6

De Pauw, H., J. De Baets, J. Vanfleteren, and A. Van Calster. "Integrated Optics in a Standard MCM-D Motherboard Technology Demonstrated in O/E Measurement Probes." In ASME 2003 International Electronic Packaging Technical Conference and Exhibition. ASMEDC, 2003. http://dx.doi.org/10.1115/ipack2003-35192.

Full text
Abstract:
An ongoing trend in packaging technology is the introduction of optical interconnections to cope with the problems of increased data transmission speed and the raised interconnection density. Hence, improving packaging and interconnection technologies is only viable if the aspects of optical interfaces and opto-electronic (O/E) components are considered. In this paper, we will demonstrate an MCM-D technology with O/E features. We achieved to integrate high-precision V-grooves for alignment and fixation of the optical fibers into a standard MCM-D technology. The V-groove shape of the fiber fixa
APA, Harvard, Vancouver, ISO, and other styles
7

Nagayama, Gyoko, Ryuji Ando, Kei Muramatsu, and Takaharu Tsuruta. "Fabrication of Macroporous on No-Mask Silicon Substrate for Application to Microsystems." In 2008 Second International Conference on Integration and Commercialization of Micro and Nanosystems. ASMEDC, 2008. http://dx.doi.org/10.1115/micronano2008-70323.

Full text
Abstract:
We applied the anodic etching (i. e. photo assisted electrochemical etching) to the n type silicon substrate of orientation (100) without masking to fabricate macropores penetrated Si substrate. The anodic etching conditions of the macroporous formation were discussed and the effects of the resistivity, voltage, current density, electrolyte concentration and illumination etc. on the pore size and the porosity were investigated. The pores in high aspect ratio through the cross section of the silicon wafer were obtained with polishing and RIE (reactive ion etching) from the back side. It is foun
APA, Harvard, Vancouver, ISO, and other styles
8

Goodyear, Andy, Monika Boettcher, Ines Stolberg, and Mike Cooke. "Direct comparison of the performance of commonly used e-beam resists during nano-scale plasma etching of Si, SiO2, and Cr." In SPIE Advanced Lithography, edited by Qinghuang Lin, Sebastian U. Engelmann, and Ying Zhang. SPIE, 2015. http://dx.doi.org/10.1117/12.2085469.

Full text
APA, Harvard, Vancouver, ISO, and other styles
9

Azeredo, Bruno, Keng Hsu, and Placid Ferreira. "Direct Electrochemical Imprinting of Sinusoidal Linear Gratings Into Silicon." In ASME 2016 11th International Manufacturing Science and Engineering Conference. American Society of Mechanical Engineers, 2016. http://dx.doi.org/10.1115/msec2016-8835.

Full text
Abstract:
Silicon is an excellent transparent material for building IR micro-optical elements such as holographic and blazed gratings, and curvilinear micro-lenses. Shaping this material in 3D with mirror quality finish and single-digit microscale resolution is challenging due to its brittleness and high-melting point. To achieve these patterning characteristics, electron-beam grayscale lithography is typically selected to pattern a 2.5D feature onto a resist thin-film. Subsequently, the film features are transferred into the underlying silicon substrate by deep-reactive ion etching (DRIE) [1]. Small va
APA, Harvard, Vancouver, ISO, and other styles
10

Bai, John Guofeng, and Jae-Hyun Chung. "Shadow Edge Lithography for Wafer-Scale Nanofabrication." In ASME 2007 International Mechanical Engineering Congress and Exposition. ASMEDC, 2007. http://dx.doi.org/10.1115/imece2007-42265.

Full text
Abstract:
We propose shadow edge lithography (SEL) as a wafer-scale nanofabrication method. The shadow effect of “line-ofsight” in high-vacuum evaporation is analyzed theoretically to predict the geometric distributions of the fabricated nanoscale gaps. In the experiment, nanoscale gap patterns are created by the shadow of Al edges which are prepatterned using e-beam evaporation and the conventional ultraviolet lithography. Feasibility of the SEL is demonstrated by the fabrication of nanogaps having the width ranging from 15 to 100 nm on 4-inch Si wafers. Furthermore, by using the height differences in
APA, Harvard, Vancouver, ISO, and other styles
You might also be interested in the extended bibliographies on the topic 'E-etching' for particular source types:
Journal articles Dissertations / Theses Books
We offer discounts on all premium plans for authors whose works are included in thematic literature selections. Contact us to get a unique promo code!

To the bibliography