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Journal articles on the topic 'E-etching'

Author: Grafiati

Published: 4 June 2021

Last updated: 12 February 2022

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1

Zunic, Zora, Predrag Ujic, Igor Celikovic, and Kenzo Fujimoto. "ECE laboratory in the Vinca institute: Its basic characteristics and fundamentals of electrochemic etching on polycarbonate." Nuclear Technology and Radiation Protection 18, no. 2 (2003): 57–60. http://dx.doi.org/10.2298/ntrp0302057z.

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This paper deals with the introductory aspects of the Electrochemical Etching Laboratory installed at the VINCA Institute in the year 2003. The main purpose of the laboratory is its field application for radon and thoron large-scale survey using passive radon/thoron UFO type detectors. Since the etching techniques together with the laboratory equipment were transferred from the National Institute of Radiological Sciences, Chiba, Japan, it was necessary for both etching conditions to be confirmed and to be checked up^ i. e., bulk etching speeds of chemical etching and electrochemical etching in

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Yamada, Tomoya, Ryoichi Inanami, and Shinzo Morita. "Polyimide transmitted E-beam excited CF4 plasma etching." Thin Solid Films 316, no. 1-2 (1998): 13–17. http://dx.doi.org/10.1016/s0040-6090(98)00380-0.

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3

Rogozhin, A., M. Bruk, E. Zhikharev, D. Streltsov, A. Spirin, and J. Hramchihina. "Dry e-beam etching of resist for optics." Journal of Physics: Conference Series 741 (August 2016): 012115. http://dx.doi.org/10.1088/1742-6596/741/1/012115.

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4

Jeon, Bo-Kyung, Chang-Ha Lee, A. Reum Kim, et al. "Effect of Etching Procedures on the Adhesion of Biofilm-Coated Dentin." Materials 13, no. 12 (2020): 2762. http://dx.doi.org/10.3390/ma13122762.

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Oral biofilms coat all surfaces in the oral cavity including the exposed dentin surface. This study aimed to investigate biofilm removal by acid etching procedures and the effects of the residual biofilm on dentin surfaces on composite–dentin adhesion. Dentin discs were assigned to five groups: no biofilm formation (C); biofilm formation and no surface treatment (BF); biofilm formation and acid etching (BF-E); biofilm formation and acid etching followed by chlorhexidine soaking (BF-EC); and biofilm formation and rubbing with pumice, followed by acid etching (BF-RE). Biofilms were formed on sal

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5

Wu, Hsing Chen, Sheng Hung Tu, Min Chieh Yang, and Emanuel Cooper. "Selective Etching of Silicon Oxide versus Nitride with Low Oxide Etching Rate." Solid State Phenomena 255 (September 2016): 75–80. http://dx.doi.org/10.4028/www.scientific.net/ssp.255.75.

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This paper describes both aqueous and solvent-based formulations aimed at etching silicon oxide (SiOx) with etching rates (E/R) of the order of 10-20 A/min with selectivity greater than 5 with respect to silicon nitride (SiNx) . Diluted hydrofluoric acid (dHF) with very low pH was tried first but the selectivity was found to increase only with higher SiOx E/R. Solvent-based formulations derived from previous work also behaved in a similar way, however its SiOx E/R could be reduced by modifying the total fluoride concentration inside formulation. Finally, we found that low SiOx E/R could also b

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Ivantsov, Vladimir, and Anna Volkova. "A Comparative Study of Dislocations in HVPE GaN Layers by High-Resolution X-Ray Diffraction and Selective Wet Etching." ISRN Condensed Matter Physics 2012 (August 30, 2012): 1–6. http://dx.doi.org/10.5402/2012/184023.

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It has been shown during the present study that the E-etching at elevated temperatures can be adopted for the dislocation etching in hydride vapor-phase epitaxy (HVPE) GaN layers. It has been found that the X-ray diffraction (XRD) evaluation of the dislocation density in the thicker than 6 μm epilayers using conventional Williamson-Hall plots and Dunn-Koch equation is in an excellent agreement with the results of the elevated-temperature E-etching. The dislocation distribution measured for 2-inch GaN-on-sapphire substrate suggests strongly the influence of the inelastic thermal stresses on the

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Zogheib, Lucas Villaça, Alvaro Della Bona, Estevão Tomomitsu Kimpara, and John F. Mccabe. "Effect of hydrofluoric acid etching duration on the roughness and flexural strength of a lithium disilicate-based glass ceramic." Brazilian Dental Journal 22, no. 1 (2011): 45–50. http://dx.doi.org/10.1590/s0103-64402011000100008.

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The aim of this study was to examine the effect of different acid etching times on the surface roughness and flexural strength of a lithium disilicate-based glass ceramic. Ceramic bar-shaped specimens (16 mm x 2 mm x 2 mm) were produced from ceramic blocks. All specimens were polished and sonically cleaned in distilled water. Specimens were randomly divided into 5 groups (n=15). Group A (control) no treatment. Groups B-E were etched with 4.9% hydrofluoric acid (HF) for 4 different etching periods: 20 s, 60 s, 90 s and 180 s, respectively. Etched surfaces were observed under scanning electron m

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Sponchiado, Adriane Regina, Afonso E. Wunderlich Júnior, Paulo Sérgio Galletta, and Murilo Rosa. "Avaliação do uso do Self Etching Primer na colagem de braquetes ortodônticos metálicos." Revista Dental Press de Ortodontia e Ortopedia Facial 10, no. 3 (2005): 66–74. http://dx.doi.org/10.1590/s1415-54192005000300008.

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Nesta pesquisa laboratorial foi avaliada a resistência de união ao cisalhamento de braquetes metálicos colados ao esmalte dentário bovino, utilizando um sistema adesivo convencional, composto de ácido fosfórico + primer + resina adesiva, e de um sistema SEP (self-etching primer) que combina ácido e primer em uma única solução, avaliado em ambiente seco e úmido (com água). Quarenta e oito incisivos inferiores bovinos foram divididos em três grupos de 16 unidades, que foram assim preparados: grupo 1 (controle) ácido fosfórico 37% + primer + resina Transbond XT; o grupo 2 Transbond Plus Self Etch

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Li, Zhong Yang, Zhao Yang Zhang, Yao Min Wang, and Wei Ping Mao. "Stress-Etching Using Laser Electrochemical Micromachining with Masks." Applied Mechanics and Materials 268-270 (December 2012): 468–72. http://dx.doi.org/10.4028/www.scientific.net/amm.268-270.468.

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Metal workpiece was processed by nanosecond pulsed laser electrochemical micro-etching with masks patterns in the shape of letter "E". In the experimental system established, the effect of different laser energy on processing quality was studied in air. In the different concentrations of the electrolyte, through optimized composite machining parameters, machining results of different laser energy with the masks were analyzed and compared in Aluminum alloy and Stainless steel. There was a large of difference in machining morphology by laser electrochemical micromachining with masks in two diffe

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Schwimmer, Yair, Nurit Beyth, Diana Ram, Eitan Mijiritsky, and Esti Davidovich. "Laser Tooth Preparation for Pit and Fissure Sealing." International Journal of Environmental Research and Public Health 17, no. 21 (2020): 7813. http://dx.doi.org/10.3390/ijerph17217813.

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Objectives: Various approaches are available for pit and fissure sealing, including: the use of sealants, with or without mechanical preparation; the use of etching, with or without bonding; and the use of lasers as an alternative to mechanical preparation. The objective of this study is to evaluate pit and fissure sealing by comparing the retention and microleakage of sealants, between mechanical and Er:Yag laser enamel preparation. Methods: Sixty extracted sound third molars are classified into six groups: A, bur mechanical preparation and sealant application; B, bur mechanical preparation,

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Barcellos, Daphne Câmara, Cesar Rogério Pucci, Carlos Rocha Gomes Torres, et al. "Influence of Self-Etching Adhesive Systems on Restorative Material Surfaces." World Journal of Dentistry 2, no. 2 (2011): 93–98. http://dx.doi.org/10.5005/jp-journals-10015-1063.

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ABSTRACT This study evaluated the microhardness of restorative materials after the use of self-etching and acid-etching adhesives. Specimens were divided into four groups: Group 1 (CR): Composite resin, Group 2 (GIC): Glass ionomer cement chemically activated, Group 3 (EC): Dual resinous cement, Group 4 (E): Dual resinous cement. Each group was divided into three subgroups, according to the type of adhesive system applied on the surface: Subgroup 1 (C): Control subgroup, Subgroup 2 (XE): Xeno III self-etching adhesive, Subgroup 3 (SB): Single bond acid-etching adhesive. Vickers microhardness a

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Biemond, J. Elizabeth, Gerjon Hannink, Annemarijn M. G. Jurrius, Nico Verdonschot, and Pieter Buma. "In Vivo Assessment of Bone Ingrowth Potential of Three-Dimensional E-Beam Produced Implant Surfaces and the Effect of Additional Treatment by Acid Etching and Hydroxyapatite Coating." Journal of Biomaterials Applications 26, no. 7 (2011): 861–75. http://dx.doi.org/10.1177/0885328210391495.

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The bone ingrowth potential of three-dimensional E-beam-produced implant surfaces was examined by histology and compared to a porous plasma-sprayed control. The effects of acid etching and a hydroxyapatite (HA) coating were also evaluated by histology. Specimens were implanted in the distal femur of 10 goats. Histological analysis of bone ingrowth was performed 6 weeks after implantation. The E-beam-produced surfaces showed significantly better bone ingrowth compared to the plasma-sprayed control. Additional treatment of the E-beam surface structures with a HA coating, further improved bone in

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Sidorov, F., A. Rogozhin, M. Bruk, and E. Zhikharev. "Direct Monte-Carlo simulation of dry e-beam etching of resist." Microelectronic Engineering 227 (April 2020): 111313. http://dx.doi.org/10.1016/j.mee.2020.111313.

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Alcântara, V. M. O., M. A. G. Moreira, V. A. Castro, and M. A. D. Araújo. "Sistemas Adesivos Autocondicionantes: uma Revisão de Literatura." Journal of Health Sciences 19, no. 5 (2018): 231. http://dx.doi.org/10.17921/2447-8938.2017v19n5p231.

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Os adesivos autocondicionantes foram criados a fim de melhorar a performance clínica dos sistemas adesivos convencionais de condicionamento total e conferir técnica simplificada, com diferencial de adição de monômeros ácidos às soluções de primer/ adesivo que permitem condicionamento dos substratos dentais sem a remoção da smear layer. O objetivo desta revisão de literatura é avaliar as propriedades de resistência adesiva e longevidade desses materiais em relação aos sistemas adesivos convencionais. Para a seleção dos artigos foi realizada uma busca online nas bases bibliográficas PubMed e Sco

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LON, Luís Filipe Siu, Patrícia Pigato SCHNEIDER, Dirceu Barnabé RAVELI, Denise Constance NASCIMENTO, and Odilon GUARIZA-FILHO. "Efeito da contaminação por saliva na resistência adesiva de braquetes cerâmicos utilizando uma resina ortodôntica hidrofílica." Revista de Odontologia da UNESP 47, no. 3 (2018): 131–36. http://dx.doi.org/10.1590/1807-2577.02818.

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Resumo Introdução Alguns fatores, como a presença de saliva, são capazes de influenciar a adesão do braquete ao dente durante o procedimento de colagem e podem causar falha da resistência adesiva. Objetivo O objetivo deste estudo foi avaliar a resistência ao cisalhamento de braquetes cerâmicos ortodônticos colados com Transbond XT e Transbond Plus Color Change em esmalte de dentes bovinos, contaminado e não contaminado por saliva, além de analisar o local da falha adesiva. Material e método Sessenta incisivos bovinos foram divididos aleatoriamente em quatro grupos (n=15), de acordo com o mater

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16

Lee, Jonggeon, Taemyung Kwak, Geunho Yoo, Seongwoo Kim, and Okhyun Nam. "Overgrowth of Single Crystal Diamond Using Defect-Selective Etching and Epitaxy Technique in Chemical Vapor Deposition." Journal of Nanoscience and Nanotechnology 21, no. 8 (2021): 4412–17. http://dx.doi.org/10.1166/jnn.2021.19413.

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In this study, we demonstrated the defect-selective etching and epitaxy technique for defect reduction of a heteroepitaxial chemical vapor deposition (CVD) diamond substrate. First, an 8 nm layer of nickel was deposited on the diamond surface using an e-beam evaporator. Then, defect-selective etching was conducted through an in situ single process using microwave plasma chemical vapor deposition (MPCVD). After defect-selective etching, the diamond layer was overgrown by MPCVD. The defect density measured from the atomic force microscope image decreased from 3.27×108 to 2.02×108 cm−2. The first

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17

Mikesell, Leslie R., Randall J. Schaetzl, and Michael A. Velbel. "Hornblende etching and quartz/feldspar ratios as weathering and soil development indicators in some Michigan soils." Quaternary Research 62, no. 2 (2004): 162–71. http://dx.doi.org/10.1016/j.yqres.2004.06.006.

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Weathering can be used as a highly effective relative age indicator. One such application involves etching of hornblende grains in soils. Etching increases with time (duration) and decreases with depth in soils and surficial sediments. Other variables, related to intensity of weathering and soil formation, are generally held as constant as possible so as to only minimally influence the time–etching relationship. Our study focuses on one of the variables usually held constant–climate–by examining hornblende etching and quartz/feldspar ratios in soils of similar age but varying degrees of develo

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18

Kang, You-Jung, Yooseok Shin, and Jee-Hwan Kim. "Effect of Low-Concentration Hydrofluoric Acid Etching on Shear Bond Strength and Biaxial Flexural Strength after Thermocycling." Materials 13, no. 6 (2020): 1409. http://dx.doi.org/10.3390/ma13061409.

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This study evaluated the shear bond strength (SBS) and biaxial flexural strength (BFS) of resin cements according to the surface treatment method using low-temperature hot etching with hydrofluoric acid (HF) on a yttrium-stabilized tetragonal zirconia (Y-TZP) surface; 96 discs and 72 cubes for BFS and SBS tests for Y-TZP were randomly divided into four groups of BFS and three groups of SBS. Specimens were subjected to the following surface treatments: (1) no treatment (C), (2) air abrasion with 50 μm Al2O3 particles (A), (3) hot etching with HF at 100 °C for 10 min (E), and (4) air abrasion +

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Wu, Hsing Chen, Sheng Hung Tu, Min Chieh Yang, and Emanuel Cooper. "Titanium Nitride Hard Mask Removal with Selectivity to Tungsten in FEOL." Solid State Phenomena 255 (September 2016): 91–96. http://dx.doi.org/10.4028/www.scientific.net/ssp.255.91.

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This paper describes etching of titanium nitride (TiN) highly selective to tungsten (W), where the TiN etch rate (E/R) was about 100 Å/min and W E/R was less than 1 Å/min at 60°C. The formulation concept was adapted from the Entegris TK-10 series, but it was modified to fit the criteria for front-end application. No damage to tantalum nitride (TaN) was required during the etching process but silicon oxide compatibility requirement was relaxed. By replacing W inhibitors with more suitable ones, W loss was well controlled, while the particle issue previously found in the scale up lots was also

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Pouyanfar, Hoda, Elaheh Seyed Tabaii, Samaneh Aghazadeh, Seyyed Pedram Tabatabaei Navaei Nobari, and Mohammad Moslem Imani. "Microtensile Bond Strength of Composite to Enamel Using Universal Adhesive with/without Acid Etching Compared To Etch and Rinse and Self-Etch Bonding Agents." Open Access Macedonian Journal of Medical Sciences 6, no. 11 (2018): 2186–92. http://dx.doi.org/10.3889/oamjms.2018.427.

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AIM: Considering the recent introduction of universal adhesives and the controversy regarding the use/no use of etchant prior to their application, this study sought to assess the microtensile bond strength of composite to enamel using universal adhesive with/without acid etching compared to three-step etch and rinse, two-step etch and rinse and two-step self-etch bonding agents. METHODS: This in vitro, an experimental study was conducted on 80 extracted sound human molars in five groups (16 each): Scotchbond Universal adhesive (3M) with/without prior etching, Adper Scthe otchbond Multi-

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Hotovy, Ivan, Ivan Kostic, Martin Predanocy, Pavol Nemec, and Vlastimil Rehacek. "Effects of HSQ e–beam Resist Processing on the Fabrication of ICP–RIE Etched TiO2 Nanostructures." Journal of Electrical Engineering 67, no. 6 (2016): 454–58. http://dx.doi.org/10.1515/jee-2016-0067.

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Abstract Patterning of metal oxide nanostructures with different shapes and well-defined size may play an important role in the improvement of MEMS systems, sensors and optical devices. We investigated the effects of HSQ e-beam resist processing on the fabrication of sputtered TiO2 nanostructures. They were patterned using direct write e-beam lithography combined with ICP-RIE etching in CF4/Ar plasma. Experimental results confirmed that the HSQ resist with a thickness of about 600 nm is suitable as a masking material for optimal etching process and allows patterning of the dots array in TiO2 s

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Fallahi, M., and R. Barber. "Sub-half-micrometre gratings using e-beam lithography and reactive ion etching." Canadian Journal of Physics 69, no. 3-4 (1991): 508–11. http://dx.doi.org/10.1139/p91-083.

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A simple, manufacturable technique for the generation of sub-half-micrometre gratings in GaAs is demonstrated. The technique uses a single layer of polymethylmethacrylate photoresist, electron-beam lithography, and BCl3–He reactive ion etching to achieve high-quality second-order gratings. Good light attenuation properties are demonstrated for planar and ridge wave guides.

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Winkler, Dieter, Hans Zimmermann, Margot Mangerich, and Robert Trauner. "E-beam probe station with integrated tool for electron beam induced etching." Microelectronic Engineering 31, no. 1-4 (1996): 141–47. http://dx.doi.org/10.1016/0167-9317(95)00336-3.

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Hofer, Manuel, Thomas Stauden, Ivo W. Rangelow, and Jörg Pezoldt. "Nanostructuring Techniques for 3C-SiC(100) NEMS Structures." Materials Science Forum 645-648 (April 2010): 841–44. http://dx.doi.org/10.4028/www.scientific.net/msf.645-648.841.

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In this work nanostructures based on a 30 nm thick 3C-SiC (100) heteroepitaxially grown on Si(100) are demonstrated. They consist of free standing nanoresonators with dimensions below 50 nm. The free standing nanostructures and resonators were defined by electron beam lithography using hydrogen silsesquioxane (HSQ) as a negative tone e-beam resist acting as a selective etching mask during the anisotropic and isotropic dry etching. The influences of the proximity effect, the crystallographic orientation, the angle of exposing on the feature size are highlighted.

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Pithon, Matheus Melo, Rogério Lacerda dos Santos, Márlio Vinícius de Oliveira, Eduardo Franzotti Sant'anna, and Antônio Carlos de Oliveira Ruellas. "Avaliação da resistência ao cisalhamento de dois compósitos colados em superfície condicionada com primer autocondicionante." Dental Press Journal of Orthodontics 16, no. 2 (2011): 94–99. http://dx.doi.org/10.1590/s2176-94512011000200012.

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OBJETIVO: o objetivo desse estudo foi avaliar a resistência ao cisalhamento e o índice de remanescente de adesivo (IRA) dos compósitos Eagle Bond e Orthobond em superfície de esmalte condicionada com Transbond Plus Self-Etching Primer. MÉTODOS: foram utilizados 75 incisivos inferiores permanentes bovinos divididos em cinco grupos (n=15). Nos grupos 1, 2 e 4, as colagens foram realizadas com Transbond XT, Orthobond e Eagle Bond, respectivamente, seguindo as recomendações dos fabricantes. Nos grupos 3 e 4, antes da colagem com o Orthobond e o Eagle Bond, respectivamente, a superfície dentária fo

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Fedorov, Aleksandr, Andrey Zhitenev, Darya Strekalovskaya, and Aleksandr Kur. "Quantitative Description of the Microstructure of Duplex Stainless Steels Using Selective Etching." Materials Proceedings 3, no. 1 (2021): 4. http://dx.doi.org/10.3390/iec2m-09387.

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: The properties of duplex stainless steels (DSSs) depend on the ferrite–austenite ratio and on the contents of secondary phases. Therefore, it is necessary to control the volume fractions, morphologies, and distribution patterns of all phases. The phases in the samples were identified using thermodynamic modeling and scanning electron microscopy. Investigated specimens were obtained after different heat treatments, such as solution annealing and quenching from 1050 to 1250 °C to obtain different amounts of ferrite and annealing at 850 °C to precipitate the σ-phase. Therefore, a metallographic

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Papis, E., Anna Piotrowska, T. T. Piotrowski, et al. "Fabrication of GaSb Microlenses by Photo and E-Beam Lithography and Dry Etching." Solid State Phenomena 99-100 (July 2004): 83–88. http://dx.doi.org/10.4028/www.scientific.net/ssp.99-100.83.

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Fabrication of surface-relief microstructures in GaSb for application in mid-infrared optoelectronic devices is described. Photo- and e-beam lithography was used to define patterns on GaSb surfaces. Ar/O2 sputter etching and RIE in BCl3-based plasma were applied to transfer preshaped master into the GaSb substrate. Circular microlenses with an aspect ratio (height to diameter) 0.4/10 µm and circular gratings with 0.4 µm linewidth / 1 µm period and 1.7 µm depth have been demonstrated.

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Mazzei, R., O. A. Bernaola, G. Saint Martin, J. C. Bourdin, and J. C. Grasso. "Submicroscopic nuclear track kinetic theory applied to initial chemical etching of makrofol E." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 17, no. 3 (1986): 275–79. http://dx.doi.org/10.1016/0168-583x(86)90067-4.

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Webster, M. N., A. H. Verbruggen, H. F. F. Jos, J. Romijn, P. M. A. Moors, and S. Radelaar. "High contrast marks for e-beam direct write made by reactive ion etching." Microelectronic Engineering 17, no. 1-4 (1992): 37–40. http://dx.doi.org/10.1016/0167-9317(92)90011-f.

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da Silva, Pedro Pinto. "High-resolution, extended views of membrane surfaces revealed by fracture-flip." Proceedings, annual meeting, Electron Microscopy Society of America 47 (August 6, 1989): 738–39. http://dx.doi.org/10.1017/s0424820100155669.

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I will describe a new method — fracture-flip — that uses commercially available equipment to produce extended views of cell and membrane surfaces. The resolution of this new method permits the routine identification of surface structures down to 5 nm diameter. Moreover, in contrast to freeze-etching/deep-etching, extended views are easily obtained.Conceptally, fracture-flip derives from label-fracture, another method developed in my laboratory. With label-fracture we showed that, after freeze-fracture, the exoplasmic (E) halves of cell membranes are stabilized by, and remain attached to, their

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Neves, Aline de Almeida, Rodolfo de Almeida Castro, Eduardo Tavares Coutinho, and Laura Guimarães Primo. "Microstructural analysis of demineralized primary enamel after in vitro toothbrushing." Pesquisa Odontológica Brasileira 16, no. 2 (2002): 137–43. http://dx.doi.org/10.1590/s1517-74912002000200008.

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The aim of this study was to investigate, in vitro, the morphological characteristics of demineralized primary enamel subjected to brushing with a dentifrice with or without fluoride. In order to do so, 32 enamel blocks were divided in 4 different groups containing 8 blocks each. They were separately immersed in artificial saliva for 15 days. The experimental groups were: C - control; E - submitted to etching with 37% phosphoric acid gel (30 s); EB - submitted to etching and brushing 3 times a day with a non-fluoridated dentifrice; EBF = submitted to etching and brushing 3 times a day with a f

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Augusto, MG, CRG Torres, CR Pucci, N. Schlueter, and AB Borges. "Bond Stability of a Universal Adhesive System to Eroded/Abraded Dentin After Deproteinization." Operative Dentistry 43, no. 3 (2018): 291–300. http://dx.doi.org/10.2341/16-173-l.

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SUMMARY Objective: Erosive/abrasive challenges can potentially compromise bonding to dentin. Aiming to improve the quality and stability of bonding to this substrate, this study investigated the combined effect of erosion and toothbrush abrasion on the microtensile bond strength (μTBS) stability to dentin using a universal adhesive system in total and self-etching modes, associated or not associated with deproteinization. Methods: Bovine dentin specimens were divided into five groups according to the organic matrix condition (n=20): control (C); erosion (E); erosion + abrasion (EA); erosion +

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Kang, Yi, Xuelei Ren, Xin Yuan, et al. "The Effects of Combined Micron-Scale Surface and Different Nanoscale Features on Cell Response." Advances in Materials Science and Engineering 2018 (August 16, 2018): 1–9. http://dx.doi.org/10.1155/2018/6526913.

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Sandblasting and acid-etching (SLA) and anodization are the two most commonly used methods for surface modification of biomedical titanium. However, there are unavoidable problems such as residual sand particles and lack of hydrophilicity on the surface of titanium sheets treated with SLA technology. In addition, titanium implants showed only the micro/submicroscopic structure. In order to avoid the residue of sand particles in the surface of titanium, the two surface treatments etching treatment (E) and etched-anodizing (EA) on titanium were used, and their surface topography, surface chemist

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Lippold, Marcus, Sebastian Patzig-Klein, and Edwin Kroke. "HF-HNO3-H2SO4/H2O Mixtures for Etching Multicrystalline Silicon Surfaces: Formation of NO2+, Reaction Rates and Surface Morphologies." Zeitschrift für Naturforschung B 66, no. 2 (2011): 155–63. http://dx.doi.org/10.1515/znb-2011-0208.

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The reaction behavior of HF-HNO3-H2O etching mixtures, which are frequently used for texturing silicon surfaces, is significantly influenced by the addition of sulfuric acid. For high concentrations of sulfuric acid, nitronium ions NO2+ ions have been detected by means of 14N NMR spectroscopy, and results of Raman spectroscopic investigation have allowed the quantification of the nitronium ions. Maximum etching rates of 4000 - 5000 nm s−1 are reached for HF (40 %)-HNO3 (65%)-H2SO4 (97%) mixtures with w (40%-HF)/w (65%-HNO3) ratios of 2 to 4 and w (97%-H2SO4)<0.3. For higher concentrations o

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Elmanov, Ilia, Anna Elmanova, Sophia Komrakova, et al. "Method for determination of resists parameters for photonic - integrated circuits e-beam lithography on silicon nitride platform." EPJ Web of Conferences 220 (2019): 03012. http://dx.doi.org/10.1051/epjconf/201922003012.

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In the work the thicknesses of the e-beam resists ZEP 520A and ma-N 2400 by using non-destructive method were measured, as well as recipe for the high ratio between the Si3N4 and the resists etching rate was determined. The work has a practical application for e-beam lithography of photonic-integrated circuits and nanophotonics devices based on silicon nitride platform.

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Liu, L. Z., S. B. Tian, Y. Z. Long, et al. "Tunable periodic graphene antidot lattices fabricated by e-beam lithography and oxygen ion etching." Vacuum 105 (July 2014): 21–25. http://dx.doi.org/10.1016/j.vacuum.2014.01.015.

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Rogozhin, A., M. Bruk, E. Zhikharev, and F. Sidorov. "NANOPHOTONIC STRUCTURE FORMATION BY DRY E-BEAM ETCHING OF THE RESIST: RESOLUTION LIMITATION ORIGINS." Computer Optics 41, no. 4 (2017): 499–503. http://dx.doi.org/10.18287/2412-6179-2017-41-4-499-503.

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Neng, Wan, Xu Jun, Xu Tao, et al. "Surface energy guided sub-10 nm hierarchy structures fabrication by direct e-beam etching." RSC Advances 3, no. 39 (2013): 17860. http://dx.doi.org/10.1039/c3ra42370k.

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Kawashima, Hirofumi, and Masaru Matsuyama. "Overtone Lam$\bf {\acute e}$-Mode Quartz Crystal Resonators Fabricated by an Etching Process." Japanese Journal of Applied Physics 35, Part 1, No. 5B (1996): 3046–49. http://dx.doi.org/10.1143/jjap.35.3046.

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Durina, P., A. Bencurova, A. Konecnikova, et al. "Patterning of structures by e-beam lithography and ion etching for gas sensor applications." Journal of Physics: Conference Series 514 (May 15, 2014): 012037. http://dx.doi.org/10.1088/1742-6596/514/1/012037.

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Jang, Won-Ho, Kwang-Seok Seo, and Ho-Young Cha. "P-GaN Gated AlGaN/GaN E-mode HFET Fabricated with Selective GaN Etching Process." JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE 20, no. 6 (2020): 485–90. http://dx.doi.org/10.5573/jsts.2020.20.6.485.

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Lyubomirskiy, Mikhail, Pit Boye, Jan M. Feldkamp, et al. "Diamond nanofocusing refractive X-ray lenses made by planar etching technology." Journal of Synchrotron Radiation 26, no. 5 (2019): 1554–57. http://dx.doi.org/10.1107/s1600577519007082.

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The manufacturing steps and first tests of a refractive lens made of polycrystalline diamond are described. A fabrication process based on electron-beam lithography and deep reactive ion etching is introduced. Experimental tests on beamline ID13 at the ESRF have been performed. A spot size of 360 nm (FWHM) at an energy E = 24.3 keV is observed.

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Barcellos, Daphne Câmara, Alessandra Buhler Borges, Carlos Rocha Gomes Torres, Sergio Eduardo de Paiva Gonçalves, Marcella Batista Pavanello, and Ana Carolina Souza. "Influence of Er: Yag Laser on Shear Bond Strength of Self-etching Adhesives to Bovine Enamel: In vitro Study." World Journal of Dentistry 2, no. 1 (2011): 11–15. http://dx.doi.org/10.5005/jp-journals-10015-1046.

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ABSTRACT Purpose The aim of this study was to evaluate the influence of the enamel treatment with Er:YAG laser on the bond strength of self-etching adhesives. Materials and methods One-hundred bovine incisors were ground to obtain flat enamel surfaces. The bond area was delimited with 3 mm diameter adhesive tape. Specimens were divided in two groups: Group L: Enamel surface received Er:YAG laser application (Kavo KEY 3) at 300 mJ/6 Hz in sweeping mode for 30 seconds; Group N: Enamel surface received no additional treatment. Each group was divided into five subgroups according to self-etching a

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Tajalli, A., E. Canato, A. Nardo, et al. "Impact of sidewall etching on the dynamic performance of GaN-on-Si E-mode transistors." Microelectronics Reliability 88-90 (September 2018): 572–76. http://dx.doi.org/10.1016/j.microrel.2018.06.037.

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Pa, P. S. "Design of an oval-form cathode for the precision etching process of e-paper surface." Materials & Design 30, no. 7 (2009): 2763–68. http://dx.doi.org/10.1016/j.matdes.2008.09.032.

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Lacatena, V., M. Haras, J. F. Robillard, S. Monfray, T. Skotnicki, and E. Dubois. "Phononic engineering of silicon using “dots on the fly” e-beam lithography and plasma etching." Microelectronic Engineering 121 (June 2014): 131–34. http://dx.doi.org/10.1016/j.mee.2014.04.034.

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Mondiali, V., M. Lodari, M. Borriello, D. Chrastina, and M. Bollani. "Top–down SiGe nanostructures on Ge membranes realized by e-beam lithography and wet etching." Microelectronic Engineering 153 (March 2016): 88–91. http://dx.doi.org/10.1016/j.mee.2016.02.015.

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Chomycz, Łesia, and Marek Wilczyński. "Zapowiedź Schulzowskich cliché-verre’ów." Schulz/Forum, no. 15 (September 24, 2020): 220–23. http://dx.doi.org/10.26881/sf.2020.15.12.

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A commentary on E. Menar’s essay “Sztuki graficzne. Z okazji odbyć się mającej wystawy grafiki oryginalnej w Borysławiu” that announced Bruno Schulz’s exhibition in Borsyław in March 1921. It is a brief account of the historical development of graphic arts. The author explains the essence and significance of graphics, including woodcut, etching, and lithography. The most attention he paid to the etching which, in his opinion, was the most sophisticated and difficult, allowing the artist to use a variety of materials. One of the most interesting aspects of the essay is the emphasis on the clich

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Fineran, Brian A., and Judith M. Fineran. "Teliospore wall structure in Entorrhiza (Tilletiaceae) and its relationship to taxonomy of the genus." Canadian Journal of Botany 70, no. 10 (1992): 1964–83. http://dx.doi.org/10.1139/b92-245.

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Spore wall organization in the five species of Entorrhiza (Ustilaginales) has been investigated using thin sections for transmission electron microscopy, supported by light and scanning electron microscopy and some freeze-etching. Material was examined from herbaria, specimens preserved in fixative, and fresh host tissue. The wall has four main layers, numbered 1–4 from the outside to inside of the wall; some layers are further differentiated into zones. Layer 1 in E. aschersoniana, E. caspaiyana, and E. caricicola has two zones: a broad outer zone 2 of dense matrix and a narrow inner zone 1 o

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Vayrette, Renaud, Michael Coulombier, Thomas Pardoen, and Jean Pierre Raskin. "On-Chip MEMS-Based Internal Stress Actuated Structures for the Mechanical Testing of Freestanding Thin Film Materials." Advanced Materials Research 996 (August 2014): 833–40. http://dx.doi.org/10.4028/www.scientific.net/amr.996.833.

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An on-chip suite of MEMS-based mechanical testing structures has been developed to extract the mechanical properties of freestanding thin films under tensile loading. The working principle relies on the use of high tensile internal stress within an actuator beam to deform a specimen beam made of another material owing to the etching of an underlying sacrificial layer. In order to control the deformation rate imposed during the etching process, the rectangular shape of actuator beam design has been recently upgraded to a tapered shape. The deformation rate is estimated from the modelling of the

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