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Journal articles on the topic 'Electrochemical deposition'

Author: Grafiati

Published: 4 June 2021

Last updated: 6 September 2023

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1

Majidzade, V. A., S. F. Cafarova, A. Sh Aliyev, N. B. Farhatova, and D. B. Tagiyev. "ELECTROCHEMICAL DEPOSITION OF THIN SEMICONDUCTIVE Mo–S FILMS." Azerbaijan Chemical Journal, no. 1 (March 19, 2019): 6–13. http://dx.doi.org/10.32737/0005-2531-2019-1-6-13.

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2

Möller, Peter, Chaturvedula S. Sastri, Manfred Kluckner, Dieter Rhede, and Hugo M. Ortner. "Evidence for electrochemical deposition of gold onto arsenopyrite." European Journal of Mineralogy 9, no. 6 (December 2, 1997): 1217–26. http://dx.doi.org/10.1127/ejm/9/6/1217.

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3

Chubenko, Eugene, Alexey Klyshko, Vitaly Bondarenko, Marco Balucani, Anatoly I. Belous, and Victor Malyshev. "ZnO Films and Crystals on Bulk Silicon and SOI Wafers: Formation, Properties and Applications." Advanced Materials Research 276 (July 2011): 3–19. http://dx.doi.org/10.4028/www.scientific.net/amr.276.3.

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In present work the investigation of the electrochemical and chemical hydrothermal deposition processes of ZnO on silicon is presented. The influence of the electrochemical process parameters on the characteristics and morphology of the ZnO deposits is analyzed. Electrochemical deposition from non aqueous DMSO solutions on porous silicon buffer layer is also discussed. The details of the chemical hydrothermal deposition from the nitrate bath of high-quality ZnO crystals on silicon substrate are presented. It was shown that morphology and size of synthesized ZnO crystals depends on the temperature of the deposition bath. Differences between photoluminescence of electrochemically deposited ZnO thin films and hydrothermally synthesized crystals are shown. Electrochemically deposited ZnO films demonstrate defect-caused luminescence and hydrothermally grown ZnO crystals shows intensive exciton luminescence band in UV region. Hydrothermal deposition of high-quality ZnO crystals on the surface of electrochemically deposited ZnO seed layer with porous silicon buffer improves photoluminescence properties of the structure which is useful for optoelectronics applications. Possible applications of ZnO as gas sensors and photovoltaic devices are considered. Aspects of ZnO electrochemical deposition on bulk silicon and silicon-on-isolator wafers for integration purposes are discussed.

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4

Vida-Simiti, I., Nicolae Jumate, M. Guzun, V. Ajder, and J. Bobanova. "Structure of Composite Layers Reinforced with SiC Particles Obtained by Electrochemical Deposition." Advanced Materials Research 23 (October 2007): 265–68. http://dx.doi.org/10.4028/www.scientific.net/amr.23.265.

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The paper reports on a study regarding the structure of composite layers obtained by electrochemical deposition. The depositions were achieved in a bath formed of a mixture of aqueous solutions of iron salts (iron chloride), cobalt (cobalt sulphate) and solid particles of silicon carbide (SiC) in suspension. Following the electrochemical deposition on composite structures are formed as a thin layer with a metallic matrix (FeCo alloy), reinforced with hard particles of SiC. The structure of the composite layer is uniform and very fine, with crystalline granules under 500 nm. The electrochemically deposited FeCo alloy representing the metallic matrix of the composite layer has a high micro-hardness (864 HV), superior to the same alloy obtained by casting.

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5

Huang, Baoming M. "Electrochemical atomic layer epitaxy of semiconductor CdTe thin films." Proceedings, annual meeting, Electron Microscopy Society of America 51 (August 1, 1993): 824–25. http://dx.doi.org/10.1017/s0424820100149957.

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Semiconductor thin films have important applications in areas such as photovoltaics and luminescent displays. Electrodeposition of these films is a potential low cost, room temperature production technique. Electrochemical atomic layer epitaxy (ECALE) involves alternatively depositing individual element monolayer amount per ECALE cycle, taking advantage of the under-potential deposition (UPD) phenomena.A series of CdTe thin films have been deposited using ECALE methodology in an electrochemical flow cell system. The 0.5 mM Te4+, Te blank, 5mM Cd2+, and Cd blank solutions are made with purasonic grade TeO2 and CdSO4, research grade electrolyte, and 18 M ohm water. The gold foil substrates are cleaned electrochemically before each experiment. An ECALE cycle starts with depositing monolayer amount Te, rinsing with Te blank, then depositing monolayer amount of Cd, and ending with rinsing with Cd blank solution. The whole flow cell system is controlled by a computer with house-written codes, and the deposition process can be fully programmed.

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6

Kund, Julian, Sven Daboss, Tommaso Marchesi D’Alvise, Sean Harvey, Christopher V. Synatschke, Tanja Weil, and Christine Kranz. "Physicochemical and Electrochemical Characterization of Electropolymerized Polydopamine Films: Influence of the Deposition Process." Nanomaterials 11, no. 8 (July 30, 2021): 1964. http://dx.doi.org/10.3390/nano11081964.

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Polydopamine (PDA) is a synthetic eumelanin polymer which is, to date, mostly obtained by dip coating processes. In this contribution, we evaluate the physical and electrochemical properties of electrochemically deposited PDA films obtained by cyclic voltammetry or pulsed deposition. The obtained PDA thin films are investigated with respect to their electrochemical properties, i.e., electron transfer (ET) kinetics and charge transfer resistance using scanning electrochemical microscopy and electrochemical impedance spectroscopy, and their nanomechanical properties, i.e., Young’s modulus and adhesion forces at varying experimental conditions, such as applied potential or pH value of the medium using atomic force microscopy. In particular, the ET behavior at different pH values has not to date been investigated in detail for electrodeposited PDA thin films, which is of particular interest for a multitude of applications. Adhesion forces strongly depend on applied potential and surrounding pH value. Moreover, force spectroscopic measurements reveal a significantly higher percentage of polymeric character compared to films obtained by dip coating. Additionally, distinct differences between the two depositions methods are observed, which indicate that the pulse deposition process leads to denser, more cross-linked films.

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7

Geuli, Ori, and Daniel Mandler. "Overcoming the barrier of conventional electrochemical deposition of inorganic composites." Chemical Communications 56, no. 3 (2020): 379–82. http://dx.doi.org/10.1039/c9cc07039g.

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8

Kunty, Orest. "Morphology of a dispersed tellurium electrochemical deposition in aprotic solvents." Chemistry & Chemical Technology 1, no. 3 (September 15, 2007): 117–20. http://dx.doi.org/10.23939/chcht01.03.117.

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The electrolysis of TeCl4 solutions in dimethylsulfoxide, dimethylformamide and acetonitrile using soluble tellurium anodes has been investigated. At 313 K in 0.05 M TeCl4 over graphic undercoat the formation of compact tellurium deposit took place at cathode potentials less than 1.0 V and formation of dispersed deposit – at values more than 1.25-1.5 V. Using results of SEM researches it was established that dispersed tellurium formed

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9

Vranceanu, Diana Maria, Ionut Cornel Ionescu, Elena Ungureanu, Mihai Ovidiu Cojocaru, Alina Vladescu, and Cosmin Mihai Cotrut. "Magnesium Doped Hydroxyapatite-Based Coatings Obtained by Pulsed Galvanostatic Electrochemical Deposition with Adjustable Electrochemical Behavior." Coatings 10, no. 8 (July 24, 2020): 727. http://dx.doi.org/10.3390/coatings10080727.

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The aim of this study was to adapt the electrochemical behavior in synthetic body fluid (SBF) of hydroxyapatite-based coatings obtained by pulsed galvanostatic electrochemical deposition through addition of Mg in different concentrations. The coatings were obtained by electrochemical deposition in a typical three electrodes electrochemical cell in galvanic pulsed mode. The electrolyte was obtained by subsequently dissolving Ca(NO3)2·4H2O, NH4H2PO4, and Mg(NO3)2·6H2O in ultra-pure water and the pH value was set to 5. The morphology consists of elongated and thin ribbon-like crystals for hydroxyapatite (HAp), which after the addition of Mg became a little wider. The elemental and phase composition evidenced that HAp was successfully doped with Mg through pulsed galvanostatic electrochemical deposition. The characteristics and properties of hydroxyapatite obtained electrochemically can be controlled by adding Mg in different concentrations, thus being able to obtain materials with different properties and characteristics. In addition, the addition of Mg can lead to the control of hydroxyapatite bioactive ceramics in terms of dissolution rate.

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10

Genys, Povilas, Elif Aksun, Alla Tereshchenko, Aušra Valiūnienė, Almira Ramanaviciene, and Arunas Ramanavicius. "Electrochemical Deposition and Investigation of Poly-9,10-Phenanthrenequinone Layer." Nanomaterials 9, no. 5 (May 6, 2019): 702. http://dx.doi.org/10.3390/nano9050702.

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In this research, a 9,10-phenanthrenequinone (PQ) was electrochemically polymerized on a graphite rod electrode using potential cycling. The electrode modified by poly-9,10-phenanthrenequinone (poly-PQ) was studied by means of cyclic voltammetry, electrochemical impedance spectroscopy, atomic force microscopy and scanning electron microscopy. The poly-PQ shows variations in growth pattern depending on the number of potential cycles for the initiation of polymerization. Formed poly-PQ layer demonstrates good electric conductivity, great degree of electrochemical capacitance and unique oxidation/reduction properties, which are suitable for broad technological applications, including applicability in biosensors, supercapacitors and in some other electrochemical systems.

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11

Elmasly, Saadeldin E. T., Luca Guerrini, Joseph Cameron, Alexander L. Kanibolotsky, Neil J. Findlay, Karen Faulds, and Peter J. Skabara. "Synergistic electrodeposition of bilayer films and analysis by Raman spectroscopy." Beilstein Journal of Organic Chemistry 14 (August 21, 2018): 2186–89. http://dx.doi.org/10.3762/bjoc.14.191.

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A novel methodology towards fabrication of multilayer organic devices, employing electrochemical polymer growth to form PEDOT and PEDTT layers, is successfully demonstrated. Moreover, careful control of the electrochemical conditions allows the degree of doping to be effectively altered for one of the polymer layers. Raman spectroscopy confirmed the formation and doped states of the PEDOT/PEDTT bilayer. The electrochemical deposition of a bilayer containing a de-doped PEDTT layer on top of doped PEDOT is analogous to a solution-processed organic semiconductor layer deposited on top of a PEDOT:PSS layer without the acidic PSS polymer. However, the poor solubility of electrochemically deposited PEDTT (or other electropolymerised potential candidates) raises the possibility of depositing a subsequent layer via solution-processing.

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12

Li, Jian Bo, Yu Rong Yan, Bo Shen, Yong Guo Li, Wei Cheng, and Shi Jia Ding. "Electrochemical Property of Graphene Oxide/Nafion/AuNPs Nanocomposite in Electrochemical Sensor." Applied Mechanics and Materials 568-570 (June 2014): 542–45. http://dx.doi.org/10.4028/www.scientific.net/amm.568-570.542.

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Graphene oxide (GO)/nafion (Nf) film was immobilized onto the pretreated glassy carbon electrode (GCE) surface. Electrochemically reduced graphene oxide (ERGO)/Nf/AuNPs nanocomposite was synthesized by electrochemical reduction and deposition, which was characterized by cyclic voltammetry (CV) and square wave voltammetry (SWV). The experimental results revealed that the ERGO/Nf/AuNPs nanocomposite was stable, excellent, and homogeneous electrochemical property.

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13

Gurbanova, U. M., Z. S. Safaraliyeva, N. R. Abishova, R. G. Huseynova, and D. B. Tagiyev. "MATHEMATICAL MODELING THE ELECTROCHEMICAL DEPOSITION PROCESS OF Ni–Mo THIN FILMS." Azerbaijan Chemical Journal, no. 3 (September 28, 2021): 6–11. http://dx.doi.org/10.32737/0005-2531-2021-3-6-11.

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To avoid the numerous experiments for determining optimal conditions and electrolyte composition at co-deposition of two metals we have cleated the regression equation. Mathematical calculations have been carried out using the Optum ME package program with the study of some factors as current density, concentration of main components, temperature, etc. which effect on the co-deposition process. Three independent variables have been selected. The amount of molybdenum in the deposit has been chosen as the dependent variable. The developed regression equation quite adequately describes the co-deposition process of nickel with molybdenum and can be used at planning the works on obtaining alloys with the required composition by the electrochemical method

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14

Talib, Elyas, Kok Tee Lau, Muhammad Zaimi, Mohd Shahril Amin Bistamam, Nor Syafira Abdul Manaf, Raja Noor Amalina Raja Seman, Nor Najihah Zulkapli, and Mohd Asyadi Azam. "Electrochemical Performance of Multi Walled Carbon Nanotube and Graphene Composite Films Using Electrophoretic Deposition Technique." Applied Mechanics and Materials 761 (May 2015): 468–72. http://dx.doi.org/10.4028/www.scientific.net/amm.761.468.

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This study aims to investigate multi-walled carbon nanotube and graphene composite thin films fabricated using cathodic electrophoretic deposition in aqueous solution. The deposition mechanism and films microstructure were investigated using the cyclic voltammetry (CV) and field emission scanning electron microscope. The depositions yield varied by the deposition time and deposition voltage. The composite films were studied for its application in the electrochemical capacitor. The electrochemical performance showed the capacitive behavior of the films in 6 M potassium hydroxide electrolyte. CV scans were verified from 0 to 1 V at different scan rates. The specific capacitance of 29 Fg-1 was achieved at the scan rate of 1 mVs-1.

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15

Giurlani, Walter, Andrea Giaccherini, Nicola Calisi, Giovanni Zangari, Emanuele Salvietti, Maurizio Passaponti, Stefano Caporali, and Massimo Innocenti. "Investigations on the Electrochemical Atomic Layer Growth of Bi2Se3 and the Surface Limited Deposition of Bismuth at the Silver Electrode." Materials 11, no. 8 (August 14, 2018): 1426. http://dx.doi.org/10.3390/ma11081426.

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The Electrochemical Atomic Layer Deposition (E-ALD) technique is used for the deposition of ultrathin films of bismuth (Bi) compounds. Exploiting the E-ALD, it was possible to obtain highly controlled nanostructured depositions as needed, for the application of these materials for novel electronics (topological insulators), thermoelectrics and opto-electronics applications. Electrochemical studies have been conducted to determine the Underpotential Deposition (UPD) of Bi on selenium (Se) to obtain the Bi2Se3 compound on the Ag (111) electrode. Verifying the composition with X-ray Photoelectron Spectroscopy (XPS) showed that, after the first monolayer, the deposition of Se stopped. Thicker deposits were synthesized exploiting a time-controlled deposition of massive Se. We then investigated the optimal conditions to deposit a single monolayer of metallic Bi directly on the Ag.

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16

Tonelli, Domenica, Erika Scavetta, and Isacco Gualandi. "Electrochemical Deposition of Nanomaterials for Electrochemical Sensing." Sensors 19, no. 5 (March 8, 2019): 1186. http://dx.doi.org/10.3390/s19051186.

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The most commonly used methods to electrodeposit nanomaterials on conductive supports or to obtain electrosynthesis nanomaterials are described. Au, layered double hydroxides (LDHs), metal oxides, and polymers are the classes of compounds taken into account. The electrochemical approach for the synthesis allows one to obtain nanostructures with well-defined morphologies, even without the use of a template, and of variable sizes simply by controlling the experimental synthesis conditions. In fact, parameters such as current density, applied potential (constant, pulsed or ramp) and duration of the synthesis play a key role in determining the shape and size of the resulting nanostructures. This review aims to describe the most recent applications in the field of electrochemical sensors of the considered nanomaterials and special attention is devoted to the analytical figures of merit of the devices.

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17

Tikhonov, Robert Dmitrievich. "Normal Electrochemical Deposition NiFe." European Journal of Engineering Research and Science 5, no. 8 (August 6, 2020): 828–34. http://dx.doi.org/10.24018/ejers.2020.5.8.2023.

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Due to heating of the electrolyte is an excluded abnormal codeposition alloy components and reduced variation of process parameters to achieve optimal magnetic properties Ni81Fe19 films of magnetic field concentrators. Proposed chloride electrolyte pH adjusted with hydrochloric acid, which provides congruent electrochemical deposition of permalloy at heating and stirring. Magnetic properties of permalloy films are very sensitive to the variation of component relationships of 4.26. Control of accuracy of preparation of chloride electrolyte for electrochemical deposition of NiFe conducted using spectrophotometry. It is shown that the selection process of cooking the electrolyte for electrodeposition of Ni81Fe19 alloy and temperature allow to get normal, congruent electrochemical deposition of permalloy films. It has been established that the anomalous character of permalloy deposition associated with the main feature of iron ions-the existence of variable Valence iron with two or three values in the charge of ions during the hydrolysis of iron salts.

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18

Tikhonov, Robert Dmitrievich. "Normal Electrochemical Deposition NiFe." European Journal of Engineering and Technology Research 5, no. 8 (August 6, 2020): 828–34. http://dx.doi.org/10.24018/ejeng.2020.5.8.2023.

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Due to heating of the electrolyte is an excluded abnormal codeposition alloy components and reduced variation of process parameters to achieve optimal magnetic properties Ni81Fe19 films of magnetic field concentrators. Proposed chloride electrolyte pH adjusted with hydrochloric acid, which provides congruent electrochemical deposition of permalloy at heating and stirring. Magnetic properties of permalloy films are very sensitive to the variation of component relationships of 4.26. Control of accuracy of preparation of chloride electrolyte for electrochemical deposition of NiFe conducted using spectrophotometry. It is shown that the selection process of cooking the electrolyte for electrodeposition of Ni81Fe19 alloy and temperature allow to get normal, congruent electrochemical deposition of permalloy films. It has been established that the anomalous character of permalloy deposition associated with the main feature of iron ions-the existence of variable Valence iron with two or three values in the charge of ions during the hydrolysis of iron salts.

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19

HOMMA, Takayuki. "Fundamental Analyses on Electrochemical Deposition Processes. Approaches for Investigating Electrochemical Deposition Processes." Journal of the Surface Finishing Society of Japan 50, no. 5 (1999): 395–99. http://dx.doi.org/10.4139/sfj.50.395.

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20

Kim, Bioh, Stephen Golovato, Tyler Barbera, Keiichi Fujita, and Takashi Tanaka. "Next Generation Electrochemical Deposition TSV Fill." Additional Conferences (Device Packaging, HiTEC, HiTEN, and CICMT) 2014, DPC (January 1, 2014): 001523–35. http://dx.doi.org/10.4071/2014dpc-wp15.

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The first generation of through silicon via (TSV) designs for interposer and 3D die stacking has concentrated on TSV features with aspect ratio (AR) on the order of ten. Typical via sizes are 10 X 100 um for interposer and 5 X 50 um for 3D applications. Ionized physical vapor deposition (IPVD) has been successful in depositing barrier and seed layers in these AR=10 vias that allow efficient “bottom-up” filling by electrochemical deposition (ECD) using available chemistries. While these applications are currently moving to pilot lines and low scale production, research and development has already begun on the next generation of TSV structures for interposer and die stacking. These may be based on via middle or via last designs. They are expected to increase in aspect ratio for denser TSV arrays while maintaining similar wafer thickness. Structures with AR in the range of 15–20 are being designed and produced. For interposer, a typical structure might be 8 X 120 um and 2 X 40 um for 3D stacks. These structures will challenge all TSV formation processes, including etch, dielectric liner deposition, barrier-seed deposition and TSV fill. This paper will focus on barrier-seed and TSV fill processes. IPVD barrier-seed deposition will be difficult for AR~15–20 and will require much longer deposition times for complete via coverage. Long IPVD times will produce thick overburden and pinch off the opening at the top of vias. Even if successful, IPVD may not be viable economically. More conformal deposition processes, such as atomic layer deposition (ALD), chemical vapor deposition (CVD) and wet processes, like electro-less plating and conformal ECD, may be better alternatives to IPVD. A conformal process only needs to deposit the minimum required seed thickness in the via for successful ECD filling with the overburden being nearly the same thickness. The development of a successful conformal barrier-seed process may even challenge IPVD for AR=10. This paper presents ECD TSV fill results using several conformal barrier-seed processes, demonstrating the feasibility of this approach for structures with AR = 10–20.

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21

RAKNGARM, Achariya, Yukio MIYASHITA, and Yoshiharu MUTOH. "3303 Electrochemical deposition of calcium phosphate thin film on titanium substrate." Proceedings of the JSME annual meeting 2006.1 (2006): 435–36. http://dx.doi.org/10.1299/jsmemecjo.2006.1.0_435.

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22

Valentini, Federica, Silvia Orlanducci, M. L. Terranova, and Giuseppe Palleschi. "Fabrication Routes of Microsized Electrochemical Biosensors Based on Single-Walled Carbon Nanotubes." Materials Science Forum 539-543 (March 2007): 1098–103. http://dx.doi.org/10.4028/www.scientific.net/msf.539-543.1098.

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In this work two different synthesis processes for Single-Wall Carbon Nanotubes deposition (such as the Hot Filament-Chemical Vapor Deposition, HF-CVD, and the electrophoretic deposition, EPD) on microwire surfaces, were described. Then, the morphological and structural characterization of SWNT-modified microwires were performed by Scanning Electron Microscopy (FE-SEM) and Raman Spectroscopy, respectively. Finally, the nanostrcutured microelectrodes were electrochemically characterized using NADH, NAD+, epinephrine, and ascorbic acid (AA), useful biological molecules to develop electrochemical sensors and biosensors.

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23

Park, Kimoon, Fumihiro Inoue, Jaber Derakhshandeh, and Bongyoung Yoo. "Electrochemical deposition of indium from chloride bath for low-temperature microbump bonding." Japanese Journal of Applied Physics 61, no. 4 (March 17, 2022): 041003. http://dx.doi.org/10.35848/1347-4065/ac52ba.

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Indium chloride bath was characterized towards the application of low-temperature thermal compression bonding. The electrochemical behavior of the indium chloride bath was analyzed using the cyclic voltammetry method. Electrochemical deposition of indium was carried out at various deposition factors on different materials such as copper, nickel, and cobalt. Based on the results of indium deposition obtained from the blanket films, indium bumps were electrochemically fabricated inside a through-resist hole pattern at various current densities. In addition, stacked indium bumps with various metals (Cu/In, Cu/Ni/In, Cu/Co/In) were formed for a practical application of micro bump bonding. Moreover, the formation of the intermetallic compounds between indium and under bump metallization was investigated.

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24

Zhai, Bao Gai, Qing Lan Ma, Ming Meng, and Yuan Ming Huang. "Electrochemically Deposited Aluminum in Template of Porous Silicon Film." Materials Science Forum 663-665 (November 2010): 1032–35. http://dx.doi.org/10.4028/www.scientific.net/msf.663-665.1032.

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In this article, we report on the observations that in the aqueous electrolyte of aluminum nitrate, the thin metallic conducting films on both internal and external surface of porous silicon (PS) thin films that emit visible photoluminescence at room temperature prior to electrochemical deposition have been obtained under electrochemical deposition condition. Add to this high surface-to-volume ratio and these make it a good candidate for the catalyst supporter. We have investigated the surface morphology of PS after the interval of about 30 hours of electrochemically deposited aluminum by means of scanning electron microscopy (SEM). It has been shown from SEM images that not only micrometer-sized pores are smoothed by deposition of aluminum microcrystal, but also the presences of semi-sphere aluminum microcrystal which rooted in the tip of micrometer-sized pores are observed. On the one hand, this extremely interesting phenomenon which the micrometer-sized pores are smoothed may be explained in terms of principle of electrochemical deposition; on the other hand, we have laid the formation mechanism of semi-spherical aluminum microcrystal at the door of Gibbs free energy.

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25

Soltanova, N. Sh, A. Sh Aliyev, B. A. Ismailova, and R. G. Huseynova. "ELECTROCHEMICAL REDUCTION OF CADMIUM IONS FROM ETHYLENE GLYCOL ELECTROLYTE." Azerbaijan Chemical Journal, no. 2 (June 19, 2023): 40–46. http://dx.doi.org/10.32737/0005-2531-2023-2-40-46.

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The work is devoted to the study of the process of cathodic reduction of Cd ions from anhydrous ethylene glycol electrolyte. The mechanism of the process of cadmium reduction was studied by taking linear and cyclic potentiodynamic polarization curves. The influence of cadmium chloride concentration, potential sweep rate and temperature on the process of electrochemical deposition of cadmium ions was studied. With an increase in the concentration of cadmium in the electrolyte, the rate of its release at the cathode increases. Precipitates of good quality are obtained at current densities of 25 mA/sm2. It has been established that the cadmium deposition potential almost does not change with increasing potential sweep rate. The dependence of cadmium electrodeposition from ethylene glycol electrolyte on temperature was studied, which made it possible to establish the optimal deposition temperature, which was 363–373 K, and to conclude that the deposition process is controlled by electrochemical polarization. The diffusion coefficient of cadmium ions to the cathode surface has been calculated

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26

Kauffman, Justin, John Gilbert, and Eric Paterson. "Multi-Physics Modeling of Electrochemical Deposition." Fluids 5, no. 4 (December 11, 2020): 240. http://dx.doi.org/10.3390/fluids5040240.

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Electrochemical deposition (ECD) is a common method used in the field of microelectronics to grow metallic coatings on an electrode. The deposition process occurs in an electrolyte bath where dissolved ions of the depositing material are suspended in an acid while an electric current is applied to the electrodes. The proposed computational model uses the finite volume method and the finite area method to predict copper growth on the plating surface without the use of a level set method or deforming mesh because the amount of copper layer growth is not expected to impact the fluid motion. The finite area method enables the solver to track the growth of the copper layer and uses the current density as a forcing function for an electric potential field on the plating surface. The current density at the electrolyte-plating surface interface is converged within each PISO (Pressure Implicit with Splitting Operator) loop iteration and incorporates the variance of the electrical resistance that occurs via the growth of the copper layer. This paper demonstrates the application of the finite area method for an ECD problem and additionally incorporates coupling between fluid mechanics, ionic diffusion, and electrochemistry.

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27

Cheng, Jin, Xiao Ping Zou, Xiang Min Meng, Gang Qiang Yang, Xue Ming Lü, Cui Liu Wei, Zhe Sun, Hong Ying Feng, and Yuan Yang. "Electrochemical Deposition of Lead Oxide Nanorods." Advanced Materials Research 123-125 (August 2010): 663–66. http://dx.doi.org/10.4028/www.scientific.net/amr.123-125.663.

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Synthesis of PbO nanorods on an ITO glass by electrochemical deposition was reported. Compared with previous report on the electrochemical deposition of PbO nanorods on stainless steel substrates, massive PbO nanorods were obtained with good reproducibility. The PbO nanorods have a length of several tens of micrometers and a diameter of about 100-200nm. The process for electrochemical deposition of PbO nanorods on ITO glass was investigated.

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28

Kim, Jinwook, Hyunseung Kim, Seongwoo Nam, and WooChul Jung. "Application of Electrochemical Deposition in Solid Oxide Fuel Cell Technology." Ceramist 24, no. 4 (December 31, 2021): 411–23. http://dx.doi.org/10.31613/ceramist.2021.24.4.03.

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This review paper describes the principle of electrochemical deposition and introduces recent studies applying it to the electrode fabrication of a solid oxide fuel cell (SOFC), a next-generation energy conversion device. Electrochemical deposition can easily control the structure and morphology of the deposition layer according to the applied bias/time/temperature, etc., and the process is very simple and possible even at low temperatures. In addition, deposition of cerium-based oxides, which are the representative ion-conductors or mixed-conductors widely used for SOFCs, is also possible <i>via</i> electrochemical deposition. To elucidate the effectiveness/novelty of electrochemical deposition, we present examples of the application of electrochemical deposition in SOFCs. Moreover, examples of using this method to study the properties of a material and/or to fabricate perovskite oxide-based electrodes are included.

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29

Nenastina, Tetiana, Мykola Sakhnenko, Valeria Proskurina, Alla Korohodska, and Natalia Horokhivska. "Electrochemical deposition of cobalt alloy." Bulletin of the National Technical University «KhPI» Series: New solutions in modern technologies, no. 3(9) (October 18, 2021): 55–60. http://dx.doi.org/10.20998/2413-4295.2021.03.08.

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Electrodeposition of cobalt alloys with refractory metals makes it possible to obtain coatings with a unique combination of physicochemical properties that are unattainable using other deposition methods. For the deposition of high-quality coatings with a cobalt-vanadium alloy, it is proposed to use a citrate electrolyte. Co-V coating was deposited on steel samples from citrate electrolyte at a temperature of 35-40 °C and a current density of 5-12 A/dm2 using soluble cobalt anodes. The vanadium content in the coating deposited at a ligand concentration of 0.3 mol / dm3 is 0.1-0.5 wt%. An increase in the concentration of the ligand to 0.4 mol / dm3 promotes the binding of cobalt into complexes, and, accordingly, the vanadium content in the coating increases to 0.6-1.2 wt.%. Moreover, the tendency to change the percentage of alloying elements with current density remains. Deposition coatings are dense, shiny, without internal stresses and cracks. The proposed compositions of electrolytes and modes of deposition of Co-V coatings with a vanadium content of up to 1.5 wt.% And a current efficiency of 50%. It was found that Co-V coatings are characterized by increased carbon content and are substitutional solid solutions, and the surface morphology of the obtained coatings depends significantly on the current density and changes from fine-crystalline to globular spheroid. The optimal current density for obtaining high-quality coatings with a cobalt alloy in a galvanostatic mode is ік = 10 A / dm2. Management of the storage of galvanic cobalt alloys in a quite wide range of concentrations of alloy-forming components is achieved by varying the electrolysis parameters, which allows the deposition technology to be adapted to the needs of the modern market.

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30

Hope, Gregory A., Peng Liu, Haohua Li, and Gretel K. Parker. "Electrochemical Deposition of Nanoparticulate Materials." ECS Transactions 28, no. 6 (December 17, 2019): 337–46. http://dx.doi.org/10.1149/1.3367926.

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31

Zhitomirsky, Igor, and Anthony Petric. "Electrochemical deposition of yttrium oxide." Journal of Materials Chemistry 10, no. 5 (2000): 1215–18. http://dx.doi.org/10.1039/b000311p.

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32

van Vugt, L. K., A. F. van Driel, R. W. Tjerkstra, L. Bechger, W. L. Vos, D. Vanmaekelbergh, and J. J. Kelly. "Macroporous germanium by electrochemical deposition." Chemical Communications, no. 18 (August 14, 2002): 2054–55. http://dx.doi.org/10.1039/b206970a.

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33

Tang, Eric Z., and Thomas H. Etsell. "Polarized electrochemical vapor deposition (PEVD)." Solid State Ionics 91, no. 3-4 (October 1996): 213–19. http://dx.doi.org/10.1016/s0167-2738(96)83021-9.

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34

Streltsov, E. A., N. P. Osipovich, L. S. Ivashkevich, A. S. Lyakhov, and V. V. Sviridov. "Electrochemical deposition of PbSe films." Electrochimica Acta 43, no. 8 (1998): 869–73. http://dx.doi.org/10.1016/s0013-4686(97)00213-2.

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35

OGATA, Y., K. KOBAYASHI, and M. MOTOYAMA. "Electrochemical metal deposition on silicon." Current Opinion in Solid State and Materials Science 10, no. 3-4 (June 2006): 163–72. http://dx.doi.org/10.1016/j.cossms.2007.02.001.

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36

Chowdhury, Supria, and Masaya Ichimura. "Electrochemical Deposition of GaSxOyThin Films." Japanese Journal of Applied Physics 48, no. 6 (June 22, 2009): 061101. http://dx.doi.org/10.1143/jjap.48.061101.

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37

Williams, F. R., and G. S. May. "Acoustic Monitoring of Electrochemical Deposition." IEEE Transactions on Electronics Packaging Manufacturing 27, no. 3 (July 2004): 198–209. http://dx.doi.org/10.1109/tepm.2004.843087.

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38

Dubin, Val M. "Electrochemical Deposition of 3D Interconnects." ECS Meeting Abstracts MA2020-02, no. 17 (November 23, 2020): 1507. http://dx.doi.org/10.1149/ma2020-02171507mtgabs.

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39

Tanner, Cameron W., and Anil V. Virkar. "Electrochemical Liquid Deposition of Ceria." Journal of the American Ceramic Society 77, no. 8 (August 1994): 2209–12. http://dx.doi.org/10.1111/j.1151-2916.1994.tb07122.x.

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40

Fritz, Heinz P., and Volker R�ger. "Electrochemical deposition of copper phosphides." Monatshefte f�r Chemie Chemical Monthly 123, no. 5 (May 1992): 397–403. http://dx.doi.org/10.1007/bf00817595.

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41

Melrose, J. R. "Pattern formation in electrochemical deposition." Chemometrics and Intelligent Laboratory Systems 15, no. 2-3 (August 1992): 231–40. http://dx.doi.org/10.1016/0169-7439(92)85012-r.

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42

Ban, Seiji, and Shigeo Maruno. "Hydrothermal-electrochemical deposition of hydroxyapatite." Journal of Biomedical Materials Research 42, no. 3 (December 5, 1998): 387–95. http://dx.doi.org/10.1002/(sici)1097-4636(19981205)42:3<387::aid-jbm6>3.0.co;2-f.

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43

Neogi, Parthasakha. "Electrochemical deposition in deep vias." AIChE Journal 52, no. 1 (2005): 354–58. http://dx.doi.org/10.1002/aic.10596.

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44

Zeynalova, A. O., S. P. Javadova, V. A. Majidzade, and A. Sh Aliyev. "ELECTROCHEMICAL SYNTHESIS OF IRON MONOSELENIDE THIN FILMS." Chemical Problems 19, no. 4 (2021): 262–71. http://dx.doi.org/10.32737/2221-8688-2021-4-262-271.

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In the presented research work, the kinetics and mechanism of the deposition process of thin iron, selenium and Fe-Se films have been studied by recording a cyclic and linear polarization curves by potentiodynamic method using Pt and Ni electrodes. Individual and co-deposition potential areas of the components of the electrolyte on the Pt electrode were determined. In order to determine the optimal electrolysis mode and electrolyte composition, the effect of various factors (concentration of initial components, temperature, etc.) on the co-electrodeposition process of Fe-Se was studied. In addition, Fe-Se samples deposited on the surface of Ni electrodes were thermally treated at 4500C and studied by SEM and X-ray phase analysis methods. Elemental analysis of the films shows that they contain 42.2% Fe and 57.8% Se.

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45

Pilan, Luisa, Matei Raicopol, and Mariana Ioniţă. "Fabrication of Polyaniline/Carbon Nanotubes Composites Using Carbon Nanotubes Films Obtained by Electrophoretic Deposition." Key Engineering Materials 507 (March 2012): 113–17. http://dx.doi.org/10.4028/www.scientific.net/kem.507.113.

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In this study, we report a facile electrochemical method to obtain polyaniline/single-wall carbon nanotubes (PANI/SWCNTs) composite electrodes by combining the electroreduction of diazonium salts and electropolymerization of conductive polymers. In a first step, the SWCNTs are covalently functionalized with diphenyl amine through the electrochemical reduction of the 4-aminodiphenylamine diazonium salt in order to provide anchors for the subsequent polymer electrodepostion. The aniline oxidation remains possible on this grafted layer and PANI can easily be deposited on the diphenyl amine-modified electrodes. The electrochemically deposited PANI/SWCNTs composites exhibit excellent electrochemical charge storage properties making them promising electrode materials for high power supercapacitors.

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46

Strbac, S., Z. Rakocevic, K. I. Popov, M. G. Pavlovic, and R. Petrovic. "The role of surface defects in hopg on the electrochemical and physical deposition of Ag." Journal of the Serbian Chemical Society 64, no. 7-8 (1999): 483–93. http://dx.doi.org/10.2298/jsc9908483s.

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The role of defects on a substrate surface during the initial stages of nucleation and growth ofAg deposited electrochemically and physically on highly oriented pyrolytic graphite (HOPG) has been observed ex situ by scanning tunneling microscopy (STM). The silver was electrodeposited under current controlled electrochemical conditions at 26?A/cm2, which corresponded to a deposition rate of 0.1 monolayers (ML) per second. For comparison, physical deposition of Ag on HOPG was performed by DC Ar + ion sputtering, at the same deposition rate and for the same deposition times. In both cases, Ag grows in an island growth mode, but the distribution of the islands appears to be quite different. In physical deposition, the Ag islands are almost homogeneously distributed over the substrate surface and a slight accumulation of islands on steps does not contribut e significantly to the overallmorphology. This indicates the crucial role of point defects on the substrate in the initial stages of nucleation. In electrochemical deposition, more line d defects are observed after a flow of current, andtheir role in the beginning of the nucleat ion is more pronounced. Lined defects are responsible for the string-like shaped domains of deposited atoms. Also, the existence of string-like shaped nucleation exclusion zones is indicated. The problem of the formation of nucleation exclusion zones,which appear only in electrochemical deposition, has been reconsidered and a new explanaton of their formation is given. A mathematical model for the calculation of the radius of the nucleati on exclusion zone has been developed.

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47

Pawar, S. H., C. H. Bhosale, and L. P. Deshmukh. "Electrochemical bath deposition technique: Deposition of CdS thin films." Bulletin of Materials Science 8, no. 3 (June 1986): 419–22. http://dx.doi.org/10.1007/bf02744155.

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48

Anseth, Ronnie, Nils-Olav Skeie, and Magne Waskaas. "The effect of precipitation and deposition layer growth on impedance measurements." tm - Technisches Messen 86, no. 1 (January 28, 2019): 25–33. http://dx.doi.org/10.1515/teme-2018-0062.

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AbstractThe objective of the study was to examine how precipitation and deposition layer growth in an electrochemical cell impact impedance measurements. A measurement system, based on Electrochemical Impedance Spectroscopy (EIS), was used to observe the impedance of an electrochemical cell while precipitation was occurring. The measurement system was also used together with measurements of the solution concentration (in parts per million, ppm) to examine what impact deposition layer growth has on an electrochemical cell. Experimental results indicate a measurable change in the impedance magnitude as the ionic concentration is altered through precipitation. A change in both impedance magnitude and the interfacial capacitance was observed when a deposition layer was established within an electrochemical cell. Results show that impedance measurements are susceptible to changes in solution conductivity and to the presence of a deposition layer in an electrochemical cell. Impedance measurements may be used as an indicator for deposition layer growth, but changes in the solution concentration should be considered when creating a model.

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49

Tang, Eric Z., Thomas H. Etsell, and Douglas G. Ivey. "Electrochemical Study of a Polarized Electrochemical Vapor Deposition Process." Journal of The Electrochemical Society 147, no. 9 (2000): 3338. http://dx.doi.org/10.1149/1.1393903.

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50

Yan, Mei, Wei Qiang Gao, Rui Sheng Xue, and Jing Hua Yu. "Influence of Electroless Copper Deposition on the Electrochemical Performance of Si/MCMB." Advanced Materials Research 306-307 (August 2011): 336–39. http://dx.doi.org/10.4028/www.scientific.net/amr.306-307.336.

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Si-Cu alloys have been prepared by electroless depositions with different process. Si-Cu/MCMB materials have been prepared by carbonization of the mixture of Si-Cu, MCMB and mesophase pitch. The influences of electroless deposition condition and heat-treatment temperature on the anodic performance of Cu-Si/MCMB have been studied. Compared with Si/MCMB, Si-Cu/MCMB has more stable cyclical performance. Furthermore, the Si-Cu/MCMB sample produced by cleaning and then electroless deposition on Si shows the better anodic performance than the Si-Cu/MCMB sample produced by direct electroless deposition on Si, because the former sample has more Cu contents than the latter sample.

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