Books on the topic 'Electrolytic polishing'
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Dettner, Paul. Electrolytic and chemical polishing of metals. Holon, Israel: Ordentlich, 1987.
Find full textGrilikhes, S. I͡A. Ėlektrokhimicheskoe i khimicheskoe polirovanie: Teorii͡a i praktika : vlii͡anie na svoĭstva metallov. 2nd ed. Leningrad: "Mashinostroenie," Leningradskoe otd-nie, 1987.
Find full textBuhlert, Magnus. Elektropolieren: Elektrolytisches Glänzen, Glätten und Entgraten von Edelstahl, Stahl, Messing, Kupfer, Aluminium und Titan. Bad Saulgau: E. Leuze, 2009.
Find full textChemical-Mechanical, Polishing 2000 (2000 San Francisco Calif ). Chemical-Mechanical Polishing 2000: Fundamentals and materials issues : symposium held April 26-27, 2000, San Francisco, California, U.S.A. Warrendale, Pa: Materials Research Society, 2001.
Find full textElectrolytic in-process dressing (ELID) techologies: Fundamentals and applications. Boca Raton, FL: Taylor & Francis, 2011.
Find full textArrowsmith, David John. Electrolytic processes on surfaces: Contributions to electrolytic polishing, anodizing, adhesion, colar, lithography and electronic applications. Birmingham: Aston University. Department of Mechanical and Production Engineering, 1988.
Find full textAdvances in CMP/polishing technologies for the manufacture of electronic devices. Oxford: Elsevier, 2012.
Find full textKrishnan, M., S. V. Babu, S. Danyluk, and M. Tsujimura. Chemical-Mechanical Polishing - Fundamentals and Challenges. University of Cambridge ESOL Examinations, 2014.
Find full textMeuris, Marc, Rajiv K. Singh, Rajeev Bajaj, and Mansour Moinpour. Chemical-Mechanical Polishing 2000: Fundamentals and Materials Issues. University of Cambridge ESOL Examinations, 2014.
Find full textBabu, Suryadevara V., Kenneth C. Cadien, and Hiroyuki Yano. Chemical-Mechanical Polishing 2001 - Advances and Future Challenges. University of Cambridge ESOL Examinations, 2014.
Find full textVos, Ingrid, Duane S. Boning, Johann W. Bartha, Ara Philipossian, and Greg Shinn. Advances in Chemical-Mechanical Polishing: Volume 816. University of Cambridge ESOL Examinations, 2014.
Find full text(Editor), S. V. Babu, S. Danyluk (Editor), M. I. Krishnan (Editor), and M. Tsujimura (Editor), eds. Chemical Mechanical Polishing /Fundamentals and Challenges: Symposium Held April 5-7, 1999, San Francisco, California, U.S.A (Materials Research Society Symposium Proceedings). Materials Research Society, 2000.
Find full textV, Babu S., ed. Chemical-mechanical polishing, fundamentals and challenges: Symposium held April 5-7, 1999, San Francisco, California, U.S.A. / c editors, S.V. Babu ... [et al.]. Warrendale, Pa: Materials Research Society, 1999.
Find full textAdvances in Chemical-Mechanical Polishing: Symposium Held April 13-15, 2004, San Francisco, California, U.S.A. Materials Research Society, 2004.
Find full textV, Babu S., Cadien Kenneth Charles 1951-, Yano Hiroyuki, and Materials Research Society Meeting, eds. Chemical-mechanical polishing 2001: Advantages and future challenges : symposium held April 18-20, 2001, San Francisco, California, U.S.A. Warrendale, Pa: Materials Research Society, 2001.
Find full textCorbin, Jane K. Chemical-Mechanical Polishing 2001--Advances and Future Challenges: Volume 671 (Materials Research Society symposium proceedings). Materials Research Society, 2001.
Find full text(Editor), R. K. Singh, Rajeev Bajaj (Editor), Mansour Moinpour (Editor), and Marc Meuris (Editor), eds. Chemical-Mechanical Polishing 2000-Fundamentals and Materials Issues: Symposium Held Spril 26-27, 2000, San Francisco, California, U.S.A. (Materials Research Society Symposia Proceedings, V. 613.). Materials Research Society, 2001.
Find full textCo, Business Communications. Chemical Mechanical Polishing Equipment and Materials: A Technical and Market Analysis (Business Opportunity Report). Business Communications Company, 2003.
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