Relevant bibliographies by topics / Electron Beam-Physical Vapor Deposition

Contents

  1. Journal articles
  2. Dissertations / Theses
  3. Books
  4. Book chapters
  5. Conference papers
  6. Reports

Academic literature on the topic 'Electron Beam-Physical Vapor Deposition'

Author: Grafiati
Published: 4 June 2021
Last updated: 1 February 2022

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Journal articles on the topic "Electron Beam-Physical Vapor Deposition"

1

Singh, Jogender, and Douglas E. Wolfe. "Nanostructured Component Fabrication by Electron Beam-Physical Vapor Deposition." Journal of Materials Engineering and Performance 14, no. 4 (August 1, 2005): 448–59. http://dx.doi.org/10.1361/105994905x56223.

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Markov, Helmut. "Electron Beam Vapor Deposition Lines." JOM 39, no. 6 (June 1987): 57. http://dx.doi.org/10.1007/bf03258069.

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Huang, Chong-Lin, Dongkai Qiao, Ching-Yen Ho, and Chang-Wei Xiong. "Effects of Plasma and Evaporated Atoms on the Spatial Distribution of Coating Film Thickness for Electron Beam-Induced Material Evaporation." Journal of Nanoelectronics and Optoelectronics 16, no. 5 (May 1, 2021): 791–96. http://dx.doi.org/10.1166/jno.2021.3007.

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This paper investigates the spatial distributions of electron beam-evaporated atoms and electron beam-induced plasma in the coating process. The materials evaporated by electron beams first form vapour and then a little of plasma is generated in the vapour. The spatial distributions of electron beam-induced atoms and plasma play an important role on the coating uniformity of composition and thickness. The radial distribution of coating deposition thickness of electron beam-evaporated atoms predicted by this study agrees with the available experimental data. The predicted distribution of ion density in the electron beam-induced plasma agrees with the available measured data. The results reveal that the normalized coating thicknesses at the divergence angle of 6 and 14 degrees of vapor source, respectively, are 0.8 and 0.2 of these at divergence angle of 0 degree of vapor source for titanium and aluminum evaporated separately. The similar tendency for the decreasing coating thickness with the radial distance is also obtained for the co-evaporation of aluminum, titanium, and copper. High rotation rate of substrate of vapor source leads to the small deposition rate. Most ions in the electron beam-induced plasma are attracted by electrons of the electon beam and are located at the neighbourhood of the beam region. Therefore, the ion and ion-attracted electron densities rapidly decrease with the increasing radial distance from the electron beam.
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Jamil, Sheba, Sanjeev K. Gupta, K. Anbalagan, and J. Akhtar. "Electron-beam assisted physical vapor deposition of polycrystalline silicon films." Materials Science in Semiconductor Processing 14, no. 3-4 (September 2011): 287–93. http://dx.doi.org/10.1016/j.mssp.2011.05.011.

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Slifka, A. J., and B. J. Filla. "Thermal conductivity measurement of an electron-beam physical-vapor-deposition coating." Journal of Research of the National Institute of Standards and Technology 108, no. 2 (March 2003): 147. http://dx.doi.org/10.6028/jres.108.014.

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Fan, Jing, Iain D. Boyd, and Chris Shelton. "Monte Carlo modeling of electron beam physical vapor deposition of yttrium." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 18, no. 6 (November 2000): 2937–45. http://dx.doi.org/10.1116/1.1310656.

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He, Xiaodong, Bin Meng, Yue Sun, Bochao Liu, and Mingwei Li. "Electron beam physical vapor deposition of YSZ electrolyte coatings for SOFCs." Applied Surface Science 254, no. 22 (September 2008): 7159–64. http://dx.doi.org/10.1016/j.apsusc.2008.05.271.

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Wolfe, Douglas E., and Jogender Singh. "Titanium carbide coatings deposited by reactive ion beam-assisted, electron beam–physical vapor deposition." Surface and Coatings Technology 124, no. 2-3 (February 2000): 142–53. http://dx.doi.org/10.1016/s0257-8972(99)00644-1.

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Zhao, Yi Jie, Li Ma, and Xiao Dong He. "Preparation and Microstructure Analysis of Ti-Al Sheet by Electron Beam Physical Vapor Deposition." Materials Science Forum 650 (May 2010): 302–7. http://dx.doi.org/10.4028/www.scientific.net/msf.650.302.

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By using electron beam physical vapor deposition (EB-PVD) technology, Ti-Al thin sheet with dimension of 450mm×450mm×0.2mm was prepared and the microstructure of Ti-Al deposit was investigated by means of scanning electron microscopy (SEM), atom force microscopy (AFM) and X-ray diffraction (XRD), and then the effect on deposit by re-evaporation of Al was explored by calculating the ratio of re-evaporating capacity with depositing capacity of Al on the substrate. The results indicate that there existed equiaxed crystal and columnar crystal along the cross-sectional may resulted from the transformation latent heats released during the transition course of atoms from gaseous state to solid state, and the variation of target-substrate distance would take effect on the phase composition due to the changing of atoms collision probability and radiant heat quantity absorbed by substrate. The effect on deposit by re-evaporation of Al could be neglected because the re-evaporating capacity of Al was far below that of the depositing capacity.
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Kashin, D. S., and P. A. Stekhov. "MODERN THERMAL BARRIER COATINGS OBTAINED BY ELECTRON-BEAM PHYSICAL VAPOR DEPOSITION (review)." Proceedings of VIAM, no. 2 (February 2018): 10. http://dx.doi.org/10.18577/2307-6046-2018-0-2-10-10.

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Dissertations / Theses on the topic "Electron Beam-Physical Vapor Deposition"

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Mahfoudhi, Marouen. "Numerical optimisation of electron beam physical vapor deposition coatings for arbitrarily shaped surfaces." Thesis, Cape Peninsula University of Technology, 2015. http://hdl.handle.net/20.500.11838/2225.

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Thesis (MTech (Mechanical Engineering))--Cape Peninsula University of Technology.
For the last few decades, methods to improve the engine efficiency and reduce the fuel consumption of jet engines have received increased attention. One of the solutions is to increase the operating temperature in order to increase the exhaust gas temperature, resulting in an increased engine power. However, this approach can be degrading for some engine parts such as turbine blades, which are required to operate in a very hostile environment (at ≈ 90% of their melting point temperature). Thus, an additional treatment must be carried out to protect these parts from corrosion, oxidation and erosion, as well as to maintain the substrate’s mechanical properties which can be modified by the high temperatures to which these parts are exposed. Coating, as the most known protection method, has been used for the last few decades to protect aircraft engine parts. According to Wolfe and Co-workers [1], 75% of all engine components are now coated. The most promising studies show that the thermal barrier coating (TBC) is the best adapted coating system for these high temperature applications. TBC is defined as a fine layer of material (generally ceramic or metallic material or both) directly deposited on the surface of the part In order to create a separation between the substrate and the environment to reduce the effect of the temperature aggression. However, the application of TBCs on surfaces of components presents a challenge in terms of the consistency of the thickness of the layer. This is due to the nature of the processes used to apply these coatings. It has been found that variations in the coating thickness can affect the thermodynamic performance of turbine blades as well as lead to premature damage due to higher thermal gradients in certain sections of the blade. Thus, it is necessary to optimise the thickness distribution of the coating.
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Beaulieu, David Cartier. "Electron Beam Chemical Vapor Deposition of Platinum and Carbon." Thesis, Georgia Institute of Technology, 2005. http://hdl.handle.net/1853/6990.

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Electron Beam Chemical Vapor Deposition (EBCVD) is a process by which an electron beam is used to decompose adsorbed reagent molecules to produce a deposit. The primary electrons from the beam, and especially the secondary electrons emitted from the substrate, dissociate the adsorbed molecules. Important factors for the deposition process include the beam parameters and reagent gas composition. Simple structures are fabricated through utilization of the various scanning modes of an SEM. Fibers (pillar-like structures) can be deposited, and lines (wall-like structures) can be deposited easily. This investigation focuses on the process parameters controlling deposition rate and geometry for platinum and carbon fibers and lines in a modified SEM. Platinum deposition was performed using a system with a small diameter needle that supplied a localized flow of gas from an organometallic platinum compound. Carbon deposition was performed in the Environmental mode, in which the microscope chamber is filled with a specified pressure of reagent gas. Statistically designed experiments were performed for platinum fiber and line deposition. Analysis indicated that the beam current and deposition time were dominant factors in determining the deposition rate. The voltage also had a significant effect on fiber deposition. For platinum line deposition, the effects of the dwell time and line time were also studied. The line time had a significant effect on line height deposited per scan. Optimization analysis was performed, and results indicated that high voltage and high beam current led to higher aspect ratios. Medium voltage and low beam current were preferable for depositing minimal width lines (less than 200 nm). Low voltage and high beam current were preferable for maximum deposition rates. EDS and EELS performed for platinum deposits in a TEM indicated amorphous structure with no carbon detected. This differs significantly from previously reported results. Statistically designed experiments were performed for carbon line deposition. The voltage, beam current, and dwell/line time were studied. Increasing line time led to a significant increase in line height/scan and appeared to be a dominant factor. Lower beam currents appeared to favor higher deposition rates. TEM analysis indicated that carbon deposits were mostly amorphous.
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Bernier, Jeremy Scott. "Evolution and characterization of partially stabilized zirconia (7wt% Y₂O₃) thermal barrier coatings deposited by electron beam physical vapor deposition." Link to electronic thesis, 2001. http://www.wpi.edu/Pubs/ETD/Available/etd-0517102-163444.

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Kolb, Tristan [Verfasser], and Hans-Werner [Akademischer Betreuer] Schmidt. "Electron beam lithography of molecular glass resist films prepared by physical vapor deposition / Tristan Kolb. Betreuer: Hans-Werner Schmidt." Bayreuth : Universität Bayreuth, 2014. http://d-nb.info/1070580961/34.

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Bernier, Jeremy Scott. "Evolution and Characterization of Partially Stabilized Zirconia (7wt% Y2O3) Thermal Barrier Coatings Deposited by Electron Beam Physical Vapor Deposition." Digital WPI, 2002. https://digitalcommons.wpi.edu/etd-theses/826.

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Thermal barrier coatings (TBCs) of ZrO2-7wt% Y2O3 were deposited by electron beam physical vapor deposition (EB-PVD) onto stationary flat plates and cylindrical surfaces in a multiple ingot coater. Crystallographic texture, microstructure, and deposition rate were investigated in this thesis. The crystallographic texture of EB-PVD TBCs deposited on stationary flat surfaces has been experimentally determined by comparing pole figure analysis data with actual column growth angle data. It was found that the TBC coating deposited directly above an ingot exhibits <220> single crystal type crystallographic texture. Coatings deposited between and off the centerline of the ingots the exhibited a <311>-type single crystal texture. For coatings deposited in the far corners of the coating chamber either a <111> fiber texture or a <311> single crystal type texture existed. The crystallographic texture of EB-PVD TBCs deposited on cylindrical surfaces was characterized using x-ray diffraction (XRD) at different angular positions on the cylinder substrate. XRD results revealed that crystallographic texture changes with angular position. Changes in crystallographic texture are attributed to the growth direction of the columns and substrate temperature. Growth direction is controlled by the direction of the incoming vapor flux (i.e. vapor incidence angle), in which competition occurs between crystallites growing at different rates. The fastest growing orientation takes over and dominates the texture. Substrate temperature variations throughout the coating chamber resulted in different growth rates and morphology. Morphology differences existed between cylindrical and flat plate surfaces. Flat cross sectional surfaces of the coatings exhibited a dense columnar structure in which the columns grew towards the closest vapor source. Surface features were found to be larger for coatings deposited directly above an ingot than coatings deposited away from the ingots. Morphological differences result from substrate temperature changes within the coating chamber, which influences growth kinetics of the coating. Cylindrical surfaces revealed a columnar structure in which columns grew towards the closest vapor. Porosity of the coating was found to increase when the angular position changed from the bottom of the cylinder. Change in angular position also caused the column diameter to decreases. Morphology changes are attributed to self-shadow effects caused by the surface curvature of the cylinder and vapor incidence angle changes. Overall, the microstructure and crystallographic texture of EB-PVD coatings was found to depend on the position in the coating chamber which was found to influence substrate temperature, growth directions, and shadowing effects. The coating thickness profiles for EB-PVD TBCs deposited on stationary cylinders have been experimentally measured and theoretically modeled using Knudsen's cosine law of emissions. A comparison of the experimental results with the model reveals that the model must to be modified to account for the sticking coefficient as well as a ricochet factor. These results are also discussed in terms of the effects of substrate temperature on the sticking coefficient, the ricochet factor, and coating density.
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Ayhan, Umut Baris. "Production Of Carbon Nanotubes By Chemical Vapor Deposition." Master's thesis, METU, 2004. http://etd.lib.metu.edu.tr/upload/12605199/index.pdf.

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ABSTRACT PRODUCTION OF CARBON NANOTUBES BY CHEMICAL VAPOR DEPOSITION Ayhan, Umut BariS M.S., Department of Chemical Engineering Supervisor: Prof. Dr. Gü
ngö
r Gü
ndü
z Co-Supervisor: Assoc. Prof. Dr. Burhanettin Ç
iç
ek July 2004, 75 pages Carbon nanotubes, which is one of the most attractive research subject for scientists, was synthesized by two different methods: Chemical vapor deposition (CVD), a known method for nanotube growth, and electron beam (e-beam), a new method which was used for the first time for the catalytic growth of carbon nanotubes. In both of the methods, iron catalyst coated silica substrates were used for the carbon nanotube growth, that were prepared by the Sol-Gel technique using aqueous solution of Iron (III) nitrate and tetraethoxysilane. The catalytic substrates were then calcined at 450 °
C under vacuum and iron was reduced at 500°
C under a flow of nitrogen and hydrogen. In CVD method the decomposition of acetylene gas was achieved at 600 °
C and 750 °
C and the carbon was deposited on the iron catalysts for nanotube growth. However, in e-beam method the decomposition of acetylene was achieved by applying pulsed high voltage on the gas and the carbon deposition on the silica substrate were done. The samples from both of the methods were characterized using transmission electron microscopy (TEM) and Raman spectroscopy techniques. TEM images and Raman spectra of the samples show that carbon nanotube growth has been achieved in both of the method. In TEM characterization, all nanotubes were found to be multi-walled carbon nanotubes (MWNT) and no single-walled carbon nanotubes (SWNT) were pictured. However, the Raman spectra show that there are also SWNTs in some of the samples.
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Zhang, Bochun. "Failure Mechanism Analysis and Life Prediction Based on Atmospheric Plasma-Sprayed and Electron Beam-Physical Vapor Deposition Thermal Barrier Coatings." Thesis, Université d'Ottawa / University of Ottawa, 2017. http://hdl.handle.net/10393/35709.

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Using experimentally measured temperature-process-dependent model parameters, the failure analysis and life prediction were conducted for Atmospheric Plasma Sprayed Thermal Barrier Coatings (APS-TBCs) and electron beam physical vapor deposition thermal barrier coatings (EB-PVD TBCs) with Pt-modified -NiAl bond coats deposited on Ni-base single crystal superalloys. For APS-TBC system, a residual stress model for the top coat of APS-TBC was proposed and then applied to life prediction. The capability of the life model was demonstrated using temperature-dependent model parameters. Using existing life data, a comparison of fitting approaches of life model parameters was performed. The role of the residual stresses distributed at each individual coating layer was explored and their interplay on the coating’s delamination was analyzed. For EB-PVD TBCs, based on failure mechanism analysis, two newly analytical stress models from the valley position of top coat and ridge of bond coat were proposed describing stress levels generated as consequence of the coefficient of thermal expansion (CTE) mismatch between each layers. The thermal stress within TGO was evaluated based on composite material theory, where effective parameters were calculated. The lifetime prediction of EB-PVD TBCs was conducted given that the failure analysis and life model were applied to two failure modes A and B identified experimentally for thermal cyclic process. The global wavelength related to interface rumpling and its radius curvature were identified as essential parameters in life evaluation, and the life results for failure mode A were verified by existing burner rig test data. For failure mode B, the crack growth rate along the topcoat/TGO interface was calculated using the experimentally measured average interfacial fracture toughness.
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Pereira, Vitor Emanuel M. Loureiro S. "Computer model to predict electron beam-physical vapour deposition (EB-PVD) and thermal barrier coating (TBC) deposition on substrates with complex geometry." Thesis, Cranfield University, 2000. http://dspace.lib.cranfield.ac.uk/handle/1826/5714.

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For many decades gas turbine engineers have investigated methods to improve engine efficiency further. These methods include advances in the composition and processing of materials, intricate cooling techniques, and the use of protective coatings. Thermal barrier coatings (TBCs) are the most promising development in superalloy coatings research in recent years with the potential to reduce metal surface temperature, or increase turbine entry temperature, by 70-200°C. In order for TBCs to be exploited to their full potential, they need to be applied to the most demanding of stationary and rotating components, such as first stage blades and vanes. Comprehensive reviews of coating processes indicate that this can only be achieved on rotating components by depositing a strain-tolerant layer applied by the electron beam-physical vapour deposition (EB-PVD) coating process. A computer program has been developed in Visual c++ based on the Knudsen cosine law and aimed at calculating the coating thickness distribution around any component, but typically turbine blades. This should permit the controlled deposition to tailor the TBC performance and durability. Various evaporation characteristics have been accommodated by developing a generalised point source evaporation model that involves real and virtual sources. Substrates with complex geometry can be modelled by generating an STL file from a CAD package with the geometric information of the component, which may include shadow-masks. Visualisation of the coated thickness distributions around components was achieved using OpenGL library functions within the computer model. This study then proceeded to verify the computer model by first measuring the coating thickness for experimental trial runs and then comparing the calculated coating thickness to that measured using a laboratory coater. Predicted thickness distributions are in good agreement even for the simplified evaporation model, but can be improved further by increasing the complexity of the source model.
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鈴木, 賢治, Kenji SUZUKI, 一秀 松本, Kazuhide MATSUMOTO, 貴博 久保, Takahiro KUBO, 修太郎 町屋, et al. "高エネルギー反射光によるEB-PVD遮熱コーティングの残留応力分布の解析." 日本機械学会, 2005. http://hdl.handle.net/2237/9130.

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Knorr, Nicholas J. "Fundamental studies of growth mechanisms in physical vapour deposition of aluminium." Thesis, University of Salford, 2000. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.365971.

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Books on the topic "Electron Beam-Physical Vapor Deposition"

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Solymar, L., D. Walsh, and R. R. A. Syms. Semiconductors. Oxford University Press, 2018. http://dx.doi.org/10.1093/oso/9780198829942.003.0008.

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Both intrinsic and extrinsic semiconductors are discussed in terms of their band structure. The acceptor and donor energy levels are introduced. Scattering is discussed, from which the conductivity of semiconductors is derived. Some mathematical relations between electron and hole densities are derived. The mobilities of III–V and II–VI compounds and their dependence on impurity concentrations are discussed. Band structures of real and idealized semiconductors are contrasted. Measurements of semiconductor properties are reviewed. Various possibilities for optical excitation of electrons are discussed. The technology of crystal growth and purification are reviewed, in particular, molecular beam epitaxy and metal-organic chemical vapour deposition.
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McGlynn, E., M. O. Henry, and J. P. Mosnier. ZnO wide-bandgap semiconductor nanostructures: Growth, characterization and applications. Edited by A. V. Narlikar and Y. Y. Fu. Oxford University Press, 2017. http://dx.doi.org/10.1093/oxfordhb/9780199533053.013.14.

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This article describes the growth, characterization and applications of zinc oxide (ZnO) wide-bandgap semiconductor nanostructures. It first introduces the reader to the basic physics and materials science of ZnO, with particular emphasis on the crystalline structure, electronic structure, optical properties and materials properties of ZnO wide-bandgap semiconductors. It then considers some of the commonly used growth methods for ZnO nanostructures, including vapor-phase transport, chemical vapor deposition, molecular beam epitaxy, pulsed-laser deposition, sputtering and chemical solution methods. It also presents the results of characterization of ZnO nanostructures before concluding with a discussion of some promising areas of application of ZnO nanostructures, such as field emission applications; electrical, optical/photonic applications; and applications in sensing, energy production, photochemistry, biology and engineering.
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Book chapters on the topic "Electron Beam-Physical Vapor Deposition"

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Auffan, Mélanie, Catherine Santaella, Alain Thiéry, Christine Paillès, Jérôme Rose, Wafa Achouak, Antoine Thill, et al. "Electron Beam Physical Vapor Deposition (EBPVD)." In Encyclopedia of Nanotechnology, 741. Dordrecht: Springer Netherlands, 2012. http://dx.doi.org/10.1007/978-90-481-9751-4_100214.

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Auffan, Mélanie, Catherine Santaella, Alain Thiéry, Christine Paillès, Jérôme Rose, Wafa Achouak, Antoine Thill, et al. "Electron-Beam-Induced Chemical Vapor Deposition." In Encyclopedia of Nanotechnology, 749. Dordrecht: Springer Netherlands, 2012. http://dx.doi.org/10.1007/978-90-481-9751-4_100216.

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Kato, Takeharu, Kazuhide Matsumoto, Yutaka Ishiwata, Tsukasa Hirayama, Hideaki Matsubara, Yuichi Ikuhara, and Hiroyasu Saka. "Transmission Electron Microscopy Study of Thermal Barrier Coatings Fabricated by Electron Beam-Physical Vapor Deposition." In Materials Science Forum, 2877–82. Stafa: Trans Tech Publications Ltd., 2005. http://dx.doi.org/10.4028/0-87849-960-1.2877.

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Kelly, Matthew, Jogender Singh, Judith Todd, Steven Copley, and Douglas Wolfe. "Quantative Microstructural Analysis of Thermal Barrier Coatings Produced by Electron Beam Physical Vapor Deposition." In Advanced Ceramic Coatings and Interfaces II, 71–80. Hoboken, NJ, USA: John Wiley & Sons, Inc., 2009. http://dx.doi.org/10.1002/9780470339510.ch8.

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Wada, Kunihiko, Yutaka Ishiwata, Norio Yamaguchi, and Hideaki Matsubara. "Strain Tolerance and Microstructure of Thermal Barrier Coatings Produced by Electron Beam Physical Vapor Deposition Process." In High-Temperature Oxidation and Corrosion 2005, 267–76. Stafa: Trans Tech Publications Ltd., 2006. http://dx.doi.org/10.4028/0-87849-409-x.267.

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Almeida, D. S., Cosme Roberto Moreira Silva, Maria Carmo Andrade Nono, and Carlos Alberto Alves Cairo. "Electron Beam-Physical Vapour Deposition of Zirconia Co-Doped with Yttria and Niobia." In Advanced Powder Technology IV, 453–58. Stafa: Trans Tech Publications Ltd., 2005. http://dx.doi.org/10.4028/0-87849-984-9.453.

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Mechnich, Peter, and Wolfgang Braue. "ZrO2 -Environmental Barrier Coatings for Oxide/Oxide Ceramic Matrix Composites Fabricated by Electron-Beam Physical Vapor Deposition." In Ceramic Transactions Series, 285–93. Hoboken, NJ, USA: John Wiley & Sons, Inc., 2010. http://dx.doi.org/10.1002/9780470909836.ch27.

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Moll, E. "Physical Vapor Deposition Techniques II: Ion Plating, Arc Deposition and Ion Beam Deposition." In Eurocourses: Mechanical and Materials Science, 181–97. Dordrecht: Springer Netherlands, 1992. http://dx.doi.org/10.1007/978-94-017-0631-5_8.

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Rigsbee, J. M. "Plasma- and Ion-Beam Assisted Physical Vapor Deposition: Processes and Materials." In Structure-Property Relationships in Surface-Modified Ceramics, 399–416. Dordrecht: Springer Netherlands, 1989. http://dx.doi.org/10.1007/978-94-009-0983-0_27.

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Buijnsters, J. G., M. Camero, L. Vázquez, F. Agullo-Rueda, C. Gómez-Aleixandre, and J. M. Albella. "Effect of Bias Voltage on the Physical Properties of Hydrogenated Amorphous Carbon Films Grown by Electron Cyclotron Resonance Chemical Vapour Deposition." In Advances in Science and Technology, 17–23. Stafa: Trans Tech Publications Ltd., 2006. http://dx.doi.org/10.4028/3-908158-04-4.17.

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Conference papers on the topic "Electron Beam-Physical Vapor Deposition"

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Northam, Matthew, Lin Rossmann, Brooke Sarley, Bryan Harder, Jun-Sang Park, Peter Kenesei, Jonathan Almer, Vaishak Viswanathan, and Seetha Raghavan. "Comparison of Electron-Beam Physical Vapor Deposition and Plasma-Spray Physical Vapor Deposition Thermal Barrier Coating Properties Using Synchrotron X-Ray Diffraction." In ASME Turbo Expo 2019: Turbomachinery Technical Conference and Exposition. American Society of Mechanical Engineers, 2019. http://dx.doi.org/10.1115/gt2019-90828.

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Abstract Electron-beam physical vapor deposition (EB-PVD) is widely used for the application of thermal barrier coatings (TBCs) to turbine blades in jet engines. An emerging method, plasma-spray physical vapor deposition (PS-PVD), is a hybrid technique whereby coatings can be applied via the liquid phase to form lamellar microstructures or via the vapor to form columnar microstructures similar to that of EB-PVD. In this study, PS-PVD and conventional EB-PVD coated samples of a columnar configuration were prepared and thermally cycled to 300 and 600 cycles. These samples were subsequently characterized in-situ, under thermal load using synchrotron x-rays. From the high-resolution x-ray diffraction (XRD) patterns, the residual and in-situ strain in the TGO layer was obtained during a thermal cycle. At high temperature, the TGO layer for both deposition methods displayed a constant near zero-strain for all samples as anticipated. In the samples with 300 thermal cycles, both deposition methods showed similar strain profiles in the TGO layer. For samples with 600 cycles, PS-PVD samples showed a more significant strain relief in the TGO at room temperature compared to similarly cycled EB-PVD samples. This could explain the coating lifetime performance between the two deposition methods. The findings support ongoing efforts to tune the manufacturing of PS-PVD coatings towards the goal of meeting or exceeding the performance of currently used coatings on jet engines. This will pave the way for more affordable high temperature coating alternatives that meet durability needs.
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Fouliard, Quentin P., Ranajay Ghosh, and Seetha Raghavan. "Delamination of Electron-Beam Physical-Vapor Deposition Thermal Barrier Coatings using Luminescent Layers." In AIAA Scitech 2021 Forum. Reston, Virginia: American Institute of Aeronautics and Astronautics, 2021. http://dx.doi.org/10.2514/6.2021-0432.

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Speransky, S. K., I. V. Rodionov, and K. S. Speransky. "Modeling the Process of Physical Vapor Deposition." In 2018 13th International Conference on Actual Problems of Electron Devices Engineering (APEDE). IEEE, 2018. http://dx.doi.org/10.1109/apede.2018.8542333.

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Henriques, Vinicius André Rodrigues, Carlos Alberto Alves Cairo, and Eduardo Tavares Galvani. "Development of Titanium Nitride Coatings in Titanium Alloys by Electron Beam Physical Vapor Deposition." In 2008 SAE Brasil Congress and Exhibit. 400 Commonwealth Drive, Warrendale, PA, United States: SAE International, 2008. http://dx.doi.org/10.4271/2008-36-0016.

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Bruk, M. A., E. N. Zhikharev, S. L. Shevchuk, I. A. Volegova, A. V. Spirin, E. N. Teleshov, V. A. Kalnov, and Yu P. Maishev. "Mask image formation by electron beam deposition from vapor phase." In SPIE Proceedings, edited by Kamil A. Valiev and Alexander A. Orlikovsky. SPIE, 2008. http://dx.doi.org/10.1117/12.802355.

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Queheillalt, Douglas T., Derek D. Hass, and Haydn N. G. Wadley. "Electron-beam-directed vapor deposition of multifunctional structures for electrochemical storage." In SPIE's 9th Annual International Symposium on Smart Structures and Materials, edited by Anna-Maria R. McGowan. SPIE, 2002. http://dx.doi.org/10.1117/12.475066.

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Saager, Stefan. "High-Rate Deposition of High-Pure Silicon Thin Films for PV-Absorber Layers by Crucible-Free Electron Beam Physical Vapor Deposition." In 62nd Society of Vacuum Coaters Annual Technical Conference. Society of Vacuum Coaters, 2019. http://dx.doi.org/10.14332/svc19.proc.0014.

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Ichihashi, Toshinari, and Shinji Matsui. "In-situ Observation on Electron Beam Induced Chemical Vapor Deposition by Transmission Electron Microscope." In 1987 Conference on Solid State Devices and Materials. The Japan Society of Applied Physics, 1987. http://dx.doi.org/10.7567/ssdm.1987.b-8-2ln.

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Ichihashi, Toshinari, and Shinji Matsui. "In-situ Observation On Electron Beam Induced Chemical Vapor Deposition By Transmission Electron Microscopy." In 1989 Microelectronic Intergrated Processing Conferences, edited by Leonard J. Brillson and Fred H. Pollak. SPIE, 1990. http://dx.doi.org/10.1117/12.963928.

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Bruk, M. A., E. N. Zhikharev, E. I. Grigoriev, A. V. Spirin, V. A. Kalnov, and I. E. Kardash. "Electron-beam-induced deposition of iron carbon nanostructures from iron dodecacarbonyl vapor." In SPIE Proceedings, edited by Kamil A. Valiev and Alexander A. Orlikovsky. SPIE, 2004. http://dx.doi.org/10.1117/12.558349.

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Reports on the topic "Electron Beam-Physical Vapor Deposition"

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Corderman, R., J. Dobbs, and P. Dupree. Electron beam physical vapor deposition through tungsten. Office of Scientific and Technical Information (OSTI), October 1997. http://dx.doi.org/10.2172/615635.

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Author, Not Given. Electron Beam Physical Vapor Deposition Coating Parameter Study. Office of Scientific and Technical Information (OSTI), November 2000. http://dx.doi.org/10.2172/790268.

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Meier, T. C. ,. LLNL. Rapid tooling by electron-beam vapor deposition. Office of Scientific and Technical Information (OSTI), February 1998. http://dx.doi.org/10.2172/301207.

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Wadley, Haydn N., and Phillip A. Parrish. Electron Beam - Directed Vapor Deposition of Low Cost Thermal Barrier Coatings. Fort Belvoir, VA: Defense Technical Information Center, March 2000. http://dx.doi.org/10.21236/ada374859.

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Shepp, T., and T. Feeley. Electron-Beam Vapor Deposition of Mold Inserts Final Report CRADA No. TSB-777-94. Office of Scientific and Technical Information (OSTI), March 2018. http://dx.doi.org/10.2172/1426124.

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You might also be interested in the extended bibliographies on the topic 'Electron Beam-Physical Vapor Deposition' for particular source types:
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