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Dissertations / Theses on the topic 'Electron Beam-Physical Vapor Deposition'
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1
Mahfoudhi, Marouen. "Numerical optimisation of electron beam physical vapor deposition coatings for arbitrarily shaped surfaces." Thesis, Cape Peninsula University of Technology, 2015. http://hdl.handle.net/20.500.11838/2225.
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Thesis (MTech (Mechanical Engineering))--Cape Peninsula University of Technology.<br>For the last few decades, methods to improve the engine efficiency and reduce the fuel consumption of jet engines have received increased attention. One of the solutions is to increase the operating temperature in order to increase the exhaust gas temperature, resulting in an increased engine power.
However, this approach can be degrading for some engine parts such as turbine blades, which are required to operate in a very hostile environment (at ≈ 90% of their melting point temperature).
Thus, an additional treatment must be carried out to protect these parts from corrosion, oxidation and erosion, as well as to maintain the substrate’s mechanical properties which can be modified by the high temperatures to which these parts are exposed.
Coating, as the most known protection method, has been used for the last few decades to protect aircraft engine parts. According to Wolfe and Co-workers [1], 75% of all engine components are now coated. The most promising studies show that the thermal barrier coating (TBC) is the best adapted coating system for these high temperature applications.
TBC is defined as a fine layer of material (generally ceramic or metallic material or both) directly deposited on the surface of the part In order to create a separation between the substrate and the environment to reduce the effect of the temperature aggression.
However, the application of TBCs on surfaces of components presents a challenge in terms of the consistency of the thickness of the layer. This is due to the nature of the processes used to apply these coatings. It has been found that variations in the coating thickness can affect the thermodynamic performance of turbine blades as well as lead to premature damage due to higher thermal gradients in certain sections of the blade. Thus, it is necessary to optimise the thickness distribution of the coating.
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Beaulieu, David Cartier. "Electron Beam Chemical Vapor Deposition of Platinum and Carbon." Thesis, Georgia Institute of Technology, 2005. http://hdl.handle.net/1853/6990.
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Electron Beam Chemical Vapor Deposition (EBCVD) is a process by which an electron beam is used to decompose adsorbed reagent molecules to produce a deposit. The primary electrons from the beam, and especially the secondary electrons emitted from the substrate, dissociate the adsorbed molecules. Important factors for the deposition process include the beam parameters and reagent gas composition. Simple structures are fabricated through utilization of the various scanning modes of an SEM. Fibers (pillar-like structures) can be deposited, and lines (wall-like structures) can be deposited easily.
This investigation focuses on the process parameters controlling deposition rate and geometry for platinum and carbon fibers and lines in a modified SEM. Platinum deposition was performed using a system with a small diameter needle that supplied a localized flow of gas from an organometallic platinum compound. Carbon deposition was performed in the Environmental mode, in which the microscope chamber is filled with a specified pressure of reagent gas.
Statistically designed experiments were performed for platinum fiber and line deposition. Analysis indicated that the beam current and deposition time were dominant factors in determining the deposition rate. The voltage also had a significant effect on fiber deposition. For platinum line deposition, the effects of the dwell time and line time were also studied. The line time had a significant effect on line height deposited per scan. Optimization analysis was performed, and results indicated that high voltage and high beam current led to higher aspect ratios. Medium voltage and low beam current were preferable for depositing minimal width lines (less than 200 nm). Low voltage and high beam current were preferable for maximum deposition rates. EDS and EELS performed for platinum deposits in a TEM indicated amorphous structure with no carbon detected. This differs significantly from previously reported results.
Statistically designed experiments were performed for carbon line deposition. The voltage, beam current, and dwell/line time were studied. Increasing line time led to a significant increase in line height/scan and appeared to be a dominant factor. Lower beam currents appeared to favor higher deposition rates. TEM analysis indicated that carbon deposits were mostly amorphous.
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Bernier, Jeremy Scott. "Evolution and characterization of partially stabilized zirconia (7wt% Y₂O₃) thermal barrier coatings deposited by electron beam physical vapor deposition." Link to electronic thesis, 2001. http://www.wpi.edu/Pubs/ETD/Available/etd-0517102-163444.
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Kolb, Tristan [Verfasser], and Hans-Werner [Akademischer Betreuer] Schmidt. "Electron beam lithography of molecular glass resist films prepared by physical vapor deposition / Tristan Kolb. Betreuer: Hans-Werner Schmidt." Bayreuth : Universität Bayreuth, 2014. http://d-nb.info/1070580961/34.
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Bernier, Jeremy Scott. "Evolution and Characterization of Partially Stabilized Zirconia (7wt% Y2O3) Thermal Barrier Coatings Deposited by Electron Beam Physical Vapor Deposition." Digital WPI, 2002. https://digitalcommons.wpi.edu/etd-theses/826.
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Thermal barrier coatings (TBCs) of ZrO2-7wt% Y2O3 were deposited by electron beam physical vapor deposition (EB-PVD) onto stationary flat plates and cylindrical surfaces in a multiple ingot coater. Crystallographic texture, microstructure, and deposition rate were investigated in this thesis. The crystallographic texture of EB-PVD TBCs deposited on stationary flat surfaces has been experimentally determined by comparing pole figure analysis data with actual column growth angle data. It was found that the TBC coating deposited directly above an ingot exhibits <220> single crystal type crystallographic texture. Coatings deposited between and off the centerline of the ingots the exhibited a <311>-type single crystal texture. For coatings deposited in the far corners of the coating chamber either a <111> fiber texture or a <311> single crystal type texture existed. The crystallographic texture of EB-PVD TBCs deposited on cylindrical surfaces was characterized using x-ray diffraction (XRD) at different angular positions on the cylinder substrate. XRD results revealed that crystallographic texture changes with angular position. Changes in crystallographic texture are attributed to the growth direction of the columns and substrate temperature. Growth direction is controlled by the direction of the incoming vapor flux (i.e. vapor incidence angle), in which competition occurs between crystallites growing at different rates. The fastest growing orientation takes over and dominates the texture. Substrate temperature variations throughout the coating chamber resulted in different growth rates and morphology. Morphology differences existed between cylindrical and flat plate surfaces. Flat cross sectional surfaces of the coatings exhibited a dense columnar structure in which the columns grew towards the closest vapor source. Surface features were found to be larger for coatings deposited directly above an ingot than coatings deposited away from the ingots. Morphological differences result from substrate temperature changes within the coating chamber, which influences growth kinetics of the coating. Cylindrical surfaces revealed a columnar structure in which columns grew towards the closest vapor. Porosity of the coating was found to increase when the angular position changed from the bottom of the cylinder. Change in angular position also caused the column diameter to decreases. Morphology changes are attributed to self-shadow effects caused by the surface curvature of the cylinder and vapor incidence angle changes. Overall, the microstructure and crystallographic texture of EB-PVD coatings was found to depend on the position in the coating chamber which was found to influence substrate temperature, growth directions, and shadowing effects. The coating thickness profiles for EB-PVD TBCs deposited on stationary cylinders have been experimentally measured and theoretically modeled using Knudsen's cosine law of emissions. A comparison of the experimental results with the model reveals that the model must to be modified to account for the sticking coefficient as well as a ricochet factor. These results are also discussed in terms of the effects of substrate temperature on the sticking coefficient, the ricochet factor, and coating density.
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Ayhan, Umut Baris. "Production Of Carbon Nanotubes By Chemical Vapor Deposition." Master's thesis, METU, 2004. http://etd.lib.metu.edu.tr/upload/12605199/index.pdf.
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ABSTRACT
PRODUCTION OF CARBON NANOTUBES BY
CHEMICAL VAPOR DEPOSITION
Ayhan, Umut BariS
M.S., Department of Chemical Engineering
Supervisor: Prof. Dr. Gü<br>ngö<br>r Gü<br>ndü<br>z
Co-Supervisor: Assoc. Prof. Dr. Burhanettin Ç<br>iç<br>ek
July 2004, 75 pages
Carbon nanotubes, which is one of the most attractive research subject for scientists, was synthesized by two different methods: Chemical vapor deposition (CVD), a known method for nanotube growth, and electron beam (e-beam), a new method which was used for the first time for the catalytic growth of carbon nanotubes.
In both of the methods, iron catalyst coated silica substrates were used for the carbon nanotube growth, that were prepared by the Sol-Gel technique using aqueous solution of Iron (III) nitrate and tetraethoxysilane. The catalytic substrates were then calcined at 450 °<br>C under vacuum and iron was reduced at 500°<br>C under a flow of nitrogen and hydrogen.
In CVD method the decomposition of acetylene gas was achieved at 600 °<br>C and 750 °<br>C and the carbon was deposited on the iron catalysts for nanotube growth. However, in e-beam method the decomposition of acetylene was achieved by applying pulsed high voltage on the gas and the carbon deposition on the silica substrate were done.
The samples from both of the methods were characterized using transmission electron microscopy (TEM) and Raman spectroscopy techniques. TEM images and Raman spectra of the samples show that carbon nanotube growth has been achieved in both of the method. In TEM characterization, all nanotubes were found to be multi-walled carbon nanotubes (MWNT) and no single-walled carbon nanotubes (SWNT) were pictured. However, the Raman spectra show that there are also SWNTs in some of the samples.
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Zhang, Bochun. "Failure Mechanism Analysis and Life Prediction Based on Atmospheric Plasma-Sprayed and Electron Beam-Physical Vapor Deposition Thermal Barrier Coatings." Thesis, Université d'Ottawa / University of Ottawa, 2017. http://hdl.handle.net/10393/35709.
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Using experimentally measured temperature-process-dependent model parameters, the failure analysis and life prediction were conducted for Atmospheric Plasma Sprayed Thermal Barrier Coatings (APS-TBCs) and electron beam physical vapor deposition thermal barrier coatings (EB-PVD TBCs) with Pt-modified -NiAl bond coats deposited on Ni-base single crystal superalloys. For APS-TBC system, a residual stress model for the top coat of APS-TBC was proposed and then applied to life prediction. The capability of the life model was demonstrated using temperature-dependent model parameters. Using existing life data, a comparison of fitting approaches of life model parameters was performed. The role of the residual stresses distributed at each individual coating layer was explored and their interplay on the coating’s delamination was analyzed. For EB-PVD TBCs, based on failure mechanism analysis, two newly analytical stress models from the valley position of top coat and ridge of bond coat were proposed describing stress levels generated as consequence of the coefficient of thermal expansion (CTE) mismatch between each layers. The thermal stress within TGO was evaluated based on composite material theory, where effective parameters were calculated. The lifetime prediction of EB-PVD TBCs was conducted given that the failure analysis and life model were applied to two failure modes A and B identified experimentally for thermal cyclic process. The global wavelength related to interface rumpling and its radius curvature were identified as essential parameters in life evaluation, and the life results for failure mode A were verified by existing burner rig test data. For failure mode B, the crack growth rate along the topcoat/TGO interface was calculated using the experimentally measured average interfacial fracture toughness.
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Pereira, Vitor Emanuel M. Loureiro S. "Computer model to predict electron beam-physical vapour deposition (EB-PVD) and thermal barrier coating (TBC) deposition on substrates with complex geometry." Thesis, Cranfield University, 2000. http://dspace.lib.cranfield.ac.uk/handle/1826/5714.
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For many decades gas turbine engineers have investigated methods to improve engine efficiency further. These methods include advances in the composition and processing of materials, intricate cooling techniques, and the use of protective coatings. Thermal barrier coatings (TBCs) are the most promising development in superalloy coatings research in recent years with the potential to reduce metal surface temperature, or increase turbine entry temperature, by 70-200°C. In order for TBCs to be exploited to their full potential, they need to be applied to the most demanding of stationary and rotating components, such as first stage blades and vanes. Comprehensive reviews of coating processes indicate that this can only be achieved on rotating components by depositing a strain-tolerant layer applied by the electron beam-physical vapour deposition (EB-PVD) coating process. A computer program has been developed in Visual c++ based on the Knudsen cosine law and aimed at calculating the coating thickness distribution around any component, but typically turbine blades. This should permit the controlled deposition to tailor the TBC performance and durability. Various evaporation characteristics have been accommodated by developing a generalised point source evaporation model that involves real and virtual sources. Substrates with complex geometry can be modelled by generating an STL file from a CAD package with the geometric information of the component, which may include shadow-masks. Visualisation of the coated thickness distributions around components was achieved using OpenGL library functions within the computer model. This study then proceeded to verify the computer model by first measuring the coating thickness for experimental trial runs and then comparing the calculated coating thickness to that measured using a laboratory coater. Predicted thickness distributions are in good agreement even for the simplified evaporation model, but can be improved further by increasing the complexity of the source model.
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鈴木, 賢治, Kenji SUZUKI, 一秀 松本 та ін. "高エネルギー反射光によるEB-PVD遮熱コーティングの残留応力分布の解析". 日本機械学会, 2005. http://hdl.handle.net/2237/9130.
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Knorr, Nicholas J. "Fundamental studies of growth mechanisms in physical vapour deposition of aluminium." Thesis, University of Salford, 2000. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.365971.
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Morken, Michael Owen Morken. "An Investigation Into The Feasibility Of Transparent Conductive Coatings At Visimax Technologies." Case Western Reserve University School of Graduate Studies / OhioLINK, 2017. http://rave.ohiolink.edu/etdc/view?acc_num=case1496835960043161.
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Ferguson, R. Matthew. "Steps toward the creation of a carbon nanotube single electron transistor." Pomona College, 2003. http://ccdl.libraries.claremont.edu/u?/stc,0.
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This report details work toward the fabrication of a single-electron transistor created from a single-walled carbon nanotube (SWNT). Specifically discussed is a method for growing carbon nanotubes (CNTs) via carbon vapor deposition (CVD). The growth is catalyzed by a solution of 0.02g Fe(NO3)3·9H2O, 0.005g MoO2(acac)2, and 0.015g of alumina particles in 15mL methanol. SWNT diameter ranges from 0.6 to 3.0 nm. Also discussed is a method to control nanotube growth location by patterning samples with small islands of catalyst. A novel “maskless” photolithographic process is used to focus light from a lightweight commercial digital projector through a microscope. Catalyst islands created by this method are approximately 400 μm2 in area.
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Alam, Md Khorshed. "Fabrication of surface enhanced Raman spectroscopy (SERS) active substrates based on vertically aligned nitrogen doped carbon nanotube forest." Thesis, Umeå universitet, Institutionen för fysik, 2015. http://urn.kb.se/resolve?urn=urn:nbn:se:umu:diva-101573.
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This thesis work describes the fabrication and surface enhanced Raman spectroscopy (SERS) characterization of vertically aligned nitrogen (N) doped multi walled carbon nanotube (MWCNT) forests coated by silver (Ag) and gold (Au) nanoparticles. In the present work, the CNT forests were grown from a catalyst metal layer by the chemical vapor deposition (CVD) process at temperature of 800 oC and a physical vapor deposition (PVD) and annealing processes were applied subsequently for the evaporation and diffusion of noble metal nanoparticles on the forest. Transistor patterning of 20, 50 and 100 μm were made onto the silicon-oxide (SiO2) wafers through the photolithography process with and without depositing a thickness of 10 nm titanium (Ti) buffer layer on the Si-surfaces. Iron (Fe) and cobalt (Co) were used together to deposite a thickness of 5 nm catalyst layer onto the Single Side Polished (SSP) wafers. As carbon and nitrogen precursor for the CNT growth was used pyridine. Two different treatment times (20 and 60 minutes) in the CVD process determined the CNT forest height. Scanning Electron Microscopy (SEM) imaging was employed to characterize the CNT forest properties and Ag and Au nanoparticle distribution along the CNT walls. The existence of “hot spots” created by the Ag and Au nanoparticles through the surface roughness and plasmonic properties was demonstrated by the SERS measurements. Accordingly, the peak intensity at wave number of 1076 cm-1 was picked up from each SERS spectra to establish the Ag- and Au-trend curves with different concentrations of 4-ATP solution. The SERS mapping was also carried out to study the Ag- and Au-coated CNT surface homogeneity and “hot spots” distribution on the CNT surface. The SERS enhancement factors (EF) were calculated by applying an analyte solution of ethanolic 4-ATP on the CNT surface. The calculated values of EF from Ag- and Au-coated CNT forests were 9×106 and 2.7×105 respectively.
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Evans, Ryan David. "Tribological Thin Films on Steel Rolling Element Bearing Surfaces." Case Western Reserve University School of Graduate Studies / OhioLINK, 2006. http://rave.ohiolink.edu/etdc/view?acc_num=case1133365793.
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Gilmore, Annette Clare. "Microscopic studies of doped and electron irradiated CVD diamond." Thesis, University of Bristol, 1999. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.313357.
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Boeckl, John J. "Microstructural investigation of defects in epitaxial GaAs grown on mismatched Ge and SiGe/Si substrates." The Ohio State University, 2005. http://rave.ohiolink.edu/etdc/view?acc_num=osu1116498970.
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J, Boeckl John. "Microstructural investigation of defects in epitaxial GaAs grown on mismatched Ge and SiGe/Si substrates." Connect to this title online, 2005. http://rave.ohiolink.edu/etdc/view?acc%5Fnum=osu1116498970.
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Thesis (Ph. D.)--Ohio State University, 2005.<br>Title from first page of PDF file. Document formatted into pages; contains xxii, 212 p.; also includes graphics. Includes bibliographical references (p. 203-212). Available online via OhioLINK's ETD Center
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Azzopardi, Alban. "Evolution microstructurale à haute température de barrières thermiques déposées par évaporation : influence sur la conductivité thermique et le module d'élasticité." Paris 6, 2003. http://www.theses.fr/2003PA066010.
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Loader, Charlotte Bree. "Structural properties of multi-layered materials." Thesis, Imperial College London, 2000. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.342222.
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Mareček, David. "Vliv elektronového svazku na grafenové polem řízené tranzistory." Master's thesis, Vysoké učení technické v Brně. Fakulta strojního inženýrství, 2017. http://www.nusl.cz/ntk/nusl-320004.
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This diploma thesis deals with electrical conductivity of a graphene sample, preparation of a graphene field-effect transistor and his irradiation by electron beam. In the theoretical part of the thesis, we describe electronic properties of graphene, preparation of graphene by CVD and its transfer to Si substrate with SiO_2 layer. Experimental part of this thesis is focused on the preparation of a graphene field-effect transistor for use in UHV conditions. Futher describes electron beam scanning over the transistor and creation of current maps of tranzistor. In the last part, the thesis deals with influence of electron beam on transport properties of graphene layer and doping of graphene layer by electron beam.
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Schmeißer, Martin Anton Helmut. "Photocathodes for high brightness, high average current photoelectron injectors." Doctoral thesis, Humboldt-Universität zu Berlin, 2019. http://dx.doi.org/10.18452/20481.
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Für viele Anwendungen in der Grundlagenforschung, Medizin und industriellen Entwicklung sind Beschleuniger der entscheidende Antrieb. Vor allem Elektronenbeschleuniger sind als Synchrotronquellen unter den brillantesten Quellen für Strahlung im Infrarot- bis Röntgenbereich und damit unerlässlich für eine Vielzahl von Anwendungen und analytischen Methoden. Photoinjektoren stellen als Elektronenquellen für Beschleuniger eine wichtige Komponente für die Entwicklung von Lichtquellen wie Freie-Elektronen-Laser, sowie für neue Beschleunigerkonzepte wie Linearbeschleuniger mit Energierückgewinnung dar. Die Photokathode und der Anregungslaser definieren dabei mit der Quantenausbeute (QE) und der intrinsischen Emittanz zentrale Kenngrößen des Photoinjektors.
Diese Arbeit beschreibt die Entwicklung von Alkali-Antimonid Photokathoden für die Anwendung in einem Photoinjektor mit supraleitendem Hochfrequenz-Resonator. Alkali Antimonide zeigen generell eine hohe QE und Cäsium Kalium Antimonid (Cs-K-Sb) im speziellen verspricht eine geringe intrinsische Emittanz aufgrund der Ionisierungsenergie, die nur knapp unter der Photonenenergie der grünen Anregungslaser liegt.
Mit der Inbetriebnahme eines Präparations- und Analysesystems konnte die Abscheidung dünner Schichten von Cs-K-Sb sowie die Messung der QE und chemischen Zusammensetzung erzielt werden. Dabei wurde mit der Ko-evaporation der Alkalimetalle eine neue Wachstumsmethode etabliert und hinsichtlich der Prozessstabilität und Qualität der erzeugten Proben mit der sequenziellen Methode verglichen.
Schließlich beschreiben die Inbetriebnahme eines Prototyps des Photoinjektors und erste erfolgreiche Kathodentransfers im Vakuum einen wichtigen Schritt hin zum Betrieb eines Beschleunigers mit einer Cs-K-Sb Photokathode im supraleitenden Hochfrequenz-Injektor. Diese Kombination erlaubt die Erzeugung eines Elektronenstrahls mit niedriger Emittanz und hohem mittleren Strom.<br>For many disciplines in basic and applied research, medicine and industrial development accelerators are an important driving force. Especially electron accelerators as synchrotron sources are among the brightest sources of radiation from the infrared to the X-ray regime and thus fundamental to a broad range of analytical techniques. Photoinjectors as electron sources for accelerator applications are a key component for the development of light sources such as free electron lasers as well as new accelerator concepts like energy-recovery linacs. The photocathode and drive laser define the quantum efficiency (QE) and intrinsic emittance of the photoemission process and thus central figures of merit of the photoinjector.
This work focuses on the development of alkali antimonide photocathodes for the application in a superconducting radio frequency photoinjector.
Alkali antimonides generally exhibit a high QE and cesium potassium antimonide (Cs-K-Sb) specifically is expected to release electrons with a low intrinsic emittance as the photoemission threshold is close to the photon energy of common, green, drive laser wavelengths.
A preparation and analysis system has been commissioned for the deposition of Cs-K-Sb thin film photocathodes and their analysis regarding QE and chemical composition. A new deposition technique, the alkali metal co-deposition, was established and compared to the sequential deposition in terms of process reliability and quality of the produced samples.
The work concludes with a report of the commissioning of a prototype of the photoinjector and successful cathode transfers in ultra-high vacuum, which represents an important technological advancement towards the operation of an accelerator with the combination of Cs-K-Sb photocathodes and an SRF injector. This combination makes the generation of an electron beam with low emittance and high average current possible.
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Kormoš, Lukáš. "Aplikace grafénové membrány v nanoelektronických zařízeních." Master's thesis, Vysoké učení technické v Brně. Fakulta strojního inženýrství, 2015. http://www.nusl.cz/ntk/nusl-231954.
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This diploma thesis is focused on the applications and fabrication of graphene membrane from graphene prepared by the chemical vapor deposition. Theoretical part deals with transport properties of the graphene and multiple scattering processes limiting the charge carrier mobility in this material. Included is short review of graphene membrane applications. Experimental part provides fabrication process for achieving suspended graphene device by utilizing electron beam lithography, focused ion beam, chemical etching and patterning of graphene. Graphene membrane is characterized by transport properties measurement and compared to non-suspended graphene.
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Flink, Axel. "Growth and Characterization of Ti-Si-N Hard Coatings." Licentiate thesis, Linköping : Department of Physics, Chemistry and Biology, Linköping University, 2006. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-7741.
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Gasparetto, Jacopo. "Investigation of indium tin oxide-titanium dioxide interconnection layers for perovskite-silicon tandem solar cells." Master's thesis, Alma Mater Studiorum - Università di Bologna, 2017. http://amslaurea.unibo.it/14230/.
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Per superare i limiti di efficienza delle tradizionali celle al silicio, dovuti alla termalizzazione degli elettroni generati dai fotoni solari più energetici, la comunità scientifica si è recentemente indirizzata verso la tecnologia di celle tandem monolitiche perovskite-silicio. In questo tipo di dispositivi, una cella perovskite viene depositata direttamente su di una cella etero-giunzione al silicio (SHJ) ad alta efficienza e, grazie al suo band gap, assorbe i fotoni più energetici permettendo un efficienza totale maggiore. Le celle perovskite attualmente in fase di studio presso Fraunhofer ISE possiedono un contatto posteriore formato da diossido di titanio (TiO2), mentre il contatto frontale delle celle SHJ è formato tipicamente di indium tin oxide (ITO). In questo lavoro si è studiata la fattibilità di celle solari tandem perovskite-silicio, analizzando dettagliatamente l’interfaccia ITO/TiO2 e la sua resistività. Poiché la resistenza di serie di una cella fotovoltaica, di qualunque natura, è un parametro fortemente limitate per l’efficienza di conversione, è necessario che questi layer di interconnessione abbiano una resistenza più bassa possibile per non causare perdite dovute al trasporto dei portatori di carica. Sono stati preparati campioni con formati da uno stack ITO/TiO2/ITO depositato su un substrato di silicio. Tutti i layer di ITO sono stati depositati tramite sputtering mentre sono state testate tre differenti tecniche di deposizione per il TiO2: Electron Beam Physical Vapour Deposition (EBPVD), Thermal Atomic Layer Deposition (T-ALD) e Plasma Enhanced ALD (PE-ALD). Per ogni tecnica di deposizione del TiO2 si è studiata la resistenza dei film, anche in seguito a trattamenti termici a differenti condizioni. Sono state inoltre condotte analisi di diffrazione a raggi X (XRD) e spettroscopia fotoelettronica a raggi X (XPS) per sondare la struttura cristallina e la composizione chimica dei layer di TiO2 depositati su ITO tramite le differenti tecniche.
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Macak, Eva. "Electron microscopy of sharp edges and corners coated by ion-assisted PVD." Thesis, Sheffield Hallam University, 2003. http://shura.shu.ac.uk/19991/.
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The thesis examines ion-assisted physical-vapour deposition (PVD) of thin coatings on non-flat three-dimensional samples, concentrating on the case of free-standing edges and comers. Changes in the electric field in the vicinity of sharp edges lead to local changes in the ion bombardment (ion flux and angle of incidence) which can significantly affect the ion-surface interaction and thus the properties and the performance of the coatings growing in the edge region. This work presents a detailed electron microscopy study of the edge-related changes in the coating properties and develops a physical model to explain and quantify the effects. The problem is studied on a system typical for industrial coating of cutting tools used in dry high speed cutting: TiAlN-type coatings (TiAlN/VN and TiAlCrYN) deposited on wedge-shaped samples by closed-field unbalanced magnetron sputtering (UBM), using high-flux, low-energy Ar+ ion irradiation (J[i]/J[me]~4, E[i] = 75-150 eV). The morphology and composition of the coatings in the edge region, as a function of the edge geometry (angle and radius of curvature) and the deposition conditions (substrate bias), is studied using scanning electron microscopy combined with energy-dispersive X-ray spectroscopy (SEM+EDX). The internal structure of the coatings growing on sharp edges is examined by transmission electron microscopy (TEM). A detailed theoretical analysis of the effects, based on the simulations of the plasma sheath around the samples and the resulting ion bombardment distribution, is presented. A direct relationship between the experimentally observed magnitude and spatial extent of the changes in the edge region and the simulated characteristics of the plasma sheath around the edges is shown.
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Hagerty, Phillip. "Physical Vapor Deposition of Materials for Flexible Two Dimensional Electronic Devices." University of Dayton / OhioLINK, 2016. http://rave.ohiolink.edu/etdc/view?acc_num=dayton1460739765.
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Mukherjee, Sriparna. "Evolution of microstructure and residual stress in disc-shape EB-PVD thermal barrier coatings and temperature profile of high pressure turbine blade." Master's thesis, University of Central Florida, 2011. http://digital.library.ucf.edu/cdm/ref/collection/ETD/id/4989.
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A detailed understanding of failure mechanisms in thermal barrier coatings (TBCs) can help develop reliable and durable TBCs for advanced gas turbine engines. One of the characteristics of failure in electron beam physical vapor deposited (EB-PVD) TBCs is the development of instability, named rumpling, at the interface between (Ni, Pt)Al bond coat and thermally grown oxide (TGO). In this study, thermal cycling at 1100[degrees]C with 1 hr dwell time was carried out on 25.4mm disc specimens of TBCs that consisted of EB-PVD coated ZrO[sub2]-7wt.%Y[sub2]O[sub3], (Pt,Ni)Al bond coat, and CMSX-4 Ni-based superalloy. At specific fraction of lifetime, TBCs were examined by electron microscopy and photostimulated luminescence (PL). Changes in the average compressive residual stress of the TGO determined by PL and the magnitude of rumpling, determined by tortuosity from quantitative microstructural analyses, were examined with respect to the furnace thermal cyclic lifetime and microstructural evolution of TBCs. The combination of elastic strain energy within the TGO and interfacial energy at the interface between the TGO and the bond coat was defined as the TGO energy, and its variation with cyclic oxidation time was found to remain approximately constant ~135J/m[super2] during thermal cycling from 10% to 80% thermal cyclic lifetime. Parametric study at ~135J/m[super2] was performed and variation in residual stress with rumpling for different oxide scale thicknesses was examined. This study showed that the contribution of rumpling in residual stress relaxation decreased with an increase in TGO thickness. High pressure turbine blades serviced for 2843 hours and in the as coated form were also examined using electron microscopy and photostimulated luminescence. The difference in residual stress values obtained using PL on the suction and pressure sides of as-coated turbine blade were discussed.; The presence of a thick layer of deposit on the serviced blade gave signals from stress free alpha]-Al[sub2]O[sub3] in the deposit, not from the TGO. The TGO growth constant data from the disc-shape TBCs, thermally cycled at 1100??C, and studies by other authors at different temperatures but on similar EB-PVD coated TBCs with (Pt, Ni)Al bond coat and CMSX-4 Ni- based superalloy were used to determine the temperature profile at the YSZ/bond coat interface. The interfacial temperature profiles of the serviced blade and the YSZ thickness profile were compared to document the variable temperature exposure at the leading edge, trailing edge, suction and the pressure side.<br>ID: 030423389; System requirements: World Wide Web browser and PDF reader.; Mode of access: World Wide Web.; Thesis (M.S.)--University of Central Florida, 2011.; Includes bibliographical references (p. 90-92).<br>M.S.<br>Masters<br>Mechanical, Materials, and Aerospace Engineering<br>Engineering and Computer Science
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Sharma, Varun. "Evaluation of novel metalorganic precursors for atomic layer deposition of Nickel-based thin films." Master's thesis, Saechsische Landesbibliothek- Staats- und Universitaetsbibliothek Dresden, 2015. http://nbn-resolving.de/urn:nbn:de:bsz:14-qucosa-166627.
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Nickel und Nickel (II) -oxid werden in großem Umfang in fortgeschrittenen elektronischen Geräten verwendet. In der Mikroelektronik-Industrie wird Nickel verwendet werden, um Nickelsilizid bilden. Die Nickelmono Silizid (NiSi) wurde als ausgezeichnetes Material für Source-Drain-Kontaktanwendungen unter 45 nm-CMOS-Technologie entwickelt. Im Vergleich zu anderen Siliziden für die Kontaktanwendungen verwendet wird NiSi wegen seines niedrigen spezifischen Widerstand, niedrigen Kontaktwiderstand, relativ niedrigen Bildungstemperatur und niedrigem Siliziumverbrauchs bevorzugt. Nickel in Nickelbasis-Akkus und ferromagnetischen Direktzugriffsspeicher (RAMs) verwendet. Nickel (II) oxid wird als Transistor-Gate-Oxid und Oxid in resistive RAM genutzt wird. Atomic Layer Deposition (ALD) ist eine spezielle Art der Chemical Vapor Deposition (CVD), das verwendet wird, um sehr glatte sowie homogene Dünnfilme mit hervorragenden Treue auch bei hohen Seitenverhältnissen abzuscheiden. Es basiert auf selbstabschließenden sequentielle Gas-Feststoff-Reaktionen, die eine präzise Steuerung der Filmdicke auf wenige Angström lassen sich auf der Basis. Zur Herstellung der heutigen 3D-elektronische Geräte, sind Technologien wie ALD erforderlich. Trotz der Vielzahl von praktischen Anwendungen von Nickel und Nickel (II) -oxid, sind einige Nickelvorstufen zur thermischen basierend ALD erhältlich. Darüber hinaus haben diese Vorstufen bei schlechten Filmeigenschaften führte und die Prozesseigenschaften wurden ebenfalls begrenzt. Daher in dieser Masterarbeit mussten die Eigenschaften verschiedener neuartiger Nickelvorstufen zu bewerten. Alle neuen Vorstufen heteroleptische (verschiedene Arten von Liganden) und Komplexe wurden vom Hersteller speziell zur thermischen basierend ALD aus reinem Nickel mit H 2 als ein Co-Reaktionsmittel gestaltet. Um die neuartige Vorläufer zu untersuchen, wurde eine neue Methode entwickelt, um kleine Mengen in einer sehr zeitsparend (bis zu 2 g) von Ausgangsstoffen zu testen. Diese Methodologie beinhaltet: TGA / DTA-Kurve analysiert der Vorstufen, thermische Stabilitätstests in dem die Vorläufer (<0,1 g) wurden bei erhöhter Temperatur in einer abgedichteten Umgebung für mehrere Stunden wurde die Abscheidung Experimenten und Film Charakterisierungen erhitzt. Die Abscheidungen wurden mit Hilfe der in situ Quarzmikrowaage überwacht, während die anwendungsbezogenen Filmeigenschaften, wie chemische Zusammensetzung, physikalische Phase, Dicke, Dichte, Härte und Schichtwiderstand wurden mit Hilfe von ex situ Messverfahren untersucht. Vor der Evaluierung neuartiger Nickelvorstufen ein Benchmark ALD-Prozess war vom Referenznickelvorläufer (Ni (AMD)) und Luft als Reaktionspartner entwickelt. Das Hauptziel der Entwicklung und Optimierung von solchen Benchmark-ALD-Prozess war es, Standard-Prozessparameter wie zweite Reaktionspartner Belichtungszeiten, Argonspülung Zeiten, gesamtprozessdruck, beginnend Abscheidungstemperatur und Gasströme zu extrahieren. Diese Standard-Prozessparameter mussten verwendet, um die Prozessentwicklung Aufgabe (das spart Vorläufer Verbrauch) zu verkürzen und die Sublimationstemperatur Optimierung für jede neuartige Vorstufe werden. Die ALD Verhalten wurde in Bezug auf die Wachstumsrate durch Variation des Nickelvorläuferbelichtungszeit, Vorläufer Temperatur und Niederschlagstemperatur überprüft<br>Nickel and nickel(II) oxide are widely used in advanced electronic devices . In microelectronic industry, nickel is used to form nickel silicide. The nickel mono-silicide (NiSi) has emerged as an excellent material of choice for source-drain contact applications below 45 nm node CMOS technology. As compared to other silicides used for the contact applications, NiSi is preferred because of its low resistivity, low contact resistance, relatively low formation temperature and low silicon consumption. Nickel is used in nickel-based rechargeable batteries and ferromagnetic random access memories (RAMs). Nickel(II) oxide is utilized as transistor gate-oxide and oxide in resistive RAMs. Atomic Layer Deposition (ALD) is a special type of Chemical Vapor Deposition (CVD) technique, that is used to deposit very smooth as well as homogeneous thin films with excellent conformality even at high aspect ratios. It is based on self-terminating sequential gas-solid reactions that allow a precise control of film thickness down to few Angstroms. In order to fabricate todays 3D electronic devices, technologies like ALD are required. In spite of huge number of practical applications of nickel and nickel(II) oxide, a few nickel precursors are available for thermal based ALD. Moreover, these precursors have resulted in poor film qualities and the process properties were also limited. Therefore in this master thesis, the properties of various novel nickel precursors had to be evaluated. All novel precursors are heteroleptic (different types of ligands) complexes and were specially designed by the manufacturer for thermal based ALD of pure nickel with H 2 as a co-reactant. In order to evaluate the novel precursors, a new methodology was designed to test small amounts (down to 2 g) of precursors in a very time efficient way. This methodology includes: TGA/DTA curve analyses of the precursors, thermal stability tests in which the precursors (< 0.1 g) were heated at elevated temperatures in a sealed environment for several hours, deposition experiments, and film characterizations. The depositions were monitored with the help of in situ quartz crystal microbalance, while application related film properties like chemical composition, physical phase, thickness, density, roughness and sheet resistance were investigated with the help of ex situ measurement techniques. Prior to the evaluation of novel nickel precursors, a benchmark ALD process was developed from the reference nickel precursor (Ni(amd)) and air as a co-reactant. The main goal of developing and optimizing such benchmark ALD process was to extract standard process parameters like second-reactant exposure times, Argon purge times, total process pressure, starting deposition temperature and gas flows. These standard process parameters had to be utilized to shorten the process development task (thus saving precursor consumption) and optimize the sublimation temperature for each novel precursor. The ALD behaviour was checked in terms of growth rate by varying the nickel precursor exposure time, precursor temperature and deposition temperature
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Beeler, David Allen. "Analysis of Laser Induced Spallation of Electron Beam Physical Vapor Deposited (EB-PVD) Thermal Barrier Coatings." Wright State University / OhioLINK, 2013. http://rave.ohiolink.edu/etdc/view?acc_num=wright1380478836.
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Rykaczewski, Konrad. "Electron beam induced deposition (EBID) of carbon interface between carbon nanotube interconnect and metal electrode." Diss., Atlanta, Ga. : Georgia Institute of Technology, 2009. http://hdl.handle.net/1853/31773.
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Thesis (Ph.D)--Mechanical Engineering, Georgia Institute of Technology, 2010.<br>Committee Chair: Dr. Andrei G. Fedorov; Committee Member: Dr. Azad Naeemi; Committee Member: Dr. Suresh Sitaraman; Committee Member: Dr. Vladimir V. Tsukruk; Committee Member: Dr. Yogendra Joshi. Part of the SMARTech Electronic Thesis and Dissertation Collection.
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Šeda, Miroslav. "Tlakový senzor typu MEMS využívající nanokompozity." Master's thesis, Vysoké učení technické v Brně. Fakulta elektrotechniky a komunikačních technologií, 2008. http://www.nusl.cz/ntk/nusl-217234.
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The main goal of this work is to introduce with the basic technologies of manufacturing MEMS (Micro-electro-mechanical-systems). Further there is mentioned properties and manufacturing of CNT (Carbon nanotubes), used in manufacturing of capacitance pressure sensor.
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Biegler, Zachary J. "Growth, Optimization, and Characterization of Transition Metal Nitrides and Transition Metal Oxides for Electronic and Optical Applications." University of Dayton / OhioLINK, 2019. http://rave.ohiolink.edu/etdc/view?acc_num=dayton1574016211227215.
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Casimirius, Stéphane. "Croissance localisée de nanotubes de carbone aux échelles micrométrique et nanométrique." Phd thesis, Université Paul Sabatier - Toulouse III, 2006. http://tel.archives-ouvertes.fr/tel-00136052.
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La réalisation de dispositifs nanotechnologiques comportant des nanotubes de carbone (NTC) repose essentiellement sur l'intégration contrôlée des NTC sur substrat. Nous avons développé cette thématique en choisissant, plutôt que la manipulation de NTC synthétisés, l'approche de la croissance localisée de NTC par dépôt chimique catalytique en phase vapeur (CCVD) sous mélange de gaz H2-CH4. Nos travaux nous ont permis de synthétiser sélectivement des NTC à partir de sites catalytiques définis, sur des substrats de silicium. Notre étude a porté sur la synthèse de NTC à partir de dépôts de nanoparticules (NP) catalytiques de cobalt préparées selon trois voies distinctes : formation in situ de NP sur support oxyde par réduction sélective de la solution solide Mg0,95Co0,05O préparée par voie sol-gel ; NP de Co préformées par voie chimique, déposées directement sur un substrat SiO2/Si ; NP formées par le recuit de couche mince métallique Co également déposée sur substrat SiO2/Si. Nous avons démontré que la CCVD sous CH4 pur ou sous mélange H2-CH4, avec montée en température sous gaz inerte, aboutit à la formation de NTC dès 850°C, à partir de dépôts catalytiques non structurés. En particulier, le choix du système catalytique adéquat permet (1) de produire des films denses de NTC (environ 1 NTC/µm²) ; (2) de favoriser la formation de NTC mono- ou biparois, dont le diamètre est généralement compris entre 0,8 et 4 nm, et la longueur de l'ordre de quelques dizaines de µm. Des techniques de structuration ont été développées dans le but de localiser les dépôts de NP catalytiques. Le tamponnage (technique de lithographie molle) d'un précurseur catalytique liquide (sol ou suspension de NP Co) à l'aide d'un timbre apparaît comme une technique adéquate pour la production de motifs catalytiques micrométriques (1 - 100 µm). En revanche, la lithographie électronique associée au dépôt en couche mince (lift-off) demeure l'outil privilégié pour localiser des motifs catalytiques de dimensi ons nanométriques (jusqu'à 50 nm) par rapport aux structures prédéfinies du substrat de silicium. Nos travaux démontrent l'adéquation de la croissance localisée pour la production de motifs de NTC avec un certain contrôle de la densité surfacique des NTC, compatible avec la formation d'interconnexions entre motifs voisins. La dimension ultime des motifs produits varie entre 50 nm et 100 µm, selon la nature du catalyseur et de la technique de structuration employée. Notre étude ne met pas en évidence l'influence nette de l'organisation des motifs catalytiques sur l'orientation des NTC, qui reste majoritairement aléatoire à la surface des substrats SiO2/Si, et ce quelle que soit la nature du catalyseur mis en Suvre.
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Frafjord, Jaret James. "Combinatorial design of Nickel-Chromium alloys by physical vapor deposition and electron beam welding." 2004. http://etd.utk.edu/2004/FrafjordJaret.pdf.
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Thesis (M.S.)--University of Tennessee, Knoxville, 2004.<br>Title from title page screen (viewed Jan. 12, 2005). Thesis advisor: George M. Pharr. Document formatted into pages (ix, 87 p. : ill. (some col.)). Vita. Includes bibliographical references (p. 80-86).
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Dhulipalla, Anvesh. "Thickness Prediction of Deposited Thermal Barrier Coatings using Ray Tracing and Heat Transfer Methods." Thesis, 2020. http://hdl.handle.net/1805/24763.
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Indiana University-Purdue University Indianapolis (IUPUI)<br>Thermal barrier coatings (TBCs) have been extensively employed as thermal protection in hot sections of gas turbines in aerospace and power generation applications. However, the fabrication of TBCs still needs to improve for better coating quality, such as achieving coating thickness' uniformity. However, several previous studies on the coating thickness prediction and a systematic understanding of the thickness evolution during the deposition process are still missing.
This study aims to develop high-fidelity computational models to predict the coating thickness on complex-shaped components. In this work, two types of models, i.e., ray-tracing based and heat transfer based, are developed. For the ray-tracing model, assuming a line-of-sight coating process and considering the shadow effect, validation studies of coating thickness predictions on different shapes, including plate, disc, cylinder, and three-pin components. For the heat transfer model, a heat source following the Gaussian distribution is applied. It has the analogy of the governing equations of the ray-tracing method, thus generating a temperature distribution similar to the ray intensity distribution in the ray-tracing method, with the advantages of high computational efficiency. Then, using a calibrated conversion process, the ray intensity or the temperature profile are converted to the corresponding coating thickness. After validation studies, both models are applied to simulate the coating thickness in a rotary turbine blade.
The results show that the simulated validation cases are in good agreement with either the experimental, analytical, or modeling results in the literature. The turbine blade case shows the coating thickness distributions based on rotating speed and deposition time. In summary, the models can simulate the coating thickness in rotary complex-shaped parts, which can be used to design and optimize the coating deposition process.