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Journal articles on the topic 'Electron Beam-Physical Vapor Deposition'

Author: Grafiati

Published: 4 June 2021

Last updated: 1 February 2022

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1

Singh, Jogender, and Douglas E. Wolfe. "Nanostructured Component Fabrication by Electron Beam-Physical Vapor Deposition." Journal of Materials Engineering and Performance 14, no. 4 (August 1, 2005): 448–59. http://dx.doi.org/10.1361/105994905x56223.

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2

Markov, Helmut. "Electron Beam Vapor Deposition Lines." JOM 39, no. 6 (June 1987): 57. http://dx.doi.org/10.1007/bf03258069.

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3

Huang, Chong-Lin, Dongkai Qiao, Ching-Yen Ho, and Chang-Wei Xiong. "Effects of Plasma and Evaporated Atoms on the Spatial Distribution of Coating Film Thickness for Electron Beam-Induced Material Evaporation." Journal of Nanoelectronics and Optoelectronics 16, no. 5 (May 1, 2021): 791–96. http://dx.doi.org/10.1166/jno.2021.3007.

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This paper investigates the spatial distributions of electron beam-evaporated atoms and electron beam-induced plasma in the coating process. The materials evaporated by electron beams first form vapour and then a little of plasma is generated in the vapour. The spatial distributions of electron beam-induced atoms and plasma play an important role on the coating uniformity of composition and thickness. The radial distribution of coating deposition thickness of electron beam-evaporated atoms predicted by this study agrees with the available experimental data. The predicted distribution of ion density in the electron beam-induced plasma agrees with the available measured data. The results reveal that the normalized coating thicknesses at the divergence angle of 6 and 14 degrees of vapor source, respectively, are 0.8 and 0.2 of these at divergence angle of 0 degree of vapor source for titanium and aluminum evaporated separately. The similar tendency for the decreasing coating thickness with the radial distance is also obtained for the co-evaporation of aluminum, titanium, and copper. High rotation rate of substrate of vapor source leads to the small deposition rate. Most ions in the electron beam-induced plasma are attracted by electrons of the electon beam and are located at the neighbourhood of the beam region. Therefore, the ion and ion-attracted electron densities rapidly decrease with the increasing radial distance from the electron beam.

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4

Jamil, Sheba, Sanjeev K. Gupta, K. Anbalagan, and J. Akhtar. "Electron-beam assisted physical vapor deposition of polycrystalline silicon films." Materials Science in Semiconductor Processing 14, no. 3-4 (September 2011): 287–93. http://dx.doi.org/10.1016/j.mssp.2011.05.011.

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5

Slifka, A. J., and B. J. Filla. "Thermal conductivity measurement of an electron-beam physical-vapor-deposition coating." Journal of Research of the National Institute of Standards and Technology 108, no. 2 (March 2003): 147. http://dx.doi.org/10.6028/jres.108.014.

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6

Fan, Jing, Iain D. Boyd, and Chris Shelton. "Monte Carlo modeling of electron beam physical vapor deposition of yttrium." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 18, no. 6 (November 2000): 2937–45. http://dx.doi.org/10.1116/1.1310656.

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7

He, Xiaodong, Bin Meng, Yue Sun, Bochao Liu, and Mingwei Li. "Electron beam physical vapor deposition of YSZ electrolyte coatings for SOFCs." Applied Surface Science 254, no. 22 (September 2008): 7159–64. http://dx.doi.org/10.1016/j.apsusc.2008.05.271.

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8

Wolfe, Douglas E., and Jogender Singh. "Titanium carbide coatings deposited by reactive ion beam-assisted, electron beam–physical vapor deposition." Surface and Coatings Technology 124, no. 2-3 (February 2000): 142–53. http://dx.doi.org/10.1016/s0257-8972(99)00644-1.

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9

Zhao, Yi Jie, Li Ma, and Xiao Dong He. "Preparation and Microstructure Analysis of Ti-Al Sheet by Electron Beam Physical Vapor Deposition." Materials Science Forum 650 (May 2010): 302–7. http://dx.doi.org/10.4028/www.scientific.net/msf.650.302.

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By using electron beam physical vapor deposition (EB-PVD) technology, Ti-Al thin sheet with dimension of 450mm×450mm×0.2mm was prepared and the microstructure of Ti-Al deposit was investigated by means of scanning electron microscopy (SEM), atom force microscopy (AFM) and X-ray diffraction (XRD), and then the effect on deposit by re-evaporation of Al was explored by calculating the ratio of re-evaporating capacity with depositing capacity of Al on the substrate. The results indicate that there existed equiaxed crystal and columnar crystal along the cross-sectional may resulted from the transformation latent heats released during the transition course of atoms from gaseous state to solid state, and the variation of target-substrate distance would take effect on the phase composition due to the changing of atoms collision probability and radiant heat quantity absorbed by substrate. The effect on deposit by re-evaporation of Al could be neglected because the re-evaporating capacity of Al was far below that of the depositing capacity.

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10

Kashin, D. S., and P. A. Stekhov. "MODERN THERMAL BARRIER COATINGS OBTAINED BY ELECTRON-BEAM PHYSICAL VAPOR DEPOSITION (review)." Proceedings of VIAM, no. 2 (February 2018): 10. http://dx.doi.org/10.18577/2307-6046-2018-0-2-10-10.

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11

Fuke, Indraneel, Vittaldas Prabhu, and Seungyup Baek. "Computational Model for Predicting Coating Thickness in Electron Beam Physical Vapor Deposition." Journal of Manufacturing Processes 7, no. 2 (January 2005): 140–52. http://dx.doi.org/10.1016/s1526-6125(05)70091-8.

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12

Baik, Kyeong-Ho, Hee-Jin Park, Chang-Hyun Park, and Hee-Soo Kang. "Microstructural Evolution of CoNiCrAlY-YSZ Coating in Electron Beam Physical Vapor Deposition." Korean Journal of Metals and Materials 51, no. 7 (July 5, 2013): 497–503. http://dx.doi.org/10.3365/kjmm.2013.51.7.497.

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13

Anklam, T. "Evaporation rate and composition monitoring of electron beam physical vapor deposition processes." Surface and Coatings Technology 76-77 (December 1995): 681–86. http://dx.doi.org/10.1016/02578-9729(68)00065-.

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14

Anklam, T. M., L. V. Berzins, D. G. Braun, C. Haynam, T. Meier, and M. A. McClelland. "Evaporation rate and composition monitoring of electron beam physical vapor deposition processes." Surface and Coatings Technology 76-77 (December 1995): 681–86. http://dx.doi.org/10.1016/0257-8972(96)80006-5.

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15

Yi, Jian, XiaoDong He, Yue Sun, and Yao Li. "Electron beam-physical vapor deposition of SiC/SiO2 high emissivity thin film." Applied Surface Science 253, no. 9 (February 2007): 4361–66. http://dx.doi.org/10.1016/j.apsusc.2006.09.063.

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16

Cho, S., S. Lewis, V. Prabhu, and I. Fuke. "Intelligent automation of electron beam physical vapour deposition." Surface Engineering 21, no. 1 (February 2005): 17–26. http://dx.doi.org/10.1179/174329305x23254.

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17

Ho, Ching Yen, and Wen Chieh Wu. "Ionic Distribution in Plasma for the Process of Electron-Beam Physical Vapor Deposition." Applied Mechanics and Materials 597 (July 2014): 153–56. http://dx.doi.org/10.4028/www.scientific.net/amm.597.153.

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This paper investigates ionic distribution generated by electron beam (EB) during Physical Vapor Deposition (PVD). EB-PVD has a wide range of applications in thermal barrier coatings (TBCs) due to favorable characteristics compared with other coating processes. EB-PVD is an important material coating method that utilizes electron beams as heat sources to evaporate materials, which are then deposited on a substrate. Therefore EB-induced ionic distribution dominates the quality and thickness of the final coating on the substrate. Assuming the EB-generated plasma to be only a function of radial direction, the steady-state equations of continuity and motion combined with Posson’s equation were utilized to analyze the plasma distributions along the radial direction. The available experimental data are also used to validate the model. The results show that the coating efficiency can be improved by decreasing the ratio of the electron thermal energy to the initial ion energy and increasing the ratio of the initial ion density to the initial electron density. The uniformity of coating can be achieved by reducing the initial ion density.

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18

Hsieh, Chi Hua, Li Te Tsou, Sheng Hao Chen, Huai Yi Chen, Yao Jen Lee, Chiung Hui Lai, and Horng Show Koo. "Comparison of Characteristics of Rapid Thermal and Microwave Annealed Amorphous Silicon Thin Films Prepared by Electron Beam Evaporation and Low Pressure Chemical Vapor Deposition." Advanced Materials Research 663 (February 2013): 372–76. http://dx.doi.org/10.4028/www.scientific.net/amr.663.372.

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In this study we use chemical and physical vapor depositions to fabricate amorphous silicon (a-Si) films. We also use traditional rapid thermal annealing (RTA) and advanced microwave annealing (MWA) to activate or crystallize a-Si films and then observe their sheet resistances and crystallization. We discovered, although the cost of films fabricated by electron beam (e-beam) evaporation is relatively lower than by chemical vapor deposition (CVD), the effects of the former method are poorer whether in sheet resistance or film crystallization. In addition, only at the doping layer prepared by CVD can film crystallization degree produced by MWA match RTA.

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19

Kato, Takeharu, Kazuhide Matsumoto, Yutaka Ishiwata, Tsukasa Hirayama, Hideaki Matsubara, Yuichi Ikuhara, and Hiroyasu Saka. "Transmission Electron Microscopy Study of Thermal Barrier Coatings Fabricated by Electron Beam-Physical Vapor Deposition." Materials Science Forum 475-479 (January 2005): 2877–82. http://dx.doi.org/10.4028/www.scientific.net/msf.475-479.2877.

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20

Huang, Wenting, Vesna Srot, Julia Wagner, and Gunther Richter. "Fabrication of α-FeSi2 nanowhiskers and nanoblades via electron beam physical vapor deposition." Materials & Design 182 (November 2019): 108098. http://dx.doi.org/10.1016/j.matdes.2019.108098.

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21

Li, Wei, Zachary J. Coppens, D. Greg Walker, and Jason G. Valentine. "Electron beam physical vapor deposition of thin ruby films for remote temperature sensing." Journal of Applied Physics 113, no. 16 (April 28, 2013): 163509. http://dx.doi.org/10.1063/1.4802628.

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22

TENG, MIN, XIAODONG HE, and YUE SUN. "COMPOSITION AND NANOHARDNESS OF SiC FILMS DEPOSITED BY ELECTRON BEAM PHYSICAL VAPOR DEPOSITION." International Journal of Modern Physics B 23, no. 06n07 (March 20, 2009): 1910–15. http://dx.doi.org/10.1142/s0217979209061822.

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SiC films with a quantity of carbon and silicon were obtained by electron beam physical vapor deposition (EB-PVD) from a sintered SiC target with different current intensity of EB. The X-ray photoelectron spectroscopy (XPS) was used for characterization of chemical bonding states of C and Si elements in SiC films in order to study the influence of current intensity of EB on the compositions in the deposited films. At the same time, the nanohardness of the deposited films was investigated.

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23

Grumbt, Gundis, Rolf Zenker, Horst Biermann, Kai Weigel, Klaus Bewilogua, and Günter Bräuer. "Duplex Surface Treatment - Physical Vapor Deposition (PVD) and Subsequent Electron Beam Hardening (EBH)." Advanced Engineering Materials 16, no. 5 (December 19, 2013): 511–16. http://dx.doi.org/10.1002/adem.201300411.

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24

Jin, Zhi, Yu-An Shen, Fupeng Huo, Y. C. Chan, and Hiroshi Nishikawa. "Electromigration behavior of silver thin film fabricated by electron-beam physical vapor deposition." Journal of Materials Science 56, no. 16 (February 19, 2021): 9769–79. http://dx.doi.org/10.1007/s10853-021-05862-w.

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25

He, Xiao Dong, Jian Yi, Yue Sun, and Yao Li. "Thermodynamic Analysis of EB-PVD Preparing SiC Coating." Key Engineering Materials 353-358 (September 2007): 1663–66. http://dx.doi.org/10.4028/www.scientific.net/kem.353-358.1663.

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The process of Electron Beam-Physical Vapor Deposition (EB-PVD) preparing SiC coating by Electron Beam evaporating 3C-SiC ingot on stainless steel (SS) substrate was firstly discussed as a preliminary estimation from thermodynamic viewpoint. The results show that, with the temperature increasing from 2500 to 3400 K, the purity of SiC coating increases from 0.58 to 0.734.

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26

Bruk, M. A., E. N. Zhikharev, S. L. Shevchuk, I. A. Volegova, A. V. Spirin, E. N. Teleshov, V. A. Kal’nov, and Yu P. Maishev. "Formation of masking pattern by electron beam-induced vapor deposition." High Energy Chemistry 42, no. 2 (March 2008): 105–12. http://dx.doi.org/10.1134/s0018143908020082.

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27

Ma, Zhenqiang, and Gary S. Was. "Aluminum metallization for flat-panel displays using ion-beam-assisted physical vapor deposition." Journal of Materials Research 14, no. 10 (October 1999): 4051–61. http://dx.doi.org/10.1557/jmr.1999.0547.

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Failures in aluminum interconnects in display control devices are often caused by the formation of hillocks during postdeposition annealing. Ion-beam-assisted deposition was used to create a (110) out-of-plane texture in aluminum films to suppress hillocking. X-ray diffraction was used to quantify the (110)/(111) out-of-plane texture ratio, and scanning electron microscopy and atomic force microscopy were used to characterize the surface topology. Results show that no hillocks were observed on (110)-textured aluminum films following annealing for 30 min at 450 °C. Following annealing, the resistivity of the films made by ion-beam-assisted deposition recovered to within a factor of 2 of the physical-vapor-deposition films. Results show that ion-beam-assisted deposition can effectiv09ely modify the aluminum out-of-plane texture in such a way that hillock suppression can be achieved without significant change in resistivity.

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28

Brice, Craig A., Brian T. Rosenberger, Sankara N. Sankaran, Karen M. Taminger, Bryan Woods, and Rahbar Nasserrafi. "Chemistry Control in Electron Beam Deposited Titanium Alloys." Materials Science Forum 618-619 (April 2009): 155–58. http://dx.doi.org/10.4028/www.scientific.net/msf.618-619.155.

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Direct manufacturing of metallic materials has gained widespread interest in the past decade. Of the methods that are currently under evaluation, wire-fed electron beam deposition holds the most promise for producing large-scale titanium parts for aerospace applications [1]. This method provides the cleanest processing environment as the deposition is performed under vacuum. While this environment is beneficial in preventing contamination of the deposit, there is the potential for preferential vaporization of high vapor pressure elements during the deposition process. This can lead to detrimental chemistry variations, which can have negative impacts on physical and mechanical properties. Past experience has shown that deposition of the alloy Ti-6Al-4V using electron beam direct manufacturing can produce material with aluminum content below the specification minimum [2]. As aluminum has a high vapor pressure with respect to titanium and vanadium, it preferentially vaporizes from the molten pool. This aluminum loss scales with the size of the molten pool and thus the chemical content can vary throughout the build. Compensating for this loss is necessary in order to achieve nominal chemistry in the deposited material. This paper examines established processing conditions for direct manufacturing of titanium, quantitatively determines deposited alloy chemistry changes under various conditions, and suggests a feedstock composition that will result in deposited material with nominal Ti-6Al-4V chemistry.

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29

Reinhold, E., and J. Faber. "Large area electron beam physical vapor deposition (EB-PVD) and plasma activated electron beam (EB) evaporation — Status and prospects." Surface and Coatings Technology 206, no. 7 (December 2011): 1653–59. http://dx.doi.org/10.1016/j.surfcoat.2011.09.022.

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30

Ozgurluk, Yasin, Kadir Mert Doleker, Hayrettin Ahlatci, Dervis Ozkan, and Abdullah Cahit Karaoglanli. "The Microstructural Investigation of Vermiculite-Infiltrated Electron Beam Physical Vapor Deposition Thermal Barrier Coatings." Open Chemistry 16, no. 1 (October 25, 2018): 1106–10. http://dx.doi.org/10.1515/chem-2018-0097.

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AbstractThermal barrier coatings (TBCs) are widely used in aerospace and aviation industries for materials required to withstand severe environments such as oxidation, hot-corrosion failure and CMAS (calcia–magnesia–alumina–silica) attack or vermiculite corrosion. This is particularly apparent in vermiculite, which can penetrate sand, volcanic ash and is the most destructive damage mechanism in the TBC system. Impurities from the desert environment such as calcia–magnesia–alumina–silica (CMAS) cause degradation of TBCs. In this research, CoNiCrAlY metallic bond coatings were deposited on Inconel 718 nickel based superalloy substrates with a thickness of around 100 μm using a Cold Gas Dynamic Spray (CGDS) technique. Production of TBCs were carried out with deposition of YSZ ceramic top coating material using Electron Beam Physical Vapor Deposition (EB-PVD), with a thickness of around 200 μm. The effect of CMAS with spreading naturally-occurring mineral (vermiculite) on TBC samples were investigated using scanning electron microscopy (SEM), energy dispersive spectroscopy (EDS) analysis and X-ray diffraction (XRD). The microstructure evolution of YSZ and failure mechanism of TBC were evaluated.

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31

Qin, Ying, Wei Qu, Xian Xiu Mei, Sheng Zhi Hao, Ji Jun Zhao, Wen Lu, and Chuang Dong. "Numerical Simulation for Surface Modification of Thermal Barrier Coatings by High-Current Pulse Electron Beam." Materials Science Forum 654-656 (June 2010): 1807–10. http://dx.doi.org/10.4028/www.scientific.net/msf.654-656.1807.

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High current pulsed electron beam is an effective technique for surface sealing of ceramic thermal barrier coatings prepared by electron beam physical vapor deposition. Due to the rapid remelting and solidification, the outer layers of ceramic coatings become smooth and dense, and the protective performance for turbine blades is effectively improved. Because of the complex multi-layered structures in the coatings, a high-current pulsed electron beam treatment requires specific parameter inputs which are related to the temperature field induced by electron energy deposition in the coatings. In this paper, a two-dimensional temperature simulation was performed to demonstrate the melting depth and temperature evolution in ceramic coatings treated by high-current pulsed electron beam. Different energy densities and pulses were studied and discussed for obtaining optimized parameters.

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32

Wada, Kunihiko, Norio Yamaguchi, and Hideaki Matsubara. "Crystallographic texture evolution in ZrO2–Y2O3 layers produced by electron beam physical vapor deposition." Surface and Coatings Technology 184, no. 1 (June 2004): 55–62. http://dx.doi.org/10.1016/j.surfcoat.2003.08.084.

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33

Jeong, Yong-Hoon, Han-Cheol Choe, and Sang-Won Eun. "Hydroxyapatite coating on the Ti–35Nb–xZr alloy by electron beam-physical vapor deposition." Thin Solid Films 519, no. 20 (August 2011): 7050–56. http://dx.doi.org/10.1016/j.tsf.2011.04.086.

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34

Mohite, K. C., Y. B. Khollam, A. B. Mandale, K. R. Patil, and M. G. Takwale. "Characterization of silicon oxynitride thin films deposited by electron beam physical vapor deposition technique." Materials Letters 57, no. 26-27 (September 2003): 4170–75. http://dx.doi.org/10.1016/s0167-577x(03)00284-2.

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35

Wada, Kunihiko, and Hideaki Matsubara. "Synthesis and Characterization of Thermal Barrier Coatings Produced by Electron Beam Physical Vapor Deposition." Zairyo-to-Kankyo 54, no. 5 (2005): 195–200. http://dx.doi.org/10.3323/jcorr1991.54.195.

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36

Xu, Zhenhua, Limin He, Xiaolong Chen, Yu Zhao, and Xueqiang Cao. "Thermal barrier coatings of rare earth materials deposited by electron beam-physical vapor deposition." Journal of Alloys and Compounds 508, no. 1 (October 2010): 94–98. http://dx.doi.org/10.1016/j.jallcom.2010.04.160.

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37

Shafyei, Hossein, and Rouholah Ashiri. "Electron beam assisted physical vapor deposition of very hard TiCN coating with nanoscale characters." Ceramics International 45, no. 12 (August 2019): 14821–28. http://dx.doi.org/10.1016/j.ceramint.2019.04.213.

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38

Takeguchi, M., M. Shimojo, K. Mitsuishi, M. Tanaka, and K. Furuya. "Nanostructures fabricated by electron beam induced chemical vapor deposition." Superlattices and Microstructures 36, no. 1-3 (July 2004): 255–64. http://dx.doi.org/10.1016/j.spmi.2004.08.038.

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39

Fedorov, Andrei G., Konrad Rykaczewski, and William B. White. "Transport issues in focused electron beam chemical vapor deposition." Surface and Coatings Technology 201, no. 22-23 (September 2007): 8808–12. http://dx.doi.org/10.1016/j.surfcoat.2007.04.031.

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40

Hass, D. D., P. A. Parrish, and H. N. G. Wadley. "Electron beam directed vapor deposition of thermal barrier coatings." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 16, no. 6 (November 1998): 3396–401. http://dx.doi.org/10.1116/1.581492.

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41

Rossmann, Lin, Matthew Northam, Brooke Sarley, Liudmila Chernova, Vaishak Viswanathan, Bryan Harder, and Seetha Raghavan. "Investigation of TGO stress in thermally cycled plasma-spray physical vapor deposition and electron-beam physical vapor deposition thermal barrier coatings via photoluminescence spectroscopy." Surface and Coatings Technology 378 (November 2019): 125047. http://dx.doi.org/10.1016/j.surfcoat.2019.125047.

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42

Goto, Takashi, and Teiichi Kimura. "Laser Chemical Vapor Deposition of Thick Oxide Coatings." Key Engineering Materials 317-318 (August 2006): 495–500. http://dx.doi.org/10.4028/www.scientific.net/kem.317-318.495.

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Thick oxide coatings have wide-ranged applications typically thermal barrier coatings. Although high speed deposition processes, often plasma spray or electron-beam physical vapor deposition, have been employed for these applications, another route has been pursued to improve the performance of coatings. We have proposed laser chemical vapor deposition (LCVD) for high-speed and thick oxide coatings. Conventional CVD can fabricate coatings at deposition rates of several to several 10 μm/h, and conventional LCVD has been mainly focused on thin film coatings and low temperature deposition. In the present LCVD, high-speed deposition rates ranging from 300 to 3000 μm/h have been achieved for several oxide coatings such as yttria stabilized zirconia (YSZ), TiO2, Al2O3 and Y2O3. This paper describes the effect of deposition conditions on the morphology and deposition rates for the preparation of YSZ and TiO2 by LCVD.

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43

Kato, T., K. Matsumoto, H. Matsubara, Y. Ishiwata, H. Saka, T. Hirayama, and Y. Ikuhara. "Transmission electron microscopy characterization of a Yttria-stabilized zirconia coating fabricated by electron beam–physical vapor deposition." Surface and Coatings Technology 194, no. 1 (April 2005): 16–23. http://dx.doi.org/10.1016/j.surfcoat.2004.05.014.

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44

Ali, Naser, Joao Teixeira, Abdulmajid Addali, Maryam Saeed, Feras Al-Zubi, Ahmad Sedaghat, and Husain Bahzad. "Deposition of Stainless Steel Thin Films: An Electron Beam Physical Vapour Deposition Approach." Materials 12, no. 4 (February 14, 2019): 571. http://dx.doi.org/10.3390/ma12040571.

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This study demonstrates an electron beam physical vapour deposition approach as an alternative stainless steel thin films fabrication method with controlled layer thickness and uniform particles distribution capability. The films were fabricated at a range of starting electron beam power percentages of 3–10%, and thickness of 50–150 nm. Surface topography and wettability analysis of the samples were investigated to observe the changes in surface microstructure and the contact angle behaviour of 20 °C to 60 °C deionised waters, of pH 4, pH 7, and pH 9, with the as-prepared surfaces. The results indicated that films fabricated at low controlled deposition rates provided uniform particles distribution and had the closest elemental percentages to stainless steel 316L and that increasing the deposition thickness caused the surface roughness to reduce by 38%. Surface wettability behaviour, in general, showed that the surface hydrophobic nature tends to weaken with the increase in temperature of the three examined fluids.

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45

Galvani, Eduardo T., V. A. R. Henriques, and T. G. Lemos. "Improvement of Tribological Properties by Titanium Nitride Deposition in Titanium Alloys Produced by Powder Metallurgy." Materials Science Forum 727-728 (August 2012): 480–85. http://dx.doi.org/10.4028/www.scientific.net/msf.727-728.480.

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Titanium nitride (TiN) is a hard material, often used as coating to improve the wear properties of titanium alloys in machining, implant and aerospace applications. Electron Beam Physical Vapor Deposition (EB-PVD) is a technique which a target anode is bombarded with an electron beam given off by a charged tungsten filament under high vacuum, producing a thin film in a substrate. In this work, results of TiN films depositions on Ti-13Nb-13Zr substrates by EB-PVD are studied. Titanium targets were obtained by a purified ingot and the substrates produced by powder metallurgy. Sintered samples of Ti-13Nb-13Zr and TiN layers were characterized by X-ray diffraction, scanning electron microscopy, Vickers microhardness and wear tests. The TiN films presented high hardness values, continuity and large thickness. The coatings improved the tribological properties of the substrate due to high adhesion and low wear rate.

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46

Zhabin, A. N., A. N. Nyafkin, V. M. Serpova, and E. I. Krasnov. "METHODS OF PHYSICAL VAPOR DEPOSITION FOR THE MANUFACTURE OF METAL MATRIX COMPOSITES (review)." Proceedings of VIAM, no. 11 (2020): 68–75. http://dx.doi.org/10.18577/2307-6046-2020-0-11-68-75.

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A review of the scientific and technical literature in the field of the most used methods of physical vapor deposition for the manufacture of metal matrix composites (MMCs) reinforced silicon carbide fibers is presented. The most widespread methods of solid-phase technology for the manufacture of MMCs are briefly considered, and methods of electron-beam deposition and magnetron sputtering of a matrix titanium alloy on silicon carbide fibers are discussed in detail. The morphological structure of the surface of the deposited matrix alloy on fibers, obtained by different methods, is investigated.

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47

Meng, B., Y. Sun, X. D. He, and J. H. Peng. "Fabrication and characterization of Ni–YSZ anode functional coatings by electron beam physical vapor deposition." Thin Solid Films 517, no. 17 (July 2009): 4975–78. http://dx.doi.org/10.1016/j.tsf.2009.03.098.

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48

Garcia, Gemma, Roger Doménech-Ferrer, Francesc Pi, Josep Santiso, and Javier Rodríguez-Viejo. "Combinatorial Synthesis and Hydrogenation of Mg/Al Libraries Prepared by Electron Beam Physical Vapor Deposition." Journal of Combinatorial Chemistry 9, no. 2 (March 2007): 230–36. http://dx.doi.org/10.1021/cc060131h.

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Lugscheider, E., K. Bobzin, A. Etzkorn, A. Horn, R. Weichenhain, E. W. Kreutz, and R. Poprawe. "Electron beam-physical vapor deposition - thermal barrier coatings on laser drilled surfaces for transpiration cooling." Surface and Coatings Technology 133-134 (November 2000): 49–53. http://dx.doi.org/10.1016/s0257-8972(00)00872-0.

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Kelly, Matthew, Jogender Singh, Judith Todd, Steven Copley, and Douglas Wolfe. "Metallographic techniques for evaluation of Thermal Barrier Coatings produced by Electron Beam Physical Vapor Deposition." Materials Characterization 59, no. 7 (July 2008): 863–70. http://dx.doi.org/10.1016/j.matchar.2007.07.010.

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