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Academic literature on the topic 'Etcw.r'

Author: Grafiati

Published: 26 July 2024

Last updated: 19 July 2025

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Journal articles on the topic "Etcw.r"

1

Sheng, Lin. "The Simulation Application for the Structure Design of the Etcher Nozzle." Applied Mechanics and Materials 249-250 (December 2012): 372–77. http://dx.doi.org/10.4028/www.scientific.net/amm.249-250.372.

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With the higher and higher etching rate, the flow field situation of the plasma etching chamber became an important factor to design the etcher chamber structure. This paper studied the etcher nozzle structure in detail by using the flow simulation technology to analyze how to get uniform follow field on the surface of the etching wafer, and then this paper determined the structure parameters of the etcher nozzle.

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Xu, Xia, Juan Feng, and Ling Tian. "Modeling and Optimization of Process Parameters of a DF-CCP Etcher Chamber." Key Engineering Materials 572 (September 2013): 213–16. http://dx.doi.org/10.4028/www.scientific.net/kem.572.213.

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Dual-frequency capacitively coupled plasma (DF-CCP) etcher has become the mainstream in dielectric etcher. By building a 2D axisymmetric model of 300mm DF-CCP etcher in CFD-ACE+ software, plasma simulation experiments are carried out by orthogonal design. Then a process model based on simulation results is proposed to analysis influence of key process parameters including high frequency voltage, low frequency voltage, and chamber pressure and center/edge flow ratio on chamber plasma characteristics. Finally, to get high plasma uniformity and plasma density, process optimizations are carried out.

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Duan, Wen Rui, and Ling Tian. "Surrogate Modeling and Optimizing for CCP Etch Process." Applied Mechanics and Materials 670-671 (October 2014): 548–53. http://dx.doi.org/10.4028/www.scientific.net/amm.670-671.548.

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In order to analyze performance of the Capacitively Coupled Plasma (CCP) etcher, commercial software like OPTIMUS can be applied to approximate etch process model by Response Surface Method (RSM) or Radial Basis Functions (RBF). Multi-factor parameters are concerned in etch process, like frequencies of the dual Radio Frequency system (RF) and flow rate and flow ratio of the process gas. When facing the multi-dimensional problem, the algorithms would turned to be inefficiency and the optimization process may be trapped in local minimum area or cannot converge because of oscillation. To improve surrogate modeling for the CCP etcher, a self-optimizing RBF (SO-RBF) algorithm is proposed and a process modeling tool is developed. Experiments on a state-of-art dual station CCP etcher shows that based on the global approximation model generated by this algorithm, process parameter optimization can be easily implemented with less error than OPTIMUS.

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4

Lee, Jongwon, Kilsun Roh, Sung-Kyu Lim, and Youngsu Kim. "Sidewall Slope Control of InP Via Holes for 3D Integration." Micromachines 12, no. 1 (2021): 89. http://dx.doi.org/10.3390/mi12010089.

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This is the first demonstration of sidewall slope control of InP via holes with an etch depth of more than 10 μm for 3D integration. The process for the InP via holes utilizes a common SiO2 layer as an InP etch mask and conventional inductively coupled plasma (ICP) etcher operated at room temperature and simple gas mixtures of Cl2/Ar for InP dry etch. Sidewall slope of InP via holes is controlled within the range of 80 to 90 degrees by changing the ICP power in the ICP etcher and adopting a dry-etched SiO2 layer with a sidewall slope of 70 degrees. Furthermore, the sidewall slope control of the InP via holes in a wide range of 36 to 69 degrees is possible by changing the RF power in the etcher and introducing a wet-etched SiO2 layer with a small sidewall slope of 2 degrees; this wide slope control is due to the change of InP-to-SiO2 selectivity with RF power.

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Valenzuela, Terence D., Daniel W. Spaite, Lani L. Clark, Harvey W. Meislin, and Raymond O. Sayre. "Estimated Cost-Effectiveness of Dispatcher CPR Instruction via Telephone to Bystanders During Out-of-Hospital Ventricular Fibrillation." Prehospital and Disaster Medicine 7, no. 3 (1992): 229–33. http://dx.doi.org/10.1017/s1049023x00039558.

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AbstractHypothesis:Emergency cardiopulmonary resuscitation (CPR) instruction via telephone (ETCPR) is cost-effective compared to prehospital, emergency medical technician (EMT)/paramedic treatment alone of witnessed, ventricular fibrillation (VF) in adult patients.Methods:A total of 118 patients, age >18 years, with prehospital, witnessed ventricular fibrillation were studied. Patient data were extracted from hospital records, monitor-defibrillator recordings, paramedic reports, dispatching records, and telephone interviews with bystanders. No ETCPR was available during this period. The costs of ETCPR implementation were estimated retrospectively. Marginal cost of the paramedic service attributable to treatment of VF was calculated from fire department records. Years-of-life saved were estimated from age, gender, and race matched norms.Results:Of the 53 patients receiving bystander CPR (BCPR), 14 (26%) survived to hospital discharge versus 4/65 patients (6%) lacking BCPR, These groups did not differ significantly (p>.05) in age, EMS response times, or time from collapse to defibrillation. The mean time interval from collapse to CPR was significantly less for patients with BCPR (1.8 min) than for patients without BCPR (7.1 min). Had all patients received BCPR and survived at the rate of 0.26, 13 additional patients would have survived to hospital discharge. The cost per year-of-life saved by the EMS system with ETCPR would have been [US]$2,834 versus $4,881 without ETCPR. The cost per additional year-of-life saved by ETCPR was estimated to be $560 in patients experiencing out-of-hospital ventricular fibrillation.Conclusion:The use of ETCPR instruction of callers by 9-1-1 dispatchers potentially is a cost-effective addition to a two-tier, EMS system for treatment of prehospital ventricular fibrillation.

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6

Shin, H., K. Noguchi, X. Y. Qian, N. Jha, G. Hills, and C. Hu. "Spatial distributions of thin oxide charging in reactive ion etcher and MERIE etcher." IEEE Electron Device Letters 14, no. 2 (1993): 88–90. http://dx.doi.org/10.1109/55.215117.

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7

Chen, Wei Kun, Wei Yu Chen, and Li Hui Jin. "Improvement of Edge Etcher System." Advanced Materials Research 1008-1009 (August 2014): 1144–47. http://dx.doi.org/10.4028/www.scientific.net/amr.1008-1009.1144.

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The edge etcher machine is fully automated with very dangerous chemical circumstance; the shortcoming is low capacity for production, it spends too much time on the centering process, we use vision system to reduce the time of centering process and increase the capacity of production.

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8

. "Micro-etcher met nieuwe technologie." TandartsPraktijk 27, no. 2 (2006): 167. http://dx.doi.org/10.1007/bf03072772.

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9

Yunogami, Takashi, Ken’etsu Yokogawa, and Tatsumi Mizutani. "Development of neutral‐beam‐assisted etcher." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 13, no. 3 (1995): 952–58. http://dx.doi.org/10.1116/1.579657.

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10

Gawkrodger, David J., and Fiona M. Lewis. "Isolated cobalt sensitivity in an etcher." Contact Dermatitis 29, no. 1 (1993): 46. http://dx.doi.org/10.1111/j.1600-0536.1993.tb04542.x.

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Dissertations / Theses on the topic "Etcw.r"

1

Dickenson, Andrew C. "Measurement and simulation of ion energy distributions in a reactive ion etcher." Thesis, University of Bristol, 1994. http://hdl.handle.net/1983/2e692fca-5cd1-48da-bb7e-6bb76a1bb23b.

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2

Gower, Aaron E. (Aaron Elwood). "An architecture for flexible distributed experimentation and control with an AME 5000 plasma etcher." Thesis, Massachusetts Institute of Technology, 1996. http://hdl.handle.net/1721.1/10647.

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3

Schmid, Elizabeth Carroll. "Mary Nimmo Moran, Mary Cassatt and the painter-etcher movement: gender, identity and paths to professionalism." Thesis, University of Iowa, 2014. https://ir.uiowa.edu/etd/1394.

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4

Ropero, Pérez Germán. "Design of a Polygeneration system in Filipinas ETCR, Colombia." Thesis, KTH, Skolan för industriell teknik och management (ITM), 2021. http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-300082.

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This project has addressed the design of a cost-effective Polygeneration system that guarantees a continuous, equitable and environmentally friendly energy supply for the rural settlement of Filipinas ETCR, (in Spanish, Espacios Territoriales de Capacitación y Reincorporación) Colombia, which is currently not achieved, due to a system that relies on the national electricity grid (with numerous outages) and on LPG (Liquefied Petroleum Gas) and wood to meet the thermal demand, mainly for cooking. For this purpose, in addition to the current energy supply situation, the energy demand according to type (electricity and heat) and sector (residential, commercial and agro-livestock) is characterized. Also, the availability of renewable energy sources is examined, resulting in the existence of a potential for solar and residual biomass resources. Then, the most suitable sub-systems and technologies for their exploitation have been analyzed. In this way, HOMER Pro software has been used to find the most competitive solution (the lowest LCOE, Levelized Cost of Energy), together with a technical, economic, environmental and social analysis to analyze its impact on the ETCR. Thus, the final solution results in a Polygeneration system based on a PV (Photovoltaic) subsystem, the electrical grid and a biogas production plant (48 m3/day) by anaerobic digestion of agricultural, livestock and urban waste biomass coupled with an ICE (Internal Combustion Engine). The PV (250 kW) would be the major source of electricity generation, followed by the grid and, as a back-up, the biogas-fired ICE (25 kW), which is also used to replace LPG and wood for heating purposes. The solution presents a remarkable renewable fraction (73% instead of the current <0.5%) and a significant reduction of polluting emissions (60.5% of CO2 emissions). Moreover, it is ensured an economic viability over time (a ROI of 9.7% and DPB (Discounted Pay-Back) lower than 18 years) and a potential positive impact in the socio-economic development of Filipinas ETCR. To conclude, these results are in line with the UN SDGs (Sustainable Development Goals) 7 and 13, being an example of the viability of such systems and the positive environmental, social and economic consequences they can have in rural locations with economic difficulties and non-renewable and weak energy supplies.<br>Detta projekt har behandlat utformningen av ett kostnadseffektivt polygenereringssystem som garanterar en kontinuerlig, rättvis och miljövänlig energiförsörjning för bosättningen på landsbygden i Filipinas ETCR (Espacios Territoriales de Capacitación y Reincorporación på spanska) i Colombia, vilket för närvarande inte är uppnått på grund av ett existerande energisystem som är beroende av det nationella elnätet (med många avbrott) och av gasol och ved för att tillgodose det termiska behovet, främst för matlagning. I detta syfte har man förutom den nuvarande energiförsörjningssituationen även karakteriserat efterfrågan på energi efter typ (el och värme) och sektor (bostäder, handel och jordbruk och boskapsskötsel). Dessutom undersöks tillgången på förnybara energikällor, vilket påvisar att det finns potential för både solenergi och biomassa. Därefter har man analyserat lämpliga delsystem och tekniker för att kunna nyttja energikällorna. För detta har programmet HOMER Pro använts till att hitta den mest konkurrenskraftiga lösningen (med lägst LCOE), tillsammans med en teknisk, ekonomisk, miljömässig och social analys för att analysera dess inverkan på ETCR. Således är den slutliga lösningen ett system för polygenerering som bygger på ett delsystem av solceller, elnätet och en biogasproduktionsanläggning (48 m3/dag) som använder sig av anaerob nedbrytning av biomassa från både jordbruk, boskap och stadsavfall i kombination med en ICE. Solcellerna (250 kW) skulle då vara den främsta källan till elproduktion följt av elnätet, varav den biogaseldade ICE-anläggningen (25 kW) används som reserv och för att ersätta gasol och ved för uppvärmning. Lösningen innebär en anmärkningsvärd andel förnybara energikällor (73% jämfört med nuvarande <0,5%) och en signifikant minskning av förorenande utsläpp (60,5% av koldioxidutsläppen). Dessutom garanteras en ekonomisk lönsamhet med tiden (med en ROI på 9,7 % och en DPB på mindre än 18 år) och en potentiellt positiv inverkan på den socioekonomiska utvecklingen i Filipinas ETCR. Sammanfattningsvis ligger dessa resultat i linje med mål 7 och 13 av FN:s hållbarhetsmål, eftersom de är ett exempel på lönsamheten hos sådana system och de positiva miljömässiga, sociala och ekonomiska konsekvenser som de kan få på landsbygden där det förekommer ekonomiska svårigheter, och där eltillförseln är opålitlig och baserad på energikällor som inte är förnybara.

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5

Teale, Carson(Carson Arthur). "In-situ depth monitoring for a deep reactive ion etcher using a white light interferometer with active vibration cancellation." Thesis, Massachusetts Institute of Technology, 2019. https://hdl.handle.net/1721.1/121726.

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Thesis: Ph. D., Massachusetts Institute of Technology, Department of Electrical Engineering and Computer Science, 2019<br>Cataloged from PDF version of thesis.<br>Includes bibliographical references (pages 119-121).<br>Standard process development for micro and nanofabrication etching technologies relies on open-loop trial and error testing of recipes to achieve optimal etch depths and uniformities. This strategy is inefficient for research and fabrication of novel devices where one-of-a-kind experiments cannot justify lengthy process development times. This thesis describes the development of an in-situ depth measurement device for real-time feedback of etch depth and uniformity. This device will help facilitate far shorter process development times, potentially enabling the desired etch to be achieved on the first process run. The depth imager consists of a wide-field, white light interferometer with a 12" working distance, capable of imaging across a 1/2" field of view. Active feedback from a co-propagating laser interferometer is used to stabilize the system against vibrations through a feedback loop that controls the position of the reference mirror using a piezo actuator. This scheme ties the accuracy of the white light depth scan to the stability of the laser wavelength, allowing for accurate step sizes without the need for an expensive scanning stage. The well defined sampling period allows for the phase sensitive detection of the white light interference signal, reducing amplitude fluctuations from plasma emissions. This design is able to image deep trenches with optically rough surfaces, etched directly into a silicon substrate with aspect ratios of 10 or more. The device is demonstrated on a custom built deep reactive ion etcher (DRIE), achieving a depth resolution of better than 1 [mu]m in the presence of large vibrations.<br>by Carson Teale.<br>Ph. D.<br>Ph.D. Massachusetts Institute of Technology, Department of Electrical Engineering and Computer Science

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6

鈴木, 彰一. "ITSを用いた大型貨物車交通マネジメントに関する研究". 京都大学 (Kyoto University), 2016. http://hdl.handle.net/2433/215190.

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7

Ruiz, Crespo Nestor. "Polygeneration system model in rural areas of Colombia : Filipinas ETCR as a case of study." Thesis, KTH, Skolan för industriell teknik och management (ITM), 2021. http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-300081.

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This project has addressed the design of a cost-effective Polygeneration system that guarantees a continuous, equitable and environmentally friendly energy supply for the rural settlement of Filipinas ETCR, (in Spanish, Espacios Territoriales de Capacitación y Reincorporación) Colombia, which is currently not achieved, due to a system that relies on the national electricity grid (with numerous outages) and on LPG (Liquefied Petroleum Gas) and wood to meet the thermal demand, mainly for cooking. For this purpose, in addition to the current energy supply situation, the energy demand according to type (electricity and heat) and sector (residential, commercial and agro-livestock) is characterized. Also, the availability of renewable energy sources is examined, resulting in the existence of a potential for solar and residual biomass resources. Then, the most suitable sub-systems and technologies for their exploitation have been analyzed. In this way, HOMER Pro software has been used to find the most competitive solution (the lowest LCOE, Levelized Cost of Energy), together with a technical, economic, environmental and social analysis to analyze its impact on the ETCR. Thus, the final solution results in a Polygeneration system based on a PV (Photovoltaic) subsystem, the electrical grid and a biogas production plant (48 m3/day) by anaerobic digestion of agricultural, livestock and urban waste biomass coupled with an ICE (Internal Combustion Engine). The PV (250 kW) would be the major source of electricity generation, followed by the grid and, as a back-up, the biogas-fired ICE (25 kW), which is also used to replace LPG and wood for heating purposes. The solution presents a remarkable renewable fraction (73% instead of the current <0.5%) and a significant reduction of polluting emissions (60.5% of CO2 emissions). Moreover, it is ensured an economic viability over time (a ROI of 9.7% and DPB (Discounted Pay-Back) lower than 18 years) and a potential positive impact in the socio-economic development of Filipinas ETCR. To conclude, these results are in line with the UN SDGs (Sustainable Development Goals) 7 and 13, being an example of the viability of such systems and the positive environmental, social and economic consequences they can have in rural locations with economic difficulties and non-renewable and weak energy supplies.<br>Detta projekt har behandlat utformningen av ett kostnadseffektivt polygenereringssystem som garanterar en kontinuerlig, rättvis och miljövänlig energiförsörjning för bosättningen på landsbygden i Filipinas ETCR (Espacios Territoriales de Capacitación y Reincorporación på spanska) i Colombia, vilket för närvarande inte är uppnått på grund av ett existerande energisystem som är beroende av det nationella elnätet (med många avbrott) och av gasol och ved för att tillgodose det termiska behovet, främst för matlagning. I detta syfte har man förutom den nuvarande energiförsörjningssituationen även karakteriserat efterfrågan på energi efter typ (el och värme) och sektor (bostäder, handel och jordbruk och boskapsskötsel). Dessutom undersöks tillgången på förnybara energikällor, vilket påvisar att det finns potential för både solenergi och biomassa. Därefter har man analyserat lämpliga delsystem och tekniker för att kunna nyttja energikällorna. För detta har programmet HOMER Pro använts till att hitta den mest konkurrenskraftiga lösningen (med lägst LCOE), tillsammans med en teknisk, ekonomisk, miljömässig och social analys för att analysera dess inverkan på ETCR. Således är den slutliga lösningen ett system för polygenerering som bygger på ett delsystem av solceller, elnätet och en biogasproduktionsanläggning (48 m3/dag) som använder sig av anaerob nedbrytning av biomassa från både jordbruk, boskap och stadsavfall i kombination med en ICE. Solcellerna (250 kW) skulle då vara den främsta källan till elproduktion följt av elnätet, varav den biogaseldade ICE-anläggningen (25 kW) används som reserv och för att ersätta gasol och ved för uppvärmning. Lösningen innebär en anmärkningsvärd andel förnybara energikällor (73% jämfört med nuvarande <0,5%) och en signifikant minskning av förorenande utsläpp (60,5% av koldioxidutsläppen). Dessutom garanteras en ekonomisk lönsamhet med tiden (med en ROI på 9,7 % och en DPB på mindre än 18 år) och en potentiellt positiv inverkan på den socioekonomiska utvecklingen i Filipinas ETCR. Sammanfattningsvis ligger dessa resultat i linje med mål 7 och 13 av FN:s hållbarhetsmål, eftersom de är ett exempel på lönsamheten hos sådana system och de positiva miljömässiga, sociala och ekonomiska konsekvenser som de kan få på landsbygden där det förekommer ekonomiska svårigheter, och där eltillförseln är opålitlig och baserad på energikällor som inte är förnybara.

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8

平井, 章一. "都市間高速道路における休憩行動分析と休憩行動モデルのネットワークシミュレーションへの実装に関する研究". Kyoto University, 2018. http://hdl.handle.net/2433/232009.

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9

Yang, SHIH-FENG, and 楊世豐. "TFT LCD Dry etcher process chemical type Side etch study." Thesis, 2014. http://ndltd.ncl.edu.tw/handle/19184604902928332763.

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碩士<br>國立交通大學<br>平面顯示技術碩士學位學程<br>102<br>During TFT-LCD array process, etching plays a crucial role of creating designed circuits and patterns. By applying chemical or physical process etching can remove certain parts of the deposit film which are not protected by the photo resist. Therefore it can transfer specific patterns from the photo mask to the deposit film (usually thousands of Å) on the glass. The transferred circuit and patterns are important components in the TFT-LCD manufacturing process. Currently there are two types of etching techniques in TFT LCD etching process, Wet and Dry Etching. The former applies chemical agent while the later takes the physical reaction approach (via plasma); In practice one can fine tune some parameters to change dry etching to behave like chemical type. Conventional results show Wet etching is superior in terms of factory throughput. However its isotropic etching by chemical agent may cause undercut issue, which makes line width hard to control. To the contrary although Dry Etching has lower throughput that is introduced by vacuuming process. Its anisotropic property makes it a great method when line width quality is a top priority. The focus of this dissertation is on Dry Etching. We will show by fine tuning some dry etching parameters to make it similar to wet etching, one can achieve the benefit of both wet and dry etching, i.e. higher throughput and better line width control (less occurrence of defects). This paper applied the methodology of Evidence Act and Taguchi experimental method to research the genuine parameters that make Dry Etching process act similar to the wet one. We filtered the candidate parameters and searched for the optimized parameter set in the experiments. We hope the study results can improve existing dry etching process recipe and eventually this new concept can be introduced in the mass-production manufacturing process.

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Lei, Shuen-Chen, and 雷舜誠. "Study of Plasma Etching on 300mm Inductively Coupled Plasma Etcher." Thesis, 2001. http://ndltd.ncl.edu.tw/handle/04405263728158955844.

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碩士<br>國立清華大學<br>工程與系統科學系<br>89<br>In this thesis ,we use Central Composite Design and Orthogonal Array to arrange the experiments.The parameters of etching rate include ICP power、Bias power、flow rate and pressure. Besides,we use spectrometer and RF impedance meter to measure plasma intensity and RF voltage.Before etching process,we have a standard warm-up process to confirm the ICP etcher is correct and stable.We found etch rate increases when ICP power and Bias power increase. When Flow rate increase,etch rate increases slightly.Intensity of Cl atom spectrum and RF voltage increase,etch rate increases.In our system,etch rate and the product of Intensity of Cl atom spectrum and RF voltage have linear relationship. We establish the relationship between etch rate and ICP power、Bias power、flow rate and pressure in regression equation model and neural network model.We found in non-linear systems neural network model has better predictive abilities.

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Books on the topic "Etcw.r"

1

V, Pomeranskai͡a T., ed. Rozanov@etc.ru. T͡Sentralʹnyĭ izdatelʹskiĭ dom, 2011.

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Rijn, Rembrandt Harmenszoon van. Rembrandt: Experimental etcher. Hacker Art Books, 1988.

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Dameron, Chip. Waiting for an etcher. Lamar University Press, 2015.

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1950-, Ash Nancy, ed. Rembrandt as an etcher. Sound & Vision, 2006.

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Petukhova, LaVine Tatyana, Weislogel Andrew, Hooghe Romeyn de 1645-1708, and Herbert F. Johnson Museum of Art., eds. Romeyn de Hooghe: Virtuoso etcher. Herbert F. Johnson Museum of Art, Cornell University, 2009.

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Harris, Gėnė E. Joseph Pennell, illustrator, lithographer, etcher. Brandywine Conservancy, 1986.

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Dallett, Joseph B. Romeyn de Hooghe: Virtuoso etcher. Herbert F. Johnson Museum of Art, Cornell University, 2009.

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Campbell, Richard J. George Earl Resler: Minnesota etcher. Minneapolis Institute of Arts, 1996.

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Dallett, Joseph B. Romeyn de Hooghe: Virtuoso etcher. Herbert F. Johnson Museum of Art, Cornell University, 2009.

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S, Ackley Clifford, ed. Rembrandt's journey: Painter, draftsman, etcher. MFA Publications, 2003.

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Book chapters on the topic "Etcw.r"

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Gregg, John, and Peter G. Borden. "In-Situ Particle Monitoring in a Plasma Etcher." In Particles in Gases and Liquids 2. Springer US, 1990. http://dx.doi.org/10.1007/978-1-4899-3544-1_20.

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"etcher, n." In Oxford English Dictionary, 3rd ed. Oxford University Press, 2023. http://dx.doi.org/10.1093/oed/6970704631.

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"The etcher." In Modernising Protestantism. Amsterdam University Press, 2025. https://doi.org/10.1515/9789048567256-022.

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"photo-etcher, n." In Oxford English Dictionary, 3rd ed. Oxford University Press, 2023. http://dx.doi.org/10.1093/oed/1092471243.

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"Chronology." In Rembrandt’s Journey: Painter · Draftsman · Etcher. "Museum of Fine Arts, Boston", 2003. http://dx.doi.org/10.37862/aaeportal.00241.008.

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"Looking Over Rembrandt’s Shoulder: The Printmaker at Work." In Rembrandt’s Journey: Painter · Draftsman · Etcher. "Museum of Fine Arts, Boston", 2003. http://dx.doi.org/10.37862/aaeportal.00241.004.

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"Materials and Techniques." In Rembrandt’s Journey: Painter · Draftsman · Etcher. "Museum of Fine Arts, Boston", 2003. http://dx.doi.org/10.37862/aaeportal.00241.009.

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"Introduction: Rembrandt’s Artistic Journey." In Rembrandt’s Journey: Painter · Draftsman · Etcher. "Museum of Fine Arts, Boston", 2003. http://dx.doi.org/10.37862/aaeportal.00241.001.

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"Catalogue." In Rembrandt’s Journey: Painter · Draftsman · Etcher. "Museum of Fine Arts, Boston", 2003. http://dx.doi.org/10.37862/aaeportal.00241.006.

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"Exhibition List." In Rembrandt’s Journey: Painter · Draftsman · Etcher. "Museum of Fine Arts, Boston", 2003. http://dx.doi.org/10.37862/aaeportal.00241.007.

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Conference papers on the topic "Etcw.r"

1

Harrison, Jacob, Nathan Jessurun, Raphael R. Dos Santos, Shajib Ghosh, Navid Asadi, and Mark Tehranipoor. "Analysis of Etcher Configuration on Part Marking Characteristics for Counterfeit Identification." In 2024 IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA). IEEE, 2024. http://dx.doi.org/10.1109/ipfa61654.2024.10691006.

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Distelhurst, Kevin, Jim Densmore, and Jiaqi Tang. "Removal of Highly Doped Silicon for Backside Fault Isolation with Fluorine-Based Etches." In ISTFA 2024. ASM International, 2024. http://dx.doi.org/10.31399/asm.cp.istfa2024p0509.

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Abstract III-V power electronic devices are a growing industry as electric vehicles (EVs), power-demanding servers, and other high-power electronics become more prominent. The design of these devices can alter a failure analysis lab’s process flow typically used on traditional silicon-based logic devices. One such obstacle is backside fault isolation (FI) through highly doped silicon wafers used in GaN-on-Si technologies. Backside fault isolation is critical for many electrical failure analyses so finding several approaches to enable this technique that fits current FA flows is desirable. Chemical and Focused Ion Beam (FIB) based approaches have been used to enable backside FI [1], [2]. This paper considers a plasma-based approach with two separate machines, a Microwave Induced Plasma spot etcher and a chamber based Reactive Ion Etch (RIE). Both utilize a Fluorine-based chemistry which is highly selective to the silicon vs the underlying GaN. The etches are used to selective remove the silicon to form a window to the underlying GaN material. Subsequent backside FI analyses are successfully followed by several other analyses.

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Zeng, Li, Li-Tian Xu, Tao Zhong, et al. "Investigation of silicon oxide thin film utilizing plasma enhanced atomic layer deposition in ICP etcher." In 2025 Conference of Science and Technology of Integrated Circuits (CSTIC). IEEE, 2025. https://doi.org/10.1109/cstic64481.2025.11017791.

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LEE, Chih-Ming, Hsiu-Pin CHEN, Yu-Chen CHANG, Wan-Kang HSIEH, and Li-Heng KAO. "Fluorocarbon Film Deposition Using Reactive Ion Etcher and Its Application for Physical Analysis of 3D Stacking TSV, Micro Bump and Hybrid Bonding." In 2024 IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA). IEEE, 2024. http://dx.doi.org/10.1109/ipfa61654.2024.10691016.

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Jekauc, Igor, Jasen Moffitt, Sushil Shakya, et al. "Metal etcher qualification using angular scatterometry." In Microlithography 2005, edited by Richard M. Silver. SPIE, 2005. http://dx.doi.org/10.1117/12.598828.

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Quick, A. K., and N. Hershkowitz. "Uniformity measurements in a helicon plasma etcher." In International Conference on Plasma Science (papers in summary form only received). IEEE, 1995. http://dx.doi.org/10.1109/plasma.1995.531582.

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Lewington, Richard, Ibrahim M. Ibrahim, Sheeba Panayil, Ajay Kumar, and John Yamartino. "Mask etcher data strategy for 45nm and beyond." In Photomask and Next Generation Lithography Mask Technology XIII, edited by Morihisa Hoga. SPIE, 2006. http://dx.doi.org/10.1117/12.681760.

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Chen, Wei-Su, Peng-Sheng Chen, Hung-Wen Wei, Frederick T. Chen, Ming-Jinn Tsai, and Tzu-Kun Ku. "Transfer optimized dry development process of sub-32nm HSQ/AR3 BLR resist pillar from low-K etcher to metal etcher." In SPIE Advanced Lithography, edited by Ying Zhang. SPIE, 2012. http://dx.doi.org/10.1117/12.915488.

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Cheng, Jia, Yu Zhu, Guanghong Duan, and Yangying Chen. "Three-Dimensional Discharge Simulation of Inductively Coupled Plasma Etcher." In 2007 First International Conference on Integration and Commercialization of Micro and Nanosystems. ASMEDC, 2007. http://dx.doi.org/10.1115/mnc2007-21145.

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Based on the commercial software, CFD-ACE+, a three-dimensional discharge model of an inductively coupled plasma (ICP) etcher was built. The spatial distributions of the electron temperature and the electron number density (END) of the argon plasma were simulated at 10 mTorr, 200 W and 200 sccm. One-dimensional distribution profiles of the plasma parameters above the wafer’s surface at different pressures and powers were compared. These results demonstrate that the END increases with both pressure and power. And the electron temperature decreases with pressure. The methods and conclusions can be used to provide some reference for the configurations of the chamber and the coil of the ICP equipment design and improvement and process parameters selection.

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Nakano, N., T. Makabe, and Z. L. Petrovic. "Narrow gap reactive ion etcher-Its discharge structure and function." In International Conference on Plasma Sciences (ICOPS). IEEE, 1993. http://dx.doi.org/10.1109/plasma.1993.593458.

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Reports on the topic "Etcw.r"

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Jones, W. K. Reaction Ion Etcher for MEMS Fabrication. Defense Technical Information Center, 2003. http://dx.doi.org/10.21236/ada415898.

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Morkoc, Hadis. Request for Mask Aligner and Upgrade for a Reactive Ion Etcher. Defense Technical Information Center, 2003. http://dx.doi.org/10.21236/ada417759.

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Barr, Robert W. Development of Design Parameters and Conceptual Drawing for a Plasma Etcher to Clean and Sterilize Surgical Instruments. Defense Technical Information Center, 1989. http://dx.doi.org/10.21236/ada259791.

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