Relevant bibliographies by topics / Film deposited on substrate

Contents

  1. Journal articles
  2. Dissertations / Theses
  3. Books
  4. Book chapters
  5. Conference papers
  6. Reports

Academic literature on the topic 'Film deposited on substrate'

Author: Grafiati
Published: 8 February 2025
Last updated: 31 July 2025

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Journal articles on the topic "Film deposited on substrate"

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Panitchakan, H., and Pichet Limsuwan. "The Properties of Al2O3 Films Deposited onto Al2O3-TiC and Si Substrates by RF Diode Sputtering." Applied Mechanics and Materials 313-314 (March 2013): 126–30. http://dx.doi.org/10.4028/www.scientific.net/amm.313-314.126.

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The Al2O3 films were deposited onto Al2O3-TiC and Si (100) substrates by RF sputtering technique by varying powers sputter target, substrate bias voltages and fixed process pressure 25 mTorr which aim to achieve high deposition rate and investigated film properties onto different types. Result showed significant power sputter target to deposition rate both substrates and film properties depend on type of substrate. The power sputter target at 8kW and substrate bias voltage at -150 V is optimum deposition condition to provide deposition rate is 53.97nm/min for Al2O3-TiC substrate and 51.50nm/mi
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Hwang, Cheol Seong, Mark D. Vaudin, and Gregory T. Stauf. "Influence of substrate annealing on the epitaxial growth of BaTiO3 thin films by metal-organic chemical vapor deposition." Journal of Materials Research 12, no. 6 (1997): 1625–33. http://dx.doi.org/10.1557/jmr.1997.0222.

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BaTiO3 thin films were deposited by metal-organic chemical vapor deposition at 840 °C on two differently treated (100) MgO single crystal substrates. One MgO substrate was only mechanically polished and the other substrate was polished and then annealed at 1100 °C for 4 h in oxygen. Observation by transmission electron microscopy showed that the BaTiO3 thin film deposited on the unannealed substrate was fine-grained and that the whole film was epitaxial (100) in nature. In contrast, the film deposited on the annealed substrate consisted of large, (100)-oriented, epitaxial grains within which w
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Xu, Zhihua, and Zhengtao Chen. "The Effect of Titanium Oxide Substrate on the Film Morphology and Photoluminescence Properties of Organometal Halide Perovskites." MRS Proceedings 1771 (2015): 181–85. http://dx.doi.org/10.1557/opl.2015.608.

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ABSTRACTWe have investigated the film morphology and photoluminescence properties of spin-coated CH3NH3PbI3-xClx films on mesoporous and compact TiO2 substrates. We observe that the perovskite film deposited on the mesoporous substrate composed of 20 nm TiO2 nanopaticles exhibits relatively uniform grain size, while the films deposited on the compact TiO2 substrate and the mesoporous substrate with large TiO2 nanoparticles (200 nm) show highly heterogeneous film morphology. The heterogeneity of film morphology has significant effect on the photoluminescence spectra and lifetime of the perovski
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Prasad, Beesabathina D., L. Salamanca-Riba, S. N. Mao, X. X. Xi, T. Venkatesan, and X. D. Wu. "Effect of substrate materials on laser deposited Nd1.85Ce0.15CuO4−y films." Journal of Materials Research 9, no. 6 (1994): 1376–83. http://dx.doi.org/10.1557/jmr.1994.1376.

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The growth morphology and interface structure of Nd1.85Ce0.15CuO4−y (NCCO) films grown by pulsed laser deposition on two different types of substrates, “perovskite” LaAlO3 (LAO) and SrTiO3 (STO) and “fluorite” Y2O3-stabilized ZrO2 (YSZ), were studied using cross-sectional electron microscopy. Structurally, the NCCO films are different when grown on the two types of substrates in three aspects: (i) epitaxy, (ii) substrate-film intermixing, and (iii) substrate-film interface roughness. In general, films deposited on “fluorite” substrates showed better superconducting properties than the films gr
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Xu, Fang Chao, and Kazuhiro Kusukawa. "Adhesion Strength of BNT Films Hydrothermally Deposited on Titanium Substrates." Advanced Materials Research 123-125 (August 2010): 399–402. http://dx.doi.org/10.4028/www.scientific.net/amr.123-125.399.

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Lead-free piezoelectric (Bi1/2Na1/2)TiO3 (BNT) films were deposited on 1 mm thick pure titanium(Ti) substrates by a hydrothermal method. Tensile tests were performed to quantitatively assess the adhesion strength between BNT films and Ti substrates. Ti substrates were pretreated by chemical polish and mechanical polish respectively prior to BNT film deposition. In the tensile test, the behavior of BNT film exfoliation was investigated by the replica method. The critical Ti substrate strain inducing BNT film exfoliation was determined by the aid of finite element analysis (FEM). In this study,
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Sacken, U. von, and D. E. Brodie. "Structure of vacuum-deposited Zn3P2 films." Canadian Journal of Physics 64, no. 10 (1986): 1369–73. http://dx.doi.org/10.1139/p86-243.

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The structure of polycrystalline Zn3P2 films has been studied for 1- to 2-μm-thick vacuum-deposited films on glass substrates. Transmission electron microscopy and X-ray diffraction techniques have been used to obtain a detailed, quantitative analysis of the film structure. The initial growth consists of small (≤ 10 nm), randomly oriented grains. As the film thickness increases, the growth of crystallites with the {220} planes oriented approximately parallel to the substrate is favoured, and a columnar structure develops along with a highly preferred orientation. This structure has been observ
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Hasan, M. K., M. N. A. Shafi, M. N. A. Siddiquy, M. A. Rahim, and M. J. Islam. "Electrical, Magnetic and Morphological Properties of E-Beam Evaporated Ni Thin Films." Journal of Scientific Research 8, no. 1 (2016): 21–28. http://dx.doi.org/10.3329/jsr.v8i1.24492.

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Nickel (Ni) thin films in the thickness range 50?80 nm have been prepared by electron beam evaporation method at a base pressure of 4x10-5 mbar on silicon and glass substrates. Some samples have been annealed at 573 K for 1.5 h in open air. The resistivity of Ni films on silicon substrate is higher than the resistivity of Ni films on glass substrate. The TCR of Ni films is found to be positive which indicates that the Ni samples are metallic in nature. Coercivity of Ni films increases with increasing film thickness. The coercivity of 80 nm as-deposited Ni film on glass substrate is found to be
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Yu, J., and S. Matsumoto. "Growth of cubic boron nitride films on tungsten carbide substrates by direct current jet plasma chemical vapor deposition." Journal of Materials Research 19, no. 5 (2004): 1408–12. http://dx.doi.org/10.1557/jmr.2004.0188.

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Cubic boron nitride (cBN) film was deposited on Co-containing WC substrates by dc jet plasma chemical vapor deposition from an Ar–N2–BF3–H2 gas system. The formation of cobalt nitrides was observed at interface, and the hindrance of Co on cBN growth was demonstrated. Growth temperature and etching treatment of the substrate before deposition influenced the cBN growth greatly. At 1050 °C, cBN films were obtained on etched substrates but not on unetched substrates. At 1090 °C, cBN films were not obtained even on etched substrates. At 960 °C, cBN films deposited even on unetched substrate but the
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Sawa, Sayuki, and Shinzo Yoshikado. "Evaluation of Planar-Type Thin Film ZnO Varistors Fabricated Using Pulsed Laser Ablation." Key Engineering Materials 320 (September 2006): 109–12. http://dx.doi.org/10.4028/www.scientific.net/kem.320.109.

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Planar-type thin film Bi-Mn-Co-doped ZnO varistors were fabricated on a silica glass substrate or a sintered alumina substrate using a visible light (532 nm) pulsed laser ablation method. The deposited thin films were annealed at 800°C or 900°C in air. For the thin films deposited on alumina substrates and then annealed, the contents of Bi and Mn decreased compared with those of the as-deposited films. Voltage-current (V-I) characteristics of the thin-film varistor fabricated on the alumina substrates and annealed showed nonlinearity. The nonlinearity index α was approximately 10 for the thin
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Wang, Xin Chang, Bin Shen, and Fang Hong Sun. "Deposition and Characterization of Boron-Doped HFCVD Diamond Films on Ti, SiC, Si and Ta Substrates." Applied Mechanics and Materials 217-219 (November 2012): 1062–67. http://dx.doi.org/10.4028/www.scientific.net/amm.217-219.1062.

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In the present investigation, titanium (Ti), silicon carbide (SiC), silicon (Si) and tantalum (Ta) samples with the same geometry are selected as substrates to deposite HFCVD boron-doped diamond films with the same deposition parameters, using trimethyl borate as the dopant. FESEM, EDS, Raman spectroscopy and Rockwell hardness tester are used to characterize as-deposited boron-doped diamond (BDD) films. The FESEM micrographs exhibit that the film deposited on Si substrate presents the best uniformity and that on Ti substrate has smallest grain size and film thickness, with titanium element det
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Dissertations / Theses on the topic "Film deposited on substrate"

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Porada, O. K., A. O. Kozak, V. I. Ivashchenko, et al. "Hard Si-C-N Chemical Vapor Deposited Films." Thesis, Sumy State University, 2015. http://essuir.sumdu.edu.ua/handle/123456789/42711.

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Si-C-N thin films were deposited on silicon substrates by plasma-enhanced chemical vapor deposition (PECVD) using hexamethyldisilazane as the main precursor. An influence of substrate temperature (TS) on film properties was analyzed. It was established that the deposited films were x-ray amorphous. The growth of the films slows down with increasing substrate temperature. The distribution of Si–C, Si–N and C–N bonds were almost independent of TS, whereas the number of С–Н, Si–H and N–H bonds essentially decreased when substrate temperature increased. The nanohardness and elastic modulus increa
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Bragg, Donald. "Photocatalytic Oxidation of Carbon Monoxide Using Sputter Deposited Molybdenum Oxide Thin Films on a Silicon Dioxide Substrate." Fogler Library, University of Maine, 2007. http://www.library.umaine.edu/theses/pdf/BraggD2007.pdf.

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Manoochehrnia, Pooyan. "Characterisatiοn οf viscοelastic films οn substrate by acοustic micrοscοpy. Direct and inverse prοblems". Electronic Thesis or Diss., Normandie, 2024. http://www.theses.fr/2024NORMLH38.

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Dans le cadre de cette thèse de doctorat, la caractérisation des films épais et minces déposés sur un substrat a été réalisée à l'aide de la microscopie acoustique via des algorithmes de résolution de problèmes directs et inverses. La méthode de Strohm est utilisée pour la résolution directe des problèmes, tandis qu'une variété de modèles mathématiques comprenant le modèle de la série de Debye (DSM), le modèle de la ligne de transmission (TLM) et la méthode spectrale utilisant le modèle de la rapport entre les réflexions multiples (MRM) ont été utilisés pour résoudre les problèmes inverses. Un
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Schlebrowski, Torben [Verfasser], Christian B. [Akademischer Betreuer] Fischer, Stefan [Akademischer Betreuer] Wehner, Christian B. [Gutachter] Fischer, and Barbara [Gutachter] Hahn. "Plasma deposited thin layers of amorphous hydrogenated carbon (a-C:H) on selected biodegradable polymer films - Layer thickness and substrate dependent carbon hybridisation and its effect on layer stability / Torben Schlebrowski ; Gutachter: Christian B. Fischer, Barbara Hahn ; Christian B. Fischer, Stefan Wehner." Koblenz, 2020. http://d-nb.info/1213726859/34.

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Butterfield, Martin Thomas. "Surface structure of ultrathin metal films deposited on copper single crystals." Thesis, Loughborough University, 2000. https://dspace.lboro.ac.uk/2134/33132.

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Ultrathin films of Cobalt, Iron and Manganese have been thennally evaporated onto an fcc Copper (111) single crystal substrate and investigated using a variety of surface structural teclmiques. The small lattice mismatch between these metals and the Cu (111) substrate make them an ideal candidate for the study of the phenomena of pseudomorphic film growth. This is important for the understanding of the close relationship between film structure and magnetic properties. Growing films with the structure of their substrate rather than their bulk phase may provide an opportunity to grow materials w
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Munns, Clifford B. "X-ray diffraction studies of evaporated gold thin films deposited on aluminum nitride substrates." Thesis, Monterey, Calif. : Springfield, Va. : Naval Postgraduate School ; Available from National Technical Information Service, 1994. http://handle.dtic.mil/100.2/ADA280454.

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Taddeo, Fernando. "Caracterização de filme vítreo, sinterizado com diferentes ciclos térmicos, depositado sobre substrato de Y-TZP e sua resistência de união imediata e após termociclagem a cimentos resinosos." Universidade de São Paulo, 2013. http://www.teses.usp.br/teses/disponiveis/23/23140/tde-16122013-193112/.

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A zircônia estabilizada por ítria (Y-TZP) apresenta excelentes propriedades mecânicas; entretanto, sua microestrutura cristalina inerte faz com que tratamentos aplicados em porcelanas e vitrocerâmicas, como condicionamento com ácido fluorídrico e aplicação de compostos silânicos, sejam ineficazes para obter união aos cimentos resinosos. Neste trabalho, propõe-se uma alternativa para aumentar a reatividade da Y-TZP a cimentos resinosos por meio de um processo de modificação da superfície através da deposição de um filme vítreo. O objetivo deste estudo é, portanto, caracterizar um filme vítreo,
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Stefanik, Todd Stanley 1973. "The effect of oxygen partial pressure on the epitaxy of cerium oxide films deposited on nickel substrates." Thesis, Massachusetts Institute of Technology, 1996. http://hdl.handle.net/1721.1/47650.

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Gan, Feng Yuan 1967. "Thin film transistors with chemically deposited active channels." Thesis, McGill University, 2001. http://digitool.Library.McGill.CA:80/R/?func=dbin-jump-full&object_id=38192.

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Using CdSe and CdS thin films as an active layer prepared by chemical bath deposition method (CBD), thin film transistors (TFT) have been fabricated and studied. There are two fabrication processes developed in this work for TFTs dependent on the substrates used. A procedure for the fabrication of TFTs on Si substrates and a procedure for devices on glass substrates will be presented. Both procedures are designed for the fabrication of TFTs with an inverted gate-staggered electrode configuration. The chemical bath deposition process developed has yielded CdSe-TFTs and CdS-TFTs on thermally gro
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Poulter, Neil. "Novel antimicrobial plasma deposited films." Thesis, University of Bath, 2010. https://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.518294.

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Bacterial infection is a growing concern in hospital and community settings, where the issue of biofilms is a major problem. Most current methods of preventing microbial attachment and biofilm formation are limited due to application, process or inherent flaws. It was proposed that thin films containing an organometallic element could be deposited using plasma, a quick, clean surface modification technique; to create antimicrobial films which could then be applied to a range of substrates. <br /> Several novel antimicrobial monomer systems were synthesised and characterised based on silver, co
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Books on the topic "Film deposited on substrate"

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Sloof, Willem Gerrit. Internal stresses and microstructure of layer/substrate assemblies: Analysis of TiC and TiN coatings chemically vapour deposited on various substrates. Delft University Press, 1996.

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Miyoshi, Kazuhisa. Chemical-vapor-deposited diamond film. National Aeronautics and Space Administration, Lewis Research Center, 1999.

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Miyoshi, Kazuhisa. Chemical-vapor-deposited diamond film. National Aeronautics and Space Administration, Lewis Research Center, 1999.

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Miyoshi, Kazuhisa. Chemical-vapor-deposited diamond film. National Aeronautics and Space Administration, Lewis Research Center, 1999.

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Miyoshi, Kazuhisa. Chemical-vapor-deposited diamond film. National Aeronautics and Space Administration, Lewis Research Center, 1999.

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Munns, Clifford B. X-ray diffraction studies of evaporated gold thin films deposited on aluminum nitride substrates. Naval Postgraduate School, 1994.

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J, Mort, and Jansen F. Ph D, eds. Plasma deposited thin films. CRC Press, 1986.

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Horgan, Fergal G. Osteoblast response to sputter deposited calcium phosphate thin film coatings. The author], 2004.

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Peng, Zhilong. Bio-inspired Studies on Adhesion of a Thin Film on a Rigid Substrate. Springer Berlin Heidelberg, 2015. http://dx.doi.org/10.1007/978-3-662-46955-2.

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United States. National Aeronautics and Space Administration., ed. CHEMICAL-VAPOR-DEPOSITED DIAMOND FILM... NASA/TM-1999-107249/CH9... MAY 27, 1999. s.n., 1999.

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Book chapters on the topic "Film deposited on substrate"

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Kaneko, Satoru, Seishiro Ohya, and Ken Kobayashi. "Bi2Sr2Ca1Cu2Ox Film Deposited on Ion Implanted Substrate." In Advances in Superconductivity VII. Springer Japan, 1995. http://dx.doi.org/10.1007/978-4-431-68535-7_229.

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Shan, Ying Chun, Xiao Dong He, Ming Wei Li, and Yao Li. "Surface Morphology of Thin Film Deposited on Rotating Substrate by EB-PVD." In Key Engineering Materials. Trans Tech Publications Ltd., 2007. http://dx.doi.org/10.4028/0-87849-410-3.2238.

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Magalas, Leszek B., and S. Etienne. "Mechanical Spectroscopy of Oil Films Deposited on Metallic Substrate." In Solid State Phenomena. Trans Tech Publications Ltd., 2006. http://dx.doi.org/10.4028/3-908451-24-8.157.

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Jayachandran, S., A. Brolin, M. Harivishanth, K. Akash, and I. A. Palani. "Study on Actuation Characteristics of NiTiCu SMA Thin Film Deposited on Flexible Substrate." In Lecture Notes on Multidisciplinary Industrial Engineering. Springer Singapore, 2019. http://dx.doi.org/10.1007/978-981-32-9425-7_44.

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Ikenaga, Noriaki, Yoichi Kishi, Zenjiro Yajima, and Noriyuki Sakudo. "Influence of Substrate Temperature on Texture for Deposited TiNi Films." In Advances in Science and Technology. Trans Tech Publications Ltd., 2008. http://dx.doi.org/10.4028/3-908158-16-8.30.

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Singh, Salam Surjit, and Biraj Shougaijam. "Multiband Photodetection Using TiO2 Thin Film Deposited on Si Substrate Using E-beam Evaporation Technique." In Lecture Notes in Electrical Engineering. Springer Nature Singapore, 2022. http://dx.doi.org/10.1007/978-981-19-2308-1_15.

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Ahia, Chinedu Christian, Crispin Munyelele Mbulanga, Edson L. Meyer, and Johannes Reinhardt Botha. "Development of InSb Nanostructures on GaSb Substrate by Metal-Organic Chemical Vapour Deposition: Design Considerations and Characterization." In Chemically Deposited Nanocrystalline Metal Oxide Thin Films. Springer International Publishing, 2021. http://dx.doi.org/10.1007/978-3-030-68462-4_31.

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Sadyrin, E. V., A. L. Nikolaev, A. S. Vasiliev, and I. Yu Golushko. "Nanoindentation Derived Mechanical Properties of Au Thin Film Deposited by Pulsed Laser Sputtering on Si Substrate." In Springer Proceedings in Materials. Springer International Publishing, 2021. http://dx.doi.org/10.1007/978-3-030-76481-4_19.

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Calabretta, Michele, Alessandro Sitta, Salvatore Massimo Oliveri, and Gaetano Sequenzia. "Analysis of Warpage Induced by Thick Copper Metal on Semiconductor Device." In Lecture Notes in Mechanical Engineering. Springer International Publishing, 2021. http://dx.doi.org/10.1007/978-3-030-70566-4_10.

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AbstractElectrochemical deposited (ECD) thick film copper on silicon substrate is one of the most challenging technological brick for semiconductor industry representing a relevant improvement from the state of art because of its excellent electrical and thermal conductivity compared with traditional compound such as aluminum. The main technological factor that makes challenging the industrial implementation of thick copper layer is the severe wafer warpage induced by Cu annealing process, which negatively impacts the wafer manufacturability. The aim of presented work is the understanding of w
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Shalu, C., S. Raj Mohan, Mukesh P. Joshi, and Vipul Singh. "Substrate Dependent Growth of DH6T Small Molecules in Vapor Deposited Thin Films." In Springer Proceedings in Physics. Springer International Publishing, 2019. http://dx.doi.org/10.1007/978-3-319-97604-4_147.

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Conference papers on the topic "Film deposited on substrate"

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Avile´s, F., L. Llanes, A. I. Oliva, J. E. Corona, M. Aguilar-Vega, and M. I. Lori´a-Bastarrachea. "Elasto-Plastic Properties of Thin Gold Films Over Polymeric Substrates." In ASME 2008 International Mechanical Engineering Congress and Exposition. ASMEDC, 2008. http://dx.doi.org/10.1115/imece2008-66319.

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Metallic thin films have been extensively used as coatings, interconnections, sensors and as part of micro and nano-electromechanical devices (MEMS and NEMS). The conventional substrates utilized to deposit those films are normally rigid, such as silicon. However, for applications where the substrate is subjected to significant mechanical strain (e.g. automotive coatings, electronic textiles, bioengineering, etc.) the film-substrate system needs to be flexible and conformable. Compliant polymeric substrates are ideal candidates for such a task. Some interesting mechanical properties not achiev
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Williams, Forrest L., L. L. Boyer, J. R. McNeil, and J. J. McNally. "Optical Characteristics of Oxide Materials Deposited at Low Temperature and High Temperature Using Ion Assisted Deposition." In Optical Interference Coatings. Optica Publishing Group, 1988. http://dx.doi.org/10.1364/oic.1988.thb15.

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Although heating substrates during deposition to temperatures of 250°C or higher often improves film properties, this precludes the use of conventional techniques to deposit thin films onto substrate materials that degrade in high temperature environments. Ion assisted deposition (IAD) is a technique that can improve the performance of thin films produced by physical vapor deposition, even when depositing onto heated substrates.1-3 IAD can increase film packing density and improve film stoichiometry compared to conventionally deposited coatings, resulting in optical thin films having higher va
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Karpyna, Vitalii, Arsenii Ievtushenko, Olena Olifan, et al. "Substrate bias influence on the properties of ZnO:Al and ZnO:Al,N films deposited by magnetron sputtering." In IXth INTERNATIONAL SAMSONOV CONFERENCE “MATERIALS SCIENCE OF REFRACTORY COMPOUNDS”. Frantsevich Ukrainian Materials Research Society, 2024. http://dx.doi.org/10.62564/m4-vk1027.

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ZnO-based wide bandgap semiconductor oxides with a bandgap 3.3 eV have unique optical and electrical properties that make it promising for transparent electronics, optoelectronics and solar cells [1]. Magnetron sputtering (MS) attracts our attention due to the great possibilities for the deposition oxide films with good film adhesion, high deposition rates, film uniformity and stable composition of the deposited films. Traditionally the substrate potential at MS is grounded. The negative or positive potential applied to substrate (substrate bias) can influence the film growth as well. As to si
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Pakseresht, A., and A. Shahbazkhan. "The Effect of Splats Morphology and Post-Treatment on the Microstructure of Sprayed Coating." In ITSC2017, edited by A. Agarwal, G. Bolelli, A. Concustell, et al. DVS Media GmbH, 2017. http://dx.doi.org/10.31399/asm.cp.itsc2017p0879.

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Abstract In the thermal spray process, particulate materials can be melted by plasma atmosphere due to its high local temperature from 8700 °C to 15,000 °C. Therefore, the material powders turn into droplets after being melted by injection into the hot flame. Molten droplets are accelerated toward a substrate and form the splats which quickly solidify; finally, the film is formed by pile-up splats. Splat morphology and post treatment can determine the microstructure, mechanical and physical properties of the coating. In this study, BaTiO3 films were deposited onto a mirror polished stainless s
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Adrian, F. J., J. Bohandy, B. F. Kim, A. N. Jette, and P. Thompson. "Deposition of Metal Lines Using an Excimer Laser." In Microphysics of Surfaces, Beams, and Adsorbates. Optica Publishing Group, 1987. http://dx.doi.org/10.1364/msba.1987.wc3.

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A laser-induced forward transfer (LIFT) technique for transferring metal from one substrate to another has recently been reported.1 With this method, a metal film, deposited on a transparent source substrate, is irradiated by the laser which is focused at the interface between the film and substrate, Fig. 1, so that the ablated metal is expelled outward and will deposit on a target substrate located near the source. As noted previously,1 properties of the deposited metal features such as resolution, i.e., similarity of the deposited to the ablated metal region, electrical conductivity, etc., d
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Matsui, Shinji, Toshinari Ichihashi, and Masanobu Mito. "Electron Beam Induced Film Deposition." In Microphysics of Surfaces, Beams, and Adsorbates. Optica Publishing Group, 1989. http://dx.doi.org/10.1364/msba.1989.tua1.

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A novel method for directly applying material on only a very small area of a substrate (selective deposition) at low temperature has been reported by applying a gas-substrate interface1-7). When an electron beam is irradiated onto a substrate in electron beam Chemical Vapor Deposition (CVD), source gas molecules, adsorbed on a substrate, are dissociated into nonvolatile and volatile materials. Nonvolatile materials are deposited on a substrate, which volatile materials are evacuated. Nanometer structures can be fabricated by electron beam CVD, using electron beam induced surface reaction, beca
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Velhal, Ninad B., Narayan D. Patil, Varsha D. Phadtare, and Vijaya R. Puri. "Microwave properties of polypyrrole thin film deposited on inorganic substrate." In SOLID STATE PHYSICS: Proceedings of the 58th DAE Solid State Physics Symposium 2013. AIP Publishing LLC, 2014. http://dx.doi.org/10.1063/1.4872824.

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Ohshima, C., I. Kashiwag, S. I. Ohmi, and H. Iwai. "Electrical Characteristics of Gd2O3 Thin Film Deposited on Si Substrate." In 32nd European Solid-State Device Research Conference. IEEE, 2002. http://dx.doi.org/10.1109/essderc.2002.194956.

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Abou-Hanna, Jeries, Jose Lozano, and Wael Abuzaid. "Impact of Surface Roughness on Formation of Micro Cracks and Fatigue Performance." In ASME 2010 International Mechanical Engineering Congress and Exposition. ASMEDC, 2010. http://dx.doi.org/10.1115/imece2010-37090.

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Tungsten-doped diamond-like carbon (DLC) coatings have been magnetron sputtered with chromium and chromium/tungsten carbide dual interlayers onto 410 stainless steel rods. The surface finish (Ra) of the substrate before deposition was 0.10–0.25 μm for a set of rough rods and 0.05 to 0.10 μm for a set of smooth rods. SEM analyses revealed different kinds of flaws in the as-deposited films (virgin coating). Two samples, one from each set, were fatigue tested under uni-axial tension to determine the effect of the substrate surface roughness on the performance of the coating. Surface analysis reve
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Williams, Forrest L., R. D. Jacobson, J. R. McNeil, and J. J. McNally. "Ion-assisted optical coatings deposited at low temperature." In OSA Annual Meeting. Optica Publishing Group, 1987. http://dx.doi.org/10.1364/oam.1987.ths8.

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We have examined ion-assisted deposition (IAD) of thin films on substrates at reduced temperature (&lt;150°C). Conventional deposition techniques typically require heated substrates (~300°C). The development of deposition techniques at reduced temperature is important for coating substrate materials that cannot be subjected to elevated temperature and for improving throughput. We have observed increased values of refractive index for optical thin films of Al2O3, TiO2, and Ta2O6 deposited using IAD that approach those of bulk material. In addition, optical coatings of SiO2 and MgF2 deposited wi
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Reports on the topic "Film deposited on substrate"

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Dugger, M. T., J. K. J. Panitz, and C. W. Vanecek. Electrophoretically-deposited solid film lubricants. Office of Scientific and Technical Information (OSTI), 1995. http://dx.doi.org/10.2172/82450.

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Thaler, Stephen L. Integrated Substrate and Thin Film Design Methods. Defense Technical Information Center, 1999. http://dx.doi.org/10.21236/ada369790.

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Lu, Kyle, Gregory Horner, Bryon Larson, et al. Microwave Photoconductance Spectrometer for Thin-Film Deposited Semiconductor Materials. Office of Scientific and Technical Information (OSTI), 2024. http://dx.doi.org/10.2172/2466321.

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Cooke, D. W., E. R. Gray, R. J. Houlton, H. H. Javadi, and M. A. Maez. Surface Resistance of YBa(2)Cu(3)O(7) Films Deposited on LaGaO(3) Substrates. Defense Technical Information Center, 1989. http://dx.doi.org/10.21236/ada228636.

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Shechtman, Dan. Transmission Electron Microscopy of the CVD Diamond Film/Substrate Interface. Defense Technical Information Center, 1991. http://dx.doi.org/10.21236/ada234767.

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Shechtman, Dan. Transmission Electron Microscopy of the CVD Diamond Film/Substrate Interface. Defense Technical Information Center, 1991. http://dx.doi.org/10.21236/ada234790.

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Chatraphorn, Patcha, and Sojiphong Chatraphorn. Simulations of thin film growth on patterned substrates. Chulalongkorn University, 2005. https://doi.org/10.58837/chula.res.2005.34.

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Patterned substrate growth is a technique that layers of thin film are grown on a substrate with a predetermined pattern. A simple model is used to study patterned growth process with two different types of pattern: flat pattern and periodic pattern. The goals are to determine growth conditions that enable the grown film to reproduce the original pattern, and to determine how much of the original patterns survive up to a specific time. The persistence probability is used to determine fractions of survived pattern. We found that in flat patterned growth, a high substrate temperature which resul
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Mola, E. E., and L. Blum. The Adsorption of Incommensurate Monolayers on an Hexagonal Substrate: Lead Underpotentially Deposited on Silver (111). Defense Technical Information Center, 1988. http://dx.doi.org/10.21236/ada222764.

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Weber, M. Improvement of small-area, amorphous-silicon thin-film photovoltaics on polymer substrate. Office of Scientific and Technical Information (OSTI), 1990. http://dx.doi.org/10.2172/7202806.

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Ilias, S., F. G. King, Ting-Fang Fan, and S. Roy. Separation of Hydrogen Using an Electroless Deposited Thin-Film Palladium-Ceramic Composite Membrane. Office of Scientific and Technical Information (OSTI), 1996. http://dx.doi.org/10.2172/419403.

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