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Journal articles on the topic 'Film thickness'

Author: Grafiati

Published: 4 June 2021

Last updated: 25 July 2025

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1

Wanarattikan, Pornsiri, Piya Jitthammapirom, Rachsak Sakdanuphab, and Aparporn Sakulkalavek. "Effect of Grain Size and Film Thickness on the Thermoelectric Properties of Flexible Sb2Te3 Thin Films." Advances in Materials Science and Engineering 2019 (January 8, 2019): 1–7. http://dx.doi.org/10.1155/2019/6954918.

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In this work, stoichiometric Sb2Te3 thin films with various thicknesses were deposited on a flexible substrate using RF magnetron sputtering. The grain size and thickness effects on the thermoelectric properties, such as the Seebeck coefficient (S), electrical conductivity (σ), power factor (PF), and thermal conductivity (k), were investigated. The results show that the grain size was directly related to film thickness. As the film thickness increased, the grain size also increased. The Seebeck coefficient and electrical conductivity corresponded to the grain size of the films. The mean free p

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2

Chanthong, Thawatchai, Weerawat Intaratat, and Thanate Na Wichean. "Effect of Thickness on Electrical and Optical Properties of ZnO:Al Films." Trends in Sciences 20, no. 3 (2023): 6372. http://dx.doi.org/10.48048/tis.2023.6372.

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Zinc oxide (ZnO:Al) films were prepared on a substrate of different thicknesses by sputtering at 1×10−2 mbar argon gas pressure and 200 W power. The effect of film thickness on the structural, electrical, and optical properties was investigated by X-ray diffraction (XRD), 4-point probe technique, and ultraviolet-visible spectroscopy. The XRD film crystal structure study revealed that all sample films at thicknesses of 66, 106, 150 and 193 nm, respectively, exhibited planar Hexagonal wurtzite crystal structure (002), and ZnO crystals were grown along the c-axis. The ZnO:Al film at a thickness o

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3

ESWARAMOORTHI, VELUCHAMY, and RAYAR VICTOR WILLIAMS. "EFFECT OF THICKNESS ON MICROSTRUCTURE, DIELECTRIC AND OPTICAL PROPERTIES OF SINGLE LAYER Ba0.6Sr0.4TiO3 THIN FILM." Surface Review and Letters 21, no. 02 (2014): 1450020. http://dx.doi.org/10.1142/s0218625x14500206.

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Single layered Ba 0.6 Sr 0.4 TiO 3 (BST) thin films were prepared on stainless steel (304) and quartz substrates by solution method. The microstructure, grain size, surface morphology and thickness of the films were reported on the basis of X-ray diffraction (XRD), atomic force microscopy (AFM), field emission scanning electron microscopy (FESEM) and UV-visible spectrometer. Variation in thickness influences the microstructure of the films. The single layered thin film had uniform crack-free surface morphology. The low frequency dielectric constants for the films of thicknesses 663, 476 and 45

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4

Chen, Yen-Hua, and Kuo-Jui Tu. "Thickness Dependent on Photocatalytic Activity of Hematite Thin Films." International Journal of Photoenergy 2012 (2012): 1–6. http://dx.doi.org/10.1155/2012/980595.

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Hematite (Fe2O3) thin films with different thicknesses are fabricated by the rf magnetron sputtering deposition. The effects of film thicknesses on the photocatalytic activity of hematite films have been investigated. Hematite films possess a polycrystalline hexagonal structure, and the band gap decreases with an increase of film thickness. Moreover, all hematite films exhibit good photocatalytic ability under visible-light irradiation; the photocatalytic activity of hematite films increases with the increasing film thickness. This is because the hematite film with a thicker thickness has a ro

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5

Xiao, Na, Bo Yang, Fei Fei Du, Yan Wu, Xiang Zhao, and Gao Wu Qin. "Hardness and Texture Evolution of Sputtered TiN Thin Films with Different Thicknesses on Ti6Al4V Substrate." Key Engineering Materials 709 (September 2016): 91–94. http://dx.doi.org/10.4028/www.scientific.net/kem.709.91.

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In this present work, TiN films with various thicknesses (from 0.3 μm to 2 μm) were deposited by DC reactive magnetron sputtering on Ti6Al4V substrates. The evolution of texture and microstructure were studied by X-ray diffraction and Scanning Electron Microscopy, respectively. The XRD characterization indicates that the preferred texture of TiN films is changed from (111) to (100) with increasing the film thickness. The microstructure characterization shows that their microstructure transform from continuous into columnar with increasing the TiN film thickness. It is considered these results

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6

Greculeasa, Simona Gabriela, Anda-Elena Stanciu, Aurel Leca, et al. "Influence of Thickness on the Magnetic and Magnetotransport Properties of Epitaxial La0.7Sr0.3MnO3 Films Deposited on STO (0 0 1)." Nanomaterials 11, no. 12 (2021): 3389. http://dx.doi.org/10.3390/nano11123389.

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Epitaxial La0.7Sr0.3MnO3 films with different thicknesses (9–90 nm) were deposited on SrTiO3 (0 0 1) substrates by pulsed laser deposition. The films have been investigated with respect to morpho-structural, magnetic, and magneto-transport properties, which have been proven to be thickness dependent. Magnetic contributions with different switching mechanisms were evidenced, depending on the perovskite film thickness. The Curie temperature increases with the film thickness. In addition, colossal magnetoresistance effects of up to 29% above room temperature were evidenced and discussed in respec

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7

Gong, Wanting, Ruina Ma, An Du, Xue Zhao, and Yongzhe Fan. "The Effects of the Pre-Anodized Film Thickness on Growth Mechanism of Plasma Electrolytic Oxidation Coatings on the 1060 Al Substrate." Materials 16, no. 17 (2023): 5922. http://dx.doi.org/10.3390/ma16175922.

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To increase the density of the micro-arc oxide coating, AA 1060 samples were pretreated with an anodic oxide film in an oxalic acid solution. Plasma electrolytic oxidation (PEO) was performed to investigate the effect of the thickness of the pre-anodic oxide film on the soft-sparking mechanism. The experimental results revealed that the PEO coating phases with different thicknesses of the pre-anodized films contained both Al and gamma–alumina (γ-Al2O3). The pre-anodized film changes the final morphology of the coating, accelerating the soft sparking transition and retaining the soft sparking.

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8

He, Li, Chen, et al. "Thickness Dependence of Ferroelectric and Optical Properties in Pb(Zr0.53Ti0.47)O3 Thin Films." Sensors 19, no. 19 (2019): 4073. http://dx.doi.org/10.3390/s19194073.

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As a promising functional material, ferroelectric Pb(ZrxTi1−x)O3 (PZT) are widely used in many optical and electronic devices. Remarkably, as the film thickness decreases, the materials’ properties deviate gradually from those of solid materials. In this work, multilayered PZT thin films with different thicknesses are fabricated by Sol-Gel technique. The thickness effect on its microstructure, ferroelectric, and optical properties has been studied. It is found that the surface quality and the crystalline structure vary with the film thickness. Moreover, the increasing film thickness results in

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9

Kubota, Rurika, Akinori Tateyama, Takahisa Shiraishi, Yoshiharu Ito, Minoru Kurosawa, and Hiroshi Funakubo. "Film thickness dependence of ferroelectric properties in polar-axis-oriented epitaxial tetragonal (Bi,K)TiO₃ films prepared by hydrothermal method." AIP Advances 12, no. 3 (2022): 035241. http://dx.doi.org/10.1063/5.0084170.

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Tetragonal (00l)-oriented epitaxial (Bi,K)TiO3 films were grown at 240 °C on (100) cSrRuO3//(100)SrTiO3 substrates by the hydrothermal method. KOH aqueous solutions and Bi(NO3)3 · 5H2O and TiO2 powders were used as the starting materials. Film thickness was controlled from 33 to 1200 nm by changing the deposition time, and the Bi/(Bi+K) ratio in the A-site of perovskite ABO3 was almost constant for all film thicknesses. Polar-axis (00l)-oriented epitaxial (Bi,K)TiO3 films were obtained without a secondary phase and/or other orientation for all thickness ranges. Large ferroelectricity with the

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10

Khamee, Wattana, Kanchanee Niyom, and Watcharee Rattanasakulthong. "Thickness dependence of optical properties of sputtered AZO film on borosilicate glass." Journal of Physics: Conference Series 2653, no. 1 (2023): 012046. http://dx.doi.org/10.1088/1742-6596/2653/1/012046.

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Abstract Sputtered AZO film with different thicknesses (98, 141, 206, 249 and 306 nm) was deposited on a borosilicate substrate. The XRD pattern indicated that the deposited AZO films showed the prominent peak of the AZO phase in the (002) direction, and the (004) plane was also observed on the 141, 206, 249 and 306 nm films. The peak intensity was increased with film thickness. AFM images reveal that all films show a granule surface and columnar structure with different sizes and distributions depending on thickness. In addition, the surface roughness and electrical resistance of the films we

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11

Jaber, Ahmad M. D. (Assa’d), Ammar Alsoud, Saleh R. Al-Bashaish, et al. "Electron Energy-Loss Spectroscopy Method for Thin-Film Thickness Calculations with a Low Incident Energy Electron Beam." Technologies 12, no. 6 (2024): 87. http://dx.doi.org/10.3390/technologies12060087.

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In this study, the thickness of a thin film (tc) at a low primary electron energy of less than or equal to 10 keV was calculated using electron energy-loss spectroscopy. This method uses the ratio of the intensity of the transmitted background spectrum to the intensity of the transmission electrons with zero-loss energy (elastic) in the presence of an accurate average inelastic free path length (λ). The Monte Carlo model was used to simulate the interaction between the electron beam and the tested thin films. The total background of the transmitted electrons is considered to be the electron tr

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12

Zhang, Weiguang, Jijun Li, Yongming Xing, et al. "Experimental Study on the Thickness-Dependent Hardness of SiO2 Thin Films Using Nanoindentation." Coatings 11, no. 1 (2020): 23. http://dx.doi.org/10.3390/coatings11010023.

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SiO2 thin films are widely used in micro-electro-mechanical systems, integrated circuits and optical thin film devices. Tremendous efforts have been devoted to studying the preparation technology and optical properties of SiO2 thin films, but little attention has been paid to their mechanical properties. Herein, the surface morphology of the 500-nm-thick, 1000-nm-thick and 2000-nm-thick SiO2 thin films on the Si substrates was observed by atomic force microscopy. The hardnesses of the three SiO2 thin films with different thicknesses were investigated by nanoindentation technique, and the depen

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13

Khachatryan, Hayk, Sung-Nam Lee, Kyoung-Bo Kim, and Moojin Kim. "Deposition of Al Thin Film on Steel Substrate: The Role of Thickness on Crystallization and Grain Growth." Metals 9, no. 1 (2018): 12. http://dx.doi.org/10.3390/met9010012.

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In this study, we deposited aluminum (Al) films of different thicknesses on steel substrate and examined their phase, microstructure, and film growth process. We estimated that films of up to 30 nm thickness were mainly amorphous in nature. When the film thickness exceeded 30 nm, crystallization was observed. The further increase in film thickness triggered grain growth, and the formation of grains up to 40 nm occurred. In such cases, the Al film had a cross-grained structure with well-developed primary grains networks that were filled with small secondary grains. We demonstrated that the micr

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14

Ghorannevis, Zohreh, Marzieh Asadi Milani, Maryam Habibi, and Mahmood Ghoranneviss. "Thickness Dependence of Structural and Optical Properties of Al/ZnO Films Prepared by DC Magnetron Sputtering." Advanced Materials Research 856 (December 2013): 193–96. http://dx.doi.org/10.4028/www.scientific.net/amr.856.193.

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In this paper, AZO thin films of different thicknesses were deposited on glass substrates as transparent conducting (TCO) films by changing the deposition time using a DC magnetron sputtering method. The effect of film thicknesses on the structural and optical properties of AZO films was investigated using X-ray diffractometer (XRD) and spectrophotometer, respectively. Results show that increasing the film thickness results in decreasing the optical transmittance. The optimum properties were obtained for a film with 500 nm thickness and 90 min deposition time, which exhibited a transmittance o

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15

Ali, H. S., R. I. Jasim, H. Ch Magid, et al. "Influence of thickness on the physical properties of nanostructured TiO2 thin films for nitrogen dioxide gas sensor." Digest Journal of Nanomaterials and Biostructures 20, no. 2 (2025): 595–608. https://doi.org/10.15251/djnb.2025.202.595.

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TiO2 thin films were deposited utilizing chemical vapor deposition. XRD data indicate that all the films were polycrystalline with a predominat plane along (121). As the dislocation density and strain parameter reduce from (91.15 to 64.13), (31.97 to 27.76 For film thicknesses of 250 nm and 350 nm, respectively. the grain size increases from 10.45 nm to 12.48 nm with an increase in thickness from 250 to 350 nm. AFM images revealed that average particle sizes were 80.1 nm to 24.8 nm as thickness increased, whereas surface roughness averages decreased as film thickness increased. SEM images reve

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16

Kusano, Eiji. "Dependence of film structure on the film structure-independent equivalent film thickness in magnetron sputtering deposition of Ag thin films." Journal of Vacuum Science & Technology A 40, no. 5 (2022): 053405. http://dx.doi.org/10.1116/6.0001989.

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In this work, I have investigated the structures and properties of Ag thin films deposited by magnetron sputtering onto glass substrates with temperatures of 150 and 600 °C for film structure-independent equivalent film thicknesses in the range of 20–400 nm. The Ag thin film morphologies observed using scanning electron microscopy and atomic force microscopy showed the following distinguishable changes: an Ag thin film with an equivalent film thickness of 20 nm deposited at a substrate temperature of 150 °C displayed a film microstructure of oblate grains separated by voids, while those with e

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17

Rezk, Amgad R., Ofer Manor, Leslie Y. Yeo, and James R. Friend. "Double flow reversal in thin liquid films driven by megahertz-order surface vibration." Proceedings of the Royal Society A: Mathematical, Physical and Engineering Sciences 470, no. 2169 (2014): 20130765. http://dx.doi.org/10.1098/rspa.2013.0765.

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Arising from an interplay between capillary, acoustic and intermolecular forces, surface acoustic waves (SAWs) are observed to drive a unique and curious double flow reversal in the spreading of thin films. With a thickness at or less than the submicrometre viscous penetration depth, the film is seen to advance along the SAW propagation direction, and self-similarly over time t 1/4 in the inertial limit. At intermediate film thicknesses, beyond one-fourth the sound wavelength λ ℓ in the liquid, the spreading direction reverses, and the film propagates against the direction of the SAW propagati

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18

Wang, Naien, Yunfei Zou, Lulu Wang, and Li Yu. "Theoretical study on amplifying strong exciton–photon coupling based on surface plasmon in a hybridized perovskite nanowire-metal film-perovskite nanowire structure." Modern Physics Letters B 35, no. 20 (2021): 2150336. http://dx.doi.org/10.1142/s021798492150336x.

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We theoretically report a strong light–matter interaction in a sandwich structure composed of hybridized inorganic–organic perovskite nanowires, silica (SiO2) films and a silver (Ag) film. Surface plasmon effectively enhances the strong exciton–photon coupling strength of perovskite nanowires, which depends on reduction of effective mode volume and local field enhancement. By calculation, we find that the thicknesses of SiO2 and Ag films can affect the coupling strength. With the suitable thickness of SiO2 (5 nm) and Ag (30 nm) films, Rabi splitting can reach 319 meV, while without an Ag film

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19

Hadia, E. H., F. H. Jasim, S. S. Chiad, et al. "Thickness effects on the physical characterization of nanostructured CuO thin films for hydrogen gas sensor." Digest Journal of Nanomaterials and Biostructures 19, no. 2 (2024): 717–29. http://dx.doi.org/10.15251/djnb.2024.192.717.

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In these studies, radio frequency (RF) magnetron sputtering was used to produce nanostructured CuO thin films on glass bases with different thicknesses of (250, 300, and 350 nm). X-ray diffraction (XRD) analysis of these films revealed a polycrystalline structure with a preferred peak along the (111) plane. The Scherrer formula was used to compute the grain size. It was found that the average grain sizes are 10.78 nm, 11.36 nm, and 11.84 nm for film thicknesses of 250, 3000, and 300 nm, respectively, while the dislocation density and strain values decline. The surface roughness decreased from

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20

Thein Kyaw, Thein, Kyaw Myo Naing, and Nyunt Win. "Study on Anodizing Processes for Formation of Nano Porous Aluminum Oxide Thin Films." Advanced Materials Research 236-238 (May 2011): 3061–64. http://dx.doi.org/10.4028/www.scientific.net/amr.236-238.3061.

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In this paper aluminum oxide thin film was prepared by anodic oxidation in various acid baths such as sulphuric acid, chromic acid and phosphoric acid with different concentrations. The thickness and appearance of the anodized films formed has been compared. The thicknesses of anodic oxide film, coating weight per unit area and coating ratio of anodic oxide film variation were determined with respect to the different electrolyte concentrations by using the thickness determination formula. Sulphuric acid gives the highest thickness aluminum oxide films, in the operation condition of 15% H2SO4so

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21

Markov, A. B., A. V. Solovyov, E. V. Yakovlev, E. A. Pesterev, V. I. Petrov, and M. S. Slobodyan. "Computer simulation of temperature fields in the Cr (film)-Zr (substrate) system during pulsed electron-beam irradiation." Journal of Physics: Conference Series 2064, no. 1 (2021): 012058. http://dx.doi.org/10.1088/1742-6596/2064/1/012058.

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Abstract The paper presents the results of numerical simulation of the distribution of thermal fields during the formation of Cr-Zr surface alloy using a pulsed low-energy high-current electron beam (LEHCEB). The melting thresholds of the Cr-Zr system for different thicknesses of Cr films were calculated. The melting threshold of the Cr-Zr system increases linearly with increasing Cr film thickness. A linear regression dependency model of the melting threshold on the film thickness is proposed. Evaporation thresholds of the Cr-Zr system for different thicknesses of Cr films were calculated. Th

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22

Yeo, Chang-Dong, Andreas A. Polycarpou, James D. Kiely, and Yiao-Tee Hsia. "Nanomechanical properties of sub-10 nm carbon film overcoats using the nanoindentation technique." Journal of Materials Research 22, no. 1 (2007): 141–51. http://dx.doi.org/10.1557/jmr.2007.0007.

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The hardness and elastic modulus of ultra thin amorphous carbon overcoat (COC) films were measured using a recently developed sub-nm nanoindentation system. The carbon overcoat film thickness was varied to be 2.5 nm, 5 nm, and 10 nm on a glass substrate with a 2 nm titanium interlayer. A very sharp indenting tip, which was a cube corner tip with a radius of 44 nm, was used for the experiments. It was found that the mechanical properties of sub-10 nm film thicknesses can be reliably measured using the sub-nm indentation system and a sharp indenting tip. As the thickness of the carbon overcoat i

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23

Peng, Tiefeng, Siyuan Yang, Fan Xiang, et al. "Film tension of liquid nano-film from molecular modeling." International Journal of Modern Physics B 31, no. 04 (2017): 1750016. http://dx.doi.org/10.1142/s0217979217500163.

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Due to its geometry simplicity, the forces of thin liquid film are widely investigated and equivalently employed to explore the phys–chemical properties and mechanical stability of many other surfaces or colloid ensembles. The surface tension of bulk liquid ([Formula: see text]) and film tension ([Formula: see text]) are the most important parameters. Considering the insufficiency of detailed interpretation of film tension under micro-scale circumstances, a method for film tension was proposed based on numerical modeling. Assuming surface tension at different slab thicknesses being identical t

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24

Chattopadhyay, Soma, A. R. Teren, Jin-Ha Hwang, T. O. Mason, and B. W. Wessels. "Diffuse Phase Transition in Epitaxial BaTiO3 Thin Films." Journal of Materials Research 17, no. 3 (2002): 669–74. http://dx.doi.org/10.1557/jmr.2002.0095.

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The thickness dependence of the dielectric properties of epitaxial BaTiO3 thin films was investigated for thicknesses ranging from 15 to 320 nm. The films were deposited by low-pressure metalorganic chemical vapor deposition on (100) MgO substrates. The relative dielectric permittivity and the loss tangent values decreased with decreasing thickness. High-temperature dielectric measurements showed that with decreasing film thickness, the ferroelectric-to-paraelectric transition temperature decreased, the relative dielectric permittivity decreased, and the phase transition was diffuse. The c/a r

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25

Huang, Jingbin, Zhanyong Wang, Shijie Liao, Fang Wang, Min Huang, and Jian Zhang. "Achievement of High Perpendicular Anisotropy and Modification of Heat Treatment Peeling in Micron-Thickness Nd-Fe-B Films Used for Magnetic MEMS." Materials 16, no. 11 (2023): 4071. http://dx.doi.org/10.3390/ma16114071.

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Thick Nd-Fe-B permanent magnetic films with good perpendicular anisotropy have important applications in magnetic microelectromechanical systems (MEMSs). However, when the thickness of the Nd-Fe-B film reaches the micron level, the magnetic anisotropy and texture of NdFeB film will become worse, and it is also prone to peeling during heat treatment, which seriously limits their applications. In this paper, Si(100)/Ta(100 nm)/NdxFe91−xB9(x = 14.5, 16.4, 18.2)/Ta (100 nm) films with thicknesses of 2–10 μm are prepared by magnetron sputtering. It is found that gradient annealing (GN) could help i

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26

Yang, Junfang, Yabin Hu, Yi Ma, et al. "Combined Retrieval of Oil Film Thickness Using Hyperspectral and Thermal Infrared Remote Sensing." Remote Sensing 15, no. 22 (2023): 5415. http://dx.doi.org/10.3390/rs15225415.

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An outdoor experiment was conducted to measure the thickness of oil films (0~3000 μm) using an airborne hyperspectral imager and thermal infrared imager, and the spectral response and thermal response of oil films of different thicknesses were analyzed. The classic support vector regression (SVR) model was used to retrieve the oil film thickness. On this basis, the suitable range for retrieving oil film thickness using hyperspectral and thermal infrared remote sensing was explored, and the decision-level fusion algorithm was developed to fuse the retrieval capabilities of hyperspectral and the

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27

Wang, John, and Yu Zhang. "Nanostructured Mesoporous Thick Films of Titania for Dye-Sensitized Solar Cells." Applied Mechanics and Materials 110-116 (October 2011): 540–46. http://dx.doi.org/10.4028/www.scientific.net/amm.110-116.540.

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For energy harvesting, such as in dye-sensitized solar cells, thick films of nanostructured mesoporous titania are inevitably required. Although various mesoporous thin films, i.e., film thickness below 300 nm, such as those of TiO2 and SiO2, have been widely investigated via a supramolecular templating approach in the past decade, little progress has been made with thick films, i.e., film thickness of at least several micrometers. In order to develop the desperately wanted thick films of mesoporous nanostructure for titania, we have successfully modified the supramolecular templating approach

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Sergievskaya, I. A., S. A. Ermakov, and T. N. Lazareva. "Mode transformation of waves on the surface of a liquid covered by an elastic film of finite thickness." Fundamental and Applied Hydrophysics 18, no. 1 (2025): 31–40. https://doi.org/10.59887/2073-6673.2025.18(1)-3.

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The study of surface wave suppression due to oil product films and biogenic films in areas of catastrophic phytoplankton blooms is an important task in application to the problem of remote diagnostics of pollution on the sea surface. The peculiarity of such films in comparison with the well-studied case of quasi-monomolecular films of surfactants is a significant (on the order of or more than 1 micron) film thickness, the latter in this case is described as a layer of viscous liquid. This paper investigates wave damping on a water surface covered by a layer of another viscous fluid of finite t

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Křupka, I., M. Hartl, and M. Liška. "Influence of Contact Pressure on Central and Minimum Film Thickness Within Ultrathin Film Lubricated Contacts." Journal of Tribology 127, no. 4 (2005): 890–92. http://dx.doi.org/10.1115/1.2032991.

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Recent numerical results have indicated that the relationship between the film thickness and the speed may not always follow the simple power law, especially under severe conditions. This paper is aimed at obtaining experimental results at high contact stresses and low speeds to study the thin film behavior. Ultrathin lubricant films were observed at maximum Hertz pressures of 0.52, 1.01, and 1.54 GPa by using an optical test rig. Central and minimum film thickness values were obtained with thin film colorimetric interferometry from chromatic interferograms. The nonlinear behavior of both cent

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Hammad, Abdel-wahab, Vattamkandathil, and Ansari. "Growth and Correlation of the Physical and Structural Properties of Hexagonal Nanocrystalline Nickel Oxide Thin Films with Film Thickness." Coatings 9, no. 10 (2019): 615. http://dx.doi.org/10.3390/coatings9100615.

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This study investigated nonstoichiometric nickel oxide thin films prepared via the DC-sputtering technique at different film thicknesses. The prepared films were characterized by a surface profiler for thickness measurement, X-ray diffraction (XRD) for film nature, atomic force microscopy (AFM) for film morphology and roughness, UV-visible-near infrared (UV-vis.-NIR) spectroscopy for optical transmittance spectra of the films, and the photoluminescence (PL) spectra of the prepared films were obtained. The measured film thickness increased from 150 to 503 nm as the deposition time increased. XR

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Martínez-Miranda, L. J., J. J. Santiago-Avilés, W. R. Graham, P. A. Heiney, and M. P. Siegal. "X-ray structural studies of epitaxial yttrium silicide on Si(111)." Journal of Materials Research 9, no. 6 (1994): 1434–40. http://dx.doi.org/10.1557/jmr.1994.1434.

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We performed a series of glancing angle and reflection x-ray diffraction experiments to study both the in-plane and out-of-plane structure of epitaxial YSi2−x films grown on Si(111), with thicknesses ranging from 85 Å to 510 Å. These measurements allowed us to characterize the mean film lattice constants, the position correlation lengths of the film, and the presence and extent of strain as a function of film thickness. We find that the strain along the basal plane increases as a function of increasing thickness to approximately 1% in the 510 Å film; the corresponding out-of-plane strain is su

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Vakaliuk, I. V., R. S. Yavorskiy, L. I. Nykyruy, B. P. Naidych, and Ya S. Yavorskyy. "Morphology and optical properties of CdS thin films prepared by Physical Vapor Deposition method." Physics and Chemistry of Solid State 23, no. 4 (2022): 669–77. http://dx.doi.org/10.15330/pcss.23.4.669-677.

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The optical properties of cadmium sulfide thin films obtained by thermal evaporation in vacuum were studied. The stoichiometric compositions of the binary compound previously synthesized from high-purity powders of the initial components were used. Films of different thicknesses deposited on a glass substrate were investigated using scanning electron microscopy and absorption coefficient was defined by the Swanepoel method. It was found that with increasing film thickness, surface formations decrease and at a thickness of 1 μm the film surface is continuous. It is determined that thin films of

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Tank, Tejas M., Chetan M. Thaker, and J. A. Bhalodia. "Structural Transition in Thickness Dependent CSD Grown Nanostructure Manganite Thin Films." Advanced Materials Research 1047 (October 2014): 131–39. http://dx.doi.org/10.4028/www.scientific.net/amr.1047.131.

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In this report, manganite thin films of La0.7Sr0.3MnO3(LSMO) of various thicknesses are carried out by using Chemical Solution Deposition (CSD) technique on(100)– oriented single crystalline LaAlO3(LAO) substrate. Desired film thickness was achieved via control of the number of deposition sequences. X-ray diffraction (XRD) study shows that 1stand 3rdcoatings of LSMO films have the cubic structure while 5thand 7thcoatings of LSMO films have hexagonal structure. As the film thickness increases, increase in lattice parameter(c)was observed. Surface morphological study was carried out using Atomic

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Lansåker, Pia C., Klas Gunnarsson, Arne Roos, Gunnar A. Niklasson, and Claes Goran Granqvist. "Au-Based Transparent Conductors for Window Applications: Effect of Substrate Material." Advances in Science and Technology 75 (October 2010): 25–30. http://dx.doi.org/10.4028/www.scientific.net/ast.75.25.

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Thin films of Au were made by sputter deposition onto glass substrates with and without transparent and electrically conducting layers of SnO2:In. The Au films were up to ~11 nm in thickness and covered the range for thin film growth from discrete islands, via large scale coalescence and formation of a meandering conducting network, to the formation of a more or less “holey” film. Scanning electron microscopy and atomic force microscopy showed that the SnO2:In films were considerably rougher than the glass itself. This roughness influenced the Au film formation so that large scale coalescence

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Sánchez-Dena, Oswaldo, Susana Hernández-López, Marco Antonio Camacho-López, Pedro Estanislao Acuña-Ávila, Jorge Alejandro Reyes-Esqueda, and Enrique Vigueras-Santiago. "ZnO Films from Thermal Oxidation of Zn Films: Effect of the Thickness of the Precursor Films on the Structural, Morphological, and Optical Properties of the Products." Crystals 12, no. 4 (2022): 528. http://dx.doi.org/10.3390/cryst12040528.

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Zinc oxide (ZnO) films with different structural, morphological, and optical properties were obtained by (fixed) thermal oxidation of deposited metallic zinc (Zn) films. The main characteristics of the oxidized films are discussed in terms of the Zn film thickness. On-axis preferential crystallographic oriented growth of ZnO can be tuned based on the control of the thickness of the deposited Zn: c-axis (a-axis) for the thinnest (thicker) Zn film. The thicker ZnO film is rather a-textured, whereas the grains hosted by the ZnO films corresponding to the Zn films of intermediate thicknesses are m

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He, Xi Yun, Ai Li Ding, Yong Zhang, Zi Ping Cao, and Ping Sun Qiu. "Influence of Film Thickness on Optical Properties of PLZT Thin Films Derived from MOD Method." Key Engineering Materials 280-283 (February 2007): 231–34. http://dx.doi.org/10.4028/www.scientific.net/kem.280-283.231.

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PLZT (9/65/35) thin films on sapphire (001) substrates with thickness of 0.1 ~ 0.9 µm were prepared by a metal-organic decomposition (MOD) process. All the films present highly (110)-preferred orientation independent of the film thickness. The microstructure of the films was investigated. The influence of film thickness on optical properties of PLZT films was examined and analyzed. As the film thickness is increased, the absorption edge of the film is shifted to longer wavelength; the optical band gap Eg is increased slightly. The refractive index at 510nm determined from optical transmission

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37

Liu, Huaiyuan, Donglin Ma, Yantao Li, Lina You, and Yongxiang Leng. "Evolution of the Shadow Effect with Film Thickness and Substrate Conductivity on a Hemispherical Workpiece during Magnetron Sputtering." Metals 13, no. 1 (2023): 165. http://dx.doi.org/10.3390/met13010165.

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When depositing films on a complex workpiece surface by magnetron sputtering, the shadow effect occurs and causes the columnar structure to tilt toward the substrate owing to the oblique incident angle of the plasma flux, affecting the microstructure and properties of the films. Improving the surface diffusion could alleviate the shadow effect, whereas changing the energy of the deposited particles could improve surface diffusion. Different substrate conductivities could affect the energy of the deposited particles when they reach the substrate. In this study, Si (semiconductor) and SiO2 (insu

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Leca, Minodora, and Ovidiu Segarceanu. "INFLUENCE OF FILM THICKNESS, TEMPERATURE AND INORGANIC FILLERS ON THE VOLUME ELECTRIC RESISTIVITY OF HEAT-CURING EPOXY VARNISH." SOUTHERN BRAZILIAN JOURNAL OF CHEMISTRY 1, no. 1 (1993): 97–105. http://dx.doi.org/10.48141/sbjchem.v1.n1.1993.100_1993.pdf.

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The dependence of the volume electric resistivity of heat-during epoxy varnish on the film thickness, temperature, and nature of inorganic fillers for films obtained by spraying on steel supports cured for 30 minutes at l60 °C was determined. Film thicknesses ranged between 5 and 56 µm, temperature between 24 °C and l40 °C, and the fillers were rutile type titanium micronizes mica, colloidal aluminium oxide, and aluminium silicate. The experimental data, treated statistically by the Linear regression method, shows a linear dependence of the volume electric resistivity on the film thickness and

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HUANG, A., S. Y. TAN, and S. R. SHANNIGRAHI. "THICKNESS EFFECTS ON THE EPITAXIAL NATURE OF THE SINGLE-PHASE MULTIFERROIC THIN FILMS." International Journal of Nanoscience 08, no. 01n02 (2009): 81–85. http://dx.doi.org/10.1142/s0219581x09005992.

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Multiferroic Bi 0.95 La 0.05 Fe 0.7 Sc 0.3 O 3 (BLFS) thin films with different thicknesses have been prepared on (1 0 0) LaAlO 3 (LAO) substrates using a sol–gel process and annealed in N 2 ambient at 650°C for 5 min. From the X-ray diffraction (XRD) analysis, it was observed that BLFS thin films had (h 0 0)-preferred orientation for the film thickness 63, 125, 186, and 240 nm and became isotropic thereafter. The films developed in-plane epitaxial growth with respect to the substrate. The surface morphology became denser and the surface roughness increased as thickness increased up to 241 nm.

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Lv, Jing, and Sheng Ni Zhang. "Effect of Thicknesses on the Optical and Electrical Properties of Ag Films on PET Substrates." Advanced Materials Research 79-82 (August 2009): 655–58. http://dx.doi.org/10.4028/www.scientific.net/amr.79-82.655.

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A series of Ag films with different thicknesses were prepared on polyethylene terephthalate (PET) substrates under identical conditions by thermal evaporation. The effect of the thickness on the optical and electrical properties of the films was studied. The morphology of the samples was investigated by atomic force microscopy (AFM). The optical and electrical properties were measured by spectrophotometer and four-point probe method, respectively. The experimental results show that the reflectance increases, while transmittance and resistivity decrease with the increase of the thickness. There

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Yu, Cheng-Chang, Wen-How Lan, and Kai-Feng Huang. "Indium-Nitrogen Codoped Zinc Oxide Thin Film Deposited by Ultrasonic Spray Pyrolysis on n-(111) Si Substrate: The Effect of Film Thickness." Journal of Nanomaterials 2014 (2014): 1–7. http://dx.doi.org/10.1155/2014/861234.

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Indium-nitrogen codoped zinc oxide (INZO) thin films were fabricated by spray pyrolysis deposition technique on n-(111) Si substrate with different film thicknesses at 450°C using a precursor containing zinc acetate, ammonium acetate, and indium nitrate with 1 : 3 : 0.05 at.% concentration. The morphology and structure studies were carried out by scanning electron microscopy (SEM) and X-ray diffraction (XRD). The grain size of the films increased when increasing the film thickness. From XRD spectra, polycrystalline ZnO structure can be observed and the preferred orientation behavior varied fro

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42

Rani, Usha, Kafi Devi, Divya Gupta, and Sanjeev Aggarwal. "N₂⁺-implantation-induced tailoring of structural, morphological, optical, and electrical characteristics of sputtered molybdenum thin films." Beilstein Journal of Nanotechnology 16 (April 1, 2025): 495–509. https://doi.org/10.3762/bjnano.16.38.

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Molybdenum (Mo) thin films have extensive applications in energy storage devices and photovoltaic solar cells because of their remarkable thermal stability, high melting point, and chemical inertness. In the present study, Mo thin films of different thicknesses (150, 200, 250, and 300 nm) have been deposited on Si(100) substrates via radio frequency sputtering in an argon atmosphere at room temperature. Some of these films have been implanted with 1 × 1017 N2+·cm−2 at 30 keV using a current density of 4 µA·cm−2. Surface morphology and structural, optical, and electrical properties of the as-de

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Zhao, Minglin, Jie Lian, Zhaozong Sun, et al. "Optical characterization of TiAlON-based film used for solar energy." Modern Physics Letters B 28, no. 25 (2014): 1450196. http://dx.doi.org/10.1142/s0217984914501966.

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Optical characterization of TiAlON film applied in solar energy is presented in this paper. TiAlON -based films with different thicknesses have been deposited by magnetron sputtering. The spectrophotometer and spectroscopic ellipsometry (GES5) have been used to study the samples. Surface morphology and component of the films were investigated using scanning electron microscope (SEM), X-ray diffraction (XRD), atomic force microscope (AFM) and X-ray photoelectron spectroscopy (XPS). The optical constants and film thicknesses of TiAlON films with different thicknesses have been obtained by theore

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El Zawawi, I. K., Manal A. Mahdy, and E. A. El-Sayad. "Influence of Film Thickness and Heat Treatment on the Physical Properties of Mn Doped Sb2Se3 Nanocrystalline Thin Films." Journal of Nanomaterials 2017 (2017): 1–14. http://dx.doi.org/10.1155/2017/7509098.

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Nanocrystalline thin films of Sb37.07Mn1.95Se60.98 with different thickness (7, 20, 40, and 80 nm) were successfully prepared via inert gas condensation technique. As-deposited films showed amorphous structure by grazing incident in-plane X-ray diffraction (GIIXD) technique. All films of different thicknesses were heat treated at 433 K for 90 min. The GIIXD pattern of annealed films showed nanocrystalline orthorhombic structure. The effect of thickness of annealed films on the structure and optical properties was studied. Calculated particle sizes are 20.67 and 24.15 for 40 and 80 nm thickness

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England, Craig D., Laurie Bechder, Steve Zierer, Lisa Gassaway, Barbara Miner, and Steve Bill. "Metal Film Thickness Standards." Advances in X-ray Analysis 39 (1995): 707–12. http://dx.doi.org/10.1154/s0376030800023156.

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Cobalt, titanium and titanium nitride film thickness standards were deposited. All metal film thicknesses were obtained from x-ray reflectivity (XRR) measurement using a conventional powder diffractometer. The cobalt film thicknesses were also thicknesses were also determined from cross-sectional transmission electron microscopy (TEM) images and scanning electron microscope energy dispersive x-ray spectroscopy (SEM/EDXS) data using the recently developed MUFILM measurement technique. The cobalt film thicknesses obtained using MUFILM agreed well with the XRR results. The metal film standards we

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Lee, Sang Wook, Hyun Suk Jung, Dong Wook Kim, and Kug Sun Hong. "Correlation of Thickness with the Photocatalytic Characteristic of TiO₂ Thin Films." Materials Science Forum 486-487 (June 2005): 65–68. http://dx.doi.org/10.4028/www.scientific.net/msf.486-487.65.

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5, 10, and 30 nm thickness of transparent TiO2 thin films were fabricated using sol-gel process, and the influence of film thickness on the photocatalytic property was investigated. The increase in film thickness was found to enhance the photocatalytic property of the films. Photocatalytic properties of each film were estimated by decomposition of stearic acid. The amount of decomposed stearic acid increased with film thickness (5 - 30 nm). For the case of 30 nm thickness film, the stearic acid was decomposed perfectly in twelve minutes. UV-vis spectra and photocurrents of each film clearly sh

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Liu, Xiaoyan, Lei Wang, and Yi Tong. "Optoelectronic Properties of Ultrathin Indium Tin Oxide Films: A First-Principle Study." Crystals 11, no. 1 (2020): 30. http://dx.doi.org/10.3390/cryst11010030.

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First-principle density functional theory simulations have been performed to predict the electronic structures and optoelectronic properties of ultrathin indium tin oxide (ITO) films, having different thicknesses and temperatures. Our results and analysis led us to predict that the physical properties of ultrathin films of ITO have a direct relation with film thickness rather than temperature. Moreover, we found that a thin film of ITO (1 nm thickness) has a larger absorption coefficient, lower reflectivity, and higher transmittance in the visible light region compared with that of 2 and 3 nm

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Long, Hangyu, Huawen Hu, Kui Wen, et al. "Thickness Effects on Boron Doping and Electrochemical Properties of Boron-Doped Diamond Film." Molecules 28, no. 6 (2023): 2829. http://dx.doi.org/10.3390/molecules28062829.

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As a significant parameter in tuning the structure and performance of the boron-doped diamond (BDD), the thickness was focused on the mediation of the boron doping level and electrochemical properties. BDD films with different thicknesses were deposited on silicon wafers by the hot filament chemical vapor deposition (HFCVD) method. The surface morphology and composition of the BDD films were characterized by SEM and Raman, respectively. It was found that an increase in the BDD film thickness resulted in larger grain size, a reduced grain boundary, and a higher boron doping level. The electroch

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Malikov, Vladimir N., Nikolay D. Tihonskii, and Alexey V. Ishkov. "Thin Ni/Al Metal Films Characterization Using a High-Frequency Electromagnetic Field." Key Engineering Materials 910 (February 15, 2022): 893–901. http://dx.doi.org/10.4028/p-digld4.

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The paper presents methods of obtaining and studying new materials - thin metal films of the Ni/Al system. The technique and main parameters of the resistive method of thermal evaporation of the alloy using a vacuum universal station are briefly presented. Samples of thin films of various thicknesses were obtained. The thickness of the material was determined both using a scanning electron microscope and a developed eddy-current gage system operating under a hardware-software complex. In the course of the research, the limit the film thickness gauging capabilities of the developed gage system

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Zhou, Qingyang, and Takashi Ikuno. "Effect of the thicknesses of asymmetric TiO₂/polydimethylsiloxane films on the triboelectric output power." Japanese Journal of Applied Physics, September 29, 2023. http://dx.doi.org/10.35848/1347-4065/acfe84.

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Abstract To improve the output voltage of the polydimethylsiloxane (PDMS)-based triboelectric nanogenerators (TENGs), we investigated the effect of thicknesses of TiO2 nanoparticles (NPs)/PDMS composite films on the output power. The composite film was composed of TiO2 NPs-embedded PDMS film (base film) and pure PDMS thin film (capping layer) which was deposited on the base film. We found that the moderate thickness of the capping layer was approximately 3 μm, which is the thinnest film thickness that can completely cover the particulates exposed on the surface. The TiO2 NPs/PDMS composite fil

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