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1

Symposium on Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Emerging Dielectrics (9th 2007 Chicago, Ill.). Silicon nitride, silicon dioxide, and emerging dielectrics 9. Edited by Sah R. E, Electrochemical Society. Dielectric Science and Technology Division., and Electrochemical Society Meeting. Electrochemical Society, 2007.

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2

Symposium on Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Emerging Dielectrics (9th 2007 Chicago, Ill.). Silicon nitride, silicon dioxide, and emerging dielectrics 9. Edited by Sah R. E, Electrochemical Society. Dielectric Science and Technology Division., and Electrochemical Society Meeting. Electrochemical Society, 2007.

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3

Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (8th 2005 Québec, Québec). Silicon nitride, silicon dioxide thin insulating films, and other emerging diele[c]trics VIII: Proceedings of the international symposium. Edited by Sah R. E, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division, and Electrochemical Society Meeting. Electrochemical Society, 2005.

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4

Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (8th 2005 Québec, Québec). Silicon nitride, silicon dioxide thin insulating films, and other emerging diele[c]trics VIII: Proceedings of the international symposium. Edited by Sah R. E, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division, and Electrochemical Society Meeting. Electrochemical Society, 2005.

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5

B, Bergmann Ralf, and Research Signpost (Trivandrum India), eds. Growth, characterization, and electronic applications of si-based thin films. Research Signpost, 2002.

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6

Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (5th 1999 Seattle, Wash.). Silicon nitride and silicon dioxide thin insulating films: Proceedings of the fifth international symposium. Electrochemical Society), 1999.

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7

Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (7th 2003 Paris, France). Silicon nitride and silicon dioxide thin insulating films VII: Proceedings of the international symposium. Edited by Sah R. E, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division, and Electrochemical Society Meeting. Electrochemical Society, 2003.

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8

Innocenzi, Plinio. Mesoporous Ordered Silica Films. Springer International Publishing, 2022. http://dx.doi.org/10.1007/978-3-030-89536-5.

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9

P, Jennings J., and Hefter G. T, eds. Amorphous silicon thin films and devices: Results of research carried out as MERIWA Project No. E161 in the School of Mathematical and Physical Sciences, Murdoch University. Minerals and Energy Research Institute of Western Australia, 1993.

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10

Angeles, CA) International Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface (5th 2005 Los. The physics and chemistry of SiO₂ and the Si-SiO₂ interface--5. Electrochemical Society, 2005.

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11

International Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface (3rd 1996 Los Angeles, Calif.). The physics and chemistry of SiO₂ and the Si-SiO₂ interface-3, 1996: Proceedings of the Third International Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface. Edited by Massoud Hisham Z, Poindexter Edward H, and Helms C. Robert. Electrochemical Society, 1996.

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12

IEEE SOS/SOI Technology Conference. (1990 Key West, Fla.). 1990 IEEE SOS/SOI Technology Conference, October 2-4, 1990, Marriott's Casa, Marina Resort, Key West, Florida : proceedings. IEEE], 1990.

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13

United States. National Aeronautics and Space Administration., ed. System for the growth of bulk SiC crystals by modified CVD techniques: Final report. National Aeronautics and Space Administration, 1994.

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14

Robert, Helms C., Deal Bruce E, Electrochemical Society Electronics Division, Electrochemical Society. Dielectric Science and Technology Division., and Symposium on the Physics and Chemistry of the SiO₂ and Si-SiO₂ Interface (2nd : 1992 : St. Louis, Mo.), eds. The Physics and chemistry of SiO₂ and the Si-SiO₂ interface 2. Plenum Press, 1993.

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15

International Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface (4th 2000 Toronto, Ont.). The physics and chemistry of SiO₂ and the Si-SiO₂ interface--4, 2000: Proceedings of the Fourth International Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface, Toronto, Canada, May 15-18, 2000. Edited by Massoud Hisham Z, Electrochemical Society Electronics Division, and Electrochemical Society. Dielectric Science and Technology Division. Electrochemical Society, 2000.

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16

Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (2nd 1986 San Diego, Calif.). Proceedings of the Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films. Electrochemical Society), 1987.

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17

Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (3rd 1994 San Francisco, Calif.). Proceedings of the Third Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films. Electrochemical Society), 1994.

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18

Jamal, Deen M., Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division, and Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (4th : 1997 : Montreal, Quebec), eds. Silicon nitride and silicon dioxide thin insulating films: Proceedings of the Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films. Electrochemical Society, 1997.

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19

Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (1988 Chicago, Ill.). Proceedings of the Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films. Electrochemical Society, 1989.

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20

Symposium C on Properties and Applications of SiC, Natural and Synthetic Diamond and Related Materials (1990 Strasbourg, France). SiC, natural and synthetic diamond and related materials: Proceedings of Symposium C on Properties and Applications of SiC, Natural and Synthetic Diamond and Related Materials of the 1990 E-MRS Fall conference, Strasbourg, France, November 27-30, 1990. North-Holland, 1992.

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21

United States. National Aeronautics and Space Administration., ed. Properties of thin films for high temperature flow sensors: Final report for the period ended August 20, 1990. National Aeronautics and Space Administration, 1991.

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22

United States. National Aeronautics and Space Administration., ed. Properties of thin films for high temperature flow sensors: Final report for the period ended August 20, 1990. National Aeronautics and Space Administration, 1991.

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23

Center, Lewis Research, ed. Mechanical protection of DLC films on fused silica slides. Lewis Research Center, 1985.

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24

J, Belzer Barbara, and National Institute of Standards and Technology (U.S.), eds. Thin film reference materials development: Final report for CRADA CN-1364. U.S. Dept. of Commerce, Technology Administration, National Institute of Standards and Technology, 1998.

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25

IEEE SOS/SOI Technology Conference. (1988 St. Simons Island, Ga.). 1988 IEEE SOS/SOI Technology Workshop, October 3-5, 1988, Sea Palms Resort, St. Simons Island, Georgia, proceedings. s.n., 1988.

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26

A, Golanski, Nguyen Van Tran, and Krimmel E. F, eds. Photon, beam, and plasma enhanced processing: June 2nd-5th, 1987, Strasbourg, (France). Editions de Physique, 1987.

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27

Senoussaoui, Nadia. Einfluss der Oberflächenstrukturierung auf die optischen Eigenschaften der Dünnschichtsolarzellen auf der Basis von a-Si : H und [mu]c-Si: H. Forschungszentrum Jülich, Zentralbibliothek, 2004.

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28

United States. National Aeronautics and Space Administration., ed. Laser ann[e]aling of amorphous/poly silicon solar cell material flight experiment: Final technical report. National Aeronautics and Space Administration, 1990.

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29

G, Pensl, and International Conference on Silicon Carbide and Related Materials (7th : 1998 : Stockholm, Sweden), eds. Silicon carbide, III-nitrides and related materials: ICSCIII-N'97 : Proceedings of the 7th International Conference on Silicon Carbide, III-Nitrides and Related Materials, Stockholm, Sweden, September 1997. Trans Tech Publications, 1998.

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30

Baraban, A. P. Ėlektronika sloev SiO₂ na kremnii. Izd-vo Leningradskogo universiteta, 1988.

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31

International Conference on Silicon Carbide and Related Materials (1999 Research Triangle Park, N.C.). Silicon carbide and related materials--1999: ICSCRM'99 : proceedings of the International Conference on Silicon Carbide and Related Materials--1999, Research Triangle Park, North Carolina, USA, October 10-15, 1999. Edited by Carter Calvin H, Devaty Robert Philip 1954-, and Rohrer Gregory S. Trans Tech Publications, 2000.

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32

Kamps, Toby. Silence. The Menil Collection, 2012.

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33

A, Buchanan D., ed. Structure and electronic properties of ultrathin dielectric films on silicon and related structures: Symposium held November 29-December 1, 1999, Boston, Massachusetts, U.S.A. Materials Research Society, 2000.

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34

J, Camassel, European Materials Research Society. Meeting, Symposium A on High Temperature Electronics: Materials, Devices, and Applications (1996 : Strasbourg, France), and Symposium B on Thin Film Materials for Large Area Electronics (1996 : Strasbourg, France), eds. Frontiers in electronics: High temperature and large area applications : proceedings of Symposium A on High Temperature Electronics: Materials, Devices, and Applications, and proceedings of Symposium B on Thin Film Materials for Large Area Electronics of the 1996 E-MRS Spring Conference, Strasbourg, France, June 4-7, 1996. Elsevier, 1997.

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35

Owens, Richard J. Katyn: Slaughter & silence. ETC./Ethnic Television Channel, 1991.

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36

National Renewable Energy Laboratory (U.S.), ed. Porous polycrystalline silicon thin film solar cells: Final report, 24 May 1999-24 May 2002. National Renewable Energy Laboratory, 2003.

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37

United States. National Aeronautics and Space Administration., ed. Ultra-low-cost room temperature SiC thin films: Final report, NASA research grant no. NAG3-1828 for the period April 8, 1996 to September 30, 1996. The Center, 1997.

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38

Slafer, Dennis. Novel R2R manufacturable photonic-enhanced thin film solar cells: January 28, 2010 - January 31, 2011. National Renewable Energy Laboratory, 2012.

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39

G, Spencer M., and International Conference on SiC and Related Materials (5th : 1993 : Washington, D.C.), eds. Silicon carbide and related materials: Proceedings of the fifth conference, 1-3 November 1993, Washington, DC, USA. Institute of Physics Pub., 1994.

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40

1941-, Boulos Edward N., Platts Dennis R, and International Conference on Processing Materials for Properties (1st : 1993 : Honolulu, Hawaii), eds. Glass and optical materials II: Optoelectronics, thin film coating, sol-gel processing. American Ceramic Society, 1994.

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41

(Editor), R. E. Sah, M. J. Deen (Editor), J. F. Zhang (Editor), J. Yota (Editor), and Y. Kamakura (Editor), eds. Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Other Emerging Dielectrics VIII 2005. Electrochemical Society, 2005.

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42

Silicon Nitride and Silicon Dioxide Thin Insulating Films VII: Proceedings of the International Symposium. Not Avail, 2003.

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43

Shaikhutdinov, Shamil. Introduction to Ultrathin Silica Films. Jenny Stanford Publishing, 2020.

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44

Shaikhutdinov, Shamil. Introduction to Ultrathin Silica Films. Taylor & Francis Group, 2021.

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45

Shaikhutdinov, Shamil. Introduction to Ultrathin Silica Films. Jenny Stanford Publishing, 2020.

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46

Shaikhutdinov, Shamil. Introduction to Ultrathin Silica Films. Jenny Stanford Publishing, 2020.

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47

Introduction to Ultrathin Silica Films. Jenny Stanford Publishing, 2020.

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48

Miller, Cynthia J., ed. Silence of the Lambs. Rowman & Littlefield, 2016. https://doi.org/10.5040/9798881818432.

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One of only three films to-date to win Academy Awards in all five major categories, The Silence of the Lambs marked a sea change in horror films when it debuted, shifting the genre from teen slasher fare of the 1970s to the sophisticated psychological horror that characterizes acclaimed films today. Praised by some as the first true feminist thriller, it has drawn criticism from others for perpetuating narratives of crimes against women and demonizing its queer character. Regardless of the controversy, this film is a perennial favorite and even made it into AFI’s list of top 100 movies of all
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49

(Editor), H. Z. Massoud, C. R. Helms (Editor), and Edward H. Poindexter (Editor), eds. Physics & Chemistry of Si02 & the Si-Si02 Interface: 3rd International Symposium (Proceedings Series Volume 96-1). Electrochemical Society, 1996.

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50

Thin films on silicon. World Scientific Publishing Co. Pte. Ltd, 2016.

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