Academic literature on the topic 'Halo implants'
Create a spot-on reference in APA, MLA, Chicago, Harvard, and other styles
Consult the lists of relevant articles, books, theses, conference reports, and other scholarly sources on the topic 'Halo implants.'
Next to every source in the list of references, there is an 'Add to bibliography' button. Press on it, and we will generate automatically the bibliographic reference to the chosen work in the citation style you need: APA, MLA, Harvard, Chicago, Vancouver, etc.
You can also download the full text of the academic publication as pdf and read online its abstract whenever available in the metadata.
Journal articles on the topic "Halo implants"
Banaszeski da Silva, Mauricio, Thiago H. Both, Hans P. Tuinhout, Adrie Zegers-van Duijnhoven, Gilson I. Wirth, and Andries J. Scholten. "A Compact Statistical Model for the Low-Frequency Noise in Halo-Implanted MOSFETs: Large RTN Induced by Halo Implants." IEEE Transactions on Electron Devices 66, no. 8 (August 2019): 3521–26. http://dx.doi.org/10.1109/ted.2019.2924819.
Full textNicholas, G., B. De Jaeger, D. P. Brunco, P. Zimmerman, G. Eneman, K. Martens, M. Meuris, and M. M. Heyns. "High-Performance Deep Submicron Ge pMOSFETs With Halo Implants." IEEE Transactions on Electron Devices 54, no. 9 (September 2007): 2503–11. http://dx.doi.org/10.1109/ted.2007.902732.
Full textFelch, S. B., M. A. Foad, C. Olsen, F. Nouri, Y. Matsunaga, and N. Natsuaki. "90 nm device validation of the use of a single-wafer, high-current implanter for high tilt halo implants." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 237, no. 1-2 (August 2005): 53–57. http://dx.doi.org/10.1016/j.nimb.2005.04.076.
Full textMondal, Chandrima, and Abhijit Biswas. "Studies on Halo Implants in Controlling Short-Channel Effects of Nanoscale Ge Channel pMOSFETs." IEEE Transactions on Electron Devices 59, no. 9 (September 2012): 2338–44. http://dx.doi.org/10.1109/ted.2012.2204062.
Full textde Sousa, Lucíola Lucena, Deborah Gouvêa Prado, Mariny Fabiéle Cabral Coelho, Virgilio Pereira Ricci, Guilherme Vilela Ferreira, Eliana C. da S. Rigo, Mérilin Cristina dos Santos Fernandes, and Neide Aparecida Mariano. "Evaluation of the Bactericidal Properties of the Biomimetic Coating of Ha Doped with AgNO3." Materials Science Forum 930 (September 2018): 362–67. http://dx.doi.org/10.4028/www.scientific.net/msf.930.362.
Full textAli, Syed Asif, Asad Ali Ch, Ahmad Sarfraz Humayun, Usman Zafar Dar, and Syed Muhammad Awais. "EXPERIENCE OF HALOPELVIC TRACTION IN THE TREATMENT OF SEVERE SPINE DEFORMITY: A CASE SERIES." Annals of King Edward Medical University 21, no. 4 (January 8, 2016): 295. http://dx.doi.org/10.21649/akemu.v21i4.778.
Full textFathipour, Morteza, Ehsanollah Fathi, Behrouz Afzal, and Ali Khakifirooz. "An improved shift-and-ratio Leff extraction method for MOS transistors with halo/pocket implants." Solid-State Electronics 48, no. 10-11 (October 2004): 1829–32. http://dx.doi.org/10.1016/j.sse.2004.05.021.
Full textBaino, Francesco, Sergio Perero, Marta Miola, and Monica Ferraris. "Antibacterial Nanocoatings for Ocular Applications." Advances in Science and Technology 102 (October 2016): 24–28. http://dx.doi.org/10.4028/www.scientific.net/ast.102.24.
Full textEng, Chee-Wee, Wai-Shing Lau, David Vigar, and James Yong-Meng Lee. "An Improved Shift-and-Ratio Effective Channel Length Extraction Method for Metal Oxide Silicon Transistors with Halo/Pocket Implants." Japanese Journal of Applied Physics 42, Part 1, No. 5A (May 15, 2003): 2621–27. http://dx.doi.org/10.1143/jjap.42.2621.
Full textvan Meer, H., K. Henson, J. H. Lyu, M. Rosmeulen, S. Kubicek, N. Collaert, and K. De Meyer. "Limitations of shift-and-ratio based L/sub eff/ extraction techniques for MOS transistors with halo or pocket implants." IEEE Electron Device Letters 21, no. 3 (March 2000): 133–36. http://dx.doi.org/10.1109/55.823579.
Full textDissertations / Theses on the topic "Halo implants"
Silva, Maurício Banaszeski da. "A physics-based statistical random telegraph noise model." reponame:Biblioteca Digital de Teses e Dissertações da UFRGS, 2016. http://hdl.handle.net/10183/150171.
Full textLow Frequency Noise (LFN) and Random Telegraph Noise (RTN) are performance limiters in many analog and digital circuits. For small area devices, the noise power spectral density can easily vary by many orders of magnitude, imposing serious threat on circuit performance and possibly reliability. In this thesis, we propose a new RTN model to describe the statistics of the low frequency noise in MOSFETs. Using the proposed model, we can explain and calculate the Expected value and Variability of the noise as function of devices’ biases, geometry and physical parameters. The model is validated through numerous experimental results for n-channel and p-channel devices from different CMOS technology nodes. We show that the LFN statistics of n-channel and p-channel MOSFETs can be described by the same mechanism. From our results and model, we show that the trap density of the p-channel device is a strongly varying function of the Fermi level, whereas for the n-channel the trap density can be considered constant. We also show and explain, using the proposed model, the impact of the halo-implanted regions on the statistics of the noise. Using this model, we clarify why the variability, denoted by σ[log(SId)], of RTN/LFN doesn't follow a 1/√area dependence; and we demonstrate that the noise, and its variability, found in our measurements can be modeled using reasonable physical quantities. Moreover, the proposed model can be used to calculate the percentile quantity of the noise, which can be used to predict or to achieve certain circuit yield.
Timm, Max Eike [Verfasser], and Omid [Akademischer Betreuer] Majdani. "Patientenspezifische Auswahl von Cochlea-Implantat Elektroden basierend auf anatomischen Indikationsbereichen : Patient specific selection of lateral wall cochlear implant electrodes based on anatomical indication ranges / Max Eike Timm ; Akademischer Betreuer: Omid Majdani ; Klinik für Hals-Nasen-Ohrenheilkunde." Hannover : Bibliothek der Medizinischen Hochschule Hannover, 2019. http://d-nb.info/1206259108/34.
Full textAlmaggoussi, Abdelmajid. "Conduction électrique dans les couches minces polysilicium implantées bore et dans les couches d'inversion à potentiel modulé." Montpellier 2, 1991. http://www.theses.fr/1991MON20089.
Full textBlömer, Johannes [Verfasser], and Andreas [Akademischer Betreuer] Büchner. "Vergleich der subjektiven Einschätzung der Hörsituation bei Cochlea-Implantat-Patienten und der objektiven Sprachtestergebnisse : Übereinstimmungen oder Widersprüche / Johannes Blömer ; Akademischer Betreuer: Andreas Büchner ; Klinik für Hals-, Nasen-, Ohrenheilkunde." Hannover : Bibliothek der Medizinischen Hochschule Hannover, 2019. http://d-nb.info/1186638435/34.
Full textLee, Guan-De, and 李冠德. "The Impact of Interfacial Layer and the Halo Implant on the Reliability of High K Dielectric CMOS Devices." Thesis, 2005. http://ndltd.ncl.edu.tw/handle/19384572148428672624.
Full text國立交通大學
電子工程系所
93
With the scaling of gate oxide thickness into 1 nm regime, the gate leakage current will increase exponentially with reducing thickness. Several different methods can be employed to improve device performance and reliability. Among them, high K gate stack CMOS device is a good choice. Not only high K gate stack is needed, but also halo implant process for improving SCE ( short channel effect ) is inevitable. The impact of halo implant specifically on the edge of Hf based high K gate stacks are evaluated by a unique leakage measurement. Halo implants with large AMU ( Atomic Mass Unit ) through ALD ( Atomic Layer Deposition ) Hf based high K dielectric without appropriate IL ( interfacial layer ) may cause unavoidable damage at the gate edge region, which further causes serious degradation of the devices. In this thesis, extensive study and comparison have been carried out for various IL process with different halo implant species. First, a unique leakage measurement is made for different interfacial layer processes. They include nitrogen free, nitrogen incorporation by plasma and thermal, for the interfacial layers respectively. Next, we examine the influence of different halo implant species on each IL. It was found that halo implant impact on device characteristics, as a result of high K gate dielectric degradation, is strongly dependent on the halo implant species and governed by the IL used. Reliability test of these devices was then carried out in the latter half of this work. Because the effect of different halo implant on IL is not obvious during the Positive Bias Temperature Instability(PBTI) reliability testing, Gate-Induced Drain Leakage (GIDL) current and Gated Diode measurement are employed to observe the hot carrier stress effect. After the hot carrier stress, it was found that from the observation of Vt instability and Gm degradation results, optimized high K gate stack with even higher bombardment from the heaviest halo implant species exhibits better performance by comparing to the control oxide. These results provide an important guideline for the design of CMOS devices with high K gate dielectric.
Books on the topic "Halo implants"
Morley-Smith, Andrew C., André R. Simon, and John Pepper. Implanted cardiac support devices. Oxford University Press, 2015. http://dx.doi.org/10.1093/med/9780199687039.003.0031.
Full textMorley-Smith, Andrew C., André R. Simon, and John Pepper. Implanted cardiac support devices. Oxford University Press, 2018. http://dx.doi.org/10.1093/med/9780199687039.003.0031_update_001.
Full textGary, Cyril S., Samuel Kim, and Deepak Narayan. Pain Management in Body Contouring Procedures. Oxford University Press, 2018. http://dx.doi.org/10.1093/med/9780190457006.003.0011.
Full textAgarwal, Anil, Neil Borley, and Greg McLatchie. Breast surgery. Oxford University Press, 2017. http://dx.doi.org/10.1093/med/9780199608911.003.0005.
Full textBook chapters on the topic "Halo implants"
Mang, W. L. "Zyderm Kollagen Implant: Eine sinnvolle Ergänzung in der ästhetischen Kopf-Hals-Chirurgie?" In Die Ästhetik von Form und Funktion in der Plastischen und Wiederherstellungschirurgie, 260–67. Berlin, Heidelberg: Springer Berlin Heidelberg, 1985. http://dx.doi.org/10.1007/978-3-662-06634-8_51.
Full textChristofides, C. "Hall Effect and Resistance Measurements on Implanted and Annealed Silicon Layers." In Surface Engineering, 555–61. Dordrecht: Springer Netherlands, 1990. http://dx.doi.org/10.1007/978-94-009-0773-7_55.
Full textMannaert, G., Mikhail R. Baklanov, D. Goossens, Johann Vertommen, and Werner Boullart. "Study of a Metal Gate and Silicon Selective “Dry Ash Only” Process for Combined Extension and Halo Implanted Photo Resist." In Solid State Phenomena, 113–16. Stafa: Trans Tech Publications Ltd., 2007. http://dx.doi.org/10.4028/3-908451-46-9.113.
Full text"26.11 Cochlear-Implant-Operation." In Checklisten Hals-Nasen-Ohren-Heilkunde, edited by Arnold and Ganzer. Stuttgart: Georg Thieme Verlag, 2005. http://dx.doi.org/10.1055/b-0034-19968.
Full text"25 Implantat- und Osteosynthesematerialien." In Traumatologie des Kopf-Hals-Bereichs, edited by Arne Ernst, Michael Herzog, and Rainer Ottis Seidl. Stuttgart: Georg Thieme Verlag, 2004. http://dx.doi.org/10.1055/b-0034-7671.
Full textCohnen, Mathias, Florian Dammann, and Stefan Rohde. "25 Perioperative Bildgebung (Tympanoplastik, Kochlea-Implantat)." In Referenz Radiologie – Kopf/Hals. Stuttgart: Georg Thieme Verlag, 2020. http://dx.doi.org/10.1055/b-0039-173236.
Full textMorley-Smith, Andrew C., André R. Simon, and John Pepper. "Implanted cardiac support devices." In The ESC Textbook of Intensive and Acute Cardiovascular Care, edited by Marco Tubaro, Pascal Vranckx, Eric Bonnefoy-Cudraz, Susanna Price, and Christiaan Vrints, 680–90. Oxford University Press, 2021. http://dx.doi.org/10.1093/med/9780198849346.003.0051.
Full textPolignano, M. L., and G. Queirolo. "Chapter 6 Studies of the Stripping Hall Effect in Ion-Implanted Silicon." In Semiconductors and Semimetals, 165–94. Elsevier, 1997. http://dx.doi.org/10.1016/s0080-8784(08)62678-2.
Full textCrichton, Andrew C. "Complications Common to Nonpenetrating Surgeries." In Complications of Glaucoma Surgery. Oxford University Press, 2013. http://dx.doi.org/10.1093/oso/9780195382365.003.0079.
Full text"Black Bass Diversity: Multidisciplinary Science for Conservation." In Black Bass Diversity: Multidisciplinary Science for Conservation, edited by Zachary A. Thomas, Thomas L. Arsuffi, and Stephan J. Magnelia. American Fisheries Society, 2015. http://dx.doi.org/10.47886/9781934874400.ch13.
Full textConference papers on the topic "Halo implants"
Chang-Hoon Choi, Shyh-Horng Yang, G. Pollack, S. Ekbote, P. R. Chidambaram, S. Johnson, C. Machala, and R. W. Dutton. "Characterization of Zener-tunneling drain leakage current in high-dose halo implants." In IEEE International Conference on Simulation of Semiconductor Processes and Devices. IEEE, 2003. http://dx.doi.org/10.1109/sispad.2003.1233655.
Full textEid, M., M. Elshazly, H. Abdelazim, H. Abdelghaffar, and H. S.Mostafa. "Migration of Cochlear Implants in Cochlear Implantation and its Effect on Implant Performance." In Abstract- und Posterband – 91. Jahresversammlung der Deutschen Gesellschaft für HNO-Heilkunde, Kopf- und Hals-Chirurgie e.V., Bonn – Welche Qualität macht den Unterschied. © Georg Thieme Verlag KG, 2020. http://dx.doi.org/10.1055/s-0040-1711089.
Full textWimmer, W., F. Wagner, H. Arsani, C. Kiefer, M. Pastore-Wapp, L. Anschuetz, and M. Caversaccio. "MRI Metal Artifact Reduction Sequence for Auditory Implants: First Results with a Transcutaneous Bone Conduction Implant." In Abstract- und Posterband – 91. Jahresversammlung der Deutschen Gesellschaft für HNO-Heilkunde, Kopf- und Hals-Chirurgie e.V., Bonn – Welche Qualität macht den Unterschied. © Georg Thieme Verlag KG, 2020. http://dx.doi.org/10.1055/s-0040-1710850.
Full textBrademann, G., B. Böhnke, A. Mewes, M. Hey, and P. Ambrosch. "Longitudinalstudie der Cochlea-Implantat-Versorgung am Cochlear Implant Centrum CIC Schleswig-Kiel." In Abstract- und Posterband – 89. Jahresversammlung der Deutschen Gesellschaft für HNO-Heilkunde, Kopf- und Hals-Chirurgie e.V., Bonn – Forschung heute – Zukunft morgen. Georg Thieme Verlag KG, 2018. http://dx.doi.org/10.1055/s-0038-1640267.
Full textGröger, M., M. Leinung, A. Loth, S. Helbig, and T. Stöver. "Chronology of hearing rehabilitation in simultaneous vs. sequentially implanted cochlear implant patients." In Abstract- und Posterband – 90. Jahresversammlung der Deutschen Gesellschaft für HNO-Heilkunde, Kopf- und Hals-Chirurgie e.V., Bonn – Digitalisierung in der HNO-Heilkunde. Georg Thieme Verlag KG, 2019. http://dx.doi.org/10.1055/s-0039-1686382.
Full textEllis-Monaghan, J., Kam-Leung Lee, Meikei Ieong, and I. Yang. "Carbon Implanted Halo for Super Halo Characteristic NFETs in Bulk and SOI." In 31st European Solid-State Device Research Conference. IEEE, 2001. http://dx.doi.org/10.1109/essderc.2001.195224.
Full textBrisbin, D., J. Yang, S. Bahl, and C. Parker. "Enhanced PMOS NBTI degradation due to halo implant channeling." In 2007 IEEE International Integrated Reliability Workshop Final Report. IEEE, 2007. http://dx.doi.org/10.1109/irws.2007.4469215.
Full textBrisbin, D., J. Yang, S. Bahl, and C. Parker. "Enhanced PMOS NBTI degradation due to halo implant channeling." In 2008 IEEE International Reliability Physics Symposium (IRPS). IEEE, 2008. http://dx.doi.org/10.1109/relphy.2008.4558864.
Full textTamaki, Emi, and Ken Iwasaki. "A half-implant device on fingernails." In CHI '14: CHI Conference on Human Factors in Computing Systems. New York, NY, USA: ACM, 2014. http://dx.doi.org/10.1145/2559206.2581293.
Full textTamaki, Emi, and Ken Iwasaki. "A half-implant device on fingernails." In AH '14: 5th Augmented Human International Conference. New York, NY, USA: ACM, 2014. http://dx.doi.org/10.1145/2582051.2582061.
Full text