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1

Michel, Houssa, ed. High-K gate dielectrics. Institute of Physics, 2004.

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2

International Symposium on High Dielectric Constant Materials: Materials Science, Processing, Reliability, and Manufacturing Issues (1st 2003 Salt Lake City, Utah). Physics and technology of high-k gate dielectrics I : proceedings of the International Symposium on High Dielectric Constant Materials : Materials Science, Processing, Reliability, and Manufacturing Issues, held in Salt Lake City, Utah, October 20-24, 2002. Edited by Kar S. 1942-, Electrochemical Society. Dielectric Science and Technology Division., and Electrochemical Society Electronics Division. Electrochemical Society, 2003.

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3

High-K Gate Dielectric Materials. Taylor & Francis Group, 2020.

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4

Maity, Niladri Pratap, Reshmi Maity, and Srimanta Baishya. High-K Gate Dielectric Materials. Taylor & Francis Group, 2022.

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5

Houssa, Michel. High K Gate Dielectrics. Taylor & Francis Group, 2003.

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6

Houssa, Michael. High k Gate Dielectrics (Materials Science and Engineering). Taylor & Francis, 2003.

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7

Houssa, Michel. High K Gate Dielectrics. Taylor & Francis Group, 2003.

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8

Houssa, Michel. High K Gate Dielectrics. Taylor & Francis Group, 2003.

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9

Houssa, Michel, and M. Houssa. High K Gate Dielectrics. Taylor & Francis Group, 2010.

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10

Houssa, Michel. High K Gate Dielectrics. Taylor & Francis Group, 2003.

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11

Maity, Niladri Pratap, Reshmi Maity, and Srimanta Baishya. High-K Gate Dielectric Materials: Applications with Advanced Metal Oxide Semiconductor Field Effect Transistors. Apple Academic Press, Incorporated, 2020.

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12

Maity, Niladri Pratap, Reshmi Maity, and Srimanta Baishya. High-K Gate Dielectric Materials: Applications with Advanced Metal Oxide Semiconductor Field Effect Transistors. Apple Academic Press, Incorporated, 2020.

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13

Maity, Niladri Pratap, Reshmi Maity, and Srimanta Baishya. High-K Gate Dielectric Materials: Applications with Advanced Metal Oxide Semiconductor Field Effect Transistors. Apple Academic Press, Incorporated, 2020.

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14

Maity, Niladri Pratap, Reshmi Maity, and Srimanta Baishya. High-K Gate Dielectric Materials: Applications with Advanced Metal Oxide Semiconductor Field Effect Transistors. Apple Academic Press, Incorporated, 2020.

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15

Physics and technology of high-k gate dielectrics II: Proceedings of the Second International Symposium on High Dielectric Constant Materials: Materials Science, Processing, Reliability, and Manufacturing Issues : held in Orlando, Florida, October 12-16, 2003. Electrochemical Society, 2004.

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16

Kim Young-Hee and Jack C. Lee. Hf-Based High-k Dielectrics: Process Development, Performance Characterization, and Reliability (Synthesis Lectures on Solid State Materials and Devices). Morgan & Claypool Publishers, 2005.

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17

(Editor), H. R. Huff, C. A. Richter (Editor), M. L. Green (Editor), G. Lucovsky (Editor), and T. Hattori (Editor), eds. Ultrathin Sio2 and High-K Materials for Ulsi Gate Dielectrics: Symposium Held April 5-8, 1999 San Francisco, California, U.S.A. (Materials Research Society Symposium Proceedings). Materials Research Society, 1999.

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18

Advanced Technologies for Next Generation Integrated Circuits. Institution of Engineering & Technology, 2020.

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