Books on the topic 'High-k dielectric'
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Gusev, Evgeni, ed. Defects in High-k Gate Dielectric Stacks. Springer Netherlands, 2006. http://dx.doi.org/10.1007/1-4020-4367-8.
Full textYang, Kuo-Chang. Characterization of Gd2O3 high-K dielectric films on Si(001). National Library of Canada, 2000.
Find full textEvgeni, Gusev, ed. Defects in high-k gate dielectric stacks: Nano-electronic semiconductor devices. Springer, 2006.
Find full textInternational Symposium on High Dielectric Constant Materials: Materials Science, Processing, Reliability, and Manufacturing Issues (1st 2003 Salt Lake City, Utah). Physics and technology of high-k gate dielectrics I : proceedings of the International Symposium on High Dielectric Constant Materials : Materials Science, Processing, Reliability, and Manufacturing Issues, held in Salt Lake City, Utah, October 20-24, 2002. Edited by Kar S. 1942-, Electrochemical Society. Dielectric Science and Technology Division., and Electrochemical Society Electronics Division. Electrochemical Society, 2003.
Find full textKim, Young-Hee, and Jack C. Lee. Hf-Based High-k Dielectrics. Springer International Publishing, 2005. http://dx.doi.org/10.1007/978-3-031-02552-5.
Full textMoharana, Srikanta, Santosh Kumar Satpathy, Tuan Anh Nguyen, Ram K. Gupta, and Parvej Ahmad Alvi. Metal Oxide-based High-K Dielectrics. CRC Press, 2025. https://doi.org/10.1201/9781003352365.
Full textHe, Gang, and Zhaoqi Sun, eds. High-k Gate Dielectrics for CMOS Technology. Wiley-VCH Verlag GmbH & Co. KGaA, 2012. http://dx.doi.org/10.1002/9783527646340.
Full textInternational, Symposium on High Dielectric Constant Gate Stacks (4th 2006 Cancun Mexico). Physics and technology of high-k gate dielectrics 4. Electrochemical Society, 2006.
Find full textInternational, Symposium on High Dielectric Constant Materials and Gate Stacks (5th 2007 Washington D. C. ). Physics and technology of high-k gate dielectrics 5. Electrochemical Society, 2007.
Find full textInternational Symposium on High Dielectric Constant Materials: Materials Science, Processing, Reliability, and Manufacturing Issues (3rd 2005 Los Angeles, Calif.). Physics and technology of high-k gate dielectrics III. Edited by Kar S. 1942-, Electrochemical Society. Dielectric Science and Technology Division., and Electrochemical Society. Electronics and Photonics Division. Electrochemical Society, 2006.
Find full textInternational Symposium on High Dielectric Constant Gate Stacks (4th 2006 Cancun, Mexico). Physics and technology of high-k gate dielectrics 4. Edited by Kar S. 1942-, Electrochemical Society Meeting, Electrochemical Society. Dielectric Science and Technology Division., and Electrochemical Society. Electronics and Photonics Division. Electrochemical Society, 2006.
Find full textMaity, Niladri Pratap, Reshmi Maity, and Srimanta Baishya. High-K Gate Dielectric Materials. Taylor & Francis Group, 2022.
Find full textHoussa, Michel, and M. Houssa. High K Gate Dielectrics. Taylor & Francis Group, 2010.
Find full textHoussa, Michael. High k Gate Dielectrics (Materials Science and Engineering). Taylor & Francis, 2003.
Find full textGusev, Evgeni. Defects in HIgh-k Gate Dielectric Stacks: Nano-Electronic Semiconductor Devices. Springer, 2006.
Find full textMaity, Niladri Pratap, Reshmi Maity, and Srimanta Baishya. High-K Gate Dielectric Materials: Applications with Advanced Metal Oxide Semiconductor Field Effect Transistors. Apple Academic Press, Incorporated, 2020.
Find full textMaity, Niladri Pratap, Reshmi Maity, and Srimanta Baishya. High-K Gate Dielectric Materials: Applications with Advanced Metal Oxide Semiconductor Field Effect Transistors. Apple Academic Press, Incorporated, 2020.
Find full textMaity, Niladri Pratap, Reshmi Maity, and Srimanta Baishya. High-K Gate Dielectric Materials: Applications with Advanced Metal Oxide Semiconductor Field Effect Transistors. Apple Academic Press, Incorporated, 2020.
Find full textMaity, Niladri Pratap, Reshmi Maity, and Srimanta Baishya. High-K Gate Dielectric Materials: Applications with Advanced Metal Oxide Semiconductor Field Effect Transistors. Apple Academic Press, Incorporated, 2020.
Find full textPhysics and technology of high-k gate dielectrics II: Proceedings of the Second International Symposium on High Dielectric Constant Materials: Materials Science, Processing, Reliability, and Manufacturing Issues : held in Orlando, Florida, October 12-16, 2003. Electrochemical Society, 2004.
Find full textGusev, Evgeni. Defects in High-k Gate Dielectric Stacks: Nano-Electronic Semiconductor Devices (NATO Science Series II: Mathematics, Physics and Chemistry) (NATO Science ... II: Mathematics, Physics and Chemistry). Springer, 2006.
Find full textHe, Gang, and Zhaoqi Sun. High-K Gate Dielectrics for CMOS Technology. Wiley & Sons, Incorporated, John, 2012.
Find full textHe, Gang, and Zhaoqi Sun. High-K Gate Dielectrics for CMOS Technology. Wiley & Sons, Incorporated, John, 2012.
Find full textHe, Gang, and Zhaoqi Sun. High-K Gate Dielectrics for CMOS Technology. Wiley & Sons, Incorporated, John, 2012.
Find full textHe, Gang, and Zhaoqi Sun. High-K Gate Dielectrics for CMOS Technology. Wiley & Sons, Limited, John, 2012.
Find full textPhysics and Technology of High-k Gate Dielectrics I. Electrochemical Society, Incorporated, 2003.
Find full textKim, Young Hee, and Jack C. Lee. Hf-Based High-K Dielectrics: Process Development, Performance Characterization, and Reliability. Morgan & Claypool Publishers, 2006.
Find full textKim, Young Hee, and Jack C. Lee. Hf-Based High-K Dielectrics: Process Development, Performance Characterization, and Reliability. Springer International Publishing AG, 2007.
Find full textShiraishi, K., and T. Nakayama. Role of computational sciences in Si nanotechnologies and devices. Edited by A. V. Narlikar and Y. Y. Fu. Oxford University Press, 2017. http://dx.doi.org/10.1093/oxfordhb/9780199533060.013.1.
Full textKim Young-Hee and Jack C. Lee. Hf-Based High-k Dielectrics: Process Development, Performance Characterization, and Reliability (Synthesis Lectures on Solid State Materials and Devices). Morgan & Claypool Publishers, 2005.
Find full textAdvanced Technologies for Next Generation Integrated Circuits. Institution of Engineering & Technology, 2020.
Find full text(Editor), H. R. Huff, C. A. Richter (Editor), M. L. Green (Editor), G. Lucovsky (Editor), and T. Hattori (Editor), eds. Ultrathin Sio2 and High-K Materials for Ulsi Gate Dielectrics: Symposium Held April 5-8, 1999 San Francisco, California, U.S.A. (Materials Research Society Symposium Proceedings). Materials Research Society, 1999.
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