Books on the topic 'High-k materials'

Michel, Houssa, ed. High-K gate dielectrics. Bristol: Institute of Physics, 2004.

Tayal, Shubham, Parveen Singla, and J. Paulo Davim. High-k Materials in Multi-Gate FET Devices. Boca Raton: CRC Press, 2021. http://dx.doi.org/10.1201/9781003121589.

Frank, Blackwell, Hohmann Charles 1945-, Maehr Jane, and High/Scope Educational Research Foundation, eds. High/Scope K-3 curriculum series. Ypsilanti, Mich: High/Scope Press, 1991.

International Symposium on High Dielectric Constant Materials: Materials Science, Processing, Reliability, and Manufacturing Issues (1st 2003 Salt Lake City, Utah). Physics and technology of high-k gate dielectrics I : proceedings of the International Symposium on High Dielectric Constant Materials : Materials Science, Processing, Reliability, and Manufacturing Issues, held in Salt Lake City, Utah, October 20-24, 2002. Edited by Kar S. 1942-, Electrochemical Society. Dielectric Science and Technology Division., and Electrochemical Society Electronics Division. Pennington, NJ: Electrochemical Society, 2003.

Kablov, E. N. Aviat︠s︡ionnye materialy i tekhnologii: I︠u︡bileĭnyĭ nauchno-tekhnicheskiĭ sbornik (prilozhenie k zhurnalu "Aviat︠s︡ionnye materialy i tekhnologii"). Moskva: VIAM, 2012.

Whittenberger, J. Daniel. Mechanical properties of pure nickel alloys after long term exposures to LiOH and vacuum at 775 K. [Washington, D.C.]: NASA, 1990.

Pressure Vessels and Piping Conference (2010 Bellevue, Wash.). Proceedings of the ASME Pressure Vessels and Piping Conference--2010: Presented at ASME 2010 Pressure Vessels and Piping Conference/K-PVP Conference, July 18-22, 2010, Bellevue, Washington, USA. New York: American Society of Mechanical Engineers, 2010.

High-K Gate Dielectric Materials. Taylor & Francis Group, 2020.

Maity, Niladri Pratap, Reshmi Maity, and Srimanta Baishya. High-K Gate Dielectric Materials. Taylor & Francis Group, 2022.

Houssa, Michel. High K Gate Dielectrics. Taylor & Francis Group, 2003.

High-K Materials in Multi-Gate FET Devices. Taylor & Francis Group, 2021.

Tayal, Shubham. High-K Materials in Multi-gate Fet Devices. Taylor & Francis Group, 2021.

Davim, J. Paulo, Shubham Tayal, and Parveen Singla. High-K Materials in Multi-Gate FET Devices. Taylor & Francis Group, 2021.

Davim, J. Paulo, Shubham Tayal, and Parveen Singla. High-K Materials in Multi-Gate FET Devices. Taylor & Francis Group, 2021.

Houssa, Michael. High k Gate Dielectrics (Materials Science and Engineering). Taylor & Francis, 2003.

Houssa, Michel. High K Gate Dielectrics. Taylor & Francis Group, 2003.

Houssa, Michel, and M. Houssa. High K Gate Dielectrics. Taylor & Francis Group, 2010.

Houssa, Michel. High K Gate Dielectrics. Taylor & Francis Group, 2003.

Houssa, Michel. High K Gate Dielectrics. Taylor & Francis Group, 2003.

Blackwell, Frank F., and Charles Hohmann. Science: Field Test Edition (High/Scope K-3 Curriculum Series). High/Scope Press, 1991.

Maity, Niladri Pratap, Reshmi Maity, and Srimanta Baishya. High-K Gate Dielectric Materials: Applications with Advanced Metal Oxide Semiconductor Field Effect Transistors. Apple Academic Press, Incorporated, 2020.

Maity, Niladri Pratap, Reshmi Maity, and Srimanta Baishya. High-K Gate Dielectric Materials: Applications with Advanced Metal Oxide Semiconductor Field Effect Transistors. Apple Academic Press, Incorporated, 2020.

Maity, Niladri Pratap, Reshmi Maity, and Srimanta Baishya. High-K Gate Dielectric Materials: Applications with Advanced Metal Oxide Semiconductor Field Effect Transistors. Apple Academic Press, Incorporated, 2020.

Maity, Niladri Pratap, Reshmi Maity, and Srimanta Baishya. High-K Gate Dielectric Materials: Applications with Advanced Metal Oxide Semiconductor Field Effect Transistors. Apple Academic Press, Incorporated, 2020.

Kim Young-Hee and Jack C. Lee. Hf-Based High-k Dielectrics: Process Development, Performance Characterization, and Reliability (Synthesis Lectures on Solid State Materials and Devices). Morgan & Claypool Publishers, 2005.

(Editor), H. R. Huff, C. A. Richter (Editor), M. L. Green (Editor), G. Lucovsky (Editor), and T. Hattori (Editor), eds. Ultrathin Sio2 and High-K Materials for Ulsi Gate Dielectrics: Symposium Held April 5-8, 1999 San Francisco, California, U.S.A. (Materials Research Society Symposium Proceedings). Materials Research Society, 1999.

Water Works: A Physical Science Unit for High-Ability Learners in Grades K-1. Taylor & Francis Group, 2021.

(Editor), Annette Bussmann-Holder, and Hugo Keller (Editor), eds. High Tc Superconductors and Related Transition Metal Oxides: Special Contributions in Honor of K. Alex Müller on the Occasion of his 80th Birthday. Springer, 2007.

Physics and technology of high-k gate dielectrics II: Proceedings of the Second International Symposium on High Dielectric Constant Materials: Materials Science, Processing, Reliability, and Manufacturing Issues : held in Orlando, Florida, October 12-16, 2003. Pennington, N.J: Electrochemical Society, 2004.

Bianconi, Antonio, Annette Bussmann-Holder, and Hugo Keller. High-Tc Copper Oxide Superconductors and Related Novel Materials: Dedicated to Prof. K. A. Müller on the Occasion of his 90th Birthday. Springer, 2017.

Bianconi, Antonio, Annette Bussmann-Holder, and Hugo Keller. High-Tc Copper Oxide Superconductors and Related Novel Materials: Dedicated to Prof. K. A. Müller on the Occasion of his 90th Birthday. Springer, 2018.

How States Are Creating Conditions for Use of High-Quality Instructional Materials in K–12 Classrooms: Findings from the 2021 American Instructional Resources Survey. RAND Corporation, 2022. http://dx.doi.org/10.7249/rra134-13.

Dinamicheskoe szhatie i adiabaticheskoe rasshirenie veshchestv: (moi udarnye adiabaty) : sbornik stateĭ k 50-letii︠u︡ nauchnoĭ dei︠a︡telʹnosti R.F. Trunina. Sarov: RFI︠A︡T︠S︡-VNIIĖF, 2006.

Mechanical properties of pure nickel alloys after long term exposures to LiOH and vacuum at 775 K. [Washington, D.C.]: NASA, 1990.

Advanced Technologies for Next Generation Integrated Circuits. Institution of Engineering & Technology, 2020.

Skupio, Rafał. Zastosowanie nieinwazyjnych pomiarów rdzeni wiertniczych do zwiększenia informacji na temat parametrów skał zbiornikowych. Instytut Nafty i Gazu - Państwowy Instytut Badawczy, 2022. http://dx.doi.org/10.18668/pn2022.237.

Series, Michigan Historical Reprint. David Copperfield. By Charles Dickens. (Boz.) With ... illustrations from designs by H. K. Browne. Scholarly Publishing Office, University of Michigan Library, 2005.

Series, Michigan Historical Reprint. David Copperfield. By Charles Dickens. (Boz.) With ... illustrations from designs by H. K. Browne. Scholarly Publishing Office, University of Michigan Library, 2005.