Relevant bibliographies by topics / High-throughput nanolithography

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  1. Journal articles
  2. Book chapters
  3. Conference papers

Academic literature on the topic 'High-throughput nanolithography'

Author: Grafiati
Published: 10 December 2022
Last updated: 31 July 2025

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Journal articles on the topic "High-throughput nanolithography"

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Neumann, Hendrikje R., and Christine Selhuber-Unkel. "High-throughput micro-nanostructuring by microdroplet inkjet printing." Beilstein Journal of Nanotechnology 9 (September 4, 2018): 2372–80. http://dx.doi.org/10.3762/bjnano.9.222.

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The production of micrometer-sized structures comprised of nanoparticles in defined patterns and densities is highly important in many fields, ranging from nano-optics to biosensor technologies and biomaterials. A well-established method to fabricate quasi-hexagonal patterns of metal nanoparticles is block copolymer micelle nanolithography, which relies on the self-assembly of metal-loaded micelles on surfaces by a dip-coating or spin-coating process. Using this method, the spacing of the nanoparticles is controlled by the size of the micelles and by the coating conditions. Whereas block copol
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Berry, I. L. "Programmable aperture plate for maskless high-throughput nanolithography." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 15, no. 6 (1997): 2382. http://dx.doi.org/10.1116/1.589652.

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Hakala, Tommi K., Veikko Linko, Antti-Pekka Eskelinen, J. Jussi Toppari, Anton Kuzyk, and Päivi Törmä. "Field-Induced Nanolithography for High-Throughput Pattern Transfer." Small 5, no. 23 (2009): 2683–86. http://dx.doi.org/10.1002/smll.200901326.

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Schaper, Charles D. "Molecular transfer lithography for pseudomaskless, high-throughput, aligned nanolithography." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 21, no. 6 (2003): 2961. http://dx.doi.org/10.1116/1.1621660.

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Zhang, Hua, Nabil A Amro, Sandeep Disawal, Robert Elghanian, Roger Shile, and Joseph Fragala. "High-Throughput Dip-Pen-Nanolithography-Based Fabrication of Si Nanostructures." Small 3, no. 1 (2007): 81–85. http://dx.doi.org/10.1002/smll.200600393.

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WEI, J., and C. K. WONG. "PHYSICAL AND CHEMICAL NANOLITHOGRAPHY TECHNIQUES: CHALLENGES AND PROSPECTS." International Journal of Nanoscience 04, no. 04 (2005): 575–85. http://dx.doi.org/10.1142/s0219581x05003644.

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The fabrication of nanodevices and nanosystems having dimensions smaller than 100 nm requires the ability to produce, control, manipulate, and modify structures at the nanometer scale. Physical and chemical nanolithography techniques have been demonstrated to be promising because of the low cost and high throughput. Although the physical and chemical nanolithography techniques can pattern small features on single chips or across an entire wafer, there are considerable challenges when dealing with complex nanostructures, alignment and multilevel stacks. In this paper, the problems are reviewed
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LI, HAI, XIAO-DONG ZHANG, YI ZHANG, ZHEN-QIAN OUYANG, and JUN HU. "FABRICATION OF TRUE-COLOR MICROPATTERNS BY 2D STEPWISE CONTRACTION AND ADSORPTION NANOLITHOGRAPHY (SCAN)." Surface Review and Letters 14, no. 01 (2007): 129–34. http://dx.doi.org/10.1142/s0218625x07009141.

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Fabrication of structures on the micro- and nanometer scales is of great importance for both fundamental research and potential applications. While microlithography methods are relatively established, the production of multi-component micro- and nanostructures with high density still presents difficulties. In this paper, a novel strategy termed as two-dimensional (2D) stepwise contraction and adsorption nanolithography (SCAN) is used to fabricate true-color micropatterns through a series of size-reduction process based on the physical elasticity of elastomer. Faithful multicolor patterns with
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Lin, P. S. D. "High-throughput nanolithography using an oxygen-plasma resistant two-layer resist system." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 6, no. 6 (1988): 2290. http://dx.doi.org/10.1116/1.584072.

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Jones, Alexandra G., Claudio Balocco, Rosemary King, and Aimin M. Song. "Highly tunable, high-throughput nanolithography based on strained regioregular conducting polymer films." Applied Physics Letters 89, no. 1 (2006): 013119. http://dx.doi.org/10.1063/1.2219094.

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Haaheim, Jason, and Omkar A. Nafday. "Dip Pen Nanolithography: A Desktop Nanofabrication Approach Using High-Throughput Flexible Nanopatterning." Microscopy Today 17, no. 2 (2009): 30–33. http://dx.doi.org/10.1017/s1551929500054468.

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Dip Pen Nanolithography (DPN) is a scanning probe lithography technique where an atomic force microscope tip is used to transfer molecules to a surface via a solvent meniscus. This technique allows surface patterning on scales of under 100 nanometres. DPN is the nanotechnology analog of the dip pen (also called the quill pen), where the tip of an atomic force microscope cantilever acts as a “pen,” which is coated with a chemical compound or mixture acting as an “ink,” and put in contact with a substrate, the “paper.”DPN enables direct deposition of nanoscale materials onto a substrate in a fle
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Book chapters on the topic "High-throughput nanolithography"

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Pan, Liang. "Plasmonic Lenses for High-Throughput Nanolithography." In Plasmonics and Super-Resolution Imaging. CRC Press, 2017. http://dx.doi.org/10.4324/9781315206530-11.

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Pan, Liang. "Plasmonic Lenses for High-Throughput Nanolithography." In Plasmonics and Super-Resolution Imaging. Jenny Stanford Publishing, 2017. http://dx.doi.org/10.1201/9781315206530-10.

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Conference papers on the topic "High-throughput nanolithography"

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Schaper, Charles D. "MxL: pseudo-maskless high-throughput nanolithography." In Microlithography 2003, edited by Roxann L. Engelstad. SPIE, 2003. http://dx.doi.org/10.1117/12.484420.

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Haaheim, J. R., E. R. Tevaarwerk, J. Fragala, and R. Shile. "Commercially available high-throughput Dip Pen Nanolithography." In SPIE Defense and Security Symposium, edited by Thomas George and Zhongyang Cheng. SPIE, 2008. http://dx.doi.org/10.1117/12.777219.

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Hummler, Klaus, Qiushi Zhu, Keegan Behm, et al. "High-power EUV light sources (>500w) for high throughput in next-generation EUV lithography tools." In Optical and EUV Nanolithography XXXVII, edited by Martin Burkhardt and Claire van Lare. SPIE, 2024. http://dx.doi.org/10.1117/12.3010463.

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Haaheim, J. R., E. R. Tevaarwerk, J. Fragala, and R. Shile. "Dip Pen Nanolithography: a maturing technology for high-throughput flexible nanopatterning." In Defense and Security Symposium, edited by Thomas George and Zhongyang Cheng. SPIE, 2007. http://dx.doi.org/10.1117/12.719707.

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Hwang, Hyunwoo, Won-Sup Lee, No-Cheol Park, Hyunseok Yang, Young-Pil Park, and Kyoung-Su Park. "Enhanced Air-Gap Control for High-Speed Plasmonic Lithography Using Solid Immersion Lens With Sharp-Ridge Nanoaperture." In ASME 2011 International Mechanical Engineering Congress and Exposition. ASMEDC, 2011. http://dx.doi.org/10.1115/imece2011-63336.

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Recently, plasmonic nanolithography is studied by many researchers (1, 2 and 3). This presented a low-cost and high-throughput approach to maskless nanolithography technique that uses a metallic sharp-ridge nanoaperture with a high strong nanometer-sized optical spot induced by surface plasmon resonance. However, these nanometer-scale spots generated by metallic nanoapertures are formed in only the near-field region, which makes it very difficult to pattern above the photoresist surface at high-speeds.
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Li, Y. F., Y. Tomizawa, A. Koga, M. Sugiyama, and H. Fujita. "Multiple antiwear probes for stable and high throughput scanning probe microscope nanolithography." In 2013 Transducers & Eurosensors XXVII: The 17th International Conference on Solid-State Sensors, Actuators and Microsystems (TRANSDUCERS & EUROSENSORS XXVII). IEEE, 2013. http://dx.doi.org/10.1109/transducers.2013.6627189.

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Wang, Yuan, Mohamed E. Saad, Kang Ni, et al. "Scalable Plasmonic Nanolithography: Prototype System Design and Construction." In ASME 2016 11th International Manufacturing Science and Engineering Conference. American Society of Mechanical Engineers, 2016. http://dx.doi.org/10.1115/msec2016-8671.

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Maskless nanolithography is an agile and cost effective approach if their throughputs can be scaled for mass production purposes. Using plasmonic nanolithography (PNL) approach, direct pattern writing was successfully demonstrated with around 20 nm half-pitch at high speed. Here, we report our recent efforts of implementing a high-throughput PNL prototype system with unique metrology and control features, which are designed to use an array of plasmonic lenses to pattern sub-100 nm features on a rotating substrate. Taking the advantage of air bearing surface techniques, the system can expose th
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Oga, Toshihiro, Takamitsu Komaki, Takeshi Ohta, et al. "Improved ArFi scanner throughput and process yield through a next generation DUV light source featuring high-repetition rate and enhanced speckle contrast." In Optical and EUV Nanolithography XXXVII, edited by Martin Burkhardt and Claire van Lare. SPIE, 2024. http://dx.doi.org/10.1117/12.3009784.

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Haaheim, J. R., O. A. Nafday, T. Levesque, J. Fragala, and R. Shile. "MEMS-enabled Dip Pen Nanolithography for directed nanoscale deposition and high-throughput nanofabrication." In SPIE MOEMS-MEMS: Micro- and Nanofabrication, edited by Wanjun Wang. SPIE, 2009. http://dx.doi.org/10.1117/12.817396.

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Wang, Zhihua, and Qingze Zou. "Iterative-Control-Based High-Speed Direct Mask Fabrication via Ultrasonic-Vibration-Assisted Mechanical Plowing." In ASME 2013 Dynamic Systems and Control Conference. American Society of Mechanical Engineers, 2013. http://dx.doi.org/10.1115/dscc2013-3945.

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Mechanical indentation and plowing is one of the most widely used methods in probe-based nanolithography. Compared to other probe-based nanolithography techniques such as the Dip-pen and the milliped, mechanical plowing is not restrictive to conductive materials and/or soft materials. However, like other probe-based nanolithgraphy techniques, the low-throughput has hindered the implementation of this technique in practices. The fabrication throughput, although can be increased via parallel-probe, is ultimately limited by the tracking precision of the probe relative to the sample during the plo
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