Relevant bibliographies by topics / HiPIMS plasma

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  1. Journal articles
  2. Dissertations / Theses
  3. Books
  4. Book chapters
  5. Conference papers

Academic literature on the topic 'HiPIMS plasma'

Author: Grafiati
Published: 4 June 2021
Last updated: 17 February 2022

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Journal articles on the topic "HiPIMS plasma"

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Cao, Tian Dong, and Chang Zi Chen. "New Plasma Surface Processing Technology and its Application." Applied Mechanics and Materials 697 (November 2014): 21–26. http://dx.doi.org/10.4028/www.scientific.net/amm.697.21.

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Plasma surface processing technology can improve the mechanical properties, the corrosion resistance and chemical properties of the parts; therefore it has been widely used in industrial field. Advanced plasma surface processing technology is also constantly innovation, high power pulsed magnetron sputtering technique has been studied and explored by many scholars in recent years, and also gradually began to be used in the industry . This paper mainly introduces the study of HiPIMS dynamic and application over the past ten years. The HiPIMS discharge mechanism research method and theory is sum
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Hubička, Zdenek, Martin Zlámal, Jiri Olejníček, Drahoslav Tvarog, Martin Čada, and Josef Krýsa. "Semiconducting p-Type Copper Iron Oxide Thin Films Deposited by Hybrid Reactive-HiPIMS + ECWR and Reactive-HiPIMS Magnetron Plasma System." Coatings 10, no. 3 (2020): 232. http://dx.doi.org/10.3390/coatings10030232.

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A reactive high-power impulse magnetron sputtering (r-HiPIMS) and a reactive high-power impulse magnetron sputtering combined with electron cyclotron wave resonance plasma source (r-HiPIMS + ECWR) were used for the deposition of p-type CuFexOy thin films on glass with SnO2F conductive layer (FTO). The aim of this work was to deposit CuFexOy films with different atomic ratio of Cu and Fe atoms contained in the films by these two reactive sputtering methods and find deposition conditions that lead to growth of films with maximum amount of delafossite phase CuFeO2. Deposited copper iron oxide fil
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Ehiasarian, Arutiun P. "High-power impulse magnetron sputtering and its applications." Pure and Applied Chemistry 82, no. 6 (2010): 1247–58. http://dx.doi.org/10.1351/pac-con-09-10-43.

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High-power impulse magnetron sputtering (HIPIMS) was introduced in the late 1990s as a unique physical vapor deposition method. The technology utilizes magnetron sputtering cathodes and high peak power density of up to 3 kW cm–2 on the target. The plasma produces a metal flux with high degree of ionization. HIPIMS has been successfully used as a substrate pretreatment method to enhance coating adhesion by promoting local epitaxial growth. As a deposition technology, HIPIMS produces high-density microstructure films. It has been industrialized and has successful applications in hard, electronic
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Vetushka, Alena, and Arutiun P. Ehiasarian. "Plasma dynamic in chromium and titanium HIPIMS discharges." Journal of Physics D: Applied Physics 41, no. 1 (2007): 015204. http://dx.doi.org/10.1088/0022-3727/41/1/015204.

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Hecimovic, Ante, Achim von Keudell, Volker Schulz-von der Gathen, and Jorg Winter. "Various Shapes of Plasma Spokes Observed in HiPIMS." IEEE Transactions on Plasma Science 42, no. 10 (2014): 2810–11. http://dx.doi.org/10.1109/tps.2014.2330454.

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Spagnolo, S., M. Zuin, R. Cavazzana, et al. "Characterization of electromagnetic fluctuations in a HiPIMS plasma." Plasma Sources Science and Technology 25, no. 6 (2016): 065016. http://dx.doi.org/10.1088/0963-0252/25/6/065016.

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Gómez, Iñigo, Adrián Claver, José Antonio Santiago, et al. "Improved Adhesion of the DLC Coating Using HiPIMS with Positive Pulses and Plasma Immersion Pretreatment." Coatings 11, no. 9 (2021): 1070. http://dx.doi.org/10.3390/coatings11091070.

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Diamond-like carbon (DLC) coatings are used due to their extraordinary tribomechanical properties, great hardness, high elastic modulus, high wear resistance, low friction coefficient and chemical inertness, which provide them with biocompatibility. Compared to other physical vapor deposition (PVD) coatings of transition nitrides and carbonitrides, DLC has limited adhesion, so it is necessary to develop new techniques to overcome this limitation. This work reports the results of scratch testing for the measurement of adhesion and of tests for wear resistance and nanoindentation in AISI 316L st
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Brenning, N., I. Axnäs, M. A. Raadu, D. Lundin, and U. Helmerson. "A bulk plasma model for dc and HiPIMS magnetrons." Plasma Sources Science and Technology 17, no. 4 (2008): 045009. http://dx.doi.org/10.1088/0963-0252/17/4/045009.

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Hecimovic, A. "Anomalous cross-Bfield transport and spokes in HiPIMS plasma." Journal of Physics D: Applied Physics 49, no. 18 (2016): 18LT01. http://dx.doi.org/10.1088/0022-3727/49/18/18lt01.

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Mishra, A., P. J. Kelly, and J. W. Bradley. "The 2D plasma potential distribution in a HiPIMS discharge." Journal of Physics D: Applied Physics 44, no. 42 (2011): 425201. http://dx.doi.org/10.1088/0022-3727/44/42/425201.

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Dissertations / Theses on the topic "HiPIMS plasma"

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Poolcharuansin, Phitsanu. "The development of electrical plasma diagnostics for HiPIMS discharges." Thesis, University of Liverpool, 2012. http://livrepository.liverpool.ac.uk/7495/.

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High power impulse magnetron sputtering (HiPIMS) is a plasma-based thin film deposition technique in which extremely high power pulses are applied to a conventional magnetron sputtering source. As a result, the plasma density in HiPIMS discharges is considerably increased up to 1E19 per cubic metre, about three orders of magnitude higher than that in conventional direct current magnetron sputtering (DCMS) discharges. Hence the vapour of the sputtered species becomes highly ionised, leading to remarkable improvement in the microstructure and the properties of depositing films. To better control
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Bowes, Michael. "Plasma diagnosis of reactive high power impulse magnetron sputtering (HiPIMS) discharges." Thesis, University of Liverpool, 2014. http://livrepository.liverpool.ac.uk/18833/.

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Reactive HiPIMS discharges have been investigated by employing a selection of plasma diagnostic techniques. Plasma dynamics in a reactive HiPIMS discharge were studied by means of a single Langmuir probe which revealed electron and positive ion densities of the order of 10^17 to 10^18 m^-3 in typical substrate positions, the temporal evolutions of which exhibited a dual-peak structure attributed to the propagation of an ion acoustic wave or the compression and subsequent rarefaction of the process gas caused by the intense 'sputter wind'. The compression phase is also thought to be the cause o
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Hecimovic, Ante. "High power impulse magnetron sputtering (HIPIMS) : fundamental plasma studies and material synthesis." Thesis, Sheffield Hallam University, 2009. http://shura.shu.ac.uk/19781/.

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Physical vapour deposition (PVD) technology is widely used for deposition of coatings with applications in various industries; coatings in semiconductor industry, optical coatings or hard coatings mostly used in car and aerospace industries. In 1999 novel physical vapour deposition technology entitled high power impulse magnetron sputtering (HIPIMS) was suggested. The principle of HIPIMS is to utilize impulses (short pulses) of high power delivered to the target in order to generate high amount of metal ions with degree of metal ionization up to 90% and ions with energies up to 100 eV. Given t
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Lundin, Daniel. "Plasma properties in high power impulse magnetron sputtering." Licentiate thesis, Linköping : Department of Physics, Chemistry, and Biology, Linköping University, 2008. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-11621.

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Delfour-Peyrethon, Brice. "HiPIMS plasma diagnostic to study the repeatability of low temperature deposition of crystalline titania." Thesis, Manchester Metropolitan University, 2018. http://e-space.mmu.ac.uk/620631/.

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In the last few decades, Titanium dioxide (also called Titania or TiO2) has experienced significant scientific interest due to its range of properties and possibility for further developments in a range of applications, including photocatalysis. Initially, the material was widely used in this application in powder form for water decontamination applications. It was later developed as a thin film coating onto glasses and metals (industrial, construction scale) for its self-cleaning properties. Indeed, the scientific community realised that TiO2 coatings could present both antimicrobial properti
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Karlsson, Magnus. "Measurement of internal current densities during a HiPIMS discharge with a Rogowski coil." Thesis, Linköpings universitet, Institutionen för fysik, kemi och biologi, 2011. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-69587.

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In this study, the current densities in three different directions (r, φ and z) have been measured above the target during a HiPIMS discharge by the use of a Rogowski coil. This was done to examine the key transport parameter Jφ/JD┴ = ωge TEFF throughout the whole measured area, which is a key parameter describing how electrons are transported across magnetic field lines. The coil was adapted to the certain plasma environment that is present during a HiPIMS discharge in consideration due to the extreme environment that is present during the experiment. The thin film deposition system, where th
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Lai, Chung-Chuan. "Growth and Phase Stability of Titanium Aluminum Nitride Deposited by High Power Impulse Magnetron Sputtering." Thesis, Linköpings universitet, Plasma och beläggningsfysik, 2011. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-68922.

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In this work, we investigate the relation between the diffusion behavior of Ti1-xAlxN at elevated temperatures and the microstructure. Thinfilm samples are synthesized by reactive co-sputtering with two cathodes. One cathode equipped with Ti target is connected to a highpower impulse magnetron sputtering (HiPIMS) power supply, and the other cathode equipped with Al target is operated with a directcurrent power source. The spinodal decomposition of cubic metastable Ti1-xAlxN controlled by thermally activated diffusion is observe fordiffusion behavior. Various HiPIMS pulsing frequencies are used
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Liao, Hao Hsiang. "Digital Timing Generator for Control of Plasma Discharges." Thesis, Linköpings universitet, Elektroniska Kretsar och System, 2019. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-161090.

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This thesis report presents a new design of a synchronization unit for high power impulse magnetron sputtering (HiPIMS) applications used for depositing thin films. The proposed system is composed of two major hardware parts: a microcontroller unit (MCU) and a field-programmable gate array (FPGA). The control range of the new system is increased by at least ten times compared to existing synchronization unit designed by Ionautics AB.In order to verify the system and benchmark its innovations, several batches of the thin film have been deposited using the new technology. It is shown that HiPIMS
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Cuynet, Stéphane. "Etude des conditions d’élaboration d’électrodes de pile à combustible PEMFC par procédés plasma." Thesis, Orléans, 2014. http://www.theses.fr/2014ORLE2027/document.

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Émanant d’une collaboration entre le laboratoire CNRS du GREMI et le CEA le Ripault, l’objectif de cette thèse est de réaliser une étude exhaustive sur les conditions d’élaboration des électrodes de pile à combustible PEMFC par procédés plasma, dont l’enjeu est d’améliorer l’activité électro-catalytique du catalyseur employé qu’est le platine (Pt). A même quantité, la répartition du platine sur son support se révèle être un critère déterminant sur les performances délivrées par les PEMFCs. De cette observation, plusieurs axes de recherche ont été proposés et chacun d’entre eux a permis d’obten
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Layes, Vincent [Verfasser], los Arcos Teresa [Gutachter] De, and Achim von [Gutachter] Keudell. "Fundamental surface processes in HiPIMS plasmas : physics and chemistry at the plasma magnetron target interface / Vincent Layes ; Gutachter: Teresa De los Arcos, Achim von Keudell ; Fakultät für Physik und Astronomie." Bochum : Ruhr-Universität Bochum, 2021. http://d-nb.info/123941899X/34.

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Books on the topic "HiPIMS plasma"

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Zecchin de Fasano, Graciela Cristina, ed. Hipias menor. Editorial de la Universidad Nacional de La Plata (EDULP), 2013. http://dx.doi.org/10.35537/10915/27895.

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Las cátedras del Área Griego de la Facultad de Humanidades y Ciencias de la Educación de la UNLP han desarrollado desde 1993 material didáctico de teoría y práctica de la lengua griega para subsanar la carencia de este tipo de información y de ejercitación en lengua castellana, ya que la mayor parte de las metodologías se hallan en lengua inglesa. Para tal fin fue creado un método propio de enseñanza publicado bajo el título de <i>Griego Clásico. Cuadernos de Trabajos Prácticos. Serie Mitos</i>, una colección que cuenta con 6 volúmenes y que ya ha obtenido una reedición a cargo de
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Book chapters on the topic "HiPIMS plasma"

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"High-Power Impulse Magnetron Sputtering (HiPIMS)." In Encyclopedia of Plasma Technology. CRC Press, 2016. http://dx.doi.org/10.1081/e-eplt-120049697.

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Conference papers on the topic "HiPIMS plasma"

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Estrin, Francis Lockwood, and James W. Bradley. "Triple probe mesurements in HiPIMS plasma." In 2016 IEEE International Conference on Plasma Science (ICOPS). IEEE, 2016. http://dx.doi.org/10.1109/plasma.2016.7534248.

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Mishra, Anurag, J. W. Bradley, and P. J. Kelly. "Spatial and temporal evolution of plasma potential in hipims discharge." In 2009 IEEE 36th International Conference on Plasma Science (ICOPS). IEEE, 2009. http://dx.doi.org/10.1109/plasma.2009.5227766.

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Gallian, Sara, Jan Trieschmann, Thomas Mussenbrock, William N. G. Hitchon, and Ralf Peter Brinkmann. "Analytic model of the energy distribution for energetic electrons in HiPIMS." In 2015 IEEE International Conference on Plasma Sciences (ICOPS). IEEE, 2015. http://dx.doi.org/10.1109/plasma.2015.7179892.

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Gallian, Sara, Jan Trieschmann, Thomas Mussenbrock, William N. G. Hitchon, and Ralf Peter Brinkmann. "Global modeling of hiPIMS systems: Transition from homogeneous to self organized discharges." In 2014 IEEE 41st International Conference on Plasma Sciences (ICOPS) held with 2014 IEEE International Conference on High-Power Particle Beams (BEAMS). IEEE, 2014. http://dx.doi.org/10.1109/plasma.2014.7012495.

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Gallian, Sara, Thomas Mussenbrock, Ralf-Peter Brinkmann, and William N. G. Hitchon. "Parametric studyoflow frequency rotating structures in high power impulse magnetron sputtering (HIPIMS) discharges." In 2013 IEEE 40th International Conference on Plasma Sciences (ICOPS). IEEE, 2013. http://dx.doi.org/10.1109/plasma.2013.6634889.

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Rieke, Julius. "Controlling Stoichiometry and Ionization of Reactive HIPIMS Processes by Using Plasma Emission Monitoring." In 61st Society of Vacuum Coaters Annual Technical Conference. Society of Vacuum Coaters, 2018. http://dx.doi.org/10.14332/svc18.proc.0038.

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Sigurjonsson, P., J. T. Gudmundsson, P. Larsson, D. Lundin, and U. Helmersson. "The spatial and temporal variation of the electron energy distribution function (EEDF) in the HiPIMS discharge." In 2009 IEEE 36th International Conference on Plasma Science (ICOPS). IEEE, 2009. http://dx.doi.org/10.1109/plasma.2009.5227253.

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Shukla, Krishnanand. "A New Approach Towards Performing Plasma Nitriding of CrCoMo Medical Grade Alloys Using HIPIMS Discharge." In 64th Society of Vacuum Coaters Annual Technical Conference. Society of Vacuum Coaters, 2021. http://dx.doi.org/10.14332/svc21.proc.0024.

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Jouan, Pierre-Yves, K. Jeraudy, A. Ferrec, et al. "NiO Thin films Deposited by Reactive HiPIMS: From Plasma Diagnostics to Improvement of the Solar Cells Efficiency." In Society of Vacuum Coaters Annual Technical Conference. Society of Vacuum Coaters, 2015. http://dx.doi.org/10.14332/svc15.proc.1953.

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O’Dell, J. S., T. N. Mckechnie, and R. R. Holmes. "Increasing Performance of Plasma Spray Formed Components." In ITSC 1998, edited by Christian Coddet. ASM International, 1998. http://dx.doi.org/10.31399/asm.cp.itsc1998p1271.

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Abstract Near net shape spray forming of components significantly simplifies and reduces cost of fabricating some structures. Material utilization is very high, and laborious machining can be avoided. As-spray formed components have been tested and found to perform adequately. However, improvements in alloying, thermal treatment and coating have been demonstrated to add increased performance to spray formed components. In fabricating tungsten components alloying additions of rhenium, nickel or iron have made significant increases in material strength and ductility. Thermal treatments such as h
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