Relevant bibliographies by topics / Hitachi (firm)

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Academic literature on the topic 'Hitachi (firm)'

Author: Grafiati
Published: 4 June 2021
Last updated: 5 February 2022

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Journal articles on the topic "Hitachi (firm)"

1

Anchordoguy, Marie. "Chandler and Business History in Japan." Business History Review 82, no. 2 (2008): 301–8. http://dx.doi.org/10.1017/s0007680500062796.

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The work and ideas of Alfred D.Chandler Jr. have enriched the field of Japanese business history and our understanding of that nation's industrial development. Chandler's studies about the rise of the large, professionally managed, multidivisional firm in the United States highlight factors critical not only to the United States' capitalist system but also to Japan's. Indeed, large firms played a dominant role in Japan's economic takeoff in the late 1800s. As these companies grew, they were transformed into professionally managed corporations. Managers, operating in a clear hierarchical chain of command, built up huge companies, such as Nihon Denki (NEC), Toshiba, Mitsubishi Electric, Hitachi, Nippon Steel, Matsushita, and Toyota. In Japanese as in U.S. firms, the visible hand of management was critical to controlling the flow of work, from the input of raw materials to the production of finished goods.
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2

Aldrich, Henry C., and Donna S. Williams. "Inexpensive Digitization of an SEM." Microscopy Today 13, no. 2 (March 2005): 46–47. http://dx.doi.org/10.1017/s1551929500051506.

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Because of the high cost of Polaroid film, many years ago we fitted our Hitachi S-450 scanning electron microscope with a 35 mm camera. At that time, we used a Pentax ME Super, which was totally manual and had to have the film advanced by a hand lever. This was an annoyance, but when we set up the system, Polaroid Type 55 film was about $2.00 per photo, and the cost of 35 mm spooled in our lab ran about $.10 per photo.When we traded the Hitachi S-450 for the later Hitachi S-570, we moved the 35 mm system to this microscope. About 1999, when the Pentax ZX-50 with motorized film advance became available, we adapted it to the S-570, using the Pentax electric shutter release. The lens used with both of these cameras was an elderly 50 mm screw-mount Pentax Macro lens that focused well on the CRT of the SEM.
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Savage, T. S., R. Ai, and L. D. Marks. "UHV-TEM imaging of surface reconstructions in B-doped Si<111>." Proceedings, annual meeting, Electron Microscopy Society of America 49 (August 1991): 618–19. http://dx.doi.org/10.1017/s0424820100087409.

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A variety of techniques including LEED, STM and RHEED have been used to study surface reconstructions on the silicon <111> surface. Additionally, ultra high vacuum-transmission electron microscopy (UHV-TEM) has been used for a limited number of studies most notably on the 7x7 reconstructed surface. The limiting factor in these studies has been the availability of microscopes capable of in-situ sample preparation and imaging in a UHV environment. The Hitachi UHV-H9000 located at Northwestern University has recently been used to observe several surface reconstructions on a single crystal silicon <111> thin film. Transmission electron diffraction (TED) patterns were obtained for 7x7, and 5x1 surface reconstructions.
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Matsumoto, Takao, Takayoshi Tanji, and Akira Tonomura. "A high-resolution fraunhofer in-line electron holography." Proceedings, annual meeting, Electron Microscopy Society of America 51 (August 1, 1993): 1222–23. http://dx.doi.org/10.1017/s0424820100151945.

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In-line holography is advantageous in terms of contrast in imaging weak phase objects. However, most of the recent articles on electron holography had an off-axis configuration employing an electron biprism and were applied successfully only to objects with a rather strong phase shift such as magnetic flux and thin crystals. When it comes to the observation of considerably weak phase object, the off-axis method fails. We applied Fraunhofer in-line electron holography to observe an undecagold cluster, the core of which has a diameter of 0.82 nm, and obtained a high resolution image with high contrast that has been obtained neither by off-axis electron holography nor by conventional transmission electron microscopy.A Hitachi HF-2000 electron microscope equipped with a 200-kV cold field emission gun was used during the experiment. The specimen, Monoamino-Undecagold (NanoProbes, Inc., Stony Brook, N.Y.), was prepared in a highly dispersive form on a thin carbon film supported by a thick holey carbon film.
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Yang, Jiao, Xin Yu Wang, Peng Kai Li, Ji Fa Huang, and Peng Hao Deng. "Synthesis of Self-Supporting ZnO Nanowire Array Film and its Optical Property and Room Temperature Ferromagnetism." Materials Science Forum 1036 (June 29, 2021): 45–52. http://dx.doi.org/10.4028/www.scientific.net/msf.1036.45.

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X-ray diffractometer, field emission scanning electron microscope (SEM, Hitachi S-4800), laser confocal micro-region Raman spectrometer and vibration sample magnetometer were used to systematically study the effects of polyethyleneimine concentrations and exposure time on the morphology and size of ZnO nanowire arrays. The photoelectric property and the relationship between the morphology of nanowire arrays and ferromagnetism at room temperature were also analyzed. Under 15 min exposure time, when the polyethyleneimine concentration is 2.25 g / L, the obtained ZnO nanowire array film exhibits the smallest size, the optimal density and vertical orientation. According to the study of luminescence and room temperature magnetism, it is shown that the optical and ferromagnetic property are related to the variation tendency of oxygen defects and surface defects of the ZnO nanowires.
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Li, Chao Rong, Hu Yang, and Juan Li. "Rapid Fabrication of Large-Area SiO2 Nanoparticle Monolayer Films Via Water-Induced Interfacial Assembly." Applied Mechanics and Materials 528 (February 2014): 112–17. http://dx.doi.org/10.4028/www.scientific.net/amm.528.112.

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Water/toluene interfacial self-assembly of nanostructures is a powerful bottom-up approach for film fabrication because of the low cost and high efficiency, and it is a simple and universal method for almost all low-dimensional nanostructures. The method involved adding alcohol and then toluene (here the dispersant was itself alcohol, only toluene was added) into SiO2 nanoparticle dispersion, and then a large quantity of distilled water was rapidly poured into the mixed system. Simultaneously, nanoparticles in the dispersion were extracted to the water/toluene interface, forming a thin film with a nearly perfect hexagonal close packed phase. Large-area nanoparticle monolayer films (e.g., more than 20 cm2) could be prepared in less than 1 min. The close-packed structures of these thin films were verified by a field emission scanning electron microscopy (FESEM, Hitachi S-4800, Japan). We also investigated the whole process of forming the films and found out the mechanism of water-induced interfacial assembly. As for the specific kinetic mechanism of the fabrication process, it is expected to further study in later time.
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7

Kimoto, K., Y. Yahisa, T. Hirano, K. Usami, and S. Narishige. "Compositional separation in CoCrTa thin film as observed using a TEM with an imaging filter." Proceedings, annual meeting, Electron Microscopy Society of America 53 (August 13, 1995): 480–81. http://dx.doi.org/10.1017/s0424820100138774.

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Cobalt chromium alloys are current longitudinal high-density recording media. Compositional features in the cobalt chromium thin films directly affect the magnetic and recording properties. Elemental analyses of the films have been performed by several methods, however, topological nature and crystallographic information are still ill-defined because of limitations in these methods.In the present study, elemental mapping of cobalt and chromium in a CoCrTa thin film has been quantitatively performed using a transmission electron microscope (TEM) with an imaging filter.A chromium underlayer (75nm thick) and a CoCrTa magnetic layer (27nm thick) were deposited on a Ni-P plated Al-Mg alloy substrate using direct current magnetron sputtering at a substrate temperature of 270°C. Target contents for sputtering of the CoCrTa film are shown in Table I. Energy-filtered images and electron energy loss spectra (EELS) were acquired using a TEM (Hitachi, HF-2000) equipped with an imaging filter (Gatan, imaging filter model 678). Because of the high brightness of a field emission gun, this system allows a small collection semiangle (4.4 mrad) and a narrow energy window (20-30 eV) for imaging.
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8

Liu, Y., H. Wang, J. Mazumder, and J. M. Rigsbee. "HRTEM Study of Sputtered Cu-6at% Ta Films." Microscopy and Microanalysis 3, S2 (August 1997): 409–10. http://dx.doi.org/10.1017/s143192760000893x.

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Cu-refractory metal composites such as Cu-Ta alloys are attracting research interest because of their potential high electrical and thermal conductivity and high mechanical strength at elevated temperatures [1]. In the previous study, it has been shown that the hardness of Cu-Ta is three times of the Cu substrate [2] and the Ta was found to exist as discrete particle and aligned particles. In this presentation, we report the detailed study on the microstructure of the heat treated film and hot-pressed film.The Cu-6at%Ta films were deposited on Cu foil at 100°C by RF co-sputtering. The films examined in this study was hot-pressed under 35 MPa pressure at Ar atmosphere for 1 hour. Cross-sectional TEM samples were examined using a Hitachi 9000 high resolution transmission electron microscope (HRTEM) at the Center for Microanalysis, Materials Research Laboratory, University of Illinois at Urbana-Champaign.
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9

Matsukawa, Daisaku, Hiroko Yotsuyanagi, Shiori Sakakibara, Noriyuki Yamazaki, Tetsuya Enomoto, and Takeharu Motobe. "Novel Low Temperature Curable Photosensitive Negative-tone Polyimide with Higher Resolution and Reliability." International Symposium on Microelectronics 2018, no. 1 (October 1, 2018): 000508–11. http://dx.doi.org/10.4071/2380-4505-2018.1.000508.

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Abstract Hitachi Chemical DuPont MicroSystems (HDMS) has been developing photo sensitive negative-tone polyimides (PIs) as dielectrics for re-distribution layers (RDLs) in wafer level packages (WLPs) and as protection layers in semiconductor ICs. Photo sensitive negative-tone PIs can simplify the manufacturing process and ensure high reliability owing to their good mechanical properties, high thermal stability, and high electrical properties. On the other hand, since advanced packaging application such as Fan-Out WLP (FO-WLP) requires finer L/S design as well as higher reliability, lithographic performance of PIs has to be further improved and good cured film property should be achieved when cured at lower temperature (&lt;230 °C). In order to meet these requirements, HDMS started the development of new PI which shows enhanced lithographic performance with good film property. In this paper, we will demonstrate our novel low temperature curable photo sensitive solvent developable negative-tone PI. By adopting a new photo-package to improve lithographic performance, this PI can achieve 3 μm via opening at 5 μm cured thickness and 5 μm via opening at 10 μm cured thickness with smooth pattern profile after cure. In addition, this PI shows good film property when cured at 200 °C and no electrical failure is observed during 300h bias-HAST using 2/2 μm L/S pattern.
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10

Dineen, M. T. "Use of digital microscopy in process control during the manufacture of rubber-modified thermoplastics." Proceedings, annual meeting, Electron Microscopy Society of America 54 (August 11, 1996): 616–17. http://dx.doi.org/10.1017/s0424820100165549.

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The production of rubber modified thermoplastics can exceed rates of 30,000 pounds per hour. If a production plant needs to equilibrate or has an upset, that means operating costs and lost revenue. Results of transmission electron microscopy (TEM) can be used for process adjustments to minimize product loss. Conventional TEM, however, is not a rapid turnaround technique. The TEM process was examined, and it was determined that 50% of the time it took to complete a polymer sample was related to film processing, even when using automated equipment. By replacing the conventional film portion of the process with a commercially available system to digitally acquire the TEM image, a production plant can have the same TEM image in the control room within 1.5 hours of sampling.A Hitachi H-600 TEM Operated at 100 kV with a tungsten filament was retrofitted with a SEMICAPS™ image collection and processing workstation and a KODAK MEGAPLUS™ charged coupled device (CCD) camera (Fig. 1). Media Cybernetics Image-Pro Plus software was included, and connections to a Phaser II SDX printer and the network were made. Network printers and other PC and Mac software (e.g. NIH Image) were available. By using digital acquisition and processing, the time it takes to produce a hard copy of a digital image is greatly reduced compared to the time it takes to process film.
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Books on the topic "Hitachi (firm)"

1

Pegge, Tony. Hitachi two years on. London: Institute of Personnel Management, 1986.

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Book chapters on the topic "Hitachi (firm)"

1

"Hitachi: A Dancing Giant." In The New Community Firm, 113–39. Cambridge University Press, 2005. http://dx.doi.org/10.1017/cbo9780511488610.009.

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Conference papers on the topic "Hitachi (firm)"

1

Clark, Eppie E. "Value Assessment of Workers of ON, AMKOR and HITACHI Firms in the Philippines." In PICMET '07 - 2007 Portland International Conference on Management of Engineering & Technology. IEEE, 2007. http://dx.doi.org/10.1109/picmet.2007.4349599.

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