Academic literature on the topic 'HSQ resist'
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Journal articles on the topic "HSQ resist"
Komori, Takuya, Hui Zhang, Takashi Akahane, Zulfakri bin Mohamad, You Yin, and Sumio Hosaka. "Effect of Salty Development on Forming HSQ Resist Nanodot Arrays with a Pitch of 15×15 nm2 by 30-keV Electron Beam Lithography." Key Engineering Materials 534 (January 2013): 113–17. http://dx.doi.org/10.4028/www.scientific.net/kem.534.113.
Full textSidorkin, V., A. Grigorescu, H. Salemink, and E. van der Drift. "Resist thickness effects on ultra thin HSQ patterning capabilities." Microelectronic Engineering 86, no. 4-6 (April 2009): 749–51. http://dx.doi.org/10.1016/j.mee.2008.12.071.
Full textHotovy, Ivan, Ivan Kostic, Martin Predanocy, Pavol Nemec, and Vlastimil Rehacek. "Effects of HSQ e–beam Resist Processing on the Fabrication of ICP–RIE Etched TiO2 Nanostructures." Journal of Electrical Engineering 67, no. 6 (December 1, 2016): 454–58. http://dx.doi.org/10.1515/jee-2016-0067.
Full textBruchhaus, L., S. Bauerdick, L. Peto, U. Barth, A. Rudzinski, J. Mussmann, J. Klingfus, J. Gierak, and H. Hövel. "High resolution and high density ion beam lithography employing HSQ resist." Microelectronic Engineering 97 (September 2012): 48–50. http://dx.doi.org/10.1016/j.mee.2012.04.033.
Full textLauvernier, Denis, Jean-Pierre Vilcot, Marc François, and Didier Decoster. "Optimization of HSQ resist e-beam processing technique on GaAs material." Microelectronic Engineering 75, no. 2 (August 2004): 177–82. http://dx.doi.org/10.1016/j.mee.2004.05.002.
Full textDinh, Cong Que, Akihiro Oshima, and Seiichi Tagawa. "Depth Dependence of Time Delay Effect on Hydrogen Silsesquioxane (HSQ) Resist Layers." Journal of Photopolymer Science and Technology 25, no. 1 (2012): 121–24. http://dx.doi.org/10.2494/photopolymer.25.121.
Full textTao, Jiarui, Yifang Chen, Xingzhong Zhao, Adnan Malik, and Zheng Cui. "Room temperature nanoimprint lithography using a bilayer of HSQ/PMMA resist stack." Microelectronic Engineering 78-79 (March 2005): 665–69. http://dx.doi.org/10.1016/j.mee.2004.12.082.
Full textRommel, Marcus, Bengt Nilsson, Piotr Jedrasik, Valentina Bonanni, Alexandre Dmitriev, and Jürgen Weis. "Sub-10nm resolution after lift-off using HSQ/PMMA double layer resist." Microelectronic Engineering 110 (October 2013): 123–25. http://dx.doi.org/10.1016/j.mee.2013.02.101.
Full textTatarintsev, A. A., A. V. Shishlyannikov, K. V. Rudenko, A. E. Rogozhin, and A. E. Ieshkin. "The Effect of Temperature on the Development of a Contrast HSQ Electronic Resist." Russian Microelectronics 49, no. 3 (May 2020): 151–56. http://dx.doi.org/10.1134/s1063739720030063.
Full textRadtke, Mariusz, Richard Nelz, Abdallah Slablab, and Elke Neu. "Reliable Nanofabrication of Single-Crystal Diamond Photonic Nanostructures for Nanoscale Sensing." Micromachines 10, no. 11 (October 24, 2019): 718. http://dx.doi.org/10.3390/mi10110718.
Full textDissertations / Theses on the topic "HSQ resist"
Knotek, Miroslav. "Selektivní růst GaN nanostruktur na křemíkových substrátech." Master's thesis, Vysoké učení technické v Brně. Fakulta strojního inženýrství, 2015. http://www.nusl.cz/ntk/nusl-232076.
Full textDäbritz, Frank. "Hyperstern-Polymere mit hochverzweigten Kernen und polaren Armen - Ihre Synthese, Charakterisierung und Anwendung als Reaktivbinder in Epoxy-basierten Photo- und Thermolacken." Doctoral thesis, Saechsische Landesbibliothek- Staats- und Universitaetsbibliothek Dresden, 2011. http://nbn-resolving.de/urn:nbn:de:bsz:14-qucosa-77588.
Full textFerreira, Liliana Filipa Gomes. "Desenvolvimento de métodos instrumentais de análise aplicado à indústria das resinas naturais." Master's thesis, 2018. http://hdl.handle.net/1822/55932.
Full textA resina natural é substância orgânica resultante do metabolismo secundário de várias espécies vegetais do género Pinus. Por destilação obtém-se colofónia e terebentina que são os principais responsáveis pelo valor económico da resina, uma vez que são utilizados como matérias-primas numa vasta gama de aplicações. A colofónia é utilizada no fabrico dos derivados de resina que, posteriormente, são incorporados em aplicações de diversas indústrias químicas, como por exemplo na indústria dos adesivos, tintas, cosméticos, alimentar, entre outras. Com o mercado extremamente exigente e competitivo, a etapa de análise e caracterização das matérias-primas e dos produtos acabados é crucial para garantir a qualidade e segurança do produto final. No sentido de auxiliar e complementar o controlo de qualidade das matérias-primas e do produto acabado foram aplicadas duas técnicas de caracterização avançada, a espetroscopia de infravermelho (FTIR-ATR) e a cromatografia gasosa acoplada à espetrometria de massa (CG/EM e HS-CG-EM). A técnica de FTIR-ATR foi aplicada no sentido de apoiar a caracterização das matérias-primas no ato de receção, proporcionando uma resposta rápida. A cromatografia gasosa foi direcionada para a caracterização dos derivados de resina na quantificação relativa dos Compostos Orgânicos Voláteis (COVs). Está técnica conjugada com análise multivariada dos resultados permitiu caracterizar e diferenciar as colofónias de diferentes origens. Neste estudo, a técnica de FTIR-ATR mostrou ser um método expedito para controlo de qualidade das matérias-primas, complementado as restantes técnicas no Laboratório de Qualidade da empresa. A técnica de CG-EM apresenta diversas aplicabilidades para o controlo de qualidade, quer das matérias-primas quer do produto acabado. Além disso, demonstrou ser uma mais valia no desenvolvimento de novos produtos.
Natural resin is an organic substance resulting from the secondary metabolism of several plant species of the genus Pinus. Gum rosin is the main product extracted from the natural resin by the distillation process. It is characterized an amorphous, solid, brittle, vitreous, transparent, non-volatile and waterinsoluble material. Gum rosin is used as a raw material in the production of resin derivatives which will subsequently be incorporated into various chemical industries, for example in the adhesives, paints, cosmetics, food industry, among others. With the extremely demanding and competitive market, the analysis and characterization of raw materials and finished products is crucial to ensure the quality and safety of the final product. Two techniques of advanced characterization, infrared spectroscopy (FTIR-ATR) and gas chromatography (GC / MS, HS-GC-MS) were studied in order to aid and complement the quality control of the raw materials and the finished product. The FTIR-ATR technique was developed to support the characterization of raw materials in the delivery act, providing a fast answer. The gas chromatography was directed to the characterization of the resin derivatives, specifically, in the relative quantification of Volatile Organic Compounds (VOC). On the other hand, this technique together with multivariate analysis of the results allowed to characterize and differentiate the gum rosins from different origins. In this study, the FTIR-ATR technique proved to be an expeditious method for controlling the quality of raw materials, complemented by the techniques realized in the Quality Laboratory. The CG-MS technique has several applicability for the quality control of raw materials and the finished product, however, this technique is more applicable to the research and development of new products.
You, Jing-Jhou, and 游景州. "The Involvements of Hormone-Sensitive Lipase (HSL) and Adipocyte Triglyceride Lipase (ATGL) in Resistin-induced Lipolysis in 3T3-L1 Adipocytes." Thesis, 2011. http://ndltd.ncl.edu.tw/handle/71946881160342684339.
Full text國立陽明大學
生理學研究所
99
Obesity, characterized by the excess white adipose tissue (WAT), is a public healthy problem resulting from the imbalance between food intake and energy expenditure. Increased level of free fatty acids in obesity is related to development of insulin resistance. Hormone-sensitive lipase (HSL) and adipocyte triglyceride lipase (ATGL) regulate lipolysis, defined as triacylglycerol hydrolysis for release of fatty acids and glycerol. Phosphorylation and translocation elevate HSL activity, meanwhile, interaction with comparative gene identification 58 alpha/beta-hydrolase domain containing protein 5 (CGI-58/ABHD-5) enhances ATGL activity. Cyclic adenosine monophosphate (cAMP)-dependetn protein kinase A (PKA) phosphorylates HSL at Ser563, Ser659, and Ser660, and extracellular signal-regulated kinase (ERK) at Ser600, contributing to lipolytic activation of HSL. Resistin, an adipokine, is increased in obesity and is related to insulin resistance. However, the role of resistin in lipolysis is largly unknown. We used 3T3-L1 adipocytes as the cell model for analysis. Our data demonstrated that treatment of isoproterenol (1nM) or resistin (1, 5, 10, and 50 ng/ml) for 4 hours significantly induced lipolysis in 3T3-L1 adipocytes as indicated by glycerol concentration in the medium. Furthermore, resistin (50 ng/ml) enhanced phosphorylation of HSL (Ser660) and ERK in 60 minutes according to Western blotting. Moreover, resistin elevated cAMP level at 5 minutes and maintained to 15 minutes. On the other hand, resistin (50 ng/ml) increased interaction between ATGL and ABHD-5 indicated by immunoprecipitation. However, treatment of resistin (50 ng/ml) did not affect protein expression of ATGL in 60 minutes by Western blotting. Besides, mRNA expression of Rsistin, Hsl, and Atgl were not altered by resistin (50 ng/ml) treatment within 12 hours. Altogether, resistin induces lipolysis in 3T3-L1 trough activation of HSL and ATGL.
Lu, Hsiao-Yun, and 呂曉昀. "The effects of resistin on 3T3-L1 adipocyte lipolysis and its involvement of adipose triglyceride lipase(ATGL) and hormone-sensitive lipase(HSL)." Thesis, 2009. http://ndltd.ncl.edu.tw/handle/51750213328428432706.
Full text國立陽明大學
生理學研究所
97
Lipolysis is a process of triglycerides hydrolysis. Dysfunctional lipolysis disturbs energy homeostasis and contributes to obesity and insulin resistance. Lipolysis is regulated by numerous hormones and requires activation of lipolytic enzymes such as hormone-sensitive lipase (HSL), an enzyme presumed the rate-limiting enzyme for lipolysis. In 2004, a novel lipolytic enzyme, adipose triglyceride lipase (ATGL), was identified and found predominantly in adipose tissue. ATGL interacting with coactivator—CGI-58 (also called Abhd5) on the lipid droplet catalyzes the initial step of lipolysis. Resistin was identified in 2001 and named for resistance to insulin. Previous studies show that resistin can induce adipocytes lipolysis in vivo and in vitro, but the mechanism is still unclear. Thus, the present study was to characterize the expression of ATGL and HSL in resistin-induced lipolysis. 3T3-L1 preadipocytes were differentiated from fibroblasts to mature adipocytes and served as experimental materials. Cells were treated with different concentrations of resistin (1, 10, 50, 100ng/ml) and isoproterenol (10-7M) at various time periods(0, 2, 4, 8, 10, 24hr). Glycerol contents were measured as an index of lipolysis. Gene and protein expression of ATGL and HSL were examined. Resistin can stimulate 3T3-L1 adipocytes lipolysis at the 4hr incubation in 10ng/ml and increase ATGL and HSL protein expression compared with control in 50ng/ml, but has no effect on HSL Ser660 phosphorylation. 10ng/ml resistin has no effect on 3T3-L1 adipocytes lipolysis compared with control. It can decrease ATGL gene expression in 4 and 10hr treatment, but has no effect on both protein expressions. 10-7M Isoproterenol can decrease ATGL gene expression in 4, 8 and 24hr compared with 0hr, and decrease HSL protein expression in 10hr compared with 0hr. cAMP inhibitor—2’,5’-dideoxyadenosine (2’,5’-DD) can reduce resistin and Isoproterenol induced-lipolysis at the 4hr incubation but has no effect on ATGL gene and protein expression. Under 10-7M Isoproterenol treatment, 2’,5’-DD can reduce HSL protein expression. Our data suggested that the lipolytic effect of resistin might not through the regulation of ATGL and HSL expression. It might stimulate 3T3-L1 adipocytes lipolysis throught cAMP pathway. Thus, resistin stimulate 3T3-L1 adipocytes lipolysis may through activation of ATGL activity.
Books on the topic "HSQ resist"
Alyazidi, Raidan, and Soren Gantt. Herpes simplex Virus. Oxford University Press, 2018. http://dx.doi.org/10.1093/med/9780190604813.003.0007.
Full textScott, David L. Outcomes. Oxford University Press, 2013. http://dx.doi.org/10.1093/med/9780199642489.003.0029.
Full textScott, David L. Outcomes. Oxford University Press, 2016. http://dx.doi.org/10.1093/med/9780199642489.003.0029_update_001.
Full textBook chapters on the topic "HSQ resist"
Efe, Ömer Faruk. "Application of Fuzzy Analytic Hierarchy Process for Evaluation of Ankara-Izmir High-Speed Train Project." In AI-Based Services for Smart Cities and Urban Infrastructure, 258–76. IGI Global, 2021. http://dx.doi.org/10.4018/978-1-7998-5024-3.ch012.
Full textEvans, Nicholas H. A. "Prayer Duels to the Death." In Far from the Caliph's Gaze, 115–40. Cornell University Press, 2020. http://dx.doi.org/10.7591/cornell/9781501715686.003.0005.
Full textChen, Min. "A Hierarchical Security Model for Multimedia Big Data." In Big Data, 441–53. IGI Global, 2016. http://dx.doi.org/10.4018/978-1-4666-9840-6.ch022.
Full textLopez Estrada, Veronica, Carmen Pena, and Denise Love. "Learning to Teach in Mixed-Reality Simulated Virtual Environments at a Hispanic Serving Institution (HSI)." In Handbook of Research on Developing a Post-Pandemic Paradigm for Virtual Technologies in Higher Education, 144–66. IGI Global, 2021. http://dx.doi.org/10.4018/978-1-7998-6963-4.ch008.
Full textBhartiya, Shalini, Deepti Mehrotra, and Anup Girdhar. "Hierarchy Similarity Analyser." In Virtual and Mobile Healthcare, 204–20. IGI Global, 2020. http://dx.doi.org/10.4018/978-1-5225-9863-3.ch010.
Full textBhartiya, Shalini, Deepti Mehrotra, and Anup Girdhar. "Hierarchy Similarity Analyser-An Approach to Securely Share Electronic Health Records." In Data Analytics in Medicine, 1485–501. IGI Global, 2020. http://dx.doi.org/10.4018/978-1-7998-1204-3.ch074.
Full textNisar, Humaira, Zhen Yao Lim, and Kim Ho Yeap. "A Simple Non-Invasive Automated Heart Rate Monitoring System Using Facial Images." In Advances in Bioinformatics and Biomedical Engineering, 100–122. IGI Global, 2016. http://dx.doi.org/10.4018/978-1-4666-8811-7.ch005.
Full textWilliam Tong, C. Y. "Antivirals." In Tutorial Topics in Infection for the Combined Infection Training Programme. Oxford University Press, 2019. http://dx.doi.org/10.1093/oso/9780198801740.003.0059.
Full text"Modeling and Optimization of Concentrated Solar Thermal System." In Modeling and Optimization of Solar Thermal Systems, 59–89. IGI Global, 2021. http://dx.doi.org/10.4018/978-1-7998-3523-3.ch003.
Full textScott, David L. "Outcomes." In Oxford Textbook of Rheumatology, 221–26. Oxford University Press, 2013. http://dx.doi.org/10.1093/med/9780199642489.003.0029_update_002.
Full textConference papers on the topic "HSQ resist"
Chen, Wei-Su, and Ming-Jinn Tsai. "Gap-fill type HSQ/ZEP520A bilayer resist process-(IV): HSQ-rod and HSQ-tip hardening processes." In SPIE Advanced Lithography, edited by Robert D. Allen. SPIE, 2010. http://dx.doi.org/10.1117/12.846274.
Full textSaleem, M. R., P. A. Stenberg, M. B. Khan, Z. M. Khan, S. Honkanen, and J. Turunen. "HSQ resist for replication stamp in polymers." In SPIE MOEMS-MEMS, edited by Winston V. Schoenfeld, Raymond C. Rumpf, and Georg von Freymann. SPIE, 2012. http://dx.doi.org/10.1117/12.907862.
Full textChen, Wei-Su, Pei-Yi Gu, Ming-Jer Kao, and Ming-Jinn Tsai. "Gap-fill type HSQ/ZEP520A bilayer resist process-(II): HSQ island and spacer formation." In SPIE Advanced Lithography, edited by Clifford L. Henderson. SPIE, 2008. http://dx.doi.org/10.1117/12.772506.
Full textChen, Wei-Su, and Ming-Jinn Tsai. "Gap-fill type HSQ/ZEP520A bilayer resist process-(III): optimal process window for HSQ air-tip formation." In SPIE Advanced Lithography, edited by Clifford L. Henderson. SPIE, 2009. http://dx.doi.org/10.1117/12.813623.
Full textMatsubara, Y., J. Taniguchi, and I. Miyamoto. "Fabrication of three-dimensional HSQ resist structure using electron beam lithography." In Digest of Papers Microprocesses and Nanotechnology 2005. 2005 International Microprocesses and Nanotechnology Conference. IEEE, 2005. http://dx.doi.org/10.1109/imnc.2005.203777.
Full textChen, Wei-Su, Ming-Jer Kao, and Ming-Jinn Tsai. "Gap-fill type HSQ/ZEP520A bilayer resist process-(I): HSQ-coated ZEP520A CD shrinkage for 32-nm trench patterns." In SPIE Advanced Lithography, edited by Clifford L. Henderson. SPIE, 2008. http://dx.doi.org/10.1117/12.772496.
Full textKostic, Ivan, Katia Vutova, Anna Bencurova, Pavol Nemec, and Robert Andok. "Study of Proximity Effects in HSQ e-Beam Resist on TiO2 Thin Film." In 2020 13th International Conference on Advanced Semiconductor Devices And Microsystems (ASDAM). IEEE, 2020. http://dx.doi.org/10.1109/asdam50306.2020.9393837.
Full textChen, Wei-Su, and Ming-Jinn Tsai. "Process optimization of high aspect ratio sub-32nm HSQ/AR3 bi-layer resist pillar." In SPIE Advanced Lithography, edited by Robert D. Allen and Mark H. Somervell. SPIE, 2011. http://dx.doi.org/10.1117/12.878591.
Full textTatarintsev, Andrey, Anton Shishlyannikov, Konstantin Rudenko, Alexander Rogozhin, and Alexey Yeshkin. "TEMPERATURE DEPENDENCE OF THE CONTRASTS OF THE ELECTRON HSQ RESIST AT DIFFERENT METHODS OF DEVELOPMENT." In International Forum “Microelectronics – 2020”. Joung Scientists Scholarship “Microelectronics – 2020”. XIII International conference «Silicon – 2020». XII young scientists scholarship for silicon nanostructures and devices physics, material science, process and analysis. LLC MAKS Press, 2020. http://dx.doi.org/10.29003/m1593.silicon-2020/179-182.
Full textGrigorescu, Anda E., Marco C. van der Krogt, and Cees W. Hagen. "Sub-10-nm structures written in ultra-thin HSQ resist layers using electron-beam lithography." In Advanced Lithography, edited by Qinghuang Lin. SPIE, 2007. http://dx.doi.org/10.1117/12.725851.
Full textReports on the topic "HSQ resist"
Kyser, E. A. Plutonium Loading onto Reillex HPQ Anion Exchange Resin. Office of Scientific and Technical Information (OSTI), January 2001. http://dx.doi.org/10.2172/773118.
Full textSteimke, J., M. Williams, T. Steeper, and R. Leishear. NITRATE CONVERSION OF HB-LINE REILLEXTM HPQ RESIN. Office of Scientific and Technical Information (OSTI), May 2012. http://dx.doi.org/10.2172/1042698.
Full textCrooks, W. J. III. Analysis of Permanganate-Digested Reillex(TM) HPQ Anion Exchange Resin. Office of Scientific and Technical Information (OSTI), October 2001. http://dx.doi.org/10.2172/787460.
Full textKyser, E. VALIDATION FOR THE PERMANGANATE DIGESTION OF REILLEX HPQ ANION RESIN. Office of Scientific and Technical Information (OSTI), September 2009. http://dx.doi.org/10.2172/992625.
Full textMarsh, S. F. The effects of ionizing radiation on Reillex trademark HPQ, a new macroporous polyvinylpyridine resin, and on four conventional polystyrene anion exchange resins. Office of Scientific and Technical Information (OSTI), November 1990. http://dx.doi.org/10.2172/6313770.
Full textCrooks, W. J. III. Qualification of Reillex{trademark} HPQ anion exchange resin for use in SRS processes. Office of Scientific and Technical Information (OSTI), May 2000. http://dx.doi.org/10.2172/755372.
Full textWalker, B. W. Permanganate Degradation of Reillex HPQ Ion Exchange Resin for Use in HB-Line. Office of Scientific and Technical Information (OSTI), June 1999. http://dx.doi.org/10.2172/7556.
Full textWoodham, W. H. Measurement of Hydrogen Generation Rates during Digestion, Neutralization, Transfer, and Storage of Reillex HPQ Resin. Office of Scientific and Technical Information (OSTI), October 2018. http://dx.doi.org/10.2172/1480839.
Full textBest, D. Method development for thermal analyses testing on Reillex HPQ resin using the advanced reactive system screening tool (ARSST). Office of Scientific and Technical Information (OSTI), March 2016. http://dx.doi.org/10.2172/1245747.
Full textAshley, K. R., J. Ball, M. Grissom, M. Williamson, S. Cobb, D. Young, and Yen-Yuan J. Wu. An investigation of the applicability of the new ion exchange resin, Reillex{trademark}-HPQ, in ATW separations. Milestone 4, Final report. Office of Scientific and Technical Information (OSTI), September 1993. http://dx.doi.org/10.2172/10172064.
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